KR101512097B1 - Substrate treating apparatus and substrate treating method - Google Patents

Abstract

The present invention relates to a substrate processing apparatus. A substrate processing apparatus according to an embodiment of the present invention includes a container for providing a space in which a supercritical fluid flows or is accommodated; A return pipe, one end of which is connected to the container to discharge the supercritical fluid inside the container and to which a valve is provided; And a waste tube connected to the vessel to discharge the supercritical fluid in the vessel and to which a safety valve is provided, the other end of the recovery tube having the supercritical fluid withdrawn from the vessel for reuse And is connected to a recovery container which is accommodated.

Description

BACKGROUND OF THE INVENTION 1. Field of the Invention [0001] The present invention relates to a substrate processing apparatus,

The present invention relates to a substrate processing apparatus and a substrate processing method, and more particularly, to a substrate processing apparatus for processing a substrate using a supercritical fluid and a substrate processing method using the same.

Semiconductor devices are manufactured through various processes including a photolithography process for forming a circuit pattern on a substrate such as a silicon wafer. During the manufacturing process of the semiconductor device, various foreign substances such as particles, organic contaminants and metal impurities are generated. These foreign substances cause defects on the substrate, which directly affect the performance and yield of the semiconductor device. Therefore, a cleaning process for removing such foreign matter is essentially involved in the manufacturing process of the semiconductor device.

The cleaning process is carried out through a chemical process for removing foreign substances on the substrate, a cleaning process for cleaning the chemical with pure water, and a drying process for drying the substrate. The general drying process has been performed by replacing pure water on a substrate with an organic solvent such as isopropyl alcohol (IPA) having a relatively low surface tension and then evaporating the organic solvent.

However, this drying method still causes a pattern collapse for a semiconductor device having a fine circuit pattern with a line width of 30 nm or less even when an organic solvent is used. Therefore, a supercritical drying process drying process is replacing the existing drying process.

The present invention is to provide a substrate processing apparatus capable of efficiently performing a drying process using a supercritical fluid.

The present invention also provides a substrate processing apparatus in which the regeneration efficiency of a supercritical fluid is improved.

According to an aspect of the present invention, there is provided a method of producing a supercritical fluid, comprising: A return pipe, one end of which is connected to the container to discharge the supercritical fluid inside the container and to which a valve is provided; And a waste tube connected to the vessel to discharge the supercritical fluid in the vessel and to which a safety valve is provided, the other end of the recovery tube having the supercritical fluid withdrawn from the vessel for reuse A substrate processing apparatus connected to the recovery container accommodated in the substrate processing apparatus can be provided.

In addition, the valve provided to the return pipe and the safety valve provided to the waste engine may be provided in different kinds.

The safety valve may include a valve housing connected to the waste engine and forming an inlet through which the supercritical fluid flows and an outlet through which the supercritical fluid flows out; An elastic member positioned in a cylinder formed in the valve housing; And a piston which is located between the elastic member and the inlet and opens and closes the safety valve while being moved by the pressure of the elastic member and the supercritical fluid.

Also, the inner wall of the valve housing may be provided with a packing for preventing the supercritical fluid from leaking between the piston and the inner wall of the valve housing.

Also, the packing may be formed to include a via.

Also, the valve provided in the return pipe may be a diaphragm type.

In addition, the recovery container may separate foreign matter from the supercritical fluid contained therein.

In addition, the recovery container may be connected to a supercritical fluid supply unit that supplies the supercritical fluid to a housing that provides a space where the substrate is processed.

The recovery pipe may include a main recovery pipe having one end connected to the recovery container; And a first line and a second line branched in parallel at the other end of the main return pipe and connected to the container, respectively.

The valve may also include a first valve located in the first line and a second valve located in the second line.

Further, the container may be a housing that provides a space in which the substrate is processed.

In addition, the container may be a supercritical fluid supply unit for supplying the supercritical fluid to a housing that provides a space where the substrate is processed.

In addition, the container may be a pipe connecting a housing providing a space in which the substrate is processed and a supercritical fluid supply unit supplying the supercritical fluid to the housing.

According to one embodiment of the present invention, the supercritical fluid discharged from the vessel can be separated and collected depending on the degree of contamination.

Further, according to an embodiment of the present invention, the regeneration efficiency of the supercritical fluid discharged from the container can be improved.

1 is a plan view of a substrate processing apparatus according to an embodiment of the present invention.
2 is a cross-sectional view of the first process chamber of FIG.
3 is a diagram showing a phase change of carbon dioxide.
Fig. 4 is a view showing the piping of the second process chamber of Fig. 1. Fig.
5 is a diagram showing the circulation of the supercritical fluid.
6 is a view showing a piping of a second process chamber according to another embodiment.
7 is a view showing a vent unit according to an embodiment of the present invention.
8 is a cross-sectional view of the safety valve.
9 is a view showing a state in which the safety valve is opened.
10 is a sectional view of a portion where a safety valve and a waste engine are connected.
11 is a view showing a state in which a vent unit is connected.

Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. The embodiments of the present invention can be modified in various forms, and the scope of the present invention should not be construed as being limited to the following embodiments. This embodiment is provided to more fully describe the present invention to those skilled in the art. Thus, the shape of the elements in the figures has been exaggerated to emphasize a clearer description.

1 is a plan view of a substrate processing apparatus according to an embodiment of the present invention.

Referring to FIG. 1, the substrate processing apparatus 100 includes an index module 1000 and a processing module 2000.

The index module 1000 includes a load port 1100 and a transfer frame 1200 as an equipment front end module (EFEM). The index module 1000 carries the substrate S from the outside and provides the substrate S to the processing module 2000.

The load port 1100, the transfer frame 1200, and the process module 2000 may be sequentially arranged in a line. A direction in which the load port 1100, the transfer frame 1200 and the process module 2000 are arranged is referred to as a first direction X and a direction perpendicular to the first direction X as viewed from above Direction and the direction perpendicular to the first direction X and the second direction Y is referred to as a second direction Y and a direction perpendicular to the first direction X and the second direction Y is referred to as a third direction Z. [

The index module 1000 may be provided with one or a plurality of load ports 1100. [ The load port 1100 is disposed on one side of the transfer frame 1200. When there are a plurality of the load ports 1100, the load ports 1100 may be arranged in a line in the second direction Y. [ The number and arrangement of the load ports 1100 are not limited to those described above and can be changed depending on the footprint of the substrate processing apparatus 100, process efficiency, arrangement with the substrate processing apparatus 100, and the like. The load port 1100 is provided with a carrier C in which the substrate S is received. The carrier C is carried from the outside and loaded into the load port 1100 or unloaded from the load port 1100 and is transported out. For example, the carrier C may be transported between the substrate processing apparatuses 100 by a transport device such as an overhead transfer (OHT). Here, the conveyance of the substrate S may be performed by an operator or another conveying device such as an automatic guided vehicle, a rail guided vehicle or the like instead of the overhead transfer.

The substrate (S) is accommodated in the carrier (C). As the carrier C, a front opening unified pod (FOUP) may be used. At least one slot for supporting the edge of the substrate S is formed inside the carrier C. In the case of a plurality of slots, they may be formed to be spaced apart from each other along the third direction Z. [ Accordingly, the substrate S can be placed inside the carrier C. For example, the carrier (C) can accommodate 25 substrates (S). The carrier C can be sealed from the outside by an openable and closable door. The substrate S accommodated in the carrier C is prevented from being contaminated.

The transfer frame 1200 includes an index robot 1210 and an index rail 1220. The transfer frame 1200 transfers the substrate S between the process module 2000 and the carrier C that is seated on the load port 1100.

The index rail 1220 provides a path through which the index robot 1210 moves. The index rail 1220 may be provided so that its longitudinal direction is parallel to the second direction Y. [ The index robot 1210 carries the substrate S.

The index robot 1210 may have a base 1211, a body 1212, and an arm 1213. The base 1211 is installed on the index rail 1220 and can move along the index rail 1220. The body 1212 is coupled to the base 1211 and can move along the base 1211 in the third direction Z or rotate about the third direction Z. [ The arm 1213 is installed in the body 1212, and can move forward and backward. A hand may be provided at one end of the arm 1213 to hold or place the substrate S. The index robot 1210 is provided with one or a plurality of arms 1213. When a plurality of arms 1213 are provided, the index robots 1210 are stacked on the bodies 1212 along the third direction Z, The arms 1213 can be individually driven. The index robot 1210 moves the base 1211 in the second direction Y on the index rail 1220 and moves the carrier 12 from the carrier C to the substrate 1212 in accordance with the operation of the body 1212 and the arm 1213. [ S can be taken out of the process module 2000 or taken out of the process module 2000 or taken out of the process module 2000 to be housed in the carrier C. [

In addition, the index rail 1220 may be omitted from the transfer frame 1200, and the index robot 1210 may be fixed to the transfer frame 1200. In this case, the index robot 1210 may be disposed at the center of the transfer frame 1200.

 Process module 2000 includes a buffer chamber 2100, a transfer chamber 2200, a first process chamber 2300, and a second process chamber 2500. The process module 2000 receives the substrate S from the index module 1000 and performs a cleaning process on the substrate S. The buffer chamber 2100 and the transfer chamber 2200 are arranged in the first direction X and the transfer chamber 2200 is arranged such that the longitudinal direction thereof is parallel to the first direction X. [ The process chambers 2300 and 2500 may be disposed on the side of the transfer chamber 2200 in the second direction Y. [ Here, the first process chamber 2300 is disposed on one side of the transfer chamber 2200 in the second direction Y, and the second process chamber 2500 is disposed on the other side in the opposite direction in which the first process chamber 2300 is disposed As shown in FIG. The plurality of first process chambers 2300 may be disposed on one side of the transfer chamber 2200 in the first direction X or in the third direction Z Or may be arranged by a combination thereof. The second process chamber 2500 may be one or more than one and a plurality of the second process chambers 2500 may be disposed on the other side of the transfer chamber 2200 in the first direction X, Or may be arranged by a combination thereof.

However, the arrangement of the chambers 2100, 2200, 2300, and 2500 in the process module 2000 is not limited to the above-described example, and may be suitably modified in consideration of process efficiency. For example, the first process chamber 2300 and the second process chamber 2500 may be disposed on the same side of the transfer module in a first direction X, or may be stacked on top of each other.

The buffer chamber 2100 is disposed between the transfer frame 1200 and the transfer chamber 2200. The buffer chamber 2100 provides a buffer space in which the substrate S transferred between the index module 1000 and the processing module 2000 temporarily remains. In the buffer chamber 2100, one or a plurality of buffer slots in which the substrate S is placed are provided. And may be spaced from each other along the third direction Z when a plurality of buffer slots are provided. The buffer slot is provided with a substrate S which is taken out of the carrier C by the index robot 1210 or which is carried out from the processing chambers 2300 and 2500 by the transfer robot 2210 of the transfer chamber 2200. [ (S) can be seated. The index robot 1210 or the transfer robot 2210 can take out the substrate S from the buffer slot and accommodate it in the carrier C or transfer it to the process chambers 2300 and 2500.

The transfer chamber 2200 carries the substrate S between the chambers 2100, 2300, and 2500 disposed therearound. A buffer chamber 2100 is disposed on one side of the transfer chamber 2200 in the first direction X and process chambers 2300 and 2500 are disposed on one side or both sides of the transfer chamber 2200 in the second direction Y So that the transfer chamber 2200 performs the transfer of the substrate S between the buffer chamber 2100, the first process chamber 2300 and the second process chamber 2500. The transfer chamber 2200 includes a transfer rail 2220 and a transfer robot 2210.

The transfer rail 2220 provides a path through which the transfer robot 2210 moves. The conveying rails 2220 may be provided in parallel in the first direction X. [ The transfer robot 2210 carries the substrate S. The transfer robot 2210 includes a base 2211, a body 2212, and an arm 2213. Since the components of the transfer robot 2210 are similar to those of the index robot 1210, detailed description thereof will be omitted. The transfer robot 2210 transfers the wafer 2200 to the buffer chamber 2100, the first process chamber 2300, and the second process 2300 by the operation of the body 2212 and the arm 2213 while the base 2211 moves along the transfer rail 2220. [ And the substrate S is transported between the chambers 2500.

The first process chamber 2300 and the second process chamber 2500 perform different processes for the substrate S, respectively. Here, the first process performed in the first process chamber 2300 and the second process performed in the second process chamber 2500 may be sequentially performed. For example, in the first process chamber 2300, a chemical process, a cleaning process, and a first drying process are performed, and in the second process chamber 2500, a second drying process may be performed as a subsequent process of the first process have. Here, the first drying process may be a wet drying process performed using an organic solvent, and the second drying process may be a supercritical drying process performed using a supercritical fluid. The first drying step and the second drying step may optionally be carried out in any one of the drying steps.

2 is a cross-sectional view of the first process chamber of FIG.

Referring to FIGS. 1 and 2, a first process chamber 2300 includes a housing 2310 and a process unit 2400. In the first process chamber 2300, the first process is performed. Here, the first step may include at least one of a chemical process, a cleaning process, and a first drying process. As described above, the first drying step may be omitted.

The housing 2310 forms the outer wall of the first process chamber 2300 and the process unit 2400 is located inside the housing 2310 to perform the first process. The processing unit 2400 may include a spin head 2410, a fluid supply member 2420, a recovery cylinder 2430 and an elevating member 2440.

The substrate S is seated on the spin head 2410 and rotates the substrate S while the process is in progress. The spin head 2410 may include a support plate 2411, a support pin 2412, a chucking pin 2413, a rotation shaft 2414, and a motor 2415.

The support plate 2411 is provided such that the upper portion has a shape, i.e., a circle, which is substantially similar to the substrate S. A plurality of support pins 2412 on which the substrate S is placed and a plurality of chucking pins 2413 for fixing the substrate S are formed on the support plate 2411. A rotating shaft 2414 rotated by a motor 2415 is fixedly coupled to the lower surface of the support plate 2411. The motor 2415 generates a rotational force by using an external power source and rotates the support plate 2411 through the rotation shaft 2414. Accordingly, the substrate S is seated on the spin head 2410, and the support plate 2411 rotates to rotate the substrate S during the first process.

The support pins 2412 protrude from the upper surface of the support plate 2411 in the third direction Z and the plurality of support pins 2412 are spaced apart from each other at predetermined intervals. The arrangement of the entire support pins 2412 when viewed from above can be in the form of an annular ring. The rear surface of the substrate S is lifted up on the support pin 2412. The substrate S is seated by the support pins 2412 at a distance where the support pins 2412 protrude from the upper surface of the support plate 2411. [

The chucking pins 2413 protrude from the upper surface of the support plate 2411 in a third direction Z longer than the support pins 2412 and extend from the center of the support plate 2411 farther than the support pins 2412 . The chucking pins 2413 can move between the fixed position and the pickup position along the radial direction of the support plate 2411. [ Here, the fixed position is a distance corresponding to the radius of the substrate S from the center of the support plate 2411, and the pickup position is a position farther from the center of the support plate 2411 than the fixed position. The chucking pin 2413 is positioned at a pickup position when the substrate S is loaded on the spin head 2410 by the transfer robot 2210 and moves to a fixed position when the substrate S is loaded, The substrate S is brought into contact with the side surface of the substrate S to fix the substrate S in the fixed position and the transfer robot 2210 picks up the substrate S and moves to the pickup position again when the substrate S is unloaded . Accordingly, the chucking pin 2413 can prevent the substrate S from being displaced from the fixed position by the rotational force when the spin head 2410 rotates.

The fluid supply member 2420 may include a nozzle 2421, a support 2422, a support shaft 2423, and a driver 2424. The fluid supply member 2420 supplies fluid to the substrate S.

The support shaft 2423 is provided along its lengthwise direction in the third direction Z and the driver 2424 is coupled to the lower end of the support shaft 2423. The driver 2424 rotates the support shaft 2423 or moves the support shaft 2423 up and down along the third direction Z. A support base 2422 is vertically coupled to the upper portion of the support shaft 2423. The nozzle 2421 is installed on the bottom surface of one end of the support table 2422. The nozzle 2421 can move between the process position and the standby position by the rotation and elevation of the support shaft 2423 by the driver 2424. Here, the process position is a position in which the nozzle 2421 is disposed at the vertical upper portion of the support plate 2411, and the standby position is the position at which the nozzle 2421 is out of the vertical upper portion of the support plate 2411.

The processing unit 2400 may be provided with one or a plurality of fluid supply members 2420. When there are a plurality of fluid supply members 2420, each fluid supply member 2420 supplies a different fluid to each other. For example, the plurality of fluid supply members 2420 may respectively supply a cleaning agent, a rinsing agent, or an organic solvent. Here, as a cleaning agent, a solution of hydrogen peroxide (H 2 O 2) solution or hydrogen peroxide solution mixed with ammonia (NH 4 OH), hydrochloric acid (HCl) or sulfuric acid (H 2 SO 4), or a hydrofluoric acid (HF) solution is used. As the organic solvent, isopropyl alcohol may be used. The organic solvent may also be ethyl glycol, 1-propanol, tetra hydraulic franc, 4-hydroxy, 4-methyl, 2-pentanone, Butanol, 2-butanol, methanol, ethanol, n-propyl alcohol, dimethylether and the like can be used. For example, the first fluid supply member 2420a injects ammonia hydrogen peroxide solution, the second fluid supply member 2420b injects pure water, and the third fluid supply member 2420c injects the isopropyl alcohol solution .

The fluid supply member 2420 may move from the standby position to the process position and supply the above described fluid to the top of the substrate S when the substrate S is placed on the spin head 2410. [ For example, a chemical process, a cleaning process, and a first drying process may be performed, respectively, as the fluid supply portion supplies a cleaning agent, a rinsing agent, and an organic solvent. During the process, the spin head 2410 is rotated by the motor 2415 so that the fluid is evenly supplied to the upper surface of the substrate S.

The recovery cylinder 2430 provides a space in which the first process is performed, and recovers the fluid used in the process. The recovery cylinder 2430 is arranged so as to surround the spin head 2410 when viewed from above, and the upper part is opened. The processing unit 2400 may be provided with one or a plurality of recovery cylinders 2430. Hereinafter, a process unit 2400 having three recovery cylinders 2430 including a first recovery tank 2430a, a second recovery tank 2430b, and a third recovery tank 2430c will be described as an example. However, the number of the collection tubes 2430 may be selected differently depending on the number of fluids to be used and the conditions of the first process.

The first recovery tank 2430a, the second recovery tank 2430b, and the third collection tank 2430c are provided in an annular ring shape surrounding the spin head 2410, respectively. Is disposed away from the center of the spin head 2410 in the order of the first recovery cylinder 2430a, the second cylinder 2430b, and the third collection cylinder 2430c. The first recovery tank 2430a surrounds the spin head 2410. The second recovery tank 2430b surrounds the first collection tank 2430a and the third collection tank 2430c surrounds the second collection tank 2430b. To be wrapped. The first return tube 2430a is provided with a first inlet 2431a by an inner space of the first recovery tube 2430a. A second inlet 2431b is provided in the second recovery tank 2430b by a space between the first recovery tank 2430a and the second recovery tank 2430b. The third inlet 2430c is provided with a third inlet 2431c by a space between the second collection container 2430b and the third collection container 2430c. A recovery line 2432 extending downward in the third direction Z is connected to the bottom surfaces of the recovery containers 2430a, 2430b, and 2430c. Each of the recovery lines 2432a, 2432b, and 2433c discharges the recovered fluid to each of the recovery cylinders 2430a, 2430b, and 2430c, and supplies the recovered fluid to an external fluid regeneration system (not shown). A fluid regeneration system (not shown) can regenerate the recovered fluid for reuse.

The elevating member 2440 includes a bracket 2441, an elevating shaft 2442, and an elevator 2443. The elevating member 2440 moves the recovery cylinder 2430 in the third direction Z. The relative height of the recovery cylinder 2430 with respect to the spin head 2410 is changed so that the inlet 2431 of one of the recovery cylinders 2430 is positioned on the horizontal plane of the substrate S placed on the spin head 2410 . The bracket 2441 is fixed to the collection box 2430 and an elevation shaft 2442 which is moved in the third direction Z by the elevator 2443 is fixed to one end of the bracket 2441. When there are a plurality of the collection bins 2430, the brackets 2441 can be coupled to the outermost collection bins 2430. The lifting member 2440 moves along the path of the transfer robot 2210 for transferring the substrate S to the recovery cylinder 2430 when the substrate S is loaded on the spin head 2410 or unloaded from the spin head 2410 The recovery cylinder 2430 can be moved downward so as not to interfere.

The lifting member 2440 is moved by the centrifugal force in accordance with the rotation of the substrate S while the fluid is supplied by the fluid supply unit and the spin head 2410 rotates and the first process proceeds, The recovery tube 2430 may be moved in the third direction Z so that the inlet 2431 of the recovery tube 2430 is positioned on the same horizontal plane as the substrate S so that the fluid can be recovered. For example, when the first process is performed by a chemical process using a cleaning agent, followed by a cleaning process using a rinsing agent, and then followed by a first drying process using an organic solvent, when the cleaning agent is supplied, The second inlet 2431b for supplying the organic solvent and the third inlet 2431c for supplying the organic solvent to the horizontal surface of the substrate S so that the first and second collecting tubes 2430a, The recovery cylinder 2430b, and the third recovery cylinder 2430c can collect the respective fluids. As described above, recovery of the used fluid is advantageous in that the environmental pollution is prevented and the expensive fluid can be recycled, thereby reducing the manufacturing cost of the semiconductor.

The elevating member 2440 may be configured to move the spin head 2410 in the third direction Z instead of moving the recovery tube 2430. [

3 is a diagram showing a phase change of carbon dioxide.

Referring to Fig. 3, supercritical fluid will be described.

A supercritical fluid means a fluid in which a substance exceeds a critical temperature and a critical pressure, i.e., reaches a critical state, and can not distinguish the liquid from the gas. Supercritical fluids have molecular densities close to liquids, but viscosity is close to gas. These supercritical fluids have high diffusion, permeability, and solubility, which are advantageous for chemical reactions and have very low surface tension, so that they do not add interfacial tension to the microstructure. Therefore, the drying efficiency of the semiconductor device is excellent, And can be usefully used.

Hereinafter, the description will be made on the basis of supercritical fluid of carbon dioxide (CO2) which is mainly used for drying the substrate (S). However, the components and kinds of the supercritical fluid are not limited thereto.

Carbon dioxide becomes supercritical when the temperature is above 31.1 ℃ and the pressure is above 7.38Mpa. Carbon dioxide is non-toxic, non-flammable, and inert. Supercritical carbon dioxide has a lower critical temperature and critical pressure than other fluids, which makes it easier to control its solubility by controlling temperature and pressure. Water and other organic solvents , It is advantageous to use in a drying process of 10 to 100 times as low as the diffusion coefficient and the surface tension is extremely small. In addition, the carbon dioxide can be recycled and used as a by-product of various chemical reactions, and the supercritical carbon dioxide used in the drying process can be recycled and used without burdening the environment.

Fig. 4 is a view showing the piping of the second process chamber of Fig. 1. Fig.

Referring to FIG. 4, the second process chamber 2500 includes a housing 2510, a heating member 2520, and a support member 2530. In the second process chamber 2500, a second process is performed. Here, the second step may be a second drying step of drying the substrate S using a supercritical fluid.

The interior of the housing 2510 is hermetically sealed from the outside and provides a space for drying the substrate S. The housing 2510 is provided with a material that can withstand high pressure. A heating member 2520 for heating the interior of the housing 2510 may be provided between the inner wall and the outer wall of the housing 2510. Of course, the position of the heating member 2520 is not limited to this, and may be installed at a different position. The support member 2530 supports the substrate S. The support member 2530 may be fixedly installed inside the housing 2510. Alternatively, the support member 2530 may be provided in a rotatable structure instead of being fixed, so that the substrate S mounted on the support member 2530 may be rotated.

Supercritical fluid supply unit 3000 produces a supercritical fluid. For example, the supercritical fluid supply unit 3000 applies pressure to the carbon dioxide at a temperature equal to or higher than the critical temperature and a pressure equal to or higher than the critical pressure, thereby making the carbon dioxide into a supercritical fluid. The supercritical fluid generated in the supercritical fluid supply unit 3000 is supplied to the housing 2510 through the supply pipe 3001.

The supply pipe 3001 includes a main pipe 3002, an upper supply pipe 3003 and a lower supply pipe 3004. One end of the main pipe 3002 is connected to the supercritical fluid supply unit 3000. A branch portion 3005 is formed at the other end of the main pipe 3002 to branch the upper supply pipe 3003 and the lower supply pipe 3004. One end of the upper supply pipe 3003 is connected to the branch portion 3005 and the other end of the upper supply pipe 3003 is connected to the upper portion of the housing 2510. One end of the lower supply pipe 3004 is connected to the branch portion 3005 and the other end of the upper supply pipe 3003 is connected to the lower portion of the housing 2510. The supply pipe 3001 is provided with supply valves 3011, 3012 and 3013. The main valve 3011 is located in the main pipe 3002. The main valve 3011 can control the opening and closing of the main pipe 3002 and the flow rate of supercritical fluid flowing through the main pipe 3002. The upper valve 3012 and the lower valve 3013 are located in the upper supply pipe 3003 and the lower supply pipe 3004, respectively. The upper valve 3012 and the lower valve 3013 can control the opening and closing of the upper supply pipe 3003 and the lower supply pipe 3004 and the flow rate of the supercritical fluid, respectively. A filter 3014 is provided between the branch portion 3005 and the main valve 4826. The filter 3014 filters foreign matter in the supercritical fluid flowing through the supply pipe 3001.

In another embodiment, the upper supply pipe 3003 or the lower supply pipe 3004 may be omitted and implemented. One end of the supply pipe 3001 may be connected to the supercritical fluid supply unit 3000 and the other end of the supply pipe 3001 may be connected to the side of the housing 2510.

The discharge pipe 4001 discharges the supercritical fluid and gas inside the housing 2510 to the outside. One end of the discharge pipe 4001 is connected to the housing 2510 and the other end of the discharge pipe 4001 is connected to the regeneration unit 4000. The discharge pipe 4001 is provided with a discharge valve 4002. The discharge valve 4002 opens and closes the discharge pipe 4001. Further, the discharge valve 4002 can regulate the flow rate of the supercritical fluid flowing through the discharge pipe 4001. The supercritical fluid discharged from the housing 2510 is accommodated in the regeneration unit 4000. An organic solvent is present on the surface of the substrate S that is carried into the housing 2510. When the second drying process is performed, the organic solvent is discharged to the discharge tube 4001 together with the supercritical fluid. The regeneration unit 4000 removes the organic solvent contained in the supercritical fluid. In one example, the supercritical fluid may be supplied to the supercritical fluid supply unit 3000 after the organic solvent has been removed, or may be transferred to a container for storing the supercritical fluid.

The gas supply source 5000 is connected to the housing 2510 by a gas supply pipe 3001 (5001). The gas supply pipe 3001 (5001) is provided with a valve 5002. The valve 5002 opens and closes the gas supply pipes 3001 and 5001. In addition, the valve 5002 can adjust the amount of the inert gas supplied to the housing 2510. The gas supply pipes 3001 and 5001 supply the inert gas to the housing 2510. The gas supply source 5000 may be a tank for storing an inert gas. The inert gas may be nitrogen (N2), helium (He), neon (Ne), or argon (Ar). The inert gas may be supplied to the housing 2510 prior to the supply of the supercritical fluid. The inert gas supplied to the interior of the housing 2510 raises the internal pressure of the housing 2510. For example, the inert gas may be supplied such that the pressure inside the housing 2510 is higher than the threshold pressure.

An exhaust pipe 5010 may be connected to the housing 2510. The inert gas may be exhausted through the exhaust pipe 5010. An exhaust valve 5011 is provided in the exhaust pipe 5010. The exhaust valve 5011 opens and closes the exhaust pipe 5010. Further, the exhaust valve 5011 can control the amount of the inert gas discharged into the exhaust pipe 5010. Supercritical fluid is supplied into the housing 2510 with the inner pressure of the housing 2510 raised by the inert gas. At the same time, the inert gas inside the housing 2510 is exhausted to the exhaust pipe 5010. The amount of the inert gas exhausted into the exhaust pipe 5010 may correspond to the amount of the supercritical fluid supplied to the supply pipe 3001. Accordingly, the internal pressure of the housing 2510 can be maintained above the critical pressure. Continuing the supply of supercritical fluid and evacuation of the inert gas for a period of time, the interior of the housing 2510 may be filled with supercritical fluid.

5 is a diagram showing the circulation of the supercritical fluid.

Referring to FIG. 5, the supercritical fluid may circulate through the supercritical fluid supply unit 3000, the second process chamber 2500, and the regeneration unit 4000.

The supercritical fluid supply unit 3000 may include a storage tank 3100, a conversion tank 3200, a first condenser 3300, a second condenser 3400, and a pump 3500.

In the storage tank 3100, carbon dioxide is stored in a liquid state. The carbon dioxide may be supplied from the outside or the regeneration unit 4000 and stored in the storage tank 3100. At this time, the carbon dioxide supplied from the outside or the regeneration unit 4000 may include gas. The first condenser 3300 converts the gaseous carbon dioxide into a liquid state and supplies it to the storage tank 3100. Since the liquid carbon dioxide is much smaller in volume than in the gas phase, a large amount of carbon dioxide can be stored in the storage tank 3100. The first condenser 3300 may be omitted.

The conversion tank 3200 converts the carbon dioxide supplied from the storage tank 3100 into a supercritical fluid and provides it to the second process chamber 2500. Further, the conversion tank 3200 may temporarily store carbon dioxide. The carbon dioxide stored in the storage tank 3100 moves to the conversion tank 3200 while the valve (not shown) provided in the line connecting the storage tank 3100 and the conversion tank 3200 is opened. Here, a second condenser 3400 and a pump 3500 may be installed in a line connecting the storage tank 3100 and the conversion tank 3200. The second condenser 3400 changes the gaseous carbon dioxide into liquid, and the pump 3500 converts the liquid carbon dioxide into a gas that is pressurized to a pressure higher than the critical pressure, and supplies it to the conversion tank 3200. The conversion tank 3200 heats the supplied carbon dioxide to a supercritical fluid at a temperature higher than the critical temperature, and sends it to the second process chamber 2500. At this time, the pressure of the carbon dioxide coming from the conversion tank 3200 may be pressurized to 100 to 150 bar. Meanwhile, in the second process chamber 2500, liquid or gaseous carbon dioxide may be required depending on the progress of the process. At this time, the conversion tank 3200 may supply liquid or gaseous carbon dioxide to the second process chamber 2500, As shown in FIG.

The reproduction unit 4000 includes a separation module 4100 and a column module 4200. [ The regeneration unit 4000 separates the organic solvent contained in the supercritical fluid discharged from the housing 2510.

The separation module 4100 cools the carbon dioxide and the organic solvent discharged from the housing 2510. During the cooling process, the organic solvent is liquefied and separated from carbon dioxide. The column module 4200 is provided with an adsorbent (not shown) that absorbs the organic solvent. Carbon dioxide passing through the separation module 4100 flows into the column module 4200. The organic solvent contained in the carbon dioxide is absorbed and separated by the adsorbent.

6 is a view showing a piping of a second process chamber according to another embodiment.

Referring to FIG. 6, the gas supply pipe 5001 and the exhaust pipe 5010 of FIG. 4 among the pipes connected to the second process chamber 2501 may be omitted. The configuration of the housing 2511, the supercritical fluid supply unit 3100 and the regeneration unit 4300 is the same as that of the second process chamber 2500 shown in Fig. Further, the reproduction unit 4300 may be omitted. At this time, the supercritical fluid discharged to the discharge pipe 4301 is discarded.

7 is a view showing a vent unit according to an embodiment of the present invention.

Referring to Fig. 7, the vent unit 6000 includes a return pipe 6200 and a waste engine 6300.

Supercritical fluid may be stored in vessel 6100. The supercritical fluid may also flow inside the vessel 6100. The first condenser 3300, the storage tank 3100, the second condenser 3400, the pump 3500 and the conversion tank 3200 included in the supercritical fluid supply unit 3000 shown in FIGS. The pipe 6100 may be a pipe. Also, the pipes connecting the supercritical fluid supply unit 3000, the housing 2510, and the regeneration unit 4000 may be the vessel 6100.

The recovery pipe 6200 connects the container 6100 and the recovery container 6500. One end of the main return pipe 6210 is connected to the recovery container 6500. The other end of the main return pipe 6210 may be branched in parallel to the first line 6220 and the second line 6230. The ends of the first line 6220 and the second line 6230 are connected to the container 6100. The first line 6220 and the second line 6230 may be connected to the container 6100 after the ends are combined. Further, the first line 6220 and the second line 6230 may be connected to the container 6100, respectively. At this time, the portions where the first line 6220 and the second line 6230 are connected to the container 6100 may be positioned adjacent to each other. The first line 6220 and the second line 6230 are provided with a first valve 6410 and a second valve 6420, respectively.

The first valve 6410 may be set to open when the supercritical fluid of the vessel 6100 reaches a certain temperature or a constant pressure. When the temperature or pressure of the supercritical fluid in the vessel 6100 becomes higher than the set value, the supercritical fluid is discharged through the recovery pipe 6200. Therefore, the temperature or pressure of the container 6100 is prevented from becoming higher than the set value. Further, the first valve 6410 may be provided to be opened when the power supplied to the substrate processing apparatus 100 is shut off. If the substrate processing apparatus 100 is not supplied with power, the state of the supercritical fluid contained in the vessel 6100 is not controlled and the temperature or pressure of the vessel 6100 can be raised. The supercritical fluid whose state is not controlled is discharged through the first line 6220 to prevent the pressure or the temperature of the vessel 6100 from rising in a state in which the supply of power is cut off. For convenience of control, the first valve 6410 can be opened and closed using a gas.

The second valve 6420 opens and closes the second line 6230. In addition, the second valve 6420 can regulate the amount of supercritical fluid flowing through the second line 6230. The second valve 6420 may be provided for manually opening and closing the operator. Also, the second valve 6420 may be connected to a control unit (not shown) so that the second valve 6420 can be opened and closed. In the process of using the substrate processing apparatus 100, the container 6100 is required to be maintained or repaired. Maintenance or repair of the vessel 6100 is performed after the supercritical fluid contained in the vessel 6100 is discharged through the second line 6230. The valves 6410 and 6420 provided in the recovery pipe 6200 may be provided in a diaphragm type. When the valves 6410 and 6420 are provided in a diaphragm type, the foreign substances do not flow into the supercritical fluid flowing through the valves 6410 and 6420, or the amount of the foreign substances to be introduced is reduced. The first valve 6410 or the second valve 6420 may be connected to the first line 6220 and the second line 6230 in a cleaning fitting manner, respectively. For example, the first valve 6410 or the second valve 6420 may be connected to the first line 6220 and the second line 6230 in a METAL SEAL FITTING fashion. Therefore, when the supercritical fluid passes through the first valve 6410 or the second valve 6420, the foreign matter does not flow into the supercritical fluid at the junction of the valve, or the amount of the inflow is reduced. The supercritical fluid collected in the recovery vessel 6500 can be reused. The supercritical fluid can be immediately reused if the amount of foreign substances contained in the supercritical fluid collected in the recovery container 6500 is less than a certain amount. For example, the recovery vessel 6500 may be connected to a supercritical fluid supply unit 3000 by piping (not shown) to supply a supercritical fluid with a supercritical fluid supply. Further, if the amount of foreign matter contained in the supercritical fluid is more than a certain amount, the supercritical fluid can be reused after filtering the foreign matter. For example, the recovery container 6500 can be connected to a foreign matter separation device (not shown) by piping. In addition, the recovery container 6500 may be provided as an apparatus capable of separating foreign substances contained in the supercritical fluid contained therein.

One end of the waste organ 6300 is connected to the container 6100. For example, the waste engine 6300 may be directly connected to the vessel 6100. Also, the waste engine 6300 may be coupled to the vessel 6100 after being combined with the first line 6220 or the second line 6230. At this time, the waste engine 6300 is merged with the first line 6220 or the second line 6230 on the opposite side of the main return pipe 6210 with respect to the first valve 6410 or the second valve 6420. The other end of the waste engine 6300 may be provided to discharge supercritical fluid into the atmosphere or may be connected to a waste tank (not shown) to temporarily store the supercritical fluid to be discarded.

8 is a cross-sectional view of the safety valve.

Referring to Figs. 7 and 8, the safety valve 6430 includes a valve housing 6431, an elastic member 6434, and a piston 6435. Fig. The waste engine 6300 is provided with a safety valve 6430. [ The safety valve 6430 is provided to automatically open when the pressure of the container 6100 is equal to or higher than a predetermined pressure.

The valve housing 6431 forms the appearance of the safety valve 6430. The valve housing 6431 is provided with an inlet 6431a and an outlet 6431b. The inlet 6431a and the outlet 6431b are connected to the waste engine 6300, respectively. The valve housing 6431 is provided with a cylinder 6431c on the side opposite to the inlet 6431a. The elastic member 6434 is located in the cylinder 6431c.

The piston 6435 includes a pressure plate 6435a and a rod 6435b. The pressure plate 6435a is positioned in the cylinder 6431c so as to be positioned in the first sealing portion 6432 and the elastic member 6434. [ The valve housing 6431 may be provided with sealing portions 6432 and 6433 for preventing the supercritical fluid from leaking between the piston 6435 and the valve housing 6431. For example, a first sealing portion 6432 is formed on the front side of the cylinder 6431c so as to have a smaller sectional area than the cylinder 6431c. In front of the inlet 6431a, a stepped portion having a smaller sectional area than the inlet 6431a Two sealing portions 6433 may be formed. The rod 6435b extends from one surface of the pressure plate 6435a and is positioned at the first sealing portion 6432 and the second sealing portion 6433. [ The inner walls of the valve housing 6431 may be provided with packings 6432a and 6433a for preventing the supercritical fluid from leaking between the valve housing 6431 and the piston 6435. [ For example, the first sealing portion 6432 and the second sealing portion 6433 may be provided with a first packing 6432a and a second packing 6433a, respectively. The material of the first packing 6432a or the second packing 6433a is rubber. For example, the first packing 6432a or the second packing 6433a may be formed of a material including a viton. The first packing 6432a and the second packing 6433a prevent the supercritical fluid from leaking between the rod 6435b and the first sealing portion 6432 and the second sealing portion 6433, respectively.

9 is a view showing a state in which the safety valve is opened.

Referring to Fig. 9, the process of opening the safety valve 6430 will be described.

The pressure of the supercritical fluid acts on the end of the rod 6435b. When the pressure acting on the rod 6435b is larger than the force acting on the pressure plate 6435a in the elastic member 6434, the piston 6435 moves toward the cylinder 6431c and the safety valve 6430 is opened so that the supercritical fluid And flows from the inlet 6431a to the outlet 6431b. The flowing supercritical fluid is in contact with the second packing 6433a. The second packing 6433a is decomposed during contact with the supercritical fluid to contaminate the supercritical fluid. Further, in the process of reciprocating the piston 6435, foreign matter is generated in the elastic member 6434, the first packing 6432a, and the second packing 6433a. Also, a part of the supercritical fluid may be introduced into the first sealing portion 6432 or the cylinder to decompose the first packing 6432a or the elastic member 6434, and foreign matter may be generated. This foreign substance contaminates the supercritical fluid passing through the safety valve 6430. Thus, the supercritical fluid past the safety valve 6430 contains a greater amount of contaminants than the supercritical fluid entering the recovery vessel 6500 via the recovery tube 6200.

A filter 6301 is provided in the waste engine 6300 between the container 6100 and the safety valve 6430. The supercritical fluid at the inlet 6431a side may flow into the vessel 6100 side. The supercritical fluid at the inlet 6431a side contains foreign matter by the first packing 6432a, the second packing 6433a or the elastic member 6434. [ Therefore, the filter 6301 filters foreign substances contained in the supercritical fluid flowing into the vessel 6100 from the inlet 6431a side, thereby preventing the supercritical fluid in the vessel 6100 from being contaminated with the foreign matter.

10 is a sectional view of a portion where a safety valve and a waste engine are connected.

Referring to FIG. 10, the filter 6301 may be provided in a gasket type.

The filter 6301 includes a gasket portion 6302 and a filter portion 6303. The gasket portion 6302 is provided in the form of a tube corresponding to the end portion of the safety valve 6430 and the waste engine 6300. For example, when the end portions of the safety valve 6430 and the waste engine 6300 are provided in a circular shape, the gasket portion 6302 is provided in a ring shape. The filter portion 6303 extends from the side surface of the gasket portion 6302. The filter portion 6303 may be formed on one side or both sides of the gasket portion 6302. The filter portion 6303 is inserted and fixed to the waste engine 6300 or the safety valve 6430.

The safety valve 6430 in which the filter 6301 is inserted and the waste engine 6300 are fixed by the engaging member 6305. The engaging member 6305 includes a first engaging portion 6306 and a second engaging portion 6307. The first engagement portion 6306 is provided in a ring shape corresponding to the outer circumferential surface of the safety valve 6430. [ The second engaging portion 6307 is formed to extend from the side surface of the first engaging portion 6306. A thread 6308 is formed on the inner peripheral surface of the second engaging portion 6307. A first protrusion 6436 and a second protrusion 6305 protruding in the radial direction are formed on the outer circumferential surface of the safety valve 6430 and the outer circumferential surface of the closed tube 6300, respectively. A thread 6306 is formed on the outer circumferential surface of the second projection 6305. The first engaging portion 6306 is fixed to the side surface of the first projection 6436. The second engaging portion 6307 and the second protruding portion 6305 are engaged with and fixed to the threads 6305 and 6308, respectively. In another embodiment, a thread may be formed in the first projection 6436. The first engaging portion 6306 is fixed to the side surface of the second projection 6305 and the screw thread 6308 formed on the second engaging portion 6307 can be engaged and fixed with the thread formed on the first projection 6436.

11 is a view showing a state in which a vent unit is connected.

Referring to FIG. 11, the substrate processing apparatus 100 may be provided with a plurality of vent units 6000a and 6000b.

The first vent unit 6000a and the second vent unit 6000b are connected to the first container 6100a and the second container 6100b, respectively. The first vessel 6100a and the second vessel 6100b are connected to the first condenser 3300, the storage tank 3100, the second condenser 3400, the pump 3500, and the first condenser 3300 included in the supercritical fluid supply unit 3000, The conversion tank 3200 and a pipe connecting them. Also, the first vessel 6100a and the second vessel 6100b may be one of the pipes connecting the supercritical fluid supply unit 3000, the valve housing 6431, and the regeneration unit 4000. The return pipe 6300a included in the first vent unit 6000a and the return pipe 6300b and the waste pipe 6300b included in the waste pipe 6300a and the second pipe unit 6000b are respectively connected to the vent unit (6000). The main return pipes 6210a and 6210b included in the first vent unit 6000a and the second vent unit 6000b and the first lines 6220a and 6220b and the second lines 6230a and 6230b, The configurations of the valves 6410a and 6410b, the second valves 6420a and 6420b and the third bows 6430a and 6430b are the same as those of the vent unit 6000 of Fig.

The first valve 6410a of the first vent unit 6000a and the first valve 6410b of the second vent unit 6000b may be provided with the same or different temperature or pressure to be opened respectively. In addition, the safety valve 6430a of the first vent unit 6000a and the safety valve 6430b of the second vent unit 6000b may be provided with the same or different opening pressures, respectively.

The return pipe 6200a of the first vent unit 6000a and the return pipe 6200b of the second vent unit 6000b may be connected to the collection container 6501 or may be connected to the collection container 6501 after they are combined with each other . The closed tube 6300a of the first vent unit 6000a and the closed tube 6300b of the second vent unit 6000b are combined with each other and then can discharge the supercritical gas into the atmosphere or be connected to the waste tank. In addition, the closed tube 6300a of the first vent unit 6000a and the closed tube 6300b of the second vent unit 6000b may be connected to the waste tank or exhaust the supercritical gas into the atmosphere, respectively.

The foregoing detailed description is illustrative of the present invention. In addition, the foregoing is intended to illustrate and explain the preferred embodiments of the present invention, and the present invention may be used in various other combinations, modifications, and environments. That is, it is possible to make changes or modifications within the scope of the concept of the invention disclosed in this specification, within the scope of the disclosure, and / or within the skill and knowledge of the art. The embodiments described herein are intended to illustrate the best mode for implementing the technical idea of the present invention and various modifications required for specific applications and uses of the present invention are also possible. Accordingly, the detailed description of the invention is not intended to limit the invention to the disclosed embodiments. It is also to be understood that the appended claims are intended to cover such other embodiments.

1000: index module 1100: load port
1200: transfer frame 2000: process module
2100: buffer chamber 2200: transfer chamber
2300: first process chamber 2500: second process chamber
3000: supercritical fluid supply unit 4000: regeneration unit
5000: Gas source 6000: Vent unit
6200: Recovery pipe 6210: Main recovery pipe
6220: first line 6230: second line

Claims (13)

Piping providing a space in which the supercritical fluid flows or is accommodated;
A return pipe, one end of which is connected to the pipe to discharge the supercritical fluid inside the pipe and to which a valve is provided; And
And a safety valve connected to the pipeline to discharge the supercritical fluid inside the pipeline and automatically open when the pressure of the pipeline exceeds a set pressure,
The recovery pipe
A main recovery pipe connected to the recovery container, the supercritical fluid once discharged from the pipe being accommodated for reuse;
And a first line and a second line branched in parallel at the other end of the main return pipe and connected to the pipes, respectively,
Wherein the valve comprises:
A first valve located in the first line and open when the temperature or pressure of the supercritical fluid on the line becomes higher than a set point;
And a second valve located in the second line and manually opened and closed. The method according to claim 1,
Wherein the valve provided to the return pipe and the safety valve provided to the waste engine are different from each other. 3. The method according to claim 1 or 2,
The safety valve includes:
A valve housing connected to the waste engine and forming an inlet through which the supercritical fluid flows and an outlet through which the supercritical fluid flows out;
An elastic member positioned in a cylinder formed in the valve housing; And
And a piston positioned between the elastic member and the inlet and opening and closing the safety valve while being moved by the pressure of the elastic member and the supercritical fluid. The method of claim 3,
Wherein the inner wall of the valve housing is provided with a packing for preventing the supercritical fluid from leaking between the piston and the inner wall of the valve housing. 5. The method of claim 4,
Wherein the packing is formed including a via. 3. The method according to claim 1 or 2,
Wherein the valve provided in the return pipe is a diaphragm type. The method according to claim 1,
Wherein the recovery container separates foreign matter from the supercritical fluid contained therein. The method according to claim 1,
Wherein the recovery container is connected to a supercritical fluid supply unit that supplies the supercritical fluid to a housing that provides a space in which the substrate is processed. delete delete The method according to claim 1,
Wherein the container is a housing that provides a space in which the substrate is processed. The method according to claim 1,
Wherein the container is a supercritical fluid supply unit that supplies the supercritical fluid to a housing that provides a space in which the substrate is processed. The method according to claim 1,
Wherein the container is a pipe connecting a housing providing a space in which the substrate is processed and a supercritical fluid supply unit supplying the supercritical fluid to the housing.

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