KR101488661B1 - High frequency heating apparatus - Google Patents

Abstract

The present invention relates to a high-frequency heating apparatus, and more particularly to a high-frequency heating apparatus for heating a substrate by high-frequency heating.
To this end, the present invention is a high-frequency heating apparatus including a plurality of high-frequency generators for high-frequency heating a substrate, wherein the plurality of high-frequency generators are arranged with intervals of (n / 2) (Where n = 1 to 12 and? Is the wavelength of the high frequency generated by the high frequency generator).

Description

[0001] HIGH FREQUENCY HEATING APPARATUS [0002]

The present invention relates to a high-frequency heating apparatus, and more particularly to a high-frequency heating apparatus for heating a substrate by high-frequency heating.

The glass material may be a flat panel display such as a solar cell cover, a thin film transistor-liquid crystal display (TFT-LCD), a plasma display panel, an organic electro luminescent The use of such materials has been rapidly increasing in various industrial fields such as a cover of a device, and accordingly, the weight and thickness of the glass material have been demanded.

However, due to the large brittleness characteristic of the glass material, it is difficult to secure the stability of the glass due to its weight reduction and thinness. Accordingly, various strengthening methods have been studied to secure the stability of the glass.

Conventional glass reinforcing technologies include chemical strengthening techniques by ion exchange between glass surface and aqueous solution (molten salt) and heat strengthening techniques through heat treatment of glass.

Chemical strengthening is disadvantageous in terms of process time required for ion exchange between glass and aqueous solution, glass size, and recycling of the aqueous solution (contamination and concentration control).

On the other hand, heat strengthening is performed by moving the glass plate in a horizontal direction at a high temperature and then tempering and quenching the glass to strengthen the glass. The heat strengthening using the double high frequency can increase the heat treatment effect by volumetric heating, Various efforts have been made to apply the present invention to the < RTI ID = 0.0 >

However, when a large-sized plate glass is heat-treated by applying a conventional high-frequency technique, it is difficult to control the electric field distribution inside the chamber by using a single high-frequency generator, and the rate of temperature rise is low. However, there is a problem that the local heating phenomenon of the glass occurs due to the electric field concentration due to mutual interference between the high frequency generators and the heating efficiency is lowered.

FIG. 1 is a photograph of an electric field distribution (a) and a temperature distribution (b) of a plate glass after heat treatment of a plate glass by a conventional high frequency heating apparatus provided with a plurality of high frequency generators. 1 (a) represents a portion where the electric field is not formed, the blue region of FIG. 1 (b) represents a low temperature, and the red region represents a high temperature. That is, it can be seen that the edge region of the heat-treated plate glass is not heated because an electric field is not formed, and a hot spot is formed in the local region of the plate glass by concentrated heating due to interference.

That is, there is a problem that the heating rate is low in the case of high-frequency heating using a single high-frequency generator. In the case of high-frequency heating using a plurality of high-frequency generators, the heating rate is partially improved, but the mutual interference between high- There is a problem that a local heating phenomenon occurs due to the heating.

Open Utility Model Publication No. 20-2000-0010234 (June 15, 2000)

SUMMARY OF THE INVENTION It is an object of the present invention to provide a high frequency heating apparatus capable of rapid heating of a substrate and suppressing local heating phenomenon.

To this end, the present invention is a high-frequency heating apparatus including a plurality of high-frequency generators for high-frequency heating a substrate, wherein the plurality of high-frequency generators are arranged with intervals of (n / 2) (Where n = 1 to 12 and? Is the wavelength of the high frequency generated by the high frequency generator).

The high frequency heating apparatus may further include a reflector for reflecting the high frequency generated by the high frequency generator to the substrate.

The reflector may include a first reflector that separates the high frequency generator from the first reflector.

The reflector may include a second reflector disposed on at least one of left and right sides of the high frequency generator.

The reflective portion may include a third reflective portion disposed on at least one of an upper portion and a lower portion of the substrate, and the third reflective portion may be formed such that the principal plane thereof faces the main plane of the substrate.

In addition, a plurality of holes may be formed in the reflective portion.

According to the present invention, the heating rate of the substrate and the energy efficiency of the high-frequency heating apparatus can be improved.

Further, by suppressing the interference between the high-frequency waves generated by the respective high-frequency generators by reflecting the high-frequency waves by the reflection portion, it is possible to prevent the local heating phenomenon of the substrate due to field concentration and improve the high-frequency heating efficiency.

In addition, a uniform electric field is formed over the entire area of the substrate, and the substrate can be uniformly heated over the entire area.

FIG. 1 is a photograph of an electric field distribution (a) and a temperature distribution (b) of a plate glass after heat treatment of a plate glass by a conventional high frequency high frequency heating apparatus provided with a plurality of high frequency generators.
2 is a schematic plan view (a) and a side view (b) of a high-frequency heating apparatus according to an embodiment of the present invention;
3 is a schematic plan view (a) and a side view (b) of a high-frequency heating apparatus according to another embodiment of the present invention.
4 is a schematic plan view of a high frequency heating apparatus according to another embodiment of the present invention.
5 is a schematic side view of a high frequency heating apparatus according to another embodiment of the present invention.
FIG. 6 is a schematic structural view of a reflection portion according to an embodiment of the present invention; FIG.
FIG. 7 is a photograph (a) of the electric field distribution analysis and a photograph (b) of the temperature distribution analysis after heating the glass by the high frequency heating apparatus according to the embodiment of the present invention.
8 is a graph showing the surface temperature of a plate glass after the plate glass is conveyed to the high-frequency heating apparatus according to an embodiment of the present invention.

Hereinafter, a high frequency heating apparatus according to an embodiment of the present invention will be described in detail with reference to the accompanying drawings.

In the following description of the present invention, detailed description of known functions and configurations incorporated herein will be omitted when it may make the subject matter of the present invention rather unclear.

In the following description, the forward and backward direction is defined as the transport direction of the substrate, and the horizontal direction is defined as the direction transverse to the transport direction of the substrate.

2 is a schematic plan view (a) and a side view (b) of a high-frequency heating apparatus according to an embodiment of the present invention.

2, a high frequency heating apparatus according to the present invention includes a high frequency generator 200 and a substrate 100, wherein the interval between the high frequency generator 200 and the substrate 100 is (n / 2) *? (Where n = 1 to 6, The wavelength of the high-frequency wave to be generated).

The high frequency generator 200 generates a high frequency to heat the substrate 100 by vibrating the ions inside the substrate. The high frequency generator 200 may generate a high frequency of 0.98 GHz to 6.0 GHz, and preferably generate a high frequency of 2.4 GHz or 5.8 GHz.

The substrate 100 is a substrate heated by the high frequency generator 200, and may be a plate glass of various thicknesses.

The interval (1) between the high frequency generator 200 and the substrate 100 is (n / 2) *? (N = 1 to 6), and preferably the interval of?.

In addition, the high frequency heating apparatus according to the present invention may include a plurality of high frequency generators 200 for heating the substrate 100 at high temperature and rapid heating.

At this time, each of the high frequency generators 210, 220 and 230 is arranged to have an interval (2) of (n / 2) *? (N = 1 to 12), preferably with a spacing of 2?.

Here, the plurality of high frequency generators 210, 220, and 230 may be arranged in a line along the longitudinal direction.

By controlling the interval between the high frequency generator 200 and the substrate 100 and / or the interval between the high frequency generators 210, 220 and 230, the high frequency heating efficiency of the substrate by the high frequency heating apparatus can be improved . In addition, when there are a plurality of high-frequency generators, it is possible to suppress the local heating phenomenon of the substrate due to field concentration by suppressing interference between high-frequency waves generated in the respective high-frequency generators.

FIG. 3 is a schematic plan view (a) and a side view (b) of a high frequency heating apparatus according to another embodiment of the present invention, and FIG. 4 is a schematic plan view of a high frequency heating apparatus according to another embodiment of the present invention.

3 and 4, the high frequency heating apparatus according to the present invention may further include a reflector 300 for reflecting the high frequency generated from the high frequency generator to the substrate.

Here, the reflector 300 may be formed of a conductive metal capable of reflecting a high frequency.

The reflector 300 may be installed to surround the high frequency generator in the front, rear, left, and right directions, and may be installed on the upper and lower portions of the substrate 100, respectively. By providing the reflecting portion 300 in this manner, the high frequency generated from the high frequency generator 200 can be reflected more efficiently.

The reflection unit 300 reflects the high frequency generated from the high frequency generator 200 to the substrate 100 and multiple scattering the high frequency so that a uniform electric field is formed over the entire area of the substrate 100 And can be uniformly heated over the entire region including the edge of the substrate 100. Further, the temperature raising rate of the substrate 100 is improved, and the energy efficiency of the high-frequency heating apparatus is improved.

In addition, when the high frequency generator according to the present invention includes a plurality of high frequency generators, the reflector 300 may divide the plurality of high frequency generators 210, 220 and 230 into at least one.

The reflector 300 may include first reflectors 311 and 312 that separate the high frequency generators 210, 220, and 230 from each other.

Here, the first reflectors 311 and 312 may partition the high frequency generator spaced apart from each other in the front-rear direction, and the first reflectors 311 and 312 may extend in the left-right direction.

In this case, the interval between the high frequency generators 210, 220, and 230 and the first reflectors 311 and 312 (i.e., the interval between the high frequency generators 210, 220, and 230) 3) is preferably (n / 2) *? (Where 1 = 12 and? Is the wavelength of the high frequency generated by the high frequency generator), more preferably 2?

The interval (5) between the substrate 100 and the first reflecting portions 311 and 312 may be 4 cm or less, preferably 2 cm.

When the high frequency generators 240, 250 and 260 are arranged in a plurality of rows, the first reflectors 311 and 312 can partition the rows of the high frequency generators 240, 250 and 260, (240, 250, 260) may be formed along the left-right direction.

The first reflectors 311 and 312 formed between the respective rows of the high-frequency generators 240, 250, and 260 prevent mutual interference of the high-frequency waves generated in the respective columns, thereby preventing the electric field from being concentrated Thereby suppressing the phenomenon that the substrate 100 is locally heated.

The reflector 300 according to the present invention may include second reflectors 321 and 322 disposed on at least one of left and right sides of the high frequency generator 200.

When the high frequency heating apparatus according to the present invention includes a plurality of high frequency generators 240, 250 and 260 arranged in at least one row, the second reflectors 321 and 322 are disposed on the left and right sides of the row of the high frequency generator, It can be installed in at least one place.

The second reflectors 321 and 322 may extend along the front-rear direction.

In order to efficiently reflect the high frequency generated by the high frequency generator 200, the interval (4) between the high frequency generator and the second reflectors 321 and 322 is preferably 2λ or less.

5, the reflector 300 according to the present invention includes a third reflector 331 disposed on at least one of the upper and lower sides of the substrate 100 to reflect the high-frequency waves more efficiently At this time, the third reflecting portion 331 may be formed such that its principal plane is opposite to the main plane of the substrate 100.

Here, the interval (6) between the third reflecting portion 331 and the substrate may be (n / 2) *? (N = 1 to 6), preferably?.

6, a plurality of holes may be formed in the reflector 300 according to the present invention to facilitate air convection to improve the heating efficiency. The diameter of the hole may be 3 mm or less, preferably 2 mm, in order to prevent high frequency waves from being reflected off the outside of the reflector through the hole without being reflected.

7 is a graph (a) of electric field distribution and a graph (b) of temperature distribution analysis after heating the glass by a high-frequency heating apparatus having two high-frequency generators and a reflector according to an embodiment of the present invention. As shown in Fig. 7, even when the glass is heated by the high-frequency heating apparatus provided with two high-frequency generators, the reflection unit blocks the interference of the high-frequency waves between the respective rows, thereby achieving the same electric field distribution as that of the high- And heating the substrate homogeneously.

8 is a graph showing the surface temperature of a plate glass after carrying a plate glass having a width of 1600 mm heated to 650 DEG C by a high frequency heating apparatus having a plurality of high frequency generators and a reflector.

As shown in FIG. 8, it can be seen that the surface temperature of the plate glass heated by the high-frequency heating apparatus according to the present invention is extremely uniformly heated to 700 ° C ± 10 ° C.

Further, the high frequency heating apparatus according to the present invention may further include a heater (not shown) in addition to the high frequency generator for heating the substrate.

The heater heats the substrate from the outside to the inside of the substrate through the heat due to the electric resistance and the high frequency generator vibrates the substrate ions by the high frequency to heat the entire inside and outside of the substrate by the frictional heat generated thereby, Can be heated.

While the invention has been shown and described with reference to certain preferred embodiments thereof, it will be understood by those of ordinary skill in the art that various changes in form and details may be made therein without departing from the spirit and scope of the invention as defined by the appended claims. This is possible.

Therefore, the scope of the present invention should not be limited by the described embodiments, but should be determined by the scope of the appended claims as well as the appended claims.

100: substrate
200, 210, 220, 230, 240, 250, 260: a high frequency generator
300:
311, 312: first reflector 321, 322: second reflector
331:

Claims (18)

A high-frequency heating apparatus comprising a plurality of high-frequency generators for high-frequency heating a substrate,
Wherein the plurality of high frequency generators are arranged at intervals of (n / 2) * [lambda]
And a reflector for reflecting the high frequency generated by the high frequency generator to the substrate,
And a plurality of holes are formed in the reflecting portion.
(Where n = 1 to 12, and? Is a wavelength of a high frequency generated by the high frequency generator)
delete The method according to claim 1,
Wherein the reflector divides the plurality of high-frequency generators by at least one.
The method of claim 3,
Wherein the reflector includes a first reflector that separates high frequency generators spaced apart from each other.
5. The method of claim 4,
Wherein the first reflector partitions between high frequency generators spaced apart from each other in the front-rear direction.
(Wherein the forward and backward directions are the transport direction of the substrate)
5. The method of claim 4,
Wherein the plurality of high frequency generators are arranged in a plurality of rows,
And the first reflector partitions between the rows of the high frequency generator.
5. The method of claim 4,
And the interval between the high frequency generator and the first reflecting portion is (n / 2) *?.
(Where n = 1 to 12, and? Is the wavelength of the high frequency generated by the high frequency generator)
5. The method of claim 4,
Wherein a distance between the substrate and the first reflecting portion is 4 cm or less.
The method according to claim 1,
Wherein the reflector includes a second reflector disposed on at least one of left and right sides of the high frequency generator.
(Wherein the left-right direction is a direction crossing the carrying direction of the substrate)
10. The method of claim 9,
And the interval between the high frequency generator and the second reflecting portion is 2? Or less.
(Where? Is the wavelength of the high frequency generated by the high frequency generator)
The method of claim 3,
Wherein the plurality of high frequency generators are arranged in at least one row,
And the reflector includes a second reflector disposed on at least one of left and right sides of the row of the high frequency generator.
12. The method of claim 11,
And the interval between the high frequency generator and the second reflecting portion is 2? Or less.
(Where? Is the wavelength of the high frequency generated by the high frequency generator)
The method according to claim 1,
Wherein the reflector includes a third reflector provided at least one of an upper portion and a lower portion of the substrate, and the third reflector is formed such that a main plane of the third reflector faces the main plane of the substrate.
14. The method of claim 13,
Wherein an interval between the third reflecting portion and the substrate is (n / 2) *?.
(Where n = 1 to 6, and? Is the wavelength of the high frequency generated by the high frequency generator)
The method according to claim 1,
Wherein the reflector is installed so as to surround the high frequency generator in front, rear, left and right.
(Wherein the forward and backward directions are the conveying direction of the substrate, and the lateral direction is a direction crossing the conveying direction of the substrate)
The method according to claim 1,
Wherein the reflector is installed on the upper and lower sides of the substrate relative to each other.
delete The method according to claim 1,
And the diameter of the hole is 3 mm or less.

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