KR101397110B1 - Organic light emitting display device and manufacturing method thereof - Google Patents

Abstract

The present invention provides a semiconductor device comprising: a substrate; A plurality of pixels formed on the substrate and having a first region that emits light and a second region that transmits external light; A plurality of pixel circuit portions disposed in a first region of each pixel and each including at least one thin film transistor; A plurality of first electrodes arranged in a first region of each of the pixels and electrically connected to the pixel circuit portions and patterned in an island shape so as to be separated from each other; A first organic film patterned to cover at least the first electrode; A plurality of second organic layers formed on the first organic layer and patterned to correspond to at least the first electrode and including a light emitting layer; A third organic film formed on the second organic film so as to cover at least the second organic film; A first auxiliary layer formed on the third organic layer and including a first portion patterned to correspond to at least the first electrode; And a second electrode patterned to correspond to the first portion on the first auxiliary layer; And the second electrode can be patterned without a fine metal mask.

Description

[0001] The present invention relates to an organic light emitting display device and a manufacturing method thereof,

BACKGROUND OF THE INVENTION 1. Field of the Invention [0002] The present invention relates to an organic light emitting display and a method of manufacturing the same, and more particularly, to a transparent organic light emitting display and a method of manufacturing the same.

Since the organic light emitting display has excellent characteristics in terms of viewing angle, contrast, response speed, power consumption, and the like, the range of applications from personal portable devices such as MP3 players and cellular phones to televisions is expanding. There is an attempt to make a display device transparent by forming a transparent portion in an area other than the area where the thin film transistor or the organic light emitting element is provided in the organic light emitting display device. In this case, a fine metal mask is used for cathode deposition in order to pattern the cathode formed using opaque metal so as not to be formed in the transmissive portion.

However, due to the process of depositing the cathode while transferring the fine metal masks a number of times, an error occurs in the formation position of the transmissive portion, and there are many problems such as deforming the shape of the transmissive portion.

An object of the present invention is to provide a transparent organic light-emitting display device having high transparency of external light and a manufacturing method thereof.

An object of the present invention is to provide an OLED display device capable of patterning a cathode by a simple method and a manufacturing method thereof.

According to an aspect of the present invention, A plurality of pixels formed on the substrate and having a first region that emits light and a second region that transmits external light; A plurality of pixel circuit portions disposed in a first region of each pixel and each including at least one thin film transistor; A plurality of first electrodes arranged in a first region of each of the pixels and electrically connected to the pixel circuit portions and patterned in an island shape so as to be separated from each other; A first organic film formed to cover at least the first electrode; A plurality of second organic layers formed on the first organic layer and patterned to correspond to at least the first electrode and including a light emitting layer; A third organic film formed on the second organic film so as to cover at least the second organic film; A first auxiliary layer formed on the third organic layer and including a first portion patterned to correspond to at least the first electrode; And a second electrode patterned to correspond to the first portion on the first auxiliary layer; And an organic light emitting display device.

4, the first auxiliary layer includes a second portion connected to the first portion, and the second portion is located in the second region without the first organic film.

4, a second auxiliary layer patterned to correspond to the second portion on the first auxiliary layer; .

Here, with reference to FIGS. 5 and 6, the third organic film is disposed in both the first region and the second region.

5, wherein the first sub-layer comprises a second portion connected to the first portion and the second portion is located on the first organic film of the second region.

A second auxiliary layer patterned on the first auxiliary layer, patterned to correspond to the second portion of the first auxiliary layer, with reference to Figure 5; .

9, a second electrode is further disposed on the second auxiliary layer, and a second electrode disposed on the second auxiliary layer corresponds to the first portion of the first auxiliary layer And the second electrode is thinner than the patterned second electrode.

7, the first organic film is disposed in both the first region and the second region.

The first organic layer may include at least one of a hole transport layer and a hole injection layer.

Wherein the third organic layer includes at least one of an electron transport layer and an electron injection layer.

Wherein the pixel circuit portion is superimposed on the first electrode.

Wherein the first region of each pixel includes a light emitting region and a circuit region, the pixel circuit portion is disposed in the circuit region, and the first electrode is disposed in the light emitting region.

Wherein the light emitting region and the circuit region of each pixel are disposed adjacent to each other.

An insulating layer covering an edge of the first electrode and interposed between an edge of the first electrode and the first organic layer; Further comprising:

Wherein the second electrode comprises magnesium.

9 and 10, the second electrode is further disposed in the second region, and the second electrode disposed in the second region corresponds to the first portion of the first auxiliary layer And the second electrode is thinner than the patterned second electrode.

According to another aspect of the present invention, there is provided a method of manufacturing a semiconductor device, comprising: dividing a plurality of pixels on a substrate, the plurality of pixels having a first region to emit light and a second region to transmit external light; Forming a plurality of pixel circuit portions each including at least one thin film transistor in a first region of each pixel; Forming a plurality of first electrodes patterned in an island shape so as to be separated from each other in each pixel by being electrically connected to the pixel circuit portions in a first region of each of the pixels; Forming a first organic film to cover at least the first electrode; Forming a plurality of second organic films patterned to correspond to at least the first electrodes and including a light emitting layer on the first organic film; Forming a third organic film on the second organic film so as to cover at least the second organic film; Forming a first auxiliary layer on the third organic layer, the first auxiliary layer including a first portion patterned to correspond to at least the first electrode; Depositing a metal on the first and second regions to form a second electrode patterned on the first auxiliary layer to correspond to the first portion; And a method of manufacturing the organic light emitting display device.

Wherein the step of forming the first auxiliary layer includes the step of forming the first auxiliary layer such that the first auxiliary layer includes a second portion connected to the first portion and the second portion is disposed in the second region, 1 auxiliary layer; to be.

Forming a second auxiliary layer patterned on the first auxiliary layer to correspond to the second portion, between the step of forming the first auxiliary layer and the step of forming the second electrode; .

Wherein the third organic film is formed so as to be disposed in both the first region and the second region.

Wherein the first organic film is formed so as to be disposed in both the first region and the second region.

Wherein the first auxiliary layer comprises a second portion connected to the first portion and the second portion is formed on the first organic film of the second region.

Wherein a second auxiliary layer patterned to correspond to the second portion of the first auxiliary layer is formed on the first auxiliary layer between the step of forming the first auxiliary layer and the step of forming the second electrode ; .

Wherein the metal comprises magnesium.

The first organic layer may include at least one of a hole transport layer and a hole injection layer.

Wherein the third organic layer includes at least one of an electron transport layer and an electron injection layer.

Wherein the pixel circuit portion is superimposed on the first electrode.

Wherein the first region of each pixel includes a light emitting region and a circuit region, the pixel circuit portion is disposed in the circuit region, and the first electrode is disposed in the light emitting region.

Wherein the light emitting region and the circuit region of each pixel are disposed adjacent to each other.

Forming an insulating film between the edge of the first electrode and the first organic film to cover the edge of the first electrode between the forming of the first electrode and the forming of the first organic film .

Other aspects, features, and advantages will become apparent from the following drawings, claims, and detailed description of the invention.

According to the present invention as described above, it is possible to reduce the transmittance degradation in the region where the external light is transmitted as much as possible, so that the user can more easily observe the external image.

Further, since the second electrode is formed without using a fine metal mask, a problem that the position and shape of the transparent portion is distorted when using the fine metal mask is solved. Above all, the second electrode can be effectively patterned to provide an extremely excellent process environment.

1 is a cross-sectional view of a first pixel P1 and a second pixel P2, which are two adjacent pixels of the organic light emitting diode display of the present invention,
FIG. 2 is a plan view showing red pixels Pr, green pixels Pg, and blue pixels Pb adjacent to each other in the organic light emitting display according to an exemplary embodiment of the present invention,
3 is a sectional view taken along the line I-I in Fig. 2,
FIG. 4 is a sectional view showing an example of the organic light emitting portion EL of FIG. 3 in more detail,
5 is a cross-sectional view showing another example of the organic light emitting portion EL of FIG. 3 in more detail,
FIG. 6 is a cross-sectional view showing still another example of the organic light emitting portion EL of FIG. 3,
FIG. 7 is a cross-sectional view showing still another example of the organic light emitting portion EL of FIG. 3,
FIG. 8 is a cross-sectional view showing still another example of the organic light emitting portion EL of FIG. 3,
FIG. 9 is a sectional view showing another example of the organic light emitting portion EL of FIG. 4 in more detail,
10 is a cross-sectional view showing another example of the organic light emitting portion EL of FIG. 8 in more detail,
11 is a plan view showing red pixels Pr, green pixels Pg, and blue pixels Pb adjacent to each other of an OLED display according to another embodiment of the present invention,
12 is a sectional view taken along line II-II in Fig.

Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings.

FIG. 1 is a cross-sectional view schematically showing an organic light emitting diode display according to a preferred embodiment of the present invention. Referring to FIG.

Referring to FIG. 1, an OLED display according to an embodiment of the present invention includes a display unit 2 on a substrate 1.

In such an OLED display, external light is transmitted through the substrate 1 and the display unit 2 and is incident thereon.

As shown in FIG. 1, the display unit 2 is provided so that a user located on the side where the image is implemented can observe the image outside the lower portion of the substrate 1, as shown in FIG. 1, the image of the display portion 2 is embodied in the direction of the substrate 1, but the present invention is not necessarily limited to this, The present invention is equally applicable to a front emission type which is implemented in a direction opposite to that of the substrate 1.

FIG. 1 shows a first pixel P1 and a second pixel P2 which are two adjacent pixels of the organic light emitting display of the present invention.

Each of the pixels P1 and P2 includes a first region 31 and a second region 32. [

An image is realized from the display portion 2 through the first region 31 and external light is transmitted through the second region 32. [

That is, according to the present invention, the first area 31 in which each of the pixels P1 and P2 both embodies an image and the second area 32 through which external light is transmitted are provided. When the user does not see the image, .

At this time, elements such as a thin film transistor, a capacitor, and an organic light emitting element are not formed in the second region 32, so that the external light transmittance can be maximized, and the transmitted image can be transmitted to elements such as a thin film transistor, a capacitor, It is possible to reduce the occurrence of distortion as much as possible.

FIG. 2 is a plan view showing red pixels Pr, green pixels Pg and blue pixels Pb adjacent to each other, and FIG. 3 is a cross-sectional view taken along line I-I of FIG. And FIG. 4 is a cross-sectional view showing an example of the organic light emitting portion EL of FIG. 3 in more detail.

Each of the red pixels Pr, the green pixels Pg and the blue pixels Pb includes a circuit region 311 and a light emitting region 312 in the first region 31, respectively. In this embodiment, these circuit regions 311 and the light emitting regions 312 are arranged so as to overlap with each other.

A second region (32) which transmits the external light is disposed adjacent to the first region (31).

2, the second region 32 may be independently provided for each of the pixels Pr (Pg) and Pb (Pb). Although not shown, each of the pixels Pr As shown in FIG. When the second region 32 is provided so as to be connected to each of the pixels Pr, Pg and Pb, the area of the second region 32 through which the external light is transmitted is widened. 2) The overall transmittance can be increased.

As shown in FIG. 3, a pixel circuit portion including a thin film transistor TR is disposed in the circuit region 311. In the pixel circuit portion, a single thin film transistor (TR) It is not limited. The pixel circuit portion may further include a plurality of thin film transistors and storage capacitors in addition to the thin film transistor TR, and wirings such as a scan line, a data line, and a Vdd line connected thereto may further be provided.

The light emitting region 312 is provided with an organic light emitting element EL as a light emitting element. The organic light emitting element EL is electrically connected to the thin film transistor TR of the pixel circuit portion.

A buffer film 211 is formed on the substrate 1 and a pixel circuit portion including the thin film transistor TR is formed on the buffer film 211.

First, a semiconductor active layer 212 is formed on the buffer layer 211.

The buffer layer 211 is formed of a transparent insulating material. The buffer layer 211 prevents penetration of impurities and smoothes the surface. The buffer layer 211 may be formed of various materials capable of performing such a role. For example, the buffer layer 211 may be formed of an inorganic material such as silicon oxide, silicon nitride, silicon oxynitride, aluminum oxide, aluminum nitride, titanium oxide or titanium nitride, or an organic material such as polyimide, polyester, Or a laminate thereof. The buffer film 211 is not an essential component and may not be provided if necessary.

The semiconductor active layer 212 may be formed of polycrystalline silicon. However, the semiconductor active layer 212 may be formed of an oxide semiconductor. For example, the layer G-I-Z-O [(In2O3) a (Ga2O3) b (ZnO) c layer] (a, b and c are real numbers satisfying the conditions of a? 0, b? 0 and c> When the semiconductor active layer 212 is formed of an oxide semiconductor, the light transmittance in the circuit region 311 of the first region 31 can be further increased, thereby increasing the transmittance of the entire surface of the display portion 2 .

A gate insulating film 213 is formed on the buffer film 211 so as to cover the semiconductor active layer 212 and a gate electrode 214 is formed on the gate insulating film 213.

An interlayer insulating film 215 is formed on the gate insulating film 213 so as to cover the gate electrode 214. A source electrode 216 and a drain electrode 217 are formed on the interlayer insulating film 215, 212 and the contact hole.

The structure of the thin film transistor TR is not limited thereto, and various structures of the thin film transistor may be applied.

A passivation film 218 is formed to cover the thin film transistor TR. The passivation film 218 may be a single or multi-layer insulating film whose top surface is planarized. The passivation film 218 may be formed of an inorganic material and / or an organic material.

As shown in FIG. 3, a first electrode 221 of an organic light emitting device EL electrically connected to the thin film transistor TR is formed on the passivation film 218. The first electrode 221 is formed in an island shape independent of all the pixels.

The first electrode 221 may include ITO, IZO, ZnO, or In 2 O 3 having a high work function. The first electrode 221 may be formed of Ag, Mg, Al, Pt, Pd, Au, Ni, Nd, Ir, Cr, Li, Or a reflective film formed of Ca or the like.

If the first electrode 221 is formed as a reflective electrode, the first electrode 221 can shield the conductive pattern of the pixel circuit portion. Therefore, the external light is scattered by the conductive pattern of the pixel circuit portion, Can be reduced.

An insulating film 219 is formed on the passivation film 218.

The insulating film 219 covers the edge of the first electrode 221 and exposes the central portion. The insulating film 219 may be provided so as to cover the first region 31 and not necessarily cover the entire first region 31. The insulating film 219 may be formed on at least a part of the first region 31, . The insulating layer 219 may be provided to cover the entire second region 32.

The insulating layer 219 may be formed of an organic insulating material such as an acrylic resin, an epoxy resin, a polyimide, or the like, so that the upper surface of the insulating layer 219 is flat.

An organic layer 223 is formed on the first electrode 221 exposed through the insulating layer 219. A part of the organic film 223 is covered to a part of the insulating film 219 covering the edge of the first electrode 221.

The organic layer 223 includes a first organic layer 223a, a second organic layer 223b, and a third organic layer 223c, as shown in FIG.

The first organic layer 223a includes a hole injection layer (HIL) and a hole transport layer (HTL). The second organic layer 223b includes an emission layer (EML). The third organic layer 223c includes an electron injection layer (EIL) and an electron transfer layer (ETL). The first organic layer 223a and the third organic layer 223c may be commonly applied to all the pixels as a common layer, but the second organic layer 223b may be separately deposited for each pixel color.

The hole injection layer (HIL) may be formed of a phthalocyanine compound such as copper phthalocyanine or starburst type amines such as TCTA, m-MTDATA, m-MTDAPB and the like.

The hole transport layer (HTL) may be formed by a combination of N, N'-bis (3-methylphenyl) -N, N'-diphenyl- [1,1- biphenyl] -4,4'- diamine (TPD) -Di (naphthalene-1-yl) -N, N'-diphenylbenzidine (? -NPD).

The electron injection layer (EIL) may be formed using a material such as LiF, NaCl, CsF, Li2O, BaO, Liq, or the like.

The electron transport layer (ETL) can be formed using Alq3.

The light emitting layer (EML) may include a host material and a dopant material.

Examples of the host material include tris (8-hydroxy-quinolinato) aluminum (Alq3), 9,10-di (naphthyl-2-yl) anthracene (AND), 3-tert- Bis (2,2-diphenyl-ethen-1-yl) -4,4'-dimethylphenyl (DPVBi), 4,4'-bis Bis (P-DMDPVBi), Tert (9,9-diarylfluorene) s (TDAF), 2- (9,9 (9,9'-spirobifluoren-2-yl) -9,9'-spirobifluorene (BSDF), 2,7- (TSDF), bis (9,9-diarylfluorene) s (BDAF), 4,4'-bis (2,2- (P-TDPVBi), 1,3-bis (carbazol-9-yl) benzene (mCP), 1,3,5-tris (carbazol-9-yl) benzene (carbazole-9-yl) biphenyl (CBP), 4,4'-bis (carbazole-9-yl) -Bis Bis (9-carbazolyl) -2,2'-dimethyl-biphenyl (CBDP), 4,4'-bis (carbazol- CBP), (9-phenyl-9H-carbazole) fluorene (FL-4CBP), 4,4'-bis (carbazole-9-yl) -9,9-di-tolyl-fluorene (DPFL-CBP) and 9,9-bis (9-phenyl-9H-carbazol) fluorene (FL-2CBP).

Examples of the dopant material include DPAVBi (4,4'-bis [4- (di-p-tolylamino) styryl] biphenyl), ADN (9,10- (3-tert-butyl-9,10-di (naphth-2-yl) anthracene).

4, a first auxiliary layer 230 is formed on the organic layer 223 and the insulating layer 219 as described above. The first auxiliary layer 230 may be formed to cover both the first region 31 and the second region 32. Specifically, the first auxiliary layer 230 may include a first portion 230a and a second portion 230b. Here, the first portion 230a is located on the first region 31 corresponding to the first electrode 221. The second portion 230b is located on the second region 32 in connection with the first portion 230a. Referring to FIG. 4, the second portion 230b of the first auxiliary layer 230 is formed on the insulating film 219 of the second region 32 without the organic film 223. The first auxiliary layer 230 may contain at least one material selected from the group consisting of aluminum (Al), silver (Ag), and an alloy of magnesium and silver (Mg: Ag). The thickness of the first auxiliary layer 230 is formed so as not to decrease the transmittance even if it is formed on the second region 32. The thickness of the first auxiliary layer 230 may be about 5 A to 100 A, preferably about 10 A to 20 A. [ According to the experiment, when the first auxiliary layer 230 was deposited to a thickness of about 10 A to contain magnesium and silver in a mass ratio of 9: 1, the transmittance was 99.3%. Also, when aluminum was deposited as the first auxiliary layer 230 to a thickness of about 10 A, the transmittance was 99.8%. As a result of the experiment, it is understood that even if the first auxiliary layer 230 is formed, the function of the second region 32 which transmits the external light is not affected. The role of the first auxiliary layer 230 will be described later.

A second auxiliary layer 235 is formed on the first auxiliary layer 230. The second auxiliary layer 235 is formed corresponding to the second portion 230b of the first auxiliary layer 230. [ The second auxiliary layer 235 may be formed of a material such as 8-quinolinolato Lithium, N, N-diphenyl-N, N-bis ) Biphenyl-4,4'-diamine (HT01), N (di-N-diphenyl-N, Yl) phenyl-9H-fluorene-2-amine (N (diphenyl-4-yl) 9,9-dimethyl-N- (4- (9-phenyl-9H-carbazol-3-yl) phenyl) -9H-fluorene- Yl) anthracene-2-yl) phenyl) -1-phenyl-1H- benzo [D] imidazole yl) phenyl) -1-phenyl-1H-benzo- [D] imidazole LG201). The thickness of the second auxiliary layer 235 is formed so as not to decrease the transmittance even if it is formed on the second region 32. The role of the second auxiliary layer 235 will also be described later.

As described above, the second electrode 222 is formed so that the first auxiliary layer 230 corresponds to the first portion 230a. And the second electrode 222 is hardly formed on the second auxiliary layer 235. The second electrode 222 may be formed of a metal having a small work function, that is, Ag, Mg, Al, Pt, Pd, Au, Ni, Nd, Ir, Cr, Li, May be formed of a metal containing Mg or Mg alloy. The first electrode 221 and the second electrode 222 may function as an anode electrode while the second electrode 222 may serve as a cathode electrode. May be reversed. Meanwhile, the second electrode 222 may be manufactured by a general vacuum deposition process. In one embodiment, the second electrode 222 may be a thin film of magnesium deposited in a vacuum chamber by thermal evaporation or sputtering.

4, the first organic layer 223a and the third organic layer 223c may be patterned using a fine metal mask to pattern the first electrode 221 corresponding to the first electrode 221 Is deposited in the region 31 as a common layer so as to be common to all the pixels. The second organic film 223b is patterned to correspond to each pixel, that is, the first electrode 221, using a fine metal mask. The first auxiliary layer 230 is entirely deposited on the third organic layer 223c and the insulating layer 219 by using an open mask without distinguishing the first region 31 and the second region 32 from each other. Next, the second auxiliary layer 235 is deposited to be common to all the pixels on the insulating film 219 corresponding to the second region 32 free of the organic film 223 using a fine metal mask for patterning. Here, open mask means a mask having openings widely open without fine patterns unlike fine metal masks.

In this case, the first auxiliary layer 230 and the second auxiliary layer 235 can be used to form the second electrode 222 without using a conventionally used fine metal mask for patterning. The second electrode 222 may be deposited only in the first region 31 except for the second region 32 of pixels.

The metal forming the second electrode 222, particularly the metal including Mg or Mg alloy, is deposited well on the first auxiliary layer 230, but not on the second auxiliary layer 235. The first auxiliary layer 230 contains at least one material selected from the group consisting of aluminum, silver, and an alloy of magnesium and silver, and has good adhesion to the metal forming the second electrode 222. However, in the case of the second auxiliary layer 235, on the contrary, the ability to adhere to the metal forming the second electrode 222, particularly to a metal containing Mg or a Mg alloy, is poor. Therefore, when depositing a metal used as the second electrode 222, in particular, Mg or Mg alloy, the metal is deposited on both the first region 31 and the second region 32 of all the pixels by using an open mask The metal is deposited only in the first region 31 in which the first auxiliary layer 230 is formed and the deposition is hardly performed in the second region 32 in which the second auxiliary layer 235 is formed, Thereby obtaining the patterning effect of the pattern 222.

On the other hand, when a fine metal mask is used as the organic film 223 to form the patterned second electrode 222, since the deposition temperature is extremely high, deformation may occur in the fine metal mask during long-term use And this causes problems such as a shadow phenomenon, resulting in a very unstable factor in the process, which is not preferable. Therefore, in the embodiment of the present invention, a fine metal mask is not used by using the relationship between the first auxiliary layer 230 and the second auxiliary layer 235 and the material forming the second electrode 222, By forming the second electrode 222 only on the exposed first region 31 of the auxiliary layer 230, all of the above problems can be solved.

5 is a cross-sectional view showing another example of the organic light emitting portion EL of FIG. 3 in more detail.

5, a first organic layer 223a, a second organic layer 223b, a third organic layer 223c, and a first auxiliary layer 230b are sequentially formed on a first electrode 221, And the second electrode 222 are formed is similar to the embodiment shown in Fig. The formation of the first auxiliary layer 230 and the second auxiliary layer 235 on the second region 32 is also similar to the embodiment shown in FIG. However, the first organic film 223a is formed so as to extend to the second region 32. Accordingly, the first organic layer 223a, the first auxiliary layer 230, and the second auxiliary layer 235 are sequentially stacked on the second region 32. [

According to the embodiment shown in FIG. 5, there is an advantage in processing that the first organic film 223a is not patterned separately. In addition, the components corresponding to those shown in FIG. 4 perform the same or similar functions, so that a more detailed description thereof will be omitted.

FIG. 6 is a cross-sectional view showing another example of the organic light emitting portion EL of FIG. 3 in more detail.

6, a first organic layer 223a, a second organic layer 223b, a third organic layer 223c, and a first auxiliary layer 230 are sequentially formed on a first electrode 221, And the second electrode 222 are formed is similar to the embodiment shown in Fig. However, the first auxiliary layer 230 and the second auxiliary layer 235 are not formed on the second region 32, and instead, the third organic film 223c is formed to extend to the second region 32 The points are different. The components corresponding to those illustrated in FIG. 4 perform the same or similar functions, so that a more detailed description thereof will be omitted.

Referring to FIG. 6, the third organic film 223c is disposed in both the first region 31 and the second region 32. In this case, the third organic film 223c includes a metal used as the second electrode 222, in particular, a material in which Mg or Mg alloy is not deposited well. Specifically, at this time, the third organic film 223c is formed of a mixture of 8-quinolinato lithium (Liq), 2- (4- (9,10-di (naphthalen- 2-yl) phenyl) -1-phenyl-1H-benzo [l, D] imidazole LG201).

A first auxiliary layer 230 is formed on a part of the surface of the third organic film 223c. Specifically, the first auxiliary layer 230 is patterned to correspond to the first electrode 221 and is formed on the third organic layer 223c. The first auxiliary layer 230 includes a material used as the second electrode 222 as described above, in particular, a material in which Mg or Mg alloy is deposited well.

FIG. 7 is a cross-sectional view showing still another example of the organic light emitting portion EL of FIG. 3 in more detail.

7, a first organic layer 223a, a second organic layer 223b, a third organic layer 223c, a first auxiliary layer 230b, and a second organic layer 223c are successively formed on the first electrode 221, And the second electrode 222 are formed is similar to the embodiment shown in Fig. However, the first auxiliary layer 230 and the second auxiliary layer 235 are not formed on the second region 32, and instead, the first organic layer 223a is formed to extend to the second region 32 The points are different. The components corresponding to those illustrated in FIG. 4 perform the same or similar functions, so that a more detailed description thereof will be omitted.

Referring to FIG. 7, the first organic film 223a is disposed in both the first region 31 and the second region 32. In FIG. In this case, the first organic layer 223a includes a metal used as the second electrode 222, particularly, a material in which Mg or Mg alloy is not well deposited. Specifically, at this time, the first organic film 223a is formed of N, N-diphenyl-N, N-bis (9-phenyl-9H-carbazol- N-diphenyl-N, N-bis (9-phenyl-9H-carbazol-3-yl) biphenyl-4,4'- N-diphenyl-4-yl) 9,9-dimethyl-N- (4- (9- phenyl-9H-carbazol-3-yl) phenyl) -9H-fluorene-2-amine; HT211).

A first auxiliary layer 230 is formed on a part of the surface of the first organic layer 223a. Specifically, the first auxiliary layer 230 is patterned to correspond to the first electrode 221 and is formed on the first organic layer 223a. The first auxiliary layer 230 includes a material used as the second electrode 222 as described above, in particular, a material in which Mg or Mg alloy is deposited well.

6 and 7, when depositing a metal used as the second electrode 222, particularly Mg or a Mg alloy, a first region 31 and a second region 32 of all pixels are formed by using an open mask The metal is deposited only on the first auxiliary layer 230 and the surface of the third organic film 223c or the first organic film 223a exposed in the second region 32 is almost entirely The deposition is not performed and the patterning effect of the second electrode 222 is automatically obtained.

8 is a cross-sectional view showing still another example of the organic light emitting portion EL of FIG. 3 in more detail.

8, the first organic film 223a, the second organic film 223b, the third organic film 223c, and the second electrode 222b are sequentially formed on the first electrode 221, ) Was formed. Unlike the embodiment shown in FIG. 4, the first auxiliary layer 230 and the second auxiliary layer 235 are not formed, and the first organic layer 223a is formed in the second region (32).

Here, the third organic film 223c may include a specific dopant material such that a metal forming the second electrode 222, particularly a metal containing Mg or a Mg alloy, is deposited well. Specific dendritic tetra (hexahydropyrimidopyrimidine) (Di-tungsten tetra (hexahydropyrimidopyrimidine)) and the like can be used. In this case, the first organic layer 223a includes a metal used as the second electrode 222, particularly, a material in which Mg or Mg alloy is not well deposited. Specifically, at this time, the first organic film 223a is formed of N, N-diphenyl-N, N-bis (9-phenyl-9H-carbazol- N-diphenyl-N, N-bis (9-phenyl-9H-carbazol-3-yl) biphenyl-4,4'- N-diphenyl-4-yl) 9,9-dimethyl-N- (4- (9- phenyl-9H-carbazol-3-yl) phenyl) -9H-fluorene-2-amine; HT211).

8, a metal forming the second electrode 222, particularly a metal containing Mg or a Mg alloy, is deposited on the third organic film 223c containing a specific dopant at a thickness of several hundreds of angstroms But the deposition is difficult to be performed on the first organic film 223a and the second organic film 223b. A third organic film 223c containing a specific dopant is formed in a region where the second electrode 222 is to be formed and a part of the second region 32 in which the second electrode 222 is not to be formed So that the first organic film 223a is formed. Then, when depositing a metal used as the second electrode 222, in particular, Mg or Mg alloy, the metal is deposited on both the first region 31 and the second region 32 of all the pixels by using an open mask The metal is deposited only on the third organic film 223c containing the specific dopant and is hardly deposited on the exposed surface of the first organic film 223a so that the patterning effect of the second electrode 222 .

The deposition of the second electrode 222 material is relative to the deposition of the second electrode 222 material on the third organic layer 223c containing the specific dopant in FIG. The second electrode 222 is relatively more deposited on the first auxiliary layer 230 than the other organic layers 223a and 223c and the second auxiliary layer 235 in FIGS. As shown in FIG.

4, when a metal for forming the second electrode 222 is deposited by an open mask, a first thickness t1 is formed on the first portion 230a of the first auxiliary layer 230 A second portion 222a of the second electrode 222 is formed on the second auxiliary layer 235 of the second region 32 by a second thickness t2 222b may be formed. Since the second thickness t2 is thinner than the first thickness t1, the transmittance reduction due to the second portion 222b can be reduced.

5, a second electrode 222 having a smaller thickness may be formed on the second auxiliary layer 235 of the second region 32 as shown in FIG. Also in the embodiment according to FIG. 6, the second electrode 222 having a thinner thickness may be formed on the third organic film 223c of the second region 32 as shown in FIG.

7 and 8, a second electrode 222 having a smaller thickness may also be formed on the first organic layer 223a of the second region 32 as shown in FIG.

2 and 3, the present invention is not limited to the structure in which the pixel circuit portion including the thin film transistor TR is overlapped with the first electrode 221. As shown in FIGS. 11 and 12, The circuit region 311 including the pixel circuit portion including the transistor TR may not be overlapped with the first electrode 221. [

12, the second auxiliary layer 235 is also formed on the first auxiliary layer 230 corresponding to the circuit region 311 including the pixel circuit portion, unlike the structure shown in FIG. 3 . This is because the second electrode 222 can be formed only in the portion corresponding to the light emitting region 312. [ Other components and functions thereof are the same as those described with reference to FIG. 3, so that duplicate descriptions are omitted.

While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it is clearly understood that the same is by way of illustration and example only and is not to be taken by way of limitation and that those skilled in the art will recognize that various modifications and equivalent arrangements may be made therein. It will be possible. Accordingly, the true scope of protection of the present invention should be determined only by the appended claims.

1: substrate 2: display portion
4: sealing substrate 31: first region
32: second region 211: buffer film
212: semiconductor active layer 213: gate insulating film
214: gate electrode 215: interlayer insulating film
216: source electrode 217: drain electrode
218: passivation film 219: insulating film
221: first electrode 222: second electrode
223: organic film 223a: first organic film
223b: second organic film 223c: third organic film
230: first auxiliary layer 235: second auxiliary layer
230a: first part 230b: second part
311: Circuit area 312: Light emitting area

Claims (30)

Board;
A plurality of pixels formed on the substrate and having a first region that emits light and a second region that transmits external light;
A plurality of pixel circuit portions disposed in a first region of each pixel and each including at least one thin film transistor;
A plurality of first electrodes arranged in a first region of each of the pixels and electrically connected to the pixel circuit portions and patterned in an island shape so as to be separated from each other;
A first organic film formed to cover at least the first electrode;
A plurality of second organic layers formed on the first organic layer and patterned to correspond to at least the first electrode and including a light emitting layer;
A third organic film formed on the second organic film so as to cover at least the second organic film;
A first auxiliary layer formed on the third organic layer and including a first portion patterned to correspond to at least the first electrode; And
A second electrode formed on the first auxiliary layer and patterned to correspond to the first portion and the second electrode, the second electrode being connected to the main portion and thinner than the main portion;
And an organic light emitting diode. Board;
A plurality of pixels formed on the substrate and having a first region that emits light and a second region that transmits external light;
A plurality of pixel circuit portions disposed in a first region of each pixel and each including at least one thin film transistor;
A plurality of first electrodes arranged in a first region of each of the pixels and electrically connected to the pixel circuit portions and patterned in an island shape so as to be separated from each other;
A first organic film formed to cover at least the first electrode;
A plurality of second organic layers formed on the first organic layer and patterned to correspond to at least the first electrode and including a light emitting layer;
A third organic film formed on the second organic film so as to cover at least the second organic film;
A first auxiliary layer formed on the third organic layer and including a first portion patterned to correspond to at least the first electrode; And
A second electrode patterned to correspond to the first portion on the first auxiliary layer; / RTI >
Wherein the first auxiliary layer includes a second portion connected to the first portion, and the second portion is located in the second region. 3. The method of claim 2,
A second auxiliary layer patterned on the first auxiliary layer to correspond to the second portion of the first auxiliary layer;
Further comprising an organic light emitting diode (OLED). The method of claim 3,
Wherein the second electrode is further disposed on the second auxiliary layer,
Wherein the second electrode disposed on the second auxiliary layer is thinner than the second electrode patterned to correspond to the first portion of the first auxiliary layer. Board;
A plurality of pixels formed on the substrate and having a first region that emits light and a second region that transmits external light;
A plurality of pixel circuit portions disposed in a first region of each pixel and each including at least one thin film transistor;
A plurality of first electrodes arranged in a first region of each of the pixels and electrically connected to the pixel circuit portions and patterned in an island shape so as to be separated from each other;
A first organic film formed to cover at least the first electrode;
A plurality of second organic layers formed on the first organic layer and patterned to correspond to at least the first electrode and including a light emitting layer;
A third organic film formed on the second organic film so as to cover at least the second organic film;
A first auxiliary layer formed on the third organic layer and including a first portion patterned to correspond to at least the first electrode; And
A second electrode patterned to correspond to the first portion on the first auxiliary layer; / RTI >
And the third organic film is disposed in both the first region and the second region. Board;
A plurality of pixels formed on the substrate and having a first region that emits light and a second region that transmits external light;
A plurality of pixel circuit portions disposed in a first region of each pixel and each including at least one thin film transistor;
A plurality of first electrodes arranged in a first region of each of the pixels and electrically connected to the pixel circuit portions and patterned in an island shape so as to be separated from each other;
A first organic film formed to cover at least the first electrode;
A plurality of second organic layers formed on the first organic layer and patterned to correspond to at least the first electrode and including a light emitting layer;
A third organic film formed on the second organic film so as to cover at least the second organic film;
A first auxiliary layer formed on the third organic layer and including a first portion patterned to correspond to at least the first electrode; And
A second electrode patterned to correspond to the first portion on the first auxiliary layer; / RTI >
Wherein the first organic film is disposed in both the first region and the second region. The method according to claim 6,
Wherein the first auxiliary layer comprises a second portion connected to the first portion and the second portion is located on the first organic film of the second region. 8. The method of claim 7,
A second auxiliary layer patterned on the first auxiliary layer to correspond to the second portion of the first auxiliary layer;
Further comprising an organic light emitting diode (OLED). The method of claim 1, wherein
Wherein the first organic layer includes at least one of a hole transport layer and a hole injection layer. The method according to claim 1,
Wherein the third organic layer comprises at least one of an electron transport layer and an electron injection layer. The method according to claim 1,
Wherein the pixel circuit portion is overlapped with the first electrode. Board;
A plurality of pixels formed on the substrate and having a first region that emits light and a second region that transmits external light;
A plurality of pixel circuit portions disposed in a first region of each pixel and each including at least one thin film transistor;
A plurality of first electrodes arranged in a first region of each of the pixels and electrically connected to the pixel circuit portions and patterned in an island shape so as to be separated from each other;
A first organic film formed to cover at least the first electrode;
A plurality of second organic layers formed on the first organic layer and patterned to correspond to at least the first electrode and including a light emitting layer;
A third organic film formed on the second organic film so as to cover at least the second organic film;
A first auxiliary layer formed on the third organic layer and including a first portion patterned to correspond to at least the first electrode; And
A second electrode patterned to correspond to the first portion on the first auxiliary layer; / RTI >
Wherein the first region of each pixel includes a light emitting region and a circuit region, the pixel circuit portion is disposed in the circuit region, and the first electrode is disposed in the light emitting region. 13. The method of claim 12,
Wherein the light emitting region and the circuit region of each pixel are disposed adjacent to each other. The method according to claim 1,
An insulating film covering an edge of the first electrode and interposed between an edge of the first electrode and the first organic film;
The organic light emitting display according to claim 1, The method according to claim 1,
Wherein the second electrode comprises magnesium. delete The method comprising: dividing a plurality of pixels having a first region to emit light on a substrate and a second region to transmit external light;
Forming a plurality of pixel circuit portions each including at least one thin film transistor in a first region of each pixel;
Forming a plurality of first electrodes patterned in an island shape so as to be separated from each other in each pixel by being electrically connected to the pixel circuit portions in a first region of each of the pixels;
Forming a first organic film to cover at least the first electrode;
Forming a plurality of second organic films patterned to correspond to at least the first electrodes and including a light emitting layer on the first organic film;
Forming a third organic film on the second organic film so as to cover at least the second organic film;
Forming a first auxiliary layer on the third organic layer, the first auxiliary layer including a first portion patterned to correspond to at least the first electrode; And
Depositing a metal on the first region and the second region to form a second electrode patterned on the first auxiliary layer to correspond to the first portion;
Wherein the organic light emitting display device further comprises: 18. The method of claim 17,
The step of forming the first auxiliary layer
The first auxiliary layer including a second portion connected to the first portion and the second portion forming the first auxiliary layer to be located in the second region;
Gt; < / RTI > 19. The method of claim 18,
Between the step of forming the first auxiliary layer and the step of forming the second electrode,
Forming a second auxiliary layer patterned on the first auxiliary layer to correspond to the second portion of the first auxiliary layer;
Further comprising the steps of: 18. The method of claim 17,
And the third organic film is formed so as to be disposed in both the first region and the second region. 18. The method of claim 17,
Wherein the first organic film is formed so as to be disposed in both the first region and the second region. 22. The method of claim 21,
Wherein the first auxiliary layer comprises a second portion connected to the first portion and the second portion is formed on the first organic film of the second region. 23. The method of claim 22,
Between the step of forming the first auxiliary layer and the step of forming the second electrode,
Forming a second auxiliary layer patterned on the first auxiliary layer to correspond to the second portion of the first auxiliary layer;
Wherein the organic light emitting display device further comprises: 18. The method of claim 17,
Wherein the metal comprises magnesium. ≪ RTI ID = 0.0 > 11. < / RTI > 18. The method of claim 17,
Wherein the first organic layer comprises at least one of a hole transport layer and a hole injection layer. 18. The method of claim 17,
Wherein the third organic layer comprises at least one of an electron transport layer and an electron injection layer. 18. The method of claim 17,
Wherein the pixel circuit portion is overlapped with the first electrode. 18. The method of claim 17,
Wherein a first region of each pixel includes a light emitting region and a circuit region, the pixel circuit portion is disposed in the circuit region, and the first electrode is disposed in the light emitting region . 29. The method of claim 28,
Wherein the light emitting region and the circuit region of each pixel are disposed adjacent to each other. 18. The method of claim 17,
Between the step of forming the first electrode and the step of forming the first organic film,
Further comprising forming an insulating film covering the edge of the first electrode and interposed between the edge of the first electrode and the first organic film.

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