KR101368485B1 - On-line monitoring system for ultrapure water - Google Patents

On-line monitoring system for ultrapure water Download PDF

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Publication number
KR101368485B1
KR101368485B1 KR1020120109405A KR20120109405A KR101368485B1 KR 101368485 B1 KR101368485 B1 KR 101368485B1 KR 1020120109405 A KR1020120109405 A KR 1020120109405A KR 20120109405 A KR20120109405 A KR 20120109405A KR 101368485 B1 KR101368485 B1 KR 101368485B1
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South Korea
Prior art keywords
sample
unit
carrier
ultrapure water
line
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KR1020120109405A
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Korean (ko)
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유승교
이응선
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주식회사 위드텍
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67288—Monitoring of warpage, curvature, damage, defects or the like

Abstract

The present invention relates to an ultrapure water online monitoring system, and more particularly, to an ultrapure water online monitoring system capable of real-time analysis of a contamination state of an ultrapure water.

Description

On-line Monitoring System for Ultrapure Water

The present invention relates to an ultrapure water online monitoring system, and more particularly, to an ultrapure water online monitoring system capable of real-time analysis of a contamination state of an ultrapure water.

Ultrapure water (UPW, Ultrapure water) is extremely purified water, and is used in various ways, including cleaning applications in semiconductor manufacturing processes.

More specifically, semiconductor devices generally apply a photoresist after forming an oxide film on a wafer, remove a portion of the photoresist by exposing with a mask, depositing metal particles to form and etch a metal pattern, and the like. Manufactured through the same process. That is, during the manufacturing process of a semiconductor device, a process of forming and removing a variety of material layers on a wafer is performed several times. At this time, in order to prevent the materials to be removed in the previous process from remaining in one process before moving from one process to the next process, a cleaning process is generally entered between various processes during the semiconductor manufacturing process. In particular, due to the development of semiconductor technology, the trend of high integration of semiconductor devices is rapidly achieved. Therefore, the necessity of completely removing impurities such as materials remaining in the previous process or materials introduced from the outside is increasing.

As the semiconductor device is well known, it has a very fine structure, and even a small amount of impurities such as metals are introduced, which greatly affects the yield and performance of the semiconductor device. That is, adverse effects such as poor electrical properties such as dielectric breakdown strength, capacitance, leakage current, etc., or by the formation of by-products due to the reaction of trace metals with silicon or silicon oxide on the wafer, resulting in deterioration of the device. This is what happens. Therefore, the cleaning process performed such that no impurities remain on the wafer is very important.

In particular, in the wet cleaning method using ultrapure water, when the contaminated ultrapure water solution is used, serious defects are caused in the product, so it is necessary to monitor the contamination of the ultrapure water solution.

The conventional method of taking a sample and analyzing it in a laboratory is likely to be contaminated during sampling, sample transfer, and analysis, and it is difficult to secure sufficient capacity of the measured water, which inevitably lowers the reliability of the analysis (pollution evaluation). There is a problem.

In addition, in the case of sampling and analysis, it takes a long time to analyze, and even if it is determined that the contamination state, there is a problem that it is difficult to quickly perform a subsequent response to cut off the supply of contaminated ultrapure water so as to lower the defective rate.

Meanwhile, in order to solve this problem, Korean Patent No. 0585139 ("Metal Contamination Monitoring Method of Wafer Cleaning Liquid and Wafer Cleaning Liquid") has been proposed.

However, the Korean Patent No. 0585139, which is mixed with the reagent while analyzing the cleaning solution while transporting the cleaning solution along the sampling line, may reduce the analysis reliability when the sampling line and the valves, pumps, and mixers provided along the sampling line are contaminated. There is only a problem.

Therefore, there is a need for an apparatus and method capable of accurately analyzing the contamination level of a cleaning liquid (ultra pure water solution) in real time.

Registered Korean Patent No. 0585139 ("Metal Contamination Monitoring Method of Wafer Cleaning Liquid and Wafer Cleaning Liquid")

The present invention has been made to solve the problems described above, an object of the present invention is to provide a ultra-pure water online monitoring system capable of real-time analysis of the contamination state of the ultrapure water, and to increase the reliability.

Particularly, an object of the present invention is that the volume of the sample loop is greater than the volume of the sample, so that a second section (buffer section) is formed between the injected sample and the carrier, thereby preventing contamination of the sample by the carrier. It is to provide a monitoring system.

It is also an object of the present invention to provide an ultra-pure water solution online monitoring system that can use an ultrapure water solution supplied to a sample by a carrier supply unit or use an inert gas.

In addition, an object of the present invention is to provide an ultra-pure solution online monitoring system, characterized in that the standard solution supply unit is provided in the sample injection unit to evaluate and correct the concentration rate of the concentration unit.

In addition, the purpose of the present invention is the ultra-pure water solution is continuously introduced into the sample loop through the ultra-pure water inflow line, the ultra-pure water that is not transferred to the condensing unit is discharged by the ultra-pure water online monitoring that can always keep the sample loop of the sample injection unit clean To provide a system.

Particularly, an object of the present invention is to provide an ultra-pure water online monitoring system that can analyze contamination in real time when used for cleaning purposes such as wafers of ultrapure water, thereby preventing product defects and improving productivity. .

Ultra-pure water solution online monitoring system 1000 of the present invention is connected to the ultra-pure solution inlet line 100 is introduced into the sample loop 210, the carrier of the quantity is supplied to the sample loop 210 through the carrier supply unit 220 A sample injecting unit 200 for injecting a quantitative sample; A concentrator 300 for mixing the sample supplied through the sample injector 200 and the eluent supplied through the eluent supply unit 310 to desorb the sample to be analyzed; And an analysis unit 400 for quantitatively analyzing an analysis target sample supplied through the concentration unit 300. Including, but the capacity of the sample loop 210 is characterized in that more than the supply capacity of the sample.

The sample loop 210 may include a first section in which a sample to be transferred to the concentrating unit 300 is located, and a second section in which the ultrapure water except for the sample is located between the sample and the carrier of the first section. It is characterized by including.

In addition, the carrier supply unit 220 is branched from the ultrapure water inflow line 100, the first-first line 221 to move the ultrapure water solution, the first-first line 221 and the sample injection unit ( And a first flow rate controller 223 for controlling the flow of the ultrapure water used as a carrier.

In addition, the carrier supply unit 220 includes the first flow rate controller 223 in the first-second line 222 and the first flow rate control unit in the carrier flow direction of the first-second line 222. The filter 224 is further provided on the rear side of the 223.

At this time, the carrier supply unit 220 controls the flow of the carrier and the storage unit 225, the second line 226 connecting the storage unit 225 and the sample injection unit 200, the carrier is stored; A second flow control unit 227 may be further included.

The carrier supply unit 220 may include a storage unit 225 in which carriers are stored, a second line 226 connecting the storage unit 225 and the sample injector 200, and the second line 226. The second flow rate control unit 227 to control the flow of the carrier is further provided, wherein the carrier is stored in the storage unit 225 is characterized in that the inert gas.

At this time, the sample loop 210 is inert to be supplied through the second flow control unit 227 between the sample section and the carrier in the third section, the sample section is transferred to the concentrator 300 And a fourth section in which the gas is located.

In addition, the ultrapure water online monitoring system 1000 is further provided with a standard solution supply unit 230 for supplying a standard solution to the sample injection unit 200, the standard solution supplied to the sample injection unit 200 is concentrated It is characterized in that the supply to the portion (300).

In addition, the standard solution supply unit 230 is a standard solution storage unit 231 for storing the standard solution, a third line 232 connecting the standard solution storage unit and the sample injection unit 200, and the third It is characterized in that it comprises a third flow rate control unit 233 is provided in the line 232 to supply a standard solution.

In addition, the sample injection unit 200 is transferred to the standard solution supplied through the standard solution supply unit 230, the carrier of the quantity is supplied to the sample loop 210 through the carrier supply unit 220 is the standard of quantification A standard solution loop 234 for supplying a solution to the concentrating unit 300 is formed.

In addition, the eluent supply unit 310 may include an eluent storage unit 311 storing the eluent, a fourth line 312 connecting the eluent storage unit 311 and the concentration unit 300, and the fourth line. And a fourth flow rate controller 313 provided at 312 to supply an eluent.

In addition, the ultrapure water solution online monitoring system 1000 is an ultrapure water solution is continuously introduced into the sample loop 210 through the ultrapure water inflow line 100, the ultrapure water that is not transferred to the concentration unit 300 is discharged It is characterized by.

On the other hand, another ultra-pure solution online monitoring system 1000 of the present invention is connected to the transfer pipe through which the ultra-pure water is transferred or the storage unit for storing the ultra-pure water and the ultra-pure water inlet line 100, the ultra-pure water is sample loop 210 A sample injecting unit 200 that is introduced into the sample injecting unit 200 and is supplied to the sample loop 210 through a carrier supply unit 220 to inject an quantitative ultrapure water sample; A concentrator 300 for mixing the sample supplied through the sample injector 200 and the eluent supplied through the eluent supply unit 310 to desorb the sample to be analyzed; And an analysis unit 400 for quantitatively analyzing an analysis target sample supplied through the concentration unit 300. The carrier supply unit 220 includes a first line branched from the ultrapure water inflow line 100 to move the ultrapure water, and a first flow controller 223 for supplying the ultrapure water inside the first line. Ultrapure water solution, characterized in that used as a carrier.

Accordingly, the ultrapure water online monitoring system of the present invention can analyze the contamination state of the ultrapure water in real time, and has an advantage of increasing reliability.

In particular, the ultra-pure water on-line monitoring system of the present invention can prevent the contamination of the sample by the carrier by forming a second section (buffer section) between the carrier and the sample to be injected is formed larger than the capacity of the sample loop. There is an advantage.

In addition, the ultra-pure water online monitoring system of the present invention has the advantage that the carrier supply using the ultra-pure water supplied to the sample, or can use an inert gas.

In addition, the ultra-pure water online monitoring system of the present invention has an advantage that the standard solution supply unit is provided in the sample injecting unit so that the concentration rate of the concentrate can be evaluated and corrected.

In addition, the ultra-pure water online monitoring system of the present invention, the ultra-pure water is continuously introduced into the sample loop through the ultra-pure water inflow line, and the ultra-pure water that is not transferred to the condenser is discharged so that the sample loop of the sample inlet can be kept clean at all times. There is an advantage.

In particular, the ultra-pure water online monitoring system of the present invention has the advantage of being able to analyze contamination in real time when used for cleaning purposes, such as wafers of ultra-pure solution, to prevent product defects in advance and to improve productivity.

1 is a block diagram of the ultrapure solution online monitoring system according to the present invention.
2 to 6 are views each showing an example of the ultrapure solution online monitoring system according to the present invention.
7 is a diagram showing the ultrapure solution capacity (first section, second section) when the sample loop of the ultrapure solution online monitoring system according to the present invention is long expressed.
8 is a view showing another example of the ultrapure solution online monitoring system according to the present invention.
FIG. 9 is a view showing a third section and a fourth section when the sample loop of the ultrapure water online monitoring system shown in FIG. 8 is long represented.
10 is a view showing another example of the ultrapure solution online monitoring system according to the present invention.

Hereinafter, the ultrapure solution online monitoring system 1000 of the present invention having the characteristics as described above will be described in detail with reference to the accompanying drawings.

Ultra-pure water on-line monitoring system 1000 of the present invention includes a sample injection unit 200, the concentration unit 300, and the analysis unit 400.

The ultrapure water solution is water that is not contaminated with the metal or metal compound used in the cleaning process, and may be ultrapure water solution (UPW, Ultrapure water).

The sample injector 200 includes a sample loop 210 and a carrier supply unit 220. The sample injector 200 may be an injector having multiple ports.

The sample loop 210 is a portion in which the ultrapure water introduced through the ultrapure water inflow line 100 is transferred to the concentration unit 300 by injection of a carrier.

That is, the ultrapure water inflow line 100 is connected to one side of the transfer pipe to which the ultrapure water is transferred or to a storage space in which the ultrapure water is stored, and the other side thereof is connected to the sample injector 200.

At this time, the ultrapure water solution is continuously transferred to the sample loop 210 through the ultrapure water inflow line 100, and the ultrapure water that is not transferred to the concentrator 300 is discharged.

That is, the ultrapure water solution has a continuous flow inside the ultrapure water solution inlet line 100 and the sample loop 210, and part of the ultrapure water solution is supplied to the concentrating unit 300.

Through this, the ultrapure solution online monitoring system 1000 of the present invention can always maintain the ultrapure solution inlet line 100 and the inside of the sample loop 210 in a clean state at all times, and the metal material, ionic material, etc. of the ultrapure solution in real time. There is an advantage to monitoring the same pollutants.

The carrier supply unit 220 is a configuration for supplying a carrier for transferring a predetermined amount of the ultrapure water in the sample loop 210 to the concentrator 300.

The carrier supply unit 220 may be implemented by various methods.

2 to 5 illustrate a form in which the carrier uses an ultrapure water solution, and FIG. 6 illustrates that the carrier is stored in the storage unit 225, and uses an ultrapure water solution or an inert gas stored in the storage unit 225. The form is shown.

The carrier supply unit 220 of FIGS. 2 to 6 may include a first-first line 221, a first-second line 222, and a first flow rate control unit 223.

The first-first line 221 is a portion in which the ultrapure water used as a carrier is branched from the ultrapure water inflow line 100 to be moved.

The first-second line 222 is a portion connecting the first-first line 221 and the sample injector 200, and part of the ultrapure water solution introduced into the first-first line 221 is The carrier is supplied to the sample injection unit 200 through the first flow rate control unit 223 by being transferred to the first-second line 222.

In this case, the first flow rate controller 223 may be implemented in various ways.

4 is provided with a valve 221-1 for controlling the flow of the ultra-pure water solution of the first-first line 221 so that the valve 221-1 moves to the first flow controller 223. It is the form used.

In FIG. 4, the valve 221-1 is provided in the longitudinal direction of the first-first line 221 and is provided at the rear side of the portion where the first-second line 222 is connected. Ultra-pure water online monitoring system of the 1000 is not limited to this, the valve (221-1) is provided on the front side of the portion connected to the 1-2 line 222 of the first-first line (221) or In addition, the front side and the rear side may be modified in various ways, including one formed each.

That is, the valve 221-1 regulates the flow of the ultrapure water used as the carrier of the first-second line 222, and primarily controls the flow of the ultrapure water discharged on the first-first line 221. The carrier may be supplied by using the pressure by the closing of the valve 221-1.

2, 3, and 5 illustrate an example in which a first flow rate controller 223 separate from the valve 221-1 is formed in the first-second line 222.

In this case, the first flow controller 223 may use one selected from a pump, a mass flow controller (MFC), a solenoid valve, an orifice, and a regulator.

3 is the same as that shown in FIG. 2, but the filter 224 is disposed on the rear side of the first flow controller 223 in the carrier flow direction of the first-second line 222. The more provided form is shown.

The filter 224 is configured to prevent contaminants from being contained in the carrier while passing through the first flow controller 223 as the carrier is supplied by the first flow controller 223.

That is, the ultra-pure water online monitoring system 1000 of the present invention is provided with a position and various forms provided that the first flow rate controller 223 controls the flow of the ultrapure water used as a carrier and controls the supply amount. It can be formed as.

6 illustrates an example in which the carrier supply unit 220 includes a storage unit 225, a second line 226, and a second flow rate control unit 227.

The storage unit 225 is a portion in which a material usable as a carrier is stored, and is a portion in which an ultrapure water solution or an inert gas is stored separate from the ultrapure water solution passing through the ultrapure water inflow line 100.

The second line 226 is configured to connect the storage unit 225 and the sample injection unit 200, and supplies a fixed quantity of carriers stored in the storage unit 225 by the second flow controller 227.

In addition, the ultra-pure water online monitoring system 1000 of the present invention is the carrier supply unit 220 is connected to the ultra-pure water inflow line 100, the ultra-pure water is used as a carrier and the storage unit 225 stored inert gas Each of the forms using can be formed. (See Figures 8 and 9)

In this case, as shown in FIG. 9, the sample loop 210 includes a third section in which the ultrapure water sample transferred to the concentrating unit 300 is located, and an ultrapure used as a sample and a carrier of the third section. Between the aqueous solution may include a fourth section in which the inert gas supplied through the second flow control unit 227 is located.

That is, the inert gas of the fourth section can form a buffer section between the ultrapure water solution used as the carrier and the ultrapure water solution as the sample, and the analysis reliability by mixing the ultrapure water solution used as the carrier and the ultrapure water solution as the sample. The problem that can be lowered can be prevented in advance.

In addition, the sample injection unit 200 may be further provided with a standard solution supply unit 230 (see FIGS. 4 to 6).

In this case, the standard solution supply unit 230 may include a standard solution storage unit 231, a third line 232, and a third flow rate control unit 233.

The standard solution supply unit 230 is a configuration for supplying the standard solution for the concentration rate evaluation and calibration of the concentration unit 300 to the sample injection unit 200, the standard solution introduced into the sample injection unit 200 The third flow control unit 233 is supplied to the concentration unit 300 by the operation.

The standard solution storage unit 231 is a portion in which the standard solution is stored, may be provided with one or more standard solutions, and shown in Figures 4 to 6 and 8 three standard solutions are used.

The third line 232 is a portion connecting the standard solution storage unit 231 and the sample injecting unit 200. The shapes shown in FIGS. 4 to 6 and 8 are on the third line 232. The third flow rate control unit 233 is provided to adjust the supply amount of the standard solution, and in the form shown in FIG. 10, the third flow rate control unit 233 is the sample injection unit 200 and the concentrating unit ( The shape provided between 300) is shown.

In addition, the standard solution is preferably transferred to the concentrating unit 300 through a separate standard solution loop 234 so as not to be mixed with the ultrapure water solution (sample).

That is, the shape shown in FIG. 10 shows the third flow rate control part 233 located behind the standard solution loop 234 in the standard solution flow direction.

Since the standard solution loop 234 is formed separately from the sample loop 210, the ultrapure solution online monitoring system 1000 of the present invention may not be in contact with a sample to prevent contamination, and the sample injection amount and the standard solution injection amount may be reduced. There is an advantage in that the concentration can be quantified by changing the analysis.

The concentrator 300 is configured to desorb the concentrated analyte by mixing the sample supplied through the sample injector 200 and the eluent supplied through the eluent supply unit 310.

In the present invention, the sample supplied to the concentrating unit 300 through the sample injecting unit 200 means an ultrapure water or standard solution to be analyzed.

The eluent supply unit 310 may include an eluent storage unit 311, a fourth line 312, and a fourth flow rate controller 313.

The eluent storage unit 311 is a space in which the eluent is stored, and the fourth line 312 connects the eluent storage unit 311 and the concentrator 300, and is formed on the fourth line 312. Four flow rate controller 313 is provided to adjust the supply amount of the eluent.

The concentration unit 300 is concentrated in the concentrated column 301 ultrapure water or standard solution to be analyzed, and desorbs the sample to be analyzed by the eluent supplied through the eluent supply unit 310.

The analysis unit 400 is a configuration for quantitatively analyzing an analysis target sample supplied through the enrichment unit 300.

The analysis unit 400 is a means for receiving an analysis target sample through the enrichment unit 300, and selecting from IC, IC-MS, ICP-MS, AAS, HPLC, UV, fluorescence spectroscopy, electrochemical method Can be analyzed using either method.

On the other hand, the ultra-pure water online monitoring system 1000 of the present invention can be formed larger than the capacity of the sample loop 210 of the sample supply capacity.

That is, a space in which the ultrapure water solution or carrier can be stored inside the sample loop 210 is made larger than the set supply capacity of the sample, thereby serving as a buffer layer between the sample and the carrier to be supplied to the concentrator 300. Intervals are formed.

FIG. 7 is a view illustrating a case in which the sample loop 210 is elongated in the longitudinal direction, and illustrates a state immediately before the ultrapure water solution is supplied to the concentrating unit 300.

At this time, the ultrapure water in the sample loop 210 forms a first section and a second section.

The first section means an area in which the sample to be transferred to the concentrating unit 300 in the longitudinal direction of the sample loop 210 is located, the second section of the ultrapure water in the sample loop 210, It means the area where the ultrapure water solution except the sample is located.

The second section is a portion for preventing direct contact between the sample supplied to the concentrate and the carrier to prevent degradation of analysis reliability caused by mixing the carrier and the sample.

For example, when the supply volume of the sample is 10 ml, the volume of the sample loop 210 is formed to be 10 + α ml, the sample of the 10 ml in the sample loop 210 is the first section of the α ml forms the second section.

Accordingly, the ultrapure water online monitoring system 1000 of the present invention can analyze the contamination state of the ultrapure water in real time and has an advantage of increasing reliability.

In particular, the ultra-pure water online monitoring system 1000 of the present invention is formed by the second carrier (buffer section) is formed between the carrier and the sample to be injected and the volume of the sample loop 210 is formed larger than the capacity of the sample by the carrier There is an advantage to prevent the contamination of.

It will be understood by those skilled in the art that various changes in form and details may be made therein without departing from the spirit and scope of the invention as defined by the appended claims. It goes without saying that various modifications can be made.

1000: Ultrapure water online monitoring system
100: Ultrapure water inflow line
200: sample injection unit 210: sample loop
220: carrier supply unit 221: line 1-1
221-1: Valve
222: line 1-2, 223: first flow control unit
224 filter
225: storage unit 226: second line
227: second flow control unit
230: standard solution supply unit 231: standard solution storage unit
232: third line 233: third flow control unit
234: Standard solution loop
300: concentration section 301: concentration column
310: eluent supply unit 311: eluent storage unit
312: fourth line 313: fourth flow control unit
400: Analytical Department

Claims (13)

The ultrapure water solution inlet line 100 is connected to the sample loop 210 is introduced, the carrier of the sample supply unit 220 is supplied to the sample loop 210 through the carrier supply unit 220 to inject a sample of the quantitative amount );
A concentrator 300 for mixing the sample supplied through the sample injector 200 and the eluent supplied through the eluent supply unit 310 to desorb the sample to be analyzed; And
An analysis unit 400 for quantitatively analyzing an analysis target sample supplied through the concentration unit 300; , ≪ / RTI &
Ultrapure solution online monitoring system, characterized in that the capacity of the sample loop 210 is more than the supply capacity of the sample.
The method of claim 1,
The sample loop 210 is
Ultra-pure solution online, characterized in that it comprises a first section in which the sample to be transferred to the concentrator 300 is located, a second section in which the ultrapure water except the sample is located between the sample and the carrier of the first section. Monitoring system.
The method of claim 1,
The carrier supply unit 220
A first-first line 221 branched from the ultrapure water inflow line 100 to move the ultrapure water solution, and
A first-second line 222 connecting the first-first line 221 and the sample injector 200;
Ultra-pure water online monitoring system comprising a first flow rate control unit (223) for controlling the flow of the ultra-pure water used as a carrier.
The method of claim 3,
The carrier supply unit 220
The first flow rate controller 223 is provided in the first-second line 222 and the filter 224 in the rear side of the first flow rate controller 223 in the carrier flow direction of the first-second line 222. Ultra-pure solution online monitoring system, characterized in that is further provided.
The method of claim 1,
The carrier supply unit 220
A storage unit 225 in which a carrier is stored,
A second line 226 connecting the storage unit 225 and the sample injection unit 200;
Ultra-pure solution online monitoring system comprising a second flow control unit (227) for controlling the flow of the carrier.
The method of claim 3,
The carrier supply unit 220
A storage unit 225 in which a carrier is stored,
A second line 226 connecting the storage unit 225 and the sample injection unit 200;
A second flow rate controller 227 provided in the second line 226 to control the flow of carriers;
Carrier stored in the storage unit 225 is an ultra-pure water online monitoring system, characterized in that the inert gas.
The method according to claim 6,
The sample loop 210 is
A third section in which the sample to be transferred to the concentrating unit 300 is located,
And a fourth section in which the inert gas supplied through the second flow controller 227 is located between the sample and the carrier of the third section.
The method of claim 1,
The ultrapure water online monitoring system 1000
The standard solution supply unit 230 for supplying the standard solution to the sample injection unit 200 is further provided,
Ultra-pure solution online monitoring system, characterized in that the standard solution supplied to the sample injection unit 200 is supplied to the concentration unit 300.
9. The method of claim 8,
The standard solution supply unit 230
A standard solution storage unit 231 for storing a standard solution,
A third line 232 connecting the standard solution storage part and the sample injection part 200;
Ultra-pure solution online monitoring system, characterized in that it comprises a third flow rate control unit 233 is provided in the third line (232) to supply a standard solution.
10. The method of claim 9,
The sample injector 200
The standard solution supplied through the standard solution supply unit 230 is transferred, and the carrier of the quantity is supplied to the sample loop 210 through the carrier supply unit 220 to supply the standard solution of the quantity to the concentrating unit 300. Ultrapure solution online monitoring system that the standard solution loop 234 is formed.
The method of claim 1,
The eluent supply unit 310
An eluent storage unit 311 storing the eluent;
A fourth line 312 connecting the eluent storage part 311 and the concentration part 300;
Ultra-pure water online monitoring system, characterized in that it comprises a fourth flow rate control unit (313) provided in the fourth line (312) for supplying the eluent.
The method according to any one of claims 1 to 11,
The ultrapure water online monitoring system 1000
Ultrapure water is continuously introduced into the sample loop 210 through the ultrapure water inflow line 100,
Ultra-pure water online monitoring system, characterized in that the ultra-pure water that is not transferred to the concentration unit 300 is discharged.
The ultrapure water is connected to the transfer pipe through which the ultrapure water is transferred or the storage unit in which the ultrapure water is stored and the ultrapure water inflow line 100 so that the ultrapure water is introduced into the sample loop 210, and the carrier of the quantity is supplied through the carrier supply 220. A sample injecting unit 200 which is supplied to the sample loop 210 to inject a quantitative ultrapure water sample;
A concentrator 300 for mixing the sample supplied through the sample injector 200 and the eluent supplied through the eluent supply unit 310 to desorb the sample to be analyzed; And
An analysis unit 400 for quantitatively analyzing an analysis target sample supplied through the concentration unit 300; , ≪ / RTI &
The carrier supply unit 220 includes a first line branched from the ultrapure water inflow line 100 to move the ultrapure water and a first flow controller 223 to supply the ultrapure water in the first line. Ultra-pure water online monitoring system, characterized in that the aqueous solution is used as a carrier.
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KR101548632B1 (en) 2015-03-12 2015-08-31 엔비스아나(주) Apparatus For Analyzing Substrate Contamination And Method Thereof
WO2016144107A1 (en) * 2015-03-12 2016-09-15 엔비스아나(주) Substrate contaminant analysis device and substrate contaminant analysis method
KR20160109993A (en) * 2015-03-12 2016-09-21 엔비스아나(주) Apparatus For Analyzing Substrate Contamination And Method Thereof
KR101809702B1 (en) * 2016-07-26 2017-12-15 엔비스아나(주) On-line Contamination Monitoring System and Method using it
CN107845585A (en) * 2016-09-20 2018-03-27 非视觉污染分析科学技术有限公司 On-line monitoring oil contamination system and method
KR101848233B1 (en) 2015-08-31 2018-04-16 주식회사 위드텍 Gas monitoring system that automatically compensate for water

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