KR101344817B1 - Apparatus for reticle having function for inspecting pellicle frame - Google Patents

Apparatus for reticle having function for inspecting pellicle frame Download PDF

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Publication number
KR101344817B1
KR101344817B1 KR1020130090116A KR20130090116A KR101344817B1 KR 101344817 B1 KR101344817 B1 KR 101344817B1 KR 1020130090116 A KR1020130090116 A KR 1020130090116A KR 20130090116 A KR20130090116 A KR 20130090116A KR 101344817 B1 KR101344817 B1 KR 101344817B1
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KR
South Korea
Prior art keywords
optical system
reticle
pellicle frame
image
assembly
Prior art date
Application number
KR1020130090116A
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Korean (ko)
Inventor
박범수
유경진
김경민
김성수
안두백
Original Assignee
에이티아이 주식회사
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Priority to KR1020130090116A priority Critical patent/KR101344817B1/en
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Publication of KR101344817B1 publication Critical patent/KR101344817B1/en

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/10—Measuring as part of the manufacturing process
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/30—Structural arrangements specially adapted for testing or measuring during manufacture or treatment, or specially adapted for reliability measurements
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G01N2021/8822—Dark field detection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G01N2021/8854—Grading and classifying of flaws
    • G01N2021/888—Marking defects

Abstract

The reticle inspector 1000 according to the present invention may include a first optical system 100 that primarily acquires a reference image with respect to the reticle assembly 10 that is an inspection object; And a second optical system 200 disposed at a side of the first optical system 100 and obtaining an image secondary to the reticle assembly 10 from which the reference image is obtained. It may be desirable for the 200 to allow the light source to be incident in an inclined state with respect to the reticle assembly 10.

Description

Reticle checker with pellicle frame inspection {APPARATUS FOR RETICLE HAVING FUNCTION FOR INSPECTING PELLICLE FRAME}

The present invention relates to a reticle inspector, and more particularly, to an inspector having an inspection function of a pellicle frame defect.

The use of reticles is essential in the photo process employed in semiconductor manufacturing. The reticle is used as a mask for pattern formation when exposing a wafer coated with a photoresist in a semiconductor photo process.

The reticle has a pattern to be transferred to the wafer. If dirt accumulates or particles are separated on this pattern surface, this results in defects in the pattern transferred to the wafer. Therefore, the reticle is used by covering the pattern surface with a pellicle, which is an organic membrane protective film, to prevent particle adsorption on the pattern surface.

On the other hand, the pellicle is generally composed of a pellicle frame which is placed on top of the reticle surface to prevent foreign matter or contamination on the reticle surface and the pellicle frame for supporting the pellicle film.

If foreign matter or dust on the inside of the pellicle frame covered with the pellicle film floats and adheres to the surface of the reticle, the pellicle frame should be inspected. There is a limit.

More specifically, referring to the pellicle frame surface inspection method disclosed in the literature is as follows. Korean Patent No. 10-0522912 discloses the inspection of the surface of the pellicle frame by irradiating light from a light source to the inspection portion of the pellicle frame submerged in water and enlarging the inspection portion of the pellicle frame with an enlargement mechanism. However, specifically, in that the surface inspection should be performed using a separate inspection solution such as water, there is a problem in that there is a shortage in determining the foreign matter attached to the pellicle frame quickly using only the optical system.

In order to solve the above problems, the pellicle frame is defective by using a second optical system that is inclined differently from the first optical system after locating the pellicle frame with the primary optical system. An object of the present invention is to provide a reticle inspector having a pellicle frame inspection function for acquiring inspection images.

The present invention includes a first optical system 100 for primarily obtaining a reference image for the reticle assembly 10 that is an inspection object; And a second optical system 200 disposed at a side of the first optical system 100 and obtaining an image secondary to the reticle assembly 10 from which the reference image is obtained. 100 includes a first imaging unit 110 and a first optical lens 120 connected to the first imaging unit 110, and the second optical system 200 includes a second imaging unit 210 and the And a second optical lens 220 connected to a second imaging unit 210, wherein the second optical system 200 is configured to acquire an image by entering a light source in an inclined state with respect to the reticle assembly 10. It relates to a reticle checker 1000 characterized in.

In addition, the reticle assembly 10 of the present invention includes a reticle 11, a pellicle frame 13 disposed on the upper surface of the reticle 11, and a pellicle 15 disposed on the pellicle frame 13. The first optical system 100 allows the light source to be incident perpendicularly to the reticle assembly 10, and the second optical system 200 allows the light source to be incident in an inclined state with respect to the side surface of the pellicle frame 13. It is characterized by.

In addition, the reticle inspector 1000 of the present invention includes a linear motor system 400 for moving the reticle assembly 10 to the bottom of the first optical system 100 and the second optical system 200, the linear motor system ( 400 passes the reticle assembly 10 at a constant speed under the first optical system 100 so that the first optical system 100 acquires an image of the reticle assembly 10, and the linear motor system 400 The reticle assembly 10 may be stopped under the second optical system 200, and the second optical system 200 may move upward and downward to acquire a side image of the pellicle frame 13 of the reticle assembly 10.

In addition, the linear motor system 400 of the present invention includes a boat 500 for setting the position of the reticle assembly 10, wherein the linear motor system 400 is a reticle assembly 10 under the second optical system 200. The second optical system 200 moves up and down after acquiring the image of one surface 13a of the pellicle frame 13 of the reticle assembly 10 after the movement of the second optical system 200 stops, and the boat 500 then moves the reticle. The assembly 10 may be rotated 90 degrees and the second optical system 200 may move up and down to acquire an image of the other surface 13b of the pellicle frame 13.

In addition, the rotation of the boat 500 and the vertical movement of the second optical system 200 proceed sequentially, and the second optical system 200 captures images of the remaining surfaces 13c and 13d of the pellicle frame 13. Can be acquired.

In addition, the position of the pellicle frame 13 of the present invention may be grasped by the first optical system 100 or the second optical system 200.

The reticle inspector having a pellicle frame inspection function according to the present invention obtains a first image with a first optical system that is perpendicular to the pellicle, grasps the position of the pellicle frame, and is arranged at a different angle from the first optical system. The lens and the camera are erected at an angle using the optical system, and the defective area of the pellicle frame is confirmed by acquiring the second image using the focused portion.

In addition, the present invention reduces the possibility of process defects by detecting even the small size of foreign matter attached to the pellicle frame on a consistent basis by automating the inspection that has been done by humans.

In addition, the present invention can reduce the non-inspection area by inspecting even the corner portion of the frame, which was difficult to inspect by the human eye.

1 is a plan view of a reticle assembly to be inspected of the present invention.
Figure 2 is a perspective view showing a reticle inspector with a pellicle frame inspection function according to an embodiment of the present invention.
3 is a view showing the configuration of a second optical system of the reticle inspector according to an embodiment of the present invention,
4 is a conceptual diagram illustrating a process of acquiring an image of a pellicle frame by a second optical system of the reticle inspector according to the present invention.

The above objects, features and other advantages of the present invention will become more apparent by describing the preferred embodiments of the present invention in detail with reference to the accompanying drawings. Hereinafter, a reticle inspector having a pellicle frame inspection function according to an embodiment of the present invention will be described in detail with reference to the accompanying drawings.

The present invention is for the purpose of inspecting the adhesion of foreign matter, such as reticle and pellicle frame used in the photo process adopted in the semiconductor manufacturing, but is not limited to this, it can be applied to other objects or structures expected to attach foreign matter in addition to the semiconductor process. Can be.

If necessary, the reticle checker according to the present invention may be manufactured in one piece or separately. In addition, some components may be omitted depending on the usage pattern.

Pellicle  With frame inspection function Reticle  Overall structure of the inspector 1000

1 illustrates a reticle assembly 10 that is an inspection object of the present invention, wherein the reticle assembly 10 is a reticle 11 disposed at the lowermost portion, and a pellicle frame disposed in the form of a rectangular frame on an upper surface of the reticle 11 ( 13 and a pellicle 15 disposed on the pellicle frame 13.

2 and 3, the overall structure of the reticle checker 1000 according to the present invention.

The reticle inspector 1000 is disposed in parallel with the first optical system 100 and the first optical system 100 for inspecting the reticle 11 and the pellicle 15 of the reticle assembly 10, which is the inspection object, and the reticle assembly 10. And a second optical system 200 for inspecting the pellicle frame 13.

The reticle assembly 10, which is inspected by the reticle inspector 1000, is inspected by sequentially moving the lower portions of the first optical system 100 and the second optical system 200, and the moving process is, for example, a linear motor. A boat 400 overlying the system 400 and the linear system 400 may be used, but is not limited to such means that any means for transporting the reticle assembly 10 without oscillation are acceptable.

The linear motor system 400 is provided with a boat 500 for carrying the reticle assembly 10 and the boat 500 passes through the first optical system position at a constant speed in the linear motor system 400 at the second optical system position. Stop

The first optical system 100 includes a first imaging unit 110 and a first optical lens 120 connected to the first imaging unit 110.

The first optical system 100 receives light in a vertical direction with respect to the plane on which the reticle assembly 10 is placed, and is obtained as a vertical image image of the reticle assembly 10 moving at a constant speed.

The vertically acquired image is transmitted to the image processing system to check whether the reticle 11 and the pellicle 15 which are planar images of the reticle assembly 10 are defective.

The boat 500 of the linear motor system 400 stops at the second optical system position after passing the first optical system 100 at a constant speed and the defect of the pellicle frame 13 of the reticle assembly 10 at the second optical system position. Whether it is checked

The second optical system 200 includes a second imaging unit 210 and a second optical lens 220 connected to the second imaging unit 210, and the second optical system 200 is the second optical system 200. It includes a vertical transfer unit 230 for vertically transferring.

In FIG. 4, the second optical system 200 is disposed to form a predetermined inclination with the pellicle frame 13.

Specifically, the irradiation light B irradiated along the extension line connecting the second imaging unit 210 and the second optical lens 220 is incident at a constant angle with the side surface of the pellicle frame 13.

The optical system 200 moves vertically as shown by arrow A and photographs the side surface of the pellicle frame 13 which is erected perpendicularly to the reticle 11.

As shown in FIG. 1, since the pellicle frame 13 is formed surrounding the rectangular frame on the surface of the reticle 11, the boat 500 stopped at the second optical system position needs to rotate.

That is, when the second optical system 200 moves up and down to acquire an image of the pellicle frame 13 of the reticle assembly 10 on the boat 500 stopped at the second optical system position, one side 13a of the rectangular frame is moved. Obtain an image for the frame of.

Therefore, after the second optical system 200 moves up and down to obtain an image of one side 13a of the pellicle frame 13, the boat 500 is rotated 90 degrees to rotate the reticle assembly 10 degrees 90 degrees. Afterwards, the second optical system vertically moves to acquire an image of the other surface 13b of the rectangular frame of the pellicle frame 13.

As such, the boat 500 is sequentially rotated and the second optical system 200 is moved up and down to acquire images of the remaining surfaces 13c and 13d of the pellicle frame 13 and transmit the acquired images to the image processing system. Read whether or not.

As described above, in the present invention, a line scan camera is used as the first and second photographing units, and the present invention is also applicable to other image capturing systems.

The second optical lens 220 in the second optical system 200 may be disposed to be inclined at 45 degrees with respect to the surface of the reticle assembly 10.

In the present invention, in order to inspect the pellicle frame 13, after confirming the position of the frame, the second optical system 200 moves up and down to acquire an image of the pellicle frame 13, wherein the frame position is the first optical system ( When the reticle 11 and the pellicle 15 of the reticle assembly 10 are inspected at 100 and the boat reaches the second optical system position after acquiring the position of the pellicle frame 13, the second optical system as shown in FIG. 4. The side image of the pellicle frame 13 may be acquired by moving 200 up and down.

In addition, after the second optical system 200 acquires the position of the pellicle frame 13 placed on the boat 500 stopped at the second optical system position, the second optical system 200 moves up and down to move the side of the pellicle frame 13. An image can be obtained.

This is because the position of the pellicle frame 13 at the second optical system position may change because the position of the reticle assembly 10 may change until the boat 500 stops at the second optical system position after passing through the first optical system 100. After obtaining the second optical system 200 to inspect the side of the pellicle frame (13).

The second optical system 200 inspects the pellicle frame 13 and the first optical system 100 inspects the reticle 11 and the pellicle 13 that require more precise inspection than the pellicle frame 13. 200 may use a low resolution camera as compared to the first optical system 100.

Therefore, after determining the position of the pellicle frame 13 in the second optical system 200 having a high processing speed, inspecting the side surfaces 13a, 13b, 13c, and 13d of the pellicle frame 13 can be performed more quickly.

The reticle inspector 1000 further includes a height sensor 310 and an inspection optical system 320 between the first optical system 100 and the second optical system 100. The height sensor 310 allows the reticle assembly 10 to focus by checking the height variation during the process of transferring the first and second optical systems 100 and 200.

The inspection optical system 320 functions to check whether the image is an appropriate image with respect to the first image acquired through the first optical system 100.

10: reticle assembly
11: reticle
13: pellicle frame
15: pellicle
100: first optical system
110: first imaging unit
120: first optical lens
200: first optical system
210: first imaging unit
220: first optical lens
310: height sensor
320: inspection optical system

Claims (6)

delete delete A first optical system 100 configured to acquire a reference image primarily with respect to the reticle assembly 10 as an inspection object; And
It is disposed on the side of the first optical system 100, the second optical system 200 for acquiring an image secondary to the reticle assembly 10 obtained the reference image;
The first optical system 100 includes a first imaging unit 110 and a first optical lens 120 connected to the first imaging unit 110, and the second optical system 200 includes a second imaging unit ( 210 and a second optical lens 220 connected to the second imaging unit 210,
The second optical system 200 is incident to the light source in an inclined state with respect to the reticle assembly 10 to obtain an image,
The reticle assembly 10 includes a reticle 11, a pellicle frame 13 disposed on the top surface of the reticle 11, and a pellicle 15 disposed on the pellicle frame 13.
The first optical system 100 causes the light source to be incident perpendicularly to the reticle assembly 10, and the second optical system 200 causes the light source to be incident in an inclined state with respect to the side surface of the pellicle frame 13. ,
The reticle inspector 1000 includes a linear motor system 400 for moving the reticle assembly 10 to the bottom of the first optical system 100 and the second optical system 200,
The linear motor system 400 passes the reticle assembly 10 at a constant speed under the first optical system 100 so that the first optical system 100 acquires an image of the reticle assembly 10,
The linear motor system 400 stops the reticle assembly 10 under the second optical system 200 and the second optical system 200 acquires a side image of the pellicle frame 13 of the reticle assembly 10. Reticle Inspector (1000). The method of claim 3,
The linear motor system 400 includes a boat 500 for positioning the reticle assembly 10,
Under the second optical system 200, the linear motor system 400 stops transporting the reticle assembly 10, and then the second optical system 200 moves up and down so that one side of the pellicle frame 13 of the reticle assembly 10 is moved. After obtaining the image of the surface 13a, the boat 500 rotates the reticle assembly 10 by 90 degrees and the second optical system 200 is moved up and down to the other side of the pellicle frame 13 ( 13b) to obtain the image of the reticle checker (1000). 5. The method of claim 4,
Rotation of the boat 500 and vertical movement of the second optical system 200 proceed sequentially, and the second optical system 200 acquires images of the remaining surfaces 13c and 13d of the pellicle frame 13. Reticle checker (1000). The method according to any one of claims 3 to 5,
The position of the pellicle frame (13) is a reticle inspector (1000), characterized in that determined in the first optical system (100) or the second optical system (200).
KR1020130090116A 2013-07-30 2013-07-30 Apparatus for reticle having function for inspecting pellicle frame KR101344817B1 (en)

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Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101533826B1 (en) * 2014-07-17 2015-07-06 (주)오로스 테크놀로지 Surface defect inspection apparatus
KR20160010386A (en) 2015-11-18 2016-01-27 (주)오로스 테크놀로지 Surface defect inspection apparatus
KR101808508B1 (en) * 2016-05-16 2018-01-18 에이티아이 주식회사 Method for inspecting recticle using histogram filter and a device thereof
KR20180113830A (en) * 2017-04-07 2018-10-17 에이티아이 주식회사 Optical element inspection apparatus
KR20190100616A (en) * 2018-02-21 2019-08-29 (주)오로스 테크놀로지 Surface defect inspection apparatus
KR20200088529A (en) 2019-01-14 2020-07-23 주식회사 에프에스티 Inspection system for extreme ultra violet lithography pellicle

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001183301A (en) * 1999-12-27 2001-07-06 Hitachi Electronics Eng Co Ltd Apparatus and method for inspecting flaw
JP2010048587A (en) 2008-08-20 2010-03-04 Hitachi High-Technologies Corp Pattern defect inspecting device and method

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001183301A (en) * 1999-12-27 2001-07-06 Hitachi Electronics Eng Co Ltd Apparatus and method for inspecting flaw
JP2010048587A (en) 2008-08-20 2010-03-04 Hitachi High-Technologies Corp Pattern defect inspecting device and method

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101533826B1 (en) * 2014-07-17 2015-07-06 (주)오로스 테크놀로지 Surface defect inspection apparatus
KR20160010386A (en) 2015-11-18 2016-01-27 (주)오로스 테크놀로지 Surface defect inspection apparatus
KR101659587B1 (en) 2015-11-18 2016-09-23 (주)오로스테크놀로지 Surface defect inspection apparatus
KR101808508B1 (en) * 2016-05-16 2018-01-18 에이티아이 주식회사 Method for inspecting recticle using histogram filter and a device thereof
KR20180113830A (en) * 2017-04-07 2018-10-17 에이티아이 주식회사 Optical element inspection apparatus
KR101970060B1 (en) 2017-04-07 2019-04-17 에이티아이 주식회사 Optical element inspection apparatus
KR20190100616A (en) * 2018-02-21 2019-08-29 (주)오로스 테크놀로지 Surface defect inspection apparatus
KR102119492B1 (en) * 2018-02-21 2020-06-08 주식회사 에프에스티 Surface defect inspection apparatus
KR20200088529A (en) 2019-01-14 2020-07-23 주식회사 에프에스티 Inspection system for extreme ultra violet lithography pellicle

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