KR101330784B1 - Polymer having low molecular weight, preparing method thereof, optical resin composition comprising the same, and optical sheet thereof for display - Google Patents
Polymer having low molecular weight, preparing method thereof, optical resin composition comprising the same, and optical sheet thereof for display Download PDFInfo
- Publication number
- KR101330784B1 KR101330784B1 KR1020080003731A KR20080003731A KR101330784B1 KR 101330784 B1 KR101330784 B1 KR 101330784B1 KR 1020080003731 A KR1020080003731 A KR 1020080003731A KR 20080003731 A KR20080003731 A KR 20080003731A KR 101330784 B1 KR101330784 B1 KR 101330784B1
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- South Korea
- Prior art keywords
- acid
- group
- series
- acetic acid
- formula
- Prior art date
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- 230000003287 optical effect Effects 0.000 title claims abstract description 43
- 229920000642 polymer Polymers 0.000 title claims abstract description 22
- 239000011342 resin composition Substances 0.000 title claims abstract description 19
- 238000000034 method Methods 0.000 title claims abstract description 9
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims abstract description 4
- 150000001875 compounds Chemical class 0.000 claims description 20
- 239000002253 acid Substances 0.000 claims description 19
- -1 amine compound Chemical class 0.000 claims description 16
- 125000004432 carbon atom Chemical group C* 0.000 claims description 13
- 125000000217 alkyl group Chemical group 0.000 claims description 10
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical class OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 9
- 239000012963 UV stabilizer Substances 0.000 claims description 9
- 150000001412 amines Chemical class 0.000 claims description 9
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims description 9
- 238000004519 manufacturing process Methods 0.000 claims description 9
- 229940083124 ganglion-blocking antiadrenergic secondary and tertiary amines Drugs 0.000 claims description 8
- 150000003242 quaternary ammonium salts Chemical class 0.000 claims description 8
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical class CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 claims description 8
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 7
- 239000000126 substance Substances 0.000 claims description 7
- QZPSOSOOLFHYRR-UHFFFAOYSA-N 3-hydroxypropyl prop-2-enoate Chemical compound OCCCOC(=O)C=C QZPSOSOOLFHYRR-UHFFFAOYSA-N 0.000 claims description 6
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 claims description 6
- 150000001242 acetic acid derivatives Chemical class 0.000 claims description 6
- 125000003545 alkoxy group Chemical group 0.000 claims description 6
- 239000012948 isocyanate Substances 0.000 claims description 6
- 229910052736 halogen Inorganic materials 0.000 claims description 5
- 150000002367 halogens Chemical class 0.000 claims description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 5
- 150000003016 phosphoric acids Chemical class 0.000 claims description 5
- GNSFRPWPOGYVLO-UHFFFAOYSA-N 3-hydroxypropyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCCO GNSFRPWPOGYVLO-UHFFFAOYSA-N 0.000 claims description 4
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 claims description 4
- WETWJCDKMRHUPV-UHFFFAOYSA-N acetyl chloride Chemical class CC(Cl)=O WETWJCDKMRHUPV-UHFFFAOYSA-N 0.000 claims description 3
- 125000003158 alcohol group Chemical group 0.000 claims description 3
- 229910052739 hydrogen Inorganic materials 0.000 claims description 3
- 239000001257 hydrogen Substances 0.000 claims description 3
- 230000003472 neutralizing effect Effects 0.000 claims description 3
- WNXTZVMMNCCZTP-UHFFFAOYSA-N 2-hydroxyethyl 2-methylprop-2-enoate 5-hydroxy-2-methylpent-2-enoic acid Chemical compound OCCC=C(C(=O)O)C.C(C(=C)C)(=O)OCCO WNXTZVMMNCCZTP-UHFFFAOYSA-N 0.000 claims description 2
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 claims description 2
- IPGXHRDWHJEWBI-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate;4-hydroxy-2-methylidenebutanoic acid Chemical compound OCCOC(=O)C=C.OCCC(=C)C(O)=O IPGXHRDWHJEWBI-UHFFFAOYSA-N 0.000 claims description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims description 2
- WJGAPUXHSQQWQF-UHFFFAOYSA-N acetic acid;hydrochloride Chemical class Cl.CC(O)=O WJGAPUXHSQQWQF-UHFFFAOYSA-N 0.000 claims description 2
- 150000008062 acetophenones Chemical class 0.000 claims description 2
- 150000008366 benzophenones Chemical class 0.000 claims description 2
- SXDBWCPKPHAZSM-UHFFFAOYSA-N bromic acid Chemical compound OBr(=O)=O SXDBWCPKPHAZSM-UHFFFAOYSA-N 0.000 claims description 2
- DENRZWYUOJLTMF-UHFFFAOYSA-N diethyl sulfate Chemical compound CCOS(=O)(=O)OCC DENRZWYUOJLTMF-UHFFFAOYSA-N 0.000 claims description 2
- 229940008406 diethyl sulfate Drugs 0.000 claims description 2
- VAYGXNSJCAHWJZ-UHFFFAOYSA-N dimethyl sulfate Chemical compound COS(=O)(=O)OC VAYGXNSJCAHWJZ-UHFFFAOYSA-N 0.000 claims description 2
- 229960002050 hydrofluoric acid Drugs 0.000 claims description 2
- 239000000178 monomer Substances 0.000 claims description 2
- QVLTXCYWHPZMCA-UHFFFAOYSA-N po4-po4 Chemical compound OP(O)(O)=O.OP(O)(O)=O QVLTXCYWHPZMCA-UHFFFAOYSA-N 0.000 claims description 2
- CBXWGGFGZDVPNV-UHFFFAOYSA-N so4-so4 Chemical compound OS(O)(=O)=O.OS(O)(=O)=O CBXWGGFGZDVPNV-UHFFFAOYSA-N 0.000 claims description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims 2
- 125000002768 hydroxyalkyl group Chemical group 0.000 claims 2
- USQNCFXGTTYZNF-UHFFFAOYSA-N 2,2,2-trichloroacetic acid Chemical compound OC(=O)C(Cl)(Cl)Cl.OC(=O)C(Cl)(Cl)Cl USQNCFXGTTYZNF-UHFFFAOYSA-N 0.000 claims 1
- CPKUDYUJOXRCAJ-UHFFFAOYSA-N 2-chloroacetic acid Chemical compound OC(=O)CCl.OC(=O)CCl CPKUDYUJOXRCAJ-UHFFFAOYSA-N 0.000 claims 1
- DLGVPCSHDLBAKK-UHFFFAOYSA-N OCl(=O)=O.OS(O)(=O)=O Chemical group OCl(=O)=O.OS(O)(=O)=O DLGVPCSHDLBAKK-UHFFFAOYSA-N 0.000 claims 1
- YBCVMFKXIKNREZ-UHFFFAOYSA-N acoh acetic acid Chemical compound CC(O)=O.CC(O)=O YBCVMFKXIKNREZ-UHFFFAOYSA-N 0.000 claims 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 claims 1
- 150000003918 triazines Chemical class 0.000 claims 1
- 239000002216 antistatic agent Substances 0.000 abstract description 6
- 230000003068 static effect Effects 0.000 abstract description 6
- 230000005611 electricity Effects 0.000 abstract description 5
- 125000000524 functional group Chemical group 0.000 abstract description 5
- 239000002952 polymeric resin Substances 0.000 abstract description 5
- 229920003002 synthetic resin Polymers 0.000 abstract description 5
- 230000007547 defect Effects 0.000 abstract description 3
- 239000000203 mixture Substances 0.000 abstract description 3
- 238000011109 contamination Methods 0.000 abstract 1
- 238000004394 yellowing prevention Methods 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 description 23
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 7
- 230000001747 exhibiting effect Effects 0.000 description 7
- 239000000326 ultraviolet stabilizing agent Substances 0.000 description 6
- 239000003085 diluting agent Substances 0.000 description 5
- 238000004383 yellowing Methods 0.000 description 5
- 229940031098 ethanolamine Drugs 0.000 description 4
- 150000002513 isocyanates Chemical class 0.000 description 4
- 150000003141 primary amines Chemical class 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 229920002818 (Hydroxyethyl)methacrylate Polymers 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- 239000005057 Hexamethylene diisocyanate Substances 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 3
- 239000012965 benzophenone Substances 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 125000001424 substituent group Chemical group 0.000 description 3
- YXRKNIZYMIXSAD-UHFFFAOYSA-N 1,6-diisocyanatohexane Chemical compound O=C=NCCCCCCN=C=O.O=C=NCCCCCCN=C=O.O=C=NCCCCCCN=C=O YXRKNIZYMIXSAD-UHFFFAOYSA-N 0.000 description 2
- 125000004182 2-chlorophenyl group Chemical group [H]C1=C([H])C(Cl)=C(*)C([H])=C1[H] 0.000 description 2
- 229940126062 Compound A Drugs 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- NLDMNSXOCDLTTB-UHFFFAOYSA-N Heterophylliin A Natural products O1C2COC(=O)C3=CC(O)=C(O)C(O)=C3C3=C(O)C(O)=C(O)C=C3C(=O)OC2C(OC(=O)C=2C=C(O)C(O)=C(O)C=2)C(O)C1OC(=O)C1=CC(O)=C(O)C(O)=C1 NLDMNSXOCDLTTB-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000001723 curing Methods 0.000 description 2
- JQVDAXLFBXTEQA-UHFFFAOYSA-N dibutylamine Chemical compound CCCCNCCCC JQVDAXLFBXTEQA-UHFFFAOYSA-N 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 150000003053 piperidines Chemical group 0.000 description 2
- 239000013074 reference sample Substances 0.000 description 2
- 239000000523 sample Substances 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- 229960004418 trolamine Drugs 0.000 description 2
- FYADHXFMURLYQI-UHFFFAOYSA-N 1,2,4-triazine Chemical compound C1=CN=NC=N1 FYADHXFMURLYQI-UHFFFAOYSA-N 0.000 description 1
- KODLUXHSIZOKTG-UHFFFAOYSA-N 1-aminobutan-2-ol Chemical compound CCC(O)CN KODLUXHSIZOKTG-UHFFFAOYSA-N 0.000 description 1
- 239000012956 1-hydroxycyclohexylphenyl-ketone Substances 0.000 description 1
- RKMGAJGJIURJSJ-UHFFFAOYSA-N 2,2,6,6-tetramethylpiperidine Chemical class CC1(C)CCCC(C)(C)N1 RKMGAJGJIURJSJ-UHFFFAOYSA-N 0.000 description 1
- COEGBCJIXOPJHZ-UHFFFAOYSA-N 2-(2,2,6,6-tetramethylpiperidin-4-yl)ethanol Chemical compound CC1(C)CC(CCO)CC(C)(C)N1 COEGBCJIXOPJHZ-UHFFFAOYSA-N 0.000 description 1
- MIJDSYMOBYNHOT-UHFFFAOYSA-N 2-(ethylamino)ethanol Chemical compound CCNCCO MIJDSYMOBYNHOT-UHFFFAOYSA-N 0.000 description 1
- NGNBDVOYPDDBFK-UHFFFAOYSA-N 2-[2,4-di(pentan-2-yl)phenoxy]acetyl chloride Chemical compound CCCC(C)C1=CC=C(OCC(Cl)=O)C(C(C)CCC)=C1 NGNBDVOYPDDBFK-UHFFFAOYSA-N 0.000 description 1
- BPGIOCZAQDIBPI-UHFFFAOYSA-N 2-ethoxyethanamine Chemical compound CCOCCN BPGIOCZAQDIBPI-UHFFFAOYSA-N 0.000 description 1
- 125000005809 3,4,5-trimethoxyphenyl group Chemical group [H]C1=C(OC([H])([H])[H])C(OC([H])([H])[H])=C(OC([H])([H])[H])C([H])=C1* 0.000 description 1
- SOYBEXQHNURCGE-UHFFFAOYSA-N 3-ethoxypropan-1-amine Chemical compound CCOCCCN SOYBEXQHNURCGE-UHFFFAOYSA-N 0.000 description 1
- FAXDZWQIWUSWJH-UHFFFAOYSA-N 3-methoxypropan-1-amine Chemical compound COCCCN FAXDZWQIWUSWJH-UHFFFAOYSA-N 0.000 description 1
- 229920002799 BoPET Polymers 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N EtOH Substances CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 1
- AKNUHUCEWALCOI-UHFFFAOYSA-N N-ethyldiethanolamine Chemical compound OCCN(CC)CCO AKNUHUCEWALCOI-UHFFFAOYSA-N 0.000 description 1
- OPKOKAMJFNKNAS-UHFFFAOYSA-N N-methylethanolamine Chemical compound CNCCO OPKOKAMJFNKNAS-UHFFFAOYSA-N 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- MQDJYUACMFCOFT-UHFFFAOYSA-N bis[2-(1-hydroxycyclohexyl)phenyl]methanone Chemical compound C=1C=CC=C(C(=O)C=2C(=CC=CC=2)C2(O)CCCCC2)C=1C1(O)CCCCC1 MQDJYUACMFCOFT-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- XTEGARKTQYYJKE-UHFFFAOYSA-N chloric acid Chemical compound OCl(=O)=O XTEGARKTQYYJKE-UHFFFAOYSA-N 0.000 description 1
- 229940005991 chloric acid Drugs 0.000 description 1
- FOCAUTSVDIKZOP-UHFFFAOYSA-N chloroacetic acid Chemical compound OC(=O)CCl FOCAUTSVDIKZOP-UHFFFAOYSA-N 0.000 description 1
- 229940106681 chloroacetic acid Drugs 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 1
- 229940043237 diethanolamine Drugs 0.000 description 1
- WEHWNAOGRSTTBQ-UHFFFAOYSA-N dipropylamine Chemical compound CCCNCCC WEHWNAOGRSTTBQ-UHFFFAOYSA-N 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 1
- ALIATVYMFGMEJC-UHFFFAOYSA-N phenyl-[2,4,6-tris(methylamino)phenyl]methanone Chemical compound CNC1=CC(NC)=CC(NC)=C1C(=O)C1=CC=CC=C1 ALIATVYMFGMEJC-UHFFFAOYSA-N 0.000 description 1
- 238000000016 photochemical curing Methods 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920005553 polystyrene-acrylate Polymers 0.000 description 1
- LVTJOONKWUXEFR-FZRMHRINSA-N protoneodioscin Natural products O(C[C@@H](CC[C@]1(O)[C@H](C)[C@@H]2[C@]3(C)[C@H]([C@H]4[C@@H]([C@]5(C)C(=CC4)C[C@@H](O[C@@H]4[C@H](O[C@H]6[C@@H](O)[C@@H](O)[C@@H](O)[C@H](C)O6)[C@@H](O)[C@H](O[C@H]6[C@@H](O)[C@@H](O)[C@@H](O)[C@H](C)O6)[C@H](CO)O4)CC5)CC3)C[C@@H]2O1)C)[C@H]1[C@H](O)[C@H](O)[C@H](O)[C@@H](CO)O1 LVTJOONKWUXEFR-FZRMHRINSA-N 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 150000003335 secondary amines Chemical class 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- YNJBWRMUSHSURL-UHFFFAOYSA-N trichloroacetic acid Chemical compound OC(=O)C(Cl)(Cl)Cl YNJBWRMUSHSURL-UHFFFAOYSA-N 0.000 description 1
- 229960004319 trichloroacetic acid Drugs 0.000 description 1
- 239000013638 trimer Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
- C08F220/36—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate containing oxygen in addition to the carboxy oxygen, e.g. 2-N-morpholinoethyl (meth)acrylate or 2-isocyanatoethyl (meth)acrylate
- C08F220/365—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate containing oxygen in addition to the carboxy oxygen, e.g. 2-N-morpholinoethyl (meth)acrylate or 2-isocyanatoethyl (meth)acrylate containing further carboxylic moieties
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
- C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
- C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
- C08F220/1804—C4-(meth)acrylate, e.g. butyl (meth)acrylate, isobutyl (meth)acrylate or tert-butyl (meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F220/28—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
- C08F220/281—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety and containing only one oxygen, e.g. furfuryl (meth)acrylate or 2-methoxyethyl (meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/52—Amides or imides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
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Abstract
본 발명은 다음 화학식 1로 표시되는 저중합체, 이의 제조방법, 이를 포함하는 광학 수지 조성물, 및 이로부터 제조된 광학 시이트를 제공한다. The present invention provides an oligomer represented by the following formula (1), a method for preparing the same, an optical resin composition comprising the same, and an optical sheet prepared therefrom.
화학식 1Formula 1
본 발명에 따른 저중합체는 자외선에 대한 안정성을 부여할 수 있는 작용기와 대전방지 역할을 하는 작용기를 포함하고 있어 각각 자외선에 의하여 고분자 수지가 황색으로 변하는 것을 막고, 정전기에 의한 불량을 최소화할 수 있으며, 고분자 그물구조 속에 포함될 수 있도록 아크릴 작용기를 가지고 있어, 이로부터 제조된 광학 시이트가 시간이 지남에 따라 오염되는 것을 억제시킬 수 있다. The oligomer according to the present invention includes a functional group capable of imparting stability to ultraviolet rays and a functional group acting as an antistatic agent, thereby preventing the polymer resin from turning yellow by ultraviolet rays, and minimizing defects caused by static electricity. In addition, it has an acrylic functional group so that it can be included in the polymer network structure, it is possible to suppress the contamination of the optical sheet prepared from it over time.
대전방지*저중합체*광학시트*조성물*황변방지 Antistatic * Low Polymer * Optical Sheet * Composition * Yellowing Prevention
Description
본 발명은 저중합체, 이의 제조방법, 이를 포함하는 광학 수지 조성물 및 이로부터 제조된 디스플레이용 광학 시이트에 관한 것으로서, 상세하게는 자외선에 노출되었을 때 수지가 황색으로 변하는 황변 특성을 최소화시킬 수 있는 저중합체 및 이를 이용한 광학 시이트에 관한 것이다.The present invention relates to a low polymer, a method for preparing the same, an optical resin composition comprising the same, and an optical sheet for a display prepared therefrom, wherein the low molecular weight can minimize the yellowing characteristic of the resin turning yellow when exposed to ultraviolet rays. It relates to a polymer and an optical sheet using the same.
디스플레이의 일종인 액정표시소자(LCD, Liquid Crystalline Display)는 광을 조사시키는 광원, 상기 광원에서 조사된 광이 균일하게 퍼지도록 하는 도광판 또는 확산판, 이 도광판이나 확산판을 통과한 빛이 균일하게 액정 표시장치 전면으로 도달하게 하는 광학 시이트로 구성된 백 라이트 유니트 (Back light Unit)를 가진다.A liquid crystal display (LCD), which is a kind of display, has a light source for irradiating light, a light guide plate or a diffuser plate for uniformly spreading the light emitted from the light source, and the light passing through the light guide plate or the diffuser plate is uniformly It has a back light unit composed of an optical sheet for reaching the front of the liquid crystal display.
이러한 디스플레이에 사용되는 광학 시이트는 장시간 자외선에 노출되며 이 에 따라 광학 시이트가 황색으로 변하는 황변 현상이 발생하게 된다. 이러한 현상은 디스플레이의 전 면적을 황색으로 보이게 함으로써 디스플레이가 정확한 색을 나타내지 못하게 되는 문제가 생긴다.The optical sheet used in such a display is exposed to ultraviolet light for a long time, and thus a yellowing phenomenon occurs in which the optical sheet turns yellow. This phenomenon causes the display not to display the correct color by making the entire area of the display appear yellow.
또한, 상기 광학 시이트는 고분자 수지들로 이루어져 있어 정전기를 유발시키고, 이러한 정전기는 정전기 마크(static mark)를 만들어 제품에 상처를 주고, 밝기를 저하시키게 된다. 또한, 상기 광학 시이트들이 여러장 적층되었을 때 방향이 비틀어지고, 백 라이트 유니트를 육안으로 보았을 때 먼지가 붙어 이물질로 인한 불량이 발생하게 한다.In addition, the optical sheet is made of a polymer resin to induce static electricity, which causes static marks to damage the product, and lower the brightness. In addition, when the optical sheets are stacked in several sheets, the direction is distorted, and when the backlight unit is viewed with the naked eye, dust adheres to cause defects due to foreign matters.
한편, 종래에는 상기와 같이 황변이 발생하지 않도록 다음 화학식 Ⅰ 내지 Ⅵ 중에서 선택된 자외선 안정제를 사용하였다. Meanwhile, in the related art, an ultraviolet stabilizer selected from the following Chemical Formulas I to VI was used to prevent yellowing as described above.
그외에도, 정전기 방지를 위하여 다양한 형태의 대전방지 물질들을 포함시켜 왔다. In addition, various types of antistatic materials have been included to prevent static electricity.
그러나 광학 시이트를 만드는 고분자 수지 내에서 이러한 첨가제들은 이물질처럼 작용하여 완전히 고분자 그물구조(network) 속에 포함되어 있지 않아 시간이 지나면 광학 시이트 표면으로 용출되어 검은 색으로 변색되고, 이에 따라 자외선 안정제와 대전방지제로서의 화학적 특성을 나타내는데 한계가 있었다.However, in the polymer resin that makes the optical sheet, these additives act like foreign matter and are not completely contained in the polymer network, so they elute to the surface of the optical sheet and discolor to black over time. Thus, UV stabilizers and antistatic agents There was a limit to the chemical properties as.
따라서, 본 발명에서는 전술한 바와 같은 종래 기술의 문제점을 해소하기 위하여 안출된 것으로, 광학 시이트를 제조하는 데 있어 자외선 안정제 및 대전방지제로 첨가되는 여러가지 첨가제들이 제 역할을 수행하지 못하고, 이물질로 작용하여 황변 현상이 나타나는 등의 문제들을 해결하고자 한 것이다.Therefore, in the present invention, to solve the problems of the prior art as described above, various additives added as an ultraviolet stabilizer and an antistatic agent in the manufacture of the optical sheet does not play a role, and act as foreign matter This is to solve problems such as yellowing phenomenon.
이에 본 발명에서는 상기 광학 시이트로 사용되는 고분자 수지 제조용 저중합체의 구조 내에 자외선 안정제, 대전 방지제, 고분자 형성 반응기를 모두 포함하도록 제조함으로써, 자외선에 대한 내광성을 가지고, 정전기를 최소화 할 수 있으며, 황변 현상이 발생되지 않는 등 상기와 같은 문제들을 해결할 수 있었다.Accordingly, in the present invention, by preparing to include all of the UV stabilizer, antistatic agent, and the polymer forming reactor in the structure of the low polymer for producing polymer resin used as the optical sheet, it has light resistance to ultraviolet rays, can minimize static electricity, yellowing phenomenon This did not occur and could solve the above problems.
따라서, 본 발명의 목적은 대전방지 특성 및 자외선 안정성이 우수한 광학 시이트의 재료로 사용되는 저중합체를 제공하는 데 있다.Accordingly, it is an object of the present invention to provide an oligomer used as a material of an optical sheet having excellent antistatic properties and ultraviolet stability.
또한, 본 발명의 다른 목적은 상기와 같은 특성을 가지는 저중합체의 제조방법을 제공하는 데도 있다.In addition, another object of the present invention is to provide a method for producing a low polymer having the above characteristics.
또한, 본 발명의 추가의 다른 목적은 상기 저중합체를 포함하는 광학용 수지 조성물을 제공하는 데도 있다.Further, another object of the present invention is to provide an optical resin composition containing the oligomer.
본 발명의 추가의 또 다른 목적은 상기 광학 수지 조성물로부터 제조된 디스플레이용 광학 시이트를 제공하는 데도 있다. Still another object of the present invention is to provide an optical sheet for display manufactured from the optical resin composition.
본 발명은 저중합체 사슬 내에 자외선 안정제 역할을 하는 작용기와 대전방지제 역할을 하는 작용기를 포함하고 있어 각각 자외선에 의하여 고분자 수지가 황색으로 변하는 것을 막고, 정전기에 의한 불량을 최소화시킬 수 있으며, 상기 저중합체 내에 고분자 그물구조 속에 포함될 수 있도록 아크릴 작용기를 가지고 있어 만들어진 광학 시이트가 시간이 지남에 따라 오염되는 것을 막을 수 있다. The present invention includes a functional group that acts as an ultraviolet stabilizer and an antistatic agent in the oligomer chain, thereby preventing the polymer resin from turning yellow by ultraviolet rays, and minimizing defects caused by static electricity. The acrylic sheet, which can be included in the polymer net structure within it, prevents the optical sheet from being contaminated over time.
상기와 같은 목적을 달성하기 위한 본 발명의 저중합체는 다음 화학식 1로 표시되는 것을 그 특징으로 한다. The oligomer of the present invention for achieving the above object is characterized by that represented by the following formula (1).
상기 화학식 1에서 A는, 또는 이며, 상기 A에서 R1은 서로 같거나 다른 것으로서, 각각 수소, 메틸기, 또는 탄소수 1 내지 8의 알코올기이고, Q-는 할로겐산 계열, 황산 계열, 인산 계열, 초산 계열, 염화초산 계열, 및 파라톨루엔 설폰산 계열로 이루어진 그룹으로부터 선택된 1 종 이상의 산 성분이며, n은 2∼8의 정수이고,In Formula 1, A is , or R 1 in A is the same as or different from each other, and each is hydrogen, a methyl group, or an alcohol group having 1 to 8 carbon atoms, and Q − is a halogen acid series, a sulfuric acid series, a phosphoric acid series, an acetic acid series, an acetic acid chloride series, and At least one acid component selected from the group consisting of paratoluene sulfonic acid series, n is an integer from 2 to 8,
상기 화학식 1에서 B는 또는 이며, 상기 B에서 R2는 수소원자 또는 메틸기이고, p는 2∼8의 정수이며,B in Chemical Formula 1 or And, in the B R 2 is a hydrogen atom or a methyl group, p is an integer from 2 to 8,
상기 화학식 1에서 C는 이며, 상기 C에서 m은 2∼8의 정수이며, R3는 수소원자 또는 -(CH2)cCH3, -OCH3, -OCH2CH3, -OCH(CH3)2, -OC(CH3)3 이며, 여기서 상기 c는 0~6의 정수이다. In Formula 1 C is And, in the C m is an integer of 2~8, R 3 is a hydrogen atom or - (CH 2) cCH 3, -OCH 3, -OCH 2 CH 3, -OCH (CH 3) 2, -OC (CH 3 ) 3 , where c is an integer of 0 to 6;
또한, 본 발명의 다른 목적을 달성하기 위한 저중합체의 제조방법은 아민계 화합물과 산을 중화시켜 4차 암모늄염을 합성하는 단계; 및 다관능성 이소시아네이트 화합물에 상기 4차 암모늄염, 고분자 그물구조를 형성하는 화합물, 및 자외선 안정제를 첨가하고 반응시키는 단계를 포함하는 것을 그 특징으로 한다. In addition, a method for preparing a oligomer for achieving another object of the present invention comprises the steps of: neutralizing the amine compound and acid to synthesize a quaternary ammonium salt; And adding and reacting the quaternary ammonium salt, the compound forming the polymer net structure, and the ultraviolet stabilizer to the polyfunctional isocyanate compound.
또한, 본 발명의 추가의 다른 목적을 달성하기 위한 광학 수지 조성물은 상기 화학식 1로 표시되는 저중합체 100중량부에 대하여 반응성 희석제 100∼300중량부 및 광개시제 0.5 내지 5중량부로 포함하는 것을 그 특징으로 한다. In addition, the optical resin composition for achieving another object of the present invention is characterized in that it comprises 100 to 300 parts by weight of the reactive diluent and 0.5 to 5 parts by weight of the photoinitiator with respect to 100 parts by weight of the oligomer represented by the formula (1) do.
또한, 본 발명의 추가의 또 다른 목적을 달성하기 위한 광학 시이트는 상기 수지 조성물로부터 얻어진 것을 그 특징으로 한다. Moreover, the optical sheet for achieving the further another objective of this invention is characterized by what was obtained from the said resin composition.
이하에서 본 발명을 더욱 상세하게 설명하면 다음과 같다. Hereinafter, the present invention will be described in more detail.
본 발명에서는 대전방지 특성, 고분자 그물구조를 형성하는 관능성기, 및 자외선 안정제 역할을 하는 구조를 모두 포함하는 저중합체를 제공한다. 본 발명의 상세한 설명 및 청구항 전반에 걸쳐 사용된 "저중합체" 라는 의미는 중량평균분자량이 5,000 미만인 중합체로 정의될 수 있다. The present invention provides an oligomer including both antistatic properties, a functional group forming a polymer net structure, and a structure serving as a UV stabilizer. As used throughout the description and claims, the meaning of "polymer" may be defined as a polymer having a weight average molecular weight of less than 5,000.
먼저, 상기 대전방지 특성은 상기 화학식 1로 표시되는 저중합체에서 A에 해당되는 치환체가 그 역할을 수행할 수 있다. First, the antistatic property, the substituent corresponding to A in the oligomer represented by Formula 1 may play a role.
상기 A치환체는 아민계 화합물과 산 성분을 중화 반응시켜 얻어진 4차 암모늄염이다. 이때 사용되는 아민계 화합물은 알킬 사슬 말단에 적어도 1개 이상의 히드록시기(-OH)를 함유하는 탄소수 1 내지 8의 1차, 2차 및 3차 아민; 모노히드록시 1차 아민에 탄소수 1∼8개의 알킬 사슬이 치환된 2차 및 3차 아민; 탄소수 1∼9의 알킬기가 치환된 2차 및 3차 아민; 및 탄소수 1∼8개의 알콕시(Alkoxy)기가 치환된 아민을 사용할 수 있다. The A substituent is a quaternary ammonium salt obtained by neutralizing a amine compound and an acid component. The amine compounds used at this time include primary, secondary and tertiary amines having 1 to 8 carbon atoms containing at least one hydroxy group (-OH) at the alkyl chain terminal; Secondary and tertiary amines in which a monohydroxy primary amine is substituted with an alkyl chain having 1 to 8 carbon atoms; Secondary and tertiary amines substituted with an alkyl group having 1 to 9 carbon atoms; And amines in which an alkoxy group having 1 to 8 carbon atoms is substituted.
상기 알킬 사슬 말단에 적어도 1개 이상의 히드록시기(-OH)를 함유하는 탄소수 1 내지 8의 1차, 2차 및 3차 아민의 구체적인 예를 들면, 모노에탄올 아민(mono-ethanol amine), 모노프로판올 아민(mono-propanol amine), 모노부탄올 아민(mono-butanol amine), 모노펜탄올 아민(mono-pentanol amine), 모노헥산올 아 민(mono-hexanol amine), 모노헵탄올 아민(mono-heptanol amine) 및 모노옥탄올아민 (mono-octanol amine)으로 이루어진 그룹으로부터 선택된 1종 이상의 것이며, 예를 들면 다음 화학식으로 나타낸 바와 같다.Specific examples of primary, secondary and tertiary amines having 1 to 8 carbon atoms containing at least one hydroxy group (-OH) at the alkyl chain terminal include monoethanol amine and monopropanol amine. (mono-propanol amine), mono-butanol amine, mono-pentanol amine, mono-hexanol amine, monoheptanol amine And mono-octanol amine (mono-octanol amine) is one or more selected from the group consisting of, for example, as shown by the following formula.
또한, 모노히드록시 1차 아민에 탄소수 1∼8개의 알킬 사슬이 치환된 2차 혹은 3차 아민의 예를 들면, 메틸에탄올 아민(methyl ethanol amine), 에틸에탄올 아민(ethyl ethanol amine), 에틸디에탄올 아민(Ethyl diethanol amine), 디에탄올 아민(di-ethanol amine) 및 트리에탄올 아민(Tri-ethanol amine)으로 이루어진 그룹으로부터 선택된 어느 하나를 사용할 수 있으며, 이들의 구체 예는 다음 화학식과 같다. In addition, examples of the secondary or tertiary amine in which the C 1-8 alkyl chain is substituted with the monohydroxy primary amine include methyl ethanol amine, ethyl ethanol amine and ethyl di. Ethanol amine (Ethyl diethanol amine), diethanol amine (di-ethanol amine) and triethanol amine (Tri-ethanol amine) can be used any one selected from the group, specific examples thereof are shown in the following formula.
또한, 탄소수 1∼9의 알킬기가 치환된 2차 및 3차 아민으로는 디-n-부틸아민, 디-n-프로필아민, 디메틸아민, 및 트리에틸아민으로 이루어진 그룹으로부터 선택된 1종 이상의 것으로, 구체적으로는 다음 화학식과 같다.In addition, the secondary and tertiary amines substituted with an alkyl group having 1 to 9 carbon atoms include at least one selected from the group consisting of di-n-butylamine, di-n-propylamine, dimethylamine, and triethylamine, Specifically, it is as follows.
또한, 상기 아민에 히드록시기를 포함한 탄소수 1∼8개의 알콕시(Alkoxy)기가 치환된 아민으로는 2-에톡시 에틸아민, 3-메톡시 프로필아민, 및 3-에톡시 프로 필아민으로 이루어진 그룹으로부터 선택된 1종 이상의 것으로, 구체적으로는 다음 화학식으로 나타낸 바와 같다. In addition, the amine substituted with a C 1-8 alkoxy (Alkoxy) group containing a hydroxy group in the amine is selected from the group consisting of 2-ethoxy ethylamine, 3-methoxy propylamine, and 3-ethoxy propylamine. It is one or more types, and is specifically, shown by following Chemical formula.
또한, 상기 아민계 화합물을 중화시키는 데 사용되는 산 성분으로는 상기 A의 Q-에 해당되는 것으로서, 할로겐산 계열, 황산 계열, 인산 계열, 초산 계열, 염화초산 계열, 파라톨루엔 설폰산 계열, 및 이들의 유도체로 이루어진 그룹으로부터 선택된 1종 이상의 것이다. In addition, the acid component used to neutralize the amine compound corresponds to Q − of A, halogen acid series, sulfuric acid series, phosphoric acid series, acetic acid series, chloride acetate series, paratoluene sulfonic acid series, and At least one selected from the group consisting of derivatives thereof.
상기 할로겐산 계열은 F-, Cl-, Br-, 및 I- 로 이루어진 그룹으로부터 선택된 1종 이상의 것이며; 황산(sulfuric acid) 계열은 HSO4 -, SO4 2 -, CH3SO4-, 및 CH3CH2SO4 - 로 이루어진 그룹으로부터 선택된 1종 이상의 것이며; 인산(phosphoric acid) 계열은 H2PO4 -, HPO3 2 - 및 PO4 3 - 로 이루어진 그룹으로부터 선택된 1종 이상의 것이며; 초산(Acetic acid) 계열은 CH3COO-이며; 염화 초산(Chloro acetic acid) 계 열은 CH2ClCOO-, CHCl2COO- 및 CCl3COO-로 이루어진 그룹으로부터 선택된 1종 이상의 것이며; 파라톨루엔 설폰산(para-toluene sulfonic acid) 계열은 CH3(C6H4)SO3 - 이다. The halogen acid sequence is F -, Cl -, Br - , and I - will at least one selected from the group consisting of; Sulfuric acid (sulfuric acid) sequence is HSO 4 -, SO 4 2 - , CH 3 SO4 -, and CH 3 CH 2 SO 4 - will at least one selected from the group consisting of; Phosphate (phosphoric acid) family of H 2 PO 4 -, HPO 3 2 - and PO 4 3 - will at least one selected from the group consisting of; Acetic acid series is CH 3 COO − ; Acid chloride (Chloro acetic acid) based columns CH 2 ClCOO -, CHCl 2 COO - , and CCl 3 COO - will at least one selected from the group consisting of; The para-toluene sulfonic acid family is CH 3 (C 6 H 4 ) SO 3 − .
상기 산 성분의 구체적인 예를 들면, 염산(chloric acid), 황산(sulfuric acid), 인산(phosphoric acid), 초산(Acetic acid), 모노염화초산(monochloro acetic acid), 삼염화초산(trichloro acetic acid), 삼불화초산(trifluoro acetic acid), 불산(fluoric acid), 브롬산(bromic acod), 파라톨루엔 설폰산(para-toluene sulfonic acid), 디메틸설페이트(dimethyl sulfate), 디에틸설페이트(diethyl sulfate), 및 이들의 유도체로 이루어진 그룹으로부터 선택된 1종 이상의 것이나 이에 한정되는 것은 아니다.Specific examples of the acid component include chloric acid, sulfuric acid, phosphoric acid, acetic acid, monochloro acetic acid, trichloro acetic acid, Trifluoro acetic acid, fluoric acid, bromic acid, para-toluene sulfonic acid, dimethyl sulfate, diethyl sulfate, and At least one selected from the group consisting of derivatives thereof, but is not limited thereto.
상기 아민계 화합물과 산 성분의 반응 조건은 사용되는 아민 종류에 따라 달라질 수 있으며, 최대 반응 온도가 50℃를 넘지 않는 조건에서 적가하는 것이 바람직하며, 적가가 완료된 후 약 1시간 동안 교반하며, 상기 아민계 화합물과 산 성분의 반응비는 1:0.8 내지 0.8:1인 것이 반응성 면에서 바람직하다. Reaction conditions of the amine-based compound and the acid component may vary depending on the type of amine used, preferably added dropwise under the condition that the maximum reaction temperature does not exceed 50 ℃, stirred for about 1 hour after the addition is completed, the The reaction ratio of the amine compound and the acid component is preferably 1: 0.8 to 0.8: 1 in view of reactivity.
상기와 같은 아민계 화합물과 산 성분의 반응으로 상기 A로 표시되는 4차 암모늄염을 합성하게 된다. The quaternary ammonium salt represented by A is synthesized by the reaction of the amine compound and the acid component as described above.
또한, 상기 화학식 1로 표시되는 본 발명에 따른 저중합체는 차후 고분자 그물구조를 형성하는 B치환체와 자외선 안정제 역할을 하는 C를 사용한다. In addition, the oligomer according to the present invention represented by the formula (1) uses a B substituent and a UV stabilizer to form a polymer network structure in the future.
상기 고분자 그물구조를 형성하는 B는 히드록시에틸 아크릴레이트(hydroxy ethyl acrylate), 히드록시에틸 메타아크릴레이트(hydroxyethyl methacrylate), 히드록시프로필 아크릴레이트((hydroxypropyl acrylate), 히드록시프로필 메타아크릴레이트((hydroxypropyl methacrylate), 및 이들의 에스테르 화합물로 이루어진 그룹으로부터 선택된 1종 이상의 아크릴계 화합물이 바람직하다.B forming the polymer network structure is hydroxyethyl acrylate (hydroxy ethyl acrylate), hydroxyethyl methacrylate (hydroxyethyl methacrylate), hydroxypropyl acrylate ((hydroxypropyl acrylate), hydroxypropyl methacrylate (( hydroxypropyl methacrylate), and at least one acrylic compound selected from the group consisting of ester compounds thereof.
자외선 안정제 역할을 하는 C는 알코올(alcohol)의 히드록시기 (-OH)의 반대쪽 말단부에 피페리딘(piperidine) 유도체가 치환된 것으로서 일반적으로 자외선 안정제 역할을 하는 상용화된 제품들이 사용 가능하다. 이 피페리딘 유도체들 중에서 특히 2,2,6,6의 탄소 위치에 네개의 메틸기가 붙은 2,2,6,6-테트라메틸 피페리딘 유도체가 일반적으로 사용되며, 경우에 따라 질소(N)에 알킬기(Alkyl), 알콕시기 (Alkoxy)가 결합된 것이 가능하다.C, which acts as a UV stabilizer, is a piperidine derivative substituted at the opposite end of an alcohol hydroxyl group (-OH), and commercially available products that act as UV stabilizers are generally available. Of these piperidine derivatives, in particular, 2,2,6,6-tetramethyl piperidine derivatives having four methyl groups at the carbon positions of 2,2,6,6 are generally used. It is possible to combine an alkyl group (Alkyl), an alkoxy group (Alkoxy).
한편, 본 발명에 따른 저중합체는 상기 대전방지 특성을 나타내는 화합물 A와 고분자 그물구조를 형성하게 하는 화합물 B, 자외선 안정제 역할을 하는 화합물 C를 다음 화학식 2로 표시되는 헥사메틸렌디이소시아네이트(HMDI) 트라이머(Trimer)와 반응시켜 제조된다. On the other hand, the oligomer according to the present invention is a compound A exhibiting the antistatic properties and the compound B to form a polymer network structure, the compound C acting as a UV stabilizer hexamethylene diisocyanate (HMDI) tri represented by the following formula (2) It is prepared by reacting with Trimer.
상기 HMDI 트라이머 한 분자는 세개의 이소시아네이트(N=C=O) 그룹을 가지는 3당량의 다관능성 화합물이므로, 상기 반응은 HMDI Trimer 한분자당 상기 화합물 A, B, C 가 각각 하나씩 결합될 수 있도록 한다. 즉, 상기 화학식 2로 표시되는 다관능성 이소시아네이트 3당량과 상기 A로 표시되는 화합물 1당량, 상기 B로 표시되는 화합물 1당량, 및 상기 C로 표시되는 화합물이 각각 1당량씩 반응하여 본 발명에 따른 저중합체를 제조하게 된다.Since one molecule of the HMDI trimer is a 3-equivalent polyfunctional compound having three isocyanate (N = C = O) groups, the reaction allows each of the compounds A, B, and C to be bound per molecule of HMDI Trimer. . That is, 3 equivalents of the polyfunctional isocyanate represented by Formula 2 and 1 equivalent of the compound represented by A, 1 equivalent of the compound represented by B, and 1 equivalent of the compound represented by C are reacted according to the present invention. To produce an oligomer.
상기와 같이 본 발명에 따라 제조된 저중합체는 중량평균분자량 800 내지 4,500, 바람직하기로는 800 내지 1,500이다. As described above, the oligomer prepared according to the present invention has a weight average molecular weight of 800 to 4,500, preferably 800 to 1,500.
한편, 본 발명은 상기와 같이 제조된 저중합체를 포함하는 광학 수지 조성물을 제공하는 데도 그 특징이 있다.On the other hand, the present invention is also characterized in that it provides an optical resin composition comprising the oligomer prepared as described above.
이러한 광학 수지 조성물은 상기 저중합체와 반응성 희석제, 및 광개시제를 혼합시켜 제조한다. Such an optical resin composition is prepared by mixing the oligomer with a reactive diluent and a photoinitiator.
상기 광학 수지 조성물에 포함되는 반응성 희석제로는, 부틸 아크릴레이트(butyl acrylate), 히드록시 에틸 아크릴레이트(hydroxyethyl acrylate), 히드록시프로필 아크릴레이트 (hydroxypropyl acrylate) 및 이에 상응하는 아크릴계 단량체로 이루어진 그룹으로부터 선택된 1종 이상의 것으로서, 상기 저중합체의 점도를 낮추고, 또한 이하의 광개시제와 함께 첨가되어 상기 저중합체와의 고분자 반응에 기여하는 반응성 희석제로 작용하도록 첨가될 수 있으며, 그 함량은 상기 대전방지 저중합체 100중량부에 대하여 100∼300중량부로 혼합되어 사용된다.The reactive diluent included in the optical resin composition may be selected from the group consisting of butyl acrylate, hydroxyethyl acrylate, hydroxypropyl acrylate and a corresponding acrylic monomer. As one or more, it may be added to lower the viscosity of the oligomer and also act as a reactive diluent added with the following photoinitiators to contribute to the polymer reaction with the oligomer, the content of which is antistatic oligomer 100 It is used by mixing in 100-300 weight part with respect to a weight part.
또한, 상기 저중합체의 광경화를 위하여 광개시제가 첨가될 수 있다. 상기 광개시제로는 광중합개시제로는 2,4-트리클로로메틸-(4'-메톡시페닐)-6-트리아진,2,4-트리클로로메틸-(4'-메톡시스티릴)-6-트리아진, 2,4-트리클로로메틸-(피플로닐)-6-트리아진 등의 트리아진 화합물; 1-히드록시시클로헥실 페닐 케톤, 4-(2-히드록시에톡시)-페닐 (2-히드록시)프로필 케톤 등의 아세토페논계 화합물; 벤조페논, 2,4,6-트리메틸아미노벤조페논 등의 벤조페논계 화합물; 2,2-비스(2-클로로페닐)-4,4',5,5'-테트라페닐 비이미다졸, 2,2'-비스(o-클로로페닐)-4,4',5,5'-테트라키스(3,4,5-트리메톡시페닐)-1,2'-비이미다졸 등의 비이미다졸계 화합물 등에서 선택되는 1종 이상의 화합물로서, 상기 저중합체 100중량부에 대하여 0.5∼5중량부로 혼합된다. 상기 광개시제는 단독 혹은 여러가지를 혼합하여 사용할 수 있다.In addition, a photoinitiator may be added for photocuring the oligomer. The photoinitiator is a photopolymerization initiator is 2,4-trichloromethyl- (4'-methoxyphenyl) -6-triazine, 2,4-trichloromethyl- (4'-methoxystyryl) -6- Triazine compounds such as triazine and 2,4-trichloromethyl- (piflonil) -6-triazine; Acetophenone compounds such as 1-hydroxycyclohexyl phenyl ketone and 4- (2-hydroxyethoxy) -phenyl (2-hydroxy) propyl ketone; Benzophenone compounds such as benzophenone and 2,4,6-trimethylaminobenzophenone; 2,2-bis (2-chlorophenyl) -4,4 ', 5,5'-tetraphenyl biimidazole, 2,2'-bis (o-chlorophenyl) -4,4', 5,5 ' -At least one compound selected from biimidazole-based compounds such as tetrakis (3,4,5-trimethoxyphenyl) -1,2'-biimidazole and the like, from 0.5 to 100 parts by weight of the oligomer. 5 parts by weight is mixed. The photoinitiator can be used alone or in combination.
본 발명에서는 상기와 같은 광학 수지 조성물로부터 제조된 디스플레이용 광학 시이트에도 그 특징이 있다. 상기 광학 시이트는 폴리에스터, 폴리카보네이트, 폴리스티렌, 및 폴리메틸메타크릴레이트로 이루어진 그룹으로부터 선택된 1종 이상의 기재 필름 위에 30 내지 250㎛의 두께로 도포시킨 다음, 자외선 또는 전자선으로 경화시켜 제조할 수 있다. In this invention, the display optical sheet manufactured from the above optical resin composition also has the characteristics. The optical sheet may be prepared by applying a thickness of 30 to 250 μm on at least one base film selected from the group consisting of polyester, polycarbonate, polystyrene, and polymethylmethacrylate, and then curing with ultraviolet rays or electron beams. .
이하, 본 발명을 실시예에 의거하여 더욱 상세하게 설명하면 다음과 같은 바, 본 발명이 이에 한정되는 것은 아니다.Hereinafter, the present invention will be described in more detail with reference to the following Examples, but the present invention is not limited thereto.
합성예Synthetic example 1 : A 화합물(대전방지 특성을 나타내는 4차 암모늄염)의 1: Compound A (quaternary ammonium salt exhibiting antistatic properties) 제조예Manufacturing example
강력 교반기, 온도계, 적가 펀넬, 콘덴서와 냉각 재킷이 갖추어진 2L 레진 케틀에 에탄올 아민 (미국 알드리치 (Aldrich)사) 62g을 넣고 98% 황산 (미국 알드리치 (Aldrich)사) 49g을 천천히 적가시켰다. 반응 온도가 50℃가 넘지 않도록 주 의하면서 완전히 적가한 후 1시간 동안 상온에서 교반시켜, 대전방지 특성을 나타내며, 중량평균분자량 111인 A-1을 합성하였다. Into a 2L resin kettle equipped with a strong stirrer, thermometer, dropping funnel, condenser and cooling jacket, 62 g of ethanol amine (Aldrich, USA) was added dropwise slowly to 49 g of 98% sulfuric acid (Aldrich, USA). The reaction temperature was completely added dropwise while being careful not to exceed 50 ° C, followed by stirring at room temperature for 1 hour, thereby exhibiting antistatic properties and synthesizing A-1 having a weight average molecular weight 111.
합성예Synthetic example 2 : A 화합물(대전방지 특성을 나타내는 4차 암모늄염)의 2: A compound (quaternary ammonium salt exhibiting antistatic properties) 제조예Manufacturing example
강력 교반기, 온도계, 적가 펀넬, 콘덴서와 냉각 재킷이 갖추어진 2L 레진 케틀에 에탄올 아민 (미국 알드리치 (Aldrich)사) 62g을 넣고 삼불소초산 (미국 알드리치 (Aldrich)사) 114g을 천천히 적가시켰다. 반응 온도가 50℃가 넘지 않도록 주의하면서 완전히 적가한 후 1시간 동안 상온에서 교반시켜, 대전방지 특성을 나타내며, 중량평균분자량 176인 나타내는 A-2를 합성하였다. Into a 2L resin kettle equipped with a strong stirrer, thermometer, dropping funnel, condenser and cooling jacket, 62 g of ethanol amine (Aldrich, USA) was added dropwise slowly to 114 g of trifluoroacetic acid (Aldrich, USA). The reaction temperature was added dropwise while being careful not to exceed 50 ° C, followed by stirring at room temperature for 1 hour to synthesize antistatic properties, indicating A-2 having a weight average molecular weight of 176.
실시예Example 1 : One : 저중합체의Oligomer 제조예Manufacturing example
강력 교반기, 온도계, 적가 펀넬, 콘덴서와 냉각 재킷이 갖추어진 4L 레진 케틀에 HMDI 3당량에 해당하는 504g과 고분자 그물구조를 형성하게 하는 히드록시에틸 메타아크릴레이트(hydroxy ethyl methacrylate, 미국 알드리치사) 1당량에 해당하는 130g을 천천히 적가시켰다. 반응 온도가 50℃가 넘지 않도록 주의하면서 완전히 적가한 후 1시간 동안 상온에서 교반시켰다다. 여기에 상기 합성예 1의 대전방지 특성을 나타내는 A-1 111g(1당량)을 반응 온도가 50℃가 넘지 않도록 주의하면서 완전히 적가한 후 1시간 40분 동안 상온에서 교반시켰다. Hydroxyethyl methacrylate (Aldrich, USA) that forms a polymer network with 504 g equivalent to 3 equivalents of HMDI in a 4L resin kettle equipped with a strong stirrer, thermometer, dropping funnel, condenser and cooling jacket 1 130 g of the equivalent was slowly added dropwise. The reaction temperature was added dropwise while being careful not to exceed 50 ° C, and stirred at room temperature for 1 hour. To this, 111 g (1 equivalent) of A-1 exhibiting the antistatic properties of Synthesis Example 1 was added dropwise while being careful not to exceed the reaction temperature of 50 ° C., and stirred at room temperature for 1 hour 40 minutes.
여기에 자외선 안정제 역할을 하는 2-(2,2,6,6-테트라메틸-피페리딘-4-일)-에탄올(2-(2,2,6,6-tetramethyl-piperidin-4-yl)-ethanol, 미국 알드리치사) 185g(1당량)을 반응 온도가 50℃가 넘지 않도록 주의하면서 완전히 적가한 후 2시간 동안 상온에서 교반시켜 중량평균분자량 930인 본 발명에 따른 저중합체를 얻었다. 2- (2,2,6,6-tetramethyl-piperidin-4-yl) -ethanol (2- (2,2,6,6-tetramethyl-piperidin-4-yl, which acts as a UV stabilizer here) ) -ethanol, Aldrich Co., Ltd.) 185 g (1 equivalent) was added dropwise while being careful not to let the reaction temperature exceed 50 ° C., followed by stirring at room temperature for 2 hours to obtain a polymer having a weight average molecular weight of 930.
본 발명의 상기 저중합체는 1차 반응(히드록시에틸 메타아크릴레이트 반응)후 NCO%: 13.22, 2차 반응(대전방지특성 화합물) 후 NCO%: 5.62, 3차 반응(자외선 안정제 화합물) 후 NCO%: 0 으로서, 반응에 참여한 다관능성 이소시아네이트 함량을 계산하여 반응이 완전히 진행되었음을 확인하였다. The oligomer of the present invention is NCO%: 13.22 after the first reaction (hydroxyethyl methacrylate reaction), NCO% after the second reaction (antistatic compound): 5.62, NCO after the third reaction (ultraviolet stabilizer compound) As%: 0, the polyfunctional isocyanate content participating in the reaction was calculated to confirm that the reaction proceeded completely.
실시예Example 2 : 2 : 저중합체의Oligomer 제조예Manufacturing example
대전방지 특성을 나타내는 화합물로서, 상기 합성예 2의 A-2 176g(1당량)을 첨가하는 것을 제외하고는 상기 실시예 1과 동일한 방법으로 중량평균분자량 995인 본 발명에 따른 저중합체를 얻었다.As a compound exhibiting antistatic properties, a low polymer according to the present invention having a weight average molecular weight of 995 was obtained in the same manner as in Example 1, except that 176 g (1 equivalent) of A-2 of Synthesis Example 2 was added.
본 발명의 상기 저중합체는 1차 반응(히드록시에틸 메타아크릴레이트 반응) 후 NCO%: 13.22, 2차 반응(대전방지특성 화합물) 후 NCO%: 5.20, 3차 반응(자외선 안정제 화합물) 후 NCO%: 0 으로서, 반응에 참여한 다관능성 이소시아네이트 함량을 계산하여 반응이 완전히 진행되었음을 확인하였다. The oligomer of the present invention is NCO% after the first reaction (hydroxyethyl methacrylate reaction): 13.22, NCO% after the second reaction (antistatic property compound): 5.20, NCO after the third reaction (ultraviolet stabilizer compound) %: 0 As a result, the content of the polyfunctional isocyanate participating in the reaction was calculated to confirm that the reaction proceeded completely.
실시예Example 3 : 광학 수지 조성물 3: optical resin composition 제조예Manufacturing example
상기 실시예 1의 저중합체 50g에 반응성 희석제인 부틸 아크릴레이트 50g과 광개시제 벤조페논 3g을 첨가하여 균일하게 되도록 혼합시켜 광학 수지 조성물을 제조하였다.To 50 g of the oligomer of Example 1, 50 g of butyl acrylate, which is a reactive diluent, and 3 g of a photoinitiator benzophenone were added and mixed to make the optical resin composition uniform.
실시예Example 4 : 광학 수지 조성물 4: optical resin composition 제조예Manufacturing example
상기의 실시예 2의 저중합체 50g을 사용하는 것을 제외하고는 상기 실시예 3과 동일한 방법으로 광학 수지 조성물을 제조하였다.An optical resin composition was prepared in the same manner as in Example 3, except that 50 g of the oligomer of Example 2 was used.
상기 제조된 실시예 3과 4의 혼합물과, 상기 본 발명에 따른 저중합체를 포함하지 않고 부틸 아크릴레이트 100g과 벤조페논 3g을 균일하게 되도록 혼합한 시료를 기준 시료로 하여, 대전방지 특성과 자외선 내광성 특성을 다음과 같이 측정하였으며, 그 결과를 다음 표 1에 나타내었다. The antistatic properties and ultraviolet light resistance of the mixtures of Examples 3 and 4 prepared above, and a sample containing 100 g of butyl acrylate and 3 g of benzophenone uniformly without including the oligomer according to the present invention as a reference sample The properties were measured as follows, and the results are shown in Table 1 below.
<< 실험예Experimental Example >>
PET 필름을 기재로 하여 그 위에 상기 실시예 및 기준 시료를 통해 얻어진 조성물을 50~250㎛로 균일하게 코팅하여 365nm의 파장을 가지는 UV lamp로 경화시켜, 광학 시이트를 제조하였다. 또한, 상기 제조된 각 시이트의 물성을 다음과 같이 평가하였다. Based on the PET film, the composition obtained through the above examples and the reference sample was uniformly coated at 50 to 250 μm, and cured with a UV lamp having a wavelength of 365 nm to prepare an optical sheet. In addition, the physical properties of each sheet prepared above were evaluated as follows.
- 자외선 노출 실험은 QUV 장비로 UVA lamp, 0.77W/㎠ 60℃에서 500시간을 기본으로 실시함.-UV exposure test is based on 500 hours at 60 ° C UVA lamp, 0.77W / ㎠ with QUV equipment.
- 표면 저항은 수치가 작을수록 대전 방지 특성이 좋으며, 자외선 내광성은 b* 수치가 작아질수록 황색으로 심하게 변색된 것을 의미함.-The smaller the value, the better the antistatic property. The UV light resistance means that the b * value is changed to a deeper yellow.
기준
시료
standard
sample
(표면저항)Antistatic property
(Surface resistance)
a* : 2.70
b* : -1.60L * : 81.50
a * : 2.70
b * : -1.60
a* : 2.71
b* : -0.61L * : 82.1
a * : 2.71
b * : -0.61
실시예 3
Example 3
(표면저항)Antistatic property
(Surface resistance)
a* : 2.59
b* : -1.62L * : 81.42
a * : 2.59
b * : -1.62
a* : 2.67
b* : -1.49L * : 81.51
a * : 2.67
b * : -1.49
실시예 4
Example 4
(표면저항)Antistatic property
(Surface resistance)
a* : 2.71
b* : -1.61L * : 82.09
a * : 2.71
b * : -1.61
a* : 2.73
b* : -1.43L * : 82.71
a * : 2.73
b * : -1.43
상기 표 1의 결과에서처럼, 본 발명에 따른 저중합체를 포함하는 광학 수지 조성물로부터 제조된 광학 시이트는 표면 저항이 1014Ω/㎠ 이하로 대전 방지 특성이 우수함을 나타내며, 장시간의 자외선에 노출되어도 황색으 로 변하지 않는 자외선 내광 특성을 나타내어 디스플레이에 사용되는 광학 시이트의 신뢰성을 향상시킬 수 있다.As shown in the results of Table 1, the optical sheet prepared from the optical resin composition comprising the oligomer according to the present invention exhibits excellent antistatic properties with a surface resistance of 10 14 Ω / cm 2 or less, and yellow even when exposed to ultraviolet rays for a long time. It is possible to improve the reliability of the optical sheet used in the display by exhibiting the ultraviolet light resistance characteristics that do not change.
본 발명의 실시예에 따라 본 발명을 설명하였으나 본 발명이 속하는 기술 분야에서 통상의 지식을 가진 자가 본 발명의 기술적 사상을 벗어나지 않는 범위 내에서 변경 및 변형한 것도 포함된다.Although the present invention has been described in accordance with embodiments of the present invention, modifications and variations may be made by those skilled in the art without departing from the technical spirit of the present invention.
Claims (11)
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Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
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KR0131008B1 (en) * | 1994-09-27 | 1998-04-13 | 이종덕 | Optical resin composition |
US6150496A (en) | 1998-02-13 | 2000-11-21 | Basf Corporation | Inherently light-and-heat-stabilized polyamide and method of making the same |
KR100650436B1 (en) * | 2004-11-22 | 2006-11-29 | 엘지마이크론 주식회사 | Oligomers for preventing static electricity |
KR20070098722A (en) * | 2006-03-31 | 2007-10-05 | 주식회사 큐시스 | Urethane allylether derivatives, process for producing the same and light-curable polymer dispersed liquid crystal composition with excellent weatherability |
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KR0131008B1 (en) * | 1994-09-27 | 1998-04-13 | 이종덕 | Optical resin composition |
US6150496A (en) | 1998-02-13 | 2000-11-21 | Basf Corporation | Inherently light-and-heat-stabilized polyamide and method of making the same |
KR100650436B1 (en) * | 2004-11-22 | 2006-11-29 | 엘지마이크론 주식회사 | Oligomers for preventing static electricity |
KR20070098722A (en) * | 2006-03-31 | 2007-10-05 | 주식회사 큐시스 | Urethane allylether derivatives, process for producing the same and light-curable polymer dispersed liquid crystal composition with excellent weatherability |
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