KR101319706B1 - Sputtering coated with boron compounds, multi-layer thermal shutdown films manufacturing process that combines a transparent way - Google Patents

Abstract

PURPOSE: A multiple-layered heat-blocking film production method which grafts a boron compound coating and a sputtering process is provided to secure high productivity as a thickness of a whole film is reducible by forming an organic IR blocking layer with a heat blocking film through a boron compound which is capable of adjusting penetrability of a certain wavelength. CONSTITUTION: A multiple-layered heat-blocking film production comprises a step (S100) which coats an organic IR blocking layer using an IR blocking agent, composed of an inorganic metal oxide, a boron compound, a diluents, an additive, and a catalyst on a side surface of a first PET film layer which corresponds to a base film; a drying step (S110) which dries the organic IR blocking layer; a formation step (S121) which forms a sputtering layer for IR reflection on a surface, on which the organic IR blocking layer is formed, about 10-50 times; an adhesion step (S130) which glues 2 PET film on a surface of the sputtering layer; a step (S140) which glues a releasing film on a surface of the sputtering layer; and a coating step (S150) which coats a hard coating layer on a surface on the other side of a 1 PET film. [Reference numerals] (AA,DD) Supply first PET film; (BB) Supply second PET film; (CC) Supply releasing film; (S100) Organic IR blocking layer coating step; (S110) Organic IR blocking layer drying step; (S120) Sputtering layer forming step; (S121) Sputtering layer about 10-50 times forming step; (S130) Adhesion layer coating step; (S140) Releasing film gluing step; (S150) Hard coating layer coating step; (S160) UV curing step

Description

Sputtering coated with boron compounds, multi-layer thermal shutdown films manufacturing process that combines a transparent way}

The present invention relates to a manufacturing method using a transparent thermal barrier coating and a sputtering method to which the boron compound is added, and more particularly, a transparent thermal barrier comprising a complex structure of a blocking layer in order to combine effective barrier properties and permeability. It relates to a film production method.

Sunlight is largely divided into ultraviolet (100 ~ 380 nm), visible light (380 ~ 780 nm), infrared (780 ~ 60000 nm), infrared is again divided into near infrared and far infrared. Among them, UV light consists of about 6%, visible light about 46%, and infrared light about 48%. UV light causes skin aging and cancer when the skin is exposed for a long time. This will cause an increase in summer cooling costs.

Recently, in order to block the direct irradiation of sunlight including ultraviolet rays and infrared rays, products have been developed and put into practical use by attaching various barrier films to window glass of automobiles and buildings to prevent exposure to ultraviolet rays and infrared rays. have. Such a barrier film itself not only blocks ultraviolet rays and infrared rays, but also complements the mechanical strength of the window glass, prevents glass fragments from scattering when the window glass breaks, and protects privacy when the colored film is applied. It performs a variety of functions, including roles.

KR 10-068300 KR 10-018538 KR 2004-0072862A The method of manufacturing by coating a dye and a UV absorber diluted with a coating resin and a solvent on the cross-section of the polyester film is 'Korean Patent No. 068300', a heat-sensitive absorber which is an organic compound to the adhesive resin, and the UV cured hard coating layer The method of blending and using a dye in a resin for a resin consists of the Republic of Korea Patent No. '018538', a polyester support layer and a polyester color layer containing a dye and an adhesive coating layer, the dye in at least one layer of such a multilayer structure Korean Patent Publication No. 2004-0072862 has been proposed as a method for containing. In general, inorganic oxides used as thermal barrier materials have excellent durability and high thermal barrier properties, but their application range is limited due to their low visible light transmittance. Inorganic oxides include antimony tin oxide (ATO), indium tin oxide (ITO), silica dioxide (SiO2), alumina trioxide (Al2O3), molybdenum trioxide (MoO3), niobium pentoxide (Nb2O5), vanadium pentoxide (V2O5) ), Tungsten bronze (Tungsten Bronze), etc. are used most of them, and the inorganic oxides having good infrared blocking properties are actually antimony tin oxide (ATO), indium tin oxide (ITO) and tungsten bronze (Tungsten Bronze). There is this. 1 is a cross-sectional view of a thermal barrier film as an example in the prior art. And a base layer on which a heat shielding layer is formed to block radiant heat flowing in and out of the room and out, and a protective layer on which an adhesive layer is adhered to the heat shielding layer, wherein the heat shielding layer and the adhesive layer are dried by microwave waves. do. However, in the case of the thermal barrier film according to the prior art, it is common to use only one of a wet coating or a sputtering coating and to manufacture the thermal barrier film. In the case of a wet coating, the glass surface temperature rises due to the high heat absorption rate. There is a problem that occurs, and if only the sputtering process is manufactured, there is a problem that the indoor jamming phenomenon occurs when the reflectance is increased to maintain a high heat shielding rate.

The present invention for solving the problems described above can reduce the thickness of the entire film by forming an organic IR blocking layer of the thermal barrier film through the boron compound that can control the transmittance of a specific wavelength can ensure high productivity, durability To provide a transparent thermal barrier film that can improve the purpose is to.

In addition, the present invention is to provide a transparent thermal barrier film that can have advantages according to each method by combining both wet coating and sputtering coating method.

The present invention for achieving the above object, in the method for manufacturing a transparent thermal barrier film, including an inorganic metal oxide, a boron compound, a diluent, an additive, a catalyst on one surface of the first PET film layer corresponding to the base film Coating an organic IR blocking layer using an IR blocking agent configured, drying the organic IR blocking layer, and forming a sputtering layer for IR reflection on the surface on which the organic IR blocking layer is formed 10 to 50 times And adhering a second PET film to the surface of the sputtering layer, adhering the second PET film release film, and coating a hard coating layer to the other surface of the first PET film, wherein the sputtering layer forming step comprises an inorganic metal. An oxide is formed through a sputtering process, and the inorganic metal oxide selectively sputters the coating layer of ITO, AZO, Ag, AZO, or ITO. W thereby forming the respective coating layers it is characterized in that the coating capable to replace any one of W, Ni, Cr, Al, SuS, Ti.

In addition, the organic IR blocking layer drying step is characterized in that the drying through hot air drying and ultraviolet drying.

In addition, the hard coating layer forming step, characterized in that to form by dispersing ceramic nanoparticles of 20 to 30nm size.

In addition, after the hard coating layer forming step, further comprises a curing step using UV.

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In addition, it is characterized by controlling the transmittance for each wavelength by controlling the amount of the boron compound added.

As it uses chemically stable metal oxides constructed and operated as described above, it maintains stability against heat and light as well as acids and alkalis, and is free from defects such as oxidation and sulfidation caused by air, and is based on metal deposition coating method and plasma sputter. There is no reflection and mirror effect that appears in the method, and it eliminates the diffuse reflection, so the sign recognition is excellent, the center line of the road can be seen better in rainy weather, and it has the advantage of securing a clear and bright view.

In addition, compared to metal-coated tinted film, it does not interfere with wireless equipment at all, and provides comfort while driving with hot heat and glare protection.

In addition, the use of the thermal barrier film according to the present invention increases the performance and air-conditioning efficiency of the air conditioner and heater, excellent front visibility by excellent perspective, almost no reflection / retroreflection during night driving, and optimally filter the light of the oncoming vehicle This reduces the risk of eye fatigue and reduces the risk of driving at night.

In addition, the present invention by coating the metal thin film for forming the organic IR blocking layer through the Roll to Roll Sputter system to be able to combine wet coating and sputtering coating has the advantage of freely controlling the color, visible light transmittance, infrared reflectance, etc. have.

1 is a cross-sectional configuration of the thermal barrier film according to the prior art,
2 is a flow chart of a method for manufacturing a multilayer transparent thermal barrier film incorporating a boron compound coating and a sputtering process according to the present invention;
3 is a cross-sectional view showing the structure of a transparent thermal barrier film to which a boron compound is added according to the present invention;
4 is a cross-sectional view showing the structure of a sputtering layer according to the present invention;
5 is a view showing a sputtering system for forming an organic IR blocking layer of the transparent thermal barrier film according to the present invention,
6 is a spectrophotometer measurement graph of a single layer sputtered thermal barrier film,
Figure 7 is a spectrophotometer measurement graph of the thermal barrier film to which the boron compound is added according to the present invention.

Hereinafter, with reference to the accompanying drawings will be described in detail a preferred embodiment of the method for manufacturing a multi-layer transparent thermal barrier film incorporating the boron compound coating and sputtering process according to the present invention.

The method of manufacturing a multilayer transparent thermal barrier film incorporating a boron compound coating and a sputtering process according to the present invention includes an inorganic metal oxide and a boron compound on one surface of a first PET film layer corresponding to a base film in a transparent thermal barrier film manufacturing method. Coating an organic IR blocking layer using an IR blocking agent comprising a dilution solvent, an additive, and a catalyst, drying the organic IR blocking layer, and sputtering for IR reflection to a surface on which the organic IR blocking layer is formed. Forming a layer 10 to 50 times, adhering a second PET film to the surface of the sputtering layer, adhering the second PET film release film, and coating a hard coating layer on the other surface of the first PET film In the forming of the sputtering layer, an inorganic metal oxide is formed through a sputtering process, and the inorganic metal oxide is IT O, AZO, Ag, AZO, ITO is formed by sputtering the coating layer selectively, wherein each of the coating layer is characterized in that the coating can be replaced by any one of W, Ni, Cr, Al, SuS, Ti.

The transparent heat-transfer film to which the boron compound is added according to the present invention can control the transmittance of a specific wavelength using the boron compound, can be made thin in thickness, and provide a heat shielding film manufacturing method having high durability, cyanity, and shielding property. There is a purpose.

In the method for manufacturing a thermal barrier film according to the present invention, coating the organic IR coating layer 110 on the surface of the first PET (Polyethylele Terephthalate) film 100 corresponding to the base film (S100), drying the organic IR blocking layer 110 (S110), forming a sputtering layer 120 through the sputtering process with the organic IR coating layer (S120), adhering the second PET film 130, and the hard coating layer 160 with the first PET film It is largely configured to form a step (S150).

2 is a flow chart of a method for manufacturing a transparent thermal barrier film to which a boron compound according to the present invention is added, and FIG. 3 is a cross-sectional view showing the structure of a thermal barrier film according to the present invention.

First, after preparing the first PET film 100 corresponding to the base film to form an organic IR blocking layer 110 for blocking the infrared (IR) to the film surface (S100). The organic IR blocking layer may adjust the transmittance of each wavelength by adding a boron compound as a main technical gist of the present invention. The organic IR blocking layer 110 is formed by wet spraying and sputtering by mixing an inorganic metal oxide, a boron compound, a diluent solvent, an additive, and a catalyst.

Inorganic metal oxides act as IR reflectors by coating ATO or ITO nanoparticles. The size of the metal oxide is preferably 1 / 1,000,000,000 m of ultra fine powder. These metal oxides are mixed with acrylic acid, photocatalysts and other high molecular compounds.

The boron compound is a main additive according to the present invention, and is applied by mixing the organic solvent and the boron compound by wet spraying. The boron compound is to control the wavelength transmittance of 800 ~ 1000nm, it is possible to manufacture a thickness of 3um or less by applying this.

Diluent solvent is an organic solvent having a polar structure, is added to control the coating viscosity and coating leveling properties, the additive is a type of wet dispersion agent, the main component is methoxy proacetate-based, the role is to control the polarity of the coating liquid It prevents agglomeration of nano ceramic particles to improve coating leveling property. The catalyst assists the role of photocatalyst contained in the main material, and activates Curing area at 350 ~ 400nm area, which is the largest part of the UV Lamp emission wavelength, greatly improving the curing rate and maximizing product yield and at the same time Increase the quality level (appearance). Bis (2,4,6-Trimethylbenzoyl) -phenylphosphineoxide may be used as the main component of the catalyst.

On the other hand, in a preferred embodiment according to the present invention can form a barrier layer of a multi-layer structure with a metal oxide layer (sputtering layer) for the organic IR blocking layer configuration, it is configured through a Roll to Roll Sputter. The roll-to-roll sputtering system is formed by sequentially sputtering at a target when a target, which is a material to be deposited, is sequentially arranged in a vacuum chamber through which a base film is supplied through a roller, and the film is sequentially sputtered at the target. It is to deposit a thin metal film on the surface.

At this time, the present invention is characterized in that the sputtering layer corresponding to the IR blocking layer is continuously deposited up to 10 to 50 times in order to improve the infrared blocking rate.

The organic IR blocking layer 110 formed as described above increases the reflectance and offsets the high heat absorption rate indicated as a problem in organic and inorganic coatings, thereby preventing heat from being transferred to the inside by conduction, thereby improving efficiency in terms of overall energy management. To maximize. After coating the organic IR barrier layer, drying with hot air and ultraviolet rays is preferable.

Before forming the organic IR blocking layer, an adhesive layer is applied, and an organic IR coating liquid capable of selectively absorbing / blocking high 800 nm to 1000 nm regions is mixed with a transparent adhesive layer to coat the organic coating layer to directly induce infrared inflow. You can block.

After forming the organic IR blocking layer, the second PET film 130 is again bonded. That is, the organic IR blocking layer is formed between the first PET film and the second PET film.

Then, in order to attach to a product such as glass or window, the adhesive layer 140 is applied to the surface of the second PET film to add an adhesive function (S130), and the release film 150 is attached to the adhesive layer (S140).

Finally, the hard coating layer 160 is formed on the other side of the base film (S150). The hard coating layer is for improving durability, and is a mixture of ceramic particles dispersed in the nanoparticles (20 ~ 30nm) to the surface scratch-resistant coating paint, and prevents the wavelength of 800 ~ 2500nm region directly enters the room.

The hard film layer 150 is coated on the other side of the PET film corresponding to the base film, and on one side, the organic coating layer, the organic IR blocking layer 110, the adhesive layer 160, and the release film are formed (S150). . In the case of the thermal barrier film produced in a single piece, the release film 170 may be further configured as the other side of the base film. A release film is a film which is removed when adhering a thermal barrier film to a glass window or a vehicle glass. When the release film is removed, the adhesive layer is exposed so that the thermal barrier film is asked through the adhesive. After adhering the release film, finally, the entire film is cured through the UV curing step (S160) to finish durability.

Figure 4 is a cross-sectional view showing the structure of the sputtering layer of the transparent thermal barrier film to which the boron compound is added according to the present invention, Figure 5 is a view showing a sputtering system for forming an organic IR blocking layer of the transparent thermal barrier film according to the present invention to be. As mentioned above, in the present invention, the organic IR blocking layer may be sequentially sputtered through a roll-to-roll sputtering system. In more detail, the metal oxide of the organic IR blocking layer according to the present invention is characterized by forming a sputtering layer by selectively coating ITO coating, AZO coating, Ag coating, AZO coating, ITO coating. At this time, the position according to each material can be deposited at random, for example, AZO, ITO, Ag, ITO, AZO in order or may be formed in various ways, such as ITO, Ag, AZO, ITO, AZO.

In addition, in the present invention, in order to maximize the blocking efficiency through the deposition material and to reduce the manufacturing cost by replacing the deposition material, each coating layer material of ITO, Ag, AZO, ITO, AZO W, Ni, Cr, Al, SuS, It can be deposited by any one selected from Ti. For example, it may be deposited using aluminum (Al) instead of the ITO coating layer, and Ni may be deposited instead of the Ag coating layer. As described above, the deposition of materials in place of W, Ni, Cr, Al, SuS, and Ti is advantageous in that the manufacturing cost can be realized while optimizing the blocking efficiency.

The sputtering layer may implement sputtering continuously on a PET film supplied through a roll-to-roll sputtering system. The main technical gist of the present invention is to form the sputtering layer 10 to 50 times, and one sputtering layer 120-1 composed of each coating layer 121 to 125 is formed of multiple layers 120-2, 120-,. .....) to be formed more than 10 times, less than 50 times.

6 is a spectrophotometer measurement graph of the single-layer sputtered thermal barrier film, Figure 7 is a spectrophotometer measurement graph of the thermal barrier film to which the boron compound according to the present invention is added. As can be compared in the two graphs, the product containing the boron compound is blocked to the maximum in the 800-1000nm region that contains the most energy among the infrared regions, thereby maximizing the thermal barrier effect than the general type using the conventional ATO.

The present invention constructed and functioned as described above maximizes the advantages of the thermal barrier film by blocking all wavelengths of the NIR (Near Infrared) region directly into the room by applying organic and inorganic coatings and increasing reflectance in the NIR region through a sputtering process. It has an excellent effect.

While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it is to be understood that the invention is not limited to the disclosed exemplary embodiments. On the contrary, those skilled in the art will appreciate that many modifications and variations of the present invention are possible without departing from the spirit and scope of the appended claims. And all such modifications and changes as fall within the scope of the present invention are therefore to be regarded as being within the scope of the present invention.

100: PET film layer
110: organic IR blocking layer
120: sputtering layer
120-1 to 120-4: Sputtering Layer
130: second PET
140: adhesive layer
150: release film

Claims (6)

In the transparent thermal barrier film manufacturing method,
Coating an organic IR barrier layer using an IR barrier agent comprising an inorganic metal oxide, a boron compound, a diluent solvent, an additive, and a catalyst on one surface of the first PET film layer corresponding to the base film;
Drying the organic IR blocking layer;
Forming a sputtering layer for IR reflection 10 to 50 times on the surface on which the organic IR blocking layer is formed;
Adhering a second PET film to the surface of the sputtering layer;
Adhering a release film to a surface of the second PET film; And
And coating a hard coating layer on the other surface of the first PET film.
The sputtering layer forming step is to form an inorganic metal oxide through a sputtering process and to form a sputtering layer using any one of ITO, AZO, Ag, AZO, ITO as the inorganic metal oxide, respectively,
A sputtering layer formed by selectively using ITO, AZO, Ag, AZO, or ITO may be formed by replacing any one of W, Ni, Cr, Al, SuS, and Ti with a boron compound coating and a sputtering process. Multi-layer transparent thermal barrier film manufacturing method. The method of claim 1, wherein the organic IR blocking layer drying step,
A method of manufacturing a multilayer transparent thermal barrier film incorporating a boron compound coating and a sputtering process, characterized by drying through hot air drying and ultraviolet drying. The method of claim 1, wherein the hard coating layer forming step,
A method of manufacturing a multilayer transparent thermal barrier film incorporating a boron compound coating and a sputtering process, characterized in that the ceramic nanoparticles having a size of 20 to 30 nm are dispersed and formed. According to claim 1 or 3, After the hard coating layer forming step,
Method of manufacturing a multi-layer transparent thermal barrier film incorporating a boron compound coating and sputtering process further comprising a curing step using UV. delete The method of claim 1,
A method of manufacturing a multilayer transparent thermal barrier film incorporating a boron compound coating and a sputtering process, the transmittance of each wavelength is controlled by controlling the addition amount of the boron compound.

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