KR101300361B1 - Removal mechanism of rotation roller - Google Patents

Abstract

The present invention relates to a decontamination mechanism of a rotary roll, wherein the holding block 110 is mounted on the rotating roll 90, and the inside of the holding block 110 is formed in a ring shape around the outer circumference of the rotating roll 90. Install the sealing 111 in contact. The retaining block 110 is allowed to move freely in the axial direction of the rotary roll 90 by the moving mechanism 120. When the contamination of the rotary roll 90 is removed, the retaining block 110 moves from one end side of the rotary roll 90 to the other end side. Thereby, the sealing 111 scrapes off the contamination of the surface of the rotating roll 90, and removes it. The sealing 111 moved to the other end side of the rotary roll 90 provides a technique for reducing the usage amount of the cleaning liquid for cleaning the rotating roll cleaned by the cleaning liquid from the nozzle.

Description

Decontamination mechanism of rotary rolls {REMOVAL MECHANISM OF ROTATION ROLLER}

1 is a plan view showing an outline of a configuration of a coating and developing treatment apparatus according to the present embodiment.

2 is an explanatory view of a longitudinal section showing an outline of the configuration of a resist coating processing unit.

3 is a plan view schematically illustrating the configuration of a resist coating processing unit.

4 is an explanatory diagram of a nozzle.

5 is a perspective view of a holding block mounted to a rotating roll.

6 is a longitudinal cross-sectional view of the retaining block and the rotary roll.

7 is a perspective view of the sealing.

8 is an explanatory view of a longitudinal section showing an outline of a configuration of a moving mechanism of a holding block.

It is a longitudinal cross-sectional view of a holding block and a rotating roll at the time of removing the contamination of a rotating roll.

It is a longitudinal cross-sectional view of a holding block and a rotating roll at the time of providing the groove | channel in the edge part of a rotating roll.

It is a longitudinal cross-sectional view of the holding block which provided the washing nozzle.

12 is a front view of the retaining block in the case where a plurality of cleaning nozzles are provided.

13 is a longitudinal sectional view of the holding block before and after the cleaning nozzle.

It is a longitudinal cross-sectional view of a holding block and a rotating roll in the case of providing two sealing.

Fig. 15 is a longitudinal sectional view of a holding block in which a cleaning liquid supply port for prewet is formed.

It is a side view of the holding block in which the washing | cleaning liquid supply port for prewet was formed.

It is a longitudinal cross-sectional view of a holding block and a rotating roll when a brush is attached to the edge part of a rotating roll.

It is a perspective view of the holding block attached to the rotating roll when a holding block is a semicircle shape.

19 is a side view of the retaining block and the rotary roll.

It is a longitudinal cross-sectional view of a holding block and a rotating roll.

It is a longitudinal cross-sectional view of the holding block and the rotating roll in which the cleaning liquid supply port for prewet was formed.

It is a longitudinal cross-sectional view of a holding block and a rotating roll in the case where a plurality of holding blocks are provided.

** Description of reference numerals indicating main parts **

1: coating and developing apparatus

24: resist coating processing unit

90: rotating roll

110: pussy block

111: sealing

120 moving mechanism

H: cleaning liquid

G: glass substrate

The present invention relates to a decontamination mechanism of a rotary roll to which the coating liquid is supplied from the nozzle before the coating liquid is discharged from the nozzle to the substrate.

For example, in the photolithography process of the manufacturing process of a liquid crystal display, the resist coating process which apply | coats a resist liquid on a glass substrate and forms a resist film is performed.

This resist coating process is normally performed in the resist coating process unit, for example, by placing a glass substrate on a stage, and discharging a resist liquid, moving a nozzle on the upper surface of the glass substrate.

However, in the resist coating processing unit as described above, in order to stabilize the discharge state of the nozzle at the time of coating, the resist liquid is applied from the nozzle to the rotating roll while the tip of the nozzle approaches the upper surface of the rotating roll before the application of the coating. Does the processing.

In addition, if the rotary roll contaminated with the resist liquid is left as it is, the nozzle becomes dirty at the next start-up. Therefore, the rotary roll is cleaned after the end of the start-up. Conventionally, the washing | cleaning process of this rotating roll is performed by setting the lower part of a rotating roll in the washing | cleaning liquid stored in the tank, and rotating a rotating roll (refer patent document 1).

 [Patent Document 1] Japanese Patent Application Laid-Open No. 10-76205

However, as described above, when the cleaning liquid is stored in the tank to wash the rotary rolls, the cleaning liquid needs to be replaced every time the washing tank is filled with a large volume so that the rotary rolls can enter. For this reason, the running cost of the resist coating process unit was high.

This invention is made | formed in view of the related point, and an object of this invention is to reduce the usage-amount of the cleaning liquid which wash | cleans a rotary roll, and to reduce the running cost of coating processing units, such as a resist coating processing unit.

The present invention for achieving the above object is a decontamination mechanism of the rotary roll to which the coating liquid is supplied from the nozzle before the coating liquid is discharged from the nozzle to the substrate and the contact member in annular contact with the circumference of the outer peripheral surface of the rotating roll; And a moving mechanism for moving the contact member along the axial direction of the rotary roll.

According to this invention, a contact member can be moved along the axial direction of a rotating roll, and the contamination of the surface of a rotating roll can be wiped out. Therefore, since it is not necessary to collect a washing | cleaning liquid in a tank and wash | clean a rotary roll like conventionally, the usage-amount of washing | cleaning liquid can be reduced and cost can be reduced.

The decontamination mechanism of the rotary roll may have a cleaning nozzle for discharging the cleaning liquid on the surface of the rotary roll on the front side in the advancing direction of the contact member.

The said cleaning nozzle may make it possible to discharge a cleaning liquid to the upper surface of the said rotating roll.

The said cleaning nozzle may be provided in multiple places so that the outer peripheral surface of a rotating roll may be enclosed.

The said cleaning nozzle may be provided in the both sides of the moving direction of the said contact member.

The said contact member is hold | maintained by the holding member which moves to the axial direction of a rotating roll by the said moving mechanism, and the said washing nozzle may be attached to the said holding member.

The contact member may be provided in plurality along the axial direction of the said rotary roll.

Two contact members are disposed in close proximity to the rotating roll, and the two contact members are disposed to have a gap therebetween, and a cleaning liquid supply part for supplying a cleaning liquid to the surface of the rotating roll is formed at a gap between the two contact members. It's okay to stay.

The said cleaning liquid supply part may be formed in ring shape along the circumference of the outer peripheral surface of the said rotary roll.

The cleaning liquid supply pipe and the cleaning liquid discharge pipe may be connected to the cleaning liquid supply unit.

The two contact members may be provided in a block surrounding the circumference of the outer circumferential surface of the rotary roll, and the cleaning liquid supply portion may be formed in a groove shape on the inner circumferential surface of the block opposite to the outer circumferential surface of the rotary roll. .

The decontamination mechanism of the rotary roll may have a control unit that detects a load for supplying a cleaning liquid to the cleaning liquid supply unit and determines whether to replace the contact member based on the detection result.

The prewetting cleaning liquid supply part which supplies the cleaning liquid for prewetting the surface of the said rotary roll to the surface of the said rotary roll may be formed in the both sides of the movement direction of the block.

According to another aspect of the present invention, there is provided a contact member which contacts a portion of the circumference along the circumference of the outer circumferential surface of the rotating roll as a decontamination mechanism of the rotating roll to which the coating liquid is supplied from the nozzle before the coating liquid is discharged from the nozzle to the substrate. And a moving mechanism for moving the contact member along the axial direction of the rotary roll.

According to the findings of the inventors, according to the decontamination mechanism of the present invention, even when the contact member contacts a part of the circumference of the outer circumferential surface of the rotary roll, the rotary roll is rotated so that the contact member is reciprocated several times along the axial direction of the rotary roll. By moving, the contamination of the surface of a rotating roll can be wiped out. Moreover, since the contact member contacts only a part of the circumference of the outer circumferential surface of the rotary roll, the contact member can be easily separated from the rotary roll, and maintenance of the contact member can be performed easily.

The decontamination mechanism of the rotating roll may have a cleaning nozzle for discharging a cleaning liquid on the surface of the rotating roll on the front side in the advancing direction of the contact member.

The said cleaning nozzle may be provided in multiple places toward the outer peripheral surface of the said rotary roll.

The said cleaning nozzle may be provided in the both sides of the moving direction of the said contact member.

The said contact member is hold | maintained by the holding member which moves to the axial direction of the said rotary roll by the said moving mechanism, and the said cleaning nozzle may be attached to the said holding member.

The contact member may be provided in plurality along the axial direction of the said rotary roll.

Two contact members are disposed in close proximity to the rotating rolls, and the two contact members are disposed such that a gap is formed therebetween, and a cleaning liquid supply part for supplying a cleaning liquid to the surface of the rotating roll is formed at a gap between the two contact members. It's okay to stay.

The said cleaning liquid supply part may be formed along the circumference of the outer peripheral surface of the said rotary roll.

The cleaning liquid supply pipe may be connected to the cleaning liquid supply unit.

The two contact members are provided in a block disposed along the circumference of the outer circumferential surface of the rotating roll, and the cleaning liquid supply portion is formed in a groove shape on the inner circumferential surface of the block opposite to the outer circumferential surface of the rotating roll. It's okay to stay.

The decontamination mechanism of the rotary roll may have a control unit that detects a load for supplying a cleaning liquid to the cleaning liquid supply unit and determines whether to replace the contact member based on the detection result.

Guide members are provided on both sides of the moving direction of the contact member so that the contact member and the guide member are disposed so as to form a gap therebetween. A prewet cleaning liquid supply unit for supplying the liquid may be formed.

The decontamination mechanism is provided in plural along the axial direction of the rotary roll, and the contact portion between the contact members of the plurality of decontamination mechanisms and the outer peripheral surface of the rotary roll when viewed from the axial direction of the rotary roll is the rotary roll. You may touch the perimeter of the outer periphery.

The decontamination mechanism of the said rotary roll may have a control part which detects the load for moving the said contact member, and judges whether the replacement of the said contact member is based on the detection result.

The decontamination mechanism of the rotary roll may have a cleaning liquid supply part for a contact member for supplying a cleaning liquid to the contact member.

The said cleaning liquid supply part for contact members may be a nozzle which discharges cleaning liquid with respect to the contact member moved to the edge part of the axial direction of a rotating roll.

The said contact member cleaning liquid supply part may be comprised by the annular groove formed in the outer peripheral surface of the edge part of the said rotary roll, and the cleaning liquid discharge port formed in the said groove | channel.

The outer circumferential surface of the end of the rotary roll may be provided with a brush for cleaning the tip of the contact member.

The contact member may be formed of a seal material.

Hereinafter, preferred embodiments of the present invention will be described. FIG. 1: is a top view which shows the outline of the structure of the application | coating development apparatus 1 in which the decontamination mechanism of the rotating roll which concerns on this embodiment was mounted.

 As shown in FIG. 1, the coating and developing treatment apparatus 1 performs a predetermined process in a sheet-fed manner in a cassette station 2 and a port lithography step for carrying in and out of a plurality of glass substrates G, for example, in cassette units. The interface station which is installed adjacent to the processing station 3 and the processing station 3 on which various processing units for applying the pressure is disposed and performs the transfer of the glass substrate G between the processing station 3 and the exposure apparatus 4 It has the structure which connected (5) integrally.

The cassette mounting base 10 is provided in the cassette station 2, and the said cassette mounting base 10 can arrange | position several cassette C in a line in the X direction (up-down direction in FIG. 1). The cassette station 2 is provided with a substrate carrier 12 which is movable on the conveying path 11 in the X direction. The substrate carrier 12 is free to move in the arrangement direction (Z direction; vertical direction) of the glass substrate G accommodated in the cassette C, and is attached to the glass substrate G in each cassette C arranged in the X direction. Can optionally be accessed.

The substrate carrier 12 is rotatable in the θ direction around the Z axis and can also access each unit of the excimer UV irradiation unit 20 and the sixth heat treatment unit group 34 on the processing station 3 side described later. Can be.

The processing station 3 is provided with the conveyance lines A and B of 2 rows extended, for example in the Y direction (left-right direction of FIG. 1). In this conveyance line (A, B), glass substrate G can be conveyed by rotor conveyance, conveyance by an arm, etc. In the conveyance line A of the negative direction side (lower part of FIG. 1) which is the front side of the processing station 3, for example, a glass substrate from the cassette station 2 side toward the interface station 5 side Excimer UV irradiation unit 20 for removing the organic substance of (G), the scrubber cleaning unit 21 which cleans the glass substrate G, the 1st heat processing unit group 22, and the 2nd heat processing unit group 23 , The resist coating processing unit 24 for applying the resist liquid to the glass substrate G, the reduced pressure drying unit 25 for drying the glass substrate G under reduced pressure, and the third heat treatment unit group 26 in a straight line It is deployed.

In the first and second heat treatment unit groups 22 and 23, a plurality of heat treatment units for heating the glass substrate G and a cooling treatment unit for cooling the glass substrate G are stacked in multiple stages. Between the 1st heat processing unit group 22 and the 2nd heat processing unit group 23, the conveyance body 27 which conveys the glass substrate G between these unit groups 22 and 23 is provided. . Similarly, the heat treatment unit and the cooling treatment unit are stacked in multiple stages in the third heat treatment unit group 26.

In the conveyance line B of the positive direction side (upper side of FIG. 1) which is the rear surface side of the processing station 3, it is 4th in order toward the cassette station 2 side from the interface station 5 side, for example. Of the heat treatment unit group 30, the developing unit 31 for developing the glass substrate G, the i-ray UV irradiation unit 32 for decolorizing the glass substrate G, and the fifth heat treatment unit group (33) and the sixth heat treatment unit group 34 are arranged in a line in a straight line.

In the fourth to sixth heat treatment unit groups 30, 33, and 34, a heat treatment unit and a cooling treatment unit are stacked in multiple stages, respectively. Moreover, between the 5th heat processing unit group 33 and the 6th heat processing unit group 34, the conveyance body 40 which conveys the glass substrate G between these unit groups 33 and 34 is It is installed.

Between the third heat treatment unit group 26 of the conveying line A and the fourth heat treatment unit group 30 of the conveying line B, the glass substrate G between these unit groups 26 and 30 The conveyance body 41 which conveys is provided. This conveyance body 41 can convey glass substrate G also about the extension cooling unit 60 of the interface station 5 mentioned later.

Between the conveyance lines (A) and (B), the linear space 50 along the Y direction is formed. In the space 50, the shuttle 51 which mounts and conveys glass substrate G is provided. The shuttle 51 is free to move from the end of the cassette station 2 side of the processing station 3 to the end of the interface station 5 side, and with respect to each carrier 27, 40, 41 in the processing station 3. The glass substrate G can be passed.

The interface station 5 has, for example, an extension cooling unit 60 having a cooling function and passing the glass substrate G, a buffer cassette 61 temporarily housing the glass substrate G, and an external device block. 62 is provided. The external device block 62 is provided with a titler for exposing the production management code to the substrate G and a peripheral exposure apparatus for exposing the peripheral portion of the glass substrate G. The interface station 5 has a substrate carrier 63 capable of conveying the glass substrate G with respect to the extension cooling unit 60, the buffer cassette 61, the external device block 62, and the exposure apparatus 4. It is installed.

In this coating and developing apparatus 1, the glass substrate G carried in from the cassette station 2 performs the cleaning treatment, the heat treatment, the resist coating treatment, the drying treatment, and the like, while the interface station passes through the transfer line A. It is conveyed to (5). And the glass substrate G is conveyed to the exposure apparatus 4 from the interface station 5, and the glass substrate G in which the exposure process was complete | finished with the exposure apparatus 4 carries out heat processing, image development processing, heat processing, etc., a conveyance line It is returned to the cassette station 2 through (B).

Next, the structure of the resist coating process unit 24 which has a decontamination mechanism of a rotating roll is demonstrated.

The resist coating processing unit 24 is provided with a stage 70 elongated in the Y direction along the conveying line A, for example, as shown in FIGS. 2 and 3. On the upper surface of the stage 70, a plurality of gas ejection openings 71 are formed as shown in FIG. On both sides of the stage 70 in the width direction (X direction), a pair of first guide rails 72 extending in the Y direction are formed. The 1st guide rail 72 is provided with the pair of holding arm 73 which hold | maintains the edge part of the width direction of the glass substrate G, and moves on the 1st guide rail 72, respectively. By ejecting the gas from the gas ejection port 71, the glass substrate G is floated, and both ends of the floated glass substrate G are held by the holding arm 73, and the glass substrate G is conveyed. Can be moved along

On the stage 70 of the resist coating processing unit 24, the nozzle 80 which discharges a resist liquid to the glass substrate G is provided. The nozzle 80 is formed in the substantially rectangular parallelepiped shape long toward an X direction, for example as shown to FIG. 3 and FIG. The nozzle 80 is formed longer than the width of the X direction of the glass substrate G, for example. A slit-shaped discharge port 80a is formed in the lower end part of the nozzle 80 as shown in FIG. The resist liquid supply pipe 82 which connects to the resist liquid supply source 81 is connected to the upper part of the nozzle 80.

As shown in FIG. 3, the second guide rails 83 extending in the Y direction are formed on both sides of the nozzle 80. The nozzle 80 is held by the nozzle arm 84 moving on the second guide rail 83. The nozzle 80 is movable in the Y direction along the second guide rail 83 by the drive mechanism of the nozzle arm 84. For example, the lifting mechanism is provided in the nozzle arm 84, and the nozzle 80 can raise and lower to a predetermined height. By the related structure, the nozzle 80 is the discharge position E which discharges a resist liquid to the glass substrate G, and the rotating roll 90 and the standby part 91 which are mentioned later in the negative direction side of Y direction more than that. You can move between.

As shown in FIGS. 2 and 3, the rotation of the nozzle 80 is driven upstream from the discharge position E of the nozzle 80, that is, in the negative direction of the Y direction of the discharge position E of the nozzle 80. The roll 90 is provided. The rotary roll 90 is formed longer than the nozzle 80, for example toward the X direction. The nozzle 80 is discharged by discharging the resist liquid from the discharge port 80a to the rotary roll 90 while rotating the rotary roll 90 by bringing the discharge port 80a of the nozzle 80 close to the top of the rotary roll 90. The adhesion state of the resist liquid in the discharge port 80a of the can be arranged, and the discharge state of the resist liquid can be stabilized.

The standby part 91 of the nozzle 80 is provided further upstream of the rotating roll 90. In this waiting part 91, the function which wash | cleans the nozzle 80, and the function which prevents drying of the nozzle 80 are provided, for example.

The rotary roll 90 is provided with the decontamination mechanism 100 of the rotary roll 90.

Hereinafter, the decontamination mechanism 100 of this rotating roll 90 is demonstrated.

As shown in FIG. 5, the rotating roll 90 is provided with the plate-shaped holding member which is thick, and the holding block 110 as a block. In the retaining block 110, a through hole 110a is formed in the center portion, and the rotary roll 90 is inserted into the through hole 110a. As shown in FIG. 6, the through hole 110a of the retaining block 110 has a diameter substantially the same as that of the rotating roll 90, and the retaining block 110 is axially (X direction) with respect to the rotating roll 90. The through hole 110a is formed slightly larger than the diameter of the rotary roll 90 so as to be movable.

Inside the retaining block 110, a sealing 111 as a contact member is provided. The sealing 111 is formed in the annular shape which encloses the circumference of the rotating roll 90 as a thin plate shape, as shown in FIG. As shown in Fig. 6, the inner circumferential surface of the sealing 111 is formed in a tapered shape in which one side of the positive direction in the X direction is inclined, and the tip portion 111a, which is the innermost circumferential portion, is the outer circumference of the rotary roll 90. It is in contact with the circumference of a face in ring shape. As the sealing 111, for example, a sealing material such as fluorine-based resin or rubber, which is excellent in chemical resistance and wear resistance, is used.

The retaining block 110 is provided with a moving mechanism 120 as shown in FIG. 8, for example. For example, in the case J of the lower part of the rotating roll 90, the drive pulley 121 and the driven pulley 122 are provided along the axial direction of the rotating roll 90. As shown in FIG. The drive pulley 121 and the driven pulley 122 are provided outside the axial end of the rotating roll 90, for example. The servo motor 124 driven by the power supply 123 is connected to the drive pulley 121, for example. The belt 125 is fastened between the drive pulley 121 and the driven pulley 122, and the slider 126 is fixed to the belt 125. The retaining block 110 is fixed to the slider 126 via the support 127. By moving the drive pulley 121 by the servo motor 124 to move the slider 126 in the X direction, the retaining block 110 is moved between both ends of the rotary roll 90 along the axial direction of the rotary roll 90. You can move it across.

For example, operations such as the moving speed and the moving timing of the holding block 110 are controlled by the control unit 128, for example. In the present embodiment, the moving mechanism 120 includes a drive pulley 121, a driven pulley 122, a power source 123, a servo motor 124, a belt 125, a slider 126, and a support ( 127 and the control unit 128.

The nozzle 130 as a washing | cleaning liquid supply part for contact members is provided in the edge part of the rotating roll 90 in the positive direction of the X direction, for example. The nozzle 130 is connected to the cleaning liquid supply device 132 through, for example, a cleaning liquid supply pipe 131. The nozzle 130 is, for example, directed at the interval between the inner circumferential surface of the retaining block 110 and the outer circumferential surface of the rotary roll 90. The cleaning liquid can be supplied from the nozzle 130 to the space | interval of the holding block 110 and the rotating roll 90 which moved to the positive direction X direction, and the sealing 111 in the holding block 110 can be wash | cleaned.

For example, at the lower part of the rotary roll 90, the receiving support 140 which collect | recovers the contamination, washing liquid, etc. which fell from the rotary roll 90 is provided. A discharge port (not shown) is formed in the water receiver 140 so that the recovered liquid can be discharged through the discharge port.

Next, the operation | movement of the decontamination mechanism 100 of the rotating roll 90 comprised as mentioned above is demonstrated with the process of the resist coating process of the glass substrate G. As shown in FIG.

For example, as shown in FIG. 2 before the glass substrate G is conveyed on the stage 70 of the resist coating processing unit 24, the nozzle 80 moves from the standby part 91 onto the rotating roll 90. FIG. It moves and the discharge port 80a of the nozzle 80 is close to the top of the rotating roll 90. At this time, as shown in FIG. 8, the holding block 110 waits at the edge part of the negative direction of the rotating roll 90 in the X direction.

Next, the rotating roll 90 is rotated, and the resist liquid is discharged from the discharge port 80a of the nozzle 80 to the surface of the rotating roll 90 to start up the resist liquid. In this way, the adhesion state of the resist liquid in the discharge port 80a is ordered, and the discharge state of the nozzle 80 is stabilized.

When the adhesion state of the resist liquid of the discharge port 80a is trimmed, discharge of the nozzle 80 is stopped and the nozzle 80 moves to the predetermined discharge position E as shown in FIG. After the nozzle 80 moves to the discharge position E, the glass substrate G is conveyed along the conveyance line A on the stage 70 of the resist coating processing unit 24. When glass substrate G passes through the lower part of nozzle 80, resist liquid is discharged from nozzle 80, and resist liquid is apply | coated to the whole surface of the surface of glass substrate G. As shown in FIG.

On the other hand, after the nozzle 80 moves to the discharge position E from the top of the rotating roll 90, the removal process of the contamination of the rotating roll 90 is started. First, the holding block 110 waiting on the negative direction side of the rotating roll 90 in the X direction is rotated along the axis of the rotating roll 90 by the moving mechanism 120 as shown in FIG. 8. Move in the positive direction of X direction. At this time, as shown in FIG. 9, the resist liquid R adhering to the surface of the rotating roll 90 is swept away by the sealing 111 of the retaining block 110. As shown in FIG. And when the holding block 110 moves to the edge vicinity of the positive direction side of the rotating roll 90 in the X direction, the resist liquid R of the front surface of the surface of the rotating roll 90 is removed.

After the retaining block 110 moves to the end of the rotational roll 90 in the positive direction in the X-direction and stops (shown with a dotted line in FIG. 8), a solvent of a cleaning liquid, for example, a resist liquid is discharged from the nozzle 130. The retaining block 110 and the sealing 111 are cleaned.

Thereafter, the discharge of the cleaning liquid from the nozzle 130 is stopped, and the retaining block 110 is returned to the vicinity of the end portion on the negative direction side of the rotation roll 90 in the X direction.

According to the above embodiment, the sealing ring 111 which contacts an annular shape in the circumference | surroundings of the outer peripheral surface of the rotating roll 90 is provided in the rotating roll 90, and the sealing ring 111 is rotated by the moving mechanism 120. Since it was made to be able to move along the axial direction of the roll 90, the contamination of the surface of the rotating roll 90 can be wiped off by the sealing 111. FIG. In this case, since it is not necessary to store the cleaning liquid in the tank as in the prior art, the cost of the cleaning liquid can be reduced.

Moreover, since the nozzle 130 which discharges a washing | cleaning liquid was provided in the edge part of the positive direction of the rotating roll 90 in the X direction, the resist liquid of the rotating roll 90 can be removed and the contaminated sealing 111 can be wash | cleaned.

Since the sealing material is used for the sealing 111, the airtightness of the sealing 111 and the rotating roll 90 is high, and the contamination of the surface of the rotating roll 90 can be removed suitably.

In the above-described embodiment, the holding block 110 is moved only in the positive direction in the X direction when the contamination of the rotary roll 90 is removed, but the holding block 110 is also moved in the negative direction in the X direction. ) Can be moved back and forth.

In the above-mentioned embodiment, although the sealing 111 was wash | cleaned with the nozzle 130, for example, as shown in FIG. 10, it has an annular shape in the outer peripheral surface of the edge part of the positive direction side of the rotating roll 90 in the X direction. Grooves 150 may be formed, and the cleaning liquid discharge port 151 may be formed in the grooves 150. For example, the cleaning liquid discharge port 151 is formed at a plurality of points in the groove 150. The cleaning liquid discharge port 151 is connected to the cleaning liquid supply device 153 by a pipe 152 passing through the inside of the rotary roll 90.

And when the sealing 111 moves to the edge part of the X direction positive direction, the sealing 111 is located on the groove | channel 150 of the rotation roll 90. As shown in FIG. Next, the cleaning liquid H is discharged from the cleaning liquid discharge port 151, for example, the cleaning liquid H is filled in the groove 150, and the tip portion 111a of the sealing 111 is cleaned by the cleaning liquid H. In this case, since the washing | cleaning liquid H can be supplied intensively directly to the front-end | tip part 111a of the sealing 111, the sealing 111 can be wash | cleaned efficiently.

In the above-mentioned embodiment, although the contamination of the rotating roll 90 is removed only by the sealing 111, you may supply the washing | cleaning liquid to the rotating roll 90. FIG. For example, as shown in FIG. 11, the washing | cleaning nozzle 160 which discharges a washing | cleaning liquid is provided in the positive direction direction direction of the holding block 110 in the X direction. For example, the support member 161 is attached to the upper part of the side surface 110b of the retaining block 110 in the positive direction of the X direction, and the cleaning nozzle 160 is supported by the support member 161. . The cleaning nozzle 160 is, for example, slightly directed to the upper surface of the rotation roll 90 on the positive side in the X direction more than the retaining block 110. The cleaning nozzle 160 is connected to the cleaning liquid supply device 163 through, for example, a supply pipe 162.

And when removing the contamination of the rotating roll 90, the holding block 110 moves to the positive direction side of X direction, and the rotating roll 90 of the advancing direction front side of the sealing 111 from the cleaning nozzle 160 will be carried out. The cleaning liquid, for example, the solvent of the resist liquid, is discharged to the upper surface of the substrate. Thereby, the washing | cleaning liquid is supplied to the surface of the rotating roll 90, and the surface of the rotating roll 90 is wash | cleaned, for example.

According to this embodiment, in addition to the removal of the contamination by the sealing 111, since the rotating roll 90 is wash | cleaned with the washing | cleaning liquid, for example, the rotation roll 90 which cannot remove all in the sealing 111 Contamination that enters the surface irregularities can also be reduced. Moreover, since the washing | cleaning liquid is supplied to the advancing direction front side of the sealing 111, the washing | cleaning liquid can be removed by the sealing 111. FIG. In addition, since the cleaning nozzle 160 is fixed to the holding block 110, there is no need to provide a mechanism for moving the cleaning nozzle 160 separately.

In the above embodiment, the cleaning nozzle 160 was provided only on the upper side of the rotary roll 90, but as shown in FIG. 12, the cleaning nozzle 160 along the circumference of the outer circumferential surface of the rotary roll 90 was shown. It is good also if it arrange | positions in multiple places, for example, four places, and supplies cleaning liquid to the rotating roll 90 from each cleaning nozzle 160. In addition, these cleaning nozzles 160 may be arrange | positioned at equal intervals on the same circumference around the axis of the rotating roll 90. FIG. In this case, the washing | cleaning liquid can be supplied reliably to the whole surface of the surface of the rotating roll 90, and the microcontamination of the surface of the rotating roll 90 can be reliably removed.

Although the cleaning nozzle 160 mentioned above is provided only in the positive direction side of the retaining block 110 in the X direction, you may provide also in the negative direction side of an X direction as shown in FIG. In this case, the cleaning nozzle 165 on the negative direction side in the X direction is, for example, slightly directed to the upper surface of the rotation roll 90 on the negative direction side in the X direction rather than the retaining block 110. The cleaning nozzle 165 is supported by the holding block 110 by the supporting member 166. And when removing the dirt of the rotating roll 90, the retaining block 110 will move to the positive direction X direction, discharging the cleaning liquid from the cleaning nozzle 160 of the positive direction X direction. After the holding block 110 moves to the end of the positive direction in the X direction, the holding block 110 moves to the negative direction in the X direction while discharging the cleaning liquid from the cleaning nozzle 165 on the negative direction in the X direction. Move. In this way, even when the retaining block 110 is reciprocated, the cleaning liquid can be supplied to the front side in the advancing direction of the retaining block 110.

In addition, in this embodiment, you may move the holding block 110, supplying the cleaning liquid to the surface of the rotating roll 90 from the cleaning nozzles 160 and 165 of both sides of the holding block 110 simultaneously. In this case, since the washing | cleaning liquid is supplied from the both sides of the holding block 110, the contamination of the surface of the rotating roll 90 can be removed more reliably.

As described in the above embodiment, when the cleaning nozzle 160 or the cleaning nozzle 165 is provided in the holding block 110, the sealing 111 may be cleaned by supply of the cleaning liquid from the cleaning nozzle. In this case, it is not necessary to provide the nozzle 130, the groove 150, and the cleaning liquid discharge port 151 described above on the positive direction side of the rotation roll 90 in the X direction.

Since the sealing 111 described in the above embodiment is worn out by contact with the rotary roll 90, it is necessary to replace it at an appropriate time. As to whether or not the seal 111 is replaced, a load for driving the seal 111 in the axial direction may be detected and determined based on the load. For example, when the load for driving the sealing 111 is detected and the load becomes smaller than a predetermined set value, the sealing 111 may be worn out and it may be judged that replacement is necessary. For example, the load of the drive of the sealing 111 may be detected by measuring the current value of the servomotor 124 shown in FIG. 8 which moves the sealing 111 at a constant speed. The measurement of the current value of the servomotor 124 is performed by the control unit 128, for example. The controller 128 determines that the sealing 111 needs to be replaced when the current value exceeds a preset threshold, for example, and that the replacement of the sealing 111 is not necessary when the threshold value is less than or equal to the threshold. It is determined. By doing in this way, the replacement time of the sealing 111 can be judged appropriately. The driving source of the sealing 111 is not limited to the servo motor 124, and an air actuator or other driving source may be used.

In the above embodiment, although one sealing 111 is provided in the rotary roll 90, it may be provided in multiple numbers. For example, as shown in FIG. 14, two seal | stickers 170 and 171 of the same structure as the said seal | sticker 111 are provided inside the holding block 110. As shown in FIG. The seals 170 and 171 are pinched by the two plates 110a and 110b of the retaining block 110 and are fixed inside the retaining block 110. In the first sealing 170 on the positive direction in the X direction, the inclined surface of the tip portion 170a faces the positive direction on the X direction, and the second sealing 171 on the negative direction side in the X direction is the front end 171a. The inclined surface of is directed toward the negative direction of the X direction. The first sealing 170 and the second sealing 171 are arranged at intervals of about 5 to 10 mm. The inner circumferential surface of the retaining block 110 at the interval between the first sealing 170 and the second sealing 171 has a groove 172 as an annular cleaning liquid supply portion surrounding the outer circumferential surface of the rotary roll 90. Is being formed. The annular flow path through which the cleaning liquid flows is formed by the grooves 172 and the surfaces of the rotary rolls 90.

At the top of the groove 172, for example, a cleaning liquid supply pipe 173 is connected. The cleaning liquid supply pipe 173 is connected to the cleaning liquid supply device 174 outside the holding block 110 through, for example, the seals 170 and 171 in the holding block 110. For example, the washing liquid discharge pipe 175 is connected to the lowermost portion of the groove 172, and the washing liquid discharge pipe 175 passes between the seals 170 and 171 of the holding block 110 and passes below the holding block 110. It is open. In addition, control of the supply pressure of the washing | cleaning liquid in the washing | cleaning liquid supply apparatus 174 is performed by the control part 128. FIG.

Then, when the contamination of the rotary roll 90 is removed, the cleaning liquid H is supplied from the cleaning liquid supply pipe 173 to the groove 172, and the cleaning liquid H in the groove 172 is discharged from the cleaning liquid discharge pipe 175, and the groove is discharged. A flow of the cleaning liquid H is formed in 172. In that state, the holding block 110 moves from the negative direction side of the rotation direction 90 to the X direction positive direction side. At this time, the contamination of the surface of the rotary roll 90 is wiped out by the 1st sealing 170 in the advancing direction side. In addition, fine contamination remaining on the surface of the rotary roll 90 is cleaned by the cleaning liquid H passing through the grooves 172. The cleaning liquid H remaining on the surface of the rotary roll 90 is removed by the second sealing 171.

According to this embodiment, since the washing | cleaning liquid H is supplied to the narrow groove 172 between the 1st sealing 170 and the 2nd sealing 171, the rotating roll 90 is efficiently carried out with little washing | cleaning liquid H. ) Can be cleaned. Since the cleaning liquid supply pipe 173 and the cleaning liquid discharge pipe 175 are connected to the groove 172, a flow of the cleaning liquid H is formed in the groove 172, and the rotary roll 90 is formed by the flow of the cleaning liquid H. Can effectively reduce pollution.

In addition, the number of sealing of the said embodiment is not limited to two, You may be three or more.

As for the replacement timing of the seals 170 and 171 of the above embodiment, the more the seals 170 and 171 wear out, the lower the airtightness of the grooves 172 and the load for supplying the cleaning liquid to the grooves 172 is lowered. Therefore, it is also possible to detect the load of the supply of the cleaning liquid and determine whether to replace the seals 170 and 171 based on the load. For example, the load for supplying the cleaning liquid may be detected by measuring the supply pressure of the cleaning liquid supply device 174 that supplies the cleaning liquid at a constant flow rate to the groove 172. The measurement of the supply pressure of this washing | cleaning liquid supply apparatus 174 is performed by the control part 128, for example. The control unit 128 determines that, for example, the replacement of the seals 170 and 171 is necessary when the supply pressure exceeds a preset limit, and that the sealings 170 and 171 are not necessary when the supply pressure is below the limit. To judge. By doing in this way, the replacement time of the sealing parts 170 and 171 can be judged appropriately.

As shown in FIG. 15, sealing 170 and 171 sweep away contamination of the surface of the rotary roll 90 on both side surfaces of the holding block 110 in the above-described embodiment (the X direction in FIG. 15). The cleaning liquid supply ports 180 and 181 for prewetting which supply cleaning liquid H to the surface of the rotating roll 90 before each may be formed, respectively. As shown in FIG. 16, the washing | cleaning liquid supply ports 180 and 181 are formed in the shape of the rectangle of the same width | variety as the diameter of the rotating roll 90, and are formed above the rotating roll 90. As shown in FIG.

As shown in FIG. 15, the cleaning liquid supply pipes 182 and 183 are connected to the cleaning liquid supply ports 180 and 181, respectively. The cleaning liquid supply pipes 182 and 183 pass through the holding block 110 and are connected to the cleaning liquid supply device 174 outside the holding block 110. Control valves 184 and 185 are formed in the cleaning liquid supply pipes 182 and 183, respectively, and a control valve 176 is provided in the cleaning liquid supply pipe 173 connected to the groove 172 as the cleaning liquid supply unit. The control unit 128 controls the supply pressure of the cleaning liquid H and the control valves 184, 185, 176 in the cleaning liquid supply device 174.

When the retaining block 110 moves in the positive direction in the X-direction, for example, when the contamination of the rotary roll 90 is removed, the control valve 184 is opened first, and the cleaning liquid H is the cleaning liquid supply port ( Discharged from 180). The cleaning liquid H is supplied to the surface of the rotary roll 90 by riding on the side of the retaining block 110. The sealing 170 then moves the surface of the rotating roll 90 wet with the cleaning liquid H to wipe off contamination of the surface of the rotating roll 90. At this time, the control valve 176 is opened, and the cleaning liquid H is supplied to the groove 172 to clean the minute contamination remaining on the surface of the rotary roll 90. In addition, when the holding block 110 moves in the negative direction in the X direction, the control valve 185 is opened, and the cleaning liquid H is discharged from the cleaning liquid supply port 181, which is then rotated by the sealing 171 by the rotary roll 90 Contamination of the surface).

In the present embodiment, the cleaning liquid H is supplied to the surface of the rotary roll 90 from the cleaning liquid supply ports 180 and 181 and rotated before the sealing 170 and 171 sweeps away the contamination of the surface of the rotary roll 90. Since the surface of the roll 90 is wetted with the cleaning liquid H, the sealing 170 and 171 can smoothly move the surface of the rotary roll 90, so that contamination of the surface of the rotary roll 90 can be easily wiped out.

In the above embodiment, the sealing 111 has been cleaned by the nozzle 130. However, for example, as shown in FIG. 17, the tip of the sealing 11 is cleaned on the outer circumferential surface of the end of the rotary roll 90. You may provide the brush 190 for it. The brush 190 is provided at the position where the tip of the sealing 111 and the brush 190 contact when the retaining block 110 moves to the end portion on the positive side in the X direction.

When the holding block 110 moves to the end of the positive direction in the X direction, and the tip of the sealing 111 and the brush 190 come into contact with each other, the rotary roll 90 rotates to clean the sealing 111 with the brush 190. You can do it.

In the above embodiment, the sealing 111, 170, 171 is provided in contact with the entire circumference of the outer circumferential surface of the rotary roll 90, but as shown in FIGS. 18 and 19, the sealing 200 is an example. For example, it may be provided in contact with the lower periphery of the outer peripheral surface of the rotary roll 90. In addition, although the holding block 110 is provided so that the outer periphery of the outer periphery of the rotating roll 90 may be enclosed in the said embodiment, the holding block 210 is surrounding the lower periphery of the outer periphery of the rotating roll 90. It may be installed along.

The retaining block 210 is a rectangular parallelepiped, and an arcuate groove 210a is formed on the upper portion thereof. The groove 210a is formed along the lower periphery of the outer circumferential surface of the rotary roll 90 and the groove 210a is formed of the rotary roll 90 so that the retaining block 210 can move axially with respect to the rotary roll 90. It is slightly larger than the diameter.

The sealing 200 is provided inside the retaining block 210. Sealing 200 is a thin plate shape, is formed in a semi-circular shape around the outer peripheral surface lower portion of the rotary roll (90). As shown in Fig. 20, the inner circumferential surface of the sealing 200 is formed in a tapered shape in which both sides in the X direction are inclined, and the tip portion 200a, which is the innermost circumference, contacts the lower circumference of the outer circumferential surface of the rotary roll 90. have.

And when removing the dirt of the rotating roll 90, the holding block 210 will move to positive direction X direction at the speed of 200 mm / s, for example. At this time, contamination of the surface of the rotary roll 90 is wiped out by the sealing 200 moving the surface of the rotary roll 90. Next, when the retaining block 210 reaches the end of the rotary roll 90, the rotary roll 90 is rotated by three rotations, for example. Thereafter, the retaining block 210 is moved in the negative direction in the X direction, so that the contamination of the surface of the rotary roll 90 is wiped off by the sealing 200. A series of reciprocating motions of this retaining block 210 is performed, for example, three reciprocations and the contamination of the surface of the rotary roll 90 is removed.

According to the findings of the inventors, in the present embodiment, even when the sealing 200 is a semicircular shape, the contamination of the surface of the rotating roll 90 can be sufficiently removed by rotating the rotating roll 90 to reciprocate the sealing 200. . In addition, since the support block 210 having the sealing 200 is installed around the lower portion of the outer circumferential surface of the rotary roll 90, it is easy to separate the support block 210 from the rotary roll 90 and facilitate the maintenance of the sealing 200. Can be done.

The guide members 201 and 202 may be provided further inside the holding block 210 in the said embodiment. As shown in FIG. 21, the guide members 201 and 202 are provided in the X direction positive direction side and the X direction negative direction side of the sealing 200, respectively. The guide members 201 and 202 are formed in a semi-circular shape along the periphery of the outer peripheral surface of the rotary roll 90 as a thin plate shape. The guide member 201 on the positive direction in the X direction has an inclined surface of the tip portion 201a toward the positive direction in the X direction, and the guide member 202 on the negative direction side in the X direction has an inclined surface of the tip portion 202a. The direction is directed toward the negative direction.

A groove 221 is formed in the inner circumferential surface of the retaining block 210 at the interval between the sealing 200 and the guide member 201 along the lower circumference of the outer circumferential surface of the rotary roll 90. Grooves 222 having the same shape as the grooves 221 are also formed in the holding block 210 at the interval between the sealing 200 and the guide member 202. The flow path through which the cleaning liquid H flows is formed by the grooves 221 and 222 and the surfaces of the rotary rolls 90, respectively.

For example, the cleaning liquid supply pipes 223 and 224 are connected to the lowermost portions of the grooves 221 and 222, respectively. The cleaning liquid supply pipes 223 and 224 pass between the sealing 200 in the holding block 210 and the guide members 201 and 202, for example, to the cleaning liquid supplying device 230 outside the holding block 210. You are connected. For example, control valves 225 and 226 are formed in the cleaning liquid supply pipes 223 and 224, respectively, and the cleaning liquid H supplied to the groove 221 or the groove 222 by opening and closing the control valves 225 and 226. ) Is optionally supplied.

When decontamination of the rotary roll 90 is carried out using the decontamination mechanism 100 of the above structure, the holding block 210 moves to a positive direction of a X direction first. At this time, the control valve 225 is opened and the cleaning liquid H is discharged from the groove 221 to the surface of the rotary roll 90. Subsequently, as the sealing 200 moves the surface of the wet rolling roll 90 with the cleaning liquid H, the contamination of the surface of the rotary roll 90 is wiped out. Next, when the retaining block 210 reaches the end of the rotary roll 90, the control valve 225 is closed to rotate the rotary roll 90 by, for example, three revolutions. Thereafter, the holding block 210 moves in the negative direction in the X direction. At this time, the control valve 226 is opened, and the cleaning liquid H is discharged from the groove 222 to the surface of the rotary roll 90. And the sealing 200 sweeps off the contamination of the surface of the rotating roll 90 by moving the surface of the rotating roll 90 wet with the washing | cleaning liquid H. As shown in FIG. A series of reciprocating motions of this retaining block 210 is performed, for example, three reciprocations and the contamination of the surface of the rotary roll 90 is removed.

In the above embodiment, the cleaning liquid H is supplied from the grooves 221 and 222 to the surface of the rotary roll 90 before the sealing 200 sweeps the contamination of the surface of the rotary roll 90, and the rotary roll 90 Since the surface of the surface becomes wet with the cleaning liquid H, the sealing 200 can smoothly move the surface of the rotary roll 90, so that contamination of the surface of the rotary roll 90 can be easily wiped out.

In the above embodiment, although the set of the holding block 210 and the sealing 200 was provided in the rotating roll 90, the plurality of sets of the holding block 210 and the sealing 200 may be provided. For example, as shown in FIG. 22, two holding blocks 210 having the same configuration as the holding block 210 may be provided around the lower circumference and the upper circumference of the outer circumferential surface of the rotary roll 90, respectively. Therefore, when it sees from the axial direction of the rotary roll 90, the contact part of the two sealing 200 and the outer peripheral surface of the rotary roll 90 may touch the whole periphery of the outer peripheral surface of the rotary roll 90. .

And the sealing 200, 200 can remove the contamination of the surface of the rotating roll 90 by moving the rotating roll 90 to the axial direction, respectively. In this embodiment, since the contamination of the surface of the rotating roll 90 can be removed without rotating the rotating roll 90, a contamination can be removed in a short time.

In addition, the shape of the sealing 200 is slightly larger than the semicircle shape, for example, may be a substantially semicircular shape having an angle of 200 degrees. In this case, the two seals 200 and 200 are surely in contact with the entire circumference of the outer circumferential surface of the rotary roll 90 so that the contamination of the rotary roll 90 can be more reliably removed. In addition, the shape of the sealing 200 is not limited to a semi-circle shape, For example, 1/3 shape may be sufficient. In this case, if the sealing 200 is provided with respect to the rotary roll 90, three contaminants on the surface of the rotary roll 90 can be removed without rotating the rotary roll 90.

In the above embodiment, the guide members 201 and 202 are provided inside the holding block 210 and the grooves 221 and 222 are formed. Thus, the cleaning liquid H for the prewet is formed by the rotary roll 90. Although supplied to the surface, instead of forming the grooves 221 and 222, the cleaning nozzle 160 shown in FIG. 11 may be provided and the cleaning liquid H may be supplied to the surface of the rotary roll 90. Moreover, the cleaning nozzle 160 may be provided in multiple numbers toward the outer peripheral surface of the rotating roll 90, and may add the said cleaning nozzle 165 shown in FIG. 13 further.

In the above embodiment, one sealing 200 is provided inside the retaining block 210, but a plurality, for example, two may be provided. The two seals 200 are provided with the grooves 172 shown in FIG. 14, and the cleaning liquid supply pipe 173 and the control unit 128 are provided so that the cleaning liquid ( H) is supplied.

In the above embodiment, although the belt 125 is provided inside the moving mechanism 120, you may use a ball screw instead of the belt 125. FIG. By rotating the ball screw, for example, by a servo motor, the retaining blocks 110 and 210 can be moved over both ends of the rotary roll 90 along the axial direction of the rotary roll 90.

As mentioned above, although preferred embodiment of this invention was described referring an accompanying drawing, this invention is not limited to the example which concerns. It is apparent to those skilled in the art that various changes or modifications can be made within the scope of the idea described in the claims, and that they naturally belong to the technical scope of the present invention.

For example, in the above embodiment, the present invention is applied to the cleaning of the rotating rolls for feeding out the resist liquid, but may be applied to the cleaning of the rotating rolls for feeding out other coating liquids such as developer. Moreover, the washing | cleaning liquid is not limited to a solvent, It is good also as other liquids, such as pure water. This invention is applicable also when apply | coating a coating liquid to other board | substrates, such as a mask panel for FPD (flat panel display), a photomask, and a semiconductor wafer other than glass substrate G. FIG.

This invention is useful when reducing the usage-amount of the washing | cleaning liquid which wash | cleans a rotary roll.

According to this invention, since the usage-amount of the washing | cleaning liquid of a rotating roll can be reduced, the running cost of a coating processing unit can be reduced, for example.

Claims (32)

A decontamination mechanism of a rotary roll to which a coating liquid is supplied from a nozzle before a coating liquid is discharged from a nozzle to a board | substrate, A contact member in annular contact with the circumference of the outer circumferential surface of the rotating roll, And a moving mechanism for moving said contact member along the axial direction of said rotating roll. The method according to claim 1, And a cleaning nozzle for discharging a cleaning liquid onto the surface of the rotating roll on the front side of the advancing direction of the contact member. The method according to claim 2, And said cleaning nozzle is capable of discharging a cleaning liquid to an upper surface of said rotating roll. The method according to claim 2 or 3, The said cleaning nozzle is provided in several places so that the outer peripheral surface of a rotating roll may be provided, The decontamination mechanism of the rotating roll characterized by the above-mentioned. The method according to claim 2 or 3, The said cleaning nozzle is provided in the both sides of the movement direction of the said contact member, The decontamination mechanism of the rotating roll characterized by the above-mentioned. The method according to claim 2 or 3, The said contact member is hold | maintained by the holding member which moves to the axial direction of a rotating roll by the said moving mechanism, The said cleaning nozzle is attached to the said holding member, The decontamination mechanism of the rotating roll characterized by the above-mentioned.  The method according to any one of claims 1 to 3, The contact member is provided in plurality along the axial direction of the said rotary roll, The decontamination mechanism of the rotary roll characterized by the above-mentioned. The method of claim 7, Two contact members are disposed in close proximity to the rotating roll, and the two contact members are disposed such that a gap is formed therebetween, The decontamination mechanism of the rotary roll, characterized in that the cleaning liquid supply unit for supplying the cleaning liquid to the surface of the rotary roll is formed in the interval between the two contact members. The method of claim 8, And said cleaning liquid supply portion is formed in an annular shape along the circumference of the outer circumferential surface of said rotating roll.  The method according to claim 8, And a cleaning liquid supply pipe and a cleaning liquid discharge pipe are connected to the cleaning liquid supply part. The method of claim 8, The two contact members are provided in a block surrounding the circumference of the outer circumferential surface of the rotating roll,  And the cleaning liquid supplying portion is formed in a groove shape on the inner circumferential surface of the block opposite to the outer circumferential surface of the rotating roll. The method of claim 8, And a control unit for detecting a load for supplying the cleaning liquid to the cleaning liquid supply unit and determining whether to replace the contact member based on the detection result. The method of claim 11, And a prewetting cleaning liquid supplying part for supplying a cleaning liquid for prewetting the surface of the rotating roll to the surface of the rotating roll on both side surfaces of the moving direction of the block. A decontamination mechanism of a rotary roll to which a coating liquid is supplied from a nozzle before a coating liquid is discharged from a nozzle to a board | substrate, A contact member in contact with a portion of the circumference along the circumference of the outer circumferential surface of the rotating roll, Having a moving mechanism for moving the contact member along the axial direction of the rotary roll, The contact member is provided in plurality along the axial direction of the rotary roll, Two contact members are installed in close proximity to the rotary roll, The two contact members are arranged such that a gap is formed therebetween, The cleaning liquid supply part which supplies a cleaning liquid to the surface of a rotating roll is formed in the space | interval of said two contact members, And a control unit for detecting a load for supplying the cleaning liquid to the cleaning liquid supply unit and determining whether to replace the contact member based on the detection result. A decontamination mechanism of a rotary roll to which a coating liquid is supplied from a nozzle before a coating liquid is discharged from a nozzle to a board | substrate, A contact member in contact with a portion of the circumference along the circumference of the outer circumferential surface of the rotating roll, Having a moving mechanism for moving the contact member along the axial direction of the rotary roll, The decontamination mechanism is provided in plurality along the axial direction of the rotary roll, As seen from the axial direction of the rotary roll, the contact portions of the contact members of the plurality of decontamination mechanisms and the outer peripheral surface of the rotary roll touch the entire circumference of the outer peripheral surface of the rotary roll. Decontamination apparatus. A decontamination mechanism of a rotary roll to which a coating liquid is supplied from a nozzle before a coating liquid is discharged from a nozzle to a board | substrate, A contact member in contact with a portion of the circumference along the circumference of the outer circumferential surface of the rotating roll, Having a moving mechanism for moving the contact member along the axial direction of the rotary roll, It has a cleaning liquid supply part for a contact member which supplies a cleaning liquid with respect to the said contact member, And the cleaning liquid supplying portion for the contact member is constituted by an annular groove formed on the outer circumferential surface of the end of the rotating roll and the cleaning liquid discharge port formed in the groove. delete delete delete delete delete delete delete delete delete delete delete delete delete delete delete delete

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