KR101284084B1 - 기판 처리 장치 - Google Patents

기판 처리 장치 Download PDF

Info

Publication number
KR101284084B1
KR101284084B1 KR1020110106297A KR20110106297A KR101284084B1 KR 101284084 B1 KR101284084 B1 KR 101284084B1 KR 1020110106297 A KR1020110106297 A KR 1020110106297A KR 20110106297 A KR20110106297 A KR 20110106297A KR 101284084 B1 KR101284084 B1 KR 101284084B1
Authority
KR
South Korea
Prior art keywords
main body
gas
substrate
gas supply
diameter
Prior art date
Application number
KR1020110106297A
Other languages
English (en)
Korean (ko)
Other versions
KR20130042157A (ko
Inventor
박경완
Original Assignee
주식회사 테라세미콘
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 주식회사 테라세미콘 filed Critical 주식회사 테라세미콘
Priority to KR1020110106297A priority Critical patent/KR101284084B1/ko
Priority to CN201280051208.5A priority patent/CN103890642A/zh
Priority to PCT/KR2012/003339 priority patent/WO2013058454A1/ko
Publication of KR20130042157A publication Critical patent/KR20130042157A/ko
Application granted granted Critical
Publication of KR101284084B1 publication Critical patent/KR101284084B1/ko

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67109—Apparatus for thermal treatment mainly by convection
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Chemical Vapour Deposition (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
KR1020110106297A 2011-10-18 2011-10-18 기판 처리 장치 KR101284084B1 (ko)

Priority Applications (3)

Application Number Priority Date Filing Date Title
KR1020110106297A KR101284084B1 (ko) 2011-10-18 2011-10-18 기판 처리 장치
CN201280051208.5A CN103890642A (zh) 2011-10-18 2012-04-30 基板处理装置
PCT/KR2012/003339 WO2013058454A1 (ko) 2011-10-18 2012-04-30 기판 처리 장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020110106297A KR101284084B1 (ko) 2011-10-18 2011-10-18 기판 처리 장치

Publications (2)

Publication Number Publication Date
KR20130042157A KR20130042157A (ko) 2013-04-26
KR101284084B1 true KR101284084B1 (ko) 2013-07-10

Family

ID=48141077

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020110106297A KR101284084B1 (ko) 2011-10-18 2011-10-18 기판 처리 장치

Country Status (3)

Country Link
KR (1) KR101284084B1 (zh)
CN (1) CN103890642A (zh)
WO (1) WO2013058454A1 (zh)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016080729A1 (ko) * 2014-11-18 2016-05-26 주식회사 테라세미콘 기판 프로세싱 장치
KR20200074854A (ko) * 2018-12-17 2020-06-25 주식회사 원익아이피에스 기판 처리 장치

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111326447B (zh) * 2018-12-17 2023-08-04 圆益Ips股份有限公司 基板处理装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20100008722A (ko) * 2008-07-16 2010-01-26 주식회사 테라세미콘 배치식 열처리 장치
KR20110066864A (ko) * 2009-12-11 2011-06-17 도쿄엘렉트론가부시키가이샤 기판처리장치, 기판처리방법 및 이 기판처리방법을 실행시키기 위한 프로그램을 기록한 기록매체

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101120029B1 (ko) * 2009-05-29 2012-03-23 주식회사 테라세미콘 배치식 기판 처리 장치
KR20110103630A (ko) * 2010-03-15 2011-09-21 주식회사 티지솔라 배치식 에피택셜층 형성장치 및 그 형성방법

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20100008722A (ko) * 2008-07-16 2010-01-26 주식회사 테라세미콘 배치식 열처리 장치
KR20110066864A (ko) * 2009-12-11 2011-06-17 도쿄엘렉트론가부시키가이샤 기판처리장치, 기판처리방법 및 이 기판처리방법을 실행시키기 위한 프로그램을 기록한 기록매체

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016080729A1 (ko) * 2014-11-18 2016-05-26 주식회사 테라세미콘 기판 프로세싱 장치
KR20200074854A (ko) * 2018-12-17 2020-06-25 주식회사 원익아이피에스 기판 처리 장치
KR102630347B1 (ko) 2018-12-17 2024-01-30 주식회사 원익아이피에스 기판 처리 장치

Also Published As

Publication number Publication date
CN103890642A (zh) 2014-06-25
KR20130042157A (ko) 2013-04-26
WO2013058454A1 (ko) 2013-04-25

Similar Documents

Publication Publication Date Title
CN102082072B (zh) 气体喷射装置及具备该气体喷射装置的处理室
TWI517279B (zh) 基材處理裝置
TW201610221A (zh) 空間原子層沈積中的氣體分離控制
TW201419382A (zh) 用以在大面積基板上進行沈積的方法和設備
KR101284084B1 (ko) 기판 처리 장치
KR101173081B1 (ko) 수평 배치형 원자층 증착 장치
KR101006583B1 (ko) 수평 배치형 원자층 증착 장치
KR20120082369A (ko) 기판 처리 장치
JP2013232645A (ja) 基板処理装置
KR102313969B1 (ko) 기판처리 장치
KR101275496B1 (ko) 기판 처리 장치
JP4645448B2 (ja) 真空成膜装置及び真空成膜方法並びに太陽電池材料
KR101573689B1 (ko) 원자층 증착장치
KR102171175B1 (ko) 기판처리장치
KR102022860B1 (ko) 샤워헤드 어셈블리 및 이를 포함하는 화학기상 증착장치
KR102019303B1 (ko) 화학기상 증착 시스템
KR20160110586A (ko) 기판처리장치의 가스공급 제어방법
KR102287656B1 (ko) 기판처리장치
KR20150139052A (ko) 기판처리장치
KR101243314B1 (ko) 기판 처리 장치
KR101356208B1 (ko) 기판 처리 장치
KR101297686B1 (ko) 기판 처리 장치
KR101039153B1 (ko) 대면적 기판처리 시스템의 가스 인젝터
KR20180018172A (ko) 박막 증착 장치
KR101334191B1 (ko) 기판 처리 장치

Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
FPAY Annual fee payment

Payment date: 20160705

Year of fee payment: 4

FPAY Annual fee payment

Payment date: 20170704

Year of fee payment: 5

FPAY Annual fee payment

Payment date: 20180704

Year of fee payment: 6

FPAY Annual fee payment

Payment date: 20190128

Year of fee payment: 7