KR101272032B1 - Process for preparing photo curable inkjet ink for electric-electron semi-conduct part of ultra-high density and ultra-fine integrated circuit patterning formation - Google Patents

Abstract

According to an aspect of the present invention, there is provided a method of manufacturing an inkjet ink for a semiconductor capable of forming a microcircuit pattern of an integrated circuit, the method comprising: selecting a photocured semiconductor chemical; Preparing conductive organic-inorganic hybrid semiconductor molecular particles, high and low dielectric molecular particles, photothermal electrochemically active light emitting liquid crystal polymer particles, and a base prepolymer by using a curing monomer such as ultraviolet light, heat, or radiation; Preparing an organic-inorganic hybrid semiconductor molecular particle and a high and low dielectric molecular particle dispersion master solution; A process for preparing a dispersion master stock solution of organic inorganic hybrid semiconductor molecule particles; Formulating process of organic inorganic hybrid semiconductor molecular particles; And microfiltration step; The manufacturing method of the inkjet ink for photocuring semiconductors containing these etc. is provided.
In the present invention, the semiconductor inkjet ink and the application of the ink having a low change rate such as electron mobility, band gap, etc., which are inherent characteristics of semiconductors, have high physicochemical stability and relatively high conductivity, piezoelectricity, and long-term operation at low power. Provide a method.

Description

Process for preparing photo curable inkjet ink for electric-electron semi-conduct part of ultra-high density and ultra-fine integrated circuit patterning formation}

The present invention relates to an organic-inorganic complexed superconducting semiconductor inkjet ink using organic-inorganic complexed superconducting semiconductor molecules capable of multi-dimensional inkjet printing using a photocurable inkjet printing system.

All electrical and electronic products have been composed of conventional transition metals or rare metals. Particularly, it is composed of integrated circuits, and in the case of display materials, salts containing all transition metals having the same transparency and most rare metals classified as rare earths are mainly formed by solvents (Sulfonic, Choloride, Nitrate Acid). Chemical doping process (CVD) or plasma enhanced chemical vapor deposition (PECVD) under reduced pressure was carried out through the doping process. Organic polymer materials, such as polyethylene terephthalate (PET) and polypropylene (PP), which are optically transparent and mechanically secured by breaking away from the substrate (Substrate of Silicone Wafer (Single, Multiple Crystalline), Amorphous Silicon Wafer) For use in substrates Substances such as transition metals (Titanium, Zinc, Indium, Tin, Antimony, Silver, Gold, Iron etc.) that are transparent when they are originally transparent or nano-particles by Metal Oxide Chemical Vapor Deposition (MOCVD) Is salted with alkaline earth metals (Lithium, Sodium, Potassium, Calcium etc.) and thin filmed on organic polymer film by chemical vapor deposition, or CNT (Carbon Nano Tube, SWCNT, DWCNT, MWCNT) ), Nanowire, Dendrimer, Graphene, Fullerene C60, 61, 70, 90, PEDOTPOSS / PSS (Poly Thiopene Group), Poly Acetylene, Poly Pyrrole, Poly Phenylene Vinylene, Poly Phenyl Sulfide, Poly Vinylene Carbazole, Poly Sprazole, Poly acene, Poly Electrical conductivity of aniline, Poly Lglutamate, Phtalocyanin, Qinacridone, Tetracyanoquinodimethane (TCNQ), Tetrathiafulvalene (TCNQTTF), Transfer Metal Group, Alkali Metallic Salt, NonLinear Polymer, Photo Chromic, Electro Chromic, Chemical Chromic And a Molecular Orbital of SP2 or SP3 containing light or thermal conductivity and having a Fermi level of electron mobility in the valence band consisting of a material of electron mobility of 1.6 eV or higher, deposited from an existing substrate or organic polymer film substrate Is doing. However, the above process method uses the existing substrates and uses transition metals and alkaline earth metals, but the amount of process work and process temperature are lower than those of the process, but flexible electric and electronic devices can be obtained. However, electron mobility or additional physical and chemical factors In addition, due to the negative result, in order to obtain additional performance, there are more harmful or fatal factors and the intrinsic semiconducting properties of the conductive organic material have the characteristic of rapidly decreasing the electron mobility. Superconductors are used to accelerate the mobility of electrons. Piezoelectric properties have more efficient current-voltage cut-off characteristics of semiconductors in electrodynamic models. The present invention proposes a method that can more efficiently use the cut-off characteristics of the current-voltage.

In the process aspect, the conventional method described above is mainly used to overcome the contents of the MEMS (Micro Electro Mechanical System) method such as Nano Imprinting Lithography (NIL), Self Assembly Monolayer System (SAMs), Atomic Layard Deposition (ALD), etc. There is a method, but in order to eliminate the factors of additional performance degradation due to the fine circuit line width or large area, rare metals (Silver, Gold, etc.) or carbon derivatives (Graphene, Fullerene C60, 61, 70, 90, CNT (Carbon Nano Tube) , SWCNT, DWCNT, MWCNT, etc.) to the dendrimers or nanowires (vertical or orthogonal structure (buriliruan or sapphire structure) to convert to the most difficult and low conversion rate results in the most difficult process operation related technical patents (US 2011117329, JP2009286032, GB2463670, KR20100078779, KR20100075100, US2007262710, JP2007273990, CN101331625, US2004085014, JP2005081585, JP2005023099, JP2004074469, JP200326669) It appears in government services research papers or reports of each country.

The present invention induces a nucleophilic reaction by using transition metals or organic conductive polymers, which are inorganic components, in an organic molecular structure to form a transparent display or a transparent electrode or have superconductivity, secure partial transparency, and super piezoelectricity by heat or light. The present invention provides a method for fabricating a self-healing intelligent semiconductor electrode that can be used for a complex transparent or translucent display-film type solar cell semiconductor ink and a printable material that can be used for living body tissue with integrated circuits and memory shapes. In addition, a method of having high electron gap and high mobility by using an organic-inorganic hybrid high dielectric to improve electron mobility is also presented. In accordance with the present invention, environmental agencies and countries around the world and the World Health and Safety Organization, and hazardous chemicals defined by international environmental standards (for air, water, human body and animals: REACHver2006, 2008, 2010, RoHS, LoHAS, HAPs etc.) In order to ensure safer use by eliminating the generation and emission of hazardous chemicals in accordance with the provisions of this regulation, further blocking the generation and shielding of electromagnetic waves generated in the manufacturing, production, testing and operation of consumer electronics-related products. Provide invention technology.

As a key feature of the present invention, in order to impart the conduction and piezoelectric ability of organic molecules, the orbital should have a molecular orbital of SP2 or SP3 structure and should be as linear as possible. In addition, in order to have an excellent semiconductor structure, organic conductive molecules having piezoelectricity and organic piezoelectric polymers having piezoelectric properties include SAM (Self Assembly Monolayer) and SOM (Self Organization) in order to have a structure having high dielectric constant and optically and electrodynamically transporting electrons. It uses RAFT (Receive Addition Fragmentation Polymerization) method of ATRP (Atomic Transfer Polymerization) method using Monolayer), SSM (Self Supermacromolecular Monolayer) method, and uses Suspension Polymerization method, Cation, Anion method, to ink into aqueous and vegetable oils. To complement stereoregularity (HeadTail, HeadHead, HeadHeadTail, HeadTailHead) by Syndiotatic or Sectioning atatic method, metallocene in the living ion polymerization method, a precise polymerization method that is one of the Ionic Polymerization methods to use transition metal or alkaline earth metal SuspensionEm Using Substitution Polymerization Method By using ulsion Heterogeneous Synchronized Polymerization method, it has stable stereoregularity to external physicochemical changes and has structure that suppresses change rate of conduction and piezoelectricity by surface tension of organic inorganic components. In addition, additional functions such as highly transparent cured resins and insulats are designed by Ziegler-Natta reaction, ring opening ring reaction, and Danielelder catalysis for surface roughness and surface adhesion between substrate and electrode ink. . Also, the interface between materials, the interface between particles of ink, the interface between particles and solvent, the interface between ink and air, the interface between ink particles and solvent remaining oxygen, the interface between ink and ink cartridge, the interface between ink supply tube and interface, and ink damping inkjet head. Quantum well phenomena occurring in the long or short time generated at the interface, the interface between the ink and the substray are minimized. To improve the electronic mobility and band gap, we propose the optimal inkjet ink through quantum computer simulation. In order to provide a better ink system, the phenomena based on the quantum electrodynamics: QED (Quantum Electron Dynamics) -based principle and semiconductor characteristics, or self-assembly-repairing of fine defects or partial performance improvement The principle of compensating for the shortcomings is applied as an intelligent semiconductor that can be reduced or increased.

In the present invention, a flexible or rigid display that requires transparency, or an electrode used for the display, has high transparency, a small change rate such as electron mobility and band gap, which are inherent characteristics of semiconductors, and physical and chemical safety and ultra-high temperature at room temperature. The present invention provides a technique for producing an organic-inorganic hybrid molecular semiconductor inkjet ink capable of conducting, piezoelectric and long-term operation at lower power, and an application method of the ink.

In order to solve the above problems, according to a preferred embodiment of the present invention, there is provided a method of manufacturing an inkjet ink for a semiconductor capable of forming a microcircuit pattern of an integrated circuit, comprising: selecting a photocured semiconductor chemical; Preparing conductive organic-inorganic hybrid semiconductor molecular particles, high and low dielectric molecular particles, photothermal electrochemically active light emitting liquid crystal polymer particles, and a base prepolymer by using a curing monomer such as ultraviolet light, heat, or radiation; Preparing an organic-inorganic hybrid semiconductor molecular particle and a high and low dielectric molecular particle dispersion master solution; A process for preparing a dispersion master stock solution of organic inorganic hybrid semiconductor molecule particles; Formulating process of organic inorganic hybrid semiconductor molecular particles; And microfiltration step; It provides the manufacturing method of the inkjet ink for photocuring semiconductors containing these, etc.

According to another suitable embodiment of the present invention, polythiophene, polyaniline, polypyrrole, polyacetylene, polyvinylcarbazole, poly L-glutamate, polyfluorine in the main material which is a conductive organic inorganic hybrid semiconductor molecular particle (active white charcoal) It is characterized by grafting one or two or more additive materials selected from tetracyanoquinomimethane derivatives or semiconducting inorganic substances.

According to another suitable embodiment of the present invention, the dispersion solution preferably comprises a mixed solvent of ultra pure water-vegetable oil.

According to another suitable embodiment of the present invention, a liquid crystal, light emitting, plasma, electrochromic, electroluminescent transmissive or reflective display, solar cell, secondary cell, fuel cell or bio using the inkjet ink prepared by the above method Provided is an electronic component selected from the sensor.

The manufacturing method according to the present invention makes it possible to produce an ink composition that can be used for various types of heads that do not use harmful chemicals and do not emit harmful chemicals during material curing and product manufacture. The manufactured ink composition does not emit harmful chemicals during the curing process, so it does not have a harmful effect on workers and the environment, and can be used for various types of heads instead of limited head types. Wide use of electronic devices and materials, ultra-light weight, ultra-thin, and ultra-miniaturized, maximizes power consumption and production efficiency, and provides the same performance and performance as conventional silicon-based substrates, regardless of the substrate type. It has the advantage of ensuring efficiency.

1 is an overall manufacturing process chart of an inkjet ink for semiconductors of the present invention. Specifically, the step of selecting the photocured semiconductor chemical (ES11); Preparing conductive organic-inorganic hybrid semiconductor molecular particles, high and low dielectric molecular particles, photothermal electrochemically active luminescent liquid crystal polymer particles, and base prepolymers using curing monomers such as ultraviolet light, heat, and radiation (ES12); Preparing an organic-inorganic hybrid semiconductor molecular particle and a high and low dielectric molecular particle dispersion master solution (ES13); A dispersion master stock preparation process of the organic-inorganic hybrid semiconductor molecule particles (ES14); Formulation process step (ES15) of organic inorganic hybrid semiconductor molecular particles; Microfiltration step (ES16); And printing step ES17; And the like.
Figure 2 is a computer 3D simulation, modeling results of the Base Electric-Electron Piezoelectric-Conduct Transporting Matrix.
3 is a detailed structural diagram of the Base Electric-Electron Piezoelectric-Conduct Transporting Matrix.
4 is a multi-layered structure diagram of the Base Electric-Electron Piezoelectric-Conduct Transporting Matrix.
5 is an example of application in a flexible organic light emitting display of the ink of the present invention.
6 is an example of application to a flexible film type solar cell of the ink of the present invention.
7 is an example of application to a flexible field effect transistor of the ink of the present invention.
8 is an example of application in a flexible liquid crystal display of the ink of the present invention.
9 is an example of a display comparison with the conventional organic light emitting display and the ink of the present invention.
10 shows a comparison between an existing organic field effect transistor, an organic solar cell, and a field effect transistor using an ink of the present invention and an organic solar cell.
11 is a block diagram showing the overall hardware configuration of a multidimensional photocurable print system. Referring to FIG. 11, the dimensional printing system 100 includes a main board system including the first, second, and third mainboards 100, 100a, and 100b of the system, a color profiler 103, and photocuring. A device 103, a storage device 102, a commercial inkjet printer 102, and a display device 102 are provided. Each configuration is interconnected to allow data communication. The first motherboard 100 is a main operation system of the system, and a block diagram of the first motherboard module is shown in FIG. The first motherboard 100 is a RISC-based 64-bit multicore-multithreaded processor to run an independent operating system. The first motherboard 100 is capable of parallel processing and displays, prints, inputs, outputs, and stores. The second and third burnt main boards 100a and 110b are auxiliary computing systems of the system, and a block diagram of the second and third mainboard modules is shown in FIG. 3. The second and third motherboards 100a and 100b may run an independent operating system as a RISC-based multicore-multithreaded processor. The 2nd and 3rd motherboards are capable of parallel processing and are responsible for display, input, output and high speed integer operation. Mainboard No. 2 (100a) is a main processing system that can be processed in parallel with RISC-based ARM processors and handles input, output and high-speed floating-point operations. The third main board 100b is an auxiliary processing system, and the third main board 100b is a RISC-based ARM SOC processor capable of high-speed digital operation control and can be driven by a kernel or a shell. . It also handles the input and output of photo-curing control and color management (profiling) control systems, as well as high-speed image and integer and floating point operations.
FIG. 12 shows a parallel processing flow of software by the multi-dimensional photocuring printing system shown in FIG. As shown in FIG. 12, each motherboard module in step S003 executes a computer parallel distributed processing operation program by transmitting various color matching profile information and photocuring control data to step S002 through a third motherboard in step S001. It is distributed to and processes. When the operation processed in step S004 and the target value of the operation coincide, the parallel operation using the multi-core is processed by the multi-core of the first motherboard module. In step S013, the data is parallelized and processed by the multi-core, and if it is larger than the target value in step S013, the feedback is moved to step S004, and the data is stored (S008) and displayed (S007) by the computer cluster language of steps S005 and S006, and in step S013. If it is lower than the target value, the controller moves to the fourth motherboard module (S018). If the target value is the same as the target value in step S013, steps S015 and S016 are performed in turn, and feedback is sent from step S017 to step S003 to calculate. If the target value is low in step S013, the process moves to steps S018, S019, S020, S021, and S022, and then moves to step S010. This structure is taken as a ring count method of a recursive feedback structure to form software capable of correcting the calculation by the high speed processing.
13 is an input-output flow chart of a light curing control system, printer, and various sensors.

The present invention is characterized in that it comprises a granular manufacturing process method such as the following steps 1 to 12

1. A method of preparing a dispersion master stock solution of a photocurable organic-inorganic hybridized superconducting molecular inkjet ink, comprising: selecting at least one conductive material and piezoelectric material in a blended ultra pure water and vegetable oil based solvent;

2. Halogenated rare metal catalysts (Ag, Au, Pd, Pt) using SigmaAldrich's photocurable amphoteric (water soluble and fat soluble) monomers of styrene, acrylate, methacrylate and imidazole groups Molecular weight (Mn: 1,000 ~ 10,000) oligomer was prepared, and the solution of silver nitrate (0.05N) and bismuth oxide (0.01N) dissolved in nitric acid were used by ATRP and partial RAFT method. Molecular weight (Mn: 20,000 ~ 80,000) Preparing a polymer;

3. preparing the following conductive compound;

1) Preparation of a conductive material having a Fermi band of 1.6 eV or more (PA (E) DOT (Polyalkyl (ethylene) dioxy (dioctyl) thiophene) To prepare conductive polymer particles, silver nitrate (1.5 N) and gold chloride ( 1N) catalyst is used to prepare highly transparent particles of average particle size (80 nm) dispersed particles dispersed in blended ultra pure water-vegetable oil-based solvent, and inorganic acids such as dilute sulfuric acid, hydrochloric acid, nitric acid, etc. The P-type semiconductor or the N-type semiconductor is formed by mixing or proportioning at least one or more.

2) Ultrapure water that has been completely dissolved using lactone to produce PANi (Polyaniline) particles with Fermi bands of 3.2 eV or more and then blended (100 nm) in the same rare metal catalyst as PA (E) DOT. -Form particles in vegetable oil based solvents. In addition, an inorganic acid such as dilute sulfuric acid, hydrochloric acid, nitric acid or the like is formed by mixing or proportioning at least one or more to form a P-type semiconductor or an N-type semiconductor.

3) Polypyrrole (PPy) (60 nm) has an average particle size and the production method is the same as that of PANi particles. In addition, a P-type semiconductor or an N-type semiconductor is formed by mixing or proportioning at least one or more of sulfuric acid, hydrochloric acid, nitric acid and the like with inorganic substances of carbon black or titanium dioxide.

4) PA (Polyacethylene) having a Fermi band of 3.6 eV or more is used to prepare particles having an average particle size (200 nm) using an aldehyde ketone solvent.

5) In order to extract the graphene used as the most important base matrix in the present invention, activated charcoal baked in a kiln of 1100 ~ 1200 ° C in oak charcoal native to Gangwon-do in Korea as a fine particle of 10-20 mm level with a dry mill. After making, using a dry mill, zirconia silica carbide bead diameter 2mm using 2mm zirconia silicate bead and then found fine powder to 10 ~ 20㎛ with 0.5mm diameter of pulverized zirconia silica carbide. Cooling in the dry grinding process uses liquid nitrogen to cool the grinder and injects liquid helium into the grinding chamber to maintain oxygen supersaturation and superconductivity. The speed of the grinding chamber should be kept below 1000 RPM during the dry grinding process. The grinding time is maintained for 5 to 8 hours depending on the capacity of the chamber of each grinder.); In order to brand or graf the conductive polymer particles to fine-found activated charcoal particles, inert nitrogen and helium are injected using a reactor, and a reactor equipped with a high speed stirring device is used.

4. Polysulfonic acid hydrated at 30wt%, polysulphonic lithium acid, polyaminosulphonic acid, polylignosulphonic acid sodium hydrated at 30wt% in ultra pure water and vegetable oil based solvents to use the reaction catalyst Selecting an organic acid of one of the salts as the reaction dispersion-charge dopant;

5. selecting at least two of conductive materials such as silver, gold, platinum, palladium, and semiconductor materials such as germanium, gallium and aluminum for nanorodization of the rare metal;

6. Wet milling of the grafted organic-inorganic hybrid conductive material produced through the reactor;

7. ultra fine grinding of the unground grafted organic inorganic hybrid conducting material; 8. Ultrapure water and vegetable oil-based solvent (vegetable oil: 20 ~ 60wt% of soybean oil, 20 ~ 40wt% of rapeseed oil, lactam 10 ~ 20wt%, lactone) for 10-40 wt% of grafted organic inorganic hybrid conductive material 20 to 40 wt%) preparing a grafted organic inorganic hybrid conducting material dispersion solution of 50 to 70 wt%;

9. Zirconium silica carbide hafnium beads of 0.02 to 5 mm in ultra-fine mills equipped with centrifuges improve the bandgap efficiency of semiconductor materials with rare metal conduction and piezoelectric polymers and high-low dielectrics. Preparing an ink composition stock solution having an average particle size of the loaded organic-inorganic hybrid conductive material being 0.1-20 nm;

10. preparing a stock solution of piezoelectric semiconductor organic-inorganic hybrid polymer particles having a size of 0.8 to 30 nm using the prepared photocured prepolymer;

11. Adding ink reaction chemicals to adjust the viscosity, surface tension, viscosity and the like to produce ink compositions; And

12. Filtration of the manufactured ink composition, etc.

In addition, the organic-inorganic hybrid semiconductor ink grafted with the rare metal conductive and piezoelectric polymer prepared by the method of the present invention does not emit volatile organic compounds during the curing process.

In addition, the present invention is a blended ultra-pure water vegetable oil solvent based photocurable inkjet ink for inkjet electronic printing using at least one or more of conductive or piezoelectric polymers and as the base polymer polystyrene, acrylate, methyl methacrylate, Dispersion stock solution containing at least one or more of the unsaturated ester, silicone, fluorine photocurable polymer; Ultra pure water vegetable oil mixed solvent; Potassium hydroxide pH buffer solution; Thickeners prepared on the basis of any one selected from the group consisting of an ethylene glycol group, a propylene glycol group, or 5 to 500 ultra pure water vegetable oil solvents thereof; Mixed diol solution in which any one or a mixture thereof selected from the group consisting of glycerin, butanediol, pentanediol, and hexadiol is mixed with normal methylpyrilidone, 2pyrrolidone, and polyvinylpyriridone in a blended ultra pure water vegetable oil solvent It includes a moisturizer prepared by.

The present invention also provides a lignin dispersant such as sulfonic lignin, acetonitrile, dimethyl sulfate, dimethanolamine, N, Ndimethylformamide, formaldehyde, hydrazine, methyl ethyl ketone, triethylamine, dimethyl sulfoxide in the curing process. Does not release morpholine, sodium hydroxide, tetrahydrofuran or urea. In addition, the ink composition including the organic-inorganic hybrid conductive ink grafted on the outside of the particles with the rare metal conductive and piezoelectric polymer prepared in the present invention is amphoteric (water-soluble, fat-soluble) polyacrylate / polymethyl methacrylate photopolymerization Oligomers; Poly ethylpropyl oxide; Modified polysiloxane / floor organic / inorganic hybrid radical polymerization oligomers; Ethyl diacrylate, propyl diacrylate, butyl diacrylate, ethyl methacrylate, propyl methyl methacrylate, butyl methyl methacrylate, isopropyl acrylamide monomer; polyethyl methacrylate, polyethyl acrylate, unsaturated Polyester prepolymers, polyethylurea prepolymers, polyurethane prepolymers, polyurethane acrylate prepolymers; And benzoacephenone as photoinitiator; Azobismethylpropiamidinedihydrochloride (azobismethylnitrile) as a thermal radical initiator; Benzoperoxides, which are free radical initiators; TINUV 5060, 5061 from BASF (Ciba specialty.) As a stabilizer; Hydroperoxide from SigmaAldrich as a collecting agent; As a sensitizer, dispersion master stock solution containing polycinnamate etc .; Ultra pure water or diluted mixed vegetable oils (vegetable oils, ethers, lactams, lactones); Potassium hydroxide pH buffer solution; Polyethylene glycol, polypropylene glycol; Mixed polyethylene glycol (M _W 400-12,000), poly, mixed with ultra pure water dilution mixed vegetable oils (vegetable oils, ethers, lactams, lactones) with any one or a mixture of 5 to 6,000 selected from the modified group consisting of Propylene glycol (M _W 425 ~ 8,000), ethylpropyl cellulose (M _W 800 ~ 1,600,000), gelatin, pectin and the like is made of a thickener;

Also in the present invention, the aqueous or mixed vegetable oil-based dispersion master stock solution is composed of any one or a mixture thereof selected from the group consisting of glycerin, butanediol, pentanediol, hexyldiol, ultrapure water-mixed vegetable oil, etc. as a diluent.

In addition, the present invention is characterized in that the dispersion master stock solution does not discharge volatile organic compounds in the manufacturing process and use process.

In addition, the present invention can be added to the electroconductive rheology polymer polythiophene, polypyrrole, polyacene, polyanaline, polyacetyrene, fullerene, carbon nanotubes, graphene, rare metal nanowires, dendrimer, silicinoxane Biochemical polymers such as gelatin and chitosan, which are biocompatible polymers, are added to chemical sensors used in inkjet inks and DNA chips.

In addition, the present invention is a rare metal conductive and piezoelectric polymer ink, high-low dielectric molecular particle ink is 10 to 30 wt% of the organic-inorganic hybrid semiconductor dispersion master stock solution grafted to the outside of the particle; The blended ultra pure vegetal fat is 40 to 70 wt%; pH buffer solution is 0.1 to 0.5 wt%; Viscosity modifiers from 20 to 40 wt%; The surfactant is 0.1 to 1 wt%; Antifoaming agents from 0.1 to 1 wt%; Humectants 1-15 wt%; Photo-initiators, thermal initiators, free radical initiators and trapping agents, stabilizers from 0.1 to 1 wt%; 0.1-5 wt% of a sensitizer is added.

In addition, the ink composition of the present invention has a surface tension of 20 to 60 dyne / cm; Viscosity is 5.0 to 100 cPs; And pH 2 to 12. Optimum conditions include a surface tension of 30 to 50 dyne / cm; Viscosity is 10.0-40.0 cPs; And pH 4-10.

The pre-oliomer described in the present invention is a compound having a weight average molecular weight of 1000 or more and 100,000 or less.

The ink composition according to the present invention uses a chemical that is not harmful to the human body and is produced by increasing the purity of the raw material. In addition, regulations set forth by environmental agencies around the world, and by the World Health and Safety Organization, and hazardous chemicals (for air, water, human and animals: REACHver2006, 2008, 2010, RoHS, LoHAS, HAPs etc.) as set by international environmental standards. Eliminates the generation and emission of harmful chemicals and further safeguards the shielding and generation of electromagnetic beams and electromagnetic waves (EMI, ESD) generated in the manufacture, production, testing and operation of consumer electronics-related products. The ink composition according to the present invention prepared using the above-described chemicals to ensure that there is no harmful substances to the human body and the environment during the curing process, and to protect the operator and also the environment.

1. Selection Step of Photocuring Piezoelectric Semiconductor Chemicals

Fe, Cu, Ag, Au, ZnPhtalocyanine, Luminol, Carmine A, Carmine B, Luciferin, Polyazo Poly Phenol, Titanium dioxide (Rutile, Anatage), Zinc Oxide, Indium Tin Oxide, Tin Oxide, Antimony, Germanium, Carbon, Lithopone, Aluminum Oxide, Gold, Silver, Chopper, Fe ₂ O ₃ , Lithium, Magnesium, Barium sulfide, CNT (Carbon Nano Tube, DWCNT, SWCNT, MWCNT), Nanowire, Dendrimer, Graphene, Fullerene C60, 61, 70, 74, 84, 90, Poly Thiphene Group (PEDOT, PEDOTPOSS / PSS, PADOT, PT, P3HT, F8T2), Poly Acetylene, Poly Pyrrole, Poly Phenylene Vinylene Group, Poly Vinylene Carbazole, Poly Sprazole, Poly acene, Poly aniline, Poly Lglutamate, Iridium, Hafnium, Poly imide, Poly Phenyl Sulfide, Fluorescein, Tetracyanoquinodimethane (TCNQ), Tetrathiafulvalene (TCNQTTF), Transfer Metal Group, Alkali Metallic Salt, Cumarin, Cinnamate, NonLinear Polymer, Photo Chromic, Electro Chromic, Chemical Chromic, Poly Imine, Poly N N -Piezoelectric conductivity such as iso amide (Nylon), Poly Sulfone, Poly Sulfide, Pentacene, Germanium, Gallium Among the chemicals, preferably allergenic and noncarcinogenic substances can be selected.

2 . Preparation of conductive organic inorganic hybrid semiconductor molecular particles, high and low dielectric molecular particles, photothermochemically electroluminescent liquid crystal polymer particles, and base prepolymers using curing monomers such as ultraviolet light, heat, and radiation

According to a preferred embodiment of the present invention, a method for preparing a photocurable polymer using monomers for blended ultra pure water vegetable oil solvent based photocurable inkjet inks is characterized by the use of spherical polymer ink particles having constant pores under solution of an electrically conductive monomer. Form. The preparation was carried out under standard conditions (atmospheric pressure 1 ATM, temperature 298.16 K) of amphoteric (water soluble, fat soluble) styrene, acrylate, methyl methacrylate, unsaturated polyester monomers of SigmaAldrich; DowCorning's modified fluorinated silicone, monomers composed of unsaturated polyester; 20 to 40 wt% of Alfa-Aeasar's hexamethyldiadipamide, ethylimide and vinylphenylphenol monomers are mixed with ultra pure water vegetable oil solvent (20 to 60 wt% of soybean oil, 20 to 40 wt% of rapeseed oil, 10 to 20 wt of lactam) %, Lactone 20-40 wt%) Amphoteric (water-soluble, fat-soluble) solvent 2 pyrrolidone, N methylpyrilidone blend solution (1 Kg basis, mixing ratio 50:50) 20 to 40 wt% and cosolvent Dimethyl sulfoxide, dimethyl acetate blend solution (mixing ratio 50:50 based on 1Kg) 20 to 40 wt%, 5 to 15 wt% of tetrabutyl alcohol as a non-cosolvent in rare metals (Ag, Au, Pt, Pd) of SigmaAldrich Precision synthesis reaction using Wurtz FittingUlmann Reaction with at least 1 ~ 2 wt% of catalyst and 2 ~ 3 wt% of Merck's Aluminum trioxide dicholoride, doping Gemanium Nitrate and SigmaAldrich's Calcium hydrate, Hafnium hydrate, Iridium hydrate, Lithium hydrate, Potassium chloride, Simultaneous Ziegler Natta Reaction using Ligand Reaction of Bromide and Iodine Induces the action of ATRP by inducing action and initiates RAFT of the synthesized particle partial polymer, using silver nitrate (0.05N) as a polymerization electron catalyst and bismuth oxide (0.01N) solution dissolved in nitric acid. (Mn: 20,000 ~ 80,000) It is made of polymer. To induce the crystallization of conductive molecular particles, 1000 ml of 0.01 N HClH2SO4 or HNO3H2PO3 and neutralizing 0.01 N NaOHNH3OH or KOHLiOH were added dropwise to 1000 ml of azeotrope (isopropyl alcohol / ethyl alcohol or pretanol volume mixing ratio 20:80). 1000 ml of redox 1N bisphosphocarbonate or disodium sulfonate was added dropwise to form a crystal, and heat was obtained by initiator of Sigmaaldrich's Remind Water 75wt% in Benzoic peroxide (BPO) 0.1 to 1wt% by heat and light under helium atmosphere. Merck polyethyl oxide or propyl oxide, butyl oxide, pentane oxide, hexyl oxide, heptane oxide, octyl oxide, fluoride oxide, etc. are linear and the molecular orbital is SP2 or SP3 Thiopene in 3.75wt% in DI Water Solution with Molecular Orbital In order to prepare the conductive material, electron injection semiconductor molecular particles were prepared by blending silver nitrate (0.5 to 1.5N) and silver chloride or gold (0.1 to 1N) catalyst on Thiophene (Ethylenediocxyl thiphene, Hexylmethyl thiophene) monomer (2.86wt%). Ultraviolet C (193nm: 37.5mW) was added to the ultrafine water and vegetable oil-based solvents with the average particle size (80nm) dispersed in micelles. 10 kinds of basic DOT (Polyalkyl (ethylene) dioxy (dioctyl) thiophene) series (P3HT: Poly (3hexythiophene2,5diyl), P3OT: (Poly (3octylthiophene2,5diyl), P3DDT: Poly (3dodeecylthiophene2,5diyl), F8) Poly (9,9dioctylfluorenealtbithiophene), Poly (thiophene3 (2ethoxy) ethoxy) 2,5diyl, sulfonate, PE (P) DOTblockPEG (PPG): Poly (3,4ethyl (propyl) enedioxythiophene) blockPoly (ethylpropylene) glycol), PE ( P) DOTPSS: Poly (3,4ethyl (propyl) enedioxythiophene) Poly (styrenesulfonate), PE (P) DOTPOSS: Poly (3,4ethyl (propyl) enedioxythiophene Poly (octylstyrenesulfonate), PT: Poly (thipene2,5diyl) PDT: Poly (3decylthiophene2,5diyl), P3BT: Ptype organic conductive semiconductor molecule particles of poly (3butylthiophene2,5diyl) are prepared. To prepare PANi (Polyaniline) particles, another organic electron injection semiconductor molecule, completely dissolved by using lactone (ANi 5 ~ 10 wt% in Lactone: SigmaAldrich) and then using the same rare metal catalyst as PA (E) DOT. Form particles in ultra pure water and vegetable oil based solvents (100 nm) size blends. At this time, the doping agent of PANi becomes four different kinds of PANi by 0.01N HCl, H2SO4, HNO3, H2PO3, and by doping time of Ntype (Polyaniline (emelradine salt), Polyaniline (leucoemelradine)) and Ptype ( Polyaniline (emelradine salt) Long (short) chain, graft lignin, Polyaniline (emelradine salt) Long (short) chain, graft lignosulfonate (lithium, potassium, sodium) salt) Organometallic semiconductors can be prepared.

The electron (electro) moving body PPy (Polypyrrole) (60 nm) has an average particle size and the manufacturing method is the same as that of PANi particles. However, PPy does not disperse in water and common organic solvents, so it can be used in white charcoal and carbon black (1: 1, 1: 2, 2: 1, 1: 3, 3: 1, 1: 4, 4). The grafting was performed at a ratio of 1). In addition, when the Ziegler-Natta addition reaction of polyethyl oxide, propyl oxide, and butyl oxide, respectively, 2 moles, the following three types of organometallic semiconductors can be prepared. 3,4ethylenepyrrole, 1,2propylenepyrrole, 4,3butylenepyrrole When grafting a rare metal to an organic metal semiconductor to 0.01 mol of rare metals (Ag, Au, Pt, Pd) at the ends of both functional groups, a hypercube with a transparent organic metal superconductor Prepare graphene. In addition, when the prepared hypercube graphene is dispersed in 1 mole of DMSO and DMF as a coagulant, FullereneC60, 61, 70, 74, 84, 90, CNT (Carbon Nano Tube, DWCNT, SWCNT, MWCNT), Nanowire, Dendrimer In addition, it is possible to control manufacturing up to a multi-dimensional structure with graphene.

Piezoelectric molecules, PVK (Poly Vinyl Carbazole) and PLG (PolyLGlutamate), were mixed with 0.2% 2Vinyl Carbazole, 9Vinyl Carbazole, 0.1mol 1Vinylnaphtalene and 2Vinylnaphtalene in 20% by weight of pretanol and 10 wt% dissolved in isopropyl alcohol. After 8 hours with Ultra Violet C (253nm: 50.5mW) was granulated.

The base matrix PA (Polyacethylene) is used to prepare particles having an average particle size (200 nm) using an aldehyde ketone solvent. In order to extract a large amount of graphene that is used as the most important base matrix in the present invention, dry activated white charcoal 1Kg and 0.5Kg of Sigmaaldrich's graphite 100mesh of oak charcoal grown in Gangwon-do in Korea in a kiln of 1100 ~ 1200 ℃ After pulverizing 10 ~ 20mm fine particles into powder and using a dry coarse crusher to find the diameter of 300 ~ 500㎛ using 2mm zirconia silica carbide beads, dry fine crusher zirconia silica carbide beads 10 ~ It is finely found to 20 micrometers. Cooling in the dry grinding process uses liquid nitrogen to cool the grinder and injects liquid helium into the grinding chamber to maintain oxygen supersaturation and superconductivity. The speed of the grinding chamber should be kept below 1000 RPM during the dry grinding process. The grinding time is maintained for 5 to 8 hours depending on the capacity of the chamber of each grinder.); In order to blend or graf the conductive polymer to the particles of fine-found activated charcoal, inert nitrogen and helium are injected using a reactor, and a reactor equipped with a high speed stirring device is used. In order to use the reaction catalyst, polysulfonic acid hydrated at 30 wt% in ultra pure water and vegetable oil-based solvent, polysulfonic lithium acid hydrated at 40 wt%, polyaminosulphonic acid, polylignosulphonic acid sodium salt One organic acid is selected as the reaction dispersion-charge dopant, and the synthetic silicone coacrylate copolymer polymer of 5 wt% aqueous solution of Tokyo Chemical Industry Co., Ltd., Sioma Did Co., Ltd. 20 g of cinnemate in 25wt%, Ataic: 5wt aqueous solution (25wt% in DI Water) and 25g, Titanium dioxide Rutile type: 90wt%, Anatage type: 10wt%, Silicon dioxide, Aluminum oxide ( 15g of aluminum oxide, zinc oxide, indium tin oxide (ITO), antimony oxide, germanium oxide, and gallium oxide The rare metals Silver and Gold are 10g each, Platinum and Palladium each 5g using 72g at 1Kg, and various hypercube organic inorganic grafted multidimensional graphene particles are synthesized according to the ratio of catalyst and initiator. The active group forms a functional group that is water-soluble or fat-soluble depending on the presence or absence of a hydroxy group.

For superconductivity, TCNQ (Tetracyanoquinodimethane) and TCNQTTF (Tetrathiafulvalene) were dispersed in a 1Kg solution of Nitromethane: isopropyl alcohol: 2butanol = 4: 4: 2 or 3: 4: 3 at 1 mole each, each translucent solution To prepare.

Light Emission (Emitting) Polymer contains 2,5bis (2 (N, N (di) ethylamino) ethoxy) 1,4phenylene) alt1,4phenylene and Poly floure2,5Octyl (ocxyl) oxidine for each mole of hydroxytetrahydrofuran: DMSO : DMF = 4: 4: 2 To 1Kg of the mixed solution, 0.1 mole of Alkalisulfonic salt (K +, Na +, Li +) is added to each other to prepare a material having different emission locations by blending. Another LEP, Cyanopolyphenylenevinylene group, fluorenylene ethylene group, flourene vinylene group is prepared by the same solvent.

Electron transporting (Hole Transporting) layer is mainly used to maximize the efficiency of LEP or electron (bottom) carrier. In the present invention, Phtalocyanine (substituted with rare metals, alkaline earth metals and transition metals), Quinacrydione, and Cumarine derivatives were mainly prepared using 20 mole / Kg in the same manner as the mixed solution used for LEP.

Active Emission (Emitting) Liquid Cyrystal Polymer is manufactured from SigmaAldrich's amphoteric (water soluble and fat soluble) polystyrene co acrylatealt methyl methacrylate cis or trans unsaturated polyester under nitrogen atmosphere and standard conditions (atmospheric pressure 1ATM, temperature 298.16K). 250 g; 250 g of a monomer composed of an insoluble resin of a modified fluorinated silicone unsaturated polyester of DowCorning I2700 was added to 400 g of an ultra pure mixed vegetable solvent, and then a blend of two-pyrrolidone and Nmethylpyrrolidone, which are amphoteric (water-soluble and fat-soluble) solvents. Wurtz Fitting was added by adding 250 g of liquid (based on 1 Kg, mixing ratio 50:50), 200 g of co-solvent dimethyl sulfoxide and dimethyl acetate blend liquid (50:50 mixing ratio based on 1 Kg), 50 g of tetrabutyl alcohol as non-cosolvent, and 20 g of AgAuPt continuous catalyst from SigmaAldrich. Allow Ulmann Reaction to occur. Next, after adding 10 g of Merck's Aluminum trioxide dichloride and 20 g of SigmaAldrich's Calcium hydrate, the Ligand Reaction and the Ziegler Natta Reaction were simultaneously performed to synthesize a conductive rheology polymer. In order to induce crystallization of the synthesized polymer, the mixture was added dropwise to 1000 ml of azeotrope (isopropyl alcohol / ethyl alcohol volume mixing ratio 20:80), 1000 ml of 0.01 N HCl and 0.01 N NaOH neutralizing it were added dropwise and oxidized. 1000 ml of 1N bisphosphocarbonate or disodium sulfonate as a reducing agent is added dropwise to form a crystal. Next, 1 g of BPO (Benzoic peroxide), an initiator of heat and light, was added in a helium atmosphere, and Sublimation Dye & Pigment ((Phtalocyanine or Qinacrydione) transacrylate comethyl methacrylatealt (Cinnamate or Benzoic Group (Benzoate) of Sigma Aldrich was added. , Benzonic Acid) 250g, modified silicone cofluoro copolymer of Dowcorning or thiophenecofluorovinylenealt parasulfide 250g of Sigmaaldrich, 50g of spirazolecoeosin or dioindigo from Tokyo Chemical Industry, and

The liquid crystal polymer is based on SigmaAldrich's Cholestryl group (acetate, bezoate, carbonate, choloride, succinate, pergolarnate) or Nematic group (bisphenylcarbonitrile, butylnitrile, benzinitrile), and Smetic group (bezoic acid, phenylbenzoate). 1g each of Alfa Aesaer's Luciferin, Luminol salt, sigmaaldrich's Uradine and Reboflavin, and 2g of SigmaAldrich's polycinnemate (Mw 200,000) and 10g of minerals (titanium dioxide, silicon dioxide, and aluminum oxide) Aluminum oxide), zinc oxide or at least one member selected from the group consisting of indium tin oxide (ITO). Instead of the spirazole eosin from Tokyo Chemical Industry, two or more selected from the group consisting of polythiophene, acene, an alin, vinyl carbazole, spirazole, or L glutamate may be used. Finally, the conductive rheological polymer synthesized has water solubility or fat soluble according to the presence or absence of a hydroxyl group at the active end of the group. It is manufactured with Degassing using 99.999999999% nitrogen gas from Airproducts during the manufacturing of conductive rheological polymer particles.

 High dielectrics include fluor acrylate, hafnium acrylate, iridium acrylate, and zirconium oxide acrylate as low dielectrics. Synthesize.

A specific synthesis method is to disperse 1Kg of the above-described silicinoxane in 5Kg of DMSO: DMF = mixing ratio (80:20), and then disperse by adding 500g of amic dendrimer. Silver nitrate, a catalyst under atmospheric nitrogen flow, is added with 0.02 mole (3.38 g) and sonicated for 60 min. 2 g of benzoperoxide was added to the sonicated dispersion particles, and UV polymerization was performed at 3 ° C for 3 hrs under UVC 253 nm and 37.5 mW at minus 5 ° C outside the reactor to form a sillyquinoxane organic-inorganic hybrid nanoporous structure encapsulated outside the amic dendrimer. . In order to disperse and granulate the prepared structure, 2Kg of co-solvent pretanol was added to prepare a transparent nanoporous structure having a refractive index of 1.42 as a particle body having fine pores having a stirring size of 30 nm at 1000 rpm for 2hr.

To 1 Kg of the nanoporous structure prepared above, a mixed solution of 2 pyrrolidone: N methyl 2 pyrrolidone: gamma butyl lactone and gamma valerolactone = 40:40:20 was mixed with the nanoporous structure in a 1: 1 ratio. 100 g of each of the high and low dielectric materials mentioned above was added to 3.38 g of AgNO3 as a main catalyst and HAuCl4 as a cocatalyst under a nitrogen atmosphere at room temperature under reduced pressure (1ATM), and a thermal free radical initiator for the Daniel Alder substitution reaction. It is prepared by adding 1 g of benzoic benzoperoxide of SigmaAldrich, which is stirred at 600 rpm for 8 hr, and grafting the end of the nanoporous structure (polymer having hafnium, iridium or zirconium).

Each conductive molecular semiconductor particle and high and low dielectric molecular particle inks are prepared with Degassing using 99.999999999% nitrogen gas from Airproducts during the manufacturing process time.

3. Preparation of Organic Inorganic Hybrid Semiconductor Molecular Particles and Dispersion Master Solution of High and Low Dielectric Molecular Particles

In order to prepare the emulsified master solution before using the dispersing equipment for grafting and dispersing the base prepolymer and conductive molecule particles prepared in the preceding step, an intelligent semiconductor dispersion master solution having various functionalities is Manufacture. Base Electric-Electron Piezo-Conduct Transporting Matrix can manufacture P-type and N-type Bipolar Juction Transistors (BJT) by controlling the state and amount of each component of Thiophene group, PANi group, and Hypercube Organic Organic hybrid graphene. In order to implement (Field Emitting Transistor), F / F (Flip-Flop) IC (Integrate Circuit) that can be driven by controlling the state and content of each component of PPy group and PA group is composed. Components of the PVK group and TCNQ group are added to improve active voltage and current control characteristics (Cut-off) of VLSI and Very-Ultra Large Scale Integration (ULSI).

Base Electric-Electron Piezo-Conduct Transporting Matrix

Basis Pre-Olimer: 10-15 wt%

Thiophene group (at least one of the pre-made molecular particles): 8-20 wt%

PANi group (at least one of the pre-made molecular particles): 6-18 wt%

PPy group (at least one of the pre-made molecular particles): 2-10 wt%

PA group (at least one of the previous prepared molecular particles): 1-10 wt%

PVK group (at least one of the pre-made molecular particles): 1-10 wt%

TCNQ group (at least one of the previous prepared molecular particles): 1-10 wt%

Hypercube OrganicInorganic hybrid graphene: 30-40 wt%

Chage Control Agent (Clariant GmBH NP-101): 0.5 ~ 1wt%

Dynol604 (Airproducts CO.): 0.1-0.5wt%

Retinol A (SigmaAldrich CO.): 0.01 ~ 2wt%

Solvent (40 wt% ultrapure water, 10 wt% mixed vegetable oil solution, 50 wt% pretanol): balanced.

Hole Injetction Layer

Basis prepolymer: 10 to 15 wt%

Thiophene group (at least one of the pre-made molecular particles): 4-10 wt%

PANi group (at least one of the previous prepared molecular particles): 3-10 wt%

PPy group (at least one of the pre-made molecular particles): 1-5 wt%

PA group (at least one or more of the previously produced molecular particles): 0.5-5 wt%

PVK group (at least one of the pre-made molecular particles): 0.5-5 wt%

Hypercube OrganicInorganic hybrid graphene: 1-5 wt%

Chage Control Agent (Clariant GmBH NP-101): 0.5 ~ 1wt%

Dynol604 (Airproducts CO.): 0.1-0.5wt%

Retinol A (SigmaAldrich CO.): 0.01 ~ 2wt%

Aliphatic Aromatic Alcohol: 0.1 ~ 20wt%

Solvent (40 wt% ultrapure water, 10 wt% mixed vegetable oil solution, 50 wt% pretanol): balanced.

Hole Transfer Layer

Basis prepolymer: 10 to 15 wt%

Thiophene group (at least one of the pre-made molecular particles): 2-10 wt%

PANi group (at least one of the pre-made molecular particles): 1-10 wt%

PPy group (at least one of the pre-made molecular particles): 1-5 wt%

PA group (at least one of the previous prepared molecular particles): 1-10 wt%

PVK group (at least one of the pre-made molecular particles): 1-10 wt%

Hypercube OrganicInorganic hybrid graphene: 1-5 wt%

Chage Control Agent (Clariant GmBH NP-101): 0.5 ~ 1wt%

Dynol604 (Airproducts CO.): 0.1-0.5wt%

Retinol A (SigmaAldrich CO.): 0.01 ~ 2wt%

Solvent (40 wt% ultrapure water, 10 wt% vegetable oil solution, 50 wt% pretanol): balanced.

Light Emitting (Emission) Polymer

Basis prepolymer: 10 to 15 wt%

Thiophene group (at least one of the pre-made molecular particles): 2-10 wt%

PANi group (at least one of the pre-made molecular particles): 1-10 wt%

PPy group (at least one of the pre-made molecular particles): 1-10 wt%

PA group (at least one of the previous prepared molecular particles): 1-10 wt%

PVK group (at least one of the pre-made molecular particles): 1-10 wt%

MEHPPVcoPFO (at least one of the previously prepared molecular particles): 1-10 wt%

Hypercube OrganicInorganic hybrid graphene: 0.5 ~ 5wt%

Chage Control Agent (Clariant GmBH NP-101): 0.5 ~ 1wt%

Dynol604 (Airproducts CO.): 0.1-0.5wt%

Retinol A (SigmaAldrich CO.): 0.01 ~ 2wt%

Solvent (40 wt% ultrapure water, 10 wt% mixed vegetable oil solution, 50 wt% pretanol): balanced.

Electron Transporting (Hole Transporting) Layer

Basis prepolymer: 10 to 15 wt%

Thiophene group (at least one of the pre-made molecular particles): 4-10 wt%

PANi group (at least one of the previous manufactured molecular particles): 2-10 wt%

PPy group (at least one of the pre-made molecular particles): 1-10 wt%

PA group (at least one of the previous prepared molecular particles): 1-10 wt%

PVK group (at least one of the pre-made molecular particles): 1-10 wt%

Hypercube OrganicInorganic hybrid graphene: 0.5 ~ 20wt%

Chage Control Agent (Clariant GmBH NP-101): 0.5 ~ 1wt%

Dynol604 (Airproducts CO.): 0.1-0.5wt%

Retinol A (SigmaAldrich CO.): 0.01 ~ 2wt%

Solvent (40 wt% ultrapure water, 10 wt% mixed vegetable oil solution, 50 wt% pretanol): balanced.

Active Emission (Emitting) Liquid Cyrystal Polymer

Basis prepolymer: 10 to 15 wt%

Active Liquid Cyrystal Polymer (at least one of the pre-made molecular particles): 8-20 wt%

Chage Control Agent (Clariant GmBH NP-101): 0.5 ~ 1wt%

Dynol604 (Airproducts CO.): 0.1-0.5wt%

Retinol A (SigmaAldrich CO.): 0.01 ~ 2wt%

Solvent (40 wt% ultrapure water, 10 wt% mixed vegetable oil solution, 50 wt% pretanol): balanced.

Newtonian emulsified solutions with viscoelasticity are prepared with Degassing using 99.999999999% nitrogen gas from Airproducts for a manufacturing process time of 12 to 36hr.

4. Dispersion Master Stock Preparation Process of Organic Inorganic Hybrid Semiconductor Molecular Particles

The organic-inorganic hybrid semiconductor molecular particles are nuclear self-grown in the particle size of the piezoelectric semiconductor molecular particles dispersed in the photocuring dispersion master solution, so that the maximum size of the sub-nanoemulsion (10 μm) is ideally large. Not suitable for spraying through Before going to the ultra-fine mill process, milling is carried out with pre-milling (rotational speeds of 500 to 3000 RPM) and fine milling (rotational speeds of 2000 to 10000 RPM) to form micronized or sub-nano sized dispersions through micelle aggregation of the particles. It must be manufactured and dispersed to a size suitable for spraying through an inkjet nozzle through an ultra-fine milling process. For dispersion, zirconium silica carbide hafnium beads of 0.1 to 5 mm are placed in a milling machine to disperse so that the average particle size of the molecules is 1 to 10 nm for a processing time of 90 minutes at 1 kg. Through this dispersion process, a dispersion master stock solution excellent in dispersion is produced. The ideal amount of the beads for dispersing is added in the range of 60 to 90% with respect to the total volume of the machine chamber, and the injected zirconium silica carbide hafnium beads are rotated at a high speed of 12,000 to 24,000 RPM. For this ultra-fine dispersion operation, a ultra-high precision grinding and dispersing system using a zirconium silica carbide hafnium bead is used in a pilot ultra-fast grinding and dispersing equipment such as a commercially available IKA T200.

5. Formulation process of organic inorganic hybrid semiconductor molecular particles

The photocuring reaction chemical is added to the photocuring dispersion master stock solution of the organic-inorganic hybrid semiconductor molecular particles prepared by grinding and dispersing to prepare an inkjet ink. Generally, photoreactive chemicals are added to improve the stability, dispersion, or binding ability between ink particles of the ink composition. The photoreactive chemicals to be added should take into account the improvement of ink properties such as surface tension, viscosity, pH and storage stability and at the same time be harmless to humans and the environment. Photoreaction chemicals include, for example, potassium hydroxide pH buffer solutions; And a surface agent that is a surfactant. In addition, Airproducts' amphoteric surfactants such as Surfynol CT211, 221, 231, Dynol 604, 607 Zetasperse 1200, 1400, 1600, 2100, 2300, 2500, 3100, 3400, 3700, Envirogem AD01, AE01, 02, 03, 360 Surfactants; Surfactants such as Tego 270, 280, 500, 505, Disperse 750, 760, which are amphoteric surfactants from Degussa; Surfactants such as BYK 023, 024, 027, 028, Disper, Disper 180, 184, 190, 192, 191, 193, which are amphoteric surfactants of BYK; Surfactants such as Solsperse 27000, 40000, 41000, 41090, 42000, 44000, 46000, 47000, which are amphoteric surfactants from Lubirazol; Room temperature moisture curable moisturizers such as 3M's amphoteric surfactant, FC4430, 4432; and polydi (methyl, ethyl) siliconecoacrylatealt (ethyl, methyl, propyl) cellulose bis gelatin.

0.1 to 1 wt% pH buffer solution

10 to 20 wt% photocured polymer, polymer, oligomer

20 to 40 wt% photocurable monomer

1.1 to 1 wt% surface tension modifier

1.1 to 1 wt% photoinitiator

0.1 to 1 wt% thermal initiator

1.1 to 1 wt% free radical initiator

0.1 to 5 wt% sensitizer

1.1 to 1 wt% scavenger

0.1 to 1 wt% stabilizer

0.1 to 1 wt% antifoam; And

0.5 to 10 wt% moisturizer

Ink formulation master stocks and photoreaction chemicals are blended in a mechanical stirrer and made with Degassing using 99.999999999% of nitrogen and helium gas from Airproducts during the processing time in the blend situation. For example, a variable conditional Reaction & Storage Vessel, which can be controlled by a commercially available IKA computer, can be used.

7. Microfiltration

The manufactured ink composition is a process for removing impurities generated or mixed in the manufacturing process and filtering out particles having a predetermined size or more. The filtration process is performed by ultrafiltration (less than 3㎛), microfiltration (less than 500nm), selective ultra-precision filtration (less than 100nm) using Millpore or General Electric's products, and reduced pressure (1 ATM) vacuum pump. It is filtered. Through the filtration process, the ink composition has an overall uniform and stable particle size.

8. Printing

In the printing of the ink prepared previously, a photocuring device may be configured to accelerate the curing speed of the photocuring ink. Automated (SMP or MPP) parallel processing of RISC-based processors (32/64/128/256/384 / 512bit microprocessors including ARM, Intel, AMD, VIA, IBM, Nvidia, Xillinx, Altera, etc.) It provides simulation and emulation according to the configuration of the system, and enables a system with excellent sharpness output.

The following Preparations and Examples are illustrative and can be made by those skilled in the art to various modifications and modifications to the examples presented.

Preparation Example 1 Preparation of Organic Inorganic Hybrid Semiconductor Molecular Particles and Dispersion Master Solution of High and Low Dielectric Molecular Particles

The following dispersion master solution for semiconductors is prepared.

Base Electric-Electron Piezo-Conduct Transporting Matrix

Basis Pre-Olimer: 100g

Thiophene group (at least one of the pre-made molecular particles): 140 g

PANi group (at least one of the pre-made molecular particles): 100 g

PPy group (at least one of the pre-made molecular particles): 30 g

PA group (at least one or more of the prepared molecular particles): 20 g

PVK group (at least one of the pre-made molecular particles): 10 g

TCNQ group (at least one of the preceding manufactured molecular particles): 10 g

Hypercube OrganicInorganic hybrid graphene: 300 g

Chage Control Agent (Clariant GmBH NP-101): 5g

Dynol604 (Airproducts CO.): 1 g

Retinol A (SigmaAldrich CO.): 0.1 g

Solvent (40 wt% ultrapure water, 10 wt% mixed vegetable oil solution, 50 wt% pretanol): balanced.

Hole Injection Layer

Basis Pre-Olimer: 100g

Thiophene group (at least one of the pre-made molecular particles): 60 g

PANi group (at least one of the pre-made molecular particles): 80 g

PPy group (at least one of the pre-made molecular particles): 50 g

PA group (at least one of the preceding prepared molecular particles): 10 g

PVK group (at least one of the pre-made molecular particles): 10 g

Hypercube OrganicInorganic hybrid graphene: 10 g

Chage Control Agent (Clariant GmBH NP-101): 5g

Dynol604 (Airproducts CO.): 1 g

Retinol A (SigmaAldrich CO.): 0.1 g

AliphaticAromatic Alcohol: 1g

Solvent (40 wt% ultrapure water, 10 wt% mixed vegetable oil solution, 50 wt% pretanol): balanced.

Hole Transfer Layer

Basis Pre-Olimer: 100g

Thiophene group (at least one of the pre-made molecular particles): 80 g

PANi group (at least one of the pre-made molecular particles): 30 g

PPy group (at least one of the preceding manufactured molecular particles): 10 g

PA group (at least one or more of the prepared molecular particles): 20 g

PVK group (at least one of the pre-made molecular particles): 10 g

Hypercube OrganicInorganic hybrid graphene: 10 g

Chage Control Agent (Clariant GmBH NP-101): 5g

Dynol604 (Airproducts CO.): 1 g

Retinol A (SigmaAldrich CO.): 0.1 g

Solvent (40 wt% ultrapure water, 10 wt% vegetable oil solution, 50 wt% pretanol): balanced.

Light Emitting (Emission) Polymer

Basis Pre-Olimer: 120 g

Thiophene group (at least one of the pre-made molecular particles): 100 g

PANi group (at least one of the preceding molecular particles produced): 20 g

PPy group (at least one of the pre-made molecular particles): 20 g

PA group (at least one of the preceding prepared molecular particles): 10 g

PVK group (at least one of the pre-made molecular particles): 10 g

MEHPPVcoPFO (at least one of the pre-made molecular particles): 100 g

Hypercube OrganicInorganic hybrid graphene: 10 g

Chage Control Agent (Clariant GmBH NP-101): 5g

Dynol604 (Airproducts CO.): 1 g

Retinol A (SigmaAldrich CO.): 0.1 g

Solvent (40 wt% ultrapure water, 10 wt% mixed vegetable oil solution, 50 wt% pretanol): balanced.

Electron Transporting (Hole Transporting) Layer

Basis Pre-Olimer: 100g

Thiophene group (at least one of the preceding molecular particles): 50 g

PANi group (at least one of the preceding molecular particles produced): 20 g

PPy group (at least one of the preceding manufactured molecular particles): 10 g

PA group (at least one of the preceding prepared molecular particles): 10 g

PVK group (at least one of the pre-made molecular particles): 10 g

Hypercube Organic Inorganic Hybrid Graphene: 5 g

Chage Control Agent (Clariant GmBH NP-101): 5g

Dynol604 (Airproducts CO.): 1 g

Retinol A (SigmaAldrich CO.): 0.1 g

Solvent (40 wt% ultrapure water, 10 wt% mixed vegetable oil solution, 50 wt% pretanol): balanced.

Active Emitting (Emission) Liquid Cyrystal Polymer

Basis Pre-Olimer: 150g

Active Liquid Cyrystal Polymer (at least one of the pre-made molecular particles): 200 g

Chage Control Agent (Clariant GmBH NP-101): 5g

Dynol604 (Airproducts CO.): 1 g

Retinol A (SigmaAldrich CO.): 0.1 g

Solvent (40 wt% ultrapure water, 10 wt% mixed vegetable oil solution, 50 wt% pretanol): balanced.

Newtonian emulsified solutions with viscoelasticity are prepared with Degassing using 99.999999999% nitrogen gas from Airproducts for a manufacturing process time of 12 to 36hr.

Example 1

Preparation Example 1. The dispersion stock solution prepared by the above was added with chemicals in the following proportions to prepare the composition of each of the inks according to the present invention with Degassing using 99.999999999% nitrogen and helium gas from Airproducts during the process time under blend conditions. It was.

57 parts by weight of Solvent (40 wt% of ultrapure water, 10 wt% of mixed vegetable oil solution, 50 wt% of pretanol);

15 parts by weight of polypropylmethylmethacrylate;

30 parts by weight of ethylpropyl methacrylate;

13 parts by weight of 1,6 hexylene diacrylate;

Potassium hydroixe 0.5 parts by weight

Dioctyl sulfosucinate, disodium salt 0.5 parts by weight

Dynol 604 0.5 parts by weight

Benzoacetophenone 0.5 part by weight

Benzo peroxide 0.5 part by weight

2,2 Azobis (2methylpropion) dihydrodicholoride 0.5 parts by weight

Poly cinnamate 0.7 parts by weight

0.6 parts by weight of hydro peroxide

TINUVIN 5060 0.6 parts by weight

The ink compositions of each function produced were filtered using a member rain filter. The resulting ink has a surface tension of 25 to 27 dyne / cm; Viscosity 5.2-5.9 cPs; And pH 9.3. The prepared ink was injected into the cartridge and subjected to 100m output test on output equipment such as Stylus Pro GS6000, Hewlett Packard Designer jet L25500 from Epson, and Canon IPF 9000 from Canon, with an ultraviolet (light) curing device attached. In the test process, general polyethylene terephthalate and polypropylene film were used for printing. For comparative analysis, Sigmaaldrich's ITO coated PET film (No. 639303, 639281) biaxial, 4-axis-side resistive 100, 60, 45 Hz films were used. No ejection of the nozzle occurred and the durability, sharpness, transmittance, and optical and electrical properties of the printed semiconductor ink were relatively excellent in the test results. The measurement results are shown in Tables 1-4.

Comparative Example 1

Clevios GmBH's semiconductor ink compositions for petroleum dilution electronic inkjet printing were compared.

PEDOTpss 40 wt%;

Ethyl Alcohol 12wt%;

Ethyl Cellosolve 3 wt%;

DMSO 5 wt%;

DMF: 2 wt%;

Dynol604 2 wt%;

D. I. Water Balanced.

100 m output tests were performed on output equipment such as Stylus Pro GS6000 manufactured by Epson, Hewlett Packard Designer jet L25500, and Canon IPF 9000 manufactured by Canon. For comparative analysis, Sigmaaldrich's ITO coated PET film (No. 639303, 639281) biaxial, 4-axis-side resistive 100, 60, 45 Hz films were used. In the course of the test, printing was performed on a general polyethylene terephthalate and polypropylene film, and there was a slight nozzle drop, and ink bleeding occurred, and the EVA nonwoven fabric of the ink support portion of the ink head was decomposed. Hazardous substances increased the serious damage of inkjet heads due to acid generation inside the ink by ethyl cellosolve and dimethylformamide. Later also, the rate of change of resistance to moisture was also severe.

Comparative Example 2

Alfa Aesaer's electronic ink compositions for petroleum dilution electronic inkjet printing were compared.

Silver solution 40 wt%;

Methyl Methacrylate 10 wt%;

DMF: 5 wt%

Dynol604 2wt%

Xylene Balanced.

The prepared petroleum dilution electronic inkjet printing electronic inks were tested on output devices such as Stylus Pro 7900 from Epson, Hewlett Packard Designer jet z3200, and Canon IPF 8000 from Canon. For comparative analysis, Sigmaaldrich's ITO coated PET film (No. 639303, 639281) biaxial, 4-axis-side resistive 100, 60, 45 Hz films were used. During the test process, some nozzles were missing by printing on general polyethylene terephthalate and polypropylene film, ink bleeding occurred, and EVA non-woven fabric of ink support part of ink head was dissolved by Xylene and harmful substances were discharged. Example 1 but not. After the same curing process, the rate of change of surface resistance to oxidation of silver was high during the quality test.

Comparative Example 3

Electronic ink compositions for petroleum dilution electronic inkjet printing from Tokyo Chemical Industry were compared.

Gold-Graphene (separated from oil) solution 40 wt%;

Methyl Methacrylate 10 wt%;

DMF: 5 wt%

Dynol604 2wt%

DMSO Balanced.

The prepared petroleum dilution electronic inkjet printing electronic inks were tested on output devices such as Stylus Pro 7900 from Epson, Hewlett Packard Designer jet z3200, and Canon IPF 8000 from Canon. In the course of the test, it was printed on the general polyethylene terephthalate and polypropylene film, and there was no leaking of the nozzle, the ink bleeding occurred, and the ink hazardous substance of the ink head was not discharged. After the same curing process, the rate of change of 3D resistance to bending and torsion was high during the quality test.

Temperature (° C) Comparative Example 1 (Ω / cm 3) Comparative Example 2 (Ω / cm 3) Comparative Example 3 (Ω / cm 3) Example 1 (Ω / cm 3) -80 501 476 602 287 -60 472 438 503 344 -40 452 418 464 402 -20 431 410 427 428 0 450 422 432 431 20 463 433 427 449 40 484 450 420 459 60 491 460 410 467 80 500 485 399 475

This is a table for measuring 2-axis axial resistance of electrode inks with temperature changes.

(65% humidity, voltage: 1.5V, current: 100mA, printing thickness: 10㎛)

Bending and distorsion (Angle) Comparative Example 1 (Ω / cm 3) Comparative Example 2 (Ω / cm 3) Comparative Example 3 (Ω / cm 3) Example 1 (Ω / cm 3) 60 430 422 420 428 70 452 445 458 436 80 467 461 498 442 90 483 471 532 453

It is a measurement table of the 2-4 axis three-dimensional resistance of the electrode ink according to the change of bending and torsion.

(Humidity 65%, Voltage: 1.5V, Current: 100mA, Printing Thickness: 10㎛)

Tickness (nm) Comparative Example 1 (Ω / cm 3) Comparative Example 2 (Ω / cm 3) Comparative Example 3 (Ω / cm 3) Example 1 (Ω / cm 3) 10 456 438 410 442 20 443 427 409 436 40 437 420 411 429 80 420 418 407 413

It is a measurement table of the 2-4 axis three-dimensional resistance of the electrode ink according to the thickness change.

(65% humidity, voltage: 1.5V, current: 100mA)

Temperature
(℃) Moisture (%) Comparative Example 1
(Ω / cm 3) Comparative Example 2
(Ω / cm 3) Comparative Example 3
(Ω / cm 3) Example 1
(Ω / cm 3) -100 0.000001 < - -(Break) - 291 -90 0.00001 < -(Break) 506 -(Break) 300 -80 0.0001 < 532 499 602 305 -70 0.001 < 512 487 589 310 -60 0.1 < 502 475 562 319 -50 1 < 492 462 544 327 -40 One 478 452 528 335 -30 50 461 448 505 344 -20 10 450 441 495 352 -10 20 446 435 474 364 0 30 433 427 452 375 10 40 429 422 442 382 20 50 437 418 432 392 30 60 429 412 429 408 40 70 430 417 430 411 50 80 432 421 427 425 60 90 436 430 432 432 70 100 442 433 427 439 80 110 459 448 420 452 90 120 467 459 410 460 100 130 483 474 399 479

2-4 axis resistance measurement table of electrode ink according to temperature-humidity change.

(Humidity 65%, Voltage: 1.5V, Current: 100mA, Printing Thickness: 10㎛)

The invention has been described in detail by presenting examples. The presented embodiments are illustrative and can be made by those skilled in the art to various modifications and modifications to the disclosed embodiments without departing from the spirit of the invention. The invention is not limited by the invention as such variations and modifications are limited only by the claims appended hereto.

Claims (4)

In the method of manufacturing an inkjet ink for a semiconductor capable of forming a fine circuit pattern of an integrated circuit,
Selecting a photocured semiconductor molecular particle compound;
To prepare conductive organic-inorganic hybrid semiconductor molecular particles, high and low dielectric molecular particles, photo-thermochemically electroluminescent liquid crystal polymer particles using a curing monomer reacting with energy of at least one of ultraviolet (light), heat or radiation, and a base prepolymer step;
Preparing an organic-inorganic hybrid semiconductor molecular particle and a high and low dielectric molecular particle dispersed master solution semiconducted with an organic acid-inorganic acid;
A process for preparing a dispersion master stock solution of organic inorganic hybrid semiconductor molecule particles;
Formulating process of organic inorganic hybrid semiconductor molecular particles; And
Microfiltration step;
Method for producing an inkjet ink for a photo-curing semiconductor comprising a.
The method according to claim 1,
Polythiophene, polyaniline, polypyrrole, polyacetylene, polyvinylcarbazole, poly L-glutamate, polyfluorotetracyanoquinomimethane derivative, or the like to the organic-inorganic hybrid semiconductor molecule particles semiconducted by the organic acid-inorganic acid, or A method for manufacturing an inkjet ink for a semiconductor, comprising grafting at least one selected from semiconductor polymers using a conductor-semiconductor inorganic material and an inorganic-organic acid.
The method according to claim 1,
Wherein said master stock solution contains a mixed solvent of ultra-pure water-vegetable oil.
Claims 1 to 3 selected from a transmissive or reflective flexible display, hologram, battery, sensor, nanomechanical-electronic device, molecular machine-electronic or integrated circuit using the inkjet ink for semiconductor manufactured by the method of any one of claims 1 to 3. Electronic parts.

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