KR101271181B1

KR101271181B1 - Apparatus for measuring contamination degree of conveying enclosure and measuring method for using the same

Info

Publication number: KR101271181B1
Application number: KR1020120128643A
Authority: KR
Inventors: 유승교; 이응선; 주영희; 박무성
Original assignee: 주식회사 위드텍
Priority date: 2012-11-14
Filing date: 2012-11-14
Publication date: 2013-06-04

Abstract

PURPOSE: An apparatus for measuring the contamination of a conveying enclosure and a measuring method using the same are provided to prevent the fault of a wafer by removing contaminants formed in a gas suction pipe. CONSTITUTION: A conveying enclosure(100) includes a gas inlet and a gas outlet. The gas inlet is connected to the outside. An analyzer(200) measures contamination through a gas suction pipe(300). The gas suction pipe is connected to the gas outlet. An inactive gas or a cleaning solution is supplied to the gas suction pipe. [Reference numerals] (410) Inactive gas; (420) Cleaning solution

Description

Apparatus for measuring contamination degree of conveying enclosure and measuring method for using the same}

The present invention relates to a transport enclosure pollution degree measuring apparatus and a pollution degree measuring method using the same, in more detail a transport enclosure pollution degree measuring apparatus for removing the contaminants generated by adsorption in the gas suction pipe between the transport enclosure and the analyzer to improve the measurement reliability and It relates to a method of measuring the pollution using the same.

In the core process of the semiconductor industry and display industry, a wide variety of hazardous gases are indispensable. These harmful gases are acidic gases such as fluorine, chlorine, bromine, nitric acid and sulfuric acid, and basic gases such as ammonia and amines, and organic compounds. , Metallic materials such as Cu, Al, and Si, and dopant materials such as P and B. In general, their properties are toxic and very oxidative, causing product defects or surface peroxides.

In particular, since ammonia in the air has a close relationship with the yield of semiconductor production such as photoresist deformation and salt formation through reaction with acidic gas, it is required to continuously monitor and manage.

In particular, the semiconductor and FPD industries manage pollutants at very low levels of ppt-ppb to prevent product defects and improve production yields due to high integration of wafers and finer patterns. Previously, the research mainly focused on the monitoring of FAB environment, but recently, in a mini environment, the wafer is isolated from the outside to fundamentally isolate contact with molecular contaminants in the atmosphere. There is a lot of research into the problem.

Transport enclosures include FOUPs, FOSBs, and reticle chambers as a means to prevent and transport contamination.

In semiconductors, a wafer usually means a silicon wafer, which means a thin silicon plate on which semiconductors are built. A wafer is made by thinly cutting single crystal silicon having a purity of 99.9999999% and smoothing the surface. The surface of the wafer must be free of defects or contamination, as well as affect the precision of the circuit, requiring a high degree of flatness. In recent years, the disk-shaped thing of thickness 0.3mm and diameter 15-30cm is used.

The wafer is cut into individual chips after being assembled and used as a finished integrated circuit.

Until it is used as an integrated circuit, a wafer goes through a pattern process, an etching process, an ion implantation process, and the like, which is accommodated in a transport enclosure to be transported or accommodated for the next process.

However, the wafer may be supplied with a large amount of chemical in such a process, resulting in chemical contamination, and the inside of the transport enclosure may be contaminated by the contaminated wafer.

If the wafer is stored for a long time in the contaminated transport enclosure and the transport enclosure is contaminated above a certain concentration value, the wafer is adversely affected, which may cause product defects. Therefore, it is very important to quickly and accurately measure the degree of gas contamination inside the transport enclosure to improve the quality of wafer production.

Korean Laid-Open Patent Publication No. 2006-0101332 (published on September 22, 2006, titled: Method and Apparatus for Monitoring Contamination of a Substrate Wafer) discloses an apparatus for directly measuring contamination in a transport enclosure of FOUP or SMIF type.

However, the pollution measuring device as described above has a serious valve adsorption problem due to the adsorbed contaminants between the interface and the connection pipe connected to the FOUP discharge part and the gas measuring device, and even if inert gas is injected, only a part of the flow path is cleaned. However, there is a problem in that there is a limit in removing pollutants.

Korean Laid-Open Patent No. 2006-0101332 (published May 22, 2006, Title: Method and Apparatus for Monitoring Contamination of Substrate Wafer)

The present invention has been made to solve the above problems, an object of the present invention is to remove the pollutants generated by the adsorption in the gas suction pipe between the transport enclosure and the analyzer to improve the measurement reliability pollution enclosure and the same It is to provide a method for measuring the pollution level.

In other words, an object of the present invention is to measure the pollution level inside the transport enclosure by injecting inert gas or cleaning liquid into the gas suction pipe between the transport enclosure and the analyzer to discharge the pollutants inside the gas suction pipe to the outside or to the analyzer. The present invention provides a transport enclosure contamination measurement device and a pollution measurement method using the same, which can improve data reliability.

In addition, an object of the present invention is to check the leakage of the connection between the transport enclosure and the gas suction pipe or the leak in the gas suction pipe or the leakage of the door of the transport enclosure when the gas inside the transport enclosure for the measurement of contamination inside the transport enclosure It is possible to provide a transport enclosure contamination measurement device and a pollution measurement method using the same, which improves the measurement accuracy of contamination within the transport enclosure and thereby prevents a large amount of defects in the wafer.

The transport enclosure contamination level measuring apparatus of the present invention includes a transport enclosure (100) including a gas inlet (120) and a gas outlet (110) perforated to communicate with the outside on one side; And an analyzer 200 for measuring contamination by sucking gas in the transport enclosure through a gas suction pipe 300 connected to the gas outlet 110. It includes, at least one of the inert gas and the cleaning liquid is injected into the gas suction pipe 300 is characterized in that the pollutants inside the gas suction pipe 300 is discharged to the outside, or transported to the analyzer 200. .

In addition, when only the inert gas is injected into the gas suction pipe 300, the transport enclosure pollution degree measuring apparatus diffuses the inert gas in at least two directions or more, and when the inert gas and the cleaning liquid are injected into the gas suction pipe 300, The inert gas is diffused in one or more directions to remove the contaminants adsorbed in the pipe branched from the gas suction pipe 300 or the gas suction pipe 300.

In addition, the transport enclosure pollution degree measuring device (1) injecting the inert gas, in order to relieve the pressure from the analyzer, the gas suction pipe 300 is branched to prevent the back flow on the pipe is formed gas outlet 710 ( 720 is provided.

In addition, the transport enclosure pollution degree measuring apparatus 1 is connected to the gas suction pipe 300, the first gas supply unit 410 is supplied with an inert gas; A cleaning solution supply unit 420 connected to the gas suction pipe 300 between the first gas supply unit 410 and the analyzer 200 and supplied with a cleaning solution; And is formed to include a plurality of protrusions.

In addition, when the inert gas is injected into the gas suction pipe 300 from the first gas supply unit 410, the transport enclosure pollution degree measuring apparatus 1 is separated from the gas outlet 110. It is characterized by.

In addition, the transport enclosure pollution degree measuring apparatus 1 is provided with a gas-liquid separator 500 between the cleaning liquid supply unit 420 and the analyzer 200, the vent formed in the upper gas separated from the gas-liquid separator 500 Discharged through the 510, the cleaning liquid collected by the gas-liquid separator 500 may be transferred to the analyzer 200 or discharged to the outside.

In addition, the analyzer 200 measures the contaminants collected in the cleaning liquid collected by the gas-liquid separator 500, and measures the components of the material in an aqueous solution state using a method such as chromatography, ICP-MS, ICP, AAS. It is characterized by the analysis.

In addition, the transport enclosure pollution degree measuring apparatus 1 is a mixing unit having a structure for generating turbulent flow of the cleaning liquid and gas transferred in the gas suction pipe 300 located between the cleaning liquid supply unit 420 and the gas-liquid separator 500 It is characterized in that the 310 is further provided.

In addition, the transport enclosure pollution degree measuring apparatus 1 includes a flow meter 520 connected to the vent 510 of the gas-liquid separator 500; And a first vacuum pump 530 connected to the flow meter 520 to suck the gas inside the transport enclosure 100 or the gas separated from the gas-liquid separator 500. And is formed to include a plurality of protrusions.

In addition, the transport enclosure pollution degree measuring apparatus 1 is connected to the gas inlet 120 is supplied with an inert gas, the second gas supply unit 610 including a first valve 611; An air inlet 620 connected to the gas inlet 120 to allow air to flow into the transport enclosure 100 and including a second valve 621; A flow rate measuring unit 630 connected between the second gas supply unit 610 and the air inlet unit 620 and the gas inlet 120 to measure a flow rate of the inert gas or the air flowing into the transport enclosure 100. ; And a gas connected to the gas suction pipe 300 and discharged from the first gas supply part 410, the second gas supply part 610, or the air inlet part 620 to the outside, and the backflow prevention part 720 is provided. A gas outlet 710 connected; And is formed to include a plurality of protrusions.

In addition, the analyzer 200 is characterized by measuring the degree of contamination by inhaling the gas inside the transport enclosure 100, or by an analysis method that is collected by using an aqueous solution after the gas inhalation.

In addition, the analyzer 200 can directly measure the gas phase, such as IMS, CRDS, chemiluminescence, fluorescence spectroscopy, FT-IR, GC, GC-MS, gas sensor, and collected by wet sampling, chromatography, It is characterized by analyzing the components of the material in an aqueous solution using a method such as ICP-MS, ICP, AAS.

In addition, the transport enclosure pollution degree measuring method using the transport enclosure pollution degree measuring apparatus 1 of the present invention includes a) an injection step (S100) of injecting an inert gas or cleaning solution into the gas suction pipe (300); And b) a gas suction pipe cleaning step (S200) in which a gas suction pipe 300 is cleaned between the analyzer 200 from a point where the cleaning liquid is injected through the cleaning liquid. c) a pollution degree measuring step (S300) of measuring the pollution degree by sucking the gas inside the transport enclosure 100 in the analyzer 200; Characterized in that it comprises a.

In addition, the method for measuring the pollution degree of the transport enclosure, when the gas suction pipe 300 is separated from the gas outlet 110 in the injection step (S100), the inert gas and the cleaning liquid is injected into the gas suction pipe 300, the From the point where the inert gas is injected in the gas suction pipe cleaning step (S200), the gas suction pipe 300 connected to the gas outlet 110 is cleaned by the inert gas, and the inert gas and the cleaning liquid are directed to the analyzer 200 side. It is transported and characterized in that the gas suction pipe 300 is cleaned.

In addition, in the gas suction pipe cleaning step (S200), the cleaning liquid, the inert gas, or the gas in the transport enclosure 100 is mixed and introduced into the gas-liquid separator 500 provided between the cleaning liquid supply unit 420 and the analyzer 200. Next, the gas is separated from the gas-liquid separator 500, and the gas is discharged to the vent 510 formed on the upper side, and the liquid is discharged to the analyzer 200 or the outside.

In addition, the method of measuring the pollution degree of the transport enclosure inert gas is injected from the second gas supply unit 610 connected to the gas inlet 120 by opening the first valve 611, closing the second valve 621. And, the inert gas to clean the contaminants in the transport enclosure 100, the transport enclosure cleaning step (S400) is discharged to the outside through the gas suction pipe 300; characterized in that it further comprises.

In addition, in the contamination measurement step (S300), one of the first valve 611 and the second valve 621 is closed, and the other is opened to prevent the vacuum state of the transport enclosure 100. It is done.

In addition, in the pollution measurement step (S300), both the first valve 611 and the second valve 621 are closed to allow decontamination of contaminants in the transport enclosure 100 to be contaminated in the transport enclosure 100. Material is introduced into the analyzer to allow contamination to be measured.

The transport enclosure pollution degree measuring apparatus and the pollution level measuring method using the same of the present invention have an advantage of improving the measurement reliability by removing contaminants generated by adsorption in the gas suction pipe between the transport enclosure and the analyzer.

In other words, the present invention is inert gas or cleaning liquid is injected into the gas suction pipe between the transport enclosure and the analyzer to discharge the pollutants inside the gas suction pipe to the outside or transfer to the analyzer, thereby reducing the contamination measurement error due to contamination of the gas suction pipe It has the advantage of minimizing and improving the reliability of the measured data of the contamination inside the transport enclosure.

In addition, the present invention, when inhaling the gas inside the transport enclosure for the measurement of contamination in the transport enclosure, so that the connection degree between the transport enclosure and the gas suction pipe or leak in the gas suction pipe (leak) or the leakage of the transport enclosure door portion By doing so, it is possible to increase the measurement accuracy of the contamination level inside the transport enclosure, thereby preventing the occurrence of a large amount of defects in the wafer.

1 is a block diagram showing a transport enclosure pollution degree measuring apparatus of the present invention.
2 to 6 is a configuration diagram showing various embodiments of the transport enclosure pollution degree measuring apparatus according to the present invention.

Hereinafter, the transport enclosure pollution degree measuring apparatus and pollution level measuring method using the same according to the present invention as described above will be described in detail with reference to the accompanying drawings.

The transport enclosure contamination level measuring apparatus 1 of the present invention includes a transport enclosure 100, an analyzer 200, and a gas suction pipe 300 as shown in FIG. 1.

The transport enclosure 100 is a portion in which a wafer is accommodated and is transported for the next process, and a space is formed therein so as to accommodate the wafer therein and the gas inlet 120 and the gas perforated to communicate with the outside on one side thereof. A discharge door 110 is included, and a wafer door for transferring the wafer is formed on one of the remaining surfaces.

The analyzer 200 is a means for measuring the pollution degree by sucking the gas inside the transport enclosure 100, the gas suction pipe 300 is connected to the gas outlet 110 and the analyzer 200 to the transport enclosure ( 100 is a connection pipe to allow the gas inside the analyzer 200 to be transferred.

At this time, the connecting portion of the transport enclosure 100 and the gas suction pipe 300 is a Korean Patent No. 1002950 (registered date: December 15, 2010, name: gas monitoring system and method inside the transport enclosure) filed by the applicant It may be connected or disconnected using an interface means such as the adapter disclosed in.

In particular, the transport enclosure pollution degree measuring apparatus 1 of the present invention is injected with an inert gas or cleaning liquid in the gas suction pipe 300, the contaminants inside the gas suction pipe 300 is discharged to the outside or transferred to the analyzer 200 By doing so, the contamination of the gas inside the transport enclosure 100 is prevented from being degraded by the contaminants in the gas suction pipe 300.

The transport enclosure pollution degree measuring apparatus 1 of the present invention may be provided with a pump on a pipe through which contaminants in the suction pipe are discharged to the outside, thereby discharging the pollutants to the outside.

In addition, the analyzer 200 is cleaned with a cleaning liquid, dried with an inert gas, and then by measuring the pollution degree by sucking the gas inside the transport enclosure 100, it is possible to improve the pollution degree measurement reliability of the gas.

In this case, the analyzer 200 may use a gas sensor capable of directly measuring a gas component, a cavity ringdown spectroscopy (CRDS), an ion mobility spectroscopy (IMS), a GC, a chemiluminescence meter, and a GC-MS.

In addition, the analyzer 200 is a wet sampling technique, such as impinge gas, diffusion scrubber, denuder, the gas is collected in an aqueous solution, or the desorbed gas using an aqueous solution, chromatography, ICP- It may be a device for qualitatively or quantitatively analyzing the components of a substance in an aqueous solution using a method such as MS, ICP, AAS.

The transport enclosure contamination level measuring apparatus 1 and the pollution level measuring method using the same of the present invention will be described in detail in the following examples.

Example 1

The transport enclosure contamination level measuring apparatus 1 of the present invention according to the first embodiment has the configuration as shown in FIG.

In more detail, the transport enclosure pollution degree measuring apparatus 1 of the present invention is connected to the gas suction pipe 300, the first gas supply unit 410 is supplied with an inert gas, the first gas supply unit 410 and It is connected to the gas suction pipe 300 between the analyzer 200, it is formed including a cleaning liquid supply unit 420 is supplied with a cleaning liquid.

Among the pollutants, HF, Hcl, and the like are very adsorptive, thereby causing adsorption inside the gas suction pipe 300.

When the inert gas is injected into the gas suction pipe 300, the transport enclosure pollution degree measuring apparatus 1 of the present invention first checks the gas suction pipe 300 so that the inert gas does not flow into the transport enclosure 100. It is separated from the gas outlet 110.

As shown in Figure 1, the inert gas and the cleaning liquid is injected into the gas suction pipe 300, the inert gas is transferred in the a direction, b direction and c direction, the gaseous outlet by the inert gas transferred in the a direction Contaminants adsorbed inside the gas suction pipe 300 positioned between the side end connected with the 110 and the point where the inert gas is injected are removed.

In addition, the inert gas transferred in the b-direction removes contaminants adsorbed between the point where the inert gas is injected and the point where the cleaning liquid is injected, and the gas suction pipe is disposed by the cleaning solution supply pump 421 from the cleaning solution supply unit 420. By allowing the cleaning solution introduced into the 300 to be transported to the analyzer 200, the contaminants in the gas suction pipe 300 positioned between the point where the cleaning solution is injected and the analyzer 200 are removed.

In other words, as the inert gas injected into the gas suction pipe 300 diffuses in at least one direction, such as a direction, b direction, and c direction, it is possible to remove the contaminants adsorbed in the pipe branched in several paths. .

At this time, the inert gas is supplied at a constant pressure and flow rate, so that it can be smoothly diffused in both directions or more.

In this case, the backflow prevention part 720 is provided on the pipe located in the c direction to prevent the air from flowing back from the outside, and the over-supplied inert gas is exhausted.

Inert gas may be used separately from the cleaning liquid to remove the contaminants adsorbed on the gas suction pipe 300.

Through this, the transport enclosure pollution degree measuring apparatus 1 of the present invention can remove the contaminants adsorbed therein through the entire line of the gas suction pipe 300.

At this time, the inert gas may function to clean the gas suction pipe 300 and then dry and remove the cleaning liquid remaining therein.

In the transport enclosure pollution degree measuring apparatus 1 of the present invention, the first gas supply part 410 is connected to the gas suction pipe 300 so that the section of the gas suction pipe 300 that is cleaned by the cleaning liquid may be the maximum. It is preferable that the position is as close as possible to the gas outlet 110.

When the gas inlet 120 sucks gas in the transport enclosure 100 from the analyzer 200, air is introduced to prevent vacuum in the transport enclosure 100, or the transport enclosure 100 is prevented. ) It is a passage through which inert gas is injected to clean the inside.

Accordingly, the transport enclosure pollution degree measuring apparatus 1 of the present invention can improve the measurement reliability by removing contaminants generated by adsorption in the gas suction pipe 300 between the transport enclosure 100 and the analyzer 200. There is this.

Example 2

The transport enclosure pollution degree measuring apparatus 1 according to the second embodiment of the present invention is an inert gas that has passed through the gas suction pipe 300 as shown in FIG. 2, and a gas and a solution inside the transport enclosure 100 are separated by gas-liquid separation. Gas is discharged to the upper side, and the liquid cleaning liquid sinks to the lower side and is discharged to the outside or flows into the analyzer 200 and is sampled.

3 to 5, the transport enclosure contamination level measuring apparatus 1 according to the present invention relates to an embodiment in which contamination analysis is performed using gas in the cleaning liquid and the transport enclosure 100 through gas-liquid separation.

First, the transport enclosure pollution degree measuring apparatus 1 of the present invention shown in FIG. 3 is provided with a gas-liquid separator 500 between the cleaning liquid supply unit 420 and the analyzer 200, and separated from the gas-liquid separator 500. The collected gas is discharged to the outside through the operation of the vacuum pump through the air vent 510 formed above, and the pollutants collected in the gas-liquid separator 500 dissolve in the washing liquid to represent ions, and the collected washing liquid is the analyzer 200. Can be analyzed by conductivity, fluorescence, UV, ion-selective electrode, etc., depending on the nature of the contaminant.

At this time, the collected cleaning liquid may be transferred to the analyzer 200 through a means such as a pump.

In particular, the transport enclosure pollution degree measuring apparatus 1 of the present invention shown in FIG. 3 includes a gas-liquid separator 500 made of a porous membrane, thereby separating the gas mixed with the cleaning liquid and selectively passing only the cleaning liquid to the analyzer. It is transferred to (200), or to be discharged to the outside.

The gas-liquid separator 500, which is a porous membrane, may be a flat module, and may be variously changed into a tubular, spiral wound, or hollow fiber type.

At this time, the transport enclosure pollution degree measuring apparatus 1 of the present invention allows the analyzer 200 to suck the gas inside the transport enclosure 100 to be transported through the gas suction pipe 300 and at the same time, the first gas. Inert gas is injected from the supply unit 410, and a cleaning liquid is injected from the cleaning liquid supply unit 420 to reach the gas-liquid separator 500 while the gas inside the transport enclosure 100 is collected in the cleaning liquid. .

The gas suction pipe 300 is cleaned through the gas inside the transport enclosure 100 until the inert gas is injected from the first gas supply unit 410, and then, the inlet gas and the cleaning liquid are cleaned.

The cleaning liquid passing through the gas suction pipe 300 is separated from the gas-liquid separator 500 in a membrane form and discharged to the outside, or is transferred to the analyzer 200 to measure the pollution degree of the transport enclosure 100.

In another embodiment, the transport enclosure pollution degree measuring apparatus 1 of the present invention shown in Figure 4 is the gas, inert gas and cleaning liquid inside the transport enclosure 100 passing through the gas suction pipe 300 is the gas-liquid separator Inflow to the 500, the cleaning liquid sinks to the lower layer is discharged to the outside for a predetermined time.

Thereafter, when the cleaning of the gas suction pipe 300 is completed, the cleaning liquid submerged in the gas-liquid separator 500 is transferred to the analyzer 200 and used to measure the contamination of the transport enclosure 100.

At this time, the transport enclosure pollution degree measuring apparatus 1 is a gas suction tube located between the cleaning liquid supply unit 420 and the gas-liquid separator 500, in which the cleaning liquid and the air meet to improve the collection efficiency of the linear as well as the coil form In addition, the streamline may be maintained or the inner diameter may be changed to cause a turbulence between the cleaning liquid and the gas to change the collision.

In other words, the mixing unit 310 serves to effectively collect contaminants in the cleaning liquid by mixing the gas, the inert gas and the cleaning liquid inside the transport enclosure 100 while passing through the gas suction pipe 300. do.

As shown in Figure 4, the transport enclosure pollution degree measuring apparatus 1 of the present invention is a flow meter 520 is connected to the vent 510 of the gas-liquid separator 500, the flow meter 520 is connected to the transport enclosure 100 includes a first vacuum pump 530 that sucks the gas inside or the gas separated from the gas-liquid separator 500.

Through this, the transport enclosure pollution degree measuring apparatus 1 of the present invention is the gas inside the transport enclosure 100 is sucked through the first vacuum pump 530, it is controlled at a constant flow rate through the flow meter 520. .

At this time, the cleaning liquid is sucked by the operation of the cleaning solution supply pump 421 or the first vacuum pump 530 from the cleaning solution supply unit 420 flows into the gas suction pipe 300, and then into the gas-liquid separator 500 Can be introduced.

In another embodiment, in the transport enclosure contamination level measuring apparatus 1 of the present invention shown in FIG. 5, the cleaning liquid is first injected from the cleaning liquid supply unit 420 for a predetermined time, and then transferred to the gas-liquid separator 500, and then, When this is completed, the gas inside the transport enclosure 100 is sucked by the first vacuum pump 530 to reach the gas-liquid separator 500, and then the vent hole 510 is separated from the cleaning liquid. Is discharged through.

As described above, the transport enclosure pollution degree measuring apparatus 1 of the present invention shown in FIGS. 2 to 5 is contaminated of the gas suction pipe 300 by the cleaning liquid, the inert gas and the internal gas sucked from the transport enclosure 100. The substance is removed in a state in which it is collected in the cleaning liquid, and the cleaning liquid separated from the gas-liquid separator 500 is discharged to the outside during the cleaning operation, and after the cleaning operation is completed, the cleaning liquid separated from the gas-liquid separator 500 is removed. The analyzer 200 is introduced into the analyzer 200 and used for measuring the pollution level.

On the other hand, the cleaning liquid may be used in a variety of distilled water, acidic aqueous solution, basic aqueous solution, etc., may be appropriately selected according to the characteristics of the contaminants.

Accordingly, the present invention is inert gas or cleaning liquid is injected into the gas suction pipe 300 between the transport enclosure 100 and the analyzer 200 to discharge the pollutants inside the gas suction pipe 300 to the outside or the analyzer 200 By transferring to), it is possible to minimize the contamination measurement error due to contamination of the gas suction pipe 300, and to improve the reliability of the data measured the contamination degree inside the transport enclosure 100.

Example 3

Transport enclosure contamination level measuring apparatus 1 of the present invention according to the third embodiment has the configuration as shown in FIG.

The transport enclosure pollution degree measuring apparatus 1 of the present invention shown in FIG. 6 is connected to the gas inlet 120 to supply an inert gas, and includes a gas supply part including a first valve 611; An air inlet 620 connected to the gas inlet 120 to allow air to flow into the transport enclosure 100 and including a second valve 621; A flow rate measuring unit 630 connected between the gas supply unit and the air inlet unit 620 and the gas inlet 120 to measure a flow rate of the inert gas or the air flowing into the transport enclosure 100; And a gas discharge port 710 connected to the gas suction pipe 300 to discharge the gas introduced from the inert gas injection unit, the gas supply unit, or the air inlet unit 620 to the outside, and to which the backflow prevention unit 720 is connected. ; It is formed to include.

In brief, the transport enclosure contamination level measuring apparatus 1 of the present invention may check the leak level of the door of the gas suction pipe 300 or the door of the transport enclosure 100 when the gas is suctioned from the analyzer 200. It is configured to check the flow rate flowing from the gas inlet 120 through the flow rate measuring unit 630.

At this time, the flow rate measuring unit 630 may be a mass flow meter 520 or a pressure gauge that can check the flow of the flow rate.

In the semiconductor production process, the transport enclosure 100 is very important and the congestion time between processes is limited, so when checking the concentration inside the transport enclosure 100, wrong data due to errors and leaks causes a very serious problem. do.

In particular, the leak between the gas suction pipe 300 and the gas outlet 110 has a great influence on the reliability of the gas concentration inside the transport enclosure 100, and thus, a large amount of defects of the wafer accommodated therein may be generated. It should be checked closely.

In the semiconductor manufacturing process, various transport enclosures 100 are used, and the sealing degree of the door varies according to the manufacturer of the transport enclosure 100, and according to the semiconductor manufacturer, a breath hole (gas outlet outlet 110, gas inlet 120) is used. As the various techniques are applied, the pressure loss of the breath hole also has other characteristics.

The flow rate measuring unit 630 may measure the flow rate value according to the type of FOUP to check the leakage of the gas suction pipe 300 or the door of the transport enclosure 100 to ensure reliable data.

The transport enclosure pollution degree measuring apparatus 1 of the present invention opens the first valve 611 to allow the inert gas to flow from the second gas supply unit 610 and then discharges the gas outlet 710 to the transport. The inside of the enclosure 100 may be cleaned. In this case, the first valve 611 may be used for controlling the flow rate.

In addition, the transport enclosure pollution degree measuring apparatus 1 of the present invention to prevent the vacuum inside the transport enclosure 100 when the gas is sucked from the analyzer 200 to measure the pollution degree inside the transport enclosure 100. In order to close the first valve 611, the second valve 621 is opened.

At this time, the transport enclosure pollution degree measuring apparatus 1 of the present invention, even if the analyzer 200 inhales the gas inside the transport enclosure 100 by the backflow prevention unit 720, the backflow prevention unit 720 By preventing the gas from flowing back from the gas outlet 710, only the gas inside the transport enclosure 100 may be transferred to the analyzer. The backflow prevention unit 720 may be a valve for preventing backflow, such as a check valve.

The backflow prevention unit 720 cleans the inside of the gas suction pipe 300 through the inert gas injected through the first gas supply unit 410, and then measures the inert gas to check the cleaning state. In order to prevent the pressurization in 200) serves to discharge a certain amount to the outside.

In addition, the backflow prevention unit 720 is cleaned of the inside of the transport enclosure 110 by the inert gas supplied from the second gas supply unit 610, and then when measuring the degree of contamination through the discharged gas, part of the gas Is sent to the analyzer 200, and serves to discharge the remaining gas to the outside.

Accordingly, in the present invention, when the gas is sucked in the transport enclosure 100 to measure the pollution degree in the transport enclosure 100, the connection between the transport enclosure 100 and the gas suction pipe 300 or the gas suction pipe 300 By checking the leak level in the leak or the door portion of the transport enclosure 100, the accuracy of measuring the contamination level inside the transport enclosure 100 can be improved, thereby preventing the occurrence of a large amount of defects in the wafer. There is this.

Example 4

Example 4 relates to a transport enclosure 100 pollution degree measuring method using the transport enclosure pollution degree measuring apparatus 1 of Examples 1 to 3.

The transport enclosure 100 pollution degree measuring method of the present invention includes a) an injection step (S100) of injecting an inert gas or a cleaning solution into the gas suction pipe 300; And b) a gas suction pipe cleaning step (S200) in which a gas suction pipe 300 is cleaned between the analyzer 200 from a point where the cleaning liquid is injected through the cleaning liquid. and c) a pollution degree measuring step (S300) of measuring the pollution degree by sucking the gas inside the transport enclosure 100 in the analyzer 200.

At this time, the injection step (S100), as shown in Example 2, the inert gas or cleaning liquid may be injected at intervals as necessary, inert gas and the gas inside the transport enclosure 100 and The cleaning liquid may be simultaneously transferred to the gas suction pipe 300, and may be variously changed.

In the transport enclosure 100 of the present invention, the pollution degree measuring method is as shown in FIG. 1, when the gas suction pipe 300 is separated from the gas outlet 110, and an inert gas and a cleaning liquid are injected into the gas suction pipe 300. From the point where the inert gas is injected, the gas suction pipe 300 of the side (a direction) connected to the gas outlet 110 is cleaned by the inert gas, and the inert gas and the cleaning liquid are directed to the analyzer 200 side (b direction). The gas suction pipe 300 may be cleaned and transferred.

In addition, the method of measuring the pollution degree of the transport enclosure 100 of the present invention, as shown in Figures 2 to 4, the cleaning liquid, inert gas with a gas-liquid separator 500 provided between the cleaning liquid supply unit 420 and the analyzer 200 Alternatively, the gas in the transport enclosure 100 is mixed and introduced, and then separated from the gas-liquid separator 500, and the gas is discharged to the vent 510 formed at an upper side thereof, and the liquid may be discharged to the analyzer 200 or the outside. have.

In addition, the pollution degree measuring method of the transport enclosure 100 of the present invention may be used to clean the inside of the transport enclosure 100, in addition to the pollution degree measurement, by using the transport enclosure pollution degree measuring apparatus 1 of FIG. 6.

At this time, the pollution degree measuring method of the transport enclosure 100 of the present invention is the second gas supply unit 610 connected to the gas inlet 120 by opening the first valve 611, closing the second valve 621. Inert gas is injected from the), the inert gas may further include a cleaning of the transport enclosure cleaning step (S400) to clean the contaminants in the transport enclosure 100, and discharged to the outside through the gas suction pipe (300). .

In other words, the method of measuring the pollution degree of the transport enclosure 100 of the present invention is the inert gas sucked from the second gas supply unit 610 connected to the gas inlet 120 after the pollution degree measurement of the transport enclosure 100 is completed. Can clean the contaminants in the transport enclosure 100, and clean the inside of the transport enclosure 100 through the process of being discharged to the outside through the gas suction pipe (300).

In addition, in the contamination measurement step (S300) by closing both the first valve 611 and the second valve 621 to temporarily weaken the transport enclosure 100, in the transport enclosure 100 By allowing the pollutant to be desorbed, only the pollutant inside the transport enclosure 100 may be introduced into the analyzer to measure the degree of contamination.

At this time, the contaminant in the transport enclosure 100 may be sucked by the first vacuum pump 530 connected to the vent 510 of the gas-liquid separator 500, and the pump is provided in the analyzer 200. May be inhaled.

Accordingly, the transport enclosure pollution degree measuring method and the transport enclosure pollution degree measuring apparatus of the present invention has the advantage that can be implemented according to the application in a vacuum and atmospheric pressure, inert gas cleaning state and the like.

It will be understood by those skilled in the art that various changes in form and details may be made therein without departing from the spirit and scope of the invention as defined by the appended claims. It goes without saying that various modifications can be made.

1: Pollution Degree Measuring Device for Transport Enclosure
100: transport enclosure
110 gas outlet 120 gas inlet
200: Analyzer
300: gas suction pipe 310: mixing portion
410: first gas supply unit 420: cleaning liquid supply unit
421: cleaning liquid supply pump
500: gas-liquid separator
510: vent 520: flow meter
530: the first vacuum pump
610: second gas supply unit 611: first valve
620: air inlet 621: second valve
630: flow measurement unit
710 gas outlet 720 backflow prevention

Claims

A transport enclosure (100) including a gas inlet (120) and a gas outlet (110) perforated to communicate with the outside on one side; And
The analyzer for measuring the contamination level by sucking the gas inside the enclosure, the transport through the gas intake pipe 300 connected to the gas discharge port 110, 200; Including;
At least one of an inert gas and a cleaning liquid is injected into the gas suction pipe 300 so that contaminants in the gas suction pipe 300 are discharged to the outside, or transferred to the analyzer 200,
When only the inert gas is injected into the gas suction pipe 300, the inert gas is diffused at least in both directions,
When the inert gas and the cleaning liquid is injected into the gas suction pipe 300, the inert gas is diffused in one or more directions to remove the contaminants adsorbed in the pipe branched from the gas suction pipe 300 or the gas suction pipe 300. Transport enclosure contamination measurement device, characterized in that.

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The method according to claim 1,
The transport enclosure pollution degree measuring apparatus (1)
Injecting the inert gas, in order to relieve the pressure from the analyzer 200, the gas suction pipe 300 is branched and the back flow prevention portion 720 is provided in the pipe in which the gas outlet 710 is formed Transport enclosure contamination measurement system.

The method according to claim 1,
The transport enclosure pollution degree measuring apparatus (1)
A first gas supply unit 410 connected to the gas suction pipe 300 and supplied with an inert gas;
A cleaning solution supply unit 420 connected to the gas suction pipe 300 between the first gas supply unit 410 and the analyzer 200 and supplied with a cleaning solution; Transport enclosure pollution degree measuring device, characterized in that formed, including.

5. The method of claim 4,
The transport enclosure pollution degree measuring apparatus (1)
When the inert gas is injected into the gas suction pipe 300 from the first gas supply unit 410, the gas suction pipe 300 is separated from the gas outlet 110, characterized in that the transport enclosure pollution degree measuring apparatus.

5. The method of claim 4,
The transport enclosure pollution degree measuring apparatus (1)
A gas-liquid separator 500 is provided between the cleaning liquid supply unit 420 and the analyzer 200.
The gas separated from the gas-liquid separator 500 is discharged through the vent 510 formed on the upper side,
The cleaning liquid collected in the gas-liquid separator 500 is transported to the analyzer 200 or discharged to the outside, characterized in that the transport enclosure contamination measurement device.

The method according to claim 6,
The analyzer 200
Measuring the pollutants collected in the cleaning liquid collected by the gas-liquid separator 500,
Transport enclosure contamination measurement device characterized in that the analysis of the components of the material in the aqueous solution using a method such as chromatography, ICP-MS, ICP, AAS.

The method according to claim 6,
The transport enclosure pollution degree measuring apparatus (1)
Transporting characterized in that the mixing unit 310 is further provided with a structure for causing turbulent flow of the cleaning liquid and gas transported in the gas suction pipe 300 located between the cleaning liquid supply unit 420 and the gas-liquid separator 500 Enclosure contamination measuring device.

The method according to claim 6,
The transport enclosure pollution degree measuring apparatus (1)
A flow meter 520 connected to the vent hole 510 of the gas-liquid separator 500; And
A first vacuum pump 530 connected to the flow meter 520 to suck gas inside the transport enclosure 100 or gas separated from the gas-liquid separator 500; Transport enclosure pollution degree measuring device, characterized in that formed, including.

The method of claim 9,
The transport enclosure pollution degree measuring apparatus (1)
A second gas supply unit 610 connected to the gas inlet 120 to supply an inert gas and including a first valve 611;
An air inlet 620 connected to the gas inlet 120 to allow air to flow into the transport enclosure 100 and including a second valve 621;
A flow rate measuring unit 630 connected between the second gas supply unit 610 and the air inlet unit 620 and the gas inlet 120 to measure a flow rate of the inert gas or the air flowing into the transport enclosure 100. ; And
The gas introduced from the first gas supply unit 410, the second gas supply unit 610, or the air inlet unit 620 is discharged to the outside, and the backflow prevention unit 720 is connected to the gas suction pipe 300. A gas outlet 710; Transport enclosure pollution degree measuring device, characterized in that formed, including.

The method of claim 1, wherein
The analyzer 200
The transport enclosure pollution degree measuring device, characterized in that by measuring the pollution degree by inhaling the gas inside the transport enclosure 100, or collected by using an aqueous solution after the gas intake.

12. The method of claim 11,
The analyzer 200
Gas phases such as IMS, CRDS, chemiluminescence, fluorescence spectroscopy, GC, GC-MS, TOF-MS, PTR-MS, FT-IR, and gas sensors can be measured directly. Transport enclosure contamination measurement device characterized in that the analysis of the components of the material in the aqueous solution using a method such as ICP-MS, ICP, AAS.

Transport enclosure contamination measurement method using the transport enclosure pollution degree measuring apparatus 1 according to any one of claims 1, 3 to 12
a) an injection step of injecting an inert gas or a cleaning liquid into the gas suction pipe (300) (S100); And
b) a gas suction pipe cleaning step (S200) in which a gas suction pipe 300 between the analyzer 200 is cleaned from a point where the cleaning liquid is injected through the cleaning liquid;
c) a pollution degree measuring step (S300) of measuring the pollution degree by sucking the gas inside the transport enclosure 100 in the analyzer 200;
Transport enclosure contamination measurement method comprising a.

The method of claim 13,
The transport enclosure pollution measurement method
If the gas suction pipe 300 is separated from the gas outlet 110 in the injection step (S100), and the inert gas and the cleaning liquid are injected into the gas suction pipe 300,
From the point where the inert gas is injected in the gas suction pipe cleaning step (S200), the gas suction pipe 300 connected to the gas outlet 110 is cleaned by the inert gas, and the inert gas and the cleaning liquid are analyzed by the analyzer 200. Transport enclosure pollution degree measuring method characterized in that the gas suction pipe 300 is transported to the side.

The method of claim 13,
In the gas suction pipe cleaning step (S200)
The cleaning liquid, the inert gas, or the gas in the transport enclosure 100 is mixed and introduced into the gas-liquid separator 500 provided between the cleaning liquid supply unit 420 and the analyzer 200 for supplying the cleaning liquid to the gas suction pipe 300. ,
The gas is separated from the gas-liquid separator 500, the gas is discharged to the vent hole 510 formed on the upper side, the liquid is discharged to the analyzer 200 or the outside, characterized in that the transport enclosure pollution method.

The method of claim 13,
The transport enclosure pollution measurement method
Open the first valve 611 to control the opening and closing of the second gas supply unit 610 for supplying the inert gas through the gas inlet 120, and through the gas inlet 120 to the transport enclosure 100 Inert gas is injected from the second gas supply unit 610 connected to the gas inlet 120 by closing the second valve 621 that controls the opening and closing of the air inlet 620 so that the atmosphere is introduced therein .
Transport enclosure cleaning method (S400) to clean the contaminants in the inert gas in the transport enclosure 100, and discharged to the outside through the gas suction pipe (300); .

The method of claim 13,
In the pollution measurement step (S300)
Air flows into the transport enclosure 100 through the first valve 611 and the gas inlet 120 that control opening and closing of the second gas supply unit 610 that supplies the inert gas through the gas inlet 120. Transport enclosure contamination measurement, characterized in that to close any one of the second valve 621 to control the opening and closing of the air inlet 620, and to open the other to prevent the vacuum of the transport enclosure 100 Way.

The method of claim 13,
In the pollution measurement step (S300)
Air flows into the transport enclosure 100 through the first valve 611 and the gas inlet 120 that control opening and closing of the second gas supply unit 610 that supplies the inert gas through the gas inlet 120. Close all the second valve 621 to control the opening and closing of the air inlet 620 so as to
Transport contaminant measurement method to allow the contaminants in the transport enclosure (100) to be desorbed so that the contaminants inside the transport enclosure (100) flows into the analyzer to measure the degree of contamination.