KR101238417B1 - Method of coating a surface using nanoporous materials for controlling heat transfer, coating layer using the same, substrate having the coating layer, and heat control element having the coating layer - Google Patents
Method of coating a surface using nanoporous materials for controlling heat transfer, coating layer using the same, substrate having the coating layer, and heat control element having the coating layer Download PDFInfo
- Publication number
- KR101238417B1 KR101238417B1 KR1020090087966A KR20090087966A KR101238417B1 KR 101238417 B1 KR101238417 B1 KR 101238417B1 KR 1020090087966 A KR1020090087966 A KR 1020090087966A KR 20090087966 A KR20090087966 A KR 20090087966A KR 101238417 B1 KR101238417 B1 KR 101238417B1
- Authority
- KR
- South Korea
- Prior art keywords
- group
- nanoporous
- heat transfer
- substrate
- coating
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims abstract description 40
- 238000012546 transfer Methods 0.000 title claims abstract description 35
- 238000000576 coating method Methods 0.000 title claims abstract description 32
- 239000000758 substrate Substances 0.000 title claims abstract description 29
- 239000011247 coating layer Substances 0.000 title claims abstract description 18
- 239000011248 coating agent Substances 0.000 title claims abstract description 13
- 239000007783 nanoporous material Substances 0.000 title claims description 3
- 125000000524 functional group Chemical group 0.000 claims abstract description 16
- 239000011148 porous material Substances 0.000 claims abstract description 12
- 229910052710 silicon Inorganic materials 0.000 claims description 29
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 28
- 239000010703 silicon Substances 0.000 claims description 27
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- 239000002184 metal Substances 0.000 claims description 16
- 125000003277 amino group Chemical group 0.000 claims description 13
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- 150000001875 compounds Chemical class 0.000 claims description 7
- 238000010992 reflux Methods 0.000 claims description 7
- 239000002904 solvent Substances 0.000 claims description 7
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 6
- 229910052802 copper Inorganic materials 0.000 claims description 6
- 229910052736 halogen Inorganic materials 0.000 claims description 6
- 150000002367 halogens Chemical class 0.000 claims description 5
- 125000001841 imino group Chemical group [H]N=* 0.000 claims description 5
- 239000000126 substance Substances 0.000 claims description 5
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 4
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 4
- 229910052742 iron Inorganic materials 0.000 claims description 4
- 229910052746 lanthanum Inorganic materials 0.000 claims description 4
- 125000000542 sulfonic acid group Chemical group 0.000 claims description 4
- 125000003396 thiol group Chemical group [H]S* 0.000 claims description 4
- 229910052720 vanadium Inorganic materials 0.000 claims description 4
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 4
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- 239000011701 zinc Substances 0.000 claims description 4
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- 229910052804 chromium Inorganic materials 0.000 claims description 3
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 claims description 3
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- 239000013110 organic ligand Substances 0.000 claims description 3
- 239000002243 precursor Substances 0.000 claims description 3
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- 229910052684 Cerium Inorganic materials 0.000 claims description 2
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 claims description 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 2
- 125000003342 alkenyl group Chemical group 0.000 claims description 2
- 125000003545 alkoxy group Chemical group 0.000 claims description 2
- 125000000217 alkyl group Chemical group 0.000 claims description 2
- 125000002947 alkylene group Chemical group 0.000 claims description 2
- 125000000304 alkynyl group Chemical group 0.000 claims description 2
- 229910052791 calcium Inorganic materials 0.000 claims description 2
- 239000011575 calcium Substances 0.000 claims description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 2
- ZMIGMASIKSOYAM-UHFFFAOYSA-N cerium Chemical compound [Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce] ZMIGMASIKSOYAM-UHFFFAOYSA-N 0.000 claims description 2
- 229910017052 cobalt Inorganic materials 0.000 claims description 2
- 239000010941 cobalt Substances 0.000 claims description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 2
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 2
- 238000003618 dip coating Methods 0.000 claims description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 2
- 238000001764 infiltration Methods 0.000 claims description 2
- 230000008595 infiltration Effects 0.000 claims description 2
- 229910052744 lithium Inorganic materials 0.000 claims description 2
- 229910052749 magnesium Inorganic materials 0.000 claims description 2
- 239000011777 magnesium Substances 0.000 claims description 2
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 claims description 2
- 229910052750 molybdenum Inorganic materials 0.000 claims description 2
- 239000011733 molybdenum Substances 0.000 claims description 2
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- 125000001424 substituent group Chemical group 0.000 claims description 2
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- 239000010936 titanium Substances 0.000 claims description 2
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- 125000005843 halogen group Chemical group 0.000 claims 1
- 229920000642 polymer Polymers 0.000 claims 1
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 claims 1
- 238000009835 boiling Methods 0.000 abstract description 32
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- 239000007788 liquid Substances 0.000 abstract description 10
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- 230000007774 longterm Effects 0.000 abstract description 2
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- 238000007306 functionalization reaction Methods 0.000 abstract 1
- 239000013335 mesoporous material Substances 0.000 abstract 1
- 239000002086 nanomaterial Substances 0.000 abstract 1
- 238000004381 surface treatment Methods 0.000 abstract 1
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- 238000001816 cooling Methods 0.000 description 11
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- 239000013177 MIL-101 Substances 0.000 description 7
- 239000004809 Teflon Substances 0.000 description 7
- 229920006362 Teflon® Polymers 0.000 description 7
- 238000002441 X-ray diffraction Methods 0.000 description 7
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 6
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- 239000002245 particle Substances 0.000 description 6
- 238000002360 preparation method Methods 0.000 description 6
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- KYQCOXFCLRTKLS-UHFFFAOYSA-N Pyrazine Chemical compound C1=CN=CC=N1 KYQCOXFCLRTKLS-UHFFFAOYSA-N 0.000 description 4
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- XTUBPKVLOAIMQY-UHFFFAOYSA-H chromium(3+);terephthalate Chemical compound [Cr+3].[Cr+3].[O-]C(=O)C1=CC=C(C([O-])=O)C=C1.[O-]C(=O)C1=CC=C(C([O-])=O)C=C1.[O-]C(=O)C1=CC=C(C([O-])=O)C=C1 XTUBPKVLOAIMQY-UHFFFAOYSA-H 0.000 description 4
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Abstract
본 발명은 열 전달 제어를 위한 표면 처리 방법에 관한 것으로서, 더욱 상세하게는 열 전달 제어를 위해 나노세공체를 기재의 표면에 코팅하는 방법에 관한 것이다. The present invention relates to a surface treatment method for heat transfer control, and more particularly, to a method for coating a nanoporous body on the surface of a substrate for heat transfer control.
본 발명에 의하면, 나노세공체를 제조하는 단계; 상기 나노세공체의 표면에 유기 관능기를 기능화하는 단계; 상기 나노세공체를 코팅할 기재의 표면에 유기 관능기를 기능화하는 단계; 상기 나노세공체를 상기 기재의 표면에 공유 결합시키는 단계; 를 포함하는 열 전달 제어를 위한 나노세공체 코팅 방법이 제공된다.According to the present invention, preparing a nanoporous body; Functionalizing an organic functional group on a surface of the nanoporous body; Functionalizing an organic functional group on the surface of the substrate to be coated with the nanoporous body; Covalently bonding the nanoporous body to the surface of the substrate; Provided is a nanoporous coating method for heat transfer control comprising a.
본 발명에 의한 열 전달 제어를 위한 나노세공체 코팅 방법은 다음과 같은 효과가 있다. 첫째, 본 발명에 의한 코팅층은 핵생성 자리(active nucleation site)가 많고, 기체를 세공에 가둘 수 있으며, 액체와 기체의 접촉면적이 크고, 모세관압이 높으며, 습윤(wetting)이 잘되며, 기포가 서로 잘 합쳐져서 기포 탈락 횟수(bubble detachment frequency)가 높다. 따라서, 비등이 시작되는 온도를 낮으며, 임계열유속과 열전달 계수가 높다. 둘째, 본 발명에 의한 코팅층은 수 마이크로 이하의 박막으로 제조될 수 있어 컴퓨터 CPU, LED 및 핸드폰 등 좁은 면적에 큰 열량을 발생하는 기재를 냉각하는데 사용될 수 있다. 또한 코팅층으로 인해 열저항이 커지는 문제를 해결할 수 있다. 셋째, 나노세공체는 표면적이 넓기 때문에 본 발명에 의한 코팅층은 흡습력과 발수력이 탁월하다. 넷째, 본 발명에 의한 코팅층은 오랜 시간 동안 진동을 주어도 떨어지지 않을 정도로 표면에 강하게 결합되어 있어 장기 사용 안정성이 높다. Nanoporous coating method for heat transfer control according to the present invention has the following effects. First, the coating layer according to the present invention has a lot of nucleation sites (active nucleation site), can trap the gas in the pores, the contact area of the liquid and gas is large, the capillary pressure is high, wetting (wetting) well, bubbles Are combined well with each other and the bubble detachment frequency is high. Thus, the temperature at which boiling begins is lowered and the critical heat flux and heat transfer coefficient are high. Second, the coating layer according to the present invention can be made of a thin film of a few micro or less can be used to cool the substrate generating a large amount of heat in a small area, such as computer CPU, LED and mobile phone. In addition, the coating layer can solve the problem of increasing the thermal resistance. Third, because the nanoporous body has a large surface area, the coating layer of the present invention is excellent in hygroscopicity and water repellency. Fourth, the coating layer according to the present invention is strongly bonded to the surface so as not to fall even after a vibration for a long time has a high long-term stability.
나노구조체, 제올라이트, 메조세공체, 다공성 유-무기 혼성체, 기능화 Nanostructures, Zeolites, Mesoporous Materials, Porous Organic-Inorganic Hybrids, Functionalization
Description
본 발명은 열 전달 제어를 방법에 관한 것으로서, 더욱 상세하게는 열 전달 제어를 위해 나노세공체를 기재의 표면에 코팅하는 방법에 관한 것이다.The present invention relates to a method of heat transfer control, and more particularly, to a method of coating a nanoporous body on the surface of a substrate for heat transfer control.
최근 반도체의 집적도가 증가하고, 속도가 빨라지고, 복잡한 기능이 추가되면서 반도체 칩(Chip)에서 발생하는 단위면적당 열량(Heat flux)가 계속적으로 증가하고 있다. 이에 따라 칩의 온도가 높아지면 제품의 기능은 물론 수명이 저하되기 때문에 이를 해결하기 위한 다양한 냉각방법이 개발되고 있다.Recently, as the degree of integration of semiconductors increases, speed increases, and complex functions are added, heat flux per unit area generated in semiconductor chips continues to increase. Accordingly, as the temperature of the chip increases, the function and the life of the product decrease, and various cooling methods have been developed to solve this problem.
공기냉각(Air Cooling)방법에 한계가 있는 경우 액체냉각(Liquid Cooling)방법이 사용되는데, 액체 냉각 방법 중에서도 액체의 비등(boiling), 증발(evaporation), 응축(condensation) 등을 이용하는 상변화 냉각(Phase change cooling)방법이 많이 연구되고 있다. 상변화 냉각의 한 예로 써모사이 폰(thermosyphon)이 있는데 이 시스템의 성능은 비등과 응축 성능에 제한을 받는다. When there is a limit in air cooling method, liquid cooling method is used. Among liquid cooling methods, phase change cooling using boiling, evaporation, condensation, etc. of liquid is used. Phase change cooling method has been studied a lot. An example of phase-change cooling is the thermosyphon, whose performance is limited by boiling and condensing performance.
비등(boiling)성능을 향상시키기 위해 발열체의 표면을 개선하여 (1)bubbling point를 증가시키고, (2)boiling surface area를 늘리고, (3)액체가 표면에 잘 재습윤(rewetting)되게 하면, (1)initiating nucleate boiling온도가 내려가고, (2)액체와 표면의 온도차이가 줄어서 열전달 계수(heat transfer coefficient, h)가 높아지고, (3)임계열유속(Critical Heat Flux, CHF)이 늘어서 높은 열유속에도 사용이 가능할 수 있다.By improving the surface of the heating element to improve boiling performance, (1) increasing the bubbling point, (2) increasing the boiling surface area, and (3) allowing the liquid to rewet to the surface, 1) the initiating nucleate boiling temperature decreases, (2) the temperature difference between the liquid and the surface decreases, and the heat transfer coefficient (h) increases, and (3) the critical heat flux (CHF) increases, It may be possible to use.
미세한 구조물(Micro structure)을 표면에 만들어 비등성능 개선에 실용적으로 사용한 예는 Nakayama(W.Nakayama, Enhancement of heat trasfer, in: Proceedings of the 7th Int. Heat Transfer Conference, vol1, 1982, pp.223-240), Tome(J.R. Thome, Enhanced Boiling Heat Transfer, Hemisphere, NY, 1990), Kakac(S. Kakac, B. Kikis, F.A. Kulacki, F. Arinic, Convective Heat and Mass Transfer, Kluwer Academic Publishers 1991, pp. 1007-1030), Webb(R.L. Webb, Principles of Enhanced Heat Transfer, John Wiley & Sons, Inc., NY, 1994)에 기술되어 있다. 그러나 이러한 방법들(plasma spraying, electrochemical plating, mechanical forming)은 생산원가가 비싸고 사용할 수 있는 표면 구조가 제한적인 단점이 있다. For example, Nakayama (W.Nakayama, Enhancement of heat trasfer, in: Proceedings of the 7th Int. Heat Transfer Conference,
최근에는 MEMS(Micro Electro Mechanical System)기술 등을 활용하여 다양한 구조를 만들고 있는데, 크게 돌출형 구조, 동공(Cavity)형 구조, 다공성 구조로 나눌 수 있다.Recently, various structures are made by using MEMS (Micro Electro Mechanical System) technology, which can be classified into protruding structure, cavity structure, and porous structure.
먼저 표면에 돌출된 구조로, Honda(Honda, H., Takamatsu, H., Wei, J. J., 2002, Enhanced Boiling of FC-72 on Silicon Chips With Micro-Pin-Fins and Submicron-Scale Roughness, Journal of Heat Transfer, 124, pp. 383-390.)는 실리콘(silicon)을 건식 에칭(dry etching)하여 핀휜(pin fin)(50x50x60um, width;thickness;height)을 100um 간격으로 만들고, SiO2 스퍼터링(sputtering)과 습식 에칭(wet etching)을 하여 표면에 약 30nm의 표면 거칠기(roughness)를 만들어 비등실험을 한 결과 임계열유속이 일반 실리콘 대비 약 2배 정도 향상되었다. 이 실험을 통해 마이크로 단위(micro scale)의 핀 구조뿐 아니라 나노 단위(nano scale)의 표면 형상도 비등특성에 큰 영향을 줌을 확인할 수 있었다.First of all, Honda (Honda, H., Takamatsu, H., Wei, JJ, 2002, Enhanced Boiling of FC-72 on Silicon Chips With Micro-Pin-Fins and Submicron-Scale Roughness, Journal of Heat) Transfer, 124, pp. 383-390.) Dry etch silicon to make pin fins (50x50x60um, width; thickness; height) at 100um intervals, and SiO 2 sputtering As a result of boiling experiments with wet etching, the surface roughness of about 30nm was created on the surface, and the critical heat flux improved about twice as much as that of general silicon. Through this experiment, it was confirmed that not only the micro-scale fin structure but also the nano-scale surface shape greatly influence the boiling characteristics.
Mitrovic(Mitrovic, J., Hartmann, F., 2004, A New Microstructure for Pool Boiling, Superlattices and Microstructures, 35, pp. 617-628)은 전기 코팅(electro coating)과 에칭 공정을 통해 지름 1um~25um, 높이 10um~20um 크기의 원통형 구리 핀을 만들어 비등실험을 한 결과, 핀이 없는 경우보다 열전달계수가 약 2배 향상되었다.Mitrovic (Mitrovic, J., Hartmann, F., 2004, A New Microstructure for Pool Boiling, Superlattices and Microstructures, 35, pp. 617-628) has a diameter of 1 µm to 25 µm through electrocoating and etching processes. Boiling experiments were made of cylindrical copper fins with a height of 10 µm to 20 µm in height, and the heat transfer coefficient improved approximately twice as much as without the fins.
Mudawar(Sebastine Ujereh, Timothy Fisher, Issam Mudawar, 2007, Effects of carbon nanotube arrays on nucleate pool boiling, International Journal of Heat and Mass Transfer, 50, pp. 40234038)는 지름 50nm, 길이 20~30um의 카본 나노 튜브(carbon nano tube)를 실리콘 표면에 성장시켜 임계열유속이 약 45%향상됨을 확인할 수 있었다.Mudawar (Sebastine Ujereh, Timothy Fisher, Issam Mudawar, 2007, Effects of carbon nanotube arrays on nucleate pool boiling, International Journal of Heat and Mass Transfer, 50, pp. 40234038) has
위와 같이 돌출된 형태가 아니고, 표면에 동공(Cavity)를 만든 경우로서 Yu(Chih Kuang Yu, Ding Chong Lu, and Tsung Chieh Cheng, 2006, Pool boiling heat transfer on artificial-cavity surfaces in dielectric fluid FC-72, J. Micromech. Microeng. 16, pp.2092-2099)는 실리콘 칩에 지름 50um~200um, 깊이 110um/299um로 원통형 동공(Cavity)을 뚫고 간격을 달리해가며 임계열유속을 비교한 결과 임계열유속이 최고 2.5배 향상됨을 알아낼 수 있었다.Yu (Chih Kuang Yu, Ding Chong Lu, and Tsung Chieh Cheng, 2006, Pool boiling heat transfer on artificial-cavity surfaces in dielectric fluid FC-72 , J. Micromech.Microeng. 16, pp.2092-2099) is a critical heat flux obtained by comparing the critical heat fluxes through different intervals through cylindrical cavity with diameter of 50um ~ 200um and depth of 110um / 299um. Up to 2.5 times improvement was found.
Vemuri and Kim(S.Vemuri, K.Kim, 2005, Pool boiling of saturated FC-72 on nano-porous surface, International Communications in Heat and Mass Transfer, 32, pp. 27-31)은 AAO(Aluminum Anodized Oxide)로 지름 50~250nm, 깊이 70um의 동공(cavity)을 만들어서 비등이 시작되는 온도를 30%정도 낮출 수 있었다.Vemuri and Kim (S.Vemuri, K.Kim, 2005, Pool boiling of saturated FC-72 on nano-porous surface, International Communications in Heat and Mass Transfer, 32, pp. 27-31) are known as Aluminum Anodized Oxide (AOA). By creating a cavity with a diameter of 50-250nm and a depth of 70um, the temperature at which boiling starts can be reduced by 30%.
비등을 촉진시키기 위한 방법으로 다공성 층 코팅(porous layer coating)이 사용되기도 한다. You(You S.M., Simon T.W., and Bar-Cohen A., 1991, A technique for enhancing boiling heat transfer with application to cooling of electronic equipment, IEEE Transactions of the CPMT, 15(5), pp.90-96)는 'particle layering'을 통해 0.3~3um의 알루미나(Al2O3) 입자를 스프레이로 뿌리고 반데르발스 힘(van der waals molecular attraction force)으로 결합되게 하여 비등이 시작되는 온도를 50% 낮추고, 임계열유속을 32%증가시켰다.Porous layer coating is also used as a way to promote boiling. You (You SM, Simon TW, and Bar-Cohen A., 1991, A technique for enhancing boiling heat transfer with application to cooling of electronic equipment, IEEE Transactions of the CPMT, 15 (5), pp.90-96) Through particle layering, 0.3 ~ 3um of alumina (Al 2 O 3 ) particles are sprayed and combined with van der waals molecular attraction force to reduce the temperature at which boiling starts by 50%, and the critical heat flux Increased by 32%.
O'Connor and You(O'Connor J.P. and You S.M., 1995, A painting technique to enhance pool boiling heat transfer in saturated FC-72, ASME Journal of Heat Transfer, 117(2), pp.387-393)는 위 방법을 기초로 하여 3~10um의 은 플레이크(silver flake)를 섞은 비등 촉진 페인트를 만들어서 비등(boiling)이 시작되는 온도를 80% 감소시키고, 임계열유속을 109% 증가시켰다. O'Connor and You (O'Connor JP and You SM, 1995, A painting technique to enhance pool boiling heat transfer in saturated FC-72, ASME Journal of Heat Transfer, 117 (2), pp.387-393). Based on the method, boiling facilitating paints containing 3-10 μm of silver flakes were made, reducing the temperature at which boiling started by 80% and increasing the critical heat flux by 109%.
O'Cornnor et al.(O'Connor J.P., You S.M., and Price D.C., 1995, Thermal management of high power microelectronics via immersion cooling, IEEE Transactions of the CPMT, 18(3), pp.656-663)은 8~12um의 다이아몬드 입자로 만든 유전체 페인트(dielectric paint)를 이용하여 비슷한 결과를 얻었다. O'Cornnor et al. (O'Connor JP, You SM, and Price DC, 1995, Thermal management of high power microelectronics via immersion cooling, IEEE Transactions of the CPMT, 18 (3), pp.656-663). Similar results were obtained with a dielectric paint made of diamond particles of ~ 12um.
Chang and You(Chang J.Y. and You S.M., 1996, Heater orientation effects on pool boiling of micro-porous-enhanced surfaces in saturated FC-72, ASME Journal of Heat Transfer, 118(4), pp.937-943)는 1~50um의 구리 입자와 1~20um의 알루미늄 입자를 사용하여 비등이 시작되는 온도를 80~90% 낮출 수 있었다.Chang and You (Chang JY and You SM, 1996, Heater orientation effects on pool boiling of micro-porous-enhanced surfaces in saturated FC-72, ASME Journal of Heat Transfer, 118 (4), pp.937-943) By using ~ 50um copper particles and 1 ~ 20um aluminum particles, the temperature at which boiling starts can be reduced by 80 ~ 90%.
다공성 흑연(Porous graphite)이 사용되기도 하였는데, Mohamed(Mohamed S. El-Genk, Jack L. Parker, 2004, Enhanced boiling of HFE-7100 dielectric liquid on porous graphite, Energy Conversion and Management, 46, pp. 2455-2481)는 수십~수백um의 동공(cavity)을 갖는 다공성 흑연(Porous graphite)을 활용하여 일반 구리 대비 임계열유속이 60%정도 향상된 결과를 얻었다.Porous graphite was also used, Mohamed (Mohamed S. El-Genk, Jack L. Parker, 2004, Enhanced boiling of HFE-7100 dielectric liquid on porous graphite, Energy Conversion and Management, 46, pp. 2455- 2481) achieved a 60% improvement in critical heat flux over ordinary copper by using porous graphite with pores of tens to hundreds of um.
다공성 구조에 대한 이론적, 실험적 접근방법으로서 Kaviany(Scott G. Liter and Massoud Kaviany, 2001, Pool-boiling CHF enhancement by modulated porous-layer coating: theory and experiment, International Journal of Heat and Mass Transfer, 44, pp. 4287-4311)가 200um크기의 구리 입자를 사용하여 균일한 두께를 갖는 다공성 구조와 주기적으로 변하는 두께를 갖는 다공성 구조를 만들었다. 그 결과, 균일한 두께를 갖는 다공성 구조의 임계열유속은 2배가 향상되나 주기적으로 변화하는 두께를 갖는 조절된 다공성 층 코팅(porous layer coating)은 임계열유속이 3배 이상 향상됨을 이론적, 실험적으로 증명할 수 있었다. 이렇게 조절된 다공성 구조는 액체와 기체의 이동경로를 효과적으로 조절하여 액체와 기체 사이의 마찰을 최소화하기 때문에 임계열유속이 더 향상되었는데, 만약 입자 크기를 작게 하고 액체와 기체의 이동경로를 확실히 분리시키면 임계열유속을 더 향상시킬 수 있다고 말하고 있다.As a theoretical and experimental approach to porous structure, Kaviany (Scott G. Liter and Massoud Kaviany, 2001, Pool-boiling CHF enhancement by modulated porous-layer coating: theory and experiment, International Journal of Heat and Mass Transfer, 44, pp. 4287-4311) was used to make a porous structure having a uniform thickness and a porous structure with a periodically varying thickness using 200um size copper particles. As a result, it is theoretically and experimentally able to prove that the critical heat flux of the porous structure with uniform thickness is improved by 2 times, but the controlled porous layer coating with the periodically changing thickness is improved by 3 times or more. there was. This controlled porous structure improves critical heat flux because it effectively regulates the flow path between liquid and gas to minimize the friction between liquid and gas. It is said to improve heat flux further.
그러나, 위에서 언급한 모든 방법들은 두께가 수십 마이크로이상으로서, 마이크로 채널 내부에서 사용하기에 너무 두껍고, 이로 인한 열저항, 유동저항이 있으며, 고온을 요구하는 공정을 필요로 하는 등 CPU냉각과 같은 전자 장치 냉각에 사용하기에 어려움이 있다. However, all of the above-mentioned methods are tens of microns or more thick, too thick for use inside microchannels, resulting in thermal and flow resistance, and require processes that require high temperatures. Difficult to use for cooling the device.
본 발명은 이러한 문제점을 해결하기 위하여 안출된 것으로서, 나노세공체를 유기 관능기를 이용하여 열교환이 필요한 기재의 표면에 코팅하여 비등(boiling), 증발(evaporation), 응축(condensation) 등의 상변화 열전달 특성을 제어할 수 있는 나노세공체 코팅 방법 및 이를 이용한 열제어 소재 시스템을 제공하는 것을 목적으로 한다. The present invention has been made in order to solve this problem, by coating the nanoporous body on the surface of the substrate that needs heat exchange using an organic functional group, phase change heat transfer such as boiling, evaporation, condensation, etc. An object of the present invention is to provide a nanoporous coating method and a thermal control material system using the same.
본 발명에 의하면, 나노세공체를 제조하는 단계; 상기 나노세공체의 표면에 유기 관능기를 기능화하는 단계; 상기 나노세공체를 코팅할 기재의 표면에 유기 관능기를 기능화하는 단계; 상기 나노세공체를 상기 기재의 표면에 공유 결합시키는 단계; 를 포함하는 열 전달 제어를 위한 나노세공체 코팅 방법이 제공된다.According to the present invention, preparing a nanoporous body; Functionalizing an organic functional group on a surface of the nanoporous body; Functionalizing an organic functional group on the surface of the substrate to be coated with the nanoporous body; Covalently bonding the nanoporous body to the surface of the substrate; Provided is a nanoporous coating method for heat transfer control comprising a.
또한, 상기 코팅 방법에 의해 형성된 코팅층이 제공된다.In addition, a coating layer formed by the coating method is provided.
또한, 상기 코팅 방법에 의해 형성된 코팅층을 포함하는 기재, 열제어 소자, 시스템이 제공된다.Also provided is a substrate, a thermal control element, and a system comprising a coating layer formed by the coating method.
본 발명에 의한 열 전달 제어를 위한 나노세공체 코팅 방법은 다음과 같은 효과가 있다. Nanoporous coating method for heat transfer control according to the present invention has the following effects.
첫째, 본 발명에 의한 코팅층은 핵생성 자리(active nucleation site)가 많고, 기체를 세공에 가둘 수 있으며, 액체와 기체의 접촉면적이 크고, 모세관압이 높으며, 습윤(wetting)이 잘되며, 기포가 서로 잘 합쳐져서 기포 탈락 횟수(bubble detachment frequency)가 높다. 따라서, 비등이 시작되는 온도를 낮으며, 임계열유속과 열전달 계수가 높다. First, the coating layer according to the present invention has a lot of nucleation sites (active nucleation site), can trap the gas in the pores, the contact area of the liquid and gas is large, the capillary pressure is high, wetting (wetting) well, bubbles Are combined well with each other and the bubble detachment frequency is high. Thus, the temperature at which boiling begins is lowered and the critical heat flux and heat transfer coefficient are high.
둘째, 본 발명에 의한 코팅층은 수 마이크로 이하의 박막으로 제조될 수 있어 컴퓨터 CPU, LED 및 핸드폰 등 좁은 면적에 큰 열량을 발생하는 기재를 냉각하는 히트파이프 등의 시스템에 사용될 수 있다. 또한 코팅층으로 인해 열저항이 커지는 문제를 해결할 수 있다.Second, the coating layer according to the present invention can be made of a thin film of a few microns or less can be used in a system such as a heat pipe for cooling a substrate generating a large amount of heat in a small area, such as computer CPU, LED and mobile phone. In addition, the coating layer can solve the problem of increasing the thermal resistance.
셋째, 나노세공체는 표면적이 넓기 때문에 본 발명에 의한 코팅층은 흡습력과 발수력이 탁월하다. Third, because the nanoporous body has a large surface area, the coating layer of the present invention is excellent in hygroscopicity and water repellency.
넷째, 본 발명에 의한 코팅층은 오랜 시간 동안 진동을 주어도 떨어지지 않을 정도로 표면에 강하게 결합되어 있어 장기 사용 안정성이 높다. Fourth, the coating layer according to the present invention is strongly bonded to the surface so as not to fall even after a vibration for a long time has a high long-term stability.
이하, 본 발명에 대해서 상세히 설명한다.EMBODIMENT OF THE INVENTION Hereinafter, this invention is demonstrated in detail.
본 발명은 나노세공체를 제조하는 단계, 나노세공체의 표면에 유기 관능기를 기능화하는 단계, 상기 나노세공체를 코팅할 기재의 표면에 유기 관능기를 기능화하는 단계, 상기 나노세공체를 상기 기재의 표면에 공유 결합시키는 단계를 포함하는 열 전달 제어를 위한 나노세공체 코팅 방법이다(도 1 참조).The present invention comprises the steps of preparing a nanoporous body, functionalizing the organic functional group on the surface of the nanoporous body, functionalizing the organic functional group on the surface of the substrate to be coated with the nanoporous body, the nanoporous body of the substrate Nanoporous coating method for heat transfer control comprising covalently bonding to the surface (see FIG. 1).
본 발명에서 나노세공체는 나노단위의 세공을 갖는 물질을 의미하는 것으로서, 2nm이하의 세공을 갖는 제올라이트, 2-100nm의 세공을 갖는 메조세공체, 10nm 이하의 세공을 갖는 다공성 유-무기 혼성체{MOF (Metal organic framework), MOP(Metal organic polyhedra), ZIF(Zeolitic imidazolate framework)} 등이 사용될 수 있다. 다공성 유-무기 혼성체란 중심금속 이온이 유기리간드와 결합하여 형성된 다공성 유-무기 고분자 화합물을 의미한다. In the present invention, the nanoporous body refers to a material having pores in nano units, a zeolite having pores of 2 nm or less, a mesoporous body having pores of 2-100 nm, and a porous organic-inorganic hybrid having pores of 10 nm or less. {Metal organic framework (MOF), metal organic polyhedra (MOP), Zeolitic imidazolate framework (ZIF) and the like can be used. The porous organic-inorganic hybrid refers to a porous organic-inorganic high molecular compound formed by combining a central metal ion with an organic ligand.
<다공성 유-무기 혼성체의 제조>Preparation of Porous Organic-Inorganic Hybrids
본 발명에서 다공성 유-무기 혼성체는 특별히 한정하는 것은 아니지만, 금속원(source), 리간드로 작용할 수 있는 유기물 및 용매를 포함하는 반응물 혼합액을 가열하는 방법을 통해 제조할 수 있다. 상기 가열은 그 방법에 제한을 둘 필요는 없으며, 전기가열방법, 마이크로조사 또는 음파를 조사하는 방법 등에서 선택하여 사용할 수 있으나, 나노크기의 다공성 유-무기 혼성체 결정을 제조하기 위해서는 전기가열법 또는 마이크로파를 이용하는 방법이 보다 바람직하다.In the present invention, the porous organic-inorganic hybrid is not particularly limited, but may be prepared through a method of heating a reactant mixture containing a metal source, an organic material that can act as a ligand, and a solvent. The heating is not limited to the method, and may be selected and used in an electric heating method, a micro irradiation or a method of irradiating sound waves, but in order to prepare a nano-sized porous organic-inorganic hybrid crystals, the electric heating method or The method using a microwave is more preferable.
다공성 유-무기혼성체의 하나의 구성원소인 금속 물질은 어떠한 금속이라도 가능하다. 특히 배위화합물을 잘 만드는 전이금속이 바람직하다. 전이금속 중에서도 크롬, 바나듐, 철, 니켈, 코발트, 구리, 티타늄, 아연, 바나듐, 몰리브데늄, 니오비움, 지르코늄 및 망간 등이 보다 바람직하다. 전이금속 외에도 배위화합물을 만드는 전형원소는 물론 란타늄 같은 희토류 금속도 가능하다. 전형원소 중에는 칼슘, 마그네슘, 리튬, 주석, 알루미늄 및 실리콘이 바람직하며, 란타늄 금속 중에는 세륨, 란타늄이 바람직하다. 금속 원으로는 금속 자체는 물론이고 금속의 어떠한 화합물도 사용할 수 있다.The metal material, which is one member of the porous organic-inorganic hybrid, can be any metal. In particular, transition metals which make coordination compounds well are preferred. Among the transition metals, chromium, vanadium, iron, nickel, cobalt, copper, titanium, zinc, vanadium, molybdenum, niobium, zirconium, manganese, and the like are more preferable. In addition to transition metals, rare earth metals such as lanthanum are possible, as well as typical elements that make up coordination compounds. Among the typical elements, calcium, magnesium, lithium, tin, aluminum and silicon are preferable, and among lanthanum metals, cerium and lanthanum are preferable. As the metal source, any compound of the metal may be used as well as the metal itself.
다공성 유-무기 혼성체의 또 하나의 구성원소인 유기물은 링커(linker)라고도 하며 배위할 수 있는 작용기를 가진 어떠한 유기물도 가능하며, 배위할 수 있는 작용기는 카복실산기, 카복실산 음이온기, 아미노기(-NH2), 이미노기, 아미드기(-CONH2), 술폰산기(-SO3H), 술폰산 음이온기(-SO3-), 메탄디티오산기(-CS2H), 메탄디티오산 음이온기(-CS2-), 피리딘기 또는 피라진기 등이 예시될 수 있다. 또한, 금속이온과 배위결합에 참여하는 상기 1차 유기 리간드를 아미노기(-NH2), 이미노기, 아미드기(-CONH2), 술폰산기(-SO3H) 등으로 2차 치환할 수 있다. 예를 들면 1,4-BDC(Benzendicarboxylic acid)의 벤젠링 2,3,5 카본(carbon) 위치에 어느 한 곳 이상에 아미노기(-NH2), 이미노기, 아미드기(-CONH2), 술폰산기(-SO3H) 등을 추가로 치환할 수 있다. 보다 안정한 유-무기혼성체를 유도하기 위해서는 배위할 수 있는 자리가 2개 이상인, 예를 들면 바이덴테이트 또는 트리덴테이트인 유기물이 유리하다. 유기물로는 배위할 자리가 있다면 비피리딘, 피라진 등의 중성 유기물, 테레프탈레이트, 나프탈렌디카복실레이트, 벤젠트리카복실레이트, 글루타레이트, 숙신네이트 등으로 예시될 수 있는 카복실산의 음이온 등의 음이온성 유기물은 물론 양이온 물질도 가능하다. 카복실산 음이온의 경우 예를 들면 테레프탈레이트 같은 방향족 링을 갖는 것 외에 포르메이트 같은 선형의 카복실산의 음이온은 물론이고 시클로헥실디카보네이트와 같이 비방향족 링을 갖는 음이온 등 어느 것이라도 가능하다. 배위할 수 있는 자리를 가진 유기물은 물론이고 잠재적으로 배위할 자리를 가져 반응 조건에서 배위할 수 있게 변화되는 것도 가능하다. 즉, 테레프탈산 같은 유기산을 사용하여도 반응 후에는 테레프탈레이트로 금속 성분과 결합할 수 있다. 사용할 수 있는 유기물의 대표적인 예로는 벤젠디카르복실산, 나프탈렌디카복실산, 벤젠트리카복실산, 나프탈렌트리카복실산, 피리딘디카복실산, 비피리딜디카복실산, 포름산, 옥살산, 말론산, 숙신산, 글루타르산, 헥산다이오익산, 헵탄다이오익산, 또는 시클로헥실디카복실산에서 선택되는 유기산 및 그들의 음이온, 피라진, 비피리딘 등이다. Organics, another member of the porous organic-inorganic hybrid, are also called linkers and can be any organic having coordinating functional groups. Coordinating functional groups are carboxylic acid groups, carboxylic acid anion groups, amino groups (-NH). 2 ), imino group, amide group (-CONH 2 ), sulfonic acid group (-SO 3 H), sulfonic acid anion group (-SO 3- ), methanedithioic acid group (-CS 2 H), methanedithioic acid anion group ( -CS 2- ), pyridine group or pyrazine group and the like can be exemplified. In addition, the primary organic ligand participating in coordination bonds with metal ions may be secondaryly substituted with an amino group (-NH 2 ), an imino group, an amide group (-CONH 2 ), a sulfonic acid group (-SO 3 H), or the like. . For example, an amino group (-NH 2 ), an imino group, an amide group (-CONH 2 ), and a sulfonic acid at any one or more positions in a 2,3,5 carbon position of a benzene ring of 1,4-BDC (Benzendicarboxylic acid) Group (-SO 3 H) and the like may be further substituted. In order to induce a more stable organic-inorganic hybrid, organic materials having two or more coordinating sites, for example, bidentate or tridentate, are advantageous. As organic materials, if there is a position to coordinate, neutral organic materials such as bipyridine and pyrazine, anionic organic materials such as terephthalate, naphthalenedicarboxylate, benzenetricarboxylate, glutarate, anion of carboxylic acid which can be exemplified by succinate, etc. Of course, cationic materials are also possible. In the case of the carboxylic acid anion, for example, anion of a linear carboxylic acid such as formate as well as an anion having a non-aromatic ring such as cyclohexyl dicarbonate can be used, in addition to having an aromatic ring such as terephthalate. Organics with coordinating sites, as well as potentially coordinating sites, can also be changed to coordinate under reaction conditions. That is, even if an organic acid such as terephthalic acid is used, it can be combined with a metal component with terephthalate after the reaction. Representative examples of organic materials that can be used include benzenedicarboxylic acid, naphthalenedicarboxylic acid, benzenetricarboxylic acid, naphthalenetricarboxylic acid, pyridinedicarboxylic acid, bipyridyldicarboxylic acid, formic acid, oxalic acid, malonic acid, succinic acid, glutaric acid and hexanedioo Organic acids selected from Ixic acid, heptanedioic acid, or cyclohexyldicarboxylic acid and their anions, pyrazine, bipyridine and the like.
또한, 하나 이상의 유기물을 혼합하여 사용할 수도 있다.It is also possible to mix and use one or more organics.
금속 원과 유기물 외에 유-무기 혼성체의 합성에는 적당한 용매가 필요하며 물, 메탄올, 에탄올, 프로판올 등의 알콜류, 아세톤, 메틸에틸케톤 등의 케톤 류, 헥산, 헵탄, 옥탄 등의 탄화수소류 등 어떠한 물질도 사용 가능하며 두 가지 이상의 용매를 섞어 사용할 수도 있으며 물이 가장 적합하다.In addition to the metal source and organic matter, an appropriate solvent is required for the synthesis of the organic-inorganic hybrid, and alcohols such as water, methanol, ethanol and propanol, ketones such as acetone and methyl ethyl ketone, and hydrocarbons such as hexane, heptane and octane Substances may be used, or two or more solvents may be mixed and water is most suitable.
다공성 유-무기혼성체의 대표적인 예로는 크롬테레프탈레이트, 타이타늄테레프탈레이트, 지르코늄테레프탈레이트, 크롬트리카르복실레이트, 바나듐테레프탈레이트, 바나듐트리카르복실레이트, 철테레프탈레이트, 철트리카르복실레이트, 알루미늄테레프탈레이트, 알루미늄트리카르복실레이트, 아연이미다졸늄레이트를 들 수 있으며, 그 중에서도 특히 수열안정성이 뛰어난 크롬테레트탈레이트, 알루미늄트리카르복실레이트, 철트리카르복실레이트, 지르코늄테레프탈레이트, 아연이미다졸늄레이트가 바람직하다.Representative examples of porous organic-inorganic hybrids include chromium terephthalate, titanium terephthalate, zirconium terephthalate, chromium tricarboxylate, vanadium terephthalate, vanadium tricarboxylate, iron terephthalate, iron tricarboxylate, and aluminum terephthalate. Phthalates, aluminum tricarboxylates, and zinc imidazonates, among which chromium terephthalate, aluminum tricarboxylate, iron tricarboxylate, zirconium terephthalate, and zinc imidazonium are particularly excellent in hydrothermal stability. Rate is preferred.
<제올라이트><Zeolite>
본 발명에서 제올라이트는 구조 내에 Si, Al, Ga, P등의 무기물을 하나 이상 가지거나, -CH2-, -C2H4- 등의 유기기를 가질 수 있고, 특별히 한정하는 것은 아니지만, MFI, BEA, FER, AFI, CHA, FAU, LTA구조를 갖는 것이 적합하다. In the present invention, the zeolite may have at least one inorganic material such as Si, Al, Ga, P, or the like, and may have an organic group such as -CH 2- , -C 2 H 4- , but is not particularly limited, but MFI, It is suitable to have BEA, FER, AFI, CHA, FAU, LTA structure.
<메조세공체><Meso taxation body>
본 발명에서 메조세공체는 구조내에 Si, Al, Ga, P등의 무기물을 하나 이상 가지거나, -CH2-, -C2H4-, -C6H4- 등의 유기기를 가질 수 있고, 특별히 한정하는 것은 아니지만, MCM-계열, SBA-계열, MSU-계열, KIT-계열, MCF(mesoporous cellular foam)계열를 사용하는 것이 적합하다. 또한, 메조세공체의 카본레플리카(Carbon replica)도 사용할 수 있다.In the present invention, the mesoporous body may have at least one inorganic material such as Si, Al, Ga, P, or the like, or may have an organic group such as -CH 2- , -C 2 H 4- , -C 6 H 4-, and the like. Although not particularly limited, it is suitable to use MCM-based, SBA-based, MSU-based, KIT-based, and MCF (mesoporous cellular foam) series. In addition, a carbon replica of mesoporous body can also be used.
<나노세공체 표면 및 코팅하고자 하는 기재의 표면을 기능화하는 단계><Functionalizing the surface of the nanoporous body and the surface of the substrate to be coated>
나노세공체의 표면 및 나노세공체를 코팅하고자 하는 기재의 표면을 기능화시킬 수 있는 유기 관능기 전구체로는 화학식 1 내지 6에 의해서 표시되는 화합물로부터 1종 이상을 선택하여 사용할 수 있으나 제한된 것은 아니다. As the organic functional precursor that can functionalize the surface of the nanoporous body and the surface of the substrate to be coated with the nanoporous body, one or more selected from the compounds represented by
(상기 식에서, Z는 할로겐 원소이며, R은 할로겐 원소로 치환되거나 또는 비치환된 탄소수 C1~C20의 알킬기, 알케닐기, 알키닐기, 비닐기, 아미노기, 시아노기 및 머캅토기(-SH)기로 구성된 군으로부터 선택된 치환기이다. 탄소수는 3-7이 적당하다.) (Wherein Z is a halogen element, R is an alkyl group, alkenyl group, alkynyl group, vinyl group, amino group, cyano group, and mercapto group (-SH) of C 1 to C 20 substituted or unsubstituted with halogen element) A substituent selected from the group consisting of 3 to 3 carbon atoms are suitable.)
(상기 식에서, M는 불포화탄화수소를 포함하거나 포함하지 않는 C1~C20의 알킬렌, 아르알킬렌기, R1 내지 R2는 독립적으로 할로겐 원소, 비닐기(-C=CH), 아미노기(-NH2), 이미노기(-NHR), 머캅토기(-SH), 히드록시기(-OH) 또는 카복실산기(-COOH), 술폰산기 (-SO3H), 알콕시기(-OR), 포스포릭기(-PO(OH)2)로부터 선택되는 하나 이상으로 치환되거나 치환되지 않은 유기물질이다.)Wherein M is C 1 to C 20 alkylene, aralkylene group, or
상기 나노세공체의 표면 기능화 전에 불포화 금속 자리에 결합된 물 또는 용매성분을 제거하는 전처리 단계를 진행하는 것이 더욱 바람직하다. 상기 전처리는 나노세공체의 변형을 유발하지 않고 물 또는 용매성분을 제거할 수 있으면 어떠한 방법도 사용가능하며, 보다 구체적으로는 감압 하에 100℃ 이상의 온도에서 2시간 이상 가열하는 것이 좋으며, 150℃ 이상의 온도에서 4시간 이상 가열하는 것이 보 다 바람직하다.It is more preferable to proceed with the pretreatment step of removing the water or the solvent component bonded to the unsaturated metal site before the surface functionalization of the nanoporous body. The pretreatment may use any method as long as it can remove water or solvent components without causing deformation of the nanoporous body, and more specifically, it is preferable to heat at least 100 hours at a temperature of 100 ° C. or higher, and 150 ° C. or higher under reduced pressure. More preferably heating at least 4 hours at temperature.
본 발명에 따른 나노세공체의 표면 기능화방법의 실시 형태를 들면 (a) 나노세공체의 표면의 불포화 금속자리에 배위되어 있는 물 또는 알코올 등의 유기용매를 제거하는 단계, (b) 유기실란 또는 유기아민 화합물을 톨루엔 등의 유기용매에 용해시켜 제조한 유기실란 화합물 용액에 상기 전처리된 나노세공체를 투입하여 환류 반응시켜 기능화하는 단계, 및 (c) 상기 유기실란 또는 유기아민 화합물이 기능화된 나노세공체를 정제하는 단계를 포함할 수 있다.Embodiments of the surface functionalization method of the nanoporous body according to the present invention include (a) removing an organic solvent such as water or an alcohol coordinated at an unsaturated metal site on the surface of the nanoporous body, (b) organosilane or Adding an organic silane compound solution prepared by dissolving an organic amine compound in an organic solvent, such as toluene, to perform a reflux reaction by adding the pretreated nanoporous material, and (c) nano-functionalized organic silane or organic amine compound. Purifying the pore may be included.
또한, 휘발성이 좋은 유기실란 및 유기아민 화합물을 이용하여 나노세공체를 표면 기능화하는 경우에는 화학 기상 증착법과 같은 방법으로 기체 상태의 유기실란 화합물을 나노세공체와 접촉시켜 나노세공체의 불포화 금속 자리에 선택적으로 결합시킬 수 있다.In addition, when surface-functionalizing a nanoporous body using highly volatile organosilane and an organic amine compound, the organic silane compound in a gaseous state is brought into contact with the nanoporous body in the same manner as in the chemical vapor deposition method to form an unsaturated metal site of the nanoporous body. May optionally be bound to
<상기 나노세공체를 상기 기재의 표면에 공유 결합시키는 단계><Step of covalently bonding the nanoporous body to the surface of the substrate>
기능화된 나노세공체를 기재의 기능화된 표면에 공유 결합으로 고정화하기 위한 방법으로는 기능화된 나노세공체와 기재를 용매에 넣고 초음파, 전자기파를 가해주면서 교반하는 방법과 환류시키는 방법 등이 있다. 또한, 딥코팅, 침윤(Infiltration) 등의 방법이 있다. Methods for immobilizing the functionalized nanoporous body on the functionalized surface of the substrate by covalent bonding include a method in which the functionalized nanoporous body and the substrate are put in a solvent and stirred while applying ultrasonic waves and electromagnetic waves and refluxing. In addition, there are methods such as dip coating and infiltration.
이하의 본 발명을 실시예를 통하여 구체적으로 설명하지만 본 발명은 이들 실시예만으로 한정되는 것은 아니다.Hereinafter, the present invention will be described in detail with reference to Examples, but the present invention is not limited only to these Examples.
[실시예 1]Example 1
<다공성 유-무기 혼성체(Cu-BTC)의 제조>Preparation of Porous Organic-Inorganic Hybrids (Cu-BTC)
세공크기가 1nm 이상인 다공성 유-무기 혼성체 구리벤젠트리카르복실레이트를 이미 보고된 방법에 의해서 제조하였다(Science, 283, 1148, 1999). 제조방법은, 테프론 반응기에 Cu(NO3)39H2O 및 1,3,5-벤젠트리카복실산 (BTCA)을 더한 후 증류수와 에탄올을 가하되 반응물의 최종의 몰비는 Cu:BTCA:H2O:Ethanol=1:0.5:184:103 되도록 하였다. 상기 혼합 반응물을 120 ℃ 오븐에서 8시간 유지하여 반응을 시킨 후 실온으로 냉각 후 원심 분리, 증류수를 이용한 세척, 건조하여 유-무기혼성체 구리벤젠트리카르복실레이트를 얻었다. 고체의 X-선 회절분석결과 문헌에 보고된 구조와 동일한 구조임을 확인하였다 (Science, 283, 1148, 1999). Porous organic-inorganic hybrid copperbenzenetricarboxylates having a pore size of 1 nm or more were prepared by previously reported methods (Science, 283, 1148, 1999). In the preparation method, Cu (NO 3 ) 3 9H 2 O and 1,3,5-benzenetricarboxylic acid (BTCA) are added to a Teflon reactor, distilled water and ethanol are added, and the final molar ratio of the reactant is Cu: BTCA: H 2 O: Ethanol = 1: 0.5: 184: 103. The reaction mixture was maintained in an oven at 120 ° C. for 8 hours to react, cooled to room temperature, centrifuged, washed with distilled water, and dried to obtain an organic-inorganic hybrid copperbenzene tricarboxylate. X-ray diffraction analysis of the solid confirmed the same structure as that reported in the literature (Science, 283, 1148, 1999).
<아미노기가 기능화 된 유-무기 나노세공체 제조> <Organic-inorganic nanoporous body functionalized with amino group>
불포화 금속자리에 배위결합된 수분을 탈수시키기 위해 다공성 유-무기 혼성체 구리벤젠트리카르복실레이트 1g을 200 ℃ 진공오븐에서 12시간 동안 전처리한다. 에틸렌다이아민(Ethylenediamine, ED) 2 ml를 증류시켜 탈수된 구리벤젠트리카르복실레이트에 흡착시켜 불포화 금속자리에 아미노 작용기가 배위된 다공성 유-무기 혼성체를 제조하였다(NH2-CuBTC). 에틸렌다이아민을 담지하기 전후의 X-선 회절 형태로부터 다공성 유-무기 혼성체의 구조에 변화가 없음을 알 수 있었다. 또한, 적외선 분광법을 이용하여 에틸렌다이아민의 아미노 그룹(-NH2) 및 에틸그룹 (-CH2CH2-)이 2800-3000cm-1 와 3200-3400 cm-1 에서 존재함을 확인하였다. 이는 에틸렌다이아민이 배위되었음은 의미한다.1 g of porous organic-inorganic hybrid copperbenzenetricarboxylate is pretreated in a 200 ° C. vacuum oven for 12 hours to dehydrate water coordinated to unsaturated metal sites. 2 ml of ethylenediamine (Ethylenediamine, ED) was distilled off and adsorbed to dehydrated copper benzenetricarboxylate to prepare a porous organic-inorganic hybrid having an amino functional group coordinated at an unsaturated metal site (NH2-CuBTC). The X-ray diffraction patterns before and after supporting ethylenediamine showed no change in the structure of the porous organic-inorganic hybrid. In addition, using infrared spectroscopy ethylene diamine amino group (-NH 2) and an ethyl group was confirmed that there is at 2800-3000cm -1 and 3200-3400 cm -1 (-CH 2 CH 2 ). This means that ethylenediamine is coordinated.
에틸렌다이아민의 배위 전후, 다공성 유-무기 혼성체의 -OH기(3550~3650cm-1)가 거의 변화하지 않은 것으로부터 유-무기 혼성체에 에틸렌다이아민이 불포화금속자리에 선택적으로 반응한 것임을 알 수 있다. Since the -OH group (3550-3650cm -1 ) of the porous organic-inorganic hybrid was hardly changed before and after the coordination of ethylenediamine, it can be seen that the ethylenediamine reacted selectively to the unsaturated metal site in the organic-inorganic hybrid. have.
<클로린이 기능화된 실리콘웨이퍼의 제조><Preparation of Chlorine Functionalized Silicon Wafer>
2cm*2cm 실리콘웨이퍼를 테프론 고정대에 고정을 시키고 50ml 톨루엔이 들어있는 비커에 넣고 질소를 충진시킨다. 상기 비이커에 3ml의 실린지를 사용하여 1ml의 3-클로로프로필트리에톡시실란을 넣고 110℃에서 24시간 환류시킨다. 환류 과정이 끝난 후 실온으로 식히고 실리콘웨이퍼를 톨루엔 용액에 보관한다.A 2cm * 2cm silicon wafer is fixed on a Teflon holder and placed in a beaker containing 50ml toluene and filled with nitrogen. 1 ml of 3-chloropropyltriethoxysilane was added to the beaker using 3 ml of syringe and refluxed at 110 ° C. for 24 hours. After the reflux process, cool to room temperature and store the silicon wafer in toluene solution.
< NH2-CuBTC이 코팅된 실리콘웨이퍼의 제조><Manufacturing of Silicon Wafer Coated with NH2-CuBTC>
클로린이 기능화된 2cm * 2cm 실리콘웨이퍼를 테프론 고정대에 고정을 시키고 50ml 톨루엔이 들어있는 비커에 넣는다. 150℃ 진공오븐에서 12시간 건조된 NH2-CuBTC 0.1g을 상기 실리콘웨이퍼가 들어있는 비이커에 넣고 질소를 충진시킨 후 110℃에서 12시간 환류시킨다. 제조된 Si-NH-CuBTC의 코팅 정도를 전자현미경 확인한 결과 균일하게 코팅되었음을 확인할 수 있었다.A chlorinated functionalized 2cm * 2cm silicone wafer is fixed on a Teflon holder and placed in a beaker containing 50ml toluene. 0.1 g of NH2-CuBTC dried at 150 ° C. in a vacuum oven for 12 hours was placed in a beaker containing the silicon wafer and filled with nitrogen, and refluxed at 110 ° C. for 12 hours. As a result of confirming the coating degree of the prepared Si-NH-CuBTC electron microscope, it was confirmed that the coating uniformly.
[실시예 2][Example 2]
<다공성 유-무기 혼성체(MCM-48)의 제조>Preparation of Porous Organic-Inorganic Hybrids (MCM-48)
세공크기가 1nm 이상인 다공성 유-무기 혼성체 MCM-48(표면적 1050 m2/g)을 이미 보고된 방법에 의해서 제조하였다.Porous organic-inorganic hybrid MCM-48 (surface area 1050 m 2 / g) having a pore size of 1 nm or more was prepared by the previously reported method.
<아미노기가 기능화 된 MCM-48의 제조><Production of MCM-48 Functionalized with Amino Groups>
MCM-48 1g 을 200℃ 진공오븐에서 12시간 건조시킨다. 상기 탈수된 MCM-48을 50ml 톨루엔에 넣고 질소를 충진시킨다. 상기 용액에 3ml의 실린지를 사용하여 1.87ml 3-아미노프로필트리에톡시실란을 넣고 110℃에서 12시간 환류시킨다. 환류과정이 끝난 후 실온으로 식히고 종이 필터로 거른다. 물과 에탄올을 이용하여 충분히 세척한다.1 g of MCM-48 is dried in a vacuum oven at 200 ° C. for 12 hours. The dehydrated MCM-48 is placed in 50 ml toluene and charged with nitrogen. The solution was added with 1.87 ml 3-aminopropyltriethoxysilane using 3 ml of syringe and refluxed at 110 ° C. for 12 hours. After reflux, cool to room temperature and filter with paper filter. Wash thoroughly with water and ethanol.
<클로린이 기능화된 실리콘웨이퍼의 제조><Preparation of Chlorine Functionalized Silicon Wafer>
2cm*2cm 실리콘웨이퍼를 테프론 고정대에 고정을 시키고 50ml 톨루엔이 들어있는 비커에 넣고 질소를 충진시킨다. 상기 비이커에 3ml의 실린지를 사용하여 1ml의 3-클로로프로필트리에톡시실란을 넣고 110℃에서 24시간 환류시킨다. 환류 과정이 끝난 후 실온으로 식히고 실리콘웨이퍼를 톨루엔 용액에 보관한다.A 2cm * 2cm silicon wafer is fixed on a Teflon holder and placed in a beaker containing 50ml toluene and filled with nitrogen. 1 ml of 3-chloropropyltriethoxysilane was added to the beaker using 3 ml of syringe and refluxed at 110 ° C. for 24 hours. After the reflux process, cool to room temperature and store the silicon wafer in toluene solution.
<NH2-MCM-48이 코팅된 실리콘웨이퍼의 제조><Manufacture of Silicon Wafers coated with NH 2 -MCM-48>
상기 실시예 1와 유사한 방법으로 MCM-48을 실리콘웨이퍼에 코팅한다. 클로린이 기능화된 2cm * 2cm 실리콘웨이퍼를 테프론 고정대에 고정을 시키고 50ml 톨루엔이 들어있는 비커에 넣는다. 150℃ 진공오븐에서 12시간 건조된 NH2-MCM-48 0.1g을 상기 실리콘웨이퍼가 들어있는 비이커에 넣고 질소를 충진시킨 후 110℃에서 12시간 환류시켜 NH2-MCM-48을 실리콘 기판에 코팅하였다. XRD 및 SEM 분석결과 NH2-MCM-48이 코팅된 것을 확인하였다. MCM-48 is coated on a silicon wafer in a similar manner to Example 1. A chlorinated functionalized 2cm * 2cm silicone wafer is fixed on a Teflon holder and placed in a beaker containing 50ml toluene. 0.1 g of NH 2 -MCM-48 dried at 150 ° C. in a vacuum oven for 12 hours was placed in a beaker containing the silicon wafer, filled with nitrogen, and refluxed at 110 ° C. for 12 hours to coat NH 2 -MCM-48 on a silicon substrate. It was. XRD and SEM analysis confirmed that the NH 2 -MCM-48 is coated.
[실시예 3][Example 3]
실시예 1에서 다공성 유무기 혼성체로 구리벤젠트리카르복실레이트 대신에 MIL-101을 사용하여 동일한 방법에 의해서 아미노기가 기능화된 NH2-MIL-101을 제조하였다. 코팅 전후의 XRD 패턴을 분석한 결과 기존의 연구결과(Science 309, 2040, 2005)에 보고된 결정구조와 동일함을 확인하였다(도 2 참조). 적외선 분광법으로 아민이 MIL-101에 결합된 것을 확인하였다. 상기의 NH2-MIL-101을 클로린이 기능화된 실리콘 웨이퍼에 실시예 1과 동일한 방법에 의해서 결합시켰다(Si-NH-MIL-101). SEM분석 결과 NH2-MIL-101이 Si 기판에 잘 결합되어 있는 것을 확인하였다 (도 3 참조)NH 2 -MIL-101 functionalized with an amino group was prepared by using MIL-101 as a porous organic-inorganic hybrid in Example 1 instead of copperbenzenetricarboxylate. As a result of analyzing the XRD pattern before and after the coating, it was confirmed that the crystal structure is the same as that reported in the existing results (Science 309, 2040, 2005) (see FIG. 2). Infrared spectroscopy confirmed that the amine was bound to MIL-101. The NH 2 -MIL-101 was bonded to a chlorine-functional silicon wafer by the same method as in Example 1 (Si-NH-MIL-101). SEM analysis showed that NH 2 -MIL-101 was well bonded to the Si substrate (see FIG. 3).
[실시예 4]Example 4
실시예 1에서 다공성 유무기 혼성체로 구리벤젠트리카르복실레이트 대신에 MOF-5을 사용하여 동일한 방법에 의해서 아미노기가 기능화된 NH2-MOF-5을 제조하였다. 적외선 분광법으로 아민이 MOF-5에 결합된 것을 확인하였다. 상기의 NH2-MOF-5을 클로린이 기능화된 실리콘 웨이퍼에 실시예 1과 동일한 방법에 의해서 결합시켰다(Si-NH-MOF-5). NH 2 -MOF-5 functionalized with amino groups was prepared in the same manner using MOF-5 instead of copperbenzenetricarboxylate as the porous organic-inorganic hybrid in Example 1. Infrared spectroscopy confirmed that the amine was bound to MOF-5. NH 2 -MOF-5 was bonded to a chlorine-functional silicon wafer in the same manner as in Example 1 (Si-NH-MOF-5).
[실시예 5][Example 5]
실시예 1에서 다공성 유무기 혼성체로 구리벤젠트리카르복실레이트 대신에 크롬테레프탈레이트를 사용하여 동일한 방법에 의해서 아미노기가 기능화된 NH2-Cr-MOF을 제조하였다. 코팅 전후의 XRD 패턴을 분석한 결과 기존의 연구결과(Science 309, 2040, 2005)에 보고된 결정구조와 동일함을 확인하였다. 적외선 분광법으로 아민이 크롬테레프탈레이트에 결합된 것을 확인하였다. 상기의 NH2-Cr-MOF을 클로린이 기능화된 실리콘 웨이퍼에 실시예 1과 동일한 방법에 의해서 결합시켰다(Si-NH-Cr-MOF). SEM분석 결과 NH2-Cr-MOF이 Si 기판에 잘 결합되어 있는 것을 확인하였다. NH 2 -Cr-MOF having an amino group functionalized by the same method was prepared using chromium terephthalate instead of copperbenzenetricarboxylate as the porous organic-inorganic hybrid in Example 1. Analysis of the XRD pattern before and after coating confirmed that the crystal structure is the same as that reported in the previous studies (Science 309, 2040, 2005). Infrared spectroscopy confirmed that the amine was bound to chromium terephthalate. The NH 2 -Cr-MOF was bonded to a chlorine-functional silicon wafer by the same method as in Example 1 (Si-NH-Cr-MOF). SEM analysis showed that NH 2 -Cr-MOF was well bonded to the Si substrate.
[실시예 6][Example 6]
실시예 1에서 다공성 유무기 혼성체로 구리벤젠트리카르복실레이트 대신에 ZIF-8을 사용하여 동일한 방법에 의해서 아미노기가 기능화된 NH2-ZIF-8을 제조하였다. 적외선 분광법으로 아민이 ZIF-8에 결합된 것을 확인하였다. 상기의 NH2-ZIF-8을 클로린이 기능화된 실리콘 웨이퍼에 실시예 1과 동일한 방법에 의해서 결합시켰다(Si-NH-ZIF-8). NH 2 -ZIF-8 functionalized with an amino group was prepared in the same manner using ZIF-8 instead of copperbenzenetricarboxylate as the porous organic-inorganic hybrid in Example 1. Infrared spectroscopy confirmed that the amine was bound to ZIF-8. NH 2 -ZIF-8 was bonded to a chlorine-functional silicon wafer in the same manner as in Example 1 (Si-NH-ZIF-8).
<임계열유속의 측정><Measurement of critical heat flux>
실시예 3에서 제조된 나노세공체가 코팅된 실리콘웨이퍼와 아무것도 코팅되지 않은 실리콘웨이퍼의 비등성능을 Pool Boiling 실험 장치(도 4 참조)를 이용하여 평가하였다. 10mm x 10mm의 히터가 내장된 실리콘 웨이퍼를 30mm x 30mm의 기판(Printed Circuit Board)에 붙인 뒤에, 공동(Cavity)이 있는 테프론 블록 위에 올리고 진공으로 고정한다. 이렇게 하면 시료에 열을 가할 때 시료의 바닥 면은 단열시킬 수 있다. 냉매는 끓는점이 56oC 인 3M PF-5060을 사용하였으며, 이중 자켓 비이커에 담겨져 일정한 온도(56oC)로 유지가 되고, 끓어서 증발된 냉매는 콘덴서를 통해 응축되어 다시 돌아온다. 테프론 블록에 장착된 시료는 냉매에 잠긴 상태에서 외부의 직류 전원공급기를 통해 열을 받게 되며, 시료와 냉매의 온도는 센서를 이용하여 측정이 된다. 비등(Boiling) 테스트 결과 실리콘 웨이퍼에 나노세공체를 리플럭스(Reflux)방법으로 코팅한 구조가 임계열유속이 20W로서, 나노세공체가 코팅되지 않은 시료의 11W의 거의 두 배로 비등(Boiling) 성능이 향상됨을 확인할 수 있었다(도 5 참조). Boiling performance of the nanoporous coated silicon wafer and the uncoated silicon wafer prepared in Example 3 were evaluated using a Pool Boiling Experiment apparatus (see FIG. 4). A silicon wafer with a 10 mm x 10 mm heater is attached to a 30 mm x 30 mm printed circuit board, which is then placed on a Teflon block with cavities and fixed by vacuum. This allows the bottom surface of the sample to be insulated when it is heated. 3M PF-5060 with boiling point of 56 o C was used. The refrigerant was placed in a double jacket beaker and maintained at a constant temperature (56 o C). The boiled and evaporated refrigerant was condensed through the condenser and returned. The sample mounted on the Teflon block is heated by an external DC power supply in a state of being immersed in the refrigerant, and the temperature of the sample and the refrigerant is measured by using a sensor. Boiling test results show that the nanofluidic coating on the silicon wafer with the Reflux method has a critical heat flux of 20W, which is nearly twice the 11W of the sample without the nanoporous body. It could be confirmed (see FIG. 5).
도 1은 본 발명에 의한 나노세공체 코팅 방법에 관한 개념도이며, 1 is a conceptual diagram related to a nanoporous coating method according to the present invention,
도 2은 표면 기능화된 다공성 유-무기 혼성체의 XRD 패턴을 나타낸 것으로 (a)는 MIL-101, (b)는 DE-MIL-101의 XRD 패턴을 나타낸다.Figure 2 shows the XRD pattern of the surface functionalized porous organic-inorganic hybrid (a) MIL-101, (b) shows the XRD pattern of DE-MIL-101.
도 3는 실시예 3에서 제조된 표면 기능화된 다공성 유-무기 혼성체의 전자현미경 사진이며,3 is an electron micrograph of the surface functionalized porous organic-inorganic hybrid prepared in Example 3,
도 4는 임계열유속의 측정하기 위한 실험장치 모식도이며,4 is a schematic diagram of an experimental apparatus for measuring the critical heat flux,
도 5는 임계열유속 측정결과를 나타낸 것으로 (a)는 실시예 3의 나노세공체를 코팅한 실리콘웨이퍼, (b)는 코팅하지 않은 실리콘웨이퍼의 임계열유속 측정결과를 나타내는 도면이다.Figure 5 shows the results of the measurement of the critical heat flux (a) is a silicon wafer coated with the nanoporous body of Example 3, (b) is a view showing the results of the measurement of the critical heat flux of the uncoated silicon wafer.
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KR20020034340A (en) * | 2000-11-01 | 2002-05-09 | 정한채 | Preparation of a patterned mono- or multi-layered composite of zeolite or zeotype molecular sieve on a substrate and composite prepared by the same |
KR100482653B1 (en) * | 2002-06-03 | 2005-04-13 | 한국화학연구원 | Process for preparing nano-fabrication of inorganic thin films by microwave irradiation |
JP2006225579A (en) * | 2005-02-21 | 2006-08-31 | Sumitomo Chemical Co Ltd | Process for polymerization within pore of porous metal complex |
KR100680767B1 (en) * | 2006-02-07 | 2007-02-09 | 한국화학연구원 | A preparation method of porous organic inorganic hybrid materials |
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KR20020034340A (en) * | 2000-11-01 | 2002-05-09 | 정한채 | Preparation of a patterned mono- or multi-layered composite of zeolite or zeotype molecular sieve on a substrate and composite prepared by the same |
KR100482653B1 (en) * | 2002-06-03 | 2005-04-13 | 한국화학연구원 | Process for preparing nano-fabrication of inorganic thin films by microwave irradiation |
JP2006225579A (en) * | 2005-02-21 | 2006-08-31 | Sumitomo Chemical Co Ltd | Process for polymerization within pore of porous metal complex |
KR100680767B1 (en) * | 2006-02-07 | 2007-02-09 | 한국화학연구원 | A preparation method of porous organic inorganic hybrid materials |
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WO2010032965A2 (en) | 2010-03-25 |
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