KR101214953B1 - Stamp apparatus having multi-faces and making method for the stamp apparatus - Google Patents

Stamp apparatus having multi-faces and making method for the stamp apparatus Download PDF

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Publication number
KR101214953B1
KR101214953B1 KR1020120078580A KR20120078580A KR101214953B1 KR 101214953 B1 KR101214953 B1 KR 101214953B1 KR 1020120078580 A KR1020120078580 A KR 1020120078580A KR 20120078580 A KR20120078580 A KR 20120078580A KR 101214953 B1 KR101214953 B1 KR 101214953B1
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South Korea
Prior art keywords
stamp
rotation
stamp device
index number
rotation angle
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KR1020120078580A
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Korean (ko)
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이성휘
이재종
임형준
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한국기계연구원
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82B—NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS, MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES AS DISCRETE UNITS; MANUFACTURE OR TREATMENT THEREOF
    • B82B1/00—Nanostructures formed by manipulation of individual atoms or molecules, or limited collections of atoms or molecules as discrete units
    • B82B1/001—Devices without movable or flexible elements
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82B—NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS, MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES AS DISCRETE UNITS; MANUFACTURE OR TREATMENT THEREOF
    • B82B3/00—Manufacture or treatment of nanostructures by manipulation of individual atoms or molecules, or limited collections of atoms or molecules as discrete units
    • B82B3/0009—Forming specific nanostructures
    • B82B3/0019—Forming specific nanostructures without movable or flexible elements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Nanotechnology (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)

Abstract

An object of the present invention is a stamping apparatus used in nanoimprint lithography, having a plurality of sides having a shape such as a polygonal pillar, and having a body having a stamp formed on each side, thereby imprinting a plurality of patterns with various stamps. The present invention provides a stamping device having a plurality of side surfaces and a method of manufacturing the stamping device, which facilitates alignment between stamps.

Description

Stamp apparatus having a plurality of sides and a manufacturing method of the stamp device {Stamp apparatus having multi-faces and making method for the stamp apparatus}

The present invention relates to a stamping device having a plurality of side surfaces and a manufacturing method of the stamping device. More specifically, the present invention is a stamping apparatus used in nanoimprint lithography, having a plurality of sides having a plurality of sides formed in the shape of a polygonal pillar, etc. It relates to a stamping device having a plurality of sides, and a manufacturing method of the stamping device, which facilitates alignment between stamps when imprinting.

In general, in the semiconductor manufacturing process, a shape of a mask or a stamp is transferred to a substrate such as silicon and glass to produce a micrometer or a nanometer-sized microstructure in large quantities. Lithography, which transfers the shape of a mask or stamp onto a resin on a substrate, is commonly referred to as lithography. Lithography technology aligns a mask on a substrate on which a resist is applied, and then irradiates with light to cure the resist. Photo Lithography to form a pattern, and a method of arranging a stamp on a substrate on which a resist is applied, and then applying pressure in a state where the stamp and the substrate are in close contact with each other, and then heating or irradiating light such as ultraviolet rays. Imprint Lithography and the like, which form a pattern by curing a resist using, are used.

In particular, when imprint lithography is used to form nanoscale patterns, it is also referred to as nano-imprint lithography. In nanoimprint lithography, stamps are generally made in the form of wafers made of silicon and glass as well as substrates, provided that the stamp is made the same or smaller than the substrate.

In the past, nanoimprint lithography technology was used to form a single type of pattern in a single location with a single type of stamp. Currently, however, it has been developed in various forms such as step-and-flash imprint lithography (SFIL), which performs a process at various locations on a substrate using a single stamp, or multi-layer nanoimprint lithography, which performs a process multiple times on a single substrate. I'm going.

In nanoimprint lithography performed using multiple stamps having multiple patterns, the problem of overlay alignment caused by replacing the stamps has become an important technical issue. In the case of nanoimprint lithography, the size of the pattern itself is very precise at the nano level, so it is natural that the alignment of the stamp should be precise and accurate when replacing the stamp to ensure the quality of the manufactured pattern.

As described above, in order to align the stamp in the multi-imprint lithography process, conventionally, a pattern for aligning the stamp and the substrate is separately formed and measured by an optical method such that the relative position of the substrate and the stamp is used. Korean Patent Publication No. 1996-0002545 ("Electron Beam Lithography Apparatus and Multilayer Alignment Method Using The Same", 1996.01.26, Prior Art 1), Japanese Patent Publication No. 2006-216952 ("Alignment system for nanoimprint lithography and employing the same) Imprint lithography method ", 2006.08.17, prior art 2), Korean Patent Publication No. 2008-0054804 (" Method and apparatus for stamp alignment for nanoimprint lithography using resistance ", 2008.06.19, prior art 3), Korean patent Publication 2012-0001628 ("Multiple Patterning Lithography Using Spacer and Self-aligned Assist Patterns", 2012.01.04, prior art 4), and the like use an alignment scheme that uses a similar idea. More specifically, the prior art 1 performs alignment using an alignment mark coated with an electron beam resist, and the prior art 2 performs alignment using an element emitting electrons and an electrode measuring the same. In this case, a resistance alignment key having a different resistance value according to the contact position is formed on the stamp and the substrate, and the alignment is performed using the same. In the case of the prior art 4, the alignment is performed using the self-aligned assist pattern. It can be seen that all of the above prior arts are based on a similar idea by using a specific pattern for alignment.

However, the alignment method of the above method has a problem in that the device configuration or the process design is difficult, and the process time increases, and accordingly, economic disadvantages increase due to the increase of various costs. In addition, when the stamp is replaced, there is a problem that a uniform process cannot be made due to a shape error caused by a difference in thickness, size, etc. between the stamps, and there was also a need for a more stable stamp replacement process.

1. Korean Patent Publication No. 1996-0002545 ("Electron Beam Lithography Apparatus and Multi-Layer Alignment Method Using the Same", 1996.01.26) 2. Japanese Patent Application Laid-Open No. 2006-216952 ("Alignment system for nanoimprint lithography and an imprint lithography method employing the same", 2006.08.17) 3. Korean Patent Publication No. 2008-0054804 ("Method and apparatus for stamp alignment for nanoimprint lithography using resistance", 2008.06.19) 4. Korean Patent Publication No. 2012-0001628 ("Multiple Patterning Lithography Using Spacer and Self-aligned Assist Patterns", 2012.01.04)

Accordingly, the present invention has been made to solve the problems of the prior art as described above, the object of the present invention is a stamping device used in nanoimprint lithography, consisting of a polygonal pillar, etc. The present invention provides a stamping apparatus having a plurality of sides and a manufacturing method of the stamping apparatus having a body having a stamp formed on a side thereof, which facilitates alignment between stamps when imprinting a plurality of patterns with a plurality of stamps.

A stamping apparatus having a plurality of side surfaces of the present invention for achieving the above object is a stamping apparatus 100 used for imprint lithography, the cross section in a direction perpendicular to the central axis is a polygon It is formed in a shape and comprises a body 110 is formed on each side stamp, characterized in that the stamp is made to be replaced by the rotation of the body (110).

At this time, the body 110 is preferably formed in a shape in which a cross section perpendicular to the central axis forms a regular polygon. In addition, the body 110 is preferably a polygonal pillar shape or a polygonal pyramid shape.

In addition, the stamping device 100, the fixing portion 115 is formed to protrude from each of both ends in the direction of the central axis of the body 110, together with the body 110, corresponding to the fixing portion 115 A pair of fixing chucks 120 having a recessed portion formed therein and into which the fixing unit 115 is inserted; A rotation drive unit 130 connected to the fixing chuck 120 on one side to rotate the body 110; A linear drive unit 140 connected to the fixing chuck 120 on the other side to linearly move the fixing chuck 120 to adjust a gap between the fixing chucks 120; And further comprising:

At this time, the fixing portion 115 is formed in a tapered shape, the central axis is characterized in that disposed on the coaxial with the central axis of the body (110).

In addition, the stamp device 100 includes a rotation angle measuring unit 135 for measuring the rotation angle of the body 110; It is preferred to further comprise a.

In addition, the stamp device 100 includes a linear movement guide unit 145 for guiding the linear movement of the linear drive unit 140; It is preferred to further comprise a.

In addition, the stamp device 100 includes a base 150 to which the rotary drive unit 130 and the linear drive unit 140 is fixed and supported; It is preferred to further comprise a.

In addition, the stamp device 100 is provided to be connected to the base 150, and formed to surround at least one selected from the rotary drive unit 130 or the linear drive unit 140 to protect from the outside ( 155); It is preferred to further comprise a.

In addition, the manufacturing method of a stamping device having a plurality of side surfaces of the present invention, the body 110 is formed in a cross-sectional shape in a direction perpendicular to the central axis of the polygon forming a stamp on each side; A rotation driver 130 for rotating the body 110; Rotation angle measuring unit 135 for measuring the rotation angle of the body 110; A base 150 on which the rotation drive unit 130 is supported and fixed; In the manufacturing method of the stamp device 100, including a plurality of side surfaces formed in the replacement of the stamp is made by the rotation of the body 110 is used for imprint lithography, the body ( 110 is formed to have n sides (n is a natural number), a1) the processing apparatus such that the stamping apparatus 100 is parallel to the reference surface on the work table of the base 150 and the processing apparatus 200 Disposed at 200 (SA1); a2) the body 110 is rotated by the rotation driving unit 130 and the rotation angle measuring unit 135 to initialize the rotation position, and inputting 1 to the index number (i) (SA2); a3) the machining tool 250 of the processing apparatus 200 is moved in a direction parallel to the reference plane to process the side of the body 110, and adds 1 to the index number (i) (SA3); a4) determining whether the index number i is greater than n (SA4); a5) when the index number i is not greater than n (SA4-no), the body 110 is rotated by 360 / n ° by the rotation driving unit 130 and the rotation angle measuring unit 135 (SA5); a6) steps a3) to a5) are sequentially repeated; And a control unit.

At this time, the manufacturing method of the stamping device, b1) the stamping device 100, the step of being disposed on the polishing device 300 so that the reference surface on the work table of the base 150 and the polishing device 300 is parallel to (SB1); b2) the body 110 is rotated by the rotation driving unit 130 and the rotation angle measuring unit 135 to initialize the rotation position, and inputting 1 to the index number (i) (SB2); b3) a step in which the polishing tool 350 of the polishing apparatus 300 moves in a direction parallel to the reference plane to polish the side of the body 110 and adds 1 to the index number (i) (SB3); b4) determining whether the index number i is greater than n (SB4); b5) If the index number (i) is not greater than n (SB4-no), the body 110 is rotated by 360 / n ° by the rotation drive unit 130 and the rotation angle measuring unit 135 (SB5); b6) step b3) to step b5) are sequentially repeated; Characterized in that further comprises.

According to the present invention, there is a great effect to solve the alignment problem caused during stamp replacement during multiple imprint lithography much easier than in the prior art. More specifically, in the related art, since alignment is performed by using a separate alignment pattern when replacing a stamp, there is a problem in that a device configuration or a process design becomes complicated and process time increases. However, in the present invention, by using a stamp device having a plurality of sides made of a shape such as a polygonal pillar having a stamp formed on each side, so as to replace the stamp by simply rotating the body, There is a big effect that sorting can be done very easily without the need for a separate sorting operation.

In other words, according to the present invention, by improving the structure of the stamping device itself, the problem of positional displacement that may occur due to the replacement of a plurality of stamps is solved at the source, and a process requiring a plurality of stamps under more stable conditions is performed. There is a great effect that can be performed continuously (without process interruption). In particular, the stamp of the present invention can be easily applied to a multi-nanoimprint lithography process to be used by replacing a plurality of stamps, and of course, can greatly increase the process efficiency when applied.

1 is a stamp device of the present invention.
Figure 2 is a detailed view of the body of the stamp device of the present invention.
3 shows several embodiments of a body cross section of the stamp device of the present invention.
Figure 4 is a body mounting and detachment state of the stamp device of the present invention.
5 is a conceptual diagram of a processing method of the manufacturing method of the stamp device of the present invention.
Figure 6 is a body rotation step during processing of the manufacturing method of the stamp device of the present invention.
7 is a flow chart of a processing method of the manufacturing method of the stamp device of the present invention.
8 is a positional relationship between the body central axis and the stamp surface in the stamp device of the present invention.
9 is a conceptual diagram of a polishing method of the manufacturing method of the stamp device of the present invention.
10 is a flow chart of a polishing method of the manufacturing method of the stamp device of the present invention.

Hereinafter, a stamping apparatus having a plurality of side surfaces and a manufacturing method of the stamping apparatus according to the present invention having the configuration as described above will be described in detail with reference to the accompanying drawings.

First, the structure of the stamping apparatus which has a some side surface of this invention is demonstrated. 1 shows one embodiment of a stamping device of the invention, FIG. 2 shows a detailed view of the body of the stamping device of the invention, and FIG. 3 shows several embodiments of a body cross section of the stamping device of the invention. will be.

The stamp device 100 of the present invention is basically used for imprint lithography. Stamps used for imprint lithography have generally been made in the form of wafers or cylindrical rolls, which has been difficult to align when replacing stamps when multiple imprint lithography is required. Conventionally, a method of forming a separate alignment pattern for such alignment and recognizing the alignment operation is used. However, in the present invention, a stamp having an improved structure, which enables alignment in a radically different manner from the conventional method, is used. Present the device 100.

The stamp device 100 of the present invention, as shown in Figures 1 to 3, the body is formed in a cross-sectional shape in a direction perpendicular to the central axis (polygonal) to form a polygon, the stamp is formed on each side Comprising 110, characterized in that formed to be replaced by the stamp by the rotation of the body (110). That is, the body 110 is formed in a shape such as a polygonal pillar as shown in the lower portion of FIG. 1, so that stamps having different types of patterns are formed on the side portions of the polygonal pillar. (Of course, the patterns formed on each side may be different from each other, or some or all of them may be the same if necessary.)

The principle of performing multiple imprint lithography using the stamp device 100 of the present invention will be briefly described as follows. To perform an imprint process with a pattern of any one side of the body 110 (hereinafter referred to as a 'stamp face' because it is a surface on which a stamp is formed), and then to perform an imprint process with another pattern in place. In this case, it is only necessary to rotate the body 110 so that the side on which the desired pattern is formed is a working surface and then perform an imprint process. At this time, since the stamp pattern is replaced only by the rotation of the body 110 (rather than the replacement of the parts themselves), the cause of the position error (due to the replacement of parts) is essentially eliminated, thus separate alignment It is possible to easily align the pattern without performing the process for.

As described above, the stamp device 100 of the present invention has a shape such as a polygonal pillar, and includes the body 110 having a plurality of side surfaces, and stamps are formed on each side thereof, and only by the rotation of the body 110. By replacing the stamp pattern, it is possible to fundamentally solve the problem of position error occurring in the process of replacing the stamp itself to change the conventional pattern, the difficulty of the alignment work and the process time delay. Of course, accordingly, the process efficiency (ie, the production efficiency) can be dramatically improved. In addition, since the stamp device 100 of the present invention has a simple structure, the device itself can be designed and implemented very easily and inexpensively, so that the ultimate economic effect can be further maximized. do.

2 and 3 will be described in more detail with respect to the structure of the body 110 of the stamp device 100 of the present invention.

First of all, in the drawings, the body 110 has six side surfaces, but the present invention is not limited thereto. As described above, a stamp is formed on each side of the body 110 so that the stamp pattern can be replaced according to the rotation of the body 110. From this point of view, since the body 110 has more sides, it is possible to replace more types of patterns with a single device, the body 110 will be advantageous having more sides. However, in another aspect, since the area of each side itself decreases as the side surfaces of the body 110 increase, it is not always advantageous that the number of side surfaces of the body 110 is large. Therefore, the number of sides of the body 110 may be appropriately adjusted according to the process to be applied.

As described above, in order to replace the stamp by the rotation of the body 110, the body 110 should have a shape in which a cross section in a direction perpendicular to the central axis forms a regular polygon. That is, as shown in FIG. 3, the distance R k to the kth stamp face (kth stamp face, k is a natural number from 1 to n, n is the total number of sides) is equal to each other based on the central axis position. The relative angles θ k of each stamp surface are also the same. That is, the cross section of the body 110 may be a regular n-square. By doing so, even if the body 110 is rotated (since the distances R k from the center of the body to each stamp surface are all the same), a problem such as a process error occurring in accordance with a change in thickness or depth is essentially eliminated. An important condition here is that R k must all be the same. If only the center distance R k is the same and the relative angle θ k is different, no process error will occur due to the change in thickness or depth. However, in this case, the control of the rotation angle of the body 110 is more complicated, and the process design is also complicated because the area of each stamp surface is different from each other. In other words, it is not necessary to change the relative angle θ k unless the pattern to be finally formed by multiple imprint lithography is a very special case.

The body 110 is also most preferably formed in a polygonal column shape basically. Of course, the body 110 may be formed in a polygonal truncated cone shape (as shown in FIG. 8 to be described later), and in this case, it is only necessary to arrange the process surface and the stamp surface in parallel. However, in this case, the degree of pressing force may vary depending on the position, and thus pattern transfer may occur unevenly depending on the position. Therefore, unless it is a special case such as a case where the density of the pattern varies depending on the position, it is necessary to form a polygonal pyramid shape. none. In other words, it is most preferable that the body 110 is formed in a polygonal pillar shape.

As such, when the body 110 is formed in a regular polygonal shape having n stamp surfaces, when the stamp needs to be replaced, the body 110 is rotated 360 / n ° (or the desired pattern is the xth in the current pattern). If the pattern is rotated by 360x / n °), the pattern can be changed, thereby greatly simplifying the process design and control, thereby maximizing design and operation convenience.

The most important feature of the stamp apparatus 100 is the body 110 having a plurality of side surfaces and stamps formed on each side, that is, a plurality of stamp surfaces, as described above. Hereinafter, with reference to the embodiment as shown in Figure 1, it will be described with respect to another structure that can be made to operate the body 110 well.

As shown in FIG. 1, the stamp device 100 further includes a fixing unit 115 on the body 110, and also has a fixing chuck 120 and a rotation driving unit 130 in addition to the body 110. ), It is preferable that the linear drive unit 140 further comprises.

The fixing part 115 is formed to protrude from each of both ends in the direction of the central axis of the body 110. That is, the fixing part 115 is formed in one pair of the body 110. At this time, the fixing portion 115 is formed in a tapered shape, it is preferable that the central axis is arranged coaxially with the central axis of the body (110). That is, the fixing portion 115 is preferably in the shape of a truncated cone, such that the cross-sectional area is narrowed toward the outside, as shown in FIG.

The fixing chuck 120 is formed with a depression having a shape corresponding to the fixing portion 115 so that the fixing portion 115 is inserted. In this case, when the fixing part 115 is tapered, the fixing chuck 120 and the fixing part 115 may be located, even if the body 110 is initially placed in a partially displaced position. In the process of coupling is naturally the body 110 can be arranged to move to the correct position.

The rotation drive unit 130 is connected to the fixing chuck 120 on one side and serves to rotate the body 110. At this time, the stamp device 100 is preferably further provided with a rotation angle measuring unit 135 for measuring the rotation angle of the body 110. In the example of FIG. 1, the rotation angle measuring unit 135 is an example of a rotary encoder and is connected to the fixing chuck 120 on the other side, but the present invention is not limited thereto. If the rotation angle of 110 can be measured, the rotation angle measuring unit 135 may be modified in any other form.

The linear driving unit 140 is connected to the fixing chuck 120 on the other side to serve to adjust the distance between the fixing chuck 120 by linearly moving the fixing chuck 120. Figure 4 shows the body mounting and detachment state of the stamp device of the present invention. As shown in the upper part of FIG. 4, first, the linear driving unit 140 moves outward to widen the gap between the fixing chucks 120, and then the body between the fixing chucks 120. 110). Next, as shown in the lower portion of FIG. 4, when the linear driving unit 140 moves inward to narrow the gap between the fixing chucks 120, the fixing unit 115 is configured as described above. The body 110 may be naturally placed in position while being fitted into the depression of the fixing chuck 120. In addition, the stamp device 100 is preferably provided with a linear movement guide 145 for guiding the linear movement of the linear driver 140. 1 and 4 illustrate an example in which the linear movement guide 145 is formed of a rail and a block formed to be movable along the rail, but of course, the present invention is not limited thereto. If the linear movement of 120 can be stably guided, the linear movement guide 145 may be modified in any other form.

In addition, the stamp device 100 may further include a base 150 on which the rotation driving unit 130 and the linear driving unit 140 are supported and fixed. In addition, at this time, the protective cover 155 is further provided to be connected to the base 150 and formed to surround at least one selected from the rotation driving unit 130 or the linear driving unit 140 to isolate from the outside. It is desirable to be. Since the base 150 is provided, the configuration of the stamp device 100 may be stably maintained, and when the protective cover 155 is further provided, the process system and the stamp device may mutually be generated during the process. Contamination can be effectively prevented.

Hereinafter, the manufacturing method of such a stamping apparatus of the present invention, and more specifically, the manufacturing method of the body 110 will be described. In order to manufacture the body 110, it is necessary to stably fix the body 110, and also to rotate by a desired angle. Therefore, in the manufacturing method to be described below, the stamp device 100 is that the body 110, the rotation driving unit 130, the rotation angle measuring unit 135, the base 150 is basically included do. Of course, even at this time, the stamp device 100 further includes components such as the fixing part 115, the fixing chuck 120, the linear driving part 140, and the linear moving guide part 145 as described above. Of course, you can. In addition, as described above, the body 110 is formed to have n sides (n is a natural number).

5 is a conceptual view of a processing method of the manufacturing method of the stamping device of the present invention, Figure 6 is a body rotation step during processing of the manufacturing method of the stamping device of the present invention, Figure 7 is a processing of the manufacturing method of the stamping device of the present invention A flowchart of the method.

The processing of the stamping apparatus of the present invention will be described with reference to FIG. 7. First, as shown in FIG. 5, the stamp device 100 is disposed on the processing device 200 such that the reference surface on the work table of the base 150 and the processing device 200 is parallel to each other ( SA1). Next, a2) the body 110 is rotated by the rotation driving unit 130 and the rotation angle measuring unit 135 to initialize the rotation position, so that 1 is input to the index number k (SA2). . In this way, the preparation step for processing is completed.

Next, a3) the processing tool 250 of the processing apparatus 200 is moved in a direction parallel to the reference plane to process the side of the body 110, and 1 is added to the index number k (SA3). ). As shown in FIG. 5, when the stamp apparatus 100 is disposed on the processing apparatus 200, a reference surface of the base 150 and the processing apparatus 200 may be parallel to each other, and the processing may be performed. As the tool 250 moves in a direction parallel to the reference plane, the side of the body 110 is subsequently processed to be parallel to the base 150.

After processing of the k-th stamp surface is completed, a4) it is determined whether the index number k is larger than n (SA4). At this time, a5) when the index number k is not greater than n (SA4-no), the body 110 is rotated by 360 / n ° by the rotation driving unit 130 and the rotation angle measuring unit 135. Rotate (SA5). Thereafter, a6) steps a3) to a5) are repeatedly performed sequentially until the index number k becomes n. Figure 6 shows this repeating step. Subsequently, when the index number k becomes larger than n (SA4-Yes), it is determined that the processing of all the side surfaces of the body 110 is completed, and the processing is completed, and the stamp device 110 is processed into the processing apparatus. It is separated from the (200) (SA6).

Through this method of processing, the stamp surface of the stamp surface of the body 110 may be always parallel to the surface surface of the base 150. In particular, the body 110 can be made in this way as well as a polygonal pillar shape as well as a polygonal pyramid shape. 8 illustrates a positional relationship between a body central axis and a stamp surface in the stamping apparatus of the present invention, even when the body 110 is in the shape of a polygonal pyramid, as shown in FIG. The central axis is formed to be inclined with respect to the surface direction of the base 150, so that the stamp surface of the stamp surface and the base surface of the base 150 can be parallel. . (This also applies to the polishing method described later.)

9 is a conceptual diagram of a polishing method of the manufacturing method of the stamping apparatus of the present invention, and FIG. 10 is a flowchart of the polishing method of the manufacturing method of the stamping apparatus of the present invention. The polishing method also proceeds in the same manner as the processing method.

Referring to FIG. 10, a polishing process of the stamping apparatus of the present invention is described. A1) As shown in FIG. 9, the stamping apparatus 100 has a reference surface on a work table of the base 150 and the polishing apparatus 300. To be disposed in the polishing apparatus 300 to be parallel (SB1). Next, b2) the body 110 is rotated by the rotation driving unit 130 and the rotation angle measuring unit 135 to initialize the rotation position, so that 1 is input to the index number k (SB2). . Next, b3) the polishing tool 350 of the polishing apparatus 300 is moved in the direction parallel to the reference plane so that the side of the body 110 is polished, and 1 is added to the index number k (SB3). ). After polishing of the k-th stamp surface is completed, b4) it is determined whether the index number k is larger than n (SB4). In this case, b5) If the index number k is not greater than n (SB4-no), the body 110 is rotated by 360 / n ° by the rotation driving unit 130 and the rotation angle measuring unit 135. To rotate (SB5). Thereafter, steps b6) to b5) are sequentially repeated until the index number k becomes n. Thereafter, when the index number k becomes larger than n (SB4-Yes), it is determined that polishing of all sides of the body 110 is completed, and polishing is completed, and the stamp device 110 is polished. It is separated from the 300 (SB6).

It will be understood by those skilled in the art that various changes in form and details may be made therein without departing from the spirit and scope of the invention as defined by the appended claims. It goes without saying that various modifications can be made.

100: stamp device 110 of the present invention
115: fixing part 120: fixing chuck
130: rotation drive unit 135: rotation angle measurement unit
140: linear drive unit 145: linear movement guide
150: base 155: protective cover
200: processing device 250: processing tool
300: polishing apparatus 350: polishing tool

Claims (11)

A stamping apparatus 100 used for imprint lithography, comprising a body 110 having a cross section in a direction perpendicular to a central axis to form a polygon and having stamps formed on each side thereof. It is formed to replace the stamp by the rotation of the body 110,
The stamp device 100 is
Fixing portions 115 are formed at both ends of the body 110 in the direction of the central axis of the body 110 to protrude,
A pair of fixing chucks 120 in which depressions having a shape corresponding to the fixing portions 115 are formed, into which the fixing portions 115 are inserted;
A rotation drive unit 130 connected to the fixing chuck 120 on one side to rotate the body 110;
A linear drive unit 140 connected to the fixing chuck 120 on the other side to linearly move the fixing chuck 120 to adjust a gap between the fixing chucks 120;
Stamp device having a plurality of side surfaces, characterized in that comprises a.
The method of claim 1, wherein the body 110
A stamping device having a plurality of side surfaces, characterized in that the cross section in a direction perpendicular to the central axis is formed into a regular polygon.
The method of claim 1, wherein the body 110
Stamp device having a plurality of sides characterized in that the polygonal pillar shape or polygonal pyramidal shape.
delete The method of claim 1, wherein the fixing part 115
It is formed in a tapered shape, the central axis of the stamp device having a plurality of side, characterized in that disposed on the coaxial with the central axis of the body (110).
The method of claim 1, wherein the stamp device 100
Rotation angle measuring unit 135 for measuring the rotation angle of the body 110;
Stamp device having a plurality of sides characterized in that it further comprises.
The method of claim 1, wherein the stamp device 100
A linear movement guide 145 for guiding the linear movement of the linear driver 140;
Stamp device having a plurality of sides characterized in that it further comprises.
The method of claim 1, wherein the stamp device 100
A base 150 on which the rotation driver 130 and the linear driver 140 are supported and fixed;
Stamp device having a plurality of sides characterized in that it further comprises.
The method of claim 8, wherein the stamp device 100
A protective cover (155) connected to the base (150) and formed to surround at least one selected from the rotation driving unit (130) or the linear driving unit (140);
Stamp device having a plurality of sides characterized in that it further comprises.
A body 110 having a cross section in a direction perpendicular to the central axis to form a polygon, the stamp being formed on each side; A rotation driver 130 for rotating the body 110; Rotation angle measuring unit 135 for measuring the rotation angle of the body 110; A base 150 on which the rotation drive unit 130 is supported and fixed; In the manufacturing method of the stamp device 100, including a plurality of side surfaces formed in the replacement of the stamp is made by the rotation of the body 110 is used for imprint lithography, the body ( 110 is formed to have n sides (n is a natural number),
a1) the stamp device (100) is disposed on the processing device (200) such that the reference surface on the work table of the base (150) and the processing device (200) are parallel (SA1);
a2) the body 110 is rotated by the rotation driving unit 130 and the rotation angle measuring unit 135 to initialize the rotation position, and inputting 1 to the index number (i) (SA2);
a3) the machining tool 250 of the processing apparatus 200 is moved in a direction parallel to the reference plane to process the side of the body 110, and adds 1 to the index number (i) (SA3);
a4) determining whether the index number i is greater than n (SA4);
a5) when the index number i is not greater than n (SA4-no), the body 110 is rotated by 360 / n ° by the rotation driving unit 130 and the rotation angle measuring unit 135 (SA5);
a6) steps a3) to a5) are sequentially repeated;
The manufacturing method of the stamp apparatus which has a some side characterized by including the.
The method of claim 10, wherein the manufacturing method of the stamp device
b1) the step of placing the stamp device (100) on the polishing device (300) such that the reference surface on the work table of the base (150) and the polishing device (300) is parallel (SB1);
b2) the body 110 is rotated by the rotation driving unit 130 and the rotation angle measuring unit 135 to initialize the rotation position, and inputting 1 to the index number (i) (SB2);
b3) a step in which the polishing tool 350 of the polishing apparatus 300 moves in a direction parallel to the reference plane to polish the side of the body 110 and adds 1 to the index number (i) (SB3);
b4) determining whether the index number i is greater than n (SB4);
b5) If the index number (i) is not greater than n (SB4-no), the body 110 is rotated by 360 / n ° by the rotation drive unit 130 and the rotation angle measuring unit 135 (SB5);
b6) step b3) to step b5) are sequentially repeated;
The manufacturing method of the stamp device which has a some side characterized by including further.
KR1020120078580A 2012-07-19 2012-07-19 Stamp apparatus having multi-faces and making method for the stamp apparatus KR101214953B1 (en)

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Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005101201A (en) * 2003-09-24 2005-04-14 Canon Inc Nano-imprint system
JP2008284873A (en) * 2007-03-19 2008-11-27 Obducat Ab Nano-imprinting apparatus and method

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005101201A (en) * 2003-09-24 2005-04-14 Canon Inc Nano-imprint system
JP2008284873A (en) * 2007-03-19 2008-11-27 Obducat Ab Nano-imprinting apparatus and method

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