KR101203490B1 - A production method and production system for high purity hydrogen chloride - Google Patents

A production method and production system for high purity hydrogen chloride Download PDF

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KR101203490B1
KR101203490B1 KR1020110126071A KR20110126071A KR101203490B1 KR 101203490 B1 KR101203490 B1 KR 101203490B1 KR 1020110126071 A KR1020110126071 A KR 1020110126071A KR 20110126071 A KR20110126071 A KR 20110126071A KR 101203490 B1 KR101203490 B1 KR 101203490B1
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hydrogen
chlorine
hydrogen chloride
crude
high purity
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KR1020110126071A
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Korean (ko)
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이재건
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홍인화학 주식회사
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Priority to KR1020110126071A priority Critical patent/KR101203490B1/en
Priority to MYPI2013003145A priority patent/MY156181A/en
Priority to CN2012800029460A priority patent/CN103221336A/en
Priority to CN201610965803.XA priority patent/CN107021456A/en
Priority to AU2012321629A priority patent/AU2012321629B2/en
Priority to EP12830913.5A priority patent/EP2617678B1/en
Priority to CA2828446A priority patent/CA2828446C/en
Priority to JP2013538671A priority patent/JP5756180B2/en
Priority to MX2013009832A priority patent/MX347947B/en
Priority to SG2013064027A priority patent/SG192925A1/en
Priority to PCT/KR2012/001760 priority patent/WO2013054989A1/en
Priority to US13/825,089 priority patent/US20130259796A1/en
Priority to RU2013146601/05A priority patent/RU2592794C2/en
Priority to TW101110774A priority patent/TWI520906B/en
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Publication of KR101203490B1 publication Critical patent/KR101203490B1/en
Priority to IL228118A priority patent/IL228118A/en
Priority to US17/368,795 priority patent/US20210331919A1/en

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    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B7/00Halogens; Halogen acids
    • C01B7/01Chlorine; Hydrogen chloride
    • C01B7/07Purification ; Separation
    • C01B7/0706Purification ; Separation of hydrogen chloride
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B3/00Hydrogen; Gaseous mixtures containing hydrogen; Separation of hydrogen from mixtures containing it; Purification of hydrogen
    • C01B3/50Separation of hydrogen or hydrogen containing gases from gaseous mixtures, e.g. purification
    • C01B3/506Separation of hydrogen or hydrogen containing gases from gaseous mixtures, e.g. purification at low temperatures
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B3/00Hydrogen; Gaseous mixtures containing hydrogen; Separation of hydrogen from mixtures containing it; Purification of hydrogen
    • C01B3/50Separation of hydrogen or hydrogen containing gases from gaseous mixtures, e.g. purification
    • C01B3/56Separation of hydrogen or hydrogen containing gases from gaseous mixtures, e.g. purification by contacting with solids; Regeneration of used solids
    • C01B3/58Separation of hydrogen or hydrogen containing gases from gaseous mixtures, e.g. purification by contacting with solids; Regeneration of used solids including a catalytic reaction
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B7/00Halogens; Halogen acids
    • C01B7/01Chlorine; Hydrogen chloride
    • C01B7/07Purification ; Separation
    • C01B7/0743Purification ; Separation of gaseous or dissolved chlorine

Abstract

PURPOSE: A manufacturing method of high purity hydrogen chloride and a manufacturing system of the same are provided to directly react hydrogen chlorine to synthesize hydrogen chloride in a completely sealed drying technique and to remove excessive hydrogen from the hydrogen chloride in a distillation column. CONSTITUTION: A manufacturing method of high purity hydrogen chloride includes the following steps: refined hydrogen is generated by removing moisture and oxygen from crude hydrogen; refined chlorine is generated by removing moisture and oxygen from crude chlorine; the refined hydrogen and the refined chlorine are reacted to synthesize hydrogen chloride; and the synthesized hydrogen chloride is compressively cooled. [Reference numerals] (AA) Item; (BB) Raw materials; (CC) Raw material refinement; (DD) Synthesis; (EE) Refinement; (FF) Storage tank; (GG) Purity; (HH) Impurities

Description

고순도 염화수소 제조방법 및 제조 시스템{A PRODUCTION METHOD AND PRODUCTION SYSTEM FOR HIGH PURITY HYDROGEN CHLORIDE} High Purity Hydrogen Chloride Manufacturing Method and Production System {A PRODUCTION METHOD AND PRODUCTION SYSTEM FOR HIGH PURITY HYDROGEN CHLORIDE}

본 발명은 고순도 염화수소 제조방법 및 제조 시스템에 관한 것으로, 보다 상세하게는 ⅰ)원료인 조수소와 조염소를 99.999% 이상의 순도로 각각 정제하는 단계,; ⅱ)상기 정제된 수소와 염소를 1,200 내지 1,400℃ 범위의 온도에서 반응시켜 염화수소를 합성하되, 상기 수소는 염소에 비해 몰비로 과량으로 투입하는 단계,; ⅲ)상기 염화수소를 압축시켜 액상으로 변환하는 단계, 및 ⅳ)분별증류를 통해 염화수소의 정제 및 잉여 수소를 분리하는 단계를 포함한 고순도 염화수소 제조방법 및 제조 시스템에 관한 것이다. The present invention relates to a high-purity hydrogen chloride production method and production system, and more specifically, iii) purifying crude hydrogen and crude chlorine, each raw material with a purity of 99.999% or more; Ii) reacting the purified hydrogen with chlorine at a temperature in the range of 1,200 to 1,400 ° C. to synthesize hydrogen chloride, wherein the hydrogen is added in an excessive molar ratio relative to chlorine; Iii) converting the hydrogen chloride into a liquid phase, and iii) purifying hydrogen chloride and separating excess hydrogen through fractional distillation.

염화수소(HCl, Anhydrous hydrogen chloride)는 무수염산이라고도 불리우며 분자량 36.47, 상온상압 하에서는 기체 상태로 존재하며, 상압 -85℃에서 액화되는 화합물이다. 염화수소는 의약품 및 염료 중간체등 각종 화공약품 제조에 사용되며 고순도 염화수소는 반도체 제조공정에서 유용하게 사용되는 가스이다.Anhydrous hydrogen chloride (HCl), also called anhydrous hydrochloric acid, has a molecular weight of 36.47 and exists in a gaseous state at room temperature and normal pressure, and is a compound liquefied at atmospheric pressure of -85 ° C. Hydrogen chloride is used to manufacture various chemicals such as pharmaceuticals and dye intermediates, and high purity hydrogen chloride is a gas that is usefully used in semiconductor manufacturing processes.

본 명세서에서 상기 염화수소의 표현은 기상 또는 액상의 '무수염산'을 지칭하며, 염산은 상기 염화수소의 35 내지 37중량% 수용액을 말한다. 또한, 본 명세서에서 특별한 언급이 없는 한 '고순도 염화수소'는 3N급 이상, 일반적으로 3N ~ 6N(99.9% ~99.9999%)급의 염화수소를 지칭하며, ‘조수소’ 및 ‘조염소’의 표현은 정제되기 전의 수소(crude H2) 및 염소(crude Cl2)를 의미하고, ‘수소’ 및 ‘염소’의 표현은 정제된 수소 및 염소나 혼합물 중 수소 및 염소 원소를 의미한다. In the present specification, the expression of hydrogen chloride refers to 'hydrochloric acid' in a gaseous or liquid state, and hydrochloric acid refers to an aqueous solution of 35 to 37% by weight of the hydrogen chloride. In addition, unless specified otherwise in this specification, 'high purity hydrogen chloride' refers to hydrogen chloride of 3N or more, generally 3N ~ 6N (99.9% ~ 99.9999%) grade, the expression of 'hydrogen hydrogen' and 'hydrochlorine' Means hydrogen (crude H2) and chlorine (crude Cl2) before purification, and the expressions 'hydrogen' and 'chlorine' refer to purified hydrogen and chlorine or hydrogen and chlorine elements in the mixture.

염화수소의 합성은 통상 소금물의 전기분해로 생성된 조염소(crude Cl2)와 조수소(crude H2)를 1,200~1,300℃의 고온에서 반응시켜 이루어진다.The synthesis of hydrogen chloride is usually made by reacting crude chlorine (crude Cl 2 ) and crude hydrogen (crude H 2 ) generated by electrolysis of brine at a high temperature of 1,200 ~ 1,300 ° C.

H2 + Cl2---> 2HCl + 44,000Kcal-----①H 2 + Cl 2 ---> 2HCl + 44,000Kcal ----- ①

이 반응에서 얻어진 HCl 가스를 냉각하여 물에 흡수시키면 35~37%의 염산을 생산하게 된다. 기존의 무수염산 제조는 습식법으로서 35~37% 염산을 증발관에서 가열시켜 염화수소 가스를 발생시키고 이것을 탈수. 건조. 정제 냉각 시킨 후 압축 냉각해서 액화 염화수소를 제조하는 방식으로, 고온에서 염산을 취급함에 따라 장치의 유지 보수비용과 다량의 스팀이 소요되는 문제점을 안고 있다.Cooling and absorbing the HCl gas obtained in this reaction in water produces 35-37% hydrochloric acid. Conventional hydrochloric acid production is a wet method, heating 35-37% hydrochloric acid in an evaporation tube to generate hydrogen chloride gas, which is dehydrated. dry. After cooling the tablet and compressing cooling to produce liquefied hydrogen chloride, there is a problem that the maintenance cost and a large amount of steam is required as the hydrochloric acid is handled at a high temperature.

반응식 ①에서 생성된 HCl 가스를 압축하여 냉각시킬 수만 있다면 한결 간편하게 무수염화수소를 생산할 수 있을 것이다. 그러나, 보통 소금물 전기분해공정에서 발생하는 조수소(crude H2)에는 다량의 수분이 함유되어있고, 일반 전해조에서 생산된 조염소(crude Cl2) 중에는 산소(O2), 질소(N2), 탄산가스(CO2), 수분(H2O) 및 금속성분 등이 포함된 순도 99.8% 정도이다. 이들 불순물중 염화수소 압축 및 액화공정에 방해가 되는 것은 수분과 산소로서 수분은 직접적으로, 산소는 염화수소 합성과정에서 물로 바뀌어 압축기 등의 설비가동을 어렵게 한다. 따라서, 원료 중 수분과 산소만 제거하면 염화수소의 압축기사용에는 문제가 없어 3N급 이하의 저순도의 염화수소제조가 가능하다. 그런데, 반도체용 고순도 염화수소(99.999% 이상)의 제조를 위해서는 수분과 산소뿐만 아니라 기타 불순물도 제거해야 하는데, 특히 탄산가스는 일단 염화수소가스와 섞이면 분리가 거의 불가능하다.If the HCl gas produced in Scheme ① can be compressed and cooled, it will be easier to produce anhydrous hydrogen chloride. However, the crude hydrogen (crude H2) that is usually generated in the electrolysis process of brine contains a large amount of water, and the crude chlorine (crude Cl 2 ) produced in the general electrolytic cell contains oxygen (O 2 ), nitrogen (N 2 ), It is about 99.8% pure containing carbon dioxide (CO 2 ), moisture (H 2 O), and metals. Among these impurities, the hydrogen chloride compression and liquefaction process is hindered by water and oxygen, and the water is directly converted into oxygen, and the oxygen is converted into water during the hydrogen chloride synthesis process, making it difficult to operate equipment such as a compressor. Therefore, if only moisture and oxygen are removed from the raw materials, there is no problem in the use of the compressor of hydrogen chloride, and thus it is possible to manufacture hydrogen chloride with a low purity of 3N or lower. However, in order to manufacture high purity hydrogen chloride (99.999% or more) for semiconductors, it is necessary to remove not only moisture and oxygen but also other impurities. In particular, carbon dioxide gas is almost impossible to be separated once mixed with hydrogen chloride gas.

따라서 본 발명이 이루고자하는 과제는 고순도 염화수소를 제조함에 있어서염산으로부터 출발하는 기존의 습식 공정을 대체할 수 있는 보다 간편하고 경제적인 건식 고순도 염화수소 제조방법 및 시스템을 제공하는 것이다.Accordingly, an object of the present invention is to provide a simpler and more economical method for producing dry high purity hydrogen chloride which can replace the existing wet process starting from hydrochloric acid in producing high purity hydrogen chloride.

상기 기술적 과제를 해결하기 위하여, 본 발명은 ⅰ)원료인 조수소와 조염소를 99.999% 이상의 순도로 각각 정제하는 단계,; ⅱ)상기 정제된 수소와 염소를 1,200 내지 1,400℃ 범위의 온도에서 반응시켜 염화수소를 합성하되, 상기 수소는 염소에 비해 몰비로 과량으로 투입하는 단계,; ⅲ)상기 염화수소를 압축시켜 액상으로 변환하는 단계, 및 ⅳ)분별증류를 통해 염화수소의 정제 및 잉여 수소를 분리하는 단계를 포함한 고순도 염화수소 제조방법을 제공한다.In order to solve the above technical problem, the present invention comprises the steps of: i) purifying crude hydrogen and crude chlorine, respectively, with a purity of 99.999% or more; Ii) reacting the purified hydrogen with chlorine at a temperature in the range of 1,200 to 1,400 ° C. to synthesize hydrogen chloride, wherein the hydrogen is added in an excessive molar ratio relative to chlorine; Iii) compressing the hydrogen chloride to convert it into a liquid phase, and iii) purifying hydrogen chloride through fractional distillation and separating excess hydrogen.

또한, 본 발명은 상기 수소의 정제는 소금물 전기분해공정에서 나오는 95 내지 96% 수준의 조수소를 촉매 및 흡착제를 사용하여 수분과 산소를 제거하는 단계를 포함하고, 상기 조염소의 정제는 조염소 가스를 1차 흡착으로 수분을 제거하고 1차 저온증류로 금속성분을 제거 후 2차 저온증류에서는 가스성분을 제거하여 수행된 것임을 특징으로 하는 고순도 염화수소 제조방법을 제공한다.In addition, the present invention is the purification of hydrogen includes the step of removing water and oxygen using a catalyst and an adsorbent of 95 to 96% level of hydrogen from the brine electrolysis process, the purification of the crude chlorine It provides a high-purity hydrogen chloride production method characterized in that the removal of the water by the first adsorption of the gas and the removal of the metal component by the first low temperature distillation to remove the gas component in the second low temperature distillation.

또한, 본 발명은 상기 수소가 염소에 비해 몰비로 10 내지 20몰% 범위의 과량으로 투입되는 것을 특징으로 하는 고순도 염화수소 제조방법을 제공한다.In addition, the present invention provides a high-purity hydrogen chloride production method characterized in that the hydrogen is added in an excess of 10 to 20 mol% in molar ratio compared to chlorine.

또한, 본 발명은 각각 99.999% 이상의 순도로 정제된 수소 및 염소 공급관과,; 상기 수소 및 염소 공급관에서 공급된 수소와 염소를 반응시켜 염화수소를 합성하는 반응기와,; 상기 염화수소를 압축하여 액화시키는 압축기 및; 분별증류를 통해 상기 염화수소의 정제 및 미반응 수소의 분리제거를 위한 증류탑을 포함한 고순도 염화수소 제조 시스템을 제공한다.In addition, the present invention is a hydrogen and chlorine supply pipe purified with a purity of 99.999% or more, respectively; A reactor for synthesizing hydrogen chloride by reacting hydrogen and chlorine supplied from the hydrogen and chlorine supply pipes; A compressor for compressing and liquefying the hydrogen chloride; Fractional distillation provides a high purity hydrogen chloride production system including a distillation column for purification of the hydrogen chloride and separation and removal of unreacted hydrogen.

또한, 본 발명은 상기 압축기의 전방 또는 후방에 냉각장치가 더 부가된 것을 특징으로 하는 고순도 염화수소 제조 시스템을 제공한다.In addition, the present invention provides a high-purity hydrogen chloride production system characterized in that the cooling device is further added to the front or rear of the compressor.

또한, 본 발명은 상기 압축기 또는 증류탑이 2단 이상의 다단으로 구성된 것을 특징으로 하는 고순도 염화수소 제조 시스템을 제공한다.The present invention also provides a high-purity hydrogen chloride production system, characterized in that the compressor or distillation column is composed of two or more stages.

또한, 본 발명은 상기 반응기에서 도출된 염화수소를 압축하지 않고 초순수에 용해하여 염산으로 제조하는 냉각 흡수탑을 더 포함한 고순도 염화수소 제조 시스템을 제공한다.In another aspect, the present invention provides a high-purity hydrogen chloride production system further comprising a cooling absorption tower that is dissolved in ultrapure water without compression to produce hydrochloric acid.

또한, 본 발명은 상기 염소 공급관 앞에는 상기 염소의 정제를 위한 것으로, 조염소 가스에서 수분을 제거하기 위한 흡착관과, 금속성분을 제거하기 위한 1차 저온 증류관과, 상기 1차 저온 증류관에서 증류된 염소를 냉각하기 위한 냉각기 및 가스 성분을 제거하기 위한 2차 저온 증류관을 포함한 염소정제 시스템을 더 포함한 것을 특징으로 하는 고순도 염화수소 제조 시스템을 제공한다.In addition, the present invention is for the purification of the chlorine in front of the chlorine supply pipe, the adsorption tube for removing water from the crude chlorine gas, the primary low-temperature distillation tube for removing metal components, and the primary low-temperature distillation tube Provided is a high purity hydrogen chloride production system further comprising a chlorine purification system including a cooler for cooling the distilled chlorine and a secondary low temperature distillation tube for removing gas components.

본 발명의 염화수소 제조방법 및 제조 시스템은 완전 밀폐형 건식 공법으로 수소와 염소를 직접 반응시켜 염화수소를 합성한 후 곧바로 압축 냉각시키고 간단한 증류탑에서 잉여 수소 등을 제거함으로서 아주 간편하게 3N~6N까지의 고순도 염화수소를 제조할 수 있으며, 기존 공법에 비하여 공정이 단순하고 자동화가 용이하며 에너지 사용량 또한 획기적으로 줄일 수 있다.Hydrogen chloride production method and production system of the present invention is a completely hermetic dry method by directly reacting hydrogen and chlorine to synthesize hydrogen chloride immediately after compression cooling and removal of excess hydrogen, etc. in a simple distillation column is very easy to remove high purity hydrogen chloride up to 3N ~ 6N It can be manufactured, compared to the existing method, the process is simpler, easier to automate, and the energy consumption can be drastically reduced.

도 1은 본 발명의 고순도 염화수소 제조 시스템의 일예를 도시한 이해도
도 2는 원료 조염소 가스에서 불순물을 제거하기 위한 염소 정제 시스템의 예시도
1 is an understanding showing an example of a high purity hydrogen chloride production system of the present invention
2 is an illustration of a chlorine purification system for removing impurities from raw crude chlorine gas

이하에서 본 명세서에 첨부된 도면을 참조하여 본 발명을 상세히 설명한다. Hereinafter, the present invention will be described in detail with reference to the accompanying drawings.

본 발명의 고순도 염화수소 제조방법은 ⅰ)원료인 조수소와 조염소를 99.999% 이상의 순도로 각각 정제하는 단계,; ⅱ)상기 정제된 수소와 염소를 1,200 내지 1,400℃ 범위의 온도에서 반응시켜 염화수소를 합성하되, 상기 수소는 염소에 비해 몰비로 과량으로 투입하는 단계,; ⅲ)상기 염화수소를 압축시켜 액상으로 변환하는 단계, 및 ⅳ)분별증류를 통해 염화수소의 정제 및 잉여 수소를 분리하는 단계를 포함한다. The high purity hydrogen chloride production method of the present invention comprises the steps of: i) purifying crude hydrogen and crude chlorine as raw materials, each having a purity of 99.999% or more; Ii) reacting the purified hydrogen with chlorine at a temperature in the range of 1,200 to 1,400 ° C. to synthesize hydrogen chloride, wherein the hydrogen is added in an excessive molar ratio relative to chlorine; Iii) converting the hydrogen chloride into a liquid phase, and iii) purifying hydrogen chloride and separating excess hydrogen through fractional distillation.

전술한 바와 같이, 소금물 전기분해공정에서 나오는 조수소(crude H2) 가스는 95 내지 96% 수준의 순도에 불과하며, 일반 전해조에서 생산된 조염소(crude Cl2)에는 산소(O2), 질소(N2), 탄산가스(CO2), 수분(H2O) 및 금속성분 등이 포함된 순도 99.8% 정도다. 본 발명에서는 상기 수소에 대하여 촉매 및 흡착제를 사용하여 수분과 산소를 제거하여 순도 99.9999% 이상으로 할 수 있다. 도 2는 원료 조염소 가스에서 불순물을 제거하기 위한 염소 정제 시스템의 예시도이다. 도 2에서 볼 수 있는 바와 같이, 상기 염소 정제 시스템은 조염소 가스에서 수분의 제거를 위한 흡착관과, 금속성분을 제거하기 위한 1차 저온 증류관과, 상기 1차 저온 증류관에서 증류된 염소를 냉각하기 위한 냉각기 및 가스 성분을 제거하기 위한 2차 저온 증류관을 포함한다. 상기 염소정제 시스템을 이용하여 99% 내지 99.9% 수준의 조염소 가스는 흡착관을 통과시키며 수분을 제거하고 1차 저온증류 (온도 -25℃ ~ 15℃)로 철, 크롬, 니켈 등 금속성분을 제거 후 2차 저온증류(온도 -35℃ ~ 5℃)에서는 탄산가스, 질소, 산소 등 가스성분을 제거하여 순도 99.9999% 이상을 만들 수 있다. As described above, the crude hydrogen (crude H2) gas from the brine electrolysis process is only 95 to 96% purity, and the crude chlorine (crude Cl 2 ) produced in the general electrolytic cell contains oxygen (O 2 ) and nitrogen. (N 2 ), carbon dioxide (CO 2 ), water (H 2 O) and a metal component containing a purity of about 99.8%. In the present invention, the hydrogen and oxygen may be removed using a catalyst and an adsorbent with respect to the hydrogen to have a purity of 99.9999% or more. 2 is an illustration of a chlorine purification system for removing impurities from raw crude chlorine gas. As can be seen in Figure 2, the chlorine purification system is the adsorption tube for the removal of water from the crude chlorine gas, the primary low-temperature distillation tube for removing metal components, the chlorine distilled in the primary low-temperature distillation tube And a second low temperature distillation tube for removing the gas component and a cooler for cooling the gas. Using the chlorine purification system, the crude chlorine gas of 99% to 99.9% passes through the adsorption tube, removes moisture, and removes metal components such as iron, chromium, and nickel at the first low temperature distillation (temperature -25 ° C to 15 ° C). After removal, the secondary low temperature distillation (temperature -35 ℃ ~ 5 ℃) can make more than 99.9999% purity by removing gaseous components such as carbon dioxide, nitrogen and oxygen.

도 1은 본 발명의 고순도 염화수소 제조 시스템의 일예를 도시한 이해도이다. 도 1에 나타난 바와 같이, 본 발명의 고순도 염화수소 제조 시스템은 각각 99.999% 이상의 순도로 정제된 수소 및 염소을 공급하는 수소 및 염소 공급관과,; 상기 수소 및 염소 공급관에서 공급된 수소와 염소를 반응시켜 염화수소를 합성하는 반응기와,; 상기 염화수소를 압축하여 액화시키는 압축기 및; 분별증류를 통해 상기 액화된 염화수소의 정제 및 미반응 수소의 분리제거를 위한 증류탑을 포함한다. 1 is an understanding showing an example of a high purity hydrogen chloride production system of the present invention. As shown in Fig. 1, the high purity hydrogen chloride production system of the present invention comprises: a hydrogen and chlorine supply pipe for supplying purified hydrogen and chlorine with a purity of 99.999% or more, respectively; A reactor for synthesizing hydrogen chloride by reacting hydrogen and chlorine supplied from the hydrogen and chlorine supply pipes; A compressor for compressing and liquefying the hydrogen chloride; Distillation column for the purification of the liquefied hydrogen chloride and the separation and removal of unreacted hydrogen through fractional distillation.

또한, 본 발명의 고순도 염화수소 제조 시스템은 상기 염소공급관 앞에는 상기 염소의 정제를 위한 것으로, 99.8% 순도의 염소가스에서 수분의 제거를 위한 흡착관과, 금속성분을 제거하기 위한 1차 저온 증류관과, 상기 1차 저온 증류관에서 증류된 염소를 냉각하기 위한 냉각기 및 가스 성분을 제거하기 위한 2차 저온 증류관을 포함한 염소 정제 시스템을 더 포함할 수 있다. 상기 염소 정제 시스템은 본 발명의 염화수소 제조 시스템과 in-line으로 연결하여 사용할 수도 있고, 별도의 시스템으로 존재하여 고순도의 정제된 염소를 탱크에 따로 보관하여 염화수소 제조 시스템에 공급할 수도 있다.In addition, the high-purity hydrogen chloride production system of the present invention is for the purification of the chlorine in front of the chlorine supply pipe, the adsorption tube for the removal of water in chlorine gas of 99.8% purity, and the first low temperature distillation tube for removing metal components and The chlorine purification system may further include a cooler for cooling the chlorine distilled in the first low temperature distillation tube and a second low temperature distillation tube for removing gas components. The chlorine purification system may be used in-line with the hydrogen chloride production system of the present invention, or may exist as a separate system to store purified chlorine of high purity in a tank and supply it to the hydrogen chloride production system.

본 발명의 고순도 염화수소 제조 시스템에 있어서, 원료인 염소와 수소는 FCV(유량 비례 콘트롤 밸브)에 의해 조절되며 수소는 이론 량 대비 10~20몰% 범위 내에서 과량을 유지했다. 상기 수소와 염소의 반응에 있어서 상기 수소는 염소에 비해 과량으로 첨가하는 것이 바람직하다. 수소와 염소의 반응으로 염화수소를 제조하는 반응은 이론상 1:1의 mol 비로 반응시켜야 하나, 미반응 출발물질로서 염소가 잔존하는 경우 염화수소와의 분리가 쉽지 않고 염소의 독성으로 인해 반응 시스템의 손상을 초래할 우려가 있기 때문이다. 따라서, 수소와 염소의 반응시 상기 수소는 염소에 비해 10mol% 내지 20mol% 범위로 과량이 되도록 하는 것이 바람직하다. In the high-purity hydrogen chloride production system of the present invention, chlorine and hydrogen as raw materials are controlled by FCV (flow proportional control valve), and hydrogen is maintained in an excess of 10 to 20 mol% relative to the theoretical amount. In the reaction of hydrogen and chlorine, the hydrogen is preferably added in excess of chlorine. The reaction for producing hydrogen chloride by the reaction of hydrogen and chlorine should theoretically be carried out in a mol ratio of 1: 1, but if chlorine remains as an unreacted starting material, separation from hydrogen chloride is not easy and damage of the reaction system due to chlorine toxicity This is because there is a risk of causing. Therefore, the hydrogen is preferably in an excess of 10 mol% to 20 mol% relative to chlorine in the reaction of hydrogen and chlorine.

상기 반응기는 고온하에서 원료인 염소나 염화수소에 영향을 받지 않는 재질인 그라파이트(Graphite)로 만들고, 압축기는 염화수소에 견딜 수 있는 특수 재질로 된 것이 바람직하다. 상기 압축기는 왕복동식으로 2단 또는 그 이상의 다단 압축기인 것이 바람직하다. 또한, 압축효율을 높이기 위하여 상기 압축기의 전방 또는 후방에 냉각장치가 더 부가되는 것이 바람직하다. 반응기의 운전온도는 1,200 내지 1,400℃ 범위에서 운전되며, 바람직하게는 1,300±50℃를 유지하는데, 상기 온도를 유지하기 위해 먼저 수소를 공기로 연소시켜 가열하며 이 때 생긴 수분은 합성초기 생성된 HCl가스가 흡수하여 염산으로 제거했다. 초기 반응 후 반응기의 온도는 반응열에 의해 유지될 수 있다. The reactor is made of graphite (Graphite) is a material that is not affected by the raw material chlorine or hydrogen chloride at high temperature, the compressor is preferably made of a special material that can withstand hydrogen chloride. Preferably, the compressor is a reciprocating two-stage or more multistage compressor. In addition, it is preferable that a cooling device is further added to the front or rear of the compressor in order to increase the compression efficiency. The operating temperature of the reactor is operated in the range of 1,200 to 1,400 ° C., and preferably maintained at 1,300 ± 50 ° C., in order to maintain the temperature, hydrogen is first combusted by heating with air, and the moisture generated from the reaction is generated in the initial stage of synthesis. The gas was absorbed and removed with hydrochloric acid. After the initial reaction, the temperature of the reactor can be maintained by the heat of reaction.

반응 후 잉여 수소의 일부는 냉각장치(Chiller)를 거치기 전후에서 적당히 배출(Vent)시켜 냉각 효율을 높여주고 일단 액화된 염화수소는 분별증류를 통해 상기 액화된 염화수소에서 금속성분 등을 제거하는 정제 및 미반응 수소를 추가로 분리제거하게 된다. 이렇게 다단 증류탑을 통과시켜 상단에서 수소 등 일부 잔여 불순물을 제거하여 6N 이상의 고순도 염화수소를 생산할 수 있다. 액화시킨 염화수소 중에는 분압에 의해 미량의 수소가 포함되며 사용공정에 따라 수소가 불순물로 작용할 수 있기 때문에 일단 액화된 염화수소를 증류탑에서 저온 증류시켜 잔여 수소를 완전히 제거시키는 것이 바람직하기 때문이다. 본 발명의 고순도 염화수소 제조 시스템에 있어서, 상기 압축기 또는 증류탑은 효율을 위하여 2단 이상의 다단으로 구성되는 것이 바람직하다. 상기 증류탑에서 분별증류를 거친 염화수소는 정제된 액상 염화수소를 저장하는 염화수소 탱크(30)에 저장되게 된다.After the reaction, some of the surplus hydrogen is vented appropriately before and after passing through the chiller to increase the cooling efficiency, and once liquefied hydrogen chloride is removed from the liquefied hydrogen chloride through fractional distillation to remove metals and the like. The reaction hydrogen is further separated off. Through this multi-stage distillation column, some residual impurities such as hydrogen may be removed from the top to produce high purity hydrogen chloride of 6N or more. This is because the liquefied hydrogen chloride contains a small amount of hydrogen by partial pressure, and hydrogen may act as an impurity depending on the process of use, so it is preferable to completely distill the liquefied hydrogen chloride in a distillation column to completely remove residual hydrogen. In the high purity hydrogen chloride production system of the present invention, the compressor or distillation column is preferably composed of two or more stages for efficiency. Hydrogen chloride that has been fractionated in the distillation column is stored in the hydrogen chloride tank 30 for storing the purified liquid hydrogen chloride.

또한, 본 발명의 고순도 염화수소 제조 시스템은 경제성을 재고시키기 위하여 합성가스를 액화시키기 전에 일정 부분을 초순수에 용해시켜 5N(99.999%) 이상의 고순도 37~38% 염산을 생산할 수 있도록 냉각 흡수탑을 더 포함할 수 있다. In addition, the high-purity hydrogen chloride production system of the present invention further includes a cooling absorption tower to produce a high purity 37-38% hydrochloric acid of 5N (99.999%) or more by dissolving a portion of the ultra-pure water before liquefying the synthesis gas in order to reconsider economy. can do.

이때, 원료 및 제품의 정제정도에 따라 3N(99.9%)~6N(99.9999%)의 염화수소 또는 염산을 생산할 수 있으며, 기존 습식방법에 비하여 공정이 단순하고 에너지수요를 획기적으로 줄일 수 있다.In this case, 3N (99.9%) to 6N (99.9999%) of hydrogen chloride or hydrochloric acid may be produced according to the degree of purification of raw materials and products, and the process may be simpler and energy demand may be drastically reduced than conventional wet methods.

이하에서 본 발명의 실시예를 통해 본 발명에 대해 더욱 상세히 설명한다. 다만, 하기 실시예는 본 발명의 이해를 돕기 위한 것일 뿐 본 발명이 하기 실시예로 제한되는 것은 아니다.
Hereinafter, the present invention will be described in more detail with reference to the following examples. However, the following examples are merely to help the understanding of the present invention is not limited to the following examples.

실시예Example

본 발명의 실시예에서는 사전에 정제한 고순도 수소와 염소를 반응시키는 반응기(10)와, 상기 반응기를 통해 반응된 염화수소 가스를 냉각 및 압축하는 압축기(20)와, 상기 압축기를 거친 염화수소를 냉각하는 냉각장치(21)와, 상기 압축기를 통과한 염화수소를 순수(De-Ionized Water)에 용해하여 고순도의 염산으로 제조하여 저장하는 염산탱크(60)와, 상기 압축기에서 액화된 염화수소를 저온 분별증류하여 미반응 수소 등을 제거하는 2단계 증류탑(즉, 제1증류탑(40)과 제2증류탑(50)) 및 상기 증류탑에서 정제된 액상 염화수소를 저장하는 염화수소 탱크(30)를 포함한 고순도 염화수소 제조 시스템을 이용하여 염화수소를 제조하였다. 우선, 수소와 염소는 각각 시간당 약 80 및 70㎥/hr 수준으로 수소의 몰비가 염소에 비해 약 15% 과량으로 반응기에 투입되었고, 반응기는 약 1,300℃를 유지하도록 하였다. 합성된 염화수소는 압축기에서의 출구 온도가 약 160 내지 165℃ 정도였고, 냉각장치를 이용하여 영하 20℃ 정도로 냉각하여 액화시켰으며, 증류탑을 거치면서 약 영하 40℃까지 냉각되었다. In the embodiment of the present invention, the reactor 10 for reacting the previously purified high-purity hydrogen and chlorine, the compressor 20 for cooling and compressing the hydrogen chloride gas reacted through the reactor, and for cooling the hydrogen chloride through the compressor Cooling apparatus 21, a hydrochloric acid tank 60 for dissolving hydrogen chloride passed through the compressor in de-ionized water to produce and store hydrochloric acid with high purity, and fractional distillation of hydrogen chloride liquefied in the compressor. A high-purity hydrogen chloride production system including a two-stage distillation column (ie, a first distillation column 40 and a second distillation column 50) for removing unreacted hydrogen and the like, and a hydrogen chloride tank 30 storing liquid hydrogen chloride purified from the distillation column. Hydrogen chloride was prepared. First, hydrogen and chlorine were introduced into the reactor at a molar ratio of about 15% relative to chlorine at a level of about 80 and 70 m 3 / hr, respectively, and the reactor was maintained at about 1,300 ° C. The synthesized hydrogen chloride had an outlet temperature of about 160 to 165 ° C. in the compressor, liquefied by cooling to about −20 ° C. using a cooling device, and cooled to about −40 ° C. through a distillation column.

하기 표 1은 본 발명에서 원료인 조수소와 조염소, 정제후의 수소와 염소, 반응기, 압축기 및 증류탑에서 정제된 후의 염화수소의 순도와 불순물을 정량한 결과를 정리한 것이고, 하기 표 2는 본 발명의 고순도 염화수소 제조 시스템을 이용하여 제조된 염화수소를 냉각 흡수탑을 통해 수용액 상태로 제조한 염산의 순도 및 불순물을 정량한 결과를 정리한 것이다. 하기 표 1 및 표 2에서 볼 수 있는 바와 같이, 본 발명의 고순도 염화수소 제조 시스템을 이용하여 제조한 염화수소는 5N 내지 6N(99.999 내지99.9999%)이상의 순도를 갖는 것을 알 수 있다.Table 1 summarizes the results of quantifying purity and impurities of hydrogen chloride and crude chlorine as raw materials in the present invention, purified hydrogen and chlorine after purification, reactors, compressors, and distillation towers, and Table 2 below. The results of quantifying the purity and impurity of hydrochloric acid prepared by using a high purity hydrogen chloride production system of the hydrochloric acid prepared in an aqueous solution state through a cooling absorption tower. As can be seen in Table 1 and Table 2, it can be seen that the hydrogen chloride prepared using the high purity hydrogen chloride production system of the present invention has a purity of 5N to 6N (99.999 to 99.9999%) or more.

구 분division 원 료Raw material 원료정제Raw Material Purification 합 성synthesis 정 제refine 저장탱크Storage tank crude H2 crude H 2 crude Cl2 crude Cl 2 H2 H 2 Cl2 Cl 2 HClHCl HClHCl HClHCl 순 도Purity 95%~96%95%-96% 99.8%99.8% 99.999%99.999% 99.9995%99.9995% 99.995%99.995% 99.999%~99.9999%99.999% to 99.9999% 99.999%~99.9999%99.999% to 99.9999% 불순물impurities O2 O 2 ≤10ppm≤10ppm ≤500ppm≤500ppm ≤2ppm≤2ppm ≤0.5ppm≤0.5ppm ≤1ppm≤1 ppm ≤1ppm≤1 ppm ≤1ppm≤1 ppm N2 N 2 -- ≤1ppm≤1 ppm ≤1ppm≤1 ppm ≤1ppm≤1 ppm ≤1ppm≤1 ppm ≤1ppm≤1 ppm COCO -- ≤1ppm≤1 ppm ≤0.5ppm≤0.5ppm ≤0.5ppm≤0.5ppm ≤0.5ppm≤0.5ppm ≤0.5ppm≤0.5ppm CO2 CO 2 -- ≤1ppm≤1 ppm ≤0.5ppm≤0.5ppm ≤0.5ppm≤0.5ppm ≤1ppm≤1 ppm ≤1ppm≤1 ppm CH4 CH 4 -- ≤1ppm≤1 ppm ≤0.5ppm≤0.5ppm ≤1ppm≤1 ppm -- -- H2OH 2 O ≤40,000ppm≤40,000ppm ≤5ppm≤5ppm ≤4ppm≤4ppm ≤1ppm≤1 ppm ≤1ppm≤1 ppm ≤1ppm≤1 ppm ≤1ppm≤1 ppm

구 분division 37% HCl Mixing37% HCl Mixing 37%HCl 저장탱크37% HCl Storage Tank HClHCl DI WaterDI Water 37% HCl37% HCl 순 도Purity 99.999%~99.9999%99.999% to 99.9999% 18MΩ·cm이상18 MΩcm or more 36%~38%36%-38% 불순물impurities O2O2 ≤1ppm≤1 ppm -- NH4NH4 ≤0.5ppm≤0.5ppm N2N2 ≤1ppm≤1 ppm SO4SO4 ≤0.5ppm≤0.5ppm COCO ≤0.5ppm≤0.5ppm PO4PO4 ≤0.05ppm≤0.05ppm CO2CO2 ≤1ppm≤1 ppm Residue on IgnitionResidue on Ignition ≤3ppm≤3ppm CH4CH4 -- Total MetalTotal metal ≤1,000ppb≤1,000 ppb H2OH2O ≤1ppm≤1 ppm

앞에서 설명된 본 발명의 실시예는 본 발명의 기술적 사상을 한정하는 것으로 해석되어서는 안 된다. 본 발명의 보호범위는 청구범위에 기재된 사항에 의하여만 제한되고, 본 발명의 기술분야에서 통상의 지식을 가진 자는 본 발명의 기술적 사상을 다양한 형태로 개량 변경하는 것이 가능하다. 따라서 이러한 개량 및 변경은 통상의 지식을 가진 자에게 자명한 것인 한 본 발명의 보호범위에 속하게 될 것이다.The embodiments of the present invention described above should not be construed as limiting the technical idea of the present invention. The scope of protection of the present invention is limited only by the matters described in the claims, and those skilled in the art will be able to modify the technical idea of the present invention in various forms. Accordingly, such improvements and modifications will fall within the scope of the present invention as long as they are obvious to those skilled in the art.

10: HCl 합성 반응기 20: 압축기
21:냉각장치 30: 염화수소 탱크
40: HCl 제1증류탑 50: HCl 제2증류탑
60: 염산탱크 70: 1차 저온 증류관
80: Cl2 냉각기 90: 2차 저온 증류관
10: HCl synthesis reactor 20: compressor
21: cooling device 30: hydrogen chloride tank
40: HCl first distillation tower 50: HCl second distillation tower
60: hydrochloric acid tank 70: primary low temperature distillation tube
80: Cl2 cooler 90: Secondary low temperature distillation tube

Claims (8)

원료인 조수소와 조염소를 반응시켜 염화수소를 합성한 후 압축냉각시켜 고순도 염화수소를 제조하는 방법으로서,
ⅰ) 조수소에 포함된 수분과 산소에 대한 제거 공정을 수행하여 정제된 수소를 생산하는 수소 정제 단계;
ⅱ) 조염소에 포함된 수분과 산소에 대한 제거 공정을 수행하여 정제된 염소를 생산하는 염소 정제 단계;
ⅲ) 상기 정제된 수소와 상기 정제된 염소를 반응시켜 염화수소를 합성하는 반응 단계; 및
ⅳ) 상기 반응 단계를 통해 합성된 염화수소를 압축냉각시키는 압축냉각 단계를 포함하는 고순도 염화수소 제조방법.
As a method for producing high purity hydrogen chloride by synthesizing hydrogen chloride by reacting crude hydrogen and crude chlorine as raw materials, and then compression cooling.
Iii) a hydrogen purification step of producing purified hydrogen by performing a removal process for water and oxygen contained in the hydrogen hydrogen;
Ii) a chlorine purification step of performing purified chlorine to remove water and oxygen contained in the crude chlorine to produce purified chlorine;
Iii) reacting the purified hydrogen with the purified chlorine to synthesize hydrogen chloride; And
Iii) a high purity hydrogen chloride production method comprising a compression cooling step of compressing and cooling the hydrogen chloride synthesized through the reaction step.
제1항에 있어서,
상기 수소의 정제 단계는 조수소를 촉매 및 흡착제를 사용하여 수분과 산소를 제거하는 단계를 포함하고, 상기 염소 정제 단계는 조염소 가스를 1차 흡착으로 수분을 제거하고 1차 저온증류로 금속성분을 제거 후 2차 저온증류에서는 염소가스 이외의 가스성분을 제거하여 수행된 것임을 특징으로 하는 고순도 염화수소 제조방법.
The method of claim 1,
The hydrogen purification step includes removing hydrogen and hydrogen using a catalyst and an adsorbent for hydrogen hydrogen, and the chlorine purification step removes moisture by primary adsorption of crude chlorine gas, and the metal component by primary low temperature distillation. After removal of the second low temperature distillation, high-purity hydrogen chloride production method characterized in that it was carried out by removing gas components other than chlorine gas.
제1항에 있어서,
상기 반응 단계에서 수소는 염소에 비해 몰비로 10 내지 20몰% 범위의 과량으로 투입되는 것을 특징으로 하는 고순도 염화수소 제조방법.
The method of claim 1,
In the reaction step, hydrogen is a high-purity hydrogen chloride production method characterized in that the input in excess of 10 to 20 mol% in molar ratio compared to chlorine.
조수소에 포함된 수분과 산소에 대한 제거 공정을 수행하여 정제된 수소를 생산하는 수소정제 장치;
조염소에 포함된 수분과 산소에 대한 제거 공정을 수행하여 정제된 염소를 생산하는 염소정제 장치;
상기 수소정제 장치로부터 생산된 수소와 상기 염소정제 장치로부터 생산된 염소를 반응시켜 염화수소를 합성하는 반응기;
상기 반응기에서 합성된 염화수소를 압축시키는 압축기; 및
상기 압축기에 의해 압축된 염화수소를 냉각시키는 냉각장치를 포함하는 고순도 염화수소 제조 시스템.
Hydrogen purification device for producing purified hydrogen by performing a process for removing water and oxygen contained in the hydrogen;
Chlorine purification device for producing purified chlorine by performing a process for removing water and oxygen contained in the crude chlorine;
A reactor for synthesizing hydrogen chloride by reacting hydrogen produced from the hydrogen purification device with chlorine produced from the chlorine purification device;
A compressor for compressing the hydrogen chloride synthesized in the reactor; And
High purity hydrogen chloride production system comprising a cooling device for cooling the hydrogen chloride compressed by the compressor.
제4항에 있어서,
상기 압축기의 전방 또는 후방에 냉각장치가 더 부가된 것을 특징으로 하는 고순도 염화수소 제조 시스템.
5. The method of claim 4,
High purity hydrogen chloride production system characterized in that the cooling device is further added to the front or rear of the compressor.
제4항에 있어서,
상기 압축기 또는 증류탑이 2단 이상의 다단으로 구성된 것을 특징으로 하는 고순도 염화수소 제조 시스템.
5. The method of claim 4,
High-purity hydrogen chloride production system, characterized in that the compressor or distillation column is composed of two or more stages.
제4항에 있어서,
상기 압축기에서 도출된 염화수소를 정제하지 않고 용해하여 염산으로 제조하는 냉각 흡수탑을 더 포함한 고순도 염화수소 제조 시스템.
5. The method of claim 4,
A high purity hydrogen chloride production system further comprising a cooling absorption tower for dissolving the hydrogen chloride derived from the compressor without purification to produce hydrochloric acid.
제4항에 있어서,
상기 염소정제 장치는 조염소 가스에서 수분을 제거하기 위한 흡착관과, 금속성분을 제거하기 위한 1차 저온 증류관과, 상기 1차 저온 증류관에서 증류된 염소를 냉각하기 위한 냉각기 및 염소 이외의 가스 성분을 제거하기 위한 2차 저온 증류관을 구비하는 것을 특징으로 하는 고순도 염화수소 제조 시스템.
5. The method of claim 4,
The chlorine purification apparatus includes an adsorption tube for removing water from the crude chlorine gas, a primary low temperature distillation tube for removing metal components, a cooler for cooling chlorine distilled in the primary low temperature distillation tube, and other than chlorine. A high purity hydrogen chloride production system comprising a secondary low temperature distillation tube for removing gas components.
KR1020110126071A 2011-10-11 2011-11-29 A production method and production system for high purity hydrogen chloride KR101203490B1 (en)

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