KR101201669B1 - Near Infrared-Absorbing Compound of High Solubility and Excellent Durability, and Near Infrared-Absorbing Material Comprising the Same - Google Patents
Near Infrared-Absorbing Compound of High Solubility and Excellent Durability, and Near Infrared-Absorbing Material Comprising the Same Download PDFInfo
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- KR101201669B1 KR101201669B1 KR1020090118884A KR20090118884A KR101201669B1 KR 101201669 B1 KR101201669 B1 KR 101201669B1 KR 1020090118884 A KR1020090118884 A KR 1020090118884A KR 20090118884 A KR20090118884 A KR 20090118884A KR 101201669 B1 KR101201669 B1 KR 101201669B1
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- nickel complex
- dithiol
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- 150000001875 compounds Chemical class 0.000 title claims abstract description 90
- 239000011358 absorbing material Substances 0.000 title claims abstract description 16
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims abstract description 74
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 38
- 150000004662 dithiols Chemical class 0.000 claims abstract description 31
- 239000011347 resin Substances 0.000 claims description 19
- 229920005989 resin Polymers 0.000 claims description 19
- 239000002904 solvent Substances 0.000 claims description 18
- 230000003287 optical effect Effects 0.000 claims description 7
- 239000011230 binding agent Substances 0.000 claims description 6
- 238000000034 method Methods 0.000 claims description 5
- 239000000203 mixture Substances 0.000 claims description 4
- 125000003118 aryl group Chemical group 0.000 abstract description 5
- 125000003545 alkoxy group Chemical group 0.000 abstract description 4
- 125000000217 alkyl group Chemical group 0.000 abstract description 4
- 125000004435 hydrogen atom Chemical group [H]* 0.000 abstract description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 15
- 239000011248 coating agent Substances 0.000 description 13
- 238000000576 coating method Methods 0.000 description 13
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 9
- 230000015572 biosynthetic process Effects 0.000 description 9
- 238000003786 synthesis reaction Methods 0.000 description 9
- 238000010521 absorption reaction Methods 0.000 description 8
- QDZPFXNUADVRNU-UHFFFAOYSA-N 1-[4-(ethoxymethoxy)-3-methoxyphenyl]-2-hydroxy-2-(3,4,5-trimethoxyphenyl)ethanone Chemical compound C1=C(OC)C(OCOCC)=CC=C1C(=O)C(O)C1=CC(OC)=C(OC)C(OC)=C1 QDZPFXNUADVRNU-UHFFFAOYSA-N 0.000 description 7
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 6
- -1 metal complex compounds Chemical class 0.000 description 6
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- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
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- KAYPSBSKABKCJI-UHFFFAOYSA-N 4-(ethoxymethoxy)-3-methoxybenzaldehyde Chemical compound CCOCOC1=CC=C(C=O)C=C1OC KAYPSBSKABKCJI-UHFFFAOYSA-N 0.000 description 2
- 229920002799 BoPET Polymers 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 2
- 230000008859 change Effects 0.000 description 2
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- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 2
- 238000010898 silica gel chromatography Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 125000006527 (C1-C5) alkyl group Chemical group 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- XTIGGAHUZJWQMD-UHFFFAOYSA-N 1-chloro-2-methoxyethane Chemical compound COCCCl XTIGGAHUZJWQMD-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- PVSFIFPJPUEHPO-UHFFFAOYSA-N 2-hydroxy-1-(4-methoxyphenyl)-2-phenylethanone Chemical compound C1=CC(OC)=CC=C1C(=O)C(O)C1=CC=CC=C1 PVSFIFPJPUEHPO-UHFFFAOYSA-N 0.000 description 1
- WSTNJZRYSLBALJ-UHFFFAOYSA-N 2-hydroxy-2-phenyl-1-(3,4,5-trimethoxyphenyl)ethanone Chemical compound COC1=C(OC)C(OC)=CC(C(=O)C(O)C=2C=CC=CC=2)=C1 WSTNJZRYSLBALJ-UHFFFAOYSA-N 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- IZIPMHYHDQLHJF-UHFFFAOYSA-N C(C)OCCOC1=C(C=CC=C1)C(=O)C(O)C1=CC=CC=C1 Chemical compound C(C)OCCOC1=C(C=CC=C1)C(=O)C(O)C1=CC=CC=C1 IZIPMHYHDQLHJF-UHFFFAOYSA-N 0.000 description 1
- GAWIXWVDTYZWAW-UHFFFAOYSA-N C[CH]O Chemical group C[CH]O GAWIXWVDTYZWAW-UHFFFAOYSA-N 0.000 description 1
- 229920000219 Ethylene vinyl alcohol Polymers 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 244000028419 Styrax benzoin Species 0.000 description 1
- 235000000126 Styrax benzoin Nutrition 0.000 description 1
- 235000008411 Sumatra benzointree Nutrition 0.000 description 1
- 238000002835 absorbance Methods 0.000 description 1
- 239000004840 adhesive resin Substances 0.000 description 1
- 229920006223 adhesive resin Polymers 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 1
- 150000004056 anthraquinones Chemical class 0.000 description 1
- 229960002130 benzoin Drugs 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- PBAYDYUZOSNJGU-UHFFFAOYSA-N chelidonic acid Natural products OC(=O)C1=CC(=O)C=C(C(O)=O)O1 PBAYDYUZOSNJGU-UHFFFAOYSA-N 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 235000019382 gum benzoic Nutrition 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 230000007257 malfunction Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- LAIZPRYFQUWUBN-UHFFFAOYSA-L nickel chloride hexahydrate Chemical compound O.O.O.O.O.O.[Cl-].[Cl-].[Ni+2] LAIZPRYFQUWUBN-UHFFFAOYSA-L 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920000120 polyethyl acrylate Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- NNFCIKHAZHQZJG-UHFFFAOYSA-N potassium cyanide Chemical compound [K+].N#[C-] NNFCIKHAZHQZJG-UHFFFAOYSA-N 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 229920006027 ternary co-polymer Polymers 0.000 description 1
- ANRHNWWPFJCPAZ-UHFFFAOYSA-M thionine Chemical compound [Cl-].C1=CC(N)=CC2=[S+]C3=CC(N)=CC=C3N=C21 ANRHNWWPFJCPAZ-UHFFFAOYSA-M 0.000 description 1
- 238000002371 ultraviolet--visible spectrum Methods 0.000 description 1
- MWOOGOJBHIARFG-UHFFFAOYSA-N vanillin Chemical compound COC1=CC(C=O)=CC=C1O MWOOGOJBHIARFG-UHFFFAOYSA-N 0.000 description 1
- FGQOOHJZONJGDT-UHFFFAOYSA-N vanillin Natural products COC1=CC(O)=CC(C=O)=C1 FGQOOHJZONJGDT-UHFFFAOYSA-N 0.000 description 1
- 235000012141 vanillin Nutrition 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
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Classifications
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
- C07C323/10—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and singly-bound oxygen atoms bound to the same carbon skeleton
- C07C323/11—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and singly-bound oxygen atoms bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton
- C07C323/16—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and singly-bound oxygen atoms bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton containing six-membered aromatic rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F15/00—Compounds containing elements of Groups 8, 9, 10 or 18 of the Periodic Table
- C07F15/04—Nickel compounds
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/22—Absorbing filters
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Optical Filters (AREA)
- Anti-Oxidant Or Stabilizer Compositions (AREA)
Abstract
본 발명은 장파장의 근적외선을 흡수하는 하기 화학식 1, 화학식2, 화학식3으로 표시되는 디티올 니켈 착체 화합물, 및 그것을 포함하는 근적외선 흡수 소재를 제공한다. The present invention provides a dithiol nickel complex compound represented by the following general formulas (1), (2) and (3), which absorbs near-infrared wavelengths of long wavelengths, and a near-infrared absorbing material including the same.
(1) (One)
(상기 식에서, m, m', n 및 n'은 각각 독립적으로 0 내지 4의 정수이고, 그 중 적어도 하나는 1 내지 4의 정수이며; x, x', y 및 y'은 각각 독립적으로 1 내지 4의 정수이고; R1, R1', R2 및 R2'는 각각 독립적으로 수소 원자, 치환 또는 미치환의 알킬기, 치환 또는 미치환의 알콕시기, 또는 치환 또는 미치환의 아릴기이다).Wherein m, m ', n and n' are each independently an integer of 0 to 4, at least one of which is an integer of 1 to 4; x, x ', y and y' are each independently 1 An integer of 4 to 4, R 1 , R 1 ′, R 2, and R 2 ′ each independently represent a hydrogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkoxy group, or a substituted or unsubstituted aryl group. ).
Description
본 발명은 고용해도 및 고내구성을 가진 근적외선의 흡수 화합물 및 그것을 포함하는 근적외선 흡수 소재에 관한 것으로, 더욱 상세하게는, 880 ~ 1000 nm 영역의 장파장 근적외선 영역을 효과적으로 흡수하고 내구성이 우수하며, 특히, 다양한 유기 용제에 대한 용해도와 여러 수지와의 상용성이 우수한 신규 구조의 근적외선 흡수 화합물 및 그것을 이용하는 근적외선 흡수 소재에 관한 것이다.The present invention relates to a near-infrared absorbing compound having a high solubility and high durability, and a near-infrared absorbing material including the same. More particularly, the present invention effectively absorbs the long-wavelength near-infrared region of 880 to 1000 nm and has excellent durability. The present invention relates to a near-infrared absorbing compound having a novel structure having excellent solubility in various organic solvents and compatibility with various resins, and a near-infrared absorbing material using the same.
일반적으로, 근적외선 흡수 색소를 함유한 수지나 플라스틱제 근적외선 흡수 필터는 잘 알려져 있고, 그것의 용도로는, 선글라스, 용접용 안경, 빌딩이나 자동차, 전철 비행기의 창, 정보 판독을 위한 광학 판독 장치들 등을 들 수 있다.In general, near-infrared absorbing filters made of resin or plastic containing near-infrared absorbing pigments are well known, and their use includes sunglasses, welding glasses, windows of buildings and automobiles, train airplanes, and optical reading devices for reading information. Etc. can be mentioned.
또한, 이러한 근적외선 흡수 필터는 최근 평판 디스플레이 패널로서 사용되고 있는 플라즈마 디스플레이 패널(이하, 'PDP'라고 약칭한다)에도 사용되고 있다. 구체적으로, PDP에서는 800 ~ 1500 nm 영역의 근적외선이 방출되어 리모콘을 이용 한 기기의 오작동을 초래할 수 있으므로, 이러한 문제점을 해결하기 위하여 근적외선 흡수 필터가 PDP에 장착된다. This near-infrared absorption filter is also used in plasma display panels (hereinafter, abbreviated as 'PDP'), which are recently used as flat panel display panels. Specifically, since the near infrared rays in the 800 ~ 1500 nm region can be emitted from the PDP, a malfunction of the device using the remote controller can be caused, and the near infrared absorption filter is installed in the PDP to solve this problem.
이러한 근적외선 흡수 색소로는, 디이모늄계 화합물, 프탈로시아닌계 화합물, 나프토프탈로시아닌계 화합물, 시아닌계 화합물, 안트라퀴논계 화합물, 디티올계 금속 착체 화합물 등이 있지만, 실제로는, 디이모늄계 화합물, 프탈로시아닌계 화합물 및 디티올계 화합물의 일부만이 사용되고 있다.Such near-infrared absorbing dyes include dimonium-based compounds, phthalocyanine-based compounds, naphthophthalocyanine-based compounds, cyanine-based compounds, anthraquinone-based compounds, and dithiol-based metal complex compounds, but in practice, dimonium-based compounds and phthalocyanine-based compounds Only a part of the compound and the dithiol compound are used.
상기 디이모늄계 화합물은, 착물 화합물 색소 등과 동일 수지층에 함유시키면, 열화되어 400 ~ 450 nm 부근에서 흡수가 나타나 황색을 띠게 되는 문제가 있다. 또한, 상기 프탈로시아닌 화합물은 내구성이 우수하지만, 가시광의 투과율이 낮다는 점에서, 광학 필터로의 사용에 제한이 있다.When the dimonium compound is contained in the same resin layer as a complex compound dye, there is a problem in that it becomes deteriorated and becomes yellow in absorption around 400 to 450 nm. In addition, the phthalocyanine compound is excellent in durability, but the use of an optical filter is limited in that the visible light transmittance is low.
한편, 상기 디티올계 금속 착체 화합물들 중에서, 디티올 니켈 착체 화합물은 제조가 비교적 용이하고 내구성이 양호하다는 등의 장점이 있다. 예를 들어, 하기 화학식(a) 및 화학식(b) 등과 같은 장파장용(max=920 이상) 디티올 니켈 착체 화합물들이 알려져 있다. Meanwhile, among the dithiol-based metal complex compounds, the dithiol nickel complex compound has advantages such as relatively easy to manufacture and good durability. For example, long-wavelength (max = 920 or more) dithiol nickel complex compounds such as the following formulas (a) and (b) are known.
(a) (a)
(b) (b)
그러나, 상기와 같은 디티올 니켈 착체 화합물들은 파장 및 내구성의 면에서는 우수하지만, 용해도가 낮아 바인더 수지와 혼합하여 근적외선 차단용 필름을 제작할 때, 사용량의 한계점에서 석출된다는 문제가 있어서 사용이 제한적이었다. However, although the dithiol nickel complex compounds as described above are excellent in terms of wavelength and durability, they have a low solubility, so that the use of the dithiol nickel complex compounds precipitates at the limit of the amount used when producing the film for blocking the near infrared rays by mixing with a binder resin.
결과적으로, 종래에 알려져 있는 근적외선 흡수 필터는, 장기간의 사용에 의해 황색으로 변화되거나, 또는 용매에 대한 용해성이 낮고 가시광의 투과율이 낮다는 문제가 있었다.As a result, the near-infrared absorption filter known in the art has a problem that it turns yellow by long-term use, or has low solubility in a solvent and low transmittance of visible light.
따라서, 이러한 문제점을 근본적으로 해결할 수 있는 새로운 근적외선 흡수 화합물을 기반으로 근적외선 흡수 필터 등에 대한 요구가 높은 실정이다. Therefore, there is a high demand for a near infrared absorbing filter based on a new near infrared absorbing compound that can fundamentally solve such problems.
본 발명은 상기와 같은 종래기술의 문제점과 과거로부터 요청되어온 기술적 과제를 해결하는 것을 목적으로 한다.SUMMARY OF THE INVENTION It is an object of the present invention to solve the above-described problems of the prior art and the technical problems required from the past.
구체적으로, 본 출원의 발명자들은 심도 있는 연구와 다양한 실험들을 거듭한 끝에, 이후 설명하는 바와 같은 신규 구조의 화합물이 장파장 근적외선을 효과적으로 흡수하고 내구성이 우수하면서도, 용해도와 수지와의 상용성이 우수하다는 것을 확인하고, 본 발명을 완성하기에 이르렀다.Specifically, the inventors of the present application after extensive research and various experiments, the compound of the new structure as described later effectively absorbs long-wave near-infrared rays and has excellent durability, while excellent solubility and compatibility with the resin. It was confirmed that the present invention was completed.
따라서, 본 발명은 장파장의 근적외선을 흡수하는 하기 화학식 1로 표시되는 근적외선 흡수 화합물인 디티올 니켈 착체 화합물을 제공한다.Accordingly, the present invention provides a dithiol nickel complex compound, which is a near-infrared absorbing compound represented by the following formula (1) that absorbs near-infrared wavelengths of long wavelengths.
(1) (One)
상기 식에서, Where
m, m', n 및 n'은 각각 독립적으로 0 내지 4의 정수이고, 그 중 적어도 하나는 1 내지 4의 정수이며; m, m ', n and n' are each independently integers of 0 to 4, at least one of which is an integer of 1 to 4;
x, x', y 및 y'은 각각 독립적으로 1 내지 4의 정수이고; x, x ', y and y' are each independently integers from 1 to 4;
R1, R1', R2 및 R2'는 각각 독립적으로 수소 원자, 치환 또는 미치환의 알킬기, 치환 또는 미치환의 알콕시기, 또는 치환 또는 미치환의 아릴기이다.R 1 , R 1 ′, R 2 and R 2 ′ each independently represent a hydrogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkoxy group, or a substituted or unsubstituted aryl group.
즉, 본 발명의 디티올 니켈 착체 화합물은 880 ~ 1000 nm 영역에서 최대 흡수 파장을 나타냄으로써 장파장 근적외선을 효과적으로 흡수함과 동시에, 장기간의 사용에 의해서도 황색 변화가 적고, 수지와의 상용성도 우수하다. 또한, 그 제조가 용이하고, 내구성이 우수하며, 특히, 기존의 디티올계 니켈 착체 화합물보다 용해도에 있어서 우수하므로 근적외선 흡수 소재로 유용한 화합물이다.In other words, the dithiol nickel complex compound of the present invention exhibits a maximum absorption wavelength in the 880 to 1000 nm region, absorbs long wavelength near infrared rays effectively, and has a small yellow change even after long-term use, and is excellent in compatibility with the resin. In addition, the compound is easy to manufacture, has excellent durability, and is particularly useful as a near-infrared absorbing material because it is superior in solubility to conventional dithiol-based nickel complex compounds.
상기 화학식 1에서, m, m', n 및 n'은 바람직하게는 각각 독립적으로 0 내지 2의 정수일 수 있다.In
하나의 바람직한 예에서, x과 x'는 서로 동일한 정수이고, y과 y' 역시 서로 동일한 정수일 수 있다. 더욱 바람직하게는, x과 x'의 조합 또는 y과 y'의 조합 중의 적어도 하나의 조합은 1 내지 4의 정수이고, 특히 바람직하게는, 각각 1 또는 2일 수 있다. In one preferred example, x and x 'are the same integer as each other, and y and y' can also be the same integer as each other. More preferably, at least one of the combination of x and x 'or the combination of y and y' is an integer from 1 to 4, particularly preferably 1 or 2, respectively.
상기 치환 또는 미치환의 알킬기는 바람직하게는 치환 또는 미치환의 C1-C5 알킬기고, 상기 치환 또는 미치환의 알콕시기는 바람직하게는 치환 또는 미치환의 C1-C5 알콕시기며, 상기 치환 또는 미치환의 아릴기는 바람직하게는 치환 또는 미치환의 C4-C8 아릴기이다. 알킬기, 알콕시기 및 아릴기가 치환 구조를 가는 경우, 바람직하게는, 히드록시기, 할로겐기 및 아민기로 이루어진 군에서 선택되는 하나 이상의 치환기로 치환된 구조일 수 있다. The substituted or unsubstituted alkyl group is preferably a substituted or unsubstituted C 1 -C 5 alkyl group, and the substituted or unsubstituted alkoxy group is preferably a substituted or unsubstituted C 1 -C 5 alkoxy group, and the substitution Or an unsubstituted aryl group is preferably a substituted or unsubstituted C 4 -C 8 aryl group. When the alkyl group, the alkoxy group and the aryl group have a substituted structure, preferably, the structure may be substituted with one or more substituents selected from the group consisting of a hydroxy group, a halogen group and an amine group.
하나의 바람직한 예에서, R1, R1', R2 및 R2'는 수소 원자 또는 C1-C5 알콕시기일 수 있다. In one preferred example, R 1 , R 1 ′, R 2 and R 2 ′ may be hydrogen atoms or C 1 -C 5 alkoxy groups.
구체적으로는, 하기 표 1의 화합물 1 내지 9 중에서 선택되는 화합물일 수 있다. Specifically, it may be a compound selected from
[표 1][Table 1]
상기 화합물 1 내지 9 중에서도, 특히 화합물 2 내지 4는 이후 실험예 4에서도 확인할 수 있는 바와 같이, 기타 화합물들 보다 월등히 높은 용해도를 나타내므로 더욱 바람직하다. Among the
본 발명에 따른 디티올 니켈 착체 화합물은 다양한 방법으로 제조할 수 있으며, 예를 들어, G, N Schrauzer 등의 문헌[J.Amer.Chem.Soc., 87권, 1483쪽(1965년)] 또는 일본특허공개 제1990-264787호에 개시되어 있는 비스 (1,2-디아릴-1,2-에틸렌 디티올레이트) 니켈 착체 화합물의 제조방법 등에 준거하여 합성할 수 있다.The dithiol nickel complex compounds according to the present invention can be prepared by various methods, for example, G, N Schrauzer et al., J. Amer. Chem. Soc., 87, 1483 (1965) or It can synthesize | combine according to the manufacturing method etc. of the bis (1, 2- diaryl- 1, 2-ethylene dithiolate) nickel complex compound disclosed by Unexamined-Japanese-Patent No. 1990-264787.
이를 바탕으로, 본 발명의 일부 디티올 니켈 착체 화합물의 합성 방법을 이하에서 설명하지만, 기타 제조방법들이 가능할 수 있음은 물론이다.Based on this, the method for synthesizing some dithiol nickel complex compounds of the present invention will be described below, of course, other manufacturing methods may be possible.
본 발명은 또한 상기 화학식 1의 디티올 니켈 착체 화합물을 포함하는 근적외선 흡수 소재를 제공한다.The present invention also provides a near-infrared absorbing material comprising the dithiol nickel complex compound of the formula (1).
화학식 1의 디티올계 니켈 착체 화합물은 앞서 설명한 바와 같이 용해도와 수지와의 상용성이 우수하므로 고 농도로 용매, 수지 등에 첨가할 수 있어서, 종래보다 더욱 우수한 근적외선 흡수 효과를 발휘하는 소재의 제조가 가능하다.As described above, the dithiol-based nickel complex compound of Formula 1 has excellent solubility and compatibility with resins, so that the dithiol-based nickel complex compound may be added to a solvent, a resin, or the like at a high concentration, thereby producing a material having a near infrared absorption effect superior to that of the prior art. Do.
상기 용매는 근적외선 흡수 소재의 제조 과정에서 소정의 공정에서 사용된 후 제거되는 용매, 근적외선 흡수 소재에 최종적으로 포함되는 용매 등일 수 있으며, 그것의 예로는, MEK(methyl ethyl ketone), Toluene, Methyl Cellosolve 등을 들 수 있지만, 이들만으로 한정되는 것은 아니다. The solvent may be a solvent to be removed after being used in a predetermined process in the preparation of the near infrared absorbing material, a solvent finally included in the near infrared absorbing material, and examples thereof include methyl ethyl ketone (MEK), toluene, and methyl cellosolve. Although these etc. are mentioned, it is not limited only to these.
상기 수지는 근적외선 흡수 소재의 매트릭스를 구성하는 수지, 근적외선 흡수 소재의 매트릭스를 구성하는 수지 등일 수 있으며, 후자의 대표적인 예로는 바인더로 사용되는 수지를 들 수 있다. 이러한 바인더로는 점착성 수지가 사용될 수 있으며, 예를 들어, 폴리메틸메타크릴레이트 수지, 폴리에틸아크릴레이트 수지, 폴리카보네이트 수지, 에틸렌-비닐 알코올 공중합체 수지, 폴리에스테르 수지 등을 들 수 있지만, 이들만으로 한정되는 것은 아니다. The resin may be a resin constituting the matrix of the near infrared absorbing material, a resin constituting the matrix of the near infrared absorbing material, and the latter may be a resin used as a binder. As such a binder, an adhesive resin may be used, and examples thereof include polymethyl methacrylate resin, polyethyl acrylate resin, polycarbonate resin, ethylene-vinyl alcohol copolymer resin, polyester resin, and the like. It is not limited only.
하나의 바람직한 예에서, 상기 근적외선 흡수 소재는 전체 중량을 기준으로 화학식 1의 디티올계 니켈 착체 화합물 10 내지 70 중량%, 바인더 수지 20 내지 80 중량%, 및 용제 20 내지 70 중량%를 포함하는 조성으로 이루어질 수 있다. 화학식 1의 화합물을 용매에 분산시키는 경우에는 분산제를 추가로 포함할 수 있다. In one preferred embodiment, the near-infrared absorbing material is a composition comprising 10 to 70% by weight of the dithiol-based nickel complex compound of
경우에 따라서는, 상기 근적외선 흡수 소재에는 상기 화학식 1의 근적외선 흡수 화합물과 다른 흡수 파장을 가지는 화합물을 추가로 포함할 수도 있다. In some cases, the near-infrared absorbing material may further include a compound having an absorption wavelength different from that of the near-infrared absorbing compound of Chemical Formula 1.
상기 화학식 1의 근적외선 흡수 화합물은 단독으로 사용될 수도 있고, 둘 이상의 조합으로 사용될 수도 있다. The near-infrared absorbing compound of Formula 1 may be used alone or in combination of two or more.
또한, 본 발명은 상기 화학식 1의 디티올 니켈 착체 화합물을 함유하는 층을 포함하는 적층체를 제공한다.In addition, the present invention provides a laminate comprising a layer containing the dithiol nickel complex compound of the formula (1).
예를 들어, 앞서 설명한 바와 같이, 화학식 1의 디티올 니켈 착체 화합물과 바인더 및 용매를 포함하는 근적외선 흡수 소재를 소정의 기재에 소정의 두께로 도포한 후 용매를 제거하여 근적외선 흡수용 적층체를 제조할 수 있다. For example, as described above, a near-infrared absorbing material including a dithiol nickel complex compound of
상기 기재는 예를 들어 유리, 투명성 수지, 투명성 수지기판 등을 들 수 있지만, 이들만으로 한정되는 것은 아니다. Although the said base material can mention glass, transparent resin, a transparent resin board, etc., for example, it is not limited only to these.
하나의 바람직한 예에서, 상기 근적외선 흡수용 적층체는 화학식 1의 디티올 니켈 착체 화합물이 투명성 필름의 일면 또는 양면에 코팅되어 있는 코팅 필름일 수 있다. In one preferred example, the near-infrared absorbing laminate may be a coating film in which the dithiol nickel complex compound of Formula 1 is coated on one or both sides of the transparent film.
본 발명은 또한 상기 근적외선 흡수용 적층체를 포함하는 광학 필터를 제공한다. The present invention also provides an optical filter comprising the laminate for absorbing near infrared rays.
이러한 광학 필터는, 디스플레이 패널용 필터, 열선 차단 필름, 선글라스, 보호 안경, 리모콘 수광기 등 폭넓은 용도로 사용될 수 있다. Such an optical filter can be used for a wide range of applications, such as a display panel filter, a heat shield film, sunglasses, protective glasses, a remote control receiver.
이하 실시예를 참조하여 본 발명의 내용을 상술하지만, 본 발명의 범주가 그것에 의해 한정되는 것은 아니다.Although the content of the present invention will be described with reference to the following Examples, the scope of the present invention is not limited thereto.
실시예 1: (Bis[1-(3,4,5-trimethoxy) phenyl)-2-[3-methoxy-4-(2-ethoxymethoxy)-phenyl]]-1,2-ethenedithiolato-(2)-S, S']Nickel 착체 화합물(화합물 1)의 합성 Example 1 (Bis [1- (3,4,5-trimethoxy) phenyl) -2- [3-methoxy-4- (2-ethoxymethoxy) -phenyl]]-1,2-ethenedithiolato- (2) - Synthesis of S, S '] Nickel Complex Compound (Compound 1)
(1)(One) 3-methoxy-4-(2-ethoxymethoxy)benzaldehyde의 합성Synthesis of 3-methoxy-4- (2-ethoxymethoxy) benzaldehyde
2000 ml 4-neck RBF에 Vanillin (Acros사) 39.4 g, DMF 157 g, 2-chloro ethyl methyl ether (Aldrich사) 92.8 g, 및 Sodium carbonate 75.2 g을 순차적으로 투입하였다. 상기 반응물을 8 시간 동안 환류 냉각을 진행하여 반응을 진행하고, 반응이 완료된 후 냉각, 반응액을 여과하여 고형분을 제거하였다.To 2000 ml 4-neck RBF, 39.4 g of Vanillin (Acros), 157 g of DMF, 92.8 g of 2-chloro ethyl methyl ether (Aldrich) and 75.2 g of sodium carbonate were sequentially added. The reaction was carried out by reflux cooling for 8 hours to proceed with the reaction. After the reaction was completed, the reaction mixture was cooled and the reaction solution was filtered to remove solids.
수집한 여액은 Methylene chloride/H2O를 이용하여 추출을 한 후, 진공농축을 하여 용매를 제거하고, 상온에서 냉각하여 재결정을 진행하였다. 석출된 결정은 여과한 후 건조를 진행하여 순도가 99.0%이고, 수율이 90%인 투명한 결정의 상기 표제 화합물을 수득하였다.The collected filtrates were extracted with Methylene chloride / H 2 O, concentrated in vacuo to remove the solvent, and cooled to room temperature to recrystallize. The precipitated crystals were filtered and dried to obtain the title compound as a transparent crystal having a purity of 99.0% and a yield of 90%.
(2) (2) (3-methoxy-4-(2-ethoxymethoxy)-3',4',5'-trimethoxy benzoin)의 합성Synthesis of (3-methoxy-4- (2-ethoxymethoxy) -3 ', 4', 5'-trimethoxy benzoin)
1000 ml 4-neck RBF에 3,4,5-trimethoxy benzaldehyde (TCI사) 10 g을 투입하고, 상기 과정(1)에서 합성한 3-methoxy-4-(2-ethoxymethoxy)benzaldehyde 10.7 g과 Potassium cyanide 4.9 g을 투입한 후에 65% Ethanol(aq)를 투입하여 8 시간 동안 환류 냉각을 진행하였다.10 g of 3,4,5-trimethoxy benzaldehyde (TCI) was added to 1000 ml 4-neck RBF, 10.7 g of 3-methoxy-4- (2-ethoxymethoxy) benzaldehyde and Potassium cyanide synthesized in the above step (1). After adding 4.9 g, 65% Ethanol (aq) was added, and reflux cooling was performed for 8 hours.
반응 완료 후 Methylene chloride/H2O를 이용하여 추출을 진행한 후에, 유기층을 수집 농축하여 얻은 검은색 점성체는 ethyl acetate/n-hexane의 혼합비율이 6/4로 제조된 전개액을 이용하여 실리카겔 컬럼크로마토그래피를 통하여 정제함으로써, 상기 표제 화합물을 순도 98%, 수율 52%로 수득하였다.After completion of the reaction, extraction was performed using Methylene chloride / H 2 O, and the black viscous body obtained by collecting and concentrating an organic layer was prepared using a developing solution having a mixture ratio of ethyl acetate / n-hexane of 6/4. Purification via silica gel column chromatography gave the title compound in a purity of 98% and a yield of 52%.
(3) (Bis[1-(3,4,5-trimethoxy) phenyl)-2-[3-methoxy-4-(2-ethoxymethoxy)- phenyl]]-1,2-ethenedithiolato-(2)-S, S']Nickel의 합성 (3) (Bis [1- (3,4,5-trimethoxy) phenyl) -2- [3-methoxy-4- (2-ethoxymethoxy) -phenyl]]-1,2-ethenedithiolato- (2) -S Synthesis of S '] Nickel
상기 과정(2)에서 합성한 (3-methoxy-4-(2-ethoxymethoxy)-3',4',5'-trimethoxy benzoin) 10 g과 phosphorus pentasulate 3.5 g을 혼합한 후에 1,4-Dioxane 100 ml 용매 하의 60℃에서 2 시간 반응한 후, Nickel chloride hexahydrate 4.1 g을 순수 67 g에 용해한 후, 일시에 투입한 후 환류 냉각을 진행하였다.After mixing 10 g of (3-methoxy-4- (2-ethoxymethoxy) -3 ', 4', 5'-trimethoxy benzoin) synthesized in step (2) and 3.5 g of phosphorus pentasulate, 1,4-Dioxane 100 After reacting at 60 ° C. for 2 hours in a ml solvent, 4.1 g of Nickel chloride hexahydrate was dissolved in 67 g of pure water, and then added at a time, followed by reflux cooling.
반응 완료 후 Methylene chloride/H2O를 이용하여 추출을 진행하였다. 추출한 유기층은 진공농축을 진행하여 얻어진 검은색 점성체는 ethyl acetate/n-hexane의 혼합비율이 7/3로 제조된 전개액을 이용하여 실리카겔 컬럼크로마토그래피를 통하여 정제함으로써, 상기 표제 화합물을 순도 98%, 수율 32%로 수득하였다.After completion of the reaction, extraction was performed using Methylene chloride / H 2 O. The extracted organic layer was concentrated in vacuo, and the black viscous body was purified by silica gel column chromatography using a developing solution having a mixture ratio of ethyl acetate / n-hexane of 7/3, thereby purifying the title compound. %, Yield 32%.
실시예 2: (Bis[1-(3,4,5-trimethoxy) phenyl)-2-[3,4-(2-ethoxyethoxy)-phenyl]]-1,2-ethenedithiolato-(2)-S, S']Nickel 착체 화합물(화합물 2)의 합성Example 2: (Bis [1- (3,4,5-trimethoxy) phenyl) -2- [3,4- (2-ethoxyethoxy) -phenyl]]-1,2-ethenedithiolato- (2) -S, Synthesis of S '] Nickel Complex Compound (Compound 2)
3-methoxy-4-(2-ethoxymethoxy)-3',4',5'-trimethoxy benzoin 대신에 3,4-ethoxyethoxy-3',4',5'-trimethoxy benzoin 을 사용한 것을 제외하고는 실시예 1과 동일한 방법으로, 상기 표제 화합물을 합성하였다. (순도: 95%, 수율: 30%).Example 3,4-ethoxyethoxy-3 ', 4', 5'-trimethoxy benzoin was used instead of 3-methoxy-4- (2-ethoxymethoxy) -3 ', 4', 5'-trimethoxy benzoin In the same manner as in 1, the title compound was synthesized. (Purity: 95%, yield: 30%).
실시예 3: (Bis[1-(3,4-(2-ethoxyethoxy) phenyl)-2-[3-methoxy-4-(2-ethoxyethoxy)-phenyl]]-1,2-ethenedithiolato-(2)-S, S']Nickel 착체 화합물(화합 물 3)의 합성Example 3: (Bis [1- (3,4- (2-ethoxyethoxy) phenyl) -2- [3-methoxy-4- (2-ethoxyethoxy) -phenyl]]-1,2-ethenedithiolato- (2) Synthesis of -S, S '] Nickel Complex Compound (Compound 3)
3-methoxy-4-(2-ethoxymethoxy)-3',4',5'-trimethoxy benzoin 대신에 3,4-(2-ethoxyethoxy)-3'-methoxy-4'-ethoxyethoxy benzoin을 사용한 것을 제외하고는 실시예 1과 동일한 방법으로, 상기 표제 화합물을 합성하였다. (순도: 96%, 수율: 30%).Except for using 3,4- (2-ethoxyethoxy) -3'-methoxy-4'-ethoxyethoxy benzoin instead of 3-methoxy-4- (2-ethoxymethoxy) -3 ', 4', 5'-trimethoxy benzoin In the same manner as in Example 1, the title compound was synthesized. (Purity: 96%, yield: 30%).
실시예 4: Bis{1,2-bis[3,4-(2-ethoxyethoxy) phenyl)]-1,2-ethenedithiolato-(2)-S, S']Nickel 착체 화합물(화합물 4)의 합성Example 4 Synthesis of Bis {1,2-bis [3,4- (2-ethoxyethoxy) phenyl)]-1,2-ethenedithiolato- (2) -S, S '] Nickel Complex Compound (Compound 4)
3-methoxy-4-(2-ethoxymethoxy)-3',4',5'-trimethoxy benzoin 대신에 3,4-(2-ethoxyethoxy benzoin을 사용한 것을 제외하고는 실시예 1과 동일한 방법으로, 상기 표제 화합물을 합성하였다. (순도: 96%, 수율: 33%).In the same manner as in Example 1, except that 3,4- (2-ethoxyethoxy benzoin was used instead of 3-methoxy-4- (2-ethoxymethoxy) -3 ', 4', 5'-trimethoxy benzoin, the title Compounds were synthesized (purity: 96%, yield: 33%).
비교예 1: Bis{1,2-bis[(3,4,5-trimethoxy) phenyl)]-1,2-ethenedithiolato-(2)-S, S'}Nickel 착체 화합물 합성Comparative Example 1 Synthesis of Bis {1,2-bis [(3,4,5-trimethoxy) phenyl)]-1,2-ethenedithiolato- (2) -S, S '} Nickel Complex Compound
3-methoxy-4-(2-ethoxymethoxy)-3',4',5'-trimethoxy benzoin 대신에 3,4,5-trimethoxy benzoin 을 사용한 것을 제외하고는 실시예 1과 동일한 방법으로, 상기 표제 화합물을 합성하였다. (순도: 99.0%, 수율: 40%).The title compound in the same manner as in Example 1, except that 3,4,5-trimethoxy benzoin was used instead of 3-methoxy-4- (2-ethoxymethoxy) -3 ', 4', 5'-trimethoxy benzoin. Was synthesized. (Purity: 99.0%, yield: 40%).
비교예 2: Bis[1,2-bis(4-methoxy) phenyl-1,2-ethenedithiolato-(2)-S, S'}Nickel 착체 화합물 합성Comparative Example 2: Synthesis of Bis [1,2-bis (4-methoxy) phenyl-1,2-ethenedithiolato- (2) -S, S '} Nickel Complex
3-methoxy-4-(2-ethoxymethoxy)-3',4',5'-trimethoxy benzoin 대신에 4-methoxy benzoin을 사용한 것을 제외하고는 실시예 1과 동일한 방법으로, 상기 표제 화합물을 합성하였다. (순도: 98%, 수율: 35%).The title compound was synthesized in the same manner as in Example 1, except that 4-methoxy benzoin was used instead of 3-methoxy-4- (2-ethoxymethoxy) -3 ', 4', 5'-trimethoxy benzoin. (Purity: 98%, yield: 35%).
실험예 1: 디티올계 니켈 착체 화합물의 분석Experimental Example 1 Analysis of Dithiol Nickel Complex Compounds
상기 실시예 1 내지 4와 비교예 1 내지 2에서 각각 합성한 디티올계 니켈 착체 화합물들에 대한 최대 흡수 파장, 흡수도(max), 융해점(mp) 및 용해도를 각각 측정하였다. 모든 분석은 MEK로 측정을 실시하였다. 이에 대한 결과를 하기 표 2에 나타내었고, 광학 측정 결과는 도 1에 나타내었다. The maximum absorption wavelength, absorbance (max), melting point (mp) and solubility of the dithiol-based nickel complex compounds synthesized in Examples 1 to 4 and Comparative Examples 1 to 2, respectively, were measured. All analyzes were performed by MEK. The results are shown in Table 2 below, and the optical measurement results are shown in FIG. 1.
[표 2][Table 2]
상기 표 2에서 알 수 있는 바와 같이, 본 발명에 따른 디티올계 니켈 착체 화합물(화합물 1 내지 4)은 장파장 영역의 근적외선 흡수가 가능하며, 특히, 용매에 대한 용해도가 비교예 1 및 2의 화합물에 비해 월등히 우수하다는 것을 확인할 수 있다.As can be seen in Table 2, the dithiol-based nickel complex compound (
실험예 2: 다양한 용매들에 대한 디티올계 니켈 착체 화합물의 용해도Experimental Example 2: Solubility of Dithiol-Based Nickel Complex Compounds in Various Solvents
상기 실시예 1 내지 4에서 각각 제조된 디티올계 니켈 착체 화합물들(화합물 1 내지 4)의 다양한 용매들에 대한 용해도를 측정하여, 그 결과를 하기 표 3에 나타내었다. The solubility of the dithiol-based nickel complex compounds (
[표 3][Table 3]
상기 표 3에서 알 수 있는 바와 같이, 본 발명에 따른 실시예 1 내지 4의 디티올계 니켈 착체 화합물들(화합물 1 내지 4)은 다양한 용매들에서 매우 높은 용해도를 나타냄을 알 수 있다. 상기 용매들에 대한 종래의 근적외선 흡수 화합물들의 용해도가 0.1~ 0.5% 정도임을 고려할 때, 본 발명에 따른 디티올계 니켈 착체 화합물들의 용매도가 월등히 우수함을 알 수 있다. As can be seen in Table 3, it can be seen that the dithiol-based nickel complex compounds (
실시예 5: 코팅 필름의 준비Example 5: Preparation of Coating Film
Methyl methacrylate(MMA)/Butyl Methacrylate(BMA)/Hydroxy ethyl methacrylte(HEMA) (5:4:1) 3원 공중합체 고형분 30 g과 실시예 2의 화합물 50 mg을 MEK 70 g에 용해한 용액과 혼합하여 코팅액을 제조하였다.Methyl methacrylate (MMA) / Butyl Methacrylate (BMA) / Hydroxy ethyl methacrylte (HEMA) (5: 4: 1) Ternary copolymer solids 30 g and 50 mg of the compound of Example 2 were mixed with a solution of 70 g MEK. A coating solution was prepared.
상기 제조한 코팅액을 PET 필름에 Film applicator (Sheen사)를 이용하여 100 ㎛로 코팅한 후 100℃에서 1 시간 동안 건조하여 실시예 1의 화합물이 코팅된 PET 필름을 제작하였다.The prepared coating solution was coated on a PET film using a film applicator (Sheen company) at 100 μm, and then dried at 100 ° C. for 1 hour to prepare a PET film coated with the compound of Example 1.
실시예 6: 코팅 필름의 준비Example 6: Preparation of Coating Film
실시예 2의 화합물 대신에 실시예 3의 화합물을 사용한 것을 제외하고는 실시예 5와 동일한 방법으로 코팅 필름을 제작하였다. A coating film was prepared in the same manner as in Example 5 except that the compound of Example 3 was used instead of the compound of Example 2.
실험예 3: 내구성 평가Experimental Example 3: Evaluation of Durability
상기 실시예 5 및 6에서 각각 제작한 필름을 80℃,95% RH에서 72 시간 동안 방치한 후 하기 조건으로 내구성을 평가하였다.The films prepared in Examples 5 and 6, respectively, were left at 80 ° C. and 95% RH for 72 hours, and then durability was evaluated under the following conditions.
<내구성 평가조건><Durability Evaluation Condition>
* 고온 조건(표 4): 80℃, 500 시간 방치 전과 후의 파장별 투과율을 비교하였다.* High temperature conditions (Table 4): The transmittance | permeability by wavelength before and after leaving to stand at 80 degreeC and 500 hours was compared.
* 고온 및 고습 조건(표 5): 65℃, 90% RH, 500 시간 방치 전과 후의 파장별 투과율을 비교하였다.* High temperature and high humidity conditions (Table 5): 65 ℃, 90% RH, the transmittance for each wavelength before and after 500 hours left was compared.
[표 4][Table 4]
[표 5][Table 5]
상기 표 4 및 5에서 보는 바와 같이, 본 발명에 따른 실시예 5 및 6의 코팅 필름은 고온 조건 및 고온 고습 조건에서 장기간 방치한 후에도 투과율에 변화가 거의 없음을 알 수 있다.As shown in Tables 4 and 5, it can be seen that the coating films of Examples 5 and 6 according to the present invention have almost no change in transmittance even after long-term storage at high temperature and high temperature and high humidity conditions.
실험예 4: 화합물별 용해도 평가Experimental Example 4: Evaluation of Solubility by Compound
실시예 1의 방법에 기반하여, 표 1의 화합물 5와 화합물 6을 또한 합성하였고(화합물 5: 실시예 7, 화합물 6: 실시예 8), 이들의 MEK에 대한 용해도를 측정하 여, 그 결과를 실시예 1 내지 4의 화합물들에 대한 결과와 함께 하기 표 4에 나타내었다.Based on the method of Example 1, Compounds 5 and 6 of Table 1 were also synthesized (Compound 5: Example 7, Compound 6: Example 8), and their solubility in MEK was measured, and the result was Is shown in Table 4 below with the results for the compounds of Examples 1-4.
[표 6]TABLE 6
상기 표 4에서 보는 바와 같이, 실시예 2 내지 4(화합물 2 내지 4)는 실시예 1(화합물 1) 뿐만 아니라 실시예 7(화합물 5) 및 실시예 8(화합물 6)에 비해서도 월등히 높은 용매 용해도를 나타냄을 알 수 있다. As shown in Table 4, Examples 2 to 4 (Compounds 2 to 4) have significantly higher solvent solubility than not only Example 1 (Compound 1) but also Examples 7 (Compound 5) and Example 8 (Compound 6). It can be seen that.
용해도에 따른 효과를 확인하기 위하여, 상대적으로 용해도가 높은 실시예 1(화합물 1)을 사용하여 실시예 5에서와 동일한 방법으로 코팅 필름(실시예 9)을 제조하였다. In order to confirm the effect according to solubility, the coating film (Example 9) was prepared in the same manner as in Example 5 using Example 1 (Compound 1) having a relatively high solubility.
실시예 9(화합물 1)의 코팅 필름의 표면을 관찰한 결과, 도 2에 개시되어 있는 바와 같이, 일부 석출물이 확인되었다. 반면에, 실시예 5(화합물 2)의 코팅 필름과 실시예 6(화합물 3)의 코팅 필름에서는 상기와 같은 석출물들이 전혀 확인되지 않았다. 이러한 결과는 용매 용해도의 차이에 기인한 것으로 추측된다. As a result of observing the surface of the coating film of Example 9 (Compound 1), as shown in FIG. 2, some precipitate was confirmed. On the other hand, in the coating film of Example 5 (compound 2) and the coating film of Example 6 (compound 3), such precipitates were not found at all. This result is presumed to be due to the difference in solvent solubility.
따라서, 실시예 2 내지 4(화합물 2 내지 4)이 광학 필터용 코팅 필름을 제조함에 있어서, 특히 바람직함을 알 수 있다. Therefore, it can be seen that Examples 2 to 4 (Compounds 2 to 4) are particularly preferable in producing a coating film for an optical filter.
이상의 설명과 같이, 본 발명에 따른 장파장용 근적외선 흡수 화합물은 가시 광의 투과율이 높고, 특히 내구성, 용해도 및 수지와의 상용성이 우수하다.As described above, the long-wavelength near-infrared absorbing compound according to the present invention has a high transmittance of visible light and is particularly excellent in durability, solubility and compatibility with resins.
본 발명이 속한 분야에서 통상의 지식을 가진 자라면 상기 내용을 바탕으로 본 발명의 범주내에서 다양한 응용 및 변형을 행하는 것이 가능할 것이다. Those skilled in the art to which the present invention pertains will be able to perform various applications and modifications within the scope of the present invention based on the above contents.
도 1은 실험예 1에서 실시예 1 내지 4와 비교예 1 내지 2의 UV-vis spectrum data에 대한 그래프이다;1 is a graph for the UV-vis spectrum data of Examples 1 to 4 and Comparative Examples 1 and 2 in Experimental Example 1;
도 2는 실험예 4에서 실시예 9(화합물 1)의 코팅 필름의 표면에 대한 사진이다.2 is a photograph of the surface of the coating film of Example 9 (Compound 1) in Experimental Example 4.
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