KR101198761B1

KR101198761B1 - Nitride based light emitting diode

Info

Publication number: KR101198761B1
Application number: KR20060070212A
Authority: KR
Inventors: 문용태
Original assignee: 엘지이노텍 주식회사; 엘지전자 주식회사
Priority date: 2006-07-26
Filing date: 2006-07-26
Publication date: 2012-11-12
Also published as: KR20080010134A

Abstract

The present invention relates to a nitride-based light emitting device, and more particularly to a nitride-based light emitting device that can improve the luminous efficiency and reliability of the light emitting device. The present invention provides a light emitting device comprising: a light emitting layer including a quantum well layer and a quantum barrier layer; Preferably, the light emitting layer includes a stress relaxation layer positioned on at least one side of the quantum well layer.

Nitride, semiconductor, GaN, light emitting layer, stress.

Description

Nitride-based light emitting device

1 is a cross-sectional view showing an example of a conventional light emitting device structure.

2 is a cross-sectional view showing an embodiment of a light emitting device structure of the present invention.

3 is a cross-sectional view showing another embodiment of the light emitting device structure of the present invention.

Figure 4 is an enlarged cross-sectional view showing a stress relaxation layer of the present invention.

5 is an energy band diagram of an embodiment of the invention.

6 is an energy band diagram of another embodiment of the present invention.

7 is a cross-sectional view showing a horizontal light emitting device of the present invention.

8 is a cross-sectional view showing a vertical light emitting device of the present invention.

10: n-type semiconductor layer 20: light emitting layer

21: quantum well layer 22: quantum barrier layer

30: p-type semiconductor layer 40: stress relaxation layer

41: first layer 42: second layer

50 substrate 60 n-type electrode

70 p-type electrode 80 support layer

The present invention relates to a nitride-based light emitting device, and more particularly to a nitride-based light emitting device that can improve the luminous efficiency and reliability of the light emitting device.

Light Emitting Diodes (LEDs) are well-known semiconductor light emitting devices that convert current into light.In 1962, red LEDs using GaAsP compound semiconductors were commercialized, along with GaP: N series green LEDs. It has been used as a light source for display images of electronic devices, including.

The wavelength of light emitted by such LEDs depends on the semiconductor material used to make the LEDs. This is because the wavelength of the emitted light depends on the band-gap of the semiconductor material, which represents the energy difference between the valence band electrons and the conduction band electrons.

Gallium nitride compound semiconductors (Gallium Nitride (GaN)) have high thermal stability and wide bandgap (0.8 to 6.2 eV), which has attracted much attention in the development of high-power electronic components including LEDs.

One reason for this is that GaN can be combined with other elements (indium (In), aluminum (Al), etc.) to produce semiconductor layers that emit green, blue and white light.

In this way, the emission wavelength can be adjusted to match the material's characteristics to specific device characteristics. For example, GaN can be used to create white LEDs that can replace incandescent and blue LEDs that are beneficial for optical recording.

Due to the advantages of these GaN-based materials, the GaN-based LED market is growing rapidly. Therefore, since commercial introduction in 1994, GaN-based optoelectronic device technology has rapidly developed.

The brightness or output of the LED using the GaN-based material as described above is large, the structure of the active layer, the light extraction efficiency to extract light to the outside, the size of the LED chip, the type and angle of the mold (mold) when assembling the lamp package , Fluorescent material and the like.

On the other hand, one of the reasons why the growth of GaN-based semiconductors is more difficult than other III-V compound semiconductors is that there are no high-quality substrates, that is, wafers made of materials such as GaN, InN, and AlN.

Therefore, the LED structure is grown on a heterogeneous substrate such as sapphire, and many defects are generated, and these defects have a great influence on the LED performance.

As shown in FIG. 1, the basic structure of the LED of GaN-based material is a quantum well structure between the n-type semiconductor layer 1 as the electron injection layer and the p-type semiconductor layer 3 as the hole injection layer. An active layer 2 having wells is located.

In general, the active layer 2 for generating light has a nitride semiconductor multi-quantum well (MQW).

In this multi-quantum well structure, the quantum well layer 4 and the quantum barrier layer 5 are repeatedly stacked, and electrons and holes injected from the n-type semiconductor layer 1 and the p-type semiconductor layer 3, respectively. The quantum well layer 4 combines with each other to emit light.

In this case, the quantum well layer 4 is placed between the two quantum barrier layers 5 to constrain the electrons and holes quantum mechanically.

Therefore, in order to implement a high-brightness light emitting device, electrons and holes should be transported well to the quantum well layer 4, and transported electrons and holes should be efficiently coupled in the quantum well layer 4.

As a result, thin film crystallinity of the quantum well layer 4 and the quantum barrier layer 5 should be very excellent in order to implement a high brightness light emitting device.

Currently, the most representative quantum well structure of a nitride semiconductor light emitting device is composed of a gallium nitride (GaN) quantum barrier layer (5) and an indium gallium nitride (InGaN) quantum well layer (4).

However, GaN and InGaN described above inherently have very large crystal lattice mismatch. Therefore, the InGaN quantum well layer 4 is subjected to a large compressive stress.

This compressive stress deforms the energy band structure in the quantum well layer, thereby greatly reducing the luminescence properties, and also lowers the interfacial characteristics between the quantum barrier layer and the quantum well layer, and ultimately greatly reduces the luminous efficiency of the light emitting device. there was.

An object of the present invention is to provide a nitride-based light emitting device that can improve the reliability characteristics by controlling or suppressing the strain and crystal defects of the light emitting device, and by effectively constraining electrons and holes in the active layer.

In order to achieve the above technical problem, the present invention provides a light emitting device comprising: a light emitting layer including a quantum well layer and a quantum barrier layer; Preferably, the light emitting layer includes a stress relaxation layer positioned on at least one side of the quantum well layer.

The light emitting layer and the stress relaxation layer, the quantum barrier layer, the stress relaxation layer, and the quantum well layer is repeatedly laminated in order, or the quantum barrier layer, stress relaxation layer, quantum well layer, and stress relaxation layer is repeated in order It is preferable to laminate | stack.

The stress relaxation layer may have an average planar lattice constant greater than the lattice constant of the quantum barrier layer and less than the lattice constant of the quantum well layer.

The stress relaxation layer may be a superlattice layer in which semiconductor layers having different lattice constants are stacked.

In this case, the thickness of the superlattice layer, or more than 1/3 of the thickness of the quantum barrier layer, or 0.5 to 10nm is preferred, two layers having a different lattice constant may be composed of 2 to 40 pairs.

In addition, the thickness of each layer of the superlattice layer is preferably 1 to 10 atomic layers (monolayer).

The superlattice layer may be configured by alternately stacking AlInGaN materials having different lattice constants and band gaps.

The superlattice layer may further include a first layer formed of GaN; The second layer formed of InGaN or AlInGaN may be alternately stacked.

As another example, the superlattice layer may include a first layer of a material having a larger lattice constant than the quantum well layer; The second layer of a material having a smaller lattice constant than the quantum well layer may be alternately stacked.

On the other hand, it is preferable that the quantum well layer of the light emitting layer is formed of InGaN, wherein the composition of In of InGaN is represented by In _x Ga _1-x N, where x is 0.2 to 0.4 (0.2 ≤ x ≤). 0.4).

The first conductive semiconductor layer is located on one side of the light emitting layer, and the second conductive semiconductor layer is preferably located on the other side of the light emitting layer.

In addition, the ohmic electrode formed on any one side of the first conductive semiconductor layer or the second conductive semiconductor layer; A reflective electrode in contact with the ohmic electrode; In contact with the reflective electrode, and further comprising a support layer made of a metal or a conductive semiconductor may form a vertical light emitting device.

Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings.

As shown in FIG. 2, the structure of the nitride semiconductor light emitting device is composed of an n-type semiconductor layer 10 as an electron injection layer, a light emitting layer 20, and a p-type semiconductor layer 30 as a hole injection layer. The light emitting layer 20 in which light is generated has a single or multiple quantum well structure (QW) of a nitride semiconductor.

Among them, the multi-quantum well structure (MQW) has a quantum well layer (well 21) and a quantum barrier layer (barrier 22) repeatedly stacked and injected from the electron injection layer and the hole injection layer, respectively. Electrons and holes combine with each other in the quantum well layer 21 to generate light.

At this time, at least one side of the quantum well layer 21 may be provided with a stress relaxation layer 40.

In FIG. 2, an example in which the stress relaxation layer 40 is provided on one side of the quantum well layer 21 is illustrated.

FIG. 2 illustrates an embodiment in which the light emitting layer 20 is formed on the n-type semiconductor layer 10. In this case, a quantum barrier layer 22 is stacked on the n-type semiconductor layer 10. After the stress relaxation layer 40 is stacked on the barrier layer 22, the structure in which the quantum well layer 21 is stacked is repeatedly formed.

That is, in the stacking order, after the stress relaxation layer 40 is laminated on the quantum barrier layer 22, the quantum well layer 21 is laminated, and the stress relaxation layer 40 is formed on the quantum well layer 21. It is possible to relax the applied stress (accomodation).

In addition, as shown in FIG. 3, the stress relaxation layer 40 may be positioned between the quantum well layer 21 and the quantum barrier layer 22, respectively.

That is, the quantum barrier layer 22 is stacked on the n-type semiconductor layer 10, the stress relaxation layer 40 is laminated on the quantum barrier layer 22, and then the quantum well layer 21 is laminated. The structure in which the stress relaxation layer 40 is stacked on the quantum well layer 21 is repeated.

The stress relaxation layer 40 may use a superlattice layer in which semiconductor layers having different lattice constants are stacked.

More specifically, the average lattice constant of the superlattice layer constituting the stress relaxation layer 40 is greater than the lattice constant of the quantum barrier layer 22 and smaller than the lattice constant of the quantum well layer 21. This alternately stacked superlattice layer can be used.

4 shows a stress relaxation layer 40 formed of such a superlattice layer, which is composed of a first layer 41 and a second layer 42 having different lattice constants.

In FIG. 4, the superlattice lattice constant of the second layer 42 is larger than that of the first layer 41. In this case, the first layer 41 is under a tensile stress, and the second Layer 42 is subjected to compressive stress.

In this way, the superlattice layer can effectively act as the stress relaxation layer 40 because the layers 41 and 42 in the tensioned state and the compressed state are alternately stacked.

Each of the layers 41 and 42 of the superlattice layer may use a layer in which 1-10 atomic layers are formed, and the thickness of one stress relaxation layer 40 including the superlattice layer is 0.5-10 nm thick. It is preferable to form.

In addition, the superlattice layer may be formed by forming two to 40 pairs of two layers 41 and 42 having different lattice constants.

As described above, the average lattice constant of the superlattice layer constituting the stress relaxation layer 40 is greater than the lattice constant of the quantum barrier layer 22 and smaller than the lattice constant of the quantum well layer 21. One example of the alternately stacked structure may be configured by alternately laminating AlInGaN materials having different lattice constants and band gaps.

That is, the AlInGaN material is composed of the first layer 41 and the second layer 42 by varying the components of aluminum (Al) and indium (In).

In addition, the first layer 41 may be formed of GaN, and the AlInGaN or InGaN may be formed by stacking the second layer 42.

Meanwhile, the quantum barrier layer 22 of the light emitting layer 20 may be formed of a material such as GaN, InGaN, AlInGaN, and the quantum well layer 21 may be made of a material such as InGaN, AlInGaN, or the like.

In this case, when the quantum well layer 21 is formed of InGaN, the stress relaxation layer 40 may develop a larger effect when the In quantum well layer 21 contains a large amount of In components.

That is, when the quantum well layer 21 is composed of InGaN, and expressed as In _x Ga _1-x N, x is preferably 0.2 to 0.4 (0.2 ≦ x ≦ 0.4).

In FIG. 5, as in FIG. 2, a band structure in a state in which a stress relaxation layer 40 including a superlattice layer is formed only on one side of the quantum well layer 21 is illustrated.

As described above, in FIG. 5, the first layer 41 of the superlattice layer has a larger band gap than the quantum barrier layer 22, and the second layer 42 has a smaller band gap than the quantum barrier layer 22 and a quantum well layer. The band gap is larger than that of (21).

Meanwhile, as shown in FIG. 6, the first layer 41 of the superlattice layer is the quantum barrier layer 22 according to the components of the material forming the superlattice layer and the components of the material included in the quantum well layer 21. And band gap may be in the same state.

In addition, in FIG. 6, as shown in FIG. 3, the stress relaxation layer 40 including the superlattice layer is formed on both sides of the quantum well layer 21.

In some cases, the band gap of the second layer 42 of the superlattice layer may be lower than that of the quantum well layer 21.

Usually, InGaN containing In has a lattice constant larger than GaN, and an energy band gap is smaller than GaN. In addition, AlGaN containing Al has a larger bandgap than GaN. Therefore, by combining such components of In and Al, it is possible to form a stress relaxation layer 40 that can alleviate the stress applied to the quantum well layer 21.

The quantum well layer 21 of the quantum well structure described above is positioned between two quantum barrier layers 22 to constrain electrons and holes quantum mechanically.

Therefore, in order to implement a high-brightness light emitting device, electrons and holes must be transported well to the quantum well layer 21, and the electrons and holes thus transported can be efficiently combined in the quantum well layer 21.

As a result, the thin film crystallinity of the quantum well layer 21 and the quantum barrier layer 22 should be excellent in order to implement a high brightness light emitting device.

The most representative multi-quantum well structure of the nitride semiconductor light emitting device includes a gallium nitride (GaN) quantum barrier layer 22 having a relatively large band gap and an indium gallium nitride (InGaN) quantum well layer 21 having a relatively small band gap. Is done.

In order to improve light emission efficiency in the light emitting device structure, the gallium nitride (GaN) and indium gallium nitride (InGaN) are prepared as high quality thin films having excellent crystallinity.

However, these GaN and InGaN inherently has a very large crystal lattice mismatch. This means that the atomic radius of indium (In) is larger than the atomic radius of gallium (Ga), and the bonding force and bond length of indium (In) and nitrogen (N) are greater than the bonding force and bond length of gallium (Ga) and nitrogen (N), Each is weak and long.

Therefore, the InGaN quantum well layer 21 is severely subjected to compressive stress. The compressive stress deforms the energy band structure in the quantum well layer 21 to have some indirect transition characteristics when the electrons combine with the holes, so that the light emitting characteristics of the light emitting device may be greatly reduced.

In addition, the compressive stress lowers the interface characteristics between the GaN quantum barrier layer 22 and the InGaN quantum well layer 21, resulting in the loss of charges at the interface, which can greatly reduce the luminous efficiency of the light emitting device.

Therefore, the above-described problem can be solved by providing the stress relaxation layer 40 including the superlattice layer described above, and light emission efficiency can be greatly increased by relieving stress.

In addition, the stress relaxation layer 40 may allow the charges to be effectively confined to the quantum well layer 21.

7 shows an example of the horizontal light emitting device having the stress relaxation layer 40 described above.

As shown, it has the structure of the above-mentioned light emitting element which consists of the n-type semiconductor layer 10, the light emitting layer 20, and the p-type semiconductor layer 30 on the board | substrate 50, In this structure, it is n-type After the semiconductor layer 10 is etched to be exposed, the p-type electrode 70 and the n-type electrode 60 are provided.

8 shows an example of the vertical light emitting device having the above-described stress relaxation layer 40. As shown in FIG.

The structure of the above-described light emitting element consisting of the n-type semiconductor layer 10, the light emitting layer 20, and the p-type semiconductor layer 30 as described above is formed on a substrate (not shown), and the substrate is made of metal or The support layer 80 formed of the conductive semiconductor layer is separated from each other to form a state as shown in FIG. 8.

The p-type electrode 70 is positioned between the p-type semiconductor layer 30 and the support layer 80, and the p-type electrode 70 may be formed of an ohmic electrode 71 and a reflective electrode 72. have.

In this case, the ohmic electrode 71 may be a transparent electrode.

The light emitting device manufactured in such a form can greatly increase the luminous efficiency by mitigating the stress acting on the quantum well layer 21 by the action of the stress relaxation layer 40 described above, and the charges are increased in the quantum well layer 21. Can be effectively bound.

The above embodiment is an example for explaining the technical idea of the present invention in detail, and the present invention is not limited to the above embodiment, various modifications are possible, and various embodiments of the technical idea are all protected by the present invention. It belongs to the scope.

The present invention as described above has the following effects.

First, in the light emitting device according to the present invention, the band structure of the quantum well layer may be improved by the stress relaxation layer, thereby greatly improving the internal quantum efficiency.

Second, the stress relaxation layer of the present invention can improve the optical properties by making the stress distribution and the indium composition distribution in the nitride semiconductor quantum well layer grown thereon more uniform.

Third, the luminous efficiency can be greatly improved by improving the interface property between the stress relaxation layer and the quantum well layer of the present invention to greatly reduce the loss of charge at the interface.

Claims

In the light emitting device,

A light emitting layer including a quantum well layer and a quantum barrier layer;

Nitride-based light emitting device comprising a stress relaxation layer located on at least one side of the quantum well layer of the light emitting layer.

The method of claim 1, wherein the light emitting layer and the stress relaxation layer,

And the quantum barrier layer, the stress relaxation layer, and the quantum well layer are repeatedly stacked in order.

And the quantum barrier layer, the stress relaxation layer, the quantum well layer, and the stress relaxation layer are sequentially stacked in this order.

The nitride-based light emitting device according to claim 1, wherein the stress relaxation layer has an average planar lattice constant greater than the lattice constant of the quantum barrier layer and smaller than the lattice constant of the quantum well layer.

The nitride-based light emitting device according to claim 1, wherein the stress relaxation layer is a superlattice layer in which semiconductor layers having different lattice constants are stacked.

The nitride-based light emitting device according to claim 5, wherein the thickness of the superlattice layer is 1/3 or more of the thickness of the quantum barrier layer.

The nitride-based light emitting device according to claim 5, wherein the superlattice layer has a thickness of 0.5 to 10 nm.

The nitride-based light emitting device according to claim 5, wherein the superlattice layer is composed of two to forty pairs of two layers having different lattice constants.

The nitride-based light emitting device according to claim 5, wherein the superlattice layer has a thickness of 1 to 10 atomic layers forming each of the superlattice layers.

The nitride-based light emitting device according to claim 5, wherein the superlattice layer is formed by alternately stacking AlInGaN materials having different lattice constants and band gaps.

The method of claim 5, wherein the superlattice layer,

A first layer formed of GaN;

A nitride-based light emitting device characterized in that the second layer formed of InGaN or AlInGaN are laminated alternately.

The method of claim 5, wherein the superlattice layer,

A first layer of a material having a larger lattice constant than the quantum well layer;

And a second layer of a material having a lattice constant smaller than that of the quantum well layer.

The nitride-based light emitting device of claim 1, wherein the quantum well layer of the light emitting layer is formed of InGaN.

The nitride-based light emitting of claim 13, wherein x is 0.2 to 0.4 (0.2 ≦ x ≦ 0.4) when In is formed of In _x Ga _1-x N. device.