KR101172708B1 - wet type gas scrubber - Google Patents

wet type gas scrubber Download PDF

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Publication number
KR101172708B1
KR101172708B1 KR1020110129420A KR20110129420A KR101172708B1 KR 101172708 B1 KR101172708 B1 KR 101172708B1 KR 1020110129420 A KR1020110129420 A KR 1020110129420A KR 20110129420 A KR20110129420 A KR 20110129420A KR 101172708 B1 KR101172708 B1 KR 101172708B1
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KR
South Korea
Prior art keywords
cleaning
gas
cleaning liquid
separator
liquid
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KR1020110129420A
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Korean (ko)
Inventor
박종훈
성한욱
유미온
이경주
전민호
Original Assignee
유미온
주식회사 어드밴스드바이오테크놀로지
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Priority to KR1020110129420A priority Critical patent/KR101172708B1/en
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D47/00Separating dispersed particles from gases, air or vapours by liquid as separating agent
    • B01D47/12Washers with plural different washing sections
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D47/00Separating dispersed particles from gases, air or vapours by liquid as separating agent
    • B01D47/06Spray cleaning
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34Chemical or biological purification of waste gases
    • B01D53/74General processes for purification of waste gases; Apparatus or devices specially adapted therefor
    • B01D53/77Liquid phase processes
    • B01D53/78Liquid phase processes with gas-liquid contact
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2273/00Operation of filters specially adapted for separating dispersed particles from gases or vapours
    • B01D2273/30Means for generating a circulation of a fluid in a filtration system, e.g. using a pump or a fan

Abstract

The present invention is a technique related to a scrubber, in particular, it provides a technique that can effectively clean the contaminated gas through the novel cleaning liquid injection device and gas-liquid separation device of the present invention.

Description

Wet type gas scrubber

The present invention relates to a wet gas scrubber, which uses a gas-liquid separator that replaces a demister used to separate water from a gas in a conventional wet gas scrubber, and to make particulate droplets of a cleaning liquid. The present invention relates to a wet gas scrubber applying a specially designed cleaning solution spraying device.

Gas scrubbers are roughly classified into a wetting method and a burning method. Wetting scrubber is a structure that cleans and cools the exhaust gas using water, and has a relatively simple configuration, which is easy to manufacture and large-capacity, but has a disadvantage in that water-insoluble gas cannot be processed. The burning type scrubber has a structure in which a double gas passes through a burner, such as a hydrogen burner, to be directly burned, or indirectly burned by forming a high temperature chamber using a heat source and allowing exhaust gas to pass through the burner. Such a burning scrubber has an excellent effect on the treatment of ignitable gases, but is inadequate for the treatment of gases that are not well burned.

The present invention relates to a wetting scrubber, in the case of a wetting scrubber, a packed-type scrubber, a spray-type scrubber, a cyclone scrubber, a cyclonic scrubber, a venturi scrubber There are various methods such as scrubbers and ejector scrubbers.

In particular, the present invention relates to a spray tower scrubber, which, unlike a packed column scrubber, makes a droplet through a spray such as a nozzle without a packing material, unlike a packed column scrubber. The contaminant is absorbed by the mass transfer area.

1 is a view for explaining the typical structure of a conventional spray tower scrubber (100 '). Referring to FIG. 1, a contaminant gas is injected into the lower portion of the cylindrical chamber 3 ', and a cleaning liquid (mainly an aqueous solution in which an acidic or basic compound is dissolved in water) is a medium for absorbing and removing contaminants from the gas from the lower portion of the scrubber. It is circulated to the upper part, and becomes fine particles through the nozzle-type cleaning liquid spraying device 1 ', and absorbs and removes the pollutants from the polluted gas in contact with the polluted gas, and falls to the lower part of the scrubber. It is discharged to an external or other process in a dry gas state through a demister (2 ') to remove the gas.

The cleaning liquid spraying device 1 'in the conventional spray tower scrubber 100' uses a nozzle, which is expensive and is likely to be plugged due to contaminants contained in the cleaning liquid. . In addition, the conventional spray tower scrubber (100 ') uses a demister (demister, 2') to remove the water contained in the gas from which the contaminants have been removed from the droplets. The demister is a kind of filter, as shown in the enlarged view of FIG. 1, which overlaps the mesh in multiple layers and passes the steam to remove moisture in the steam. Since the demister is a filter, it is inevitably contaminated by impurities, and there are various problems such as channeling due to such contamination, resulting in poor water removal efficiency.

An object of the present invention is to replace a conventional demister, to provide a scrubber applying a gas-liquid separation device having a high separation efficiency of water without clogging or channeling phenomenon caused by contaminants.

In addition, it is an object of the present invention to provide a scrubber to which a cleaning liquid spraying device which can be manufactured at low cost and efficiently ejects droplets in place of the conventional nozzle type spraying apparatus.

The present invention provides a wet gas scrubber for purifying polluted gas through injection of a cleaning liquid, the wet gas scrubber comprising: a chamber having a gas inlet pipe through which the polluted gas flows and providing a space for mass transfer between the gas and the cleaning liquid; A washing liquid spraying device installed at one or more stages perpendicular to the chamber to spray droplets of the washing liquid; And a gas-liquid separator installed at an upper portion of the cleaning liquid spraying device to separate and remove moisture from a gas, wherein the cleaning liquid spraying device includes a cleaning liquid pipe having one or more cleaning holes through which cleaning liquid can be injected, and the cleaning liquid pipe and the lower portion of the cleaning liquid pipe. It provides a wet gas scrubber characterized in that it comprises a porous plate spaced apart in the cleaning liquid jetted from the cleaning hole to collide with the liquid.

In particular, it is preferable that the cleaning hole of the cleaning liquid spraying device further increases the cutting width from the inner diameter to the outer diameter so that the cleaning liquid is sprayed in a fan shape.

In particular, it is further provided with an extension forming cleaning liquid pipe in which the cleaning liquid pipe is extended to the outside of the chamber, wherein the extension forming cleaning liquid pipe has no cleaning holes, and it is preferable that the valve is formed in two branched portions.

In particular, the gas-liquid separator includes a cylindrical separator having one or more wet gas inlets through which water-containing gas (= wet gas) is introduced, and a cylindrical enlarged separator having a diameter larger than that of the separator on the separator. It is desirable to have.

In particular, although the diameter of the enlarged separator is larger than the diameter of the separator, the width may be narrowed toward the top.

In particular, the wet gas inlet of the gas-liquid separator is preferably installed in an oblique or normal direction away from a certain angle from the direction of the central axis of the separator.

In particular, it is preferable that an orifice is further provided on the separation part of the gas-liquid separator.

In addition, the present invention is a wet gas scrubber having a two-stage chemical liquid washing tower structure for cleaning contaminated gas with a basic cleaning liquid and an acidic cleaning liquid, respectively, having a gas inlet pipe through which contaminated gas flows and separated by an intermediate diaphragm. A chamber that serves as an acidic cleaning tower through which an acidic cleaning solution is injected, and an upper portion as a basic cleaning tower where the basic cleaning solution is injected; At least one cleaning liquid spraying device disposed in each of the cleaning towers to spray the cleaning liquid; And one or more gas-liquid separators respectively provided on top of the intermediate diaphragm and the chamber, wherein the cleaning liquid injection unit includes a cleaning liquid pipe having one or more cleaning holes through which cleaning liquid can be injected, and a lower portion of the cleaning liquid pipe. Provided is a wet gas scrubber having a two-stage chemical liquid washing tower structure is installed spaced apart and comprises a porous plate that can be droplets collide with the cleaning liquid injected from the cleaning hole.

In particular, it is preferable that the cleaning hole of the cleaning liquid spraying device further increases the cutting width from the inner diameter to the outer diameter so that the cleaning liquid is sprayed in a fan shape.

In particular, it is further provided with an extension forming cleaning liquid pipe in which the cleaning liquid pipe is extended to the outside of the chamber, wherein the extension forming cleaning liquid pipe has no cleaning holes, and it is preferable that the valve is formed in two branched portions.

In particular, the gas-liquid separator includes a cylindrical separator having one or more wet gas inlets through which water-containing gas (= wet gas) is introduced, and a cylindrical enlarged separator having a diameter larger than that of the separator on the separator. It is desirable to have.

In particular, although the diameter of the enlarged separator is larger than the diameter of the separator, the width may be narrowed toward the top.

In particular, the wet gas inlet of the gas-liquid separator is preferably installed in an oblique direction away from a predetermined angle from the direction of the central axis of the separation unit.

In particular, it is preferable that an orifice is further provided on the separation part of the gas-liquid separator.

In particular, the up-and-down order of the acidic washing tower and the basic washing tower may be changed.

The scrubber of the present invention can separate moisture from the gas at a high speed without a clogging phenomenon with a simple structure through a novel gas-liquid separation device replacing the conventional demister, and also has a simple structure of the cleaning liquid pipe and the porous plate instead of the conventional spray nozzle. Using the cleaning liquid injection value consisting of an effective cleaning liquid droplets there is an advantage that can increase the gas-liquid surface area.

1 is a view showing a conventional scrubber.
2 is a cross-sectional view of the scrubber according to the first embodiment of the present invention.
Figure 3a is a perspective view of the gas-liquid separator of the present invention, Figure 3b is a horizontal cross-sectional view, Figure 3c is a vertical cross-sectional view, Figure 3d is a cross-sectional view of another embodiment of the gas-liquid separator of the present invention, Figure 3e is an orifice added It is sectional drawing of a gas-liquid separator, and FIG. 3F is a perspective view of an orifice.
4A is a perspective view of the cleaning liquid spraying device of the present invention, FIGS. 4B and 4C are cross-sectional views, and FIG. 4D is a cross-sectional view of the scrubber of the present invention, showing that a plurality of cleaning liquid spraying devices are provided horizontally. It is for the drawing.
5A and 5B are views for explaining a washing method for removing dirt accumulated in the washing liquid spraying device.
6 is a cross-sectional view of a scrubber (two-step chemical liquid washing tower structure) according to a second embodiment of the present invention.
** Brief description of symbols in the drawing **
10: gas-liquid separator 11: separator
12: wet gas inlet 13: drain pipe
14: expansion separator 15: dry gas outlet
16: orifice 20: cleaning liquid spraying device
21: washing liquid pipe 22: washing liquid spraying hole
25: perforated plate 30: chamber
40: gas inlet pipe 50: circulation pump
60: washing liquid inlet pipe 70: extension forming cleaning liquid pipe
80: brush 90: middle septum
100: scrubber

Hereinafter, the present invention will be described with reference to the drawings.

1st Example  by Scrubber  rescue

2 is a cross-sectional view of the scrubber 100 according to the first embodiment of the present invention. The scrubber 100 of the present invention has a cylindrical chamber 30 as a basic form, and is different from the conventional scrubber 100 '. First, the novel gas-liquid separation device of the present invention replaces the conventional demister. (10) in the upper portion of the chamber 30, and second, in the present invention, instead of the nozzle for spraying the conventional cleaning liquid droplets, a novel type of cleaning liquid spraying device 10 is applied.

The washing liquid spraying apparatus 10 of the present invention is preferably composed of one or more stages in multiple stages vertically, and one or more washing liquid spraying apparatuses 10 may be provided in parallel with each other (see FIG. 4D). . This is to ensure that the cleaning liquid is uniformly sprayed horizontally and vertically.

The cleaning process of the contaminated gas in the scrubber 100 of the present invention is the same as the cleaning process of the conventional scrubber 100 '. That is, the polluted gas is introduced into the chamber 30 of the scrubber 100 through the gas inlet pipe 40 by a forced blower such as a blower (not shown), and then rises to the upper portion of the chamber 30. . On the other hand, the cleaning liquid may be collected in the lower portion of the chamber 30, or may be contained in a separate external cleaning liquid storage container. The cleaning liquid is distributed to each of the branched cleaning liquid spraying apparatuses 20 through the cleaning liquid inlet pipe 60 by the circulation pump 50. It is also possible to separately install a circulating pump for each cleaning liquid spraying device 20, but for the sake of economy and saving of installation space, it is preferable to use one circulating pump as shown in FIG. The cleaning liquid is dropletized to a size of about 0.5 to 1 mm through the cleaning liquid spraying device 20 of the present invention, thereby widening the total surface area, and the surface of such droplets serves as a material transfer interface to transfer contaminants from the rising pollutant gas. Receive and descend by gravity. The lowered washing liquid is circulated to the washing liquid spraying device again by a circulation pump or is transferred to the outside through a drain valve (not shown).

The gas passing through the cleaning liquid spraying device 20 is a gas in a wet state in which contaminants are removed but water is contained in the gas. Therefore, in order to remove such moisture, a filter type demister is conventionally used, but in the present invention, water is removed through a specially designed gas-liquid separator 10.

Hereinafter, a description will be given of the gas-liquid separation device 10 and the cleaning liquid injection device 20 which is a characteristic part of the present invention.

Gas liquid separator

Figure 3a is a perspective view of the gas-liquid separator of the present invention, Figure 3b is a horizontal cross-sectional view, Figure 3c is a vertical cross-sectional view, Figure 3d is a cross-sectional view of another embodiment of the gas-liquid separator of the present invention, Figure 3e is an orifice added 3 is a perspective view of an orifice.

As described above, the gas-liquid separator 10 of the present invention is completely different from the filter type demister 2 'in FIG. 1 and does not need to be replaced because the filter clogging does not occur because it is not a filter type. Compared to the filter type demister, the gas-liquid separation rate is faster.

The gas containing impurities (= contaminants) rises through the cleaning liquid spraying device 20 to remove impurities, but rises in the form of a wet gas containing water during the cleaning process. The wet gas inlet 12 through which the wet gas may flow is located at the lower portion of the separation part 11 in the form of a cylinder. The wet gas flowing into the lower part of the separator 11 rises while rotating naturally, and in this ascending process, heavy moisture naturally dense by the centrifugal force coagulates with each other and rides down the inner wall of the separator 11 downward. Falling, the water is discharged through the drain pipe 13 is installed in the lower portion of the separation unit 11, in particular, the bottom surface of the separation unit (11). The water discharged through the drain pipe 13 is freely dropped in the above-described chamber 30 and mixed with other cleaning liquids, and then circulated to the cleaning liquid injection device 20 through the circulation pump 50.

In the gas-liquid separator 10 of the present invention, it is preferable that one or more wet gas inlets 12 are installed on the lower wall surface of the separator 11. For example, although FIG. 3B shows an embodiment with two wet gas inlets 12, it is obvious that two or more may be possible. In particular, as shown in FIG. 3B, each of the wet gas inlets 12 is not an angle incident toward the central axis of the separation unit, but considers the rotational direction of the gas, so that the direction of the wet gas inlet 12 is the central axis direction of the separation unit 11. It is preferably located in an oblique direction or a normal direction. This is because the wet gas inlet 12 is positioned in an oblique direction instead of the central axis direction of the separating part 11, so that the wet gas flows in the direction of the rotating gas, and thus does not interfere with the rotational movement of the previously rotated gas. .

3c is wet gas enters the wet gas inlet 12 in the gas-liquid separation device 10 of the present invention, and ascends while rotating toward the top, in the process, the heavy gravity of the water is coupled to each other by centrifugal force It is a figure explaining falling to liquid water and riding on the inner wall surface of the separating part 11. The dry gas separated from the water is discharged to the outside atmosphere through the upper dry gas outlet 15 or transferred to another process. Although not shown in the drawings, it is obvious that a forced blower may be provided at the rear end of the dry gas outlet 15 of the gas-liquid separator 10 of the present invention to help discharge of the gas.

In addition, the gas-liquid separator 10 of the present invention preferably has an enlarged separator 14 having some or all of the diameter (D1) larger than the diameter (D2) of the separator 11 in order to increase the gas-liquid separation efficiency. . 3A to 3C, the cross-section of the enlarged separator 14 is narrowed toward the upper side, but it may be a cylindrical shape having the same diameter as the enlarged separator, as shown in FIG. 3D. The important point is that the diameter D1 of the enlarged separation portion 14 at the portion in contact with the separation portion 11 only needs to be larger than the diameter D2 of the separation portion. Thus, in the present invention, in addition to the separation unit 11, the expansion separation unit 14 is further provided because the centrifugal force is increased by increasing the diameter. For example, the centrifugal force = mrω 2 , and r is the radius, and the larger the radius, the greater the centrifugal force, and therefore, the greater the moisture, the better the cohesion.

In addition, in the case of the present invention, as shown in FIG. 3E, an orifice 16 having a diameter D3 smaller than the diameter D2 of the separation unit 11 may be further provided on the separation unit 11. This is because the orifice 16 is further provided on the upper portion of the separator 11 so that a substance such as dust in the gas collides with the orifice 16 and falls downward. The gas passes through the through hole 16a of the orifice 16 and enters the above-described enlarged separator 14. Figure 3f is an example of the orifice 16 usable in the present invention, as long as the diameter (D3) of the orifice (16) through the hole (16a) is smaller than the diameter (D2) of the separation portion can be used even if not in the form of Figure 3f Do. In addition, the water rising due to the orifice 16 also hits the orifice 16 can be separated from the gas can be obtained.

Cleaning liquid spray device

4A is a perspective view of the cleaning liquid spraying device of the present invention, FIGS. 4B and 4C are cross-sectional views, and FIG. 4D is a cross-sectional view of the scrubber of the present invention, showing that a plurality of cleaning liquid spraying devices are provided horizontally. It is for the drawing.

The cleaning liquid spraying device 20 of the present invention includes the cleaning liquid pipe 21 and the porous plate 25. First, the cleaning liquid pipe 21 has a basic shape of a conventional pipe having a space in which the cleaning liquid can flow. In addition to this basic form, the cleaning liquid spraying hole 22 is formed in the lower portion of the cleaning liquid pipe 21 at regular or irregular intervals in order to spray the cleaning liquid. The cleaning liquid sprayed into the cleaning liquid spraying hole 22 hits the porous plate 25 positioned below and is dispersed in the form of droplets having a small size, for example, particles having a size of 0.5 to 1 mm. Contaminants are delivered. In addition, some of the cleaning liquid passing through the porous plate 25 also receives the contaminants through the material exchange with the contaminating gas rising from the bottom. The cleaning liquid spraying apparatus 20 using the cleaning liquid pipe 21 and the porous plate 25 of the present invention increases the gas-liquid surface area, and does not block, and can maintain constant performance at all times, compared to the gas-liquid surface area increasing method using a conventional packing material. There is an advantage. In particular, by using the cleaning liquid pipe 21 instead of the nozzle, there is an advantage that the manufacturing cost is lowered and the cleaning is easy (these cleaning methods will be described in the table below).

As shown in FIG. 4B, the cleaning liquid spraying hole 22 is preferably formed by cutting at the same angle α between the inner diameter 23 and the outer diameter 24 with respect to the central axis of the cleaning liquid pipe 21. In addition, even if the angle is not the same angle with respect to the central axis, the cutting liquid is cut in an oblique direction (or "8" shaped incision) so as to increase the cutting width from the inner diameter 23 to the outer diameter 24, thereby cleaning liquid out of the washing liquid spraying hole 22. When it is injected, it is preferable to spray while spreading in a fan shape so as to hit the porous plate 25. This is because it is easy to make droplets when the spray is wide and hit the porous plate 25.

On the other hand, the porous plate 25 of the present invention can use a porous plate such as metal or plastic having a plurality of through holes. The cleaning liquid sprayed from the injection hole 22 of the cleaning liquid pipe 21 collides with droplets, and the cleaning liquid that has permeated through the holes of the porous plate 25 falls downward, and exchanges gas therethrough. It will remove contaminants. Moisture droplets hit by the porous plate 25 is present in the form of a mist (mist) in the upper portion of the porous plate 25, and removes contaminants through the contaminated gas and material transfer from the bottom.

In addition, as described above, in the present invention, the washing liquid spraying device 20 may be vertically configured in multiple stages (see FIG. 2), and one or more washing liquid spraying devices 20 may be provided horizontally as shown in FIG. 4D. It is preferable that the cleaning liquid is uniformly formed while covering the horizontal area in the chamber 30.

The cleaning liquid spraying apparatus 20 of the present invention has the advantage that the liquid-liquid contact surface area can be increased and the manufacturing cost is lower than that of the conventional packing material, while using the pipe and the porous plate of a very simple form, while lowering the cleaning liquid. In addition, when the injection nozzle is used, it is almost impossible to wash the injection nozzle, but in the present invention, it is possible to wash the cleaning liquid pipe 21. Hereinafter, the cleaning method of the cleaning liquid pipe 21 will be described.

Cleaning method of cleaning liquid spraying device

5A and 5B, the cleaning method of the cleaning liquid spraying device 20 of the present invention will be described. For reference, the valves 71 and 72 should be closed for normal pollutant cleaning operations. This requires the valves 71 and 72 to be closed. This is because the cleaning liquid is injected into the cleaning liquid injection hole 22 of the cleaning liquid pipe 21.

As an advantage of the cleaning liquid spraying device 20 of the present invention, it is not only cheaper than the cleaning liquid spraying device using the conventional nozzle, but also has the advantage of being directly cleaned by an operator. The cleaning liquid pipe 21 of the cleaning liquid spraying device 20 of the present invention has a portion that is further extended to the outside of the chamber 30, that is, an extension cleaning liquid pipe 70, and extends out of the chamber. There is no cleaning liquid injection hole 22 in 70, and two cleaning pipes 21 are branched as shown in FIGS. 2, 5A, and 5B, and valves 71 and 72 are provided at each branched part.

First, when a small amount of dirt, such as sludge, is stacked in the cleaning liquid pipe 21 of the cleaning liquid spraying device 20, the valve 71 is opened so that the cleaning liquid flows along the open valve 71. The dirt is discharged by the flow of. Since the cleaning liquid is normally supplied to the cleaning liquid spraying device 20 at a high pressure, the cleaning liquid is discharged at a high pressure by opening the valve 71, and contaminants in the cleaning liquid pipe 21 are swept away together during this discharge process.

On the other hand, if the dirt is excessively stacked in the cleaning liquid pipe 21, as shown in FIG. 5B, the valve of reference numeral 72 is opened, and the operator directly inserts the brush 80 into the cleaning liquid pipe 21, and then repeats left and right. By moving, dirt accumulated in the cleaning liquid pipe 21 can be removed. After cleaning using the brush 80, as shown in FIG. 5A, the valve 71 is opened, and the cleaning liquid is supplied at a high pressure to clean the brush, and the desorbed dirt from the cleaning liquid pipe 21 can be discharged to the outside together with the cleaning liquid. Can be.

Second Example  by Scrubber  rescue

6 is a cross-sectional view of a scrubber according to a second embodiment of the present invention. In the case of the second embodiment, the cleaning principle, the cleaning liquid spraying device and the gas-liquid separation device are the same as those of the first embodiment except that the structure of the two-stage chemical cleaning tower using the acidic cleaning liquid and the alkaline cleaning liquid is different. This two-stage chemical liquid washing tower has a structure known in the related art, and the scrubber of the second embodiment is also characterized by using the novel gas-liquid separator 10 and the cleaning liquid spraying apparatus 20 of the present invention.

Unlike the scrubber of the first embodiment described above, the scrubber of Example 2 has a two-stage scrubber tower structure in which the gas is washed twice with an acidic washing liquid and a basic washing liquid. This is because through the two-stage cleaning of the acidic cleaning liquid and the basic cleaning liquid, all the contaminants that are well dissolved in the basic and acidic cleaning liquid can be easily transferred from the gas to the cleaning liquid. In FIG. 6, the basic washing tower is at the top and the acid washing tower is at the bottom, but of course, the reverse direction may not be present. The acidic scrubber tower and the basic scrubber tower part separate the middle portion of one chamber 30 by the middle diaphragm 90, the upper part serves as a basic scrubber tower, and the lower part acts as an acid scrubber tower.

The scrubber 100 of the two-stage washing tower structure, which is the second embodiment, also has the same cleaning principle as that of the first embodiment, and the gas-liquid separator 10 and the washing liquid spraying device 20 are also the same.

As shown in FIG. 6, the polluted gas enters the lower scrubber tower of the scrubber having the two-stage scrubber tower structure through the gas inlet pipe 40 and rises. In the acid washing tower, which is a lower washing tower, an acid cleaning liquid is sprayed and dropped through the one or more stages of the washing liquid spraying device 20 to remove contaminants from the gas, and to remove moisture in the gas before going up to the basic washing tower. After the water is removed through the one or more gas-liquid separators 10 installed in the intermediate diaphragm 90, the base is raised to the basic washing tower. FIG. 6 shows an example in which two gas-liquid separators 10 are provided for removing water before the acid scrubbing tower is moved from the acid scrubber to the basic scrubber, but this is determined according to the amount of gas to be treated or the size of the chamber 30. To show that you can install more than.

In the upper basic washing tower, the aqueous solution in which the basic compound is dissolved is sprayed into the liquid through the washing liquid spraying device 20 to remove contaminants from the gas rising through the acid washing tower once more. Finally, the wet gas due to the basic cleaning liquid before being discharged to the atmosphere or another process is removed by removing the moisture by the gas-liquid separator 10. Preferably, at least one gas-liquid separator 10 is installed at the top of the chamber 30 to remove moisture from the wet gas after washing in a basic washing tower and then discharge it to the atmosphere or another process.

In the lower acid washing tower, a separate washing solution storage tank may be provided. However, in the case of the basic washing tower of the upper portion, a separate washing solution storage tank 51 is further provided outside the chamber 30, and then the washing solution storage tank 51 is provided. Circulates the basic washing liquid.

Unlike in FIG. 6, the acidic scrubber tower and the basic scrubber tower may be changed up and down, and thus description thereof will be omitted.

Claims (15)

  1. A wet gas scrubber for purifying polluted gas through injection of a cleaning liquid, comprising: a chamber having a gas inlet pipe through which the polluted gas flows and providing a space for mass transfer between the gas and the cleaning liquid;
    A washing liquid spraying device installed at one or more stages perpendicular to the chamber to spray droplets of the washing liquid; And
    A gas-liquid separator installed at an upper portion of the cleaning liquid spraying device to separate and remove moisture from a gas;
    The cleaning liquid spraying apparatus includes a cleaning liquid pipe having one or more cleaning holes through which cleaning liquids can be injected, and a porous plate spaced apart from the cleaning liquid pipes so that the cleaning liquids sprayed from the cleaning holes collide to form droplets. Done,
    The gas-liquid separator includes a cylindrical separator having at least one wet gas inlet through which water-containing gas (= wet gas) is introduced, and a cylindrical enlarged separator having a larger diameter than the separator at the top of the separator. Wet gas scrubber, characterized in that made.
  2. The wet gas scrubber according to claim 1, wherein the cleaning hole of the cleaning liquid spraying device further increases the cutting width from the inner diameter to the outer diameter so that the cleaning liquid is sprayed in a fan shape.
  3. The cleaning liquid pipe of claim 1, wherein the cleaning liquid pipe is further extended to the outside of the chamber, wherein the extension cleaning liquid pipe has no cleaning holes, and is divided into two branched valves respectively formed. Wet gas scrubber characterized in that.
  4. delete
  5. The wet gas scrubber according to claim 1, wherein the enlarged separation part has a diameter of a lower part than a diameter of the separation part, but is narrowed toward an upper part.
  6. The wet gas scrubber according to claim 1, wherein the wet gas inlet of the gas-liquid separator is installed in a diagonal direction or a normal direction deviated by an angle from the direction of the central axis of the separator.
  7. The wet gas scrubber according to claim 1, further comprising an orifice on an upper portion of the separator of the gas-liquid separator.
  8. In a wet gas scrubber having a two-stage chemical liquid washing tower structure in which a contaminated gas is washed with a basic washing liquid and an acid washing liquid, respectively.
    A chamber having a gas inlet pipe through which contaminated gas is introduced, separated by an intermediate diaphragm, and acting as an acid cleaning tower in which an acidic cleaning solution is injected, and an upper part serving as a basic cleaning tower in which a basic cleaning solution is injected;
    At least one cleaning liquid spraying device disposed in each of the cleaning towers to spray the cleaning liquid; And
    And a gas-liquid separator installed at least one of the intermediate diaphragm and the uppermost portion of the chamber,
    The cleaning liquid spraying apparatus includes a cleaning liquid pipe having one or more cleaning holes through which cleaning liquid can be injected, and a porous plate spaced apart from the cleaning liquid pipe so that the cleaning liquid sprayed from the cleaning hole collides to form droplets. Done,
    The gas-liquid separator includes a cylindrical separator having at least one wet gas inlet through which water-containing gas (= wet gas) is introduced, and a cylindrical enlarged separator having a larger diameter than the separator at the top of the separator. A wet gas scrubber having a two-stage chemical liquid washing tower structure.
  9. The wet gas scrubber of claim 8, wherein the cleaning hole of the cleaning liquid spraying device further increases the cutting width from the inner diameter to the outer diameter so that the cleaning liquid is sprayed in a fan shape.
  10. The cleaning liquid pipe of claim 8, wherein the cleaning liquid pipe is further extended to the outside of the chamber, and the extension cleaning liquid pipe has no cleaning holes, and is divided into two branches and each of which has a valve formed therein. A wet gas scrubber with a two-stage chemical liquid washing tower structure.
  11. delete
  12. The wet gas scrubber of claim 8, wherein the enlarged separation part has a diameter lower than that of the separation part, but is narrowed toward an upper part thereof.
  13. The wet gas scrubber of claim 8, wherein the wet gas inlet of the gas-liquid separator is installed in a diagonal direction or a normal direction deviated by a predetermined angle from the direction of the central axis of the separator.
  14. The wet gas scrubber of claim 8, further comprising an orifice on an upper portion of the separation part of the gas-liquid separator.
  15. 9. The wet gas scrubber of claim 8, wherein the acid cleaning tower and the basic cleaning tower are changed in the up and down order.
KR1020110129420A 2011-12-06 2011-12-06 wet type gas scrubber KR101172708B1 (en)

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Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101403130B1 (en) 2013-02-24 2014-06-11 주식회사 티에스엠텍 Ventilator
KR101535247B1 (en) * 2013-10-16 2015-07-30 운해이엔씨(주) Scrubber for removal of white plume and pollution material using flushing water purificatin unit not having waste water
KR101577573B1 (en) 2014-11-27 2015-12-15 휴켐스주식회사 Scrubber system for manufacturing ammonium nitrate
KR200479379Y1 (en) * 2014-08-20 2016-01-22 대우조선해양 주식회사 Exhaust Pipe for Scrubber
KR101600036B1 (en) 2014-12-04 2016-03-14 (주)테크윈 Apparatus for wet gas cleaning system using ultrasonic wave
KR200479940Y1 (en) 2014-08-26 2016-03-24 대우조선해양 주식회사 Exhaust Pipe for Scrubber
KR101630296B1 (en) 2016-03-30 2016-06-14 (주)유나 Acidic gas treatment apparatus
KR101630294B1 (en) 2016-03-30 2016-06-14 (주)유나 Management is easy harmful gas purifying device
KR101636372B1 (en) 2016-04-04 2016-07-05 (주)유나 The Noxious gas cleaning system
KR101636373B1 (en) 2016-03-30 2016-07-05 (주)유나 Scrubber for removing acidic gases
KR101988179B1 (en) * 2018-10-01 2019-09-26 원영학 advanced anaerobic digestion system
KR102013755B1 (en) 2018-06-27 2019-10-21 서울샤프중공업 주식회사 A scrubber
KR102044778B1 (en) 2019-02-18 2019-12-02 (주)유나 A fume hood including a neutralizing device and a neutralizing device

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Publication number Priority date Publication date Assignee Title
JP2000176319A (en) * 1998-12-16 2000-06-27 Sumika Nogyo Shizai Kk Water spraying body, its manufacture, water sprinkling tube and its manufacture
KR100605021B1 (en) * 2006-02-06 2006-07-28 (주) 바이오에너지개발 Phase separation scrubber according to odor characteristic
KR101012725B1 (en) * 2010-04-09 2011-02-09 (주)큰나무 Spray type gas filtering system with venturi effect

Patent Citations (3)

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Publication number Priority date Publication date Assignee Title
JP2000176319A (en) * 1998-12-16 2000-06-27 Sumika Nogyo Shizai Kk Water spraying body, its manufacture, water sprinkling tube and its manufacture
KR100605021B1 (en) * 2006-02-06 2006-07-28 (주) 바이오에너지개발 Phase separation scrubber according to odor characteristic
KR101012725B1 (en) * 2010-04-09 2011-02-09 (주)큰나무 Spray type gas filtering system with venturi effect

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101403130B1 (en) 2013-02-24 2014-06-11 주식회사 티에스엠텍 Ventilator
KR101535247B1 (en) * 2013-10-16 2015-07-30 운해이엔씨(주) Scrubber for removal of white plume and pollution material using flushing water purificatin unit not having waste water
KR200479379Y1 (en) * 2014-08-20 2016-01-22 대우조선해양 주식회사 Exhaust Pipe for Scrubber
KR200479940Y1 (en) 2014-08-26 2016-03-24 대우조선해양 주식회사 Exhaust Pipe for Scrubber
KR101577573B1 (en) 2014-11-27 2015-12-15 휴켐스주식회사 Scrubber system for manufacturing ammonium nitrate
KR101600036B1 (en) 2014-12-04 2016-03-14 (주)테크윈 Apparatus for wet gas cleaning system using ultrasonic wave
KR101630296B1 (en) 2016-03-30 2016-06-14 (주)유나 Acidic gas treatment apparatus
KR101630294B1 (en) 2016-03-30 2016-06-14 (주)유나 Management is easy harmful gas purifying device
KR101636373B1 (en) 2016-03-30 2016-07-05 (주)유나 Scrubber for removing acidic gases
KR101636372B1 (en) 2016-04-04 2016-07-05 (주)유나 The Noxious gas cleaning system
KR102013755B1 (en) 2018-06-27 2019-10-21 서울샤프중공업 주식회사 A scrubber
KR101988179B1 (en) * 2018-10-01 2019-09-26 원영학 advanced anaerobic digestion system
KR102044778B1 (en) 2019-02-18 2019-12-02 (주)유나 A fume hood including a neutralizing device and a neutralizing device

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