KR101128909B1 - Device and method for machining multi-layer substrate using laser beams having plural wavelength - Google Patents

Abstract

Disclosed are a multilayer substrate processing apparatus and a multilayer substrate processing method using a laser beam of a plurality of wavelengths. A transfer table capable of reciprocating along the first travel axis while supporting the stacked multi-layer substrate, and branching one of the plurality of laser beams having different wavelengths into one of the plurality of optical paths according to whether the rotating polarization optical system is rotated and the other laser A laser machining unit for aligning one of a plurality of processing axes that cross each other at a predetermined angle with respect to the beam, and machining the layers of the multilayer board along the aligned processing axes, and along the second driving axis formed to cross the first traveling axis. According to the multi-layer substrate processing apparatus including a gantry unit for reciprocating the laser processing unit, the machining direction can be changed without rotating the laser processing unit, so that laser processing can be performed in all directions during the machining process of the multilayer substrate, while also reducing the processing time. have.

Description

Device and method for machining multi-layer substrate using laser beams having plural wavelength}

The present invention relates to a multilayer substrate processing apparatus and a multilayer substrate processing method using a laser beam of a plurality of wavelengths.

One of the multilayer substrates, a solar cell, is a semiconductor device that converts light energy generated from the sun into electrical energy by a photovoltaic effect. Solar cells can be broadly classified into silicon solar cells and compound semiconductor solar cells according to the type of material. Among these, silicon solar cells using silicon as the light absorption layer are classified into crystalline substrate type solar cells such as single crystal or polycrystalline silicon solar cells and amorphous thin film solar cells.

The crystalline substrate type solar cell is manufactured using a semiconductor substrate, such as a silicon wafer, to produce a solar cell. The efficiency is high, but there is a limitation in minimizing the thickness in the process, and the expensive production cost is high due to the use of expensive semiconductor substrates. have.

Thin-film solar cells are manufactured by forming semiconductors in the form of thin films on substrates such as glass to manufacture solar cells. The thin-film solar cell can be manufactured in a thin thickness, and can be manufactured at low cost, thereby lowering production costs and being suitable for mass production. There is this.

In the case of thin film solar cells, hydrogenated amorphous silicon (a-Si: H, hereinafter called 'amorphous silicon') thin film is a p-type amorphous because the carrier diffusion distance is much smaller than that of a crystalline silicon substrate due to the properties of the material itself. A pin junction structure in which an i-type (intrinsic) amorphous silicon layer is added between silicon and n-type amorphous silicon is free of impurities. In the p-i-n junction structure, sunlight is incident on the light absorption layer (i-type amorphous silicon layer) through the p-type amorphous silicon layer. In this case, the light absorption layer is also referred to as a depletion layer because it is depleted by the p-type amorphous silicon layer and the n-type amorphous silicon layer having a high doping concentration. The photocurrent of an amorphous thin film solar cell is mostly due to the flow current generated from the depletion of the light absorption layer.

1A to 1G are diagrams for explaining a process of manufacturing such a thin film solar cell step by step. Referring to Figures 1a to 1g a general manufacturing method of a thin film solar cell step by step as follows.

First, transparent conductivity such as tin-doped indium oxide (ITO), fluorine-doped tin oxide (FTO), aluminum-doped zinc oxide (AZO), or the like, is first shown on the substrate 1 as shown in FIG. 1A. A front electrode layer 2 made of a transparent conductive oxide (TCO) is formed. Substrate 1 is formed of a material such as transparent glass so that sunlight can be incident, the front electrode layer 2 has a low energy absorption, so that the energy bandgap wide enough to pass most of the light, but also good electricity It is made of a conductive film of an oxide substrate doped so as to flow.

As shown in FIG. 1B, the front electrode layer 2 is patterned so that the deposited front electrode layer 2 is separated from each other by the front electrodes. The front electrode layer 2 performs a patterning process (P1 process) by using a laser having a wavelength of 1064 nm, for example, because it does not absorb the wavelength of the visible light region.

Next, the semiconductor layer 3 is formed on the patterned front electrode layer 2 as shown in FIG. 1C. In general, the semiconductor layer 3 has a p-i-n junction structure as described above. The semiconductor layer 3 may be formed by, for example, a chemical vapor deposition (CVD) method.

As shown in FIG. 1D, the semiconductor layer 3 is patterned so that a part of the front electrode layer 2 is exposed, and the semiconductor layers 3 are separated from each other. In this case, for example, a patterning process (P2 process) is performed using a laser of 532 nm wavelength.

Next, a back electrode layer 4 made of a metal such as aluminum (Al) is formed on the patterned semiconductor layer 3 as shown in FIG. 1E.

As shown in FIG. 1F, the rear electrode layer 4 is patterned to be separated from each other. In this case, the lower semiconductor layer 3 may be patterned together. In this case, for example, a patterning process (P3 process) is performed using a laser of 532 nm wavelength.

Next, as illustrated in FIG. 1G, the front electrode layer 2, the semiconductor layer 3, and the back electrode layer 4 are formed, and a thin film type solar cell substrate in which patterning processes (P1, P2, and P3 processes) are respectively performed. For the 50, an active area composed of unit cells that produce electricity through actual photoelectric conversion by performing an isolation process, and an active area positioned at the edge of the substrate and surrounding the active area It is divided into a dummy area to be protected. In this case, the front electrode layer 2 is removed using, for example, a laser of 1064 nm wavelength due to the characteristic of not absorbing the wavelength of the visible light region, and the semiconductor layer 3 and the back electrode layer 4 are, for example, 532 nm wavelength. It is removed using a laser. In general, the isolation groove 5 having a narrower shape than the first groove 5a using the laser of 532 nm wavelength and the second groove 5b using the laser of 1064 nm wavelength is formed.

In addition, by performing a separation process of separating the unit cells in the active region, the remaining unit cells may be normally operated even if damage occurs to any one unit cell. In this case, the separation process, like the isolation process, requires the removal of the front electrode layer 2, the semiconductor layer 3, and the back electrode layer 4 on the separation lines between the unit cells. .

When multi-layer substrates are processed using lasers of different wavelengths, such as an isolation process and / or a ceratization process, separate optical axes exist for lasers of each wavelength, and lasers of multiple wavelengths are aligned to perform processing. When the direction of rotation is required for the processing axis to be performed, it takes a considerable time to rotate and align the laser unit, thereby increasing the process tact time.

The above-described background technology is technical information that the inventor holds for the derivation of the present invention or acquired in the process of deriving the present invention, and can not necessarily be a known technology disclosed to the general public prior to the filing of the present invention.

According to the present invention, by using a polarization optical system in the use of a laser beam of a plurality of wavelengths, the processing direction can be switched without rotating the laser processing unit, so that a multi-layer substrate processing process, for example, an isolation process or / and a separator of a thin film solar cell substrate To provide a multi-layer substrate processing apparatus and a multi-layer substrate processing method using a laser beam of a plurality of wavelengths that can be laser processing in all directions during the ration process and can reduce the processing time.

In addition, the present invention provides a multilayer substrate processing apparatus and a multilayer substrate processing method using a laser beam of a plurality of wavelengths that can be changed in the processing direction by changing the traveling path of the polarized laser beam by rotating the polarization optical system itself changes its polarization state It is to provide.

According to an aspect of the present invention, a plurality of optical paths according to whether the rotation polarization optical system rotates one of a plurality of laser beams having different wavelengths from each other, a transfer table capable of reciprocating along a first travel axis while supporting the stacked multilayer substrate. A laser processing unit and a first traveling shaft which branches to one of the laser beams to align one of a plurality of processing axes that cross each other at a predetermined angle with respect to the other laser beam, and processes the layers of the multilayer substrate along the aligned processing axes; Provided is a multi-layer substrate processing apparatus including a gantry unit for reciprocating a laser machining portion along a second travel shaft formed to cross.

Each of the plurality of machining axes may be parallel to the first travel axis and the second travel axis.

The laser processing unit includes a first laser light source that emits a first laser beam, a second laser light source that emits a second laser beam having a wavelength band different from that of the first laser beam, and one of the first laser beam and the second laser beam. Is transmitted as is, and the other is a rotating polarization optical system for branching to one of the plurality of optical paths depending on whether the rotation, and the first laser beam to transmit the laser beam transmitted through the rotation polarization optical system to the first position where the plurality of processing axes cross A second position on the machining axis parallel to the first travel axis among the plurality of machining axes or a third on the machining axis parallel to the second travel axis among the plurality of machining axes, by the projection unit and the laser beam branched by the rotation polarization optical system; It may include a second projection unit and a third projection unit to be irradiated to the position, respectively.

The rotation polarization optical system alternately changes between the first polarization state and the second polarization state according to rotation, and in the first polarization state, the P-polarized component of the laser beam belonging to a predetermined range of wavelength bands is transmitted as it is, and the S-polarized component is predetermined. In the second polarization state, the S-polarized component of the laser beam belonging to the wavelength range of the predetermined range may be transmitted as it is, and the P-polarized component may be reflected at the predetermined angle.

When the second laser beam belongs to a predetermined range of wavelength bands, a P-polarized or S-polarized second laser beam is incident on the rotation polarization optical system, and the second laser beam is positioned at the second position and the third according to whether the rotation polarization optical system is rotated. It can be irradiated to one of the locations. Here, the first laser beam may be irradiated to the first position through the rotating polarization optical system as it is.

The laser processing unit includes a first laser beam disposed on an emission optical axis emitted from the rotation polarization optical system, and transmits the first laser beam as it is, and reflects the second laser beam emitted along the emission optical axis by a predetermined angle, thereby causing the second projection unit. Or a reflection and transmission mirror incident on the third projection unit.

The first projection unit is coupled to one side of the first projection unit such that one of the plurality of machining axes is parallel to the first travel axis, and the first neighboring side is formed so that the other one of the plurality of machining axes is parallel to the second travel axis. The third projection unit may be coupled to the other side of the projection unit.

The laser processing unit may further include an optical axis coupling unit coupling the optical axes of the first laser beam and the second laser beam to allow the first laser beam and the second laser beam to be incident to the rotation polarization optical system along the same incident optical axis.

The multilayer substrate is a thin film solar cell substrate, and the multilayer substrate processing apparatus may perform at least one of an isolation process and a separation process by irradiating and processing a laser beam having a visible wavelength and a laser beam having an infrared wavelength. have.

On the other hand, according to another aspect of the present invention, a method for processing a multi-layer substrate, (a) loading the multi-layer substrate on the transfer table, (b) forward movement of the transfer table along the first travel axis to the first travel shaft Laser machining the first edge of the multilayer board using a laser processing part fixed at a predetermined position among the second running axes of the intersecting gantry units, (c) the transfer table is fixed, and the laser processing part is formed along the second travel axis. Laser processing a second edge of the multilayer board while moving in one direction perpendicular to the driving axis, (d) using a laser processing part fixed at a predetermined position of the second driving axis while moving the transfer table backward along the first driving axis Laser processing the third edge of the multi-layer substrate, and (e) the transfer table is fixed, and the laser machining portion is in a different direction perpendicular to the first travel axis along the second travel axis. Laser processing a fourth edge of the multilayer substrate while moving, wherein the laser processing part branches one of the plurality of laser beams having different wavelengths into one of the plurality of optical paths according to whether the rotation polarization optical system is rotated and the other one. The laser beam may be aligned with one of a plurality of processing axes that cross each other at a predetermined angle with respect to the laser beam, and the layers of the multilayer substrate may be processed along the aligned processing axes.

Each of the plurality of machining axes may be parallel to the first travel axis and the second travel axis.

At least one of steps (b) and (d) is preceded by controlling whether the rotating polarization optical system is rotated such that one of the plurality of laser beams has a polarization state such that one of the laser beams is aligned with a processing axis parallel to the first travel axis. Can be.

At least one of steps (c) and (e) is preceded by controlling whether the rotating polarization optical system is rotated such that one of the plurality of laser beams has a polarization state such that one of the laser beams is aligned with a processing axis parallel to the second travel axis. Can be.

The multilayer substrate is a thin film solar cell substrate, and the laser processing unit may perform one or more of an isolation process and a separation process by irradiating and processing a laser beam having a visible wavelength and a laser beam having an infrared wavelength.

Other aspects, features, and advantages will become apparent from the following drawings, claims, and detailed description of the invention.

According to a preferred embodiment of the present invention, by using a polarization optical system in the use of a laser beam of a plurality of wavelengths can be switched without the rotation of the laser processing portion, the machining direction can be changed, for example, a thin film solar cell substrate In the isolation process and / or the separation process, laser processing can be performed in all directions, but the processing time can be shortened.

In addition, the polarization optical system itself is rotated and the polarization state is changed, thereby changing the traveling path of the polarized laser beam, thereby changing the processing direction.

1A to 1G are diagrams for explaining a process of manufacturing such a thin film solar cell step by step.
Figure 2a is a perspective view schematically showing a multi-layer substrate processing apparatus for performing the processing of a multi-layer substrate according to an embodiment of the present invention.
Figure 2b is a plan view showing a multi-layer substrate processing apparatus shown in Figure 2a.
Figure 2c is a side view showing the multilayer substrate processing apparatus shown in Figure 2a.
Figure 3a is a perspective view schematically showing an enlarged laser processing unit according to an embodiment of the present invention.
3B is a cross-sectional view of the laser processing part taken along the line AA of FIG. 3A.
3C is a cross-sectional view of the laser processing part taken along line BB of FIG. 3A.
4A and 4B illustrate branching of a laser beam according to a state of a rotating polarization optical system according to an embodiment of the present invention.
Figure 5 is a flow chart showing a method for processing a multi-layer substrate using a multi-layer substrate processing apparatus according to an embodiment of the present invention.
6a to 6e is a conceptual diagram showing a thin film solar cell manufacturing process according to an embodiment of the present invention.
7A and 7B illustrate a process according to a first embodiment of forming an isolation line.
8A and 8B illustrate a process according to a second embodiment of forming an isolation line.

BRIEF DESCRIPTION OF THE DRAWINGS The present invention is capable of various modifications and various embodiments, and specific embodiments are illustrated in the drawings and described in detail in the detailed description. However, this is not intended to limit the present invention to specific embodiments, it should be understood to include all transformations, equivalents, and substitutes included in the spirit and scope of the present invention. In the following description of the present invention, if it is determined that the detailed description of the related known technology may obscure the gist of the present invention, the detailed description thereof will be omitted.

The terms first, second, etc. may be used to describe various components, but the components should not be limited by the terms. The terms are used only for the purpose of distinguishing one component from another.

The terminology used herein is for the purpose of describing particular example embodiments only and is not intended to be limiting of the present invention. Singular expressions include plural expressions unless the context clearly indicates otherwise. In this application, the terms "comprise" or "have" are intended to indicate that there is a feature, number, step, operation, component, part, or combination thereof described in the specification, and one or more other features. It is to be understood that the present invention does not exclude the possibility of the presence or the addition of numbers, steps, operations, components, components, or a combination thereof.

In the present invention, as an example of the multilayer substrate, as shown in FIG. 1F, the thin film solar cell substrate 50 having the front electrode layer 2, the semiconductor layer 3, and the back electrode layer 4 formed on the substrate 1 is centered. As described above, the present invention is not limited to the scope of the present invention, and the same content may be applied to a multilayer board in which a plurality of layers are stacked, which requires processing by lasers having a plurality of wavelengths superimposed at predetermined positions.

Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings.

Figure 2a is a perspective view schematically showing a multi-layer substrate processing apparatus for performing a multi-layer substrate processing according to an embodiment of the present invention, Figure 2b is a plan view showing a multi-layer substrate processing apparatus shown in Figure 2a, Figure 2c Figure 2a is a side view showing a multi-layer substrate processing apparatus shown in Figure 2, Figure 3a is a perspective view schematically showing an enlarged laser processing unit according to an embodiment of the present invention, Figure 3b is a cross-sectional view of the laser processing unit along the line AA of Figure 3a. 3C is a cross-sectional view of the laser processing unit taken along line BB of FIG. 3A, and FIGS. 4A and 4B are diagrams illustrating branching of a laser beam according to a state of a rotating polarization optical system according to an exemplary embodiment of the present invention.

2A to 4B, the multilayer substrate processing apparatus 10, the base plate 12, the thin film type solar cell substrate 50, the transfer table 20, the receiving groove 22, and the first travel shaft 24. , Driving unit 26, gantry unit 30, vertical frame 32, horizontal girder 34, second travel shaft 36, laser processing unit 40, first laser light source 42a, second laser The light source 42b, the first projection 44a, the second projection 44b, the third projection 44c, the rotation polarization optical system 60, the first reflection and transmission mirror 47a, the second reflection and Transmission mirror 47b, first reflection mirror 48a, second reflection mirror 48b, first focusing lens 46a, second focusing lens 46b, third focusing lens 46c, first processing axis M1, the second machining axis M2, the first position P1, the second position P2, and the third position P3 are shown.

In this embodiment, one of the laser beams having different wavelengths may be controlled to rotate in two or more optical paths by the rotation polarization optical system to travel in a desired direction among the two optical paths so that the laser processing unit may be rotated without rotating the laser processing unit. All four edges of the solar cell substrate can be processed, and the tact time of the entire process is shortened.

Hereinafter, the 'thin film solar cell substrate' is a thin film type solar cell in which the formation and patterning of the front electrode layer, the formation and patterning of the semiconductor layer, the formation and patterning of the back electrode layer, that is, the P1 to P3 processes are completed, as shown in FIGS. 1A to 1F. The term "battery board 50" is used.

The multi-layer substrate processing apparatus 10 according to the present embodiment includes a transfer table 20 capable of reciprocating along the first travel shaft 24 while supporting the loaded thin film solar cell substrate 50 and a plurality of different wavelengths. First or all of the layers of the thin film solar cell substrate 50 using one of the laser beams of the thin film solar cell substrate 50 by using another one of the laser beams of a plurality of wavelengths for the first processed region. The gantry for reciprocating the laser processing part 40 for secondary processing of a part of the layers or all of the remaining layers along the second travel axis 36 intersecting the first travel axis 24. The unit 30 is made into a basic skeleton.

Conventionally, when performing an isolation process along an edge of a rectangular thin-film solar cell substrate or a separation process that separates unit cells, the processing axis is in the X-axis direction and the Y-axis when processing with a laser beam having visible and infrared wavelengths. There must be at least two in the direction, and because the laser processing unit must be rotated and aligned in order to change the processing direction, the time required for processing is increased and the tact time of the entire process is increased.

Therefore, in the present embodiment, a laser beam of the first wavelength λ 1 (infrared wavelength, for example, 1064 nm) (hereinafter referred to as a “first laser beam”) and a second wavelength λ 2 (visible light wavelength, For example, by splitting the optical path with respect to any one of the laser beam (hereinafter referred to as the "second laser beam") of the 532nm) by using a rotation polarization optical system in the X-axis direction or Y-axis direction without rotation of the laser processing unit itself It is easy to align the machining axis and shorten the tact time of the whole process.

Hereinafter, it will be described on the assumption that the thin film type solar cell substrate 50 has a rectangular shape. This is for the convenience of understanding and description of the invention, the scope of the present invention is not limited thereto.

The transfer table 20 loads and moves the thin film solar cell substrate 50 in the accommodation groove 22 therein at a predetermined initial position. The transfer table 20 moves along the Y-axis direction along the first travel shaft 24 defining the movement path of the transfer table 20. For this purpose, the first travel shaft 24 is moved along a predetermined path. For example, the table 20 may be made of a linear motor (LM) guide or a ball screw. In the figure, an example in which guide rails spaced at predetermined intervals on both sides of a horizontal center line (Y-axis direction) of the base plate 12 functions as the first travel shaft 24 is illustrated.

The driving unit 26 extending in the Y-axis direction and transmitting power to the transfer table 20 may be installed in the base plate 12. The transfer table 20 may reciprocate along the first travel shaft 24 in the Y-axis direction by the power transmitted from the driving unit 26.

When the thin film solar cell substrate 50 is supplied from one end of the first travel shaft 24 and the thin film solar cell substrate 50 is carried out to the other end of the first travel shaft 24, the first travel shaft 24 is provided. At one end, a loading unit (not shown) for supplying the thin film solar cell substrate 50 to be laser processed is disposed, and the unloading to carry out the laser processed thin film solar cell substrate 50 at the other end of the first travel shaft 24. Department (not shown) is located.

The transfer table 20 along the first travel shaft 24 may move to the loading unit to load and move the thin film type solar cell substrate to be laser processed. In this process, the thin film type solar cell substrate is lifted up from the top such as a gripper. Various loading methods can be applied.

The transfer table 20 moves along the first travel shaft 24 in the state where the thin film solar cell substrate 50 is loaded and passes through the lower portion of the gantry unit 30 installed at a predetermined position, thereby providing an isolation process or a separation process. Since the edge of the thin film solar cell substrate 50 loaded on the transfer table 20 serves to perform laser processing, the loaded thin film solar cell substrate 50 is fixed to the transfer table 20 so as not to move. It is good.

In addition, the receiving groove 22 is provided with an alignment portion for aligning the thin film solar cell substrate 50. In the multilayer substrate processing apparatus 10 according to the present embodiment, the laser processing portion 40 is a thin film type. In performing the isolation process or the separation process with respect to the solar cell substrate 50, accurate laser processing may be performed.

In addition, the receiving groove 22 may be further provided with a dust collecting unit (not shown) for collecting dust, foreign matter, etc. generated during the laser processing process.

In the unloading unit, as in the loading unit, various carrying methods such as a method of pulling up a thin film solar cell substrate from the top, such as a gripper, may be applied.

Thereafter, the transfer table 20 returns to the loading unit along the first travel shaft 24 and loads the thin film type solar cell substrate to be subsequently laser processed to repeat the above-described process.

The laser processing unit 40 includes a first laser light source 42a that emits a first laser beam, a second laser light source 42b that emits a second laser beam, and a first laser beam and a second laser beam. The first position of the thin film solar cell substrate 50 includes a rotating polarization optical system 60 for transmitting one light beam and branching the other optical path according to whether the optical system is rotated, and a laser beam transmitted through the rotation polarization optical system 60. The first projection portion 44a irradiated to P1 and the laser beam whose optical path is branched by the rotation polarization optical system 60 are used as the second position P2 and the third position P3 of the thin film solar cell substrate 50. ) And a second projection portion 44b and a third projection portion 44c respectively irradiated.

The second projection part 44b is coupled to one side of the first projection part 44a, and the second projection part 44b is coupled to one side of the side of the first projection part 44a adjacent to the side to which the second projection part 44b is coupled. The three projection parts 44c are coupled. That is, the second projection part 44b and the third projection part 44c are coupled to each other by a predetermined angle with respect to the first projection part 44a, which is the first machining axis M1 and the second machining. Corresponds to the angle formed by the axis M2.

Each of the first projection part 44a, the second projection part 44b, and the third projection part 44c respectively allows the incident laser beam to be irradiated to a predetermined position of the thin film solar cell substrate 50. ), A second focusing lens 46b, and a third focusing lens 46c, and a mirror for changing the optical path of the laser beam (second reflection and transmission mirror 47b, first reflection mirror as necessary). 48a, the second reflection mirror 48b) may be further included.

Here, the first position P1 and the second position P2 are aligned on the first machining axis M1, and the first position P1 and the third position P3 are on the second machining axis M2. By being aligned in the position, when the laser beam is irradiated to the first position P1 and the second position P2, the laser machining along the first machining axis M1 is performed and the first position P1 and the third position When the laser beam is irradiated at (P3), laser processing along the second processing axis M2 is performed, thereby obtaining the same effect as changing the direction of the processing axis without rotating the laser processing unit 40 itself. .

The first machining axis M1 and the second machining axis M2 cross each other at the first position P1, and the first machining axis M1 is formed on the thin film type solar cell substrate 50 by the transfer table 20. It corresponds to the movement direction (Y-axis direction), and the 2nd processing axis M2 corresponds to the movement direction (X-axis direction) of the laser processing part 40. FIG.

The first laser beam and the second laser beam are aligned on and irradiated on the first machining axis M1 or the second machining axis M2 so that the layers of the thin film solar cell substrate 50 (front electrode layer, semiconductor layer, Back electrode layer).

Here, the laser processing unit 40 may include a rotational polarization optical system along the incident optical axis 72 in which the first laser beam and the second laser beam emitted from each of the first laser light source 42a and the second laser light source 42b are the same. It may further include an optical axis coupling portion to be incident to the 60.

The optical axis coupling unit combines an optical axis of the first laser beam and an optical axis of the second laser beam by changing an optical path of at least one of the first laser beam and the second laser beam. As illustrated in FIG. 3B, the optical axis coupling portion reflects the first laser beam and transmits the second laser beam so that the first laser beam and the second laser beam have the same optical path. Can be.

The rotation polarization optical system 60 may change the optical paths of the P polarization component and the S polarization component of the laser beam belonging to the wavelength range of the predetermined range according to the degree of rotation. The laser beam that does not belong to the wavelength band of the predetermined range may pass through the rotation polarization optical system 60 as it is. In the present exemplary embodiment, the wavelength band of the predetermined range is assumed to be a visible light band and assumes that the first laser beam does not belong to the second laser beam, but the scope of the present invention is not limited thereto.

The first laser beam and the second laser beam are incident on the rotation polarization optical system 60, and the first laser beam passes through the rotation polarization optical system 60 as it is, and the second laser beam is emitted from the rotation polarization optical system 60. The light path of the second laser beam may be branched by being transmitted as it is or is reflected and emitted according to the degree of rotation.

The rotation polarization optical system 60 is in the form of a transparent cube as shown in FIGS. 4A and 4B, in which a polarizing film is attached in a diagonal direction or a material having polarization characteristics is applied (for example, deposition). It may be. The rotation polarization optical system 60 is rotated by a predetermined angle about the incident optical axis 72 by, for example, a driving means such as a motor, so as to be in the first polarization state (see FIG. 4A) and the second polarization state (see FIG. 4B). The state changes alternately, and transmission or reflection of the specific polarization component of the laser beam (second laser beam in this embodiment) belonging to the wavelength band of a predetermined range can be controlled.

Referring to FIG. 4A, in the first polarization state, the P polarization component is transmitted to the second laser beam incident along the incident optical axis 72 and is emitted along the first emission beam 74, and the S polarization component is reflected at a predetermined angle. And exits along the second exit optical axis 76.

In addition, referring to FIG. 4B, in the second polarization state in which the rotation polarization optical system 60 is rotated by 90 degrees in the clockwise direction with respect to the first polarization state, S is applied to the second laser beam incident along the incident optical axis 72. The polarization component is transmitted and exits along the first output light axis 74, and the P polarization component is reflected at a predetermined angle and exits along the third output light axis 78.

Therefore, when the second laser beam has only the S polarization component, the second laser beam is transmitted as it is when the rotation polarization optical system 60 is in the second polarization state, and the rotation polarization optical system 60 is in the first polarization state. In this case, it is reflected at a predetermined angle. That is, the optical path of the laser beam having only the S-polarized component, that is, the laser beam defined by the S-polarized light, depends on whether the rotating polarization optical system 60 is rotated or not, so that the first output light axis 74 and the second output light axis 76, 2 Can be branched along the two exiting optical axes.

Further, when the second laser beam has only the P polarization component, the second laser beam is transmitted as it is when the rotation polarization optical system 60 is placed in the first polarization state, and the rotation polarization optical system 60 is placed in the second polarization state. In this case, it is reflected at a predetermined angle. That is, the optical path of the laser beam having only the P polarization component, that is, the laser beam defined as P polarization, depends on whether the rotating polarization optical system 60 is rotated or not, so that the first exiting light axis 74 and the third exiting light axis 78, 2 Can be branched along the two exiting optical axes.

A separate polarization means (not shown) may be further provided at the rear end of the second laser light source 42b so that the second laser beam has only a P polarization component or an S polarization component.

Hereinafter, the path of the laser beam will be described based on the case where the second laser beam is polarized to have only the P polarization component. However, the scope of the present invention is not limited thereto, and the second laser beam has only the S polarization component. Of course, it may be polarized.

Here, in the cross section shown in FIG. 3B, the rotation polarization optical system 60 is in a first polarization state as shown in FIG. 4A, and in the cross section shown in FIG. 3C, the rotation polarization optical system 60 is shown in FIG. 4B. Assume that it is in the second polarization state as is.

The optical path of the first laser beam emitted from the first laser light source 42a is changed by the optical axis coupling unit, and the same optical axis as the second laser beam emitted from the second laser light source 42b and transmitted through the optical axis coupling unit is transmitted. To have.

When the P-polarized second laser beam is incident on the rotation polarization optical system 60 in the first polarization state, the second laser beam is transmitted as it is (see FIGS. 3B and 4A), and the second reflection and transmission mirror 47b Is reflected by the second projection unit 44b. The first reflection mirror 48a is provided in the second projection part 44b so that the second laser beam is irradiated to the second position P2.

When the P-polarized second laser beam is incident on the rotation polarization optical system 60 in the second polarization state, the second laser beam is reflected by a predetermined angle (see FIGS. 3C and 4B), and the third projection unit 44c Proceed towards. The second reflecting mirror 48b is provided in the third projection part 44c so that the second laser beam is irradiated to the third position P3.

Here, the first laser beam passes through the rotation polarization optical system 60 irrespective of the state of the rotation polarization optical system 60 and also transmits the second reflection and transmission mirror 47b provided in the first projection unit 44a. It is irradiated to one position P1.

The gantry unit 30 is disposed to intersect the first travel shaft 24 of the transfer table 20 at a predetermined position, and the laser processing unit 40 enables the reciprocating movement along the gantry unit 30, thereby transferring the transfer table. During the process of moving the thin film solar cell substrate 50 loaded in the loading unit from the loading unit to the unloading unit, an isolation process or a separation process is performed through laser processing on each edge of the thin film solar cell substrate 50. .

The gantry unit 30 includes a vertical frame 32 installed in both directions of the first travel shaft 24 in a vertical direction, and a horizontal girder 34 provided between the vertical frames 32. The horizontal girder 34 is formed in the X-axis direction so that the second travel shaft 36 serving as the movement path of the laser processing part 40 intersects the first travel shaft 24. In the drawing, although the guide rail is formed on the side of the horizontal girders 34 to perform the function of the second travel shaft 36, the present invention is not limited thereto, and the horizontal girders 34 according to the embodiment. It may be formed on the upper or lower surface of the).

The laser processing part 40 reciprocates along the second travel axis 36 which defines the movement path of the laser processing part 40, and for this purpose, the second travel axis 36 is laser processed along a predetermined path. For example, the part 40 may be made of an LM guide or a ball screw.

According to the present embodiment, when processing the edge parallel to the first travel axis 24 of the edge of the thin-film solar cell substrate 50, the laser processing unit 40 is placed in a stationary state at a predetermined position and the transfer table ( 20) moves along the first travel shaft 24 so that laser processing is performed on the corresponding edges. In the case of processing the edge crossing the first travel shaft 24, that is, parallel to the second travel shaft 36, the transfer table 20 is stopped at a predetermined position and the laser processing part 40 is formed. 2 is moved along the travel shaft 36 so that laser processing is performed for the corresponding edge. Here, the moving speed along the first travel shaft 24 of the transfer table 20 and the moving speed along the second travel shaft 36 of the laser processing unit 40 may be adjusted according to the laser processing speed at each edge. have.

5 is a flowchart illustrating a method of processing a multilayer substrate using a multilayer substrate processing apparatus according to an embodiment of the present invention, and FIGS. 6A to 6E illustrate a process of manufacturing a thin film solar cell according to an embodiment of the present invention. 7A and 7B illustrate a process according to a first embodiment of forming an isolation line, and FIGS. 8A and 8B illustrate a process according to a second embodiment of forming an isolation line.

6A to 6E, the multilayer substrate processing apparatus 10, the base plate 12, the thin film solar cell substrate 50, the transfer table 20, the receiving groove 22, and the first travel shaft 24. , Drive 26, gantry unit 30, laser machining 40, isolation lines 80a, 80b, 80c, 80d are shown.

The present embodiment relates to a method of performing laser processing such as an isolation process or a separation process by driving the above-mentioned multilayer substrate processing apparatus 10 with respect to a multilayer substrate, for example, a thin film solar cell substrate 50. In addition to the multilayer substrate processing apparatus according to the embodiment, various components may be added, changed, or omitted.

Further, hereinafter, the present invention relates to a process of forming an isolation line on all four sides of the thin film solar cell substrate 50 by laser-processing the edge of the thin film solar cell substrate 50 in a counterclockwise direction. The present invention is not limited thereto, and of course, laser processing may be performed in a clockwise direction.

As will be described later, the present embodiment is a method for shortening the tact time of the entire process by changing the processing direction without rotating the laser processing part 40 in processing the edge of the thin film solar cell substrate 50. The thin film type solar cell substrate 50 will be described from the step of being loaded on the transfer table 20.

When the thin film solar cell substrate 50 is loaded in the loading unit and is carried out from the unloading unit through the gantry unit 30, the loading unit side is forward and unloaded based on the moving direction of the thin film solar cell substrate 50. The loading side will be described as referred to as the rear.

As shown in FIG. 6A, the thin film type solar cell substrate 50 is loaded on the transfer table 20 (step S110), and the transfer table 20 moves forward along the first travel shaft 24. (Step S120).

Here, the alignment operation may be preceded with respect to the thin film solar cell substrate 50 moving along the first travel shaft 24. The alignment operation may be performed by the alignment unit provided in the accommodation groove 22 of the transfer table 20.

Next, as illustrated in FIG. 6B, the thin film type solar cell substrate 50 (or the thin film type solar cell substrate 50 that has been aligned as needed) is loaded along the transfer table 20. An isolation process is performed on the first edge while moving toward the rear side to form the isolation line 80a (step S130). Here, the laser processing unit 40 is positioned in a stationary state (first state) at a predetermined position so that laser processing of the first edge can be performed smoothly.

In this case, the rotation polarization optical system 60 of the laser processing unit 40 is controlled to be in the first polarization state, so that the first laser beam is irradiated to the first position P1 and the second laser beam is shown in FIG. 3B. By irradiating to this 2nd position P2, laser processing is performed along the 1st processing axis M1 parallel to a 1st edge.

In the laser processing of the first edge of the thin film solar cell substrate 50, as shown in FIGS. 7A and 7B, first processing by a second laser beam is performed to perform the semiconductor layer 3 and the back electrode layer 4. ) Is removed to form a first groove (90a) to expose the front electrode layer (2), the secondary processing by the first laser beam is performed by the forward movement of the thin-film solar cell substrate 50, the first groove By removing the front electrode layer 2 in the exposed region by the 90a to form the second groove 90b, the isolation groove 90 including the first groove 90a and the second groove 90b may be formed. have. Here, the processed portion (second groove 90b) by the first laser beam is narrower in width than the processed portion (first groove 90a) by the second laser beam, so that a stepped isolation groove 90 is formed. This prevents the electrical connection between the front electrode layer 2 and the back electrode layer 4 in the active region.

After the laser processing on the first edge is completed, as shown in FIG. 6C, the laser processing unit 40 moves the second travel shaft 36 perpendicular to the first travel shaft 24 along the gantry unit 30. Accordingly, an isolation process is performed on the second edge while moving toward one direction (downward in FIG. 6C) to form the isolation line 80b (step S140). Here, the transfer table 20 is positioned in a stationary state so that laser processing of the second edge may be smoothly performed.

In this case, the rotation polarization optical system 60 of the laser processing part 40 is controlled to be in the second polarization state, so that the first laser beam is irradiated to the first position P1 as shown in FIG. 3C and the second laser beam is shown. By irradiating to this 3rd position P3, laser processing is performed along the 2nd processing axis M2 parallel to a 2nd edge.

In the case of laser processing the second edge of the thin film type solar cell substrate 50, similarly to the case of processing the first edge, as shown in FIGS. 7A and 7B, first processing by the second laser beam is performed first. The semiconductor layer 3 and the back electrode layer 4 are removed to form a first groove 90a for exposing the front electrode layer 2, and the first laser beam is moved by one direction movement of the laser processing part 40. The secondary processing is performed to remove the front electrode layer 2 in the exposed area by the first groove 90a to form the second groove 90b, so that the first groove 90a and the second groove 90b are formed. Isolation grooves 90 may be formed. Here, the processed portion (second groove 90b) by the first laser beam is narrower in width than the processed portion (first groove 90a) by the second laser beam, so that a stepped isolation groove 90 is formed. This prevents the electrical connection between the front electrode layer 2 and the back electrode layer 4 in the active region.

After the laser processing on the second edge is completed, as shown in FIG. 6D, the thin film type solar cell substrate 50 loaded on the transfer table 20 moves backward along the transfer table 20 while moving forward. An isolation process is performed with respect to the third edge by 40 to form an isolation line 80c (step S150). Here, the laser processing part 40 is positioned in the stopped state (second state) at a predetermined position so that laser processing on the third edge can be performed smoothly.

In this case, the rotation polarization optical system 60 of the laser processing unit 40 is controlled to be in the first polarization state, so that the first laser beam is irradiated to the first position P1 and the second laser beam is shown in FIG. 3B. By irradiating to this 2nd position P2, laser processing is performed along the 1st processing axis M1 parallel to a 3rd edge.

In laser processing the third edge of the thin-film solar cell substrate 50, as shown in FIGS. 8A and 8B, first processing by the first laser beam is first performed, so that the front electrode layer 2 is formed from the rear electrode layer 4. The third groove (95a) is removed to be formed, and the secondary processing by the second laser beam is performed by the backward movement of the thin film solar cell substrate 50, the semiconductor layer around the third groove (95a) By forming the fourth groove 95b from which the third electrode 3 and the rear electrode layer 4 are removed, the isolation groove 95 can be finally formed. Here, a stepped isolation groove 95 is formed because the width of the processed portion (third groove 95a) by the first laser beam is narrower than that of the processed portion (fourth groove 95b) by the second laser beam. This prevents the electrical connection between the front electrode layer 2 and the back electrode layer 4 in the active region.

After the laser processing on the third edge is completed, as shown in FIG. 6E, the laser processing unit 40 is in the other direction perpendicular to the first travel shaft 24 along the gantry unit 30 (upward in FIG. 6E). ), An isolation process is performed with respect to the fourth edge while moving toward) to form an isolation line 80d (step S160). Here, the transfer table 20 is positioned in a stopped state at a predetermined position so that laser processing of the fourth edge can be performed smoothly.

In this case, the rotation polarization optical system 60 of the laser processing part 40 is controlled to be in the second polarization state, so that the first laser beam is irradiated to the first position P1 as shown in FIG. 3C and the second laser beam is shown. By irradiating to this 3rd position P3, laser processing is performed along the 2nd processing axis M2 parallel to a 2nd edge.

In the case of laser machining the fourth edge of the thin film solar cell substrate 50, similarly to the case of machining the third edge, as shown in FIGS. 8A and 8B, first processing by the first laser beam is performed first. The third grooves 95a removed from the rear electrode layer 4 to the front electrode layer 2 are formed, and the secondary processing by the second laser beam is performed by moving the laser processing part 40 in the other direction. The isolation groove 95 may be finally formed by forming the fourth groove 95b from which the semiconductor layer 3 and the rear electrode layer 4 around the third groove 95a are removed. Here, a stepped isolation groove 95 is formed because the width of the processed portion (third groove 95a) by the first laser beam is narrower than that of the processed portion (fourth groove 95b) by the second laser beam. This prevents the electrical connection between the front electrode layer 2 and the back electrode layer 4 in the active region.

After the laser processing on the fourth edge is completed, the transfer table 20 moves forward to carry out the laser-processed thin film solar cell substrate 50 with respect to all four sides to the unloading unit (step S170). The machining process is completed.

In this embodiment, the control method of the transfer table and the laser processing unit for multi-layer substrate processing according to the embodiment of the present invention described above may be performed in combination with a predetermined device, for example, a laser processing device after being stored in the recording medium. have. Here, the recording medium may be a magnetic or optical recording medium such as a hard disk, a video tape, a CD, a VCD, a DVD, or a database of a client or server computer built offline or online.

Although the present invention has been described on the assumption that the laser beam for which the optical path is split by the rotation polarization optical system is the second laser beam, that is, the visible light wavelength band, this is only one embodiment, and the rotation polarization optical system may have various wavelengths as necessary. It is possible to branch the optical path to the laser beam in the band. In this case, the laser beam to be branched may be polarized before being incident on the rotation polarization optical system.

Although the above has been described with reference to a preferred embodiment of the present invention, those skilled in the art to which the present invention pertains without departing from the spirit and scope of the present invention as set forth in the claims below It will be appreciated that modifications and variations can be made.

10: multi-layer substrate processing apparatus 12: base plate
20: transfer table 22: receiving groove
24: first travel shaft 26: drive unit
30: gantry unit 32: vertical frame
34: horizontal girder 36: second running shaft
40: laser processing part 42a, 42b: laser light source
44a, 44b, 44c: Projector 46a, 46b, 46c: Focus Lens
47a, 47b: reflective and transmissive mirrors 48a, 48b: reflective mirrors
60: rotation polarization optical system 72: incident optical axis
74, 76, 78: Output beam axis 80a, 80b, 80c, 80d: Isolation line

Claims (15)

An apparatus for processing a multilayer substrate,
A transfer table reciprocating along a first travel shaft while supporting the stacked multi-layer substrate;
One of the plurality of laser beams having different wavelengths is branched into one of the plurality of optical paths depending on whether the rotating polarization optical system is rotated, so that one of the plurality of processing axes that cross each other at an angle with respect to the other laser beam is formed. A laser processing unit for aligning and processing the layers of the multilayer substrate along the aligned processing axes; And
And a gantry unit configured to reciprocate the laser processing unit along a second travel shaft formed to intersect the first travel shaft.
The method of claim 1,
Wherein one of the plurality of machining axes is parallel to the first travel axis, and the other of the plurality of machining axes is parallel to the second travel axis.
The method of claim 2,
The laser processing unit,
A first laser light source for emitting a first laser beam;
A second laser light source to emit a second laser beam having a wavelength band different from that of the first laser beam;
A rotating polarization optical system that transmits one of the first laser beam and the second laser beam as it is, and branches the other into one of the plurality of optical paths depending on whether the second laser beam is rotated;
A first projection unit for irradiating a laser beam transmitted through the rotation polarization optical system to a first position where the plurality of processing axes intersect;
A second position on the machining axis parallel to the first travel axis among the plurality of machining axes, or a laser beam branched by the rotation polarization optical system, or on the machining axis parallel to the second travel axis among the plurality of machining axes. A multi-layer substrate processing apparatus comprising a second projection and a third projection to be irradiated to each of the three positions.
The method of claim 3,
The rotation polarization optical system is alternately changed into a first polarization state and a second polarization state depending on whether the rotation polarization optical system,
In the first polarization state, the P polarization component of the laser beam belonging to the wavelength range of the predetermined range is transmitted as it is, and the S polarization component is reflected at a predetermined angle.
In the second polarization state, the S-polarized component of the laser beam belonging to the wavelength range of the predetermined range is transmitted as it is, multilayer processing apparatus characterized in that the P-polarized component is reflected at a predetermined angle.
The method of claim 4, wherein
When the second laser beam belongs to the wavelength range of the predetermined range, a second P-polarized or S-polarized laser beam is incident on the rotation polarization optical system,
And the second laser beam is irradiated to one of the second position and the third position depending on whether the rotating polarization optical system is rotated.
The method of claim 5,
And the first laser beam passes through the rotating polarization optical system as it is and is irradiated to the first position.
The method of claim 6,
The laser processing unit is disposed on an emission optical axis from which the first laser beam is emitted from the rotation polarization optical system, and transmits the first laser beam as it is and the second laser beam emitted along the emission optical axis is a predetermined angle. And a reflection and transmission mirror which reflects and enters the second projection unit or the third projection unit.
The method of claim 3,
The second projection part is coupled to one side of the first projection part such that one of the plurality of processing axes is parallel to the first travel axis, and the other one of the plurality of processing axes is parallel to the second travel axis. And a third projection unit coupled to the other side of the first projection unit adjacent to one side.
The method of claim 3,
The laser processing unit may further include an optical axis coupling unit coupling the optical axes of the first laser beam and the second laser beam to allow the first laser beam and the second laser beam to be incident on the rotation polarization optical system along the same incident optical axis. Multi-layer substrate processing apparatus characterized in that.
The method according to any one of claims 1 to 9,
The multilayer substrate is a thin film solar cell substrate,
The multilayer substrate processing apparatus performs at least one of an isolation process and a separation process by irradiating and processing a laser beam having a visible wavelength and a laser beam having an infrared wavelength.
As a method of processing a multilayer substrate,
(a) loading the multi-layer substrate on the transfer table;
(b) lasering the first edge of the multilayer board using a laser processing unit fixed to a predetermined position of a second travel shaft of the gantry unit crossing the first travel shaft while moving the transfer table forward along the first travel shaft; Processing;
(c) the transfer table is fixed, and laser processing the second edge of the multilayer substrate while moving the laser processing part along one direction perpendicular to the first travel axis along the second travel axis;
(d) laser machining a third edge of the multi-layer substrate using the laser processing unit fixed to a predetermined position of the second driving shaft while moving the transfer table backward along the first driving shaft; And
(e) the transfer table is fixed, and laser processing the fourth edge of the multilayer substrate while moving the laser processing part along the second travel axis in another direction perpendicular to the first travel axis,
The laser processing unit may divide one of a plurality of laser beams having different wavelengths into one of a plurality of optical paths according to whether the rotating polarization optical system is rotated, and cross the other processing while forming a predetermined angle with respect to the other laser beam. And aligning one of the axes, and processing the layers of the multilayer substrate along the aligned processing axis.
The method of claim 11,
Wherein one of the plurality of processing shafts is parallel to the first travel shaft, and the other of the plurality of processing shafts is parallel to the second travel shaft.
The method of claim 12,
At least one of the steps (b) and (d) controls whether the rotating polarization optical system is rotated to have a polarization state such that one of the plurality of laser beams is aligned with a processing axis parallel to the first travel axis. Multi-layer substrate processing method characterized in that the step is preceded.
The method of claim 12,
At least one of the steps (c) and (e) controls whether the rotating polarization optical system is rotated to have a polarization state such that one of the plurality of laser beams is aligned with a processing axis parallel to the second travel axis. Multi-layer substrate processing method characterized in that the step is preceded.
15. The method according to any one of claims 11 to 14,
The multilayer substrate is a thin film solar cell substrate,
And processing the laser processing unit by irradiating and processing a laser beam having a visible wavelength and a laser beam having an infrared wavelength to perform at least one of an isolation process and a separation process.

Images