KR101111691B1 - Pattern roll making apparatus - Google Patents

Abstract

One embodiment of the present invention relates to a pattern roll forming apparatus for performing photoresist coating, UN exposure, development, etching, drying and cleaning processes for forming a pattern on a target roll in a single chamber.

According to an embodiment of the present invention, a pattern roll forming apparatus includes a chamber accommodating a target roll, a mask having a pattern to be molded on the target roll, a photoresist liquid injection nozzle for spraying a photoresist liquid on the target roll, and the target A doctor blade for uniformly forming a thickness of the photoresist liquid on a roll; a UV lamp for exposing the photoresist by irradiating UV to the target roll through the mask; and spraying a developer onto the photoresist irradiated with UV light. A developing solution spray nozzle, a cleaning liquid spray nozzle for spraying a cleaning liquid onto the target roll to clean foreign substances generated in the previous steps, a hot air pen for drying or curing the pattern of the cleaned target roll, and an etching solution And a fifth spray nozzle for etching the pattern formed on the object roll.

Pattern roll, forming, exposure, developing, etching, cleaning

Description

Pattern Roll Forming Equipment {PATTERN ROLL MAKING APPARATUS}

The present invention relates to a pattern roll forming apparatus, and more particularly, to a pattern roll forming apparatus which performs photoresist coating, UN exposure, developing, etching, drying and cleaning processes for forming a pattern on a target roll in a single chamber. It is about.

As is known, the pattern rolls used for gravure printing or offset printing form the pattern of the object to be printed. This pattern roll is patterned by photo lithography.

In general, a photolithography process coats a photoresist on a target roll, exposes the photoresist by irradiating UV through a mask on which a pattern is formed, develops by spraying a developer onto the UV-resisted photoresist, and after cleaning, the target roll The pattern may be formed on the target roll by drying the pattern developed on the substrate, etching the pattern formed on the target roll, and drying the target roll on which the pattern is formed after washing.

However, in the related art, the processes for forming the pattern roll are performed in separate apparatuses, each forming an independent space, and thus, many apparatuses are required to form one pattern roll.

In addition, since the target roll during pattern molding has to be moved between processes, the process becomes complicated and the process execution time becomes long, and foreign matter may adhere to the surface of the target roll during movement, thereby preventing pattern roll molding.

One embodiment of the present invention relates to a pattern roll forming apparatus for performing photoresist coating, UN exposure, development, etching, drying and cleaning processes for forming a pattern on a target roll in a single chamber.

According to an embodiment of the present invention, a pattern roll forming apparatus includes a chamber accommodating a target roll and forming a closed space, a mask provided on one side of the chamber having a pattern to be molded on the target roll, and a photoresist on the target roll. A photoresist liquid jet nozzle provided toward the object roll to eject the liquid, a doctor blade in close contact with and spaced from the object roll to form a constant thickness of the photoresist liquid on the object roll, and the object roll through the mask UV lamp provided on one side of the mask to irradiate UV to expose the photoresist, a developer jet nozzle installed toward the object roll to develop by spraying the developer onto the photoresist irradiated with UV, the target roll Spray the cleaning liquid onto the object to clean the foreign matter generated in the previous steps. The target roll to etch the pattern formed on the target roll by spraying a cleaning liquid jet nozzle installed toward the target, a hot air pen installed toward the target roll to dry or cure the pattern of the cleaned target roll, and an etching solution Etching liquid injection nozzle is provided toward the.

The mask and the UV lamp may be installed above the chamber, and may be installed in a first cylinder that is installed in a vertical direction to the chamber and operates linearly.

The doctor blade may be installed on the side of the chamber and installed in a horizontally installed second cylinder in a horizontal direction in the chamber.

The photoresist liquid jet nozzle may include an eleventh jet nozzle and a twelfth jet nozzle which are disposed on both sides of the photoresist jet nozzle with the target roll interposed therebetween.

The developer injection nozzle may include a twenty-first injection nozzle and a twenty-second injection nozzle disposed opposite to each other with the object roll interposed therebetween and mounted in the chamber.

The cleaning liquid spray nozzle is a rinse spray nozzle installed toward the target roll to spray the rinse on the target roll to clean the foreign substances generated in the previous steps, and the target to clean the rinse by spraying ultra pure water on the target roll. It may include an ultrapure water injection nozzle that is installed toward the roll.

The rinse injection nozzle may include a thirty-first injection nozzle and a thirty-second injection nozzle disposed opposite to each other with the target roll interposed therebetween.

The ultrapure water injection nozzle may include a forty-first injection nozzle and a forty-second injection nozzle disposed opposite to each other with the target roll interposed therebetween and mounted in the chamber.

The etchant injection nozzle may include a fifty-first injection nozzle and a fifty-second injection nozzle disposed opposite to each other with the object roll interposed therebetween and mounted in the chamber.

The chamber may have a discharge port below.

Thus, according to an embodiment of the present invention, the target roll is mounted in the chamber, and a mask, a UV lamp, a doctor blade, a hot air pen, and a plurality of injection nozzles are provided to perform all processes in a single chamber, thereby patterning the target roll. There is an effect of simplifying the processes for forming the mold and reducing the space for pattern forming of the target roll.

Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings so that those skilled in the art may easily implement the present invention. The present invention may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein. In order to clearly illustrate the present invention, parts not related to the description are omitted, and the same or similar components are denoted by the same reference numerals throughout the specification.

1 is a configuration diagram of a pattern roll forming apparatus according to an embodiment of the present invention, a state diagram of the step of mounting a mask and the target roll, Figure 2 is a pattern roll forming apparatus of FIG. It is a process chart.

1 and 2, a pattern roll forming apparatus according to an embodiment includes a chamber 1, a mask 2, a doctor blade 3, a UV lamp 4, a hot air pen 5, and a plurality of sprays. Nozzles 10, 20, 30, 40, 50. For example, the injection nozzles 10, 20, 30, 40, and 50 may be a photoresist injection nozzle 10, a developer injection nozzle 20, a cleaning solution injection nozzle (more specifically, a rinse injection nozzle 30). And ultra pure water (DeIonize Water) injection nozzles (40) and etching liquid injection nozzles (50).

The chamber 1 provides a space in the target roll 6 to perform the whole process of forming the pattern. Since the chamber 1 injects various kinds of liquids through the plurality of injection nozzles 10, 20, 30, 40, and 50 from the inside, the chamber 1 forms a sealed space to prevent the liquid from scattering during the injection.

In addition, the chamber 1 is formed to mount the object roll 6 in a horizontal state so as to rotate while performing the respective processes. The configuration for mounting and rotating the object roll 6 in the chamber 1 is possible in various ways, and thus will not be described in detail.

The mask 2 is provided with the pattern to shape | mold to the target roll 6, and is provided in the side in the chamber 1 toward the target roll 6, and may approach the target roll 6 according to the kind of process. It may be far away. The mask 2 is located adjacent to the object roll 6 at the time of UV exposure, and is located above the chamber 1 spaced apart from the object roll 6 at other processes.

The photoresist liquid injection nozzle 10 is provided on one side of the chamber 1 toward the object roll 6 so as to spray the photoresist liquid on the object roll 6. The photoresist liquid jet nozzle 10 includes an eleventh jet nozzle 11 and a twelfth jet nozzle 12 that are disposed opposite to each other with the object roll 6 interposed therebetween.

Since the eleventh jet nozzle 11 and the twelfth jet nozzle 12 are disposed opposite to the opposite sides of the target roll 6, the photoresist liquid is jetted onto the target roll 6 in half the rotation of the target roll 6. And to complete the coating. That is, the coating process time of the photoresist liquid may be shortened.

The doctor blade 3 is installed on one side of the chamber 1 toward the object roll 6 so as to uniformly form the thickness of the photoresist liquid spray-coated on the object roll 6. The doctor blade 6 is brought into close contact with the object roll 6 which rotates during the doctor blading process of the object roll 6 to form a photo-last thin film on the surface of the object roll 6, and the object roll during other processes. (6) away from

The UV lamp 4 is provided on one side of the mask 20 so as to expose the photoresist thin film by irradiating UV to the target roll 6 with the mask 2, more specifically, through a pattern formed on the mask 20. It is installed on one side of the chamber (1). In other words, the mask 2 and the UV lamp 4 are sequentially disposed in the chamber 1 toward the object roll 6. At this time, since the object roll 6 rotates, the photoresist thin film formed in the whole surface of the object roll 6 is exposed.

Thus, the UV lamp 4 may approach the object roll 6 according to the process in the chamber 1 together with the mask 2, or may move away. That is, the UV lamp 4 is located adjacent to the target roll 6 during the UV exposure with the mask 2, and is spaced apart from the target roll 6 during the other processes.

The UV lamp 4 and the mask 2 are mounted on the tray 61 so as to be integrally moved when the UV lamp 4 and the mask 2 change position with respect to the target roll 6 according to the process. The tray 61 is mounted inside the chamber 1 through the first cylinder 71 above the object roll 6. That is, depending on the linear operation of the first cylinder 71, for example, the lifting operation, the UV lamp 4 and the mask 2 may approach or move away from the target roll 6.

In addition, the doctor blade 3 is mounted inside the chamber 1 through the second cylinder 72 on the side of the target roll 6 so that the position of the doctor blade 3 can be varied with respect to the target roll 6 according to the process. That is, depending on the linear operation of the second cylinder 72, for example, the left and right reciprocating operation, the doctor blade 3 may approach or move away from the target roll 6.

The developer spray nozzle 20 is installed at one side of the chamber 1 toward the object roll 6 so as to spray the developer onto the UV-cured photoresist thin film. The developing solution spray nozzle 20 includes a twenty-first spray nozzle 21 and a twenty-second spray nozzle 22 which are disposed opposite to each other with the object roll 6 interposed therebetween.

The twenty-first jet nozzle 21 and the twenty-second jet nozzle 22 are disposed opposite to the opposite sides of the target roll 6, thereby spraying the developer onto the target roll 6 in half the rotation of the target roll 6. Allow it to complete That is, the spraying process time of the developer can be shortened.

The cleaning liquid spray nozzle is installed at one side of the chamber 1 to spray the cleaning liquid generated during the preceding processes to remove the foreign matter attached to the target roll 6 to the target roll 6. The cleaning liquid spray nozzles may be formed as one to selectively spray a plurality of cleaning liquids (not shown). However, in the present embodiment, a plurality of cleaning liquid spray nozzles may be formed to spray a plurality of cleaning liquids, that is, rinsing and ultrapure water independently. For example, the cleaning liquid injection nozzle may include a rinse injection nozzle 30 and an ultrapure water injection nozzle 40.

The rinse spray nozzle 30 is installed toward the target roll 6 so as to spray the rinse on the target roll 6 to clean the foreign matter generated in the previous steps. The rinse jet nozzle 30 includes a thirty-first jet nozzle 31 and a thirty-second jet nozzle 32 disposed opposite to each other with the object roll 6 interposed therebetween.

Since the thirty-first injection nozzle 31 and the thirty-second injection nozzle 32 are disposed opposite to both sides of the target roll 6, the spraying of the rinse to the target roll 6 is completed by 1/2 rotation of the target roll 6. Thus, it is possible to clean the foreign matter generated in the previous steps, for example, the exposure and development process. The cleaning process time for spraying the rinse can be shortened.

The ultrapure water injection nozzle 40 is provided toward the target roll 6 so as to spray the ultrapure water on the target roll 6 to clean the rinse. The ultrapure water injection nozzle 40 includes a forty-first injection nozzle 41 and a forty-second injection nozzle 42 disposed opposite to each other with the object roll 6 interposed therebetween.

Since the forty-first injection nozzle 41 and the forty-second injection nozzle 42 are disposed on both sides of the target roll 6, the injection of ultrapure water to the target roll 6 is completed by 1/2 rotation of the target roll 6. The rinse of the previous step can then be cleaned. The cleaning process time for spraying ultrapure water can be shortened.

In addition, when the rinse injection nozzle 30 is not provided, the ultrapure water injection nozzle 40 may be generated in the exposure and development process to clean foreign substances attached to the target roll 6 (not shown).

The hot air pen 5 is provided on one side in the chamber 1 toward the object roll 6 so as to dry or cure the exposed pattern of the cleaned object roll 6. The hot air pen 5 is installed outside the lifting range of the mask 20 and the UV lamp 4 so as not to obstruct the lifting of the marks 2 and the UV lamps 4 so that the irradiation direction of the hot air is applied to the target roll 6. Match.

The etching liquid injection nozzle 50 is installed on one side of the chamber 1 toward the object roll 6 to etch the surface of the object roll 6 by spraying the etching liquid and using a dried or cured pattern. The etchant jetting nozzle 50 includes a 51st jetting nozzle 51 and a 52nd jetting nozzle 52 which are disposed opposite to each other with the object roll 6 interposed therebetween.

Since the 51st injection nozzle 51 and the 52nd injection nozzle 52 are disposed opposite to both sides of the target roll 6, the injection of the etching liquid to the target roll 6 is completed by 1/2 rotation of the target roll 6 do. The etching process time for spraying the etchant may be shortened. After etching, the pattern roll is completed by removing the photoresist thin film remaining on the object roll 6.

The photoresist liquid jet nozzle 10, the developer jet nozzle 20, the rinse jet nozzle 30, the ultrapure water jet nozzle 40, and the etchant jet nozzle 50 face each target roll 6 without interfering with each other. It is installed on one inner side of the chamber 1 to form the injection direction.

For example, the eleventh injection nozzle 11, the 21st injection nozzle 21, the 31st injection nozzle 31, the 41st injection nozzle 41, and the 51st injection nozzle 51 are formed of the target roll 6. It is provided on one side (left side of Figure 1), the 12th injection nozzle 12, the 22nd injection nozzle 22, the 32nd injection nozzle 32, the 42nd injection nozzle 42 and the 52nd injection nozzle 52 May be provided on the opposite side (right side of FIG. 1) of the object roll 6.

The hot air pen 5 operates to dry or cure the developed photoresist thin film pattern after the exposure, development and cleaning process, and also to dry or cure the etched pattern after the etching and cleaning process.

On the other hand, the chamber (1) is provided with a discharge port 81 below, to discharge the liquid substances that are sprayed on each target roll (6) to complete each process, it is possible to perform the next process smoothly.

A process of molding a pattern on the object roll 6 will be described with reference to FIGS. Referring to FIG. 1, in a first step ST1, a target roll 6 for forming a pattern in a chamber 1 and a mask 2 having a pattern are mounted. The UV lamp 4 is installed in the chamber 1.

3 is a state diagram of the photoresist liquid coating step. Referring to FIG. 3, in the second step ST2, after the completion of the first step ST1, the photoresist liquid injection nozzle 10 is operated to spray and coat the photoresist liquid onto the target roll 6. At this time, the eleventh and twelfth spray nozzles 11 and 12 simultaneously spray the photoresist liquid, and the target roll 6 rotates.

4 is a state diagram of a doctor blading step. Referring to FIG. 4, after the third step ST3 is completed, the third step ST3 is rotated by operating the second cylinder 72 to bring the doctor blade 3 closer to the surface of the target roll 6. The thickness of the photoresist liquid applied to the object roll 6 is doctor-bladed with a fixed thin film.

5 is a state diagram of a UV exposure step. Referring to FIG. 5, after the fourth step ST4 completes the third step ST3, the first cylinder 71 is operated to bring the mask 2 and the UV lamp 4 closer to the target roll 6. By operating the UV lamp 4, the photoresist thin film formed on the surface of the object roll 6 is exposed by UV which passed the pattern of the mask 2.

6 is a state diagram of a developing step. Referring to FIG. 6, in the fifth step ST5, after completion of the fourth step ST4, the developer spray nozzle 20 is operated to spray the developer onto the photoresist thin film formed on the target roll 6, thereby exposing the photoresist. Develop a thin film. At this time, the twenty-first and twenty-second spray nozzles 21 and 22 simultaneously spray the developer, and the target roll 6 rotates.

7 is a state diagram of the rinse cleaning step, and FIG. 8 is a state diagram of the ultrapure water cleaning step. 7 and 8, in the sixth step ST6, after completion of the fifth step ST5, the subject roll 6 is sprayed with rinse and ultrapure water to clean the subject roll 6. The sixth step ST6 may include any one of the 61st step ST61 for spraying the rinse and the 62nd step ST62 for spraying the ultrapure water, and may be performed in two steps. In this embodiment, a process in which two steps are performed sequentially will be described as an example.

Referring to FIG. 7, in step 61, the rinse spray nozzle 30 is operated to spray the rinse onto the target roll 6 to remove foreign substances generated in the previous step. That is, the target roll 6 is first washed. At this time, the 31st and 32nd injection nozzles 31 and 32 simultaneously spray the rinse, and the target roll 6 rotates.

Referring to FIG. 8, after the fifth step ST62 or the sixty-first step ST61 is completed, the previous step is performed by operating the ultrapure water injection nozzle 40 to inject the ultrapure water to the target roll 6. Remove foreign substances and rinse generated from That is, the target roll 6 is cleaned primary or secondary. At this time, the 41st and 42nd injection nozzles 41 and 42 simultaneously spray a rinse, and the target roll 6 rotates.

9 is a state diagram of a drying or curing step. Referring to FIG. 9, in the seventh step ST7, after the sixty-first or sixty-second step ST61 or ST62 is completed, the hot air pen 5 is operated to form a pattern formed by the photoresist thin film on the target roll 6. Dry and cure. At this time, the target roll 6 rotates.

10 is a state diagram of an etching step. Referring to FIG. 10, after the seventh step ST8 is completed, the etching liquid spray nozzle 50 is operated to spray the etching liquid onto the target roll 6 by using a pattern formed of a photoresist thin film. The surface of the target roll 6 is etched. At this time, the target roll 6 rotates. After etching, the photo lacquer thin film remaining on the surface of the target roll 6 is removed.

After completion of the eighth step ST8, as shown in Figs. 7 and 8, the object roll 6 is rinsed with rinse and ultrapure water, and as shown in Fig. 9, the pattern of the etched object roll 6 is shown. Is dried and cured.

In the ninth step ST, a pattern is formed on the target roll 6 to separate the completed pattern roll from the chamber 1.

Although the preferred embodiments of the present invention have been described above, the present invention is not limited thereto, and various modifications and changes can be made within the scope of the claims and the detailed description of the invention and the accompanying drawings. Naturally, it belongs to the scope of the invention.

1 is a configuration diagram of a pattern roll forming apparatus according to an embodiment of the present invention, and is a state diagram of a step of mounting a mask and a target roll.

FIG. 2 is a process diagram of molding a pattern on a target roll by the pattern roll forming apparatus of FIG.

3 is a state diagram of the photoresist liquid coating step.

4 is a state diagram of a doctor blading step.

5 is a state diagram of a UV exposure step.

6 is a state diagram of a developing step.

7 is a state diagram of a rinse cleaning step.

8 is a state diagram of the ultrapure water cleaning step.

9 is a state diagram of a drying or curing step.

10 is a state diagram of an etching step.

<Explanation of symbols for the main parts of the drawings>

1: chamber 2: mask

3: doctor blade 4: UV lamp

5: hot air pen 6: target roll

10: photoresist liquid injection nozzle 20: developer spray nozzle

30: Rinse spray nozzle 40: Ultrapure water spray nozzle

50: etching liquid jet nozzle 11, 12: 11th, 12 jet nozzle

21, 22: 21st, 22nd injection nozzle 31, 32: 31st, 32nd injection nozzle

41, 42: 41st, 42nd injection nozzle 51, 52: 51st, 52nd injection nozzle

61 tray 71 and 72 first and second cylinders

81: outlet

Claims (10)

A chamber for receiving the object roll and forming a closed space; A mask provided on one side of the chamber having a pattern to be molded on the target roll; A photoresist liquid ejecting nozzle provided toward the object roll to spray the photoresist liquid onto the object roll; A doctor blade in close contact with or spaced from the target roll to form a constant thickness of the photoresist liquid on the target roll; A UV lamp provided on one side of the mask to expose the photoresist by irradiating UV on the object roll through the mask; A developer spray nozzle installed toward the object roll to spray and develop a developer onto the photoresist irradiated with UV light; Cleaning liquid injection nozzle installed toward the target roll to spray the cleaning liquid to the target roll to clean the foreign substances generated in the previous steps A hot air pen installed toward the target roll to dry or cure the pattern of the cleaned target roll; And And an etching solution spray nozzle provided toward the target roll to etch the pattern formed on the target roll by spraying an etching solution. The method according to claim 1, The mask and the UV lamp is installed above the chamber, the pattern roll forming apparatus is installed in the first cylinder which is installed in a vertical direction in the chamber and operates linearly. The method according to claim 1, The doctor blade is installed on the side of the chamber, the pattern roll forming apparatus is mounted to the second cylinder which is installed in the horizontal direction in the chamber in a linear operation. The method according to claim 1, The photoresist liquid jet nozzle includes an eleventh jet nozzle and a twelfth jet nozzle which are disposed on both sides of the photoresist jet nozzle with the target roll interposed therebetween. The method according to claim 1, The developing solution spray nozzle includes a twenty-first spray nozzle and a twenty-second spray nozzle disposed opposite to each other with the target roll interposed therebetween and mounted in the chamber. The method according to claim 1, The cleaning liquid injection nozzle, A rinse spray nozzle installed toward the target roll so as to spray the rinse onto the target roll to clean the foreign matter generated in the previous steps; And an ultrapure water spray nozzle which is installed toward the object roll to clean the rinse by spraying ultrapure water on the object roll. The method according to claim 6, The rinse spray nozzle includes a thirty-first injection nozzle and a thirty-second injection nozzle disposed opposite to each other with the object roll interposed therebetween and mounted in the chamber. The method according to claim 6, The ultrapure water injection nozzle includes a forty-one injection nozzle and a forty-second injection nozzle disposed on both sides of the target roll with the target roll interposed therebetween. The method according to claim 1, The etchant jet nozzle comprises a 51st jet nozzle and a 52nd jet nozzle which are disposed in the chamber so as to face each other with the target roll interposed therebetween. The method according to claim 1, The chamber is a pattern roll forming apparatus having a discharge port below.

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