KR101108317B1 - Heat process apparatus - Google Patents

Abstract

The present invention discloses a heat treatment apparatus capable of removing foreign substances and temperature control generated in a heat treatment apparatus for hard baking a photoresist formed on a glass substrate. Disclosed is a heat treatment part for baking substrates loaded in a cassette; A machine room unit configured to circulate air in the heat treatment unit; And a first exhaust pipe and a second exhaust pipe disposed inside the machine room part.

Therefore, in the present invention, it is possible to remove the particles in the heat treatment apparatus and temperature control to improve the production yield.

LCD, Bake, Soft, Hard, Photoresist, Heat Treatment

Description

Heat treatment device {HEAT PROCESS APPARATUS}

1 is a view showing the structure of a photoresist heat treatment apparatus according to the prior art.

2 is a view for explaining the driving of the blower and the driving means used in the heat treatment apparatus of FIG.

3 is a view showing the structure of a blower and a driving means of the heat treatment apparatus according to the present invention.

FIG. 4 is an enlarged view of the cover area of FIG. 3. FIG.

5 is a plan view showing the machine room structure of the heat treatment apparatus according to the present invention.

FIG. 6 is a view in which displacement adjusting means are arranged in an exhaust hose and an exhaust pipe used in FIG. 5; FIG.

* Description of the symbols for the main parts of the drawings *

103a: first blower 103b: second blower

104a: first axis of rotation 104b: second axis of rotation

107a: first cover 107b: second cover

112: machine room 112a: first machine room

112b: second machine room 120a: first exhaust hose

120b: second exhaust hose 130a: first exhaust pipe                 

130b: second exhaust pipe 150a: first driving means

150b: second driving means 170: blocking film

The present invention relates to a heat treatment apparatus capable of removing foreign matters and temperature control generated during heat treatment for hard baking a photoresist formed on a glass substrate.

In the liquid crystal display manufacturing process, an insulating film or a metal film is deposited on a substrate, and the mask process of etching is performed several times.

In the mask process, when an insulating film or a metal film is deposited on a substrate, a photoresist is applied, and then a soft bake is performed to volatilize a solvent present in the photoresist.

Subsequently, an exposure process is performed using a mask, and then a hard-bake process is performed at a temperature higher than that of the soft bake, and then developed to form a desired pattern.

Then, the patterned photoresist is etched to form a desired pattern by etching the insulating film or metal film deposited on the substrate, and then the remaining photoresist film is removed by a strip process.

As described above, in the mask process, a photoresist is applied and then a baking process is performed. In the baking process, a substrate on which the photoresist is formed is placed in a cassette disposed in a heat treatment unit of a heat treatment apparatus, and then blown at a high temperature. Blow into baking.

1 is a view showing the structure of a photoresist heat treatment apparatus according to the prior art.

As shown in FIG. 1, the heat treatment apparatus 10 for hard-baking a photoresist applied on a substrate includes a heat treatment unit 11 for blowing and baking a high temperature blower to a cassette on which the substrates are loaded, and the heat treatment unit 11. It consists of a machine room unit 12 having a blower for the air convection circulation of.

A first blower 3a and a second blower 3b are arranged in the machine room part 12. The first blower 3a obtains rotational force from the first driving means 5a, and the second blower 3b. ) Obtains a rotational force from the second drive means (5b).

Therefore, the 1st rotation shaft 4a of the said 1st blower 3a, and the 1st drive shaft 8a of the 1st drive means 5a are connected by the 1st belt 7a, and the 2nd blower ( The second rotating shaft 4b and the second driving shaft 8b of 3b are connected by the second belt 7b.

Thus, the first driving means 5a and the second driving means 5b rotate the first blower 3a and the second blower 3b so that the air is heated in the heat treatment part 11 of the heat treatment apparatus 10. Generate circulation.

As described above, the photoresist of the substrate loaded in the cassette is hard-baked by the air circulation generated in the heat treatment part 11.

2 is a view for explaining the driving of the blower and the driving means used in the heat treatment apparatus of FIG.

As shown in Fig. 2, the first blower 3a is fixed to the first rotation shaft 4a, and the first drive means 5a is fixed to the first drive shaft 8a.

In addition, the first driving shaft 8a and the first rotation shaft 4a are connected by a first belt 7a, so that the rotational force transmitted from the first driving means 8a is transferred to the first blower 3a. By transmitting to the rotary blade of the first blower (3a) to rotate.

Although shown in the figure, 9 which is not described is a ball bearing.

However, the first blower 3a and the first driving means 5a having the structure as described above are worn by the first belt 7a connecting the first drive shaft 8a and the first rotation shaft 4a. There is a problem that particles are generated.

In addition, in the ball bearing 9 fastened to the first rotation shaft 4a, the grease inside the bearing is deteriorated by heat generated by many rotations, causing particle defects.

The particles generated as described above are introduced onto the heat treatment part and are seated on the substrates undergoing the hard baking process to cause protrusion defects.

In addition, the grease present in the ball bearing is hardened by the high heat generated in the heat treatment part, thereby restricting the rotation of the first rotating shaft 4a to cause an overload of the first driving means 5a.

An object of the present invention is to cover the belt region connecting the driving means and the blower, and to discharge foreign substances to the outside, thereby reducing the occurrence of defects caused by foreign substances and improving the production yield of the liquid crystal display device.

In addition, an object of the present invention is to provide a heat treatment apparatus that prevents contamination of equipment by disposing an exhaust part for preventing the discharge of foreign substances and deterioration existing in the heat treatment apparatus.

In order to achieve the above object, the heat treatment apparatus according to the present invention,

A heat treatment part for baking the substrates loaded in the cassette;

A machine room unit configured to circulate air in the heat treatment unit; And

And a first exhaust pipe and a second exhaust pipe disposed inside the machine room part.

Here, the machine room part,

A first blower and a first rotating shaft connected to the first blower;

A second blower and a second rotary shaft connected to the second blower;

First driving means for supplying rotational force to the first blower, and a first driving shaft connected to the first driving means;

Second driving means for supplying rotational force to the second blower, and a second driving shaft connected to the second driving means;

A first belt connecting the first drive shaft and the first rotation shaft;

A second belt connecting the second drive shaft and the second rotation shaft;                     

A first cover disposed in the first belt region; And

And a second cover disposed in the second belt region.

According to the present invention, by covering the belt area connecting the driving means and the blower and discharging the foreign matter to the outside, defects caused by the foreign matter are reduced to improve the production yield of the liquid crystal display device.

In addition, in the present invention, by disposing the exhaust portion for preventing the discharge of debris and deterioration present in the heat treatment apparatus, contamination of the equipment is prevented.

Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings.

3 is a view showing the structure of the blower and the driving means of the heat treatment apparatus according to the present invention.

As shown in FIG. 3, the 1st blower 103a is being fixed to the 1st rotation shaft 104a, and the 1st drive means 105a is being fixed to the 1st drive shaft 108a.

The first drive shaft 108a and the first rotation shaft 104a are connected by a first belt (not shown), and a portion where the first belt is connected is covered with a cover 107a.

Therefore, even if the first drive shaft 108a and the first rotation shaft 104a are rotated by the rotational force transmitted from the first driving means 108a, the belt is covered by the cover 107a so that foreign matters due to belt wear are equipped. Does not pollute me

And by using heat-resistant copper for the ball bearing 109 fixed to the said 1st rotating shaft 104a, hardening of the grease in the ball bearing 109 was prevented even in high heat | fever.

4 is an enlarged view of the cover area of FIG. 3.

As shown in FIG. 4, the cover 107a portion of FIG. 3 is enlarged.

An exhaust hose 110 for air circulation is disposed in the cover 107a in an upper side of the cover 107a, and one side of the cover 107a is opened so that air flows through the exhaust hose 110. To remove the foreign matter as well as to cool.

Accordingly, a large amount of heat is generated in the first drive shaft 108a, the first rotation shaft 104a, and the belt that surrounds the cover 107a. The heat is cooled through the exhaust hose 110.

In addition, by discharging a lot of particles generated from wear of the rotating belt to the outside through the exhaust hose 110, it is possible to easily remove the foreign matter.

5 is a plan view showing the machine room structure of the heat treatment apparatus according to the present invention.

As shown in FIG. 5, the heat treatment apparatus is divided into a heat treatment unit and a machine chamber 112, in which a substrate is placed in a cassette and a baking process is performed. The structure of the machine chamber 112 is illustrated.

 The machine room 112 is a first machine room 112a in which blowers 103a and 103b and driving means 150a and 150b are arranged, and a second machine room 112b in which a cassette disposed in the heat treatment unit is controlled. In the present invention, the foreign matter generated in the first machine room (112a) is disposed in the second machine room by placing a blocking film 170 of sus material in the first machine room (112a) and the second machine room (112b). (112b) was not contaminated.

Therefore, in the present invention, the first machine room 112a and the second machine room 112b are completely separated by the blocking film 170.

In addition, the first machine room 112a includes a first exhaust pipe 130a for removing particles inside the first machine room 112a to the outside, and particles inside the second machine room 112b to the outside. The second exhaust pipe 130b is disposed.

In addition, a first blower (dotted line 103a) having an air circulation wing, a first rotating shaft 104a connected to the first blower 103a, and the first blower (inside the first machine chamber 112a) are provided. A second blower 103b disposed in parallel with 103a and a second rotary shaft 104b connected to the second blower 103b are disposed.

In addition, a first driving means 150a in which a driving motor is disposed to supply rotational force to the first blower 103a, and a first driving shaft connected to the first driving means 150a (not shown in FIG. 3). 108a), second driving means 150b for supplying rotational force to the second blower 103b, and a second driving shaft (not shown) connected to the second driving means 150b are disposed.

The second driving shaft is connected to the second driving means 150b in the same structure as the first driving shaft shown in FIG. 3.

In addition, a first belt and a second belt are disposed on the first driving shaft (not shown), the first rotating shaft 104a, the second driving shaft (not shown), and the second rotating shaft 104b, respectively, so that the first driving means 150a is disposed. And the rotational driving force of the second driving means 150b are transmitted to the first rotating shaft 104a and the second rotating shaft 104b to rotate the first blower 103a and the second blower 103b.

The first cover 107a and the second cover 107b are disposed in areas where the first belt and the second belt are disposed, respectively, and foreign matters generated by rotation and wear of the first belt and the second belt, Particles are prevented from spreading inside the machine compartment 112.

As described above with reference to FIG. 4, the first cover 107a and the second cover 107b each have a first exhaust for removing foreign matters and cooling the first cover 107a and the second cover 107b. The hose 120a and the second exhaust hose 120b are disposed.

In addition, the first exhaust pipe (130a), the second exhaust pipe (130b), the first exhaust hose (120a) and the second exhaust hose (120b) is provided with a control plate and a control valve (see Fig. 6) for adjusting the displacement amount have.

This is because the first exhaust pipe 130a, the second exhaust pipe 130b, the first exhaust hose 120a and the second exhaust hose 120b discharge foreign substances and particles present in the machine chamber 112 of the heat treatment apparatus. Function.

In addition, the first exhaust pipe 130a, the second exhaust pipe 130b, the first exhaust hose 120a, and the second exhaust hose 120b are formed inside the first machine room 112a and the second machine room 112b. Do not exhaust too much because it has a cooling function to prevent deterioration.

In particular, when too much exhaust gas is discharged from the first exhaust pipe 130a and the second exhaust pipe 130b, the temperature of the first machine room 112a and the second machine room 112b is lowered, which causes the second machine room ( 112b) it may affect the temperature of the heat treatment portion disposed above, which may affect the photoresist baking process.

Therefore, in the present invention, the first cover 107a and the second cover 107b are respectively provided in the first driving means 107a and the first blower 103a, the second driving means 107b and the second blower 103b. ) To prevent the foreign matter, particles generated from the belt to diffuse to contaminate the inside of the heat treatment apparatus (100).

In addition, the first exhaust hose 120a and the second exhaust hose 120b are respectively disposed on the first cover 107a and the second cover 107b to have a cooling function.

In addition, the first exhaust pipe 130a and the second exhaust pipe 103b are disposed in the machine room 112 to control the temperature inside the first machine room 112a and the second machine room 112b and to discharge pollutants.

FIG. 6 is a view in which the displacement adjusting means is arranged in the exhaust hose and the exhaust pipe used in FIG.

In the heat treatment apparatus of the present invention, a plurality of exhaust parts drawn out are arranged, and an adjustment means for adjusting the exhaust amount is arranged in each exhaust part.

As shown in FIG. 6, (a) an adjusting plate 201 having a diameter shape of the exhaust pipe 200 is inserted into the exhaust pipe 200, and the adjusting plate 201 is adjusted to the outside of the exhaust pipe 200. It is connected to the valve 202.                     

(b) is a view when (a) is seen from the upper side of the control valve (202).

That is, it can be seen that the control plate 201 connected to the control valve 202 rotates at a predetermined angle by adjusting the control valve 202.

Therefore, by adjusting the area to block the inside of the exhaust pipe 200, it is possible to control the amount of exhaust discharged through the exhaust pipe (200).

Such adjusting means are arranged in the first exhaust hose, the second exhaust hose, the first exhaust pipe, and the second exhaust pipe described in FIG. 5, respectively, so that the discharge can be controlled and the cooling temperature can be adjusted accordingly.

As described in detail above, the present invention covers the belt area connecting the driving means and the blower, and discharges foreign substances to the outside, thereby reducing the defects caused by the foreign substances and improving the production yield of the liquid crystal display device. There is.

In addition, in the present invention, by disposing the exhaust portion for preventing the discharge of debris and deterioration present in the heat treatment apparatus, there is an effect of preventing contamination of the equipment.

The present invention is not limited to the above-described embodiments, and various changes can be made by those skilled in the art without departing from the gist of the present invention as claimed in the following claims.

Claims (13)

A heat treatment part for baking the substrates loaded in the cassette; A first machine room including a blower for circulating air in the heat treatment part; A second machine room for controlling the baking process in the heat treatment unit; And A first exhaust pipe connected to the outside from the first machine room; And And a second exhaust pipe connected to the outside of the second machine room to remove particles and adjust temperature. The method of claim 1, The first machine room, A first blower and a first rotating shaft connected to the first blower; A second blower and a second rotary shaft connected to the second blower; First driving means for supplying rotational force to the first blower, and a first driving shaft connected to the first driving means; Second driving means for supplying rotational force to the second blower, and a second driving shaft connected to the second driving means; A first belt connecting the first drive shaft and the first rotation shaft; A second belt connecting the second drive shaft and the second rotation shaft; A first cover disposed in the first belt region; And And a second cover disposed in said second belt region. The method of claim 2, And the first cover and the second cover further comprise a first exhaust hose and a second exhaust hose, respectively. The method of claim 3, wherein And the first exhaust hose and the second exhaust hose are cooled while removing foreign matters inside the first cover and the second cover. The method of claim 2, The first cover and the second cover is a heat treatment apparatus characterized in that to prevent the diffusion of foreign matter generated in the first drive shaft and the first rotation shaft, the second drive shaft and the second rotation shaft and the first, second belt region. The method of claim 1, The first exhaust pipe and the second exhaust pipe, the heat treatment apparatus, characterized in that the adjusting means for adjusting the displacement amount respectively. The method of claim 6, The control means is a heat treatment apparatus, characterized in that consisting of a control plate and a control valve. The method of claim 3, wherein The first exhaust hose and the second exhaust hose, the heat treatment apparatus, characterized in that the adjusting means for regulating the discharge of foreign matter. The method of claim 8, The control means is a heat treatment apparatus, characterized in that consisting of a control plate and a control valve. The method of claim 1, And the first exhaust pipe controls the particle removal and the temperature of the first machine room. delete The method of claim 1, And a blocking film is further disposed between the first machine room and the second machine room to block particle contamination. 13. The method of claim 12, The blocking film is a heat treatment apparatus, characterized in that composed of a metal plate of sus material.

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