KR100985723B1 - Apparatus and method for treating substrates of multi chamber type - Google Patents

Abstract

Multi-chamber substrate processing apparatus of the present invention comprises a processing unit for processing a wafer; A loader unit for transferring a wafer to the processing unit; The processing unit includes a polygonal common conveying chamber; A plurality of process chambers connected around the common conveying chamber; A load lock chamber connecting the common transport chamber and the loader unit; A boat positioned in the load lock chamber, in which wafers conveyed from the loader portion are loaded; And a boat transport robot positioned in the common transport chamber for boat transport between the load lock chamber and the process chamber.

Description

Multi-chamber substrate processing apparatus and method {APPARATUS AND METHOD FOR TREATING SUBSTRATES OF MULTI CHAMBER TYPE}

The present invention relates to a substrate processing apparatus and method of a multi-chamber method, and more particularly to a substrate processing apparatus and method capable of substrate processing in a lot unit.

A general multi-chamber substrate processing apparatus has a structure in which a plurality of chambers capable of processing one substrate can be disposed to process a single substrate within about tens to hundreds of seconds. The multi-chamber substrate processing apparatus controls the temperature of the substrate by a direct heating method using a susceptor, and the gas required for the process is configured to supply a separate shower head.

Such a multi-chamber substrate processing apparatus cannot process a plurality of substrates because the process proceeds with the substrate placed on the susceptor. In addition, the temperature of the substrate is uniformly controlled by the susceptor, but the temperature inside the chamber is unevenly distributed because the heat generating source is the susceptor.If the temperature inside the chamber is uneven, it affects the thin film and impurity adhesion due to abnormal reaction on the outer wall of the chamber is prevented. Deepen. In addition, since the wafers are processed one by one, there is a problem that the substrates which have been processed are waited for a long time until all the substrates in the wafer storage container are processed. In addition, the substrate and the transfer robot are transferred from the wafer storage container to the load lock chamber through the front end module (EFEM), from the load lock chamber to the process chamber through the common transfer chamber, and to the wafer storage container in the reverse order after the process is completed. Frequent contact with the wafer frequently causes contamination and impact of the wafer.

An object of the present invention to provide a multi-chamber substrate processing apparatus and method capable of processing the substrate in a lot (LOT) unit.

An object of the present invention is to provide a multi-chamber substrate processing apparatus and method for processing a plurality of substrates while maintaining a uniform temperature inside the process chamber.

It is an object of the present invention to provide a multi-chamber substrate processing apparatus and method capable of minimizing contact with a transfer robot until the substrate starts and finishes the process.

Multi-chamber substrate processing apparatus of the present invention comprises a processing unit for processing a wafer; A loader unit for transferring a wafer to the processing unit; The processing unit includes a polygonal common conveying chamber; A plurality of process chambers connected around the common conveying chamber; A load lock chamber connecting the common transport chamber and the loader unit; A boat positioned in the load lock chamber, in which wafers conveyed from the loader portion are loaded; And a boat transport robot positioned in the common transport chamber for boat transport between the load lock chamber and the process chamber.

According to an embodiment of the present invention, the process chamber is a reactor in which a boat entrance is formed at the bottom; A boat table positioned below the reactor and on which the boat is placed; And an elevator for loading / unloading the boat table on which the boat is placed into the reactor.

According to an embodiment of the present invention, the process chamber includes a reaction furnace in which a boat entrance is formed at one side; And a boat table provided inside the reactor.

According to an embodiment of the present invention, the reactor includes a process tube having an internal space in which the boat is located and a supply pipe for supplying process gas to the internal space, and an exhaust pipe for evacuating the internal space; And a heater provided to surround the process tube.

According to an embodiment of the present invention, the boat includes a top plate, a bottom plate and a plurality of rods connected to the top plate and the bottom plate, wherein the rods have 25 slots so that an edge portion of the wafer can be fitted on the same horizontal line. Are formed.

According to an embodiment of the present invention, the boat transfer robot includes a seating member on which the boat is seated; An arm member coupled to the seating member to move the seating member; A driving member for providing a driving force to the seating member or the arm member; The seating member includes a coupling portion coupled with the boat to prevent flow during transport of the boat and to be aligned in the correct position when the boat is seated.

Multi-chamber substrate processing apparatus of the present invention is a polygonal common conveyance chamber; At least one process chamber connected to one side of the common transfer chamber; A load lock chamber connected to the other side of the common transfer chamber and having a boat on which substrates are loaded; And a boat conveying unit provided in the common conveying chamber and conveying a boat between the load lock chamber and the process chamber.

According to an embodiment of the present invention, the boat transfer robot includes a seating member on which the boat is seated; An arm member coupled to the seating member to move the seating member; And a driving member for providing a driving force to the seating member or the arm member.

According to an embodiment of the present invention, the process chamber is a reactor in which a boat entrance is formed at the bottom; A boat table positioned below the reactor and on which the boat is placed; And an elevator for loading / unloading the boat table on which the boat is placed into the reactor.

According to an embodiment of the present invention, the apparatus further includes a loader transfer chamber having a substrate transfer robot for transferring wafers stored in a wafer storage container to a boat of the load lock chamber.

A semiconductor processing method for collectively processing wafers accommodated in a boat of the present invention includes the steps of: loading wafers stored in a cassette into a boat waiting in a load lock chamber; Loading the boat into a process chamber when wafer loading is completed in the boat; Performing a process in the process chamber; Unloading the boat after processing in the process chamber; Conveying the boat to the load lock chamber; And transferring the wafer loaded on the boat into the cassette.

According to an embodiment of the present invention, in the loading step of the boat, when the boat is placed on the boat table, the boat table is elevated to the process chamber so that the boat is loaded into the process chamber.

According to an embodiment of the present invention, in the loading step of the boat, when the boat entrance of the process chamber is opened, the boat is placed on the boat table inside the process chamber so that the boat is loaded in the process chamber.

According to an embodiment of the present invention, the entirety of the wafer contained in the cassette is loaded in the boat.

As described above, the present invention enables substrate processing in units of lots.

In addition, the present invention can process a plurality of substrates while maintaining a uniform temperature inside the process chamber.

In addition, the present invention can minimize contact with the transfer robot until the substrate begins and finishes the process.

Hereinafter, exemplary embodiments of the present invention will be described in more detail with reference to FIGS. 1 to 6. The embodiments of the present invention may be modified in various forms, and the scope of the present invention should not be construed as being limited to the following embodiments. This embodiment is provided to more completely explain the present invention to those skilled in the art. Therefore, the shape of the elements in the drawings are exaggerated to emphasize a more clear description.

1 is a plan view illustrating a semiconductor processing apparatus in accordance with an embodiment of the present invention. 2 is a side sectional view showing a semiconductor processing apparatus according to an embodiment of the present invention. 3 is a perspective view showing a boat, a boat carrying robot and a process chamber. Figure 4 is a side cross-sectional view showing a state in which the boat is loaded in the reactor.

The processing apparatus 10 includes a processing unit 200 that performs various processing such as ashing, vapor deposition, etching, etc. on a target object, for example, a semiconductor wafer (hereinafter, simply referred to as a "wafer"), and the processing unit 200. The loader section 100 is provided to an equipment front end module for carrying the wafer W.

(Loader section)

The loader part 100 has the loader conveyance chamber 110 which conveys a wafer between the wafer storage container C and the process part 200, as shown in FIG. The loader conveyance chamber 110 is formed by a transversely long box. On one long side of the loader conveyance chamber 110, a plurality of loadports 120 are provided in parallel. These load ports 120 are each configured to mount the wafer storage container C. The load ports 120 may include a door opener (not shown) that automatically opens and closes the door of the wafer storage container C. The vessel C containing the wafer W is loaded by a transfer means (not shown), such as an overhead transfer, an overhead conveyor, or an automatic guided vehicle. 120 is placed on. The wafer holding container C may be a sealing container such as a front open unified pod. The wafer storage container can accommodate up to 25 wafers W in multiple stages at equal pitch, for example. The inside of the wafer storage container C forms an airtight structure filled with, for example, an N 2 gas atmosphere. The number of the load port 120 and the wafer storage container C is not limited to the example shown in FIG.

In the loader conveyance chamber 110, the conveying apparatus 130 for conveying the wafer W along the longitudinal direction is arrange | positioned. The wafer W is conveyed between the wafer storage container C and the load lock chamber 300 by the transfer device 130. The conveying apparatus 130 is provided so that a slide movement is possible on the guide rail 140 which extends the center part in the loader conveyance chamber 110 along a longitudinal direction. The conveying arm 132 of the conveying apparatus 130 is equipped with five fingers 134 at the front-end | tip. Therefore, the conveying apparatus 130 can handle five wafers at once. Thereby, for example, when the wafer is conveyed to the wafer storage container C and the boat 500 of each load lock chamber 300, the wafer can be exchanged quickly. The conveying apparatus 130 is equipped with each motor (not shown) for making the conveyance arm 132 rotate and expand and contract. The conveying apparatus 130 can further be equipped with the motor (not shown) for raising and lowering a conveyance arm. Each motor is connected to a control part, and the operation | movement of the conveying apparatus 130 is controlled based on the control signal from a control part.

(Processing part)

The processing unit 200 is configured, for example, in a cluster tool type. As shown in FIGS. 1 to 3, the processing unit 200 has a common transport chamber 210 having a polygonal shape (for example, a rectangular shape, a pentagonal shape, a hexagonal shape, an octagonal shape, and the like). A plurality of process chambers 400 and a load lock chamber 300 are connected around the common conveyance chamber 210. The process chamber 400 is configured to perform predetermined processing such as film formation (for example, plasma CVD) or etching (for example, plasma etching) in units of one lot of wafers W 25.

Specifically, the common conveyance chamber 210 has a flat hexagonal shape. One of the loadlock chambers 300 is connected to two side portions adjacent to the loader portion 100 among the sides of the common hexagonal chamber 210 having a flat hexagonal shape, and the process chamber 400 is connected to the remaining four sides. It is connected one by one.

Each process chamber 400 performs the same kind of processing, or different heterogeneous processing with respect to one rod (wafer W 25 sheets), for example. In addition, the number of process chambers 400 is not limited to the example shown in FIG. In each of the process chambers 400, 25 wafers W (load unit) loaded on the boat 500 are attached to wafer processing information such as a process and a recipe indicating a processing process and the like previously set in a controller (not shown). Are processed on the basis of

The common conveyance chamber 210 is used to convey the boat 500 in which 25 wafers were loaded between the process chamber 400 and the first and second loadlock chambers 300. The process chamber 400 may be connected to the common transfer chamber 210 via a gate valve, respectively. The first and second load lock chambers 300 are connected to the common transfer chamber 210 via a gate valve (vacuum side gate valve) 217, respectively. The first and second load lock chambers 300 are also connected to the loader conveyance chamber 110 via gate valves (atmospheric side gate valves) 216, respectively.

In the first and second load lock chamber 300, a boat 500 capable of mounting a wafer of 25 units in a load is waiting. The boat 500 includes an upper plate 510, a lower plate 520, and a plurality of rods 530 connected to the upper plate 510 and the lower plate 520. The rods 530 have twenty-five slots 532 formed on the same horizontal line so that the edge portion of the wafer can be fitted.

The 1st and 2nd load lock chamber 300 is comprised so that a pressure regulation is possible by vacuum exhaust. Specifically, the first and second load lock chambers 300 are each connected to an exhaust system including a vacuum pump such as a dry pump via an exhaust pipe having an exhaust valve (exhaust control valve), for example. The first and second load lock chambers 300 are each connected to a gas introduction system including a gas introduction source or the like via a gas introduction pipe having a purge valve (purge gas control valve). By controlling a purge valve, an exhaust valve, etc., the purge operation which repeats vacuuming and open | release of air | atmosphere by purge gas introduction is performed. One of the first and second loadlock chambers 300 temporarily holds the boat 500 on which the wafers W flowing into the process chamber 400 enter the process chamber 400, and the other process is completed. The boat 5000, which flows out of the process facility 400, may stay temporarily. Alternatively, one or more loadlock chambers 300 may be provided, and the loading and unloading of the boat 500 in each loadlock chamber 300 may be performed. Loading can be done.

The common conveyance chamber 210 and the reaction path 410 of each process chamber 400 are also comprised so that pressure adjustment is possible by vacuum exhaust.

As mentioned above, between the common conveyance chamber 210 and each process chamber 400, and between the common conveyance chamber 210 and each load lock chamber 300, respectively, is comprised so that an airtight opening and closing is possible. The first and second load lock chambers 300 and the loader conveyance chamber 110 are also configured to be opened and closed in a hermetic manner.

In the common conveyance chamber 210, the boat conveying apparatus 220 for conveying the boat 500 between the load lock chamber 300 and each process chamber 400 is arrange | positioned. The boat conveying apparatus 220 includes a mounting member 222, an arm member 224, and a driving member 226. Boat 500 is placed on seating member 222. The seating member 222 moves with the arm member 224 and is rotatably provided with respect to the arm member 224. Drive member 226 provides driving force to arm member 224 or seating member 222. The seating member 222 has a fitting protrusion 222a and an edge portion 222b, which are fitting portions that are fitted into the fitting groove 522 formed on the lower plate 520 of the boat on the upper surface for safe transportation of the boat in a straight shape. Have The shape of the seating member 222 may be changed to various shapes such as a fork shape in addition to the straight shape. Although the boat conveying apparatus 220 may carry the boat 500 from the bottom and convey it, it may convey in the state which chucked the upper part of the boat 500 on the contrary. When the boat conveying device 220 is to chuck the upper portion of the boat 500 to convey, the seating member 222 of the boat conveying device 220 may be coupled to the upper surface of the upper plate 510 of the boat 500. The chucking part of should be formed.

The process chamber 400 performs a predetermined process on the 25 wafers W mounted on the boat 500. For example, the process chamber 400 may be a chamber that performs a process such as ashing, deposition, etching, or measuring. When a plurality of process chambers 400 are provided, each process chamber 400 may perform the same process on the 25 wafers W mounted on the boat 500. Optionally, when a plurality of process chambers 400 are provided, the process chambers 400 may sequentially perform a series of processes on 25 wafers W mounted on the boat 500.

The process chamber 400 includes a reactor 410 in which a boat entrance 412 is formed at a lower end thereof, and a lift space 420 positioned below the reactor, in which the boat 500 is placed. An elevator 440 is provided for loading / unloading the boat table 430 and the boat table 430 on which the boat 500 is placed into the reactor 410.

In the reactor 410, the heater 414 is provided in the vertical direction, and a process tube 416 is disposed concentrically with respect to the heater 414 in the heater 414. As described above, the process chamber 400 of the present invention is not a direct heating method, but an indirect heating method for heating the inside of the process tube 416 using the heater 414 outside the process tube 416. A uniform temperature distribution inside the tube 416 can be obtained. The process tube 416 has a configuration in which a gas introduction tube 417 for introducing source gas, purge gas, and the like and an exhaust pipe 418 for evacuating the inside of the process tube 416 are connected. In the present embodiment, the gas introduction pipe 417 is shown only connected to the upper portion of the process tube 416, but for the smooth gas supply, a nozzle is installed vertically inside the process tube, and the gas introduction tube is connected to the nozzle. Therefore, it is also applicable to the structure of injecting gas from the boat side direction. On the other hand, the lower end of the reactor 410 has a boat entrance 412 is open so that the boat 500 can be inserted from the lift space 420. As shown in FIG. 4, when the boat 500 is loaded into the process tube 416, the boat entrance 412 is closed by the flange of the boat table 430. An insertion groove 432 is formed on the upper surface of the boat table 430 so that the seating member 222 of the boat transfer robot 220 can be positioned. The seating member 222 is inserted into the insertion groove 432 when the boat carrier robot 220 loads the boat 500 into the boat table 430 or unloads the boat 500 from the boat table 430. .

In the present exemplary embodiment, since the lift space 420 has an open structure with the common transport chamber 210, the lift space 420 may be considered to be included in the common transport chamber 210. When the lift space 420 is included in the common transfer chamber 210, the common transfer chamber 210 may include a boat table 430 and an elevator 440 in addition to the boat transfer robot 220. For example, the gate valve may be configured between the lift space 420 and the common conveyance chamber 210 so that the lift space 420 may be used as a space independent of the common conveyance chamber 210.

5 shows a process chamber in which a boat is directly loaded.

As shown in FIG. 5, the process chamber 400a includes a side gate valve 490. When the gate valve 490 is opened, the boat transfer robot 220 places the boat 500 directly inside the process chamber 400a. The boat table 430 is loaded. The processor 200 having such a configuration may omit a lift space in which an elevator for lifting and lowering the boat table 430 is provided.

As described above, the substrate processing apparatus 10 of the present invention advances all 25 wafers (one rod) stored in the substrate storage container in one process and thus 25 wafers are processed in the next process without waiting time. Can be transported. In particular, the wafers are conveyed by the substrate transfer robot only in the loader portion, and since the boat is conveyed while being mounted on the boat, contamination of the wafer due to frequent contact with the substrate transfer robot can be minimized.

Next, a method of processing a substrate according to an embodiment of the present invention will be described.

6 is a flowchart for explaining a substrate processing method.

2 and 6, the wafers accommodated in the wafer storage container C are loaded onto the boat 500 waiting in the load lock chamber 300 by the transfer device 130 (S110). When all 25 wafers stored in the wafer storage container C are completely loaded in the boat 500, the boat transport apparatus 220 of the common transport chamber 210 moves the boat 500 from the load lock chamber 300. Withdrawal is placed on the boat table 430 of the process chamber 400 (S120). The boat table 430 on which the boat 500 is placed is lifted by the elevator 440 and loaded into the reactor 410 through the boat entrance 412 (S130). In this case, when the boat 500 is loaded into the process tube 416, the boat entrance 412 is closed by the flange of the boat table 430. When the loading of the boat 500 is completed, a process for 25 wafers is performed in the reactor 410 (S140). And when the process is completed, the boat 500 which completed the process from the reaction furnace 410 is unloaded (S150), and the boat conveying apparatus 220 conveys a boat to the load lock chamber 300 (S160). The conveying apparatus 130 of the loader part 100 takes out five wafers from the boat 500 placed in the load lock chamber 300 and transfers them to the empty wafer storage container C (S170).

Although described with reference to the embodiments above, those skilled in the art will understand that the present invention can be variously modified and changed without departing from the spirit and scope of the invention as set forth in the claims below. Could be.

1 is a plan view showing a semiconductor processing apparatus according to an embodiment of the present invention.

2 is a side sectional view showing a semiconductor processing apparatus according to an embodiment of the present invention.

3 is a perspective view showing a boat, a boat carrying robot and a process chamber.

4 is a side cross-sectional view showing a state in which a boat is loaded in a reactor.

5 shows a process chamber in which a boat is directly loaded.

6 is a flowchart for explaining a substrate processing method.

Explanation of symbols on the main parts of the drawings

100: loader

200: processing unit

210: common transport chamber

220: boat conveying device

300: load lock chamber

400: process chamber

500: boat

Claims (14)

In the multi-chamber substrate processing apparatus: A polygonal common conveyance chamber; At least one process chamber connected to one side of the common transfer chamber; A load lock chamber connected to the other side of the common transfer chamber and having a boat on which substrates are loaded; And A boat conveying unit provided to the common conveying chamber and conveying a boat between the load lock chamber and the process chamber, The boat carrier robot A seating member having a coupling portion to which the boat is seated and coupled with the boat for preventing flow during transport of the boat and for precise positioning of the boat; An arm member coupled to the seating member to move the seating member; And a driving member providing a driving force to the seating member or the arm member. The process chamber A reactor in which a boat entrance is formed at one side; And a boat table on which the boat is placed and an insertion groove in which the seating member of the boat conveying robot is located, the boat table being provided inside the reactor. The method of claim 1, The process chamber And a lifter for loading / unloading the boat table on which the boat is placed into the reactor. delete The method of claim 2 wherein: The reactor A process tube having an internal space in which the boat is located and a supply pipe for supplying a process gas to the internal space, and an exhaust pipe for evacuating the internal space; And a heater provided to surround the process tube. The method of claim 1 wherein: The boat is An upper plate, a lower plate, and a plurality of rods connected to the upper plate and the lower plate, And 25 slots are formed in the rods so that edge portions of the wafer can be inserted on the same horizontal line. delete delete delete delete delete delete delete delete delete

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