KR100910555B1 - A mask for manufacturing a color filter and a method for manufacturing a color filter panel for a display device using the mask - Google Patents

Abstract

The mask for manufacturing a color filter according to the present invention has pixel regions arranged in a matrix form, wherein openings are formed in the n-second pixel region in the horizontal direction, and these openings are alternately arranged in the vertical direction. Again n is a multiple of three. First, a photoresist film containing red and green pigments is applied, and then a portion of the red and green pixel areas are moved so that the openings of the mask are positioned to expose the photoresist film, and the width of one column pixel area in the horizontal direction and the vertical direction is two times. The mask is moved so that the opening is located in the remaining red and green pixel areas, and the photoresist film is exposed and developed to complete the red and green color filters. Subsequently, a photoresist film including a blue pigment is applied, and then a portion of the blue pixel region is moved so that the opening of the mask is positioned to expose the photoresist, and the opening is positioned in the remaining blue pixel region by moving the width of the vertical single pixel region. The mask is moved so that the photoresist film is exposed and developed to complete the blue color filter.

Color filter, mask, pigment, pixel, liquid crystal

Description

A mask for manufacturing a color filter and a manufacturing method of a color substrate for a display device using the same {A MASK FOR MANUFACTURING A COLOR FILTER AND A METHOD FOR MANUFACTURING A COLOR FILTER PANEL FOR A DISPLAY DEVICE USING THE MASK}

1 is a layout view illustrating a red, green, and blue pixel array structure in a liquid crystal display according to an exemplary embodiment of the present invention.

2A to 2C are process diagrams illustrating a method of manufacturing a color filter substrate according to a first embodiment of the present invention.

3A to 5B are process diagrams illustrating a method of manufacturing a color filter substrate according to a second exemplary embodiment of the present invention.

FIG. 6 is a plan view illustrating a structure of a thin film transistor array substrate in a liquid crystal display according to a first exemplary embodiment of the present invention.

FIG. 7 is a cross-sectional view of the thin film transistor array substrate illustrated in FIG. 6 taken along the line VII-VII ′.

8 is a layout view of a thin film transistor array substrate in a liquid crystal display according to a second exemplary embodiment of the present invention.

9 and 10 are cross-sectional views of the thin film transistor substrate illustrated in FIG. 4 taken along lines IX-IX 'and X-X',

The present invention relates to a mask for manufacturing a color filter and a method for manufacturing a color filter substrate, and more particularly, to a mask for manufacturing a color filter for forming a color filter of red, green, and blue, and a method for manufacturing a color filter substrate for a display device using the same. It is about.

The liquid crystal display device is composed of upper and lower substrates on which electrodes are formed and liquid crystal materials injected therebetween. Such a liquid crystal display device displays an image by applying an electric field to the liquid crystal material injected between two substrates by using an electrode, and adjusting the intensity of the electric field to adjust the amount of light transmitted through the substrate.

One substrate of the liquid crystal display includes wirings for transmitting a gate signal or an image signal, a pixel electrode for transmitting an image signal, and a thin film transistor for controlling an image signal transmitted to a pixel electrode of each pixel through a gate signal. The other substrate is formed with a color filter for realizing an image of various colors and a black matrix for blocking leakage of light leakage between pixels or preventing degradation of a contrast ratio.

At this time, in the manufacturing process of the color filter substrate, a color filter pattern of red, green, and blue is repeated three times by applying a photochromic dye or pigment-colored material with a mask and exposing and developing the same. To form.                         

In this case, the mask to be used is relatively expensive, so the problem of cost increase due to the use of a plurality of masks occurs, it is preferable to reduce the number of masks in order to reduce the production cost.

The technical problem to be achieved by the present invention is to provide a method of manufacturing a color filter substrate that can reduce the cost by minimizing the number of masks.

In order to solve this problem, in the present invention, red, blue, and green pixels are sequentially arranged in a row direction, and the red and green pixels are alternately arranged in the column direction, and the blue pixels are arranged in the same manner. The color filter substrate used as a substrate of a liquid crystal display device having a pixel array structure in which neighboring four pixels of red and green are arranged to face each other in two neighboring blue pixel rows. When manufacturing, use only one or two masks. In the case of using a single mask, a mask having an opening or a shield in the pixel area alternately n-2th in the horizontal direction and alternately in the vertical direction is used. The red and green color filters use the mask to have a width of two pixel areas in the horizontal direction. The photo process is performed while moving by the width of the pixel area in the vertical direction, and the blue color filter is formed by performing the photo process while moving the same mask by the width of the pixel area in the horizontal and vertical directions. In the case of using two masks, the photo process is performed by moving the mask having an opening or a shield in the pixel area alternately in the horizontal direction and the pixel area alternately in the horizontal and vertical directions by the width of one pixel area in the horizontal and vertical directions. And a blue color filter are formed by a photo process using a mask having an opening or a shield in the blue pixel region.

More specifically, the mask used in the method for manufacturing a color filter according to the present invention has pixel regions arranged in a matrix form, and the openings or shielding portions are identically repeated in the pixel regions in the same shape in two rows. In the first row, an opening or a shield is formed in each of the n-th pixel regions in the horizontal direction, and in the second row, an opening or a shield is formed in the n-th pixel region in the horizontal direction and the horizontal is the first mask. In the direction, an opening or a shield is formed in every n-th pixel region, and a second mask in which the opening or the shield is arranged in the vertical direction is used. At this time, n is a multiple of three.

In order to manufacture a color filter substrate using such a mask, first, a first color including a pigment of a first color and a negative or positive photosensitive resin on an upper portion of a display device substrate having pixel areas of the first to third colors. The photosensitive film for color filters is apply | coated. Subsequently, the openings or shields of the first mask are aligned with the pixel areas of the first color, and then the photoresist film for color filters of the first color is exposed and developed to form a color filter of the first color.

Subsequently, a photoresist film for a color filter of a second color comprising a pigment of a second color and a negative photosensitive resin is applied to the upper portion of the substrate, and the first mask is aligned at a position to form a color filter of the first color. The openings or shields are aligned with the pixel areas of the second color by moving in the vertical direction by the width of one pixel area. Next, the photosensitive film for color filters of a 2nd color is exposed and developed using a 1st mask, and a color filter of a 2nd color is formed.

In this case, the color filter of the first or second color is preferably a red or green color filter.

In order to form the third color filter, a photosensitive film for color filters of a third color including a third color pigment and a negative or positive photosensitive resin is coated on the substrate, and the openings or shields of the second mask are applied. Align to the pixel area of the third color. Next, the photosensitive film for color filters of a 3rd color is exposed and developed using a 2nd mask, and a color filter of a 3rd color is formed.

Here, it is preferable that a color filter of a 3rd color is a blue color filter.

The mask used in the manufacturing method of another color filter substrate has pixel regions arranged in a matrix form, with openings or shielding portions formed in n-second pixel regions in the horizontal direction, and openings in the vertical direction. Alternatively, shields are alternately arranged. Where n is a multiple of three.

In the method of manufacturing a color filter using such a mask, the first or second pigment includes a pigment of one of the first or second colors and a negative photosensitive resin on an upper portion of the display device substrate having the pixel areas of the first to third colors. The photosensitive film for color filters of a 2nd color is apply | coated. Subsequently, the openings or the shields of the mask are aligned with the pixel areas of the first or second color, and then the photosensitive film for color filters of the first or second color is exposed. Subsequently, the mask is moved by two spaces in the horizontal direction and one space in the vertical direction by the pixel area width to align the openings or shields of the mask to be located in the remaining pixel areas of the first or second color, and then the first or second color. The photosensitive film for color filters is exposed and developed to form color filters of the first and second colors. Further, the openings or shielding portions of the mask are aligned with the pixel areas of the third colors, and the photosensitive film for color filters of one of the third colors is exposed using the mask. The mask is moved by one space in the vertical direction by the width of the pixel area to align the openings or shields so as to be located in the pixel areas of the remaining third colors, and the photosensitive film for color filters of the third color is exposed and developed to color the third color. Form a filter.

DETAILED DESCRIPTION Embodiments of the present invention will be described in detail with reference to the accompanying drawings so that those skilled in the art may easily implement the present invention. As those skilled in the art would realize, the described embodiments may be modified in various different ways, all without departing from the spirit or scope of the present invention.

In the drawings, the thickness of layers, films, panels, regions, etc., are exaggerated for clarity. Like parts are designated by like reference numerals throughout the specification. When a portion of a layer, film, region, plate, etc. is said to be "on top" of another part, this includes not only when the other part is "right on" but also another part in the middle. On the contrary, when a part is "just above" another part, there is no other part in the middle.                     

A method of manufacturing a color filter substrate for a display device according to an embodiment of the present invention will now be described in detail with reference to the drawings.

1 is a layout view illustrating a red, green, and blue pixel array structure in a liquid crystal display according to an exemplary embodiment of the present invention.

As shown in FIG. 1, in the liquid crystal display according to the exemplary embodiment of the present invention, red, blue, and green pixels ‥ R, B, G, ... are arranged in a matrix form. At this time, red, blue, and green pixels (... R, B, G, ...) are sequentially arranged in the row direction, and red, blue pixels (... R, G, ...) are alternately arranged in the column direction. The blue pixels B are arranged in the same manner, and the red and green pixels R and G are disposed to face each other in the diagonal direction with respect to the blue pixel B with respect to two adjacent rows.

In such a liquid crystal display, a gate line (or scan signal line) for transmitting a scan signal or a gate signal in a horizontal direction is formed for each pixel row in a row direction of the pixel, and a gate transmits a data signal in a vertical direction. A data line that crosses the line and defines the unit pixel region is insulated from the gate line and is formed for the columns of pixels R, B, G, .... Each pixel region is formed with a thin film transistor electrically connected to a gate line and a data line, and each pixel region has a pixel electrode through which the data signal transmitted to the data line is transmitted. In this case, thin film transistors may be disposed in two neighboring blue pixels, or one blue pixel for each of the two blue pixels.                     

In the liquid crystal display according to the exemplary embodiment of the present invention, each of the blue, green, and blue pixels is formed by forming a red, green, and blue color filter made of a photosensitive material including a pigment in each pixel area. The filter applies a photosensitive material comprising a pigment having a respective color on top of a substrate for a liquid crystal display, aligns a mask having an opening thereon, and then selectively exposes the photosensitive material applied through the opening of the mask. Develop and form. In this case, two or one masks are used to form red, green, and blue color filters having a pixel array of red, green, and blue according to the present invention, which will be described in detail with reference to the accompanying drawings. Here, the color filter may or may not be formed on the thin film transistor array substrate on which the thin film transistor, the pixel electrode, and the signal line are disposed. In addition, in order to improve display characteristics of the liquid crystal display, the size of the blue pixel may be designed to be narrower than that of the red and green pixels.

2A to 2C are process diagrams illustrating a method of manufacturing a color filter substrate according to a first embodiment of the present invention.

As shown in FIGS. 2A and 2B, the first mask 500 used in the method of manufacturing a color filter substrate for a liquid crystal display device according to the first embodiment of the present invention may be used to form red and green color filters. And a green pixel mask 500. Such a red and green pixel mask 500 has a pixel area of matrix backstroke, and the openings are repeated in the pixel area in the same shape in units of two rows. In the first row, the nth pixel in the horizontal direction is arranged. Openings are formed in each area, and openings are formed in the n-th pixel area in the horizontal direction in the second row. Where n is a multiple of three.

In order to form red and green color filters using the masks for red and green pixels, first, as shown in FIG. 2A, a red pigment and a negative photosensitive resin are disposed on the liquid crystal display substrate 200. The photoresist film for red color filter which is included is apply | coated, and the opening part of the red and green pixel mask 500 is aligned in the red pixel area | region of the board | substrate 200. FIG. Subsequently, ultraviolet rays are irradiated through the red and green pixel masks 500 to expose and develop the red color filter photoresist to form a red color filter R in the red pixel region.

Next, as shown in FIG. 2B, a green color filter photosensitive film including a green pigment and a negative photosensitive resin is coated on the liquid crystal display substrate 200 on which the red color filter R is formed. The red and green pixel masks 500 are vertically moved by the width of one pixel area at the positions aligned to form the red color filter R, and then the openings are aligned with the green pixel areas of the substrate 200. By irradiating, the photoresist film for green color filter is exposed and developed to form a green color filter G in the green pixel region.

In addition, as shown in FIG. 2C, the second mask 600 used in the method for manufacturing a color filter substrate for a liquid crystal display device according to the first embodiment of the present invention may be red or blue for forming a blue color filter. A mask 600 is used. The blue pixel mask 600 has pixel regions arranged in a matrix, and openings are formed in every n-th pixel region in the horizontal direction, and the openings are identically arranged in the vertical direction. Again n is a multiple of three.

In order to form a green color filter using the blue pixel mask 600, first, as shown in FIG. 2C, a substrate 200 for a liquid crystal display device in which red and green color filters R and G are formed. A photosensitive film for a blue color filter including a blue pigment and a negative photosensitive resin is coated on the upper part of the top surface), and the opening of the blue pixel mask 560 is aligned with the blue pixel area of the substrate 200. Subsequently, ultraviolet rays are irradiated through the blue pixel mask 600 to expose the blue color filter photosensitive film and then developed to form a blue color filter B in the blue pixel area.

In the method for manufacturing a color filter substrate according to the first exemplary embodiment of the present invention, the red color filter is formed and then the green color filter is formed, but the order may be formed in a reverse order. In this case, the moving direction of the mask is reversed.

The manufacturing method of the color filter substrate of the liquid crystal display device having the pixel array according to the embodiment of the present invention is formed by forming the red, green, and blue color filters R, G, and B using only two masks in the first embodiment. The manufacturing cost can be reduced.

In the first embodiment of the present invention, the red, green, and blue color filters R, G, and B are formed of two masks. However, even if only one mask is used, the red, green, and blue color filters R, G, B) can be completed, which will be described in detail with reference to the accompanying drawings.

3A to 5B are process diagrams illustrating a method of manufacturing a color filter substrate according to a second exemplary embodiment of the present invention. FIGS. 3A and 3B are process diagrams of forming a red color filter, and FIGS. 4A and 4B are green. 5 is a process chart of forming a color filter, and FIGS. 5A and 5B are process charts of forming a blue color filter.

As shown in FIGS. 3A to 5B, the masks 700 for red, green, and blue pixels according to the second embodiment for manufacturing the color filter substrate of the liquid crystal display having the pixel arrangement according to the present invention are arranged in a matrix form. In the horizontal direction, openings are formed in the n-2th pixel area, and these openings are alternately arranged in the vertical direction. Again n is a multiple of three.

In order to form a red color filter using the mask 700 for red, green, and blue pixels according to the second exemplary embodiment of the present invention, as shown in FIGS. 3A and 3B, the substrate 210 for a liquid crystal display device may be formed. The photosensitive film for red color filters containing a red pigment and negative photosensitive resin is apply | coated on the upper part. Subsequently, the openings of the red, green, and blue pixel masks 700 are aligned so as to be located in a part of the red pixel areas of the substrate 210, and then ultraviolet rays are irradiated through the mask 700 to primarily make the red color filter photoresist. After exposure, the mask 700 for the red, green, and blue pixels is moved two pixels to the right and one cell to the bottom to position the opening of the mask 700 in the remaining red pixel areas of the substrate 210. After the alignment, the red color filter R is formed by secondarily exposing the red color filter photoresist by irradiating ultraviolet rays through the mask 700.

Subsequently, in order to form the green color filter using the mask 700 for red, green, and blue pixels according to the second embodiment of the present invention, as shown in FIGS. 4A and 4B, the red color filter R is formed. The photosensitive film for green color filters containing a green pigment and a negative photosensitive resin is apply | coated on the board | substrate 210 for liquid crystal display devices which are made. Subsequently, the openings of the red, green, and blue pixel masks 700 are aligned to be located in some green pixel areas of the substrate 210, and then ultraviolet rays are irradiated through the masks 700 to primarily form the photoresist film for the green color filter. After exposure, the mask 700 for the red, green, and blue pixels is moved by two pixel widths to the right and one cell width to the right to position the opening of the mask 700 in the remaining green pixel areas of the substrate 210. After the alignment, the photosensitive film for green color filter is secondarily exposed and irradiated with ultraviolet rays through the mask 700 to develop the green color filter R.

Subsequently, in order to form the blue color filter using the mask 700 for red, green, and blue pixels according to the second embodiment of the present invention, as shown in FIGS. 5A and 5B, the red and green color filters R, The photoresist film for blue color filters containing a blue pigment and a negative photosensitive resin is apply | coated on the board | substrate 210 for liquid crystal display devices in which G) is formed. Subsequently, the openings of the masks 700 for red, green, and blue pixels are aligned to be located in a part of the blue pixel areas of the substrate 210, and then ultraviolet rays are irradiated through the mask 700 to primarily make the photosensitive film for the blue color filter. After exposure, the mask 700 for the red, green, and blue pixels is moved downward by one pixel area width to align the openings of the mask 700 to be located in the remaining blue pixel areas of the substrate 210. Ultraviolet rays are irradiated through the mask 700 to expose the blue color filter photosensitive film secondarily, and developed to form a blue color filter B. FIG.

In the manufacturing method of the color substrate according to the second embodiment of the present invention, the manufacturing order of the red, green, and blue color filters may be changed, and thus the moving direction of the mask may be reversed. In addition, even when forming the same color filter, the moving direction of the mask may be in the opposite direction depending on the exposure order.

In the method of manufacturing the color filter substrate according to the second exemplary embodiment of the present invention, the manufacturing cost can be minimized by reducing the number of masks by forming the red, green, and blue color filters using only one mask.

In the first and second embodiments of the present invention, the red, green, and blue color filters R, G, and B are formed by using the negative photoresist film, but the color filter may be formed by the positive photoresist film. The mask is made of a shield instead of the opening, which almost blocks the transmitted light, and most of the rest is the opening, and the opening and closing portions of the marks shown in the first and second embodiments have opposite shapes.

As described above, in the method for manufacturing the color filter substrate according to the embodiment of the present invention, the substrate may use a separate color filter substrate, or may use a thin film transistor array substrate. In this case, the thin film transistor array substrate may have a wiring structure having a different pattern according to its manufacturing method. This will be described in detail with reference to the drawings.

6 is a layout view of a structure of a thin film transistor substrate for a liquid crystal display device according to a first embodiment of the present invention, and FIG. 7 is a cross-sectional view of the thin film transistor array substrate taken along the line VII-VII ′ in FIG. 6.

Gate wiring is formed on the insulating substrate 100. The gate line is connected to the gate line 121 and the gate line 121 which are formed one by one for each pixel row in the pixel row direction, so that the gate pad receives a gate signal from the outside and transfers the gate signal to the gate line ( 125 and a gate electrode 123 of the thin film transistor connected to the gate line 121.

On the substrate 100, a gate insulating layer 140 made of silicon nitride (SiN _x ) covers the gate wiring.

A semiconductor layer 150 made of a semiconductor such as amorphous silicon is formed in an island shape on the gate insulating layer 140 of the gate electrode 125, and silicide or n-type impurities are doped with high concentration on the semiconductor layer 150. Resistive contact layers 160 made of a material such as n + hydrogenated amorphous silicon are formed, respectively. Alternatively, the semiconductor layer 150 may be formed along the shape of the data line 171.

The data line is formed on the ohmic contact layer 160 and the gate insulating layer 140. The data wires are formed in the vertical direction and intersect the gate lines 121 to define pixels, and the source lines 173 branching from the data lines 171 and the data lines 171 and extending to the upper portion of the ohmic contact layer 160. ), Which is connected to one end of the data line 171 and is separated from the data pad 179 and the source electrode 173 for receiving an image signal from the outside, and is opposite to the source electrode 173 with respect to the gate electrode 123. The drain electrode 175 is formed on the ohmic contact layer 160.

The passivation layer 180 is formed on the data line and the semiconductor layer 150 that does not cover the data line. In the passivation layer 180, contact holes 185 and 189 respectively exposing the drain electrode 175 and the data pad 179 are formed, and the contact holes 182 exposing the gate pad 125 together with the gate insulating layer 140. Is formed.

The pixel electrode 190 is formed on the passivation layer 180 and electrically connected to the drain electrode 175 through the contact hole 181. In addition, an auxiliary gate pad 95 and an auxiliary data pad 97 connected to the gate pad 125 and the data pad 179 are formed on the passivation layer 180 through the contact holes 182 and 189, respectively.

1 and 2, the pixel electrode 190 overlaps the gate line 121 to form a storage capacitor, and when the storage capacitor is insufficient, the pixel electrode 190 is disposed on the same layer as the gate lines 121, 125, and 123. It is also possible to add a storage capacitor wiring.

Next, a liquid crystal display according to a second exemplary embodiment of the present invention will be described.

8 is a layout view of a thin film transistor array substrate of a liquid crystal display according to a second exemplary embodiment of the present invention, and FIGS. 9 and 10 are lines XX 'and XX', respectively, of the thin film transistor array substrate illustrated in FIG. 8. A cross-sectional view taken along the line.

First, a gate line including a gate line 121, a gate pad 125, and a gate electrode 123 is formed on the insulating substrate 100 in the same manner as in the first embodiment. However, unlike the first embodiment, the storage electrode line 131 is formed on the substrate 100 in parallel with the gate line 121. The storage electrode line 131 overlaps with the conductive pattern 179 for a storage capacitor connected to the pixel electrode 190 to be described later to form a storage capacitor that improves charge storage capability of the pixel. The pixel electrode 190 and the gate line to be described later will be described. If the holding capacity generated by the overlap of 121 is sufficient, it may not be formed. The same voltage as that of the common electrode of the upper substrate is usually applied to the storage electrode line 131.

The gate insulating layer 140 is formed on the gate lines 121, 125, and 123 and the storage electrode line 131. Semiconductor patterns 152 and 157 formed of a semiconductor such as hydrogenated amorphous silicon are formed on the gate insulating layer 140, and ohmic contact layer patterns are formed on the semiconductor patterns 152 and 157.

Data wirings are formed on the ohmic contact layer patterns 163, 165, and 167. The data line is a thin film transistor which is a branch of the data line 171 formed in the vertical direction, the data pad 179 connected to one end of the data line 171 to receive an image signal from the outside, and the data line 171. And a data line portion of the source electrode 173 of the source electrode 173, and separated from the data line portions 171, 179, and 173 of the source electrode 173 with respect to the gate electrode 123 or the channel portion C of the thin film transistor. Also included is a conductive capacitor pattern 177 for the storage capacitor located on the drain electrode 175 and the storage electrode line 131 of the thin film transistor positioned on the opposite side. When the storage electrode line 131 is not formed, the conductive capacitor pattern 177 for the storage capacitor is also not formed.

The contact layer patterns 163, 165, and 167 lower the contact resistance between the semiconductor patterns 152 and 157 below and the data wires thereon, and have the same shape as the data wires. That is, the data line contact layer pattern 163 is the same as the data line portions 171, 179, and 173, and the intermediate layer pattern 165 for the drain electrode is the same as the drain electrode 175, and the intermediate layer pattern 167 for the storage capacitor is provided. Is the same as the conductor pattern 177 for the storage capacitor.

The semiconductor patterns 152 and 157 have the same shapes as the data wirings and the ohmic contact layer patterns 163, 165 and 58 except for the channel portion C of the thin film transistor. Specifically, the semiconductor capacitor pattern 157 for the storage capacitor, the conductor pattern 177 for the storage capacitor, and the contact layer pattern 167 for the storage capacitor have the same shape, but the semiconductor pattern 152 for the thin film transistor has data wiring and contact. Slightly different from the rest of the layer pattern. That is, in the channel portion C of the thin film transistor, the data line portions 171, 179, and 173, in particular, the source electrode 173 and the drain electrode 175 are separated, and the data line portion contact layer pattern 163 and the drain electrode contact. Although the layer pattern 165 is also separated, the semiconductor pattern 152 for thin film transistors is connected to each other without disconnection, thereby creating a channel of the thin film transistor.

The passivation layer 180 is formed on the data line. Therefore, even a thin thickness does not cause a parasitic capacity problem. The passivation layer 180 has contact holes 181, 189, and 187 exposing the drain electrode 175, the data pad 177, and the conductive pattern 177 for the storage capacitor, and the gate together with the gate insulating layer 140. It has a contact hole 182 that exposes the pad 125.                     

A pixel electrode 190 is formed on the passivation layer 180 to receive an image signal from the thin film transistor and generate an electric field together with the electrode of the upper plate. The pixel electrode 190 is made of a transparent conductive material such as ITO or indium tin oxide (IZO), and is physically and electrically connected to the drain electrode 175 through the contact hole 181 to receive an image signal. The pixel electrode 190 also overlaps the neighboring gate line 121 and the data line 171 to increase the aperture ratio, but may not overlap. In addition, the pixel electrode 190 is also connected to the storage capacitor conductor pattern 177 through the contact hole 187 to transmit an image signal to the conductor pattern 177. On the other hand, an auxiliary gate pad 95 and an auxiliary data pad 97 connected to the gate pad 125 and the data pad 179 through the contact holes 182 and 189, respectively, are formed. It is not essential to play a role of protecting the pads and to protect the pads 125 and 179 from the external circuit device, and their application is optional.

Although the preferred embodiments of the present invention have been described in detail above, the scope of the present invention is not limited thereto, and various modifications and improvements of those skilled in the art using the basic concepts of the present invention defined in the following claims are also provided. It belongs to the scope of rights.

As described above, according to the present invention, the manufacturing cost can be minimized by minimizing the number of masks in the manufacturing process of the color filter.

Claims (10)

The pixel areas are arranged in a matrix form, and the openings or shielding parts are equally arranged in the pixel areas in the same shape in two rows. In the first row, the pixel areas are arranged in the horizontal direction in every nth pixel area. An opening or shielding portion is formed, and in the second row, the opening or shielding portion is formed in each of the n-2th pixel regions in the horizontal direction, and n is a multiple of 3. In claim 1, The opening or the shielding portion is formed in each of the n-1th pixel regions in the horizontal direction, the opening or the shielding portion is arranged in the vertical direction, and n is a multiple of three. Applying a photosensitive film for a color filter of the first color comprising a pigment of the first color and a negative or positive photosensitive resin on an upper portion of the display device substrate having pixel areas of the first to third colors; Aligning the opening part or the shielding part of the mask of claim 1 to the pixel area of the first color; Exposing and developing the color filter photosensitive film of the first color using the mask of claim 1 to form the color filter of the first color; Method of manufacturing a color filter substrate for a display device comprising a. In claim 3, Applying a photosensitive film for a color filter of a second color comprising a pigment of a second color and a negative or positive photosensitive resin on top of the substrate, Moving the mask of claim 1 in a vertical direction by the width of one pixel area at an aligned position to form the color filter of the first color, thereby aligning the opening or the shield with the pixel area of the second color; Exposing and developing the color filter photosensitive film of the second color using the mask of claim 1 to form the color filter of the second color; Method of manufacturing a color filter substrate for a display device comprising a. In claim 3, And a color filter of the first or second color is a red or green color filter. In claim 3, Applying a photosensitive film for a color filter of a third color comprising a pigment of a third color and a negative or positive photosensitive resin on the substrate; Aligning the opening or shielding portion of the mask of claim 2 to the pixel region of the third color; Exposing and developing the color filter photosensitive film of the third color using the mask of claim 2 to form the color filter of the third color; Method of manufacturing a color filter substrate for a display device comprising a. In claim 6, And the third color filter is a blue color filter. The pixel regions are arranged in a matrix form, wherein the openings or shields are formed in the n-second pixel region in the horizontal direction, the openings or shields are alternately arranged in the vertical direction, and n is a multiple of 3. Mask for manufacturing in color filters. A photosensitive film for color filters of the first or second color comprising a pigment of the first or second color and a negative or positive photosensitive resin on an upper portion of the display device substrate having pixel regions of the first to third colors. Applying step, Aligning the openings or shields of the mask of claim 8 to some pixel areas of the first or second color, Using the mask of claim 8 to expose a photosensitive film for color filters of one of the first and second colors, The mask of claim 8 is moved by two spaces in the horizontal direction and one space in the vertical direction by the width of the pixel area to align the openings or shields of the mask of claim 8 to be located in the remaining pixel areas of the first or second color. step, The photosensitive film for color filters of a said 1st or 2nd color is exposed using the mask of Claim 8, Developing the color filter photosensitive film of the first or second color to form a color filter of the first and second color; Method of manufacturing a color filter substrate for a display device comprising a. In claim 9, Aligning an opening or a shield of the mask of claim 8 to a portion of the pixel area of the third color; The photosensitive film for one color filter of the said 3rd color is exposed using the mask of Claim 8, Moving the mask of claim 8 in the vertical direction by a width of a pixel area to align the openings or shields of the mask of claim 8 to be located in the remaining pixel areas of the third color; The photosensitive film for color filters of the said 3rd color is exposed using the mask of Claim 8, Developing the color filter photosensitive film of the third color to form the color filter of the third color; The manufacturing method of the color filter substrate for display apparatuses containing further.

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