KR100845117B1 - Antenna and manufacture method thereof - Google Patents

Antenna and manufacture method thereof Download PDF

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KR100845117B1
KR100845117B1 KR1020070017419A KR20070017419A KR100845117B1 KR 100845117 B1 KR100845117 B1 KR 100845117B1 KR 1020070017419 A KR1020070017419 A KR 1020070017419A KR 20070017419 A KR20070017419 A KR 20070017419A KR 100845117 B1 KR100845117 B1 KR 100845117B1
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pattern
substrate
layer
antenna
forming
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KR1020070017419A
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Korean (ko)
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김효순
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김효순
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01QANTENNAS, i.e. RADIO AERIALS
    • H01Q1/00Details of, or arrangements associated with, antennas
    • H01Q1/12Supports; Mounting means
    • H01Q1/22Supports; Mounting means by structural association with other equipment or articles
    • H01Q1/24Supports; Mounting means by structural association with other equipment or articles with receiving set
    • H01Q1/241Supports; Mounting means by structural association with other equipment or articles with receiving set used in mobile communications, e.g. GSM
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/01Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes on temporary substrates, e.g. substrates subsequently removed by etching
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02Pretreatment of the material to be coated
    • C23C16/0227Pretreatment of the material to be coated by cleaning or etching
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01QANTENNAS, i.e. RADIO AERIALS
    • H01Q1/00Details of, or arrangements associated with, antennas
    • H01Q1/36Structural form of radiating elements, e.g. cone, spiral, umbrella; Particular materials used therewith
    • H01Q1/38Structural form of radiating elements, e.g. cone, spiral, umbrella; Particular materials used therewith formed by a conductive layer on an insulating support

Abstract

An antenna and a manufacturing method thereof are provided to form an antenna pattern by previously forming an ABS(Acrylonitrile Butadiene Styrene) layer on a PC(Poly Carbonate) or PVC(Poly Vinyl Chloride) substrate through printing or coating according to a design shape of the antenna pattern. A manufacturing method of an antenna includes the steps of: preparing a printing compound for a pattern guide used as a guide of an antenna pattern by mixing ABS resin with thinner in a volume ratio of 1:1 to 7:3(S1); forming a pattern guide layer by printing or coating the printing compound on a PC or PVC substrate according to a design shape of the antenna pattern(S2); drying the substrate with the pattern guide layer at a normal temperature or in a thermal dryer(S3); performing ultrasonic degreasing of the substrate(S4); forming unevenness on a surface of the substrate by impregnating the substrate with a mixed solution of chromium anhydride and sulphuric acid to extract a rubber component from the pattern guide layer(S5); adsorbing and permeating metal ions into the unevenness of the pattern guide layer by impregnating the etched substrate with a mixed solution of metal ions and hydrochloric acid(S6); smoothing a surface of the pattern guide layer by impregnating the substrate with a sulphuric acid solution(S7); forming a conductive coating film on the surface of the pattern guide layer by performing chemical plating on the substrate(S8); forming a conductive copper pattern layer on the conductive coating film by performing electro or electroless plating on the substrate(S9); forming a nickel metal layer on the copper pattern layer by performing the electro or electroless plating on the substrate again(S10); forming a guide hole on the substrate by performing primary piercing punching along a printing pattern on the substrate(S11); and completely separating the entire product including the copper pattern layer from the substrate by performing secondary blanking punching through the second guide hole(S12).

Description

안테나 및 그 제조방법{ANTENNA AND MANUFACTURE METHOD THEREOF}ANTENNA AND MANUFACTURING METHOD THEREOF {ANTENNA AND MANUFACTURE METHOD THEREOF}

도 1은 종래기술에 의한 안테나 제조공정을 나타낸 개략적인 요부 공정도.1 is a schematic main process diagram showing an antenna manufacturing process according to the prior art.

도 2는 본 발명에 의한 안테나 제조방법을 설명하기 위해 나타낸 블록도.Figure 2 is a block diagram showing for explaining the antenna manufacturing method according to the present invention.

도 3a 내지 도 3h는 본 발명에 의한 안테나의 제조공정을 보인 공정순서도.Figure 3a to 3h is a process flowchart showing a manufacturing process of the antenna according to the present invention.

* 도면의 주요 부분에 대한 부호의 설명 *Explanation of symbols on the main parts of the drawings

102: 기판 104: 패턴가이드층102: substrate 104: pattern guide layer

104a: 요철부 106: 전도성피막104a: uneven portion 106: conductive film

108: 동패턴층 110: 니켈금속층108: copper pattern layer 110: nickel metal layer

112: 가이드홀 200: 안테나112: guide hole 200: antenna

본 발명은 안테나에 관한 것으로, 더욱 상세하게는 기존의 이중사출방식을 적용하지 않고 PC나 PVC 등의 합성수지재 기판 위에 안테나패턴을 용이하게 형성시킬 수 있도록 하며 작업효율성을 제고할 수 있도록 하는 안테나 및 그 제조방법에 관한 것이다.The present invention relates to an antenna, and more particularly, an antenna for easily forming an antenna pattern on a synthetic resin substrate such as PC or PVC without applying a conventional double injection method, and to improve work efficiency. It relates to a manufacturing method.

일반적으로 안테나는 무선통신을 위하여 전파를 송신하거나 수신하는데 사용하기 위한 장치로서, 다양한 형상 및 종류로 구비된다.In general, an antenna is a device for use in transmitting or receiving radio waves for wireless communication, and is provided in various shapes and types.

종래 안테나 제조기술과 관련하여서는 PC(폴리카보네이트)나 PVC(폴리염화비닐) 등의 합성수지재를 사용하는 기판에 금속성 안테나패턴을 형성시켜 안테나를 제조하는 기술에 이용되고 있다.Related to the conventional antenna manufacturing technology, a metal antenna pattern is formed on a substrate using a synthetic resin material such as PC (polycarbonate) or PVC (polyvinyl chloride), and is used in a technology for manufacturing an antenna.

하지만, PC나 PVC의 기판 위에는 금속성 안테나패턴을 바로 형성시킬 수가 없는 문제점으로 도 1에 개략적으로 나타낸 바와 같이, PC층(11)의 일측 표면 위에 ABS(아크릴로 부타디엔 스틸렌)층(12)이 적층되도록 이중사출을 행하여 기판(10)으로 사용하고 있으며, 상기 이중사출로 이루어진 기판(10)의 ABS층(12) 위에 화학증착을 통해 금속성 안테나패턴(13)을 형성시키고, 식각작업을 통하여 안테나패턴(13)이 형성되지 않은 부분의 ABS층(12)을 제거하며, 도전성을 위한 후공정을 실시함으로써 패턴을 갖는 안테나를 제조하고 있다.However, as shown in FIG. 1, a metal antenna pattern cannot be formed directly on a PC or PVC substrate. As shown in FIG. 1, an ABS (acrylobutadiene styrene) layer 12 is laminated on one surface of the PC layer 11. It is used as a substrate 10 by performing a double injection, and the metallic antenna pattern 13 is formed on the ABS layer 12 of the substrate 10 made of the double injection through chemical vapor deposition, and the antenna pattern through the etching operation An antenna having a pattern is manufactured by removing the ABS layer 12 in the portion where (13) is not formed and performing a post-process for conduction.

그런데, 상술한 바와 같은 종래기술의 안테나 제조에 의하면, PC층 위에 ABS층을 적층하기 위한 이중사출을 행하므로 작업이 번거롭고 제조단가가 높아지는 문제점 및 안테나 제조를 위한 작업효율이 떨어지는 문제점이 있었다.By the way, according to the prior art antenna manufacturing as described above, the double injection for stacking the ABS layer on the PC layer has a problem that the work is cumbersome, the manufacturing cost increases and the work efficiency for the antenna manufacturing is low.

본 발명은 상기한 문제점 등을 감안하여 창출된 것으로서, 그 목적으로 하는 바는 기존의 이중사출방식을 적용하지 않고서 PC나 PVC 등의 합성수지재 기판 위에 바로 안테나패턴을 형성시킬 수 있도록 하여 패턴 형성의 용이함을 제공할 수 있도 록 하며 안테나 제조시 작업효율성을 제고할 수 있도록 한 안테나 및 그 제조방법을 제공하는데 있다.The present invention has been made in view of the above problems, and its object is to form an antenna pattern directly on a synthetic resin substrate such as PC or PVC without applying a conventional double injection method. The present invention provides an antenna and a method of manufacturing the same, which can provide ease of use and improve work efficiency in manufacturing the antenna.

상기와 같은 목적을 달성하기 위한 본 발명은 ABS수지와 시너를 용량대비 1:1 내지 7:3의 비율로 교반 혼합하여 안테나패턴의 가이드로 사용하기 위한 패턴가이드용 인쇄혼합물을 구비하는 제1공정과; 상기 인쇄혼합물을 PC나 PVC의 기판 위에 안테나패턴의 설계형상대로 인쇄 또는 도장 처리하여 패턴가이드층을 형성시키는 제2공정과; 상기 패턴가이드층이 인쇄된 기판을 상온 또는 열건조기에서 건조 처리하는 제3공정과; 상기 건조처리 후 초음파를 이용한 탈지를 행하는 제4공정과; 상기 기판을 무수크롬산 및 황산의 혼합액에 함침시켜 각각의 패턴가이드층으로부터 고무성분을 추출해냄에 의해 표면에 요철부를 형성시키는 에칭공정의 제5공정과; 상기 에칭공정을 거친 기판을 금속이온 및 염산의 혼합액에 함침시켜 패턴가이드층의 요철부분에 금속이온을 흡착 및 침투시키는 제6공정과; 상기 제6공정을 거친 기판을 황산용액에 함침시켜 패턴가이드층의 표면을 매끈하게 처리하는 제7공정과; 상기 제7공정을 거친 기판에 화학적 도금을 행하여 패턴가이드층의 표면에 전도성피막을 형성시키는 제8공정과; 상기 전도성피막이 형성된 기판에 전기도금 또는 무전해도금을 행하여 전도성피막 위에 도전성의 동패턴층을 형성시키는 제9공정과; 상기 동패턴층을 포함하는 기판에 전기도금 또는 무전해도금을 다시 행하여 동패턴층 위에 내식성 및 장식을 위한 니켈금속층을 형성시키는 제10공정과; 상기 기 판에 형성된 인쇄패턴형상의 외곽으로 1차 피어싱 타발을 행하여 제품 전체타발을 위한 가이드홀을 기판에 형성시키는 제11공정과; 상기 가이드홀을 통한 2차 블랭킹 타발을 행하여 동패턴층을 포함하는 제품 전체를 기판으로부터 완전 분리해내는 제12공정에 의해 제조되는 것을 특징으로 한다.The present invention for achieving the above object is a first step of providing a mixed mixture for the pattern guide for use as a guide of the antenna pattern by stirring and mixing the ABS resin and thinner in a ratio of 1: 1 to 7: 3 to capacity and; A second step of forming a pattern guide layer by printing or painting the printed mixture according to a design pattern of an antenna pattern on a substrate of PC or PVC; A third step of drying the substrate on which the pattern guide layer is printed in a room temperature or a heat dryer; A fourth step of performing degreasing using ultrasonic waves after the drying treatment; A fifth step of an etching step of forming an uneven portion on the surface by impregnating the substrate with a mixed solution of chromic anhydride and sulfuric acid to extract a rubber component from each pattern guide layer; A sixth step of impregnating the substrate subjected to the etching process into a mixed solution of metal ions and hydrochloric acid to adsorb and penetrate the metal ions to the uneven portion of the pattern guide layer; A seventh step of smoothly treating the surface of the pattern guide layer by impregnating the substrate having undergone the sixth step with a sulfuric acid solution; An eighth step of forming a conductive film on the surface of the pattern guide layer by chemically plating the substrate having undergone the seventh step; A ninth process of electroplating or electroless plating the substrate on which the conductive film is formed to form a conductive copper pattern layer on the conductive film; A tenth step of electroplating or electroless plating on the substrate including the copper pattern layer to form a nickel metal layer for corrosion resistance and decoration on the copper pattern layer; An eleventh step of forming a guide hole for the entire product punching by performing a primary piercing punching on the outside of a printed pattern shape formed on the substrate; It is characterized in that it is produced by a twelfth step of completely separating the entire product including the copper pattern layer from the substrate by performing a secondary blanking punching through the guide hole.

이하, 본 발명의 바람직한 실시예를 첨부한 도면을 참조하면서 상세히 설명하기로 한다.Hereinafter, with reference to the accompanying drawings, preferred embodiments of the present invention will be described in detail.

도 2는 본 발명에 의한 안테나 제조방법을 설명하기 위해 나타낸 블록도이고, 도 3a 내지 도 3h는 본 발명에 의한 안테나 제조공정의 순서를 보인 개략적인 공정순서도이다.2 is a block diagram illustrating an antenna manufacturing method according to the present invention, Figures 3a to 3h is a schematic process flow chart showing the procedure of the antenna manufacturing process according to the present invention.

도 2에 나타낸 바와 같이, 본 발명에 의한 안테나는 ABS수지와 시너(thinner)를 교반하여 안테나패턴의 가이드로 사용하기 위한 패턴가이드용 인쇄혼합물을 구비하는 제1공정(S1)과, 상기 인쇄혼합물을 PC나 PVC의 기판 위에 안테나패턴의 설계형상대로 인쇄하여 다수의 패턴가이드층을 형성시키는 제2공정(S2)과, 상기 패턴가이드층이 인쇄된 기판을 상온 또는 열건조기에서 건조 처리하는 제3공정(S3)과, 상기 건조처리 후 초음파를 이용한 탈지를 행하는 제4공정(S4)과, 상기 기판을 무수크롬산 및 황산의 혼합액에 함침시켜 각각의 패턴가이드층으로부터 고무성분을 추출해냄에 의해 표면에 요철을 형성시키는 에칭작업의 제5공정(S5)과, 상기 에칭공정을 거친 기판을 금속이온 및 염산의 혼합액에 함침시켜 패턴가이드층의 요철부분에 금속이온을 흡착 및 침투시키는 제6공정(S6)과, 상기 제6공정을 거친 기판을 황산용액에 함침시켜 패턴가이드층의 표면을 매끈하게 처리하는 제7공 정(S7)과, 상기 제7공정을 거친 기판에 화학적 도금을 행하여 패턴가이드층의 표면에 전도성피막을 형성시키는 제8공정(S8)과, 상기 전도성피막이 형성된 기판에 전기도금을 행하여 전도성피막 위에 도전성의 동(Cu)패턴층을 형성시키는 제9공정(S9)과, 상기 동패턴층을 포함하는 기판에 전기도금을 다시 행하여 동패턴층 위에 내식성 및 장식을 위한 니켈금속층을 형성시키는 제10공정(S10)과, 상기 기판에 형성된 인쇄패턴형상의 외곽으로 1차 피어싱 타발을 행하여 제품 전체타발을 위한 가이드홀을 기판에 형성시키는 제11공정(S11)과, 상기 가이드홀을 통한 2차 블랭킹 타발을 행하여 동패턴층을 포함하는 제품 전체를 기판으로부터 완전 분리해내는 제12공정(S12)을 포함하는 공정에 의해 제조되어진다.As shown in Fig. 2, the antenna according to the present invention comprises a first step (S1) having a print mixture for pattern guide for use as a guide of the antenna pattern by stirring the ABS resin and thinner (thinner), and the print mixture A second step (S2) of forming a plurality of pattern guide layers by printing the pattern according to the design of the antenna pattern on a PC or PVC substrate, and a third process of drying the substrate on which the pattern guide layer is printed in a room temperature or a heat dryer Step (S3), the fourth step (S4) of performing degreasing by ultrasonic waves after the drying treatment, and the substrate is impregnated with a mixed solution of chromic anhydride and sulfuric acid to extract a rubber component from each pattern guide layer. The fifth step (S5) of the etching operation for forming the irregularities in the step and the substrate subjected to the etching process is impregnated with a mixture of metal ions and hydrochloric acid to adsorb and sediment the metal ions on the uneven portion of the pattern guide layer The sixth step (S6), the seventh process (S7) to impregnate the surface of the pattern guide layer by impregnating the substrate subjected to the sixth step in a sulfuric acid solution, and the substrate subjected to the seventh step An eighth step (S8) of forming a conductive film on the surface of the pattern guide layer by plating, and a ninth step of forming a conductive copper (Cu) pattern layer on the conductive film by electroplating the substrate on which the conductive film is formed ( S9) and a tenth step (S10) of forming a nickel metal layer for corrosion resistance and decoration on the copper pattern layer by performing electroplating again on the substrate including the copper pattern layer, and to the outside of the printed pattern shape formed on the substrate. An eleventh step (S11) in which the primary piercing punching is performed to form guide holes for the entire product punching, and the second blanking punching through the guide holes is performed to remove the entire product including the copper pattern layer from the substrate. To that before separation it is manufactured by a process including a first step 12 (S12).

이때, 상기 제10공정(S10)과 제11공정(S11)의 사이에는 기판에 전기도금 또는 무전해도금을 행하여 니켈금속층 위에 변색방지 및 내마모성을 위한 크롬층을 상기 니켈금속층 위에 더 형성시키는 공정(S10-1)이 추가 될 수도 있다.At this time, between the tenth step (S10) and the eleventh step (S11) of the electroplating or electroless plating on the substrate to further form a chromium layer on the nickel metal layer to prevent discoloration and wear resistance on the nickel metal layer ( S10-1) may be added.

또한, 상기 제4공정(S4) 내지 제10공정(S10) 이후에는 각각 기판의 세척을 위한 수세작업을 행하게 된다.In addition, after the fourth step (S4) to the tenth step (S10) is washed with water for washing the substrate, respectively.

이러한 본 발명의 제조공정을 도 2 및 도 3을 참조하여 더욱 상세하게 설명하면 다음과 같다.The manufacturing process of the present invention is described in more detail with reference to FIGS. 2 and 3 as follows.

(제1공정 - 인쇄재료 교반 혼합)(Step 1-Printing Material Stirring Mixing)

ABS수지와 시너를 용량대비 1:1 내지 7:3의 부피비율로 교반기에 투입하여 그 혼합비율에 따라 1시간~72시간 동안 교반 혼합함에 의해 ABS수지를 시너에 녹여 ABS농축액의 인쇄혼합물을 구비되게 한다.ABS resin and thinner were added to the stirrer at a volume ratio of 1: 1 to 7: 3 to capacity, and stirred and mixed for 1 to 72 hours according to the mixing ratio to dissolve the ABS resin in the thinner to provide a print mixture of ABS concentrate. To be.

이때, 상기 ABS수지와 시너의 인쇄혼합물은 상기한 범주내에서 인쇄방식을 사용할 경우 ABS수지의 비율을 높여가면서 점도를 짙게 하고, 도장방식을 사용할 경우 시너의 비율을 높여가면서 점도를 묽게 한다.At this time, the printing mixture of the ABS resin and thinner thickens the viscosity while increasing the proportion of the ABS resin when using the printing method within the above range, and dilutes the viscosity while increasing the proportion of the thinner when using the coating method.

(제2공정 - 패턴가이드 인쇄 또는 도장)(2nd process-pattern guide printing or painting)

상기 ABS수지를 시너에 녹인 인쇄혼합물을 PC나 PVC의 기판(102) 위에 안테나패턴의 설계형상대로 인쇄 또는 도장 처리하여 도 3a에 나타낸 바와 같이, 하나의 기판(102) 위에 ABS농축액에 의한 다수의 패턴가이드층(104)을 형성시킨다.The printing mixture in which the ABS resin is dissolved in thinner is printed or painted on the substrate 102 of PC or PVC according to the design pattern of the antenna pattern, and as shown in FIG. The pattern guide layer 104 is formed.

이때, 인쇄작업은 실크인쇄 등 일반적인 방법을 사용하므로 상세한 설명은 생략하기로 한다.At this time, since the printing operation uses a general method such as silk printing, a detailed description thereof will be omitted.

(제3공정 - 건조)(Step 3-Drying)

상기 패턴가이드층(104)이 인쇄된 기판(102)을 상온 또는 열건조기에서 10분~1시간 동안 건조 처리하여 고형화시킨다.The substrate 102 on which the pattern guide layer 104 is printed is solidified by drying for 10 minutes to 1 hour in a room temperature or a heat dryer.

(제4공정 - 초음파 탈지)(Step 4-Ultrasonic Degreasing)

상기 건조 처리 후의 기판을 초음파 탈지를 행하여 기판으로부터 이물질 제거는 물론 밀착력 개선 및 피복력 개량으로 다음의 에칭공정시 에칭효과를 향상시킬 수 있도록 한다.The substrate after the drying treatment is subjected to ultrasonic degreasing to remove the foreign matter from the substrate, and to improve the adhesion and coating strength, thereby improving the etching effect in the subsequent etching process.

(제5공정 - 에칭)(Step 5-Etching)

상기 기판을 무수크롬산 및 황산(유산)의 혼합액에 함침시키되 40~50%의 농도와 72± 5℃의 온도 조건에서 기판(102)에 인쇄된 각각의 패턴가이드층(104)으로부터 부타디엔의 고무성분을 추출해냄에 의해 도 3b에 나타낸 바와 같이, 표면에 울퉁불퉁한 요철부(104a)를 형성시킨다.The substrate was impregnated with a mixture of chromic anhydride and sulfuric acid (lactic acid), but the rubber component of butadiene from each of the pattern guide layers 104 printed on the substrate 102 at a concentration of 40-50% and a temperature of 72 ± 5 ° C. By extracting this, as shown in FIG. 3B, the uneven part 104a is formed in the surface.

(제6공정 - 제1활성)(Step 6-First Activity)

상기 에칭공정을 거친 기판을 파라듐 등의 금속이온 및 염산의 혼합액에 함침시키되 10~15%의 농도와 33± 5℃의 온도 조건에서 도 3c에 나타낸 바와 같이, 패턴가이드층(104)의 요철부(104a)에 파라듐 등의 금속이온을 흡착 및 침투시켜 촉매화 기능을 발휘되게 한다.The substrate subjected to the etching process is impregnated with a mixed solution of metal ions such as palladium and hydrochloric acid, but is uneven in the pattern guide layer 104 as shown in FIG. 3C at a concentration of 10 to 15% and a temperature of 33 ± 5 ° C. Metal ions such as palladium are adsorbed and penetrated into the unit 104a to exhibit a catalytic function.

(제7공정 - 제2활성)(Step 7-Second Activity)

상기 제6공정을 거친 기판(102)을 15~20% 농도의 황산용액에 함침시켜 요철부(104a)에 흡착 침투된 금속이온을 환원시킴으로써 패턴가이드층(104)의 표면이 매끈하게 처리되도록 한다.The surface of the pattern guide layer 104 is smoothly treated by impregnating the substrate 102 subjected to the sixth step into a sulfuric acid solution having a concentration of 15 to 20% by reducing metal ions adsorbed and penetrated into the uneven portions 104a. .

(제8공정 - 화학도금)(Step 8-Chemical Plating)

상기 제7공정을 거친 기판을 황산니켈과 차린산소다 및 구연산소다의 혼합용액에 함침시키되 2~5%의 농도와 50± 5℃의 온도 조건에서 화학적(무전해) 도금을 행하여 도 3d에 나타낸 바와 같이, 패턴가이드층(104)의 표면에 화학니켈의 전도성피막(106)을 형성시킨다.Subsequently, the substrate subjected to the seventh step was impregnated with a mixed solution of nickel sulfate, sodium hypochlorite and sodium citrate, and subjected to chemical (electroless) plating at a concentration of 2-5% and a temperature of 50 ± 5 ° C. As described above, the conductive film 106 of chemical nickel is formed on the surface of the pattern guide layer 104.

이때, 상기 전도성피막(106)은 상기 황산니켈을 황산동으로 대체함으로써 화학동의 전도성피막으로 형성되게 할 수도 있다.In this case, the conductive film 106 may be formed of a chemical copper conductive film by replacing the nickel sulfate with copper sulfate.

또한, PC나 PVC재의 기판(102)에는 도금증착이 어려워 패턴의 형상을 갖는 ABS재의 패턴가이드층(104) 위로만 화학적 또는 전기도금에 의한 도금층이 형성되어진다.In addition, since the plating deposition is difficult on the substrate 102 made of PC or PVC material, a plating layer formed by chemical or electroplating is formed only on the pattern guide layer 104 of the ABS material having a pattern shape.

(제9공정 - 제1전기도금)(Step 9-First Electroplating)

상기 전도성피막(106)이 형성된 기판(102)에 전기도금을 행하여 도 3e에 나타낸 바와 같이, 전도성피막(106) 위에 도전성의 동(Cu)패턴층(108)을 형성시킨다.Electroplating is performed on the substrate 102 on which the conductive film 106 is formed to form a conductive copper (Cu) pattern layer 108 on the conductive film 106, as shown in FIG.

이때, 기판(102)은 황산과 황산동 등의 혼합용액에 함침시키되 15~25%의 농도와 21± 5℃의 온도와 4~5A/dm2의 전류밀도를 갖는 조건하에서 전기도금을 행하며, 연성 및 밀착성을 갖는 도금층이 형성되게 하는 것이다.At this time, the substrate 102 is impregnated with a mixed solution such as sulfuric acid and copper sulfate, and electroplated under conditions having a concentration of 15-25%, a temperature of 21 ± 5 ° C., and a current density of 4-5 A / dm 2. It is to form a plating layer having adhesion.

여기서, 전류를 흐르지 않고 동(Cu)이온을 환원 석출시키는 무전해도금을 행하여 전도성피막(106) 위에 도전성의 동패턴층(108)을 형성되게 할 수도 있다.In this case, the electroless plating may be performed on the conductive film 106 to form a conductive copper pattern layer 108 on the conductive film 106 by conducting reduction plating of copper ions without flowing a current.

(제10공정 - 제2전기도금)(Step 10-Second Electroplating)

상기 동패턴층(108)을 포함하는 기판(102)에 전기도금을 다시 행하여 도 3f에 나타낸 바와 같이, 동패턴층(108) 위에 내식성 및 장식을 위한 니켈금속층(110)을 형성시킨다.Electroplating is again performed on the substrate 102 including the copper pattern layer 108 to form a nickel metal layer 110 on the copper pattern layer 108 for corrosion resistance and decoration, as shown in FIG. 3F.

이때, 기판(102)은 황산니켈과 염화니켈 및 붕산 등의 혼합용액에 함침시키되 19~24%의 농도와 54± 5℃의 온도와 2~3A/dm2의 전류밀도를 갖는 조건하에서 전기도금을 행하며, 니켈금속에 의한 광택의 장식은 물론 내식성을 갖도록 하기 위한 것이다.At this time, the substrate 102 is impregnated with a mixed solution such as nickel sulfate, nickel chloride and boric acid, but the electroplating under the conditions of 19 ~ 24% concentration, 54 ± 5 ℃ temperature and current density of 2 ~ 3A / dm 2 It is for the decoration of gloss by nickel metal and of course to have corrosion resistance.

여기서, 전류를 흐르지 않고 니켈이온을 환원 석출시키는 무전해도금을 행하여 동패턴층(108) 위에 도전성의 니켈금속층(110)을 형성되게 할 수도 있다.In this case, the electroless plating may be performed to reduce and precipitate nickel ions without flowing a current to form the conductive nickel metal layer 110 on the copper pattern layer 108.

(제11공정 - 1차 피어싱 타발)(Step 11-Primary Piercing Punch)

상기 기판(102)에 형성된 니켈금속층(110)을 포함하는 인쇄패턴형상의 외곽 으로 1차 피어싱 타발을 행하여 도 3g에 나타낸 바와 같이, 안테나 제품의 전체타발을 위한 가이드홀(112)을 기판(102)에 형성시킨다.As shown in FIG. 3G, the primary piercing punching is performed to the outside of the printing pattern shape including the nickel metal layer 110 formed on the substrate 102. To form).

(제12공정 - 2차 블랭킹 타발)(Step 12-2nd Blanking)

상기 가이드홀(112)을 통한 2차 블랭킹의 프레스 타발을 행하여 도 3h에 나타낸 바와 같이, 안테나패턴용 동패턴층(108)을 포함하는 제품 전체를 기판(102)으로부터 완전 분리해냄으로써 안테나(200)를 완성하게 된다.Press blanking of the secondary blanking through the guide hole 112 to completely remove the entire product including the copper pattern layer 108 for antenna pattern from the substrate 102 as shown in FIG. 3H. ) To complete.

한편, 본 발명에 의한 안테나 및 그 제조방법은 상술한 바와 같은 구체적인 실시예 및 첨부한 도면을 참조하여 설명하였으나, 이에 특별히 한정된다 할 수 없고, 본 발명의 기술적 사상의 유사범주 내에서 당해기술분야의 해당업자에 의해 다양한 치환, 수정 및 변형이 이루어질 수 있다 할 것이며, 이러한 유사범주 내의 수정 및 변형은 본 발명에 귀속될 수 있다 할 것이다.Meanwhile, the antenna according to the present invention and a method of manufacturing the same have been described above with reference to specific embodiments and the accompanying drawings, but the present invention is not particularly limited thereto. Various substitutions, modifications, and variations may be made by those skilled in the art, and modifications and variations in such categories may be attributed to the present invention.

이상에서 살펴본 바와 같이 본 발명에 의한 안테나 및 그 제조방법에 의하면, 안테나패턴의 형성에 유효한 ABS층을 PC나 PVC 등의 기판에 인쇄 또는 도장의 방식으로 형성시키되 안테나패턴의 설계형상대로 미리 기판 위에 형성시킴에 따라 패턴을 간단하게 형성시킬 수 있고 기존에 많이 적용하던 이중사출방식을 적용하지 않아도 되므로 안테나의 제조시 전반적인 작업효율성을 높일 수 있다.As described above, according to the antenna of the present invention and a method of manufacturing the same, an ABS layer, which is effective for forming an antenna pattern, is formed on a substrate such as PC or PVC by printing or painting, but is formed on the substrate in advance according to the design pattern of the antenna pattern. By forming the pattern, it is possible to simply form the pattern and do not need to apply the conventional double injection method can increase the overall work efficiency when manufacturing the antenna.

Claims (3)

ABS수지와 시너를 용량대비 1:1 내지 7:3의 부피비율로 교반 혼합하여 안테나패턴의 가이드로 사용하기 위한 패턴가이드용 인쇄혼합물을 구비하는 제1공정과;A first process of mixing and mixing the ABS resin and the thinner in a volume ratio of 1: 1 to 7: 3 by volume to provide a pattern mixture for pattern guide for use as a guide of an antenna pattern; 상기 인쇄혼합물을 PC나 PVC의 기판 위에 안테나패턴의 설계형상대로 인쇄 또는 도장 처리하여 패턴가이드층을 형성시키는 제2공정과;A second step of forming a pattern guide layer by printing or painting the printed mixture according to a design pattern of an antenna pattern on a substrate of PC or PVC; 상기 패턴가이드층이 인쇄된 기판을 상온 또는 열건조기에서 건조 처리하는 제3공정과;A third step of drying the substrate on which the pattern guide layer is printed in a room temperature or a heat dryer; 상기 건조처리 후 초음파를 이용한 탈지를 행하는 제4공정과;A fourth step of performing degreasing using ultrasonic waves after the drying treatment; 상기 기판을 무수크롬산 및 황산의 혼합액에 함침시켜 각각의 패턴가이드층으로부터 고무성분을 추출해냄에 의해 표면에 요철부를 형성시키는 에칭공정의 제5공정과;A fifth step of an etching step of forming an uneven portion on the surface by impregnating the substrate with a mixed solution of chromic anhydride and sulfuric acid to extract a rubber component from each pattern guide layer; 상기 에칭공정을 거친 기판을 금속이온 및 염산의 혼합액에 함침시켜 패턴가이드층의 요철부분에 금속이온을 흡착 및 침투시키는 제6공정과;A sixth step of impregnating the substrate subjected to the etching process into a mixed solution of metal ions and hydrochloric acid to adsorb and penetrate the metal ions to the uneven portion of the pattern guide layer; 상기 제6공정을 거친 기판을 황산용액에 함침시켜 패턴가이드층의 표면을 매끈하게 처리하는 제7공정과;A seventh step of smoothly treating the surface of the pattern guide layer by impregnating the substrate having undergone the sixth step with a sulfuric acid solution; 상기 제7공정을 거친 기판에 화학적 도금을 행하여 패턴가이드층의 표면에 전도성피막을 형성시키는 제8공정과;An eighth step of forming a conductive film on the surface of the pattern guide layer by chemically plating the substrate having undergone the seventh step; 상기 전도성피막이 형성된 기판에 전기도금 또는 무전해도금을 행하여 전도성피막 위에 도전성의 동패턴층을 형성시키는 제9공정과;A ninth process of electroplating or electroless plating the substrate on which the conductive film is formed to form a conductive copper pattern layer on the conductive film; 상기 동패턴층을 포함하는 기판에 전기도금 또는 무전해도금을 다시 행하여 동패턴층 위에 내식성 및 장식을 위한 니켈금속층을 형성시키는 제10공정과;A tenth step of electroplating or electroless plating on the substrate including the copper pattern layer to form a nickel metal layer for corrosion resistance and decoration on the copper pattern layer; 상기 기판에 형성된 인쇄패턴형상의 외곽으로 1차 피어싱 타발을 행하여 제품 전체타발을 위한 가이드홀을 기판에 형성시키는 제11공정과;An eleventh step of forming a guide hole for the entire product punching by performing a primary piercing punching on the outside of the printed pattern shape formed on the substrate; 상기 가이드홀을 통한 2차 블랭킹 타발을 행하여 동패턴층을 포함하는 제품 전체를 기판으로부터 완전 분리해내는 제12공정을 포함하는 것을 특징으로 하는 안테나 제조방법.And a twelfth step of completely separating the entire product including the copper pattern layer from the substrate by performing a secondary blanking through the guide hole. 삭제delete ABS수지와 시너를 용량대비 1:1 내지 7:3의 부피비율로 교반 혼합한 ABS농축액을 PC나 PVC의 기판 위에 안테나패턴의 설계형상대로 인쇄 또는 도장 처리하여 패턴가이드층을 형성시키고, 상기 ABS수지에 의한 패턴가이드층 위에 도전성의 안테나패턴이 구비되는 것을 특징으로 하는 안테나. The ABS concentrate and the ABS resin and thinner stirred and mixed at a volume ratio of 1: 1 to 7: 3 to capacity are printed or painted on the PC or PVC substrate in the shape of the antenna pattern to form a pattern guide layer. An antenna comprising a conductive antenna pattern on a pattern guide layer made of resin.
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KR101394921B1 (en) 2012-11-14 2014-05-14 오상진 External antenna module manufacture method and that's goods
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Publication number Priority date Publication date Assignee Title
KR101295730B1 (en) * 2011-12-20 2013-08-13 (주)이모트 Transferable multi-layed metal pattern and method for manufacturing metal pattern therefor
KR101394921B1 (en) 2012-11-14 2014-05-14 오상진 External antenna module manufacture method and that's goods
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CN113839198B (en) * 2021-09-10 2023-08-29 大富科技(安徽)股份有限公司 Antenna manufacturing process and automatic production line

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