KR100793987B1 - Electroplating solution for zinc-tungsten alloy electroplated steel sheet having an excellent corrosion resistance, the alloy electroplated steel sheet prepared by using the same, and producing method thereof - Google Patents

Electroplating solution for zinc-tungsten alloy electroplated steel sheet having an excellent corrosion resistance, the alloy electroplated steel sheet prepared by using the same, and producing method thereof Download PDF

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KR100793987B1
KR100793987B1 KR1020050125906A KR20050125906A KR100793987B1 KR 100793987 B1 KR100793987 B1 KR 100793987B1 KR 1020050125906 A KR1020050125906 A KR 1020050125906A KR 20050125906 A KR20050125906 A KR 20050125906A KR 100793987 B1 KR100793987 B1 KR 100793987B1
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zinc
steel sheet
tungsten
plating
corrosion resistance
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KR20070065468A (en
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김영근
오종기
김현태
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주식회사 포스코
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    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/56Electroplating: Baths therefor from solutions of alloys
    • C25D3/565Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of zinc
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C18/00Alloys based on zinc
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00Processes for servicing or operating cells for electrolytic coating
    • C25D21/12Process control or regulation

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  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
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  • Automation & Control Theory (AREA)
  • Mechanical Engineering (AREA)
  • Electroplating And Plating Baths Therefor (AREA)

Abstract

본 발명은 내식성이 우수한 아연-텅스텐 합금전기도금강판 제조용 도금용액, 이를 이용하여 제조된 합금전기도금강판 및 그 제조방법에 관한 것으로, 염화아연 100~200g/l, 텅스텐산나트륨 0.2~5g/l, 염화칼륨 150~400g/l, 폴리에틸렌글리콜 0.1~2ml/l 및 구연산 1.0~5g/l을 포함하여 조성되는 아연-텅스텐 합금전기도금강판 제조용 도금용액, 상기 도금용액을 이용하여 제조되는 그 합금 도금층에서의 금속 텅스텐 함량이 무게비로 0.1-5중량%이고 나머지가 아연으로 구성되어 있는 아연-텅스텐 합금전기도금강판, 및 상기 도금용액을 사용하여 pH 2~5, 온도 30~70℃, 전류밀도 40~120A/dm2의 조건으로 도금하여 합금 도금층에서의 금속 텅스텐 함량이 무게비로 0.1-5중량%이고 나머지가 아연으로 형성되도록 하는 것을 특징으로 하는 내식성이 우수한 아연-텅스텐 합금전기도금강판의 제조방법이 제공된다.The present invention relates to a plating solution for producing zinc-tungsten alloy electroplating steel sheet having excellent corrosion resistance, an alloy electroplating steel sheet prepared by using the same, and a method for manufacturing the same. Zinc chloride 100-200 g / l, sodium tungstate 0.2-5 g / l Plating solution for producing zinc-tungsten alloy electroplating steel sheet, including potassium chloride 150 ~ 400g / l, polyethylene glycol 0.1 ~ 2ml / l and citric acid 1.0 ~ 5g / l, in the alloy plating layer prepared using the plating solution The tungsten content of the metal is 0.1-5% by weight, and the zinc-tungsten alloy electroplated steel sheet, the remainder of which is composed of zinc, and using the plating solution, pH 2 ~ 5, temperature 30 ~ 70 ℃, current density 40 ~ 120A / dm 2 and plating under the conditions of 0.1-5% by weight of the tungsten metal content in the alloy plating layer and the weight ratio of the excellent corrosion resistance, characterized in that to ensure that the rest is formed by a zinc zinc-tungsten alloy electroplating The production method of the steel sheet is provided.

본 발명에 의하면, 아연-텅스텐 합금도금을 냉연강판 표면에 전기도금법으로 석출시킬 수 있고 내식성이 우수한 아연-텅스텐 합금전기도금강판을 안정적으로 제조할 수 있다.According to the present invention, zinc-tungsten alloy plating can be deposited on the surface of a cold rolled steel sheet by electroplating, and zinc-tungsten alloy electroplating steel sheet excellent in corrosion resistance can be stably manufactured.

전기도금, 전류밀도, 염수분무, 부착량, 전류효율 Electroplating, Current Density, Salt Spraying, Coating Weight, Current Efficiency

Description

내식성이 우수한 아연-텅스텐 합금전기도금강판 제조용 도금용액, 이를 이용하여 제조된 합금전기도금강판 및 그 제조방법{Electroplating solution for zinc-tungsten alloy electroplated steel sheet having an excellent corrosion resistance, the alloy electroplated steel sheet prepared by using the same, and producing method thereof} Electroplating solution for zinc-tungsten alloy electroplated steel sheet having excellent corrosion resistance, alloy electroplated steel sheet manufactured by the same and a method for manufacturing the same (Electroplating solution for zinc-tungsten alloy electroplated steel sheet having an excellent corrosion resistance, the alloy electroplated steel sheet prepared by using the same, and producing method

본 발명은 아연-텅스텐 합금전기도금강판 제조용 도금용액, 이를 이용하여 제조된 합금전기도금강판 및 그 제조방법에 관한 것으로서, 보다 상세하게는 우수한 내식성을 부여하며 안정적으로 제조할 수 있는 아연-텅스텐 합금전기도금용액, 이를 이용하여 제조된 합금전기강판 및 그 제조방법에 관한 것이다. The present invention relates to a plating solution for producing a zinc-tungsten alloy electroplating steel sheet, an alloy electroplating steel sheet prepared using the same, and a method for manufacturing the same, and more particularly, to a zinc-tungsten alloy which can be stably manufactured with excellent corrosion resistance. Electroplating solution, an alloy electrical steel sheet prepared using the same and a method for manufacturing the same.

아연도금강판은 값이 저렴하고 표면외관이 미려하여 자동차용은 물론 가전 및 건재용으로 오래 전부터 사용되어 왔다. 또한 아연의 표준전극전위는 -0.76V로 철의 -0.44V보다 전기화학적으로 낮음(卑)으로 강판상에 아연도금층이 형성되면 희생방식 작용으로 인하여 강판을 보호하는 능력이 뛰어나다. 그러나 아연의 부식이 어느정도 진행되면 강판에 대한 희생방식 능력은 없어지고 이때부터는 강판의 부식(적청)이 일어나게 된다. 이를 보완하기 위하여 아연-니켈, 아연-철 및 아연-코발트와 같은 합금전기도금강판이 개발되고 상업화되었다. 이들 철족금속은 아연 보다 귀한 금속들이기 때문에 아연과 금속간 화합물 형태로 합금이 되면 전극전위가 아연보다 귀한 방향으로 이동하여 내식성을 향상시키게 된다. 그러나 아연-철합금전기도금강판의 철은 용액중에서 불안정하여 2가 철이 쉽게 3가 철로 산화되고 이 3가 철은 산화물 혹은 수산화물을 형성하여 용액중에 슬러지 형태로 존재하여 도금강판에 줄무늬와 같은 각종 결함을 발생시키고 폐수 처리에 커다란 부하를 초래하는 문제점을 가지고 있다. 한편 아연-니켈 합금전기도금강판은 니켈이 인체에 알레르기 반응을 일으키고 내식성은 우수하나 도금밀착성이 나쁜 관계로 사용을 기피하며 아연-코발트 합금전기도금강판은 품질특성에 비하여 코발트 가격이 고가인 관계로 상업화되지 못했다. Galvanized steel sheet has been used for a long time for home appliances and building materials as well as automotive because of its low cost and beautiful surface appearance. In addition, the standard electrode potential of zinc is -0.76V, which is electrochemically lower than that of -0.44V of iron. Therefore, when the zinc plating layer is formed on the steel sheet, it has excellent ability to protect the steel sheet due to the sacrificial method. However, when the corrosion of zinc progresses to a certain degree, the ability of the sacrificial method for the steel sheet is lost, and from this time, the steel sheet is corroded (red blue). To compensate for this, alloy electroplated steel sheets such as zinc-nickel, zinc-iron and zinc-cobalt have been developed and commercialized. Since these iron group metals are more precious metals than zinc, when the alloy is formed in the form of an intermetallic compound with zinc, the electrode potential moves in a more precious direction than zinc, thereby improving corrosion resistance. However, iron in zinc-iron alloy electroplated steel sheet is unstable in solution, so divalent iron is easily oxidized to trivalent iron, and this trivalent iron forms oxides or hydroxides in the form of sludge in the solution. And a large load on wastewater treatment. On the other hand, zinc-nickel alloy electroplated steel sheet avoids the use of nickel due to allergic reaction to human body and excellent corrosion resistance but poor plating adhesion. Zinc-cobalt alloy electroplated steel sheet has high cobalt price compared to its quality characteristics. It was not commercialized.

또한 아연도금강판의 표면에 크로메이트나 인산염처리 혹은 수지코팅과 같은 각종 후처리 강판이 있으나 크로메이트 처리는 인체에 극히 해로운 물질로써 현재는 세계적으로 그 사용이 규제되어 있고 인삼염처리 피막은 도장하지용으로는 우수하나 피막이 전기적으로 부도체이기 때문에 용접성이 열세이고 내식성도 뛰어나지 못하다. 그리고 수지피막은 유기물질로 구성되어 있기 때문에 용접성이 나쁘고 어떤 일부 환경에서는 열에 의해 피막이 파괴되어 본래의 특성이 없어지는 문제점이 있으며 이들 모두 도금후에 이루어지는 공정들이기 때문에 작업성 측면에서도 바람직하지 못하다.In addition, there are various post-treated steel sheets such as chromate, phosphate treatment or resin coating on the surface of galvanized steel sheet. However, chromate treatment is extremely harmful substance to human body. Is excellent, but the weldability is inferior and the corrosion resistance is not good because the film is electrically insulator. In addition, since the resin film is composed of organic materials, the weldability is poor, and in some circumstances, the film is destroyed by heat, and thus the original property is lost. All these processes are performed after plating, which is not preferable in terms of workability.

결국 내식성이 우수하고 인체에도 해롭지 않은 합금전기도금강판의 개발이 필요하게 되었다.As a result, the development of alloy electroplated steel sheet having excellent corrosion resistance and not harmful to human body has been required.

따라서 본 발명은 상기와 같은 문제점을 해결하기 위하여 제안된 것으로서, 본 발명은 도금층에 아연과 텅스텐을 금속상태로 합금전기도금시킴으로써 아연과 텅스텐이 도금층에 존재하여 우수한 내식성을 부여하며 안정적으로 제조할 수 있는 아연-텅스텐 합금전기도금강판 제조용 도금용액을 제공하는데 그 목적이 있다.Therefore, the present invention has been proposed to solve the above problems, the present invention by zinc and tungsten alloy electroplating in the metal state of the plating layer, zinc and tungsten are present in the plating layer to provide excellent corrosion resistance and can be stably manufactured To provide a plating solution for the production of zinc-tungsten alloy electroplated steel sheet.

또한 본 발명은 상기 도금용액을 이용하여 제조된 아연-텅스텐 합금전기도금강판을 제공하는데 그 목적이 있다.In addition, an object of the present invention is to provide a zinc-tungsten alloy electroplating steel sheet prepared using the plating solution.

또한 본 발명은 상기 아연-텅스텐 합금전기도금강판을 제조하는 방법을 제공하는데 그 목적이 있다.In addition, an object of the present invention is to provide a method for producing the zinc-tungsten alloy electroplated steel sheet.

본 발명의 제 1 견지에 의하면, 염화아연 100~200g/l, 텅스텐산나트륨 0.2~5g/l, 염화칼륨 150~400g/l, 폴리에틸렌글리콜 0.1~2ml/l 및 구연산 1.0~5g/l을 포함하여 조성되는 아연-텅스텐 합금전기도금강판 제조용 도금용액이 제공된다.According to the first aspect of the present invention, zinc chloride includes 100 to 200 g / l, sodium tungstate 0.2 to 5 g / l, potassium chloride 150 to 400 g / l, polyethylene glycol 0.1 to 2 ml / l and citric acid 1.0 to 5 g / l A plating solution for producing a zinc-tungsten alloy electroplated steel sheet is provided.

본 발명의 제 2 견지에 의하면, 상기 도금용액을 이용하여 제조되는 그 합금 도금층에서의 금속 텅스텐 함량이 무게비로 0.1-5중량%이고 나머지가 아연으로 구 성되어 있는 아연-텅스텐 합금전기도금강판이 제공된다.According to a second aspect of the present invention, a zinc-tungsten alloy electroplating steel sheet in which the metal tungsten content in the alloy plating layer manufactured using the plating solution is 0.1-5% by weight in weight ratio and the remainder is composed of zinc Is provided.

본 발명의 제 3 견지에 의하면, 상기 도금용액을 사용하여 pH 2~5, 온도 30~70℃, 전류밀도 40~120A/dm2의 조건으로 도금하여 합금 도금층에서의 금속 텅스텐 함량이 무게비로 0.1-5중량%이고 나머지가 아연으로 형성되도록 하는 것을 특징으로 하는 내식성이 우수한 아연-텅스텐 합금전기도금강판의 제조방법이 제공된다.According to a third aspect of the present invention, the plating solution is used under the conditions of pH 2-5, temperature 30-70 ° C., current density 40-120 A / dm 2 , and the metal tungsten content in the alloy plating layer is 0.1 by weight. Provided is a method for producing a zinc-tungsten alloy electroplated steel sheet excellent in corrosion resistance, characterized in that -5% by weight and the rest is formed of zinc.

이하 본 발명에 대하여 상세히 설명한다.Hereinafter, the present invention will be described in detail.

본 발명은 냉연강판을 도금의 소지금속으로 사용하여 도금을 실시하는데, 도금은 내식성을 확보하기 위해 필요하다. 또한 형성된 도금은 인체에도 해롭지 않아야 한다.In the present invention, the cold-rolled steel sheet is used as a base metal for plating to perform plating, and plating is necessary to secure corrosion resistance. In addition, the plating formed should not be harmful to the human body.

본 발명에 의할 경우, 아연-텅스텐 합금도금을 냉연강판 표면에 전기도금법으로 석출시킬 수 있고 이들 합금이 적정 비율로 존재할 경우 내식성이 우수한 아연-텅스텐 합금전기도금강판을 안정적으로 제조할 수 있다. 이를 위해 아연-텅스텐 합금도금강판의 표면에 금속 텅스텐 함량이 무게비로 0.1-5중량%이고 나머지가 아연으로 구성되도록 제어되는 아연-텅스텐 합금도금층이 형성될 것이 요구되는 것이다.According to the present invention, zinc-tungsten alloy plating can be deposited on the surface of the cold rolled steel sheet by electroplating, and when these alloys are present in an appropriate ratio, zinc-tungsten alloy electroplating steel sheets excellent in corrosion resistance can be stably manufactured. To this end, a zinc-tungsten alloy plated layer is required to be formed on the surface of the zinc-tungsten alloy plated steel sheet so that the metal tungsten content is 0.1-5% by weight in weight ratio and the remainder is composed of zinc.

본 발명에서는 아연-텅스텐 함금도금층의 금속 텅스텐 함량을 무게비로 0.1-5중량%로 하고 나머지가 아연으로 구성되도록 제한한다. 도금층의 금속 텅스텐 함량을 0.1~5중량%로 제한한 이유는 텅스텐 함량이 0.1중량% 미만이면 내식성 향상 효과가 없고 5중량%를 초과하면 도금층이 검고 도금밀착성이 떨어지기 때문이다.In the present invention, the metal tungsten content of the zinc-tungsten alloy plated layer is limited to 0.1-5 wt% by weight and the rest is made of zinc. The reason why the metal tungsten content of the plating layer is limited to 0.1 to 5% by weight is that when the tungsten content is less than 0.1% by weight, there is no effect of improving the corrosion resistance.

또한, 본 발명에 의해 아연-텅스텐 합금도금강판을 제조할 때 도금용액중에 염화아연의 함량을 100~200g/l, 텅스텐산나트륨의 함량을 0.2~5g/l, 염화칼륨의 함량을 150~400g/l, 폴리에틸렌글리콜의 함량을 0.1~2ml/l, 그리고 구연산의 함량을 1.0~5g/l로 제한하며, 이때 용매로서는 일반적으로 물이 사용된다. In addition, when manufacturing a zinc-tungsten alloy plated steel sheet according to the present invention, the zinc chloride content in the plating solution is 100-200 g / l, the sodium tungstate content is 0.2-5g / l, and the potassium chloride content is 150-400g /. l, the content of polyethylene glycol is limited to 0.1 ~ 2ml / l, and the content of citric acid to 1.0 ~ 5g / l, wherein water is generally used as a solvent.

이와 같이 도금용액중에서 상기 각 성분의 함량을 제한한 이유는 다음과 같다. Thus, the reason for limiting the content of each component in the plating solution is as follows.

도금용액중 염화아연이 100g/l 미만이면 금속이온농도가 적기 때문에 한계전류밀도가 낮아져 고속의 도금이 불가능하고 200g/l를 초과하면 농도가 너무 높아 아연이 염의 형태로 석출하게 된다. If the zinc chloride in the plating solution is less than 100g / l metal ion concentration is low, the limit current density is low, high-speed plating is impossible, if the concentration exceeds 200g / l, zinc is precipitated in the form of salt.

도금용액중 텅스텐산나트륨 농도를 0.2~4g/l로 제한한 이유는 도금층의 금속 텅스텐을 하한치 0.1중량% 에서 상한치 5중량%로 확보할 수 있는 농도치이기 때문이다. 즉 텅스텐산나트륨이 0.2g/l미만으로 용액중에 존재하면 도금층에 금속텅스텐을 0.1중량% 이상으로 석출시킬 수 없고 텅스텐산나트륨이 도금용액중 4g/l를 초과하면 도금층의 금속텅스텐 함량이 5중량% 이상 석출하여 도금층이 검게되고 밀착성이 나빠지기 때문이다. The reason why the concentration of sodium tungstate in the plating solution is limited to 0.2-4 g / l is because the concentration of metal tungsten in the plating layer can be secured from the lower limit of 0.1% by weight to the upper limit of 5% by weight. That is, if sodium tungstate is present in the solution at less than 0.2 g / l, the metal tungsten cannot be precipitated in the plating layer by more than 0.1% by weight. If sodium tungstate is more than 4 g / l in the plating solution, the metal tungsten content of the plating layer is 5% by weight. It is because it precipitates more than% and a plating layer becomes black and adhesiveness worsens.

또한 지지염인 염화칼륨을 150~400g/l로 제한한 이유는 도금용액중 염화칼륨이 150g/l 미만이면 용액의 전도도가 낮아져 도금전압이 상승하고 그로 인하여 전력비가 상승 하게 될 뿐만 아니라 도금용액중의 텅스텐 이온이 착이온을 형성하게 하여 석출을 용이하게 하기 때문이다. 도금용액중 염화칼륨을 400g/l 초과로 하면 지지염의 농도가 진해져 결정으로 석출하기 때문에 바람직한 염화칼륨의 농도는 150~400 g/l이다.In addition, the reason for limiting the supporting salt of potassium chloride to 150 ~ 400g / l is that if the potassium chloride in the plating solution is less than 150g / l, the conductivity of the solution is lowered, thereby increasing the plating voltage and thereby increasing the power ratio, thereby increasing tungsten in the plating solution. This is because the ions form complex ions to facilitate precipitation. When potassium chloride in the plating solution is more than 400 g / l, the concentration of the supporting salt increases and precipitates as a crystal, so the preferable concentration of potassium chloride is 150 to 400 g / l.

도금용액중 폴리에틸렌글리콜계 첨가제는 도금결정립을 미세화하여 도금층을 평활하게 하기 위하여 첨가하는 것으로 폴리에틸렌글리콜계 첨가제를 0.1ml/l 미만으로 첨가하면 도금층의 결정립이 조대해져 거친 도금층이 형성되고 2.0ml/l 초과하여 첨가해도 효과가 없기 때문에 폴리에틸렌글리콜계 첨가제는 본 발명에서 제시하는 0.1~2.0ml/l가 바람직하다.Polyethyleneglycol-based additives in the plating solution are added to make the plating layer finer and smoother. If the polyethyleneglycol-based additive is added below 0.1 ml / l, the grains of the plating layer are coarsened to form a coarse plating layer and 2.0ml / l. Since it is ineffective even if it adds exceeding, the polyethyleneglycol type additive is preferably 0.1-2.0 ml / l shown by this invention.

도금용액중에 구연산은 텅스텐을 금속상태로 석출시키기 위하여 첨가하는 것으로 구연산 농도가 1.0g/l미만이면 텅스텐이 금속 상태로 석출할 수 없고 5g/l 초과하여 첨가 해도 효과가 없기 때문에 구연산의 적정 농도는 1.0~5.0g/l가 바람직하다.Citric acid in the plating solution is added to precipitate tungsten in the metal state. If the concentration of citric acid is less than 1.0g / l, tungsten cannot precipitate in the metal state. 1.0-5.0 g / l is preferable.

본 발명에 의하면 상기 도금용액을 사용하여 pH 2~5, 온도 30~70℃, 전류밀도 40~120A/dm2의 조건으로 도금을 수행한다. According to the present invention using the plating solution is carried out plating under the conditions of pH 2 ~ 5, temperature 30 ~ 70 ℃, current density 40 ~ 120A / dm 2 .

도금용액의 pH를 2~5로 제한한 이유는 용액의 pH가 2 미만이면 용액중 수소이온농도가 높아 음극전류효율이 떨어지고 5를 초과하면 아연이 용액중에 침전물을 형성하기 때문이다.The pH of the plating solution is limited to 2 to 5 because the pH of the solution is less than 2, the concentration of hydrogen ions in the solution is high, and the cathode current efficiency is lowered.

도금용액의 온도를 30~70℃로 제한한 이유는 용액의 온도가 30℃미만이면 염의 석출이 용이해지고 전류효율도 떨어지기 때문이며 70℃를 초과하면 용액의 증발량이 많아져 용액 관리에 어려움이 많기 때문이다.The reason for limiting the temperature of the plating solution to 30 ~ 70 ℃ is that the salt is easy to precipitate and the current efficiency is lower when the temperature of the solution is less than 30 ℃, and the solution is difficult to manage due to the large amount of evaporation of the solution above 70 ℃. Because.

염화물욕으로부터 아연-텅스텐 전기도금시 전류밀도를 40~120A/dm2으로 제한한 이유는 전류밀도가 40A/dm2미만이면 도금층이 검고 거친 도금층이 형성되기 때문이며 120A/dm2 를 초과하면 한계전류밀도에 도달하여 전류효율이 급격하게 떨어지기 때문이다.Zinc from chloride bath - if reason tungsten electroplating when limiting the current density to 40 ~ 120A / dm 2 is, if the current density of 40A / dm less than two is because the coating layer is black and rough plating layer is formed exceeds 120A / dm 2, the limiting current This is because the current efficiency drops rapidly when the density is reached.

이하, 실시예를 통하여 본 발명을 보다 상세히 설명한다.Hereinafter, the present invention will be described in more detail with reference to Examples.

실시예Example 1  One

두께가 0.7mm인 냉연강판을 120x150mm로 절단하여 탈지와 산세 과정을 거친 다음 용액이 순환되는 대형의 전기도금장치를 이용하여 아래의 용액 및 도금조건으로 도금을 실시하였다. 먼저 텅스텐산나트륨과 구연산을 물에 용해시켜 놓고 나머지 시약은 50리터 용량의 전기도금장치에 직접 투입한 후 이들 시약이 전부 용해된 것을 확인한 다음 미리 용해시켜 놓은 텅스텐산나트륨과 구연산 용액을 투입하였다. 도금용액중의 지지염인 염화칼륨은 300g/l, pH는 4.5, 온도 60℃, 도금부착량은 20g/m2으로 하였다. The cold rolled steel sheet having a thickness of 0.7mm was cut into 120x150mm, subjected to degreasing and pickling, and then plated under the following solution and plating conditions using a large electroplating apparatus in which the solution was circulated. First, sodium tungstate and citric acid were dissolved in water, and the remaining reagents were directly added to a 50-liter electroplating apparatus. After confirming that all of these reagents were dissolved, sodium tungstate and citric acid solution dissolved in advance were added. Potassium chloride as a supporting salt in the plating solution was 300 g / l, pH was 4.5, temperature 60 ° C., and the coating amount was 20 g / m 2 .

도금층의 텅스텐 함량 및 전류효율은 ICP-AES(Inductively Coupled Plasma-Atomic Emission Spectrometer)를 이용하여 정량분석 하였고 내식성은 염수분무시험기를 이용하여 적청이 발생하기 시작하는 시간을 체크하였으며 도금층표면의 백색도는 색차계를 이용하여 측정하였다.The tungsten content and current efficiency of the plated layer were quantitatively analyzed using Inductively Coupled Plasma-Atomic Emission Spectrometer (ICP-AES), and the corrosion resistance was checked by using a salt spray tester. It measured using the system.

전기도금시 용액 및 도금조건은 아래와 같이 변화시켰다.The solution and plating conditions were changed as follows during electroplating.

1) 염화아연 : 90~200g/l1) Zinc Chloride: 90 ~ 200g / l

2) 텅스텐산나트륨 : 0.1~6g/l2) Sodium Tungstate: 0.1 ~ 6g / l

3) 구연산 : 0.8~5g/l3) citric acid: 0.8 ~ 5g / l

4) 첨가제 : 0.08~2.0ml/l4) Additive: 0.08 ~ 2.0ml / l

5) 전류밀도 : 30~130A/dm2 5) Current Density: 30 ~ 130A / dm 2

아래 표 1은 그 평가결과를 나타낸 것이다.Table 1 below shows the evaluation results.

구분division 순번turn 도금용액Plating solution 전류밀도 (A/dm2)Current density (A / dm 2 ) 피막중 텅스텐 함량(중량%)Tungsten content (wt%) in film 내식성 (적청발생 시간)Corrosion Resistance (Red Blue Development Time) 백색도 (L*)Whiteness (L *) 전류 효율 (%)Current efficiency (%) 염화아연 (g/l)Zinc Chloride (g / l) 텅스텐 (g/l)Tungsten (g / l) 구연산 (g/l)Citric acid (g / l) 첨가제 (ml/l)Additive (ml / l) 비교예Comparative example 1One 120120 -- -- -- 6060 -- 1212 8585 9898 22 9090 0.20.2 1One 0.070.07 6060 0.20.2 4242 8282 6969 33 120120 0.10.1 1.21.2 0.150.15 4040 0.060.06 1717 8181 9494 44 120120 0.50.5 0.80.8 0.150.15 6060 2.52.5 2020 7676 9595 55 120120 66 44 22 6060 6.66.6 5151 5858 7878 66 120120 44 33 1.51.5 130130 4.54.5 4444 7575 7575 77 200200 33 44 0.080.08 120120 3.83.8 5858 5555 9696 88 120120 33 44 22 3030 2.72.7 5555 6161 9797 발명예Inventive Example 1One 100100 0.20.2 1One 0.10.1 4040 0.10.1 4848 7272 9292 22 100100 0.20.2 55 22 5050 0.40.4 5151 6969 9292 33 120120 33 22 1One 100100 3.93.9 5454 7070 8787 44 120120 0.20.2 1One 0.10.1 120120 0.30.3 5050 7171 8585 55 150150 0.50.5 1One 0.70.7 6060 1.61.6 5252 7676 9090 66 150150 1.21.2 44 0.20.2 100100 2.32.3 5656 7575 8888 77 150150 22 1One 1.51.5 8080 4.14.1 5555 7171 9090 88 200200 55 55 1One 4040 55 6060 6868 9595 99 200200 55 55 22 120120 4.84.8 5858 7070 8585

상기 표 1에 나타낸 바와 같이 비교예의 순수아연도금강판인 "1"의 경우는 부착량이 20g/m2인 경우 12시간이 경과한 시점에서 적청이 발생하기 시작했고, 염화아연의 첨가량이 90g/l로 적은 "2"의 경우는 금속이온농도가 낮아 석출과전압이 증대하기 때문에 절류효율이 69%까지 떨어지고 도금용액중 텅스텐산나트륨 농도가 0.1g/l로 낮은 "3"의 경우는 피막중 금속 텅스텐 함량이 낮아 내식성이 열세인 것을 알 수 있다. 그리고 도금용액중 구연산 첨가량이 0.8g/l인 "4"의 경우는 구연산 농도가 낮아 텅스텐 이온이 충분한 착이온을 형성하지 못하기 때문에 내식성이 열세를 나타냈다. 그리고 용액중 텅스텐산나트륨 농도가 본 발명에서 제시한 5g/l보다 높은 "5"의 경우는 내식성은 우수하나 표면이 검게 나타나 백색도가 급격하게 떨어지는 것을 알 수 있다. 기타 전류밀도가 120A/dm2 를 초과할 경우는 전류효율이 하락하고 첨가제 첨가량이 0.1ml/l 미만이거나 전류밀도가 40A/dm2 미만으로 낮으면 역시 도금층 표면이 검게 되는 현상이 발생하였다.As shown in Table 1, in the case of pure zinc plated steel sheet "1" of the comparative example, when the adhesion amount was 20 g / m 2 , the red blue blue color began to be generated after 12 hours, and the amount of zinc chloride added was 90 g / l. In case of "2", the metal ion concentration is low, and the precipitation overvoltage increases, so the current efficiency decreases to 69%. In case of "3", the concentration of sodium tungstate in the plating solution is 0.1g / l. It can be seen that the content is low in corrosion resistance. In the case of "4" having an amount of citric acid added in the plating solution of 0.8 g / l, since the concentration of citric acid was low, tungsten ions did not form sufficient complex ions, indicating poor corrosion resistance. And when the concentration of sodium tungstate in the solution of "5" higher than 5g / l presented in the present invention is excellent in corrosion resistance, but the surface is black, it can be seen that the whiteness drops sharply. When the current density exceeds 120A / dm 2 , the current efficiency decreases, and when the additive amount is less than 0.1ml / l or the current density is lower than 40A / dm 2 , the surface of the plating layer also becomes black.

그러나 본 발명에서 제시한 용액 및 도금조건으로 도금하였을 경우는 피막중 금속 텅스텐 함량이 0.1~5중량%로 석출되어 내식성이 우수하고 백색도는 68 이상, 전류효율은 85% 이상을 나타냈다. However, when plating under the solution and plating conditions presented in the present invention, the metal tungsten content in the film was precipitated to 0.1 to 5% by weight, which showed excellent corrosion resistance, whiteness of 68 or more, and current efficiency of 85% or more.

본 발명에 의할 경우, 아연-텅스텐 합금도금을 냉연강판 표면에 전기도금법으로 석출시킬 수 있고 이들 합금이 적정 비율로 존재할 경우 내식성이 우수한 아연-텅스텐 합금전기도금강판을 안정적으로 제조할 수 있다.According to the present invention, zinc-tungsten alloy plating can be deposited on the surface of the cold rolled steel sheet by electroplating, and when these alloys are present in an appropriate ratio, zinc-tungsten alloy electroplating steel sheets excellent in corrosion resistance can be stably manufactured.

Claims (3)

염화아연 100~200g/l, 텅스텐산나트륨 0.2~5g/l, 염화칼륨 150~400g/l, 폴리에틸렌글리콜 0.1~2ml/l 및 구연산 1.0~5g/l을 포함하여 조성되는 아연-텅스텐 합금전기도금강판 제조용 도금용액.Zinc-tungsten alloy electroplating steel sheet including zinc chloride 100 ~ 200g / l, sodium tungstate 0.2 ~ 5g / l, potassium chloride 150 ~ 400g / l, polyethylene glycol 0.1 ~ 2ml / l and citric acid 1.0 ~ 5g / l Plating solution for manufacture. 제 1항의 도금용액을 이용하여 제조되는 그 합금 도금층에서의 금속 텅스텐 함량이 무게비로 0.1-5중량%이고 나머지가 아연으로 구성되어 있는 아연-텅스텐 합금전기도금강판.A zinc-tungsten alloy electroplating steel sheet comprising a metal tungsten content in the alloy plating layer prepared by using the plating solution of claim 1 in a weight ratio of 0.1-5% by weight and the remainder being made of zinc. 제 1항의 도금용액을 사용하여 pH 2~5, 온도 30~70℃, 전류밀도 40~120A/dm2의 조건으로 도금하여 합금 도금층에서의 금속 텅스텐 함량이 무게비로 0.1-5중량%이고 나머지가 아연으로 형성되도록 하는 것을 특징으로 하는 내식성이 우수한 아연-텅스텐 합금전기도금강판의 제조방법.Plating is carried out under the conditions of pH 2 ~ 5, temperature 30 ~ 70 ℃, current density 40 ~ 120A / dm 2 using the plating solution of claim 1 , the metal tungsten content in the alloy plating layer is 0.1-5% by weight in weight ratio and the rest is Method for producing a zinc-tungsten alloy electroplating steel sheet excellent corrosion resistance characterized in that it is formed of zinc.
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