KR102074773B1 - Fe-X Flash Electronic Plating Solution, Method for Manufacturing the Galvanized Steel Sheet and Galvanized Steel Sheet Thereof - Google Patents

Fe-X Flash Electronic Plating Solution, Method for Manufacturing the Galvanized Steel Sheet and Galvanized Steel Sheet Thereof Download PDF

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KR102074773B1
KR102074773B1 KR1020190048136A KR20190048136A KR102074773B1 KR 102074773 B1 KR102074773 B1 KR 102074773B1 KR 1020190048136 A KR1020190048136 A KR 1020190048136A KR 20190048136 A KR20190048136 A KR 20190048136A KR 102074773 B1 KR102074773 B1 KR 102074773B1
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steel sheet
plating
hot
dip galvanized
galvanized steel
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KR1020190048136A
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Korean (ko)
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김상호
김수원
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주식회사 엠.이.시
남동화학(주)
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    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/56Electroplating: Baths therefor from solutions of alloys
    • C25D3/562Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of iron or nickel or cobalt
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C38/00Ferrous alloys, e.g. steel alloys
    • C22C38/02Ferrous alloys, e.g. steel alloys containing silicon
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C38/00Ferrous alloys, e.g. steel alloys
    • C22C38/04Ferrous alloys, e.g. steel alloys containing manganese
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C38/00Ferrous alloys, e.g. steel alloys
    • C22C38/06Ferrous alloys, e.g. steel alloys containing aluminium
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C2/00Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
    • C23C2/02Pretreatment of the material to be coated, e.g. for coating on selected surface areas
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C2/00Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
    • C23C2/04Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor characterised by the coating material
    • C23C2/06Zinc or cadmium or alloys based thereon
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C2/00Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
    • C23C2/34Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor characterised by the shape of the material to be treated
    • C23C2/36Elongated material
    • C23C2/40Plates; Strips
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/02Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material
    • C23C28/021Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material including at least one metal alloy layer
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/02Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material
    • C23C28/023Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material only coatings of metal elements only
    • C23C28/025Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material only coatings of metal elements only with at least one zinc-based layer
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00Electroplating characterised by the article coated
    • C25D7/06Wires; Strips; Foils
    • C25D7/0614Strips or foils

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Coating With Molten Metal (AREA)

Abstract

The present invention relates to the manufacture of a hot dip galvanized steel sheet used for a vehicle and home appliances and, specifically, to an Fe-X flash electroplating solution used for Fe flash plating in Fe flash electroplating performed on a substrate steel sheet by a pretreatment process of hot dip galvanizing to prevent the generation of a part which is not plated and improve adhesion of a hot dip galvanized film. The present invention also relates to a manufacturing method for a hot dip galvanized steel sheet using a Fe-X flash electroplating solution and hot dip galvanized steel sheet manufactured by the same. According to the present invention, the Fe-X flash electroplating solution for hot dip galvanized undercoat adds tungsten and/or titanium metal ions, an antioxidant, an Fe stress reducer, a potential difference enhancer, and a complexing agent to an acid plating solution in which the concentration of Fe ions is 3-300g/l. Also, additives are composed of 0.01-5 g of the tungsten and/or titanium metal ions, 0.1-100 g of the antioxidant, 0.1-30 g of the Fe stress reducer, 0.5-30 g of the potential difference enhancer, and 0.1-100 g of the complexing agent in comparison with 100 g of the concentration of the Fe ions.

Description

Fe-X 플래쉬전기도금용액 및 이를 이용한 용융아연도금강판의 제조방법 및 그 방법에 의해 제조된 용융아연도금강판 {Fe-X Flash Electronic Plating Solution, Method for Manufacturing the Galvanized Steel Sheet and Galvanized Steel Sheet Thereof}Fe-X flash electroplating solution and method for manufacturing hot-dip galvanized steel sheet using the same and hot-dip galvanized steel sheet manufactured by the method {Fe-X Flash Electronic Plating Solution, Method for Manufacturing the Galvanized Steel Sheet and Galvanized Steel Sheet Thereof}

본 발명은 자동차, 가전제품 등에 사용되는 용융아연도금강판의 제조와 관련된 것으로서, 상세하게는 용융아연도금피막의 밀착성을 향상시키고 미도금 발생을 방지하기 위하여 용융아연도금의 전처리 공정으로 소지강판 위에 실시되는 Fe 플래쉬전기도금에 있어서, Fe 플래쉬도금 시 사용되는 Fe-X 플래쉬도금용액과 이 Fe-X 플래쉬도금용액을 이용한 용융아연도금강판의 제조방법 및 그 제조방법으로 제조된 용융아연도금강판에 관한 것이다.The present invention relates to the production of hot-dip galvanized steel sheet used in automobiles, home appliances, and the like, in detail, carried out on the base steel sheet in the pre-treatment process of hot-dip galvanized to improve the adhesion of the hot-dip galvanized film and to prevent unplated. In the Fe flash electroplating, the Fe-X flash plating solution and Fe-X flash plating solution used for Fe flash plating, and a method for producing a hot-dip galvanized steel sheet using the Fe-X flash plating solution, and a hot-dip galvanized steel sheet will be.

강판의 내식성 향상 혹은 표면장식을 위하여 도금막을 형성한다. 도금막을 형성하는 물질은 다양하나 범용으로는 주로 내식성 확보용으로 아연도금과 그의 합금 물질이 사용된다. 아연도금은 소지금속이 강판인 경우 희생방식에 의하여 철 강판의 수명을 연장 시킨다. 강판에 내식물질을 도금하여 수명연장을 하거나, 장식을 할 경우 도금물질의 밀착성 및 균일도금 즉 미도금이 없어야 한다. 또한 표면이 균일하여 외관이 양호하여야 한다. 특히 자동차용 및 가전용에서 사용되는 강판은 무게를 경량화하기 위하여 인장강도, 항복강도 등을 향상시키는 고강도, 고장력 강판의 수요가 증가되고 있다. 이들 강판은 강도가 상승하므로 인하여 성형이 곤란하게 되고, 특히 강재의 연신이 저하되기도 한다. 따라서 강도와 연신율이 모두 높은 강재는 강판에 Si, Mn, Al등을 첨가하고 다양한 조직을 개발하여 DP강(Dual Phase: Ferrite and Martensite Phase), 트립강(Transformation Induced Plasticity), CP강(Complex Phase:Ferrite, Martensite and Precipite Phase) 등등의 강판 종류들로 생산되고 있다. 그러나 이들 강의 내식성을 향상시키기 위하여 용융도금을 행하는데 이들 용융도금의 절차는 압연된 강판을 소지금속으로 기름성분을 제거하는 탈지공정, 필요시 산세공정, 적정온도의 소둔공정, 냉각 및 적정온도의 용융도금공정 , 냉각 및 필요시 표면 후처리 공정으로 용융도금재가 생산된다. 일반적인 탄소강판에서 표면에 철산화물이 일어나기 어려운 이슬점은 소둔공정에서 관리하므로 표면에 양호한 아연 혹의 합금화아연용융도금이 일어난다. 그러나 상기에 언급한 고강도 혹은 고장력 강판을 생산하기 위해 첨가한 Si Mn, Al등은 소둔시 존재하는 미량의 산소나 수분과 반응하여 강판 표면에 분포되는 Si, Mn, Al등의 원소와 산화되어 단순 산화물 혹은 복합산화물 등이 발생하여 용융금속의 젖음성을 방해해서 도금막의 밀착성 저하나 미도금이 발생하여, 표면품질을 떨어뜨린다.A plated film is formed to improve corrosion resistance or surface decoration of the steel sheet. There are various materials forming the plating film, but zinc plating and its alloying material are mainly used for securing corrosion resistance. Galvanizing extends the life of iron sheet by sacrificial method when the base metal is steel sheet. In case of extending the service life by plating corrosion resistant material on plate or decorating, there should be no adhesion and uniform plating of plating material. In addition, the surface should be uniform and the appearance should be good. In particular, the steel sheet used in automobiles and home appliances is increasing the demand for high strength, high tensile strength steel sheet to improve the tensile strength, yield strength, etc. in order to reduce the weight. These steel sheets are difficult to form due to the increase in strength, and in particular, the stretching of the steel materials is lowered. Therefore, for steels with high strength and elongation, add Si, Mn, Al, etc. to the steel plate and develop various structures to make DP steel (Dual Phase: Ferrite and Martensite Phase), Trip Steel (Transformation Induced Plasticity), CP Steel (Complex Phase). It is produced in steel sheet types such as: Ferrite, Martensite and Precipite Phase. However, in order to improve the corrosion resistance of these steels, hot dip galvanizing is performed. These hot dip galvanizing procedures include a degreasing process for removing oil components from the rolled steel plate with base metal, a pickling process if necessary, an annealing process at an appropriate temperature, cooling and an appropriate temperature. Hot-dip plating materials are produced by hot-dip plating, cooling and, if necessary, surface finishing. In general carbon steel sheet, dew point, which is hard to cause iron oxide on the surface, is managed in the annealing process, so that zinc zinc alloy hot dip galvanized on the surface occurs. However, Si Mn, Al, etc. added to produce the high strength or high strength steel sheet mentioned above are oxidized with elements such as Si, Mn, Al, etc. distributed on the surface of the steel sheet by reacting with a small amount of oxygen or moisture present during annealing. Oxides or composite oxides are generated to interfere with the wettability of the molten metal, resulting in a decrease in adhesion of the plated film or unplating, resulting in poor surface quality.

이러한 결함을 해결하기 위하여 도금되기전 소지층을 덮는 방법으로서 일본특허 2002-322551,2003-183797,2005-119466, 2005-200690, 2006-283070, 2769350, 2007-262464, 한국특허10-0884104, 10-1040770, 10-214-0123921등등에서 소지강판 표면에 Ni, Fe, Co, C, S, C, Cu등의 원소로 선도금하고 처리하는 플래쉬도금 방식이 소개되었다. 그러나 상기에 소개된 방법에는 Fe도금에의한 방법이 아닐 경우 소둔시 특이한 조건으로 환원 분위기를 맞추기가 어렵거나, 이슬점 조정이 어려워 밀착성이 좋지 않거나 효과가 거의 없으며, 순수 Fe 선도금을 행하거나 상기에 언급된 원소들과의 조합에 의하여는 도금액에 Fe이온이 산화되어 슬러지화되어 장시간 사용이 불가능하다, Ni이나 Co등은 알러지유발의 중 금속이며, 비용도 비싸다. 또한 이들에 의한 선도금을 행하여도 소둔시 발생된 Si, Mn, Al등에 우선적으로 발생된 산화층에 의하여 밀착성 미비로 가공이 일어날 경우 도금층 박리로 양호한 도금품질을 얻기 어렵다.In order to solve this defect, as a method of covering the base layer before plating, Japanese Patent 2002-322551,2003-183797,2005-119466, 2005-200690, 2006-283070, 2769350, 2007-262464, Korean Patent 10-0884104, 10 -1040770, 10-214-0123921, etc., a flash plating method has been introduced to lead and process elements such as Ni, Fe, Co, C, S, C, Cu on the surface of the steel sheet. However, in the above-described method, it is difficult to adjust the reducing atmosphere to unusual conditions during annealing when it is not the method of Fe plating, or it is difficult to adjust the dew point, resulting in poor adhesion or almost no effect. In combination with the elements mentioned above, Fe ions are oxidized and sludgeized in the plating solution, which makes it impossible to use them for a long time. Ni and Co are allergen-induced heavy metals and are expensive. In addition, even when the lead is made by these metals, it is difficult to obtain a good plating quality by peeling the plating layer when processing occurs due to insufficient adhesion due to an oxide layer preferentially generated by Si, Mn, Al, etc. generated during annealing.

또한, 한국등록특허 10-0976787호에 전기아연도금강판 제조용 하지도금용액으로서의 철 도금용액과 철도금용액이 하지도금액으로 도금된 전기아연도금강판 및 그 제조방법이 소개되어 있다.. In addition, Korean Patent No. 10-0976787 discloses an electrogalvanized steel sheet in which an iron plating solution as a base plating solution for manufacturing an electrogalvanized steel sheet and a railway gold solution are plated with a base plating solution, and a manufacturing method thereof.

이 기술은 본 발명자등이 개발한 기술로서, 장시간 사용할수고, 또한 전기아연도금강판의 도금피막 특성을 향상시키고, 내식성, 밀착성 및 은폐성이 우수한 효과가 있다.This technique has been developed by the inventors and the like, and can be used for a long time, and also improves the coating film characteristics of the galvanized steel sheet, and has excellent corrosion resistance, adhesiveness and hiding property.

그러나 이 기술은 전기아연도금강판에는 우수한 효과가 있으나, 용융아연도금강판에는 적용이 곤란한 문제가 있다. However, this technique has an excellent effect on the galvanized steel sheet, but has a problem that is difficult to apply to hot-dip galvanized steel sheet.

그 이유는 위에서 언급한 것과 같이 순수 Fe도금과 마찬가지로 소지층의 최종 표면의 선도금에 의하여는 소둔시 이미 발생된 안쪽의 Si, Mn, Al등의 우선 산화물로 인한 선도금층과 소지금속과의 밀착성 미비로 양호한 도금재를 생성하기가 어렵다.The reason for this is that, as mentioned above, as in the case of pure Fe plating, by the leading surface of the final layer of the base layer, the adhesion between the base layer and the base metal due to the preferential oxides such as Si, Mn, and Al generated during annealing It is difficult to produce a good plating material inadequately.

본 발명은 상기한 문제점을 해결하기 위하여 도출된 것으로서, 도금밀착성 및 표면외관이 우수한 용융아연도금강판을 제조하기 위한 Fe-X 플래쉬도금용액을 제공하고, 이 용액을 이용하여 용융아연도금강판을 제조하는 방법 및 그 제조방법에 의해 제조된 용융아연도금강판을 제공하고자 하는데 그 목적이 있다. The present invention was derived to solve the above problems, to provide a Fe-X flash plating solution for producing a hot-dip galvanized steel sheet with excellent plating adhesion and surface appearance, to prepare a hot-dip galvanized steel sheet using this solution It is an object of the present invention to provide a hot-dip galvanized steel sheet manufactured by the method and the manufacturing method thereof.

본 발명자들은 도금 밀착성 및 미도금 방지를 위하여 검토한 결과 Si나 Al, Mn, 등이 하나 혹은 2가지 종류 이상이 들어간 경우 강도 확보 및 연성 오스테나이트 안정화나 잔류 오스테나이트 생성에 유효하기는 하지만 첨가량이 1.0% 이상인 경우 대부분 용융아연 도금이 불량하기 때문에 용융도금 전에 적정량의 Fe-X 선도금(플래쉬도금)을 행하여 상기 문제를 해결하였다. 여기에서 Fe-X 선도금은 Fe, W, Ti 금속이 소지강판 표면에 석출되어 도금되는 것으로서, X는 W 혹은 Ti 단독으로 포함되거나 W+Ti 형태로 포함됨을 의미한다. The present inventors have studied to prevent plating adhesion and unplating, and when one or two or more kinds of Si, Al, Mn, and the like are contained, they are effective in securing strength and stabilizing ductile austenite or generating residual austenite. In the case of more than 1.0%, most of the hot-dip galvanizing is poor, so the above problem is solved by performing an appropriate amount of Fe-X lead gold (flash plating) before hot dip plating. Here, the Fe-X lead metal is Fe, W, Ti metal is deposited on the surface of the steel sheet is plated, it means that X is included in W or Ti alone or in the form of W + Ti.

상기 목적을 달성하기 위하여, 본 발명은 선도금으로 Fe-X도금을 개발하였으며, 앞서 제안된 선도금에서 해결방안에서 해결치 못한 Si, Mn, Al등의 산화물이 선도금층과의 밀착성 확보를 못한 것을 Fe에 혼합된 X금속에 의하여 밀착성이 확보되고, 산화물이 완벽하게 마스킹되는 역할을 한다.In order to achieve the above object, the present invention has developed Fe-X plating as a leading gold, the oxides of Si, Mn, Al, etc. that could not be solved in the solution proposed in the preceding leading gold did not secure adhesion with the leading gold layer Adhesiveness is ensured by X metal mixed with Fe, and the oxide is completely masked.

Fe 이온의 농도가 3~300g/l인 산성 도금용액 중에 텅스텐 및/또는 티타늄 금속이온, 산화방지제, Fe 응력감소제, 전위차 개선제, 착화제를 첨가하되, 상기 첨가물들은 상기 Fe 이온의 농도 100g에 대비하여,Tungsten and / or titanium metal ions, antioxidants, Fe stress reducers, potentiometers, and complexing agents are added to an acidic plating solution having a concentration of 3 to 300 g / l of Fe ions, and the additives are added to a concentration of 100 g of Fe ions. In preparation,

텅스텐 및/또는 티타늄 금속이온은 0.01~5g, 산화방지제는 0.1~100g,0.01 to 5 g of tungsten and / or titanium metal ions, 0.1 to 100 g of antioxidant,

Fe 응력감소제는 0.1~30g, Fe와 텅스텐, 티타늄 금속의 전위차를 개선하여 양호한 도금층을 만드는 전위차 개선제는 0.5~30g, 착화제는 0.1~100g을 첨가하여 구성되는 용융아연도금 하지도금용 Fe플래쉬 도금용액을 제공한다.Fe stress reducing agent is 0.1 ~ 30g, improves the potential difference between Fe, tungsten and titanium metal to make a good plating layer. Potential difference improving agent is 0.5 ~ 30g and complexing agent is 0.1 ~ 100g. Provide a solution.

상기 Fe는 염상태로 황산제일철, 염화제일철, 붕불화제일철, 설폰제일철 중에서 선택된 하나이며,The Fe is a salt selected from ferrous sulfate, ferrous chloride, ferrous boride, iron sulfonate,

상기 텅스텐 및/또는 티타늄은 염상태로 텅스텐나트륨, 포타슘티타늄옥살레이트나인 것을 특징으로 하며, The tungsten and / or titanium is characterized in that the salt is tungsten sodium, potassium titanium oxalatena,

상기 산화방지제는 안식향산, 에틸렌 디아민 + 구연산 계 유기물, 아미노아세트산, 벤젤설포네이트, 4-옥소-펜탄산, 아스코로빈산 중의 적어도 어느하나인 것을 특징으로 하며,The antioxidant is characterized in that at least any one of benzoic acid, ethylene diamine + citric acid-based organic material, amino acetic acid, bezelsulfonate, 4-oxo-pentanoic acid, ascorbic acid,

상기 응력감소제로는 사카린, 트리데실옥시 폴리(에틸렌옥시)에탄올(3), 디이소데실프탈레이트 N-(3-히드록시부틸레멘-P-설파닐산, 폴리알킬렌 폴리아민, 말론산 중의 적어도 어느 하나인 것을 특징으로 하며,The stress reducing agent includes at least any of saccharin, tridecyloxy poly (ethyleneoxy) ethanol (3), diisodecylphthalate N- (3-hydroxybutyllemen-P-sulfanic acid, polyalkylene polyamine, and malonic acid Characterized by one,

상기 전위차 개선제는 에틸렌 글리콜, 폴리에틸렌글리콜, 폴리아민, 에틸렌 디아민, 2-뷰텐-1, 4-디올 중의 적어도 어느 하나인 것을 특징으로 하며,The potentiometer is characterized in that at least one of ethylene glycol, polyethylene glycol, polyamine, ethylene diamine, 2-butene-1, 4-diol,

상기 도금이온 착화제로 에칠렌, 아미노아세트산, 벤젠설포네이트, 글루콘산,,4-옥소-펜탄산 중의 적어도 어느 하나인 것을 특징으로 한다.The plating ion complexing agent may be at least one of ethylene, amino acetic acid, benzenesulfonate, gluconic acid, and 4-oxo-pentanoic acid.

또한 본 발명은 In addition, the present invention

중량%로 Si: 0.2~6.0%, Mn: 0.2~7.0%, Al: 0.2~7.0% 이 1종이상 함유된 소지강판을 준비하는 단계,Preparing a steel sheet containing at least one of Si: 0.2 to 6.0%, Mn: 0.2 to 7.0%, and Al: 0.2 to 7.0% by weight,

상기 소지강판 위에 Fe 금속과 텅스텐 및/또는 티타늄 중에서 선택된 1종 이상의 금속을 석출시키기 위한 Fe-X 플래쉬전기도금(Fe-X 선도금)하는 단계, Fe-X flash electroplating (Fe-X lead plating) for depositing at least one metal selected from Fe metal and tungsten and / or titanium on the base steel sheet,

가열산화, 유지,냉각 시키는 단계, 상기 Fe-X 플래쉬전기도금된 강판 위에 아연 또는 아연합금의 용융아연도금을 행하는 단계, 필요 시 후처리하는 단계로 구성되는 용융아연도금강판의 제조방법을 제공한다. It provides a method for producing a hot-dip galvanized steel sheet comprising the step of heat oxidation, maintenance, cooling, hot-dip galvanizing of zinc or zinc alloy on the Fe-X flash electroplated steel sheet, and post-treatment if necessary. .

상기 소지강판 위에 행하는 Fe-X 플래쉬전기도금은 Fe 이온의 농도가 3~300g/l인 산성 도금용액 중에 텅스텐 또는 티타늄 중 1종 이상, 산화방지제, Fe 응력감소제, 전위차 방지제, 착화제 등을 첨가하여서 된 Fe-X 플래쉬 도금용액에서 행하여 지되, 상기 첨가제는 Fe이온의 농도 100g에 대비하여, 텅스텐 또는 티타늄 중 1종 이상인 이온의 농도: 0.01~5g, 산화방지제: 0.1~100g, Fe 응력감소제: 0.1~30g, 전위차 방지제: 0.5~30g, 착화제: 0.1~100g을 첨가하여 구성한다.Fe-X flash electroplating on the base steel sheet is one or more of tungsten or titanium, antioxidants, Fe stress reducers, potentiometric inhibitors, complexing agents, etc. in an acid plating solution with a Fe ion concentration of 3 ~ 300g / l. It is carried out in the Fe-X flash plating solution added, the additive is compared to the concentration of Fe ions 100g, the concentration of one or more ions of tungsten or titanium: 0.01 ~ 5g, antioxidant: 0.1 ~ 100g, Fe stress reduction Agent: 0.1-30 g, potentiometric inhibitors: 0.5-30 g, complexing agents: 0.1-100 g is added and comprised.

상기 Fe-X 프래쉬전기도금은 도금전류밀도 1~150ASD, 도금액 온도는 20~85oC, pH는 1.0~6.5의 조건에서 도금이 이루어지는 것을 특징으로 하며,The Fe-X flash electroplating is characterized in that the plating is performed under the conditions of the plating current density of 1 ~ 150ASD, the plating solution temperature is 20 ~ 85oC, pH is 1.0 ~ 6.5,

상기 Fe-X도금층의 도금량은 0.1~5.0g/m2인 것을 특징으로 한다.The plating amount of the Fe-X plating layer is characterized in that 0.1 ~ 5.0g / m2.

또한 본 발명은 In addition, the present invention

소지강판 위에 Fe-X 금속의 도금층이 형성되고, 상기 Fe-X도금층위에 아연 또는 아연합금의 용융도금층이 형성되어 있는 용융아연도금강판을 제공한다.A plated layer of Fe-X metal is formed on the base steel sheet, and a hot dip galvanized steel sheet having a hot-dip galvanized layer of zinc or zinc alloy is formed on the Fe-X plated layer.

상기 Fe-X도금층의 도금량은 0.1~5.0g/m2인 것을 특징으로 한다.The plating amount of the Fe-X plating layer is characterized in that 0.1 ~ 5.0g / m2.

본 발명에 의하면, 용융도금이 어려운 Si나 Al, Mn 등이 1종 혹은 2종이상이 함유된 고장력강 혹은 고강도 강판에 도금 밀착성이 우수하고, 미도금이 없는 양호한 표면을 갖는 용융아연도금강판을 연속 제조하는 것이 가능하다.According to the present invention, a hot-dip galvanized steel sheet having a good surface adhesion and no unplated surface is continuously formed on a high-strength steel or a high-strength steel sheet containing one or two or more kinds of Si, Al, and Mn, which are difficult to be hot-dipped. It is possible to manufacture.

도 1은 Si, Al, Mn의 합이 4.1 중량% 포함된 고강도 강판에 선도금 없이 용융아연도금한 강판의 표면
도 2는 도 1과 동일한 소지강판에 Fe-X 플래쉬도금을 2g/m2행하고 용융아연도금한 강판의 표면
1 is a surface of a steel sheet hot-dip galvanized without lead in a high-strength steel sheet containing 4.1 wt% of the sum of Si, Al, and Mn
2 is a surface of a steel sheet hot-dip galvanized with 2 g / m2 of Fe-X flash plating on the same base steel sheet as in FIG.

본 발명에서는 일반적인 방법으로 용융도금을 행하는 공정을 포함하고 있으며 여기에 선도금으로 Fe를 기반으로 하는 Fe-X 도금을 선도금 시키는 공정을 포함한다. Fe-X 선도금은 일반적으로 전기도금으로 이루어지며 그 공정은 압연된 Si, Mn, Al등이 포함된 소지강판을 도금 원판으로 하고 전기도금법으로 도금하는데 있어서 Fe 순금속 만으로는 밀착성과 미도금 방지 및 연속 생산에 어려움이 있어서 X의 성분이 Fe와 동시에 도금되도록 한다. 여기에서 Fe-X 도금욕은 제일철을 사용하는 산성욕이다. 이들의 구성은 황산제일철, 염화제일철, 붕불화 제일철, 설폰제일철등이나 이들의 혼합으로 주로 이루어진다. 그러나 이들 도금욕은 도금과정에서 제일철 이온이 제이철로 되고 궁극적으로는 슬러지화가 되어 연속 도금이 어렵게 된다. The present invention includes a process for performing hot-dip plating in a general manner, and includes a process for leading the Fe-X plating based on Fe as the lead. The Fe-X lead is generally made of electroplating, and the process is made of a plated steel sheet containing rolled Si, Mn, Al, etc. and plated by electroplating. Difficulties in production allow X to be plated simultaneously with Fe. Here, the Fe-X plating bath is an acid bath using ferrous iron. These structures mainly consist of ferrous sulfate, ferrous chloride, ferrous boride, ferric sulfone and the like, and mixtures thereof. However, in these plating baths, ferrous ions become ferric iron and ultimately become sludge in the plating process, making continuous plating difficult.

따라서 본 도금액에서는 제이철 생성을 방지하는 것이 필요하다.  Therefore, in this plating solution, it is necessary to prevent the production of ferric iron.

또한 본 발명은 도금액 순수 Fe 도금시 나타나는 Si, Mn, Al등의 산화물이나, 복합물을 엄폐하여 미도금을 방지 시키나, 산화가열시 이들 산화물과 Fe-X도금층과의 밀착성을 확보해서 소지금속과 선도금층의 밀착성, 선도금층과 용융도금피막의 밀착성 모두 확보해야 한다.In addition, the present invention prevents unplating by covering oxides or composites such as Si, Mn, Al, etc., which appear in pure Fe plating of a plating solution, but in the case of oxidative heating, it is possible to secure adhesion between these oxides and the Fe-X plated layer so that base metals and wires The adhesion of the plating layer and the adhesion of the lead metal layer and the hot dip coating film should be ensured.

상기 2가지 목적을 달성키 위하여 본 발명의 Fe-X 플래쉬도금용액이 마련된다. 도금용액은 Fe 이온의 농도가 3~300g/L인 도금액에, 도금액 1L에 Fe 농도 100g (이하 Fe이온 100g을 기준)을 기준으로 하여, 철이온의 산화를 방지하기 위한 산화 방지제가 0.1~100g, Fe 응력 감소제가 0.1~30g, Fe금속과 X금속의 전위차를 개선하여 양호한 도금층을 만드는 전위차 개선제가 0.05~30g, 소둔시 소지 금속의 산화물과의 밀착성을 확보하기 위한 도금층 X원소인 W 및/또는 Ti이 0.01 ~5.0g이 첨가되어 도금액으로 구성된다. 또한 전도성 확보를 위하여 전도성 염을 사용할 수도 있다. In order to achieve the above two objects, the Fe-X flash plating solution of the present invention is provided. Plating solution is 0.1 ~ 100g of antioxidant to prevent oxidation of iron ions based on Fe concentration of 100g (hereinafter referred to as 100g of Fe ion) in plating solution with Fe ion concentration of 3 ~ 300g / L. , 0.1 to 30 g of Fe stress reducing agent, 0.05 to 30 g of potential difference improving agent which improves the potential difference between Fe metal and X metal to make a good plating layer. Or 0.01 to 5.0 g of Ti is added to constitute a plating solution. In addition, a conductive salt may be used to secure conductivity.

이들은 일반적인 전기도금이론에 따른 것으로 도금전류밀도 1~150ASD, 도금액 온도는 상온~85oC, pH는 1.0~5.5에서 도금이 이루어지고, 도금량은 0.1 ~5g/m2으로 형성된다. These are according to the general electroplating theory, the plating current density is 1 ~ 150ASD, the plating solution temperature is room temperature ~ 85oC, the pH is made at 1.0 ~ 5.5, the plating amount is formed to 0.1 ~ 5g / m2.

이하에 본 발명을 구체적으로 설명한다. The present invention will be described in detail below.

본 발명의 Fe-X 도금액에서, 철 금속은 염의 형태로 공급되며 이들은 염화제일철, 황산제일철, 붕불화제일철, 황산제일철암모늄, 슬파민산철, 개미산철등과 같이 황산계, 염화물계, 암모늄계, 등으로 사용이 가능하다. Fe의 농도는 3~ 300g/L가 사용 가능한데 바람직하게는 50~200g/L이다. 철의 농도가 300g/L 이상이면 염의 용해가 원할치 않아 도금 밀착성이 감소되고 균일도금을 행하기 어려우며, 3g/L 이하가 되면 이온 농도가 낮아 전류를 높이면 수소 발생에 의한 탄도금이 발생하고, 표면에 핏트 등이 발생하는 결함이 발생한다. In the Fe-X plating solution of the present invention, the ferrous metal is supplied in the form of salts, which are sulfuric acid, chloride, ammonium, It can be used as such. The concentration of Fe may be used in the range of 3 to 300 g / L, preferably 50 to 200 g / L. If the iron concentration is more than 300g / L, salt dissolution is not desired and plating adhesion is reduced and uniform plating is difficult.If the concentration is less than 3g / L, the ion concentration is low and the current is increased to generate a ballistic plating due to hydrogen generation. A defect occurs in the fitting or the like.

상기 도금액에 X원소로는 Ti, W 금속이 1종 또는 2종이상 첨가되며, 석출 도금층에 함유량이 나타나는데 도금액에 X성분은 Fe 100g 대비 0.01 ~ 5g/L이다. 0.01g/L 이하에서는 용융도금재의 소지 금속표면에 노출된 Si, Mn, Al등이 산화가열시 산화 피막이 형성되어 선도금 Fe도금층과 밀착성을 감소시키는 것을 방지하지 못하며, 5g/L 이상이 되면 Fe와 X금속의 합금성이 불량하게되어 도금성이 좋지 않게 되어 오히려 밀착성의 개선이 어렵다.As the X element, Ti or W metal is added to the plating solution, or one or two or more kinds thereof are added, and the content appears in the precipitation plating layer. The X component in the plating solution is 0.01 to 5 g / L compared to 100 g of Fe. At 0.01g / L or less, Si, Mn, Al, etc. exposed on the metal surface of the molten plated material do not prevent the formation of an oxide film during oxidative heating, thereby reducing the adhesion with the lead gold Fe plating layer. It is difficult to improve the adhesion due to poor alloying properties of the X metal and the poor plating property.

철 이온이 주성분인 도금에서는 철 이온이 산화되어 2가에서 3가로 변화되고 이것이 산화 슬러지로 발전하는게 일반적이다. 따라서 이러한 철이온의 산화를 막지 못하면 연속적인 도금을 행할 수 없다. 본 발명자들은 이러한 결함을 없애기 위하여 철이온 산화방지제로 안식향산, 에틸렌 디아민 + 구연산 계 유기물, 아미노아세트산, 벤젤설포네이트, 4-옥소-펜탄산, 아스코로빈산과 이들의 혼합물 들을 첨가하여 이러한 결함을 막는다. 이들의 도금액 1L에 철성분을 100g로 하였을 때 0.1 ~ 100g를 첨가하면 능력을 발휘 할 수 있으나 바람직하게는 1~50g가 양호하다. 0.1g/L 이하에서는 산화 방지제의 농도가 낮아서 Fe의 산화를 방지하지 못하며, 100g이상이 되면 산화방지는 양호하나 도금 시 응력의 증가로 도금층의 표면이 크랙이 발생하고, 액의 안정성도 양호하지 못하다. In plating where iron ions are the main component, iron ions are oxidized to change from divalent to trivalent, which is generally developed into oxidized sludge. Therefore, continuous plating cannot be performed unless such oxidation of iron ions is prevented. The inventors have added benzoic acid, ethylene diamine + citric acid organics, aminoacetic acid, bezelsulfonate, 4-oxo-pentanoic acid, ascorroic acid and mixtures thereof with iron ion antioxidants to eliminate these defects. When the iron component is 100g to 1L of these plating solutions, 0.1 to 100g may be added to exhibit the ability, but preferably 1 to 50g is good. At 0.1g / L or less, the concentration of antioxidant is low to prevent the oxidation of Fe. If it is more than 100g, the oxidation is good, but the surface of the plating layer cracks due to the increase of stress during plating, and the stability of the liquid is also not good. Can not do it.

또한 Fe-X도금을 행할 시 도금층에 응력이 집중하여 크랙이나 밀착성 등이 불량하게 되는 원인이 있으므로 응력 감소제가 필요하고, 또한 Fe와 X도금 물질의 전위차를 낮추어주는 첨가제가 필요하다. 응력감소제로는 사카린, 트리데실옥시 폴리(에틸렌옥시)에탄올(3), 디이소데실프탈레이트 N-(3-히드록시부틸레멘-P-설파닐산, 폴리알킬렌 폴리아민, 말론산 또는 이들의 혼합물이 철 100g에 대하여 0.1 ~30g 을 초과 하지 않아야 하나 바람직하게는 2~10g이 양호하다. 응력감소를 위하여 0.1g 이하에서는 효과가 없으며, 30g 이상 첨가하는 경우는 도금액에 유기물의 과량으로 전도효율이 떨어지고, 전류가 높을 때 이온 전달을 방해해서 불균일 도금이 행해지고 오히려 응력 증가로 크랙이 발생된 조직이 나타난다. In addition, when Fe-X plating is performed, stress may be concentrated in the plating layer, resulting in poor cracking or adhesiveness, and thus a stress reducing agent is required, and an additive for lowering the potential difference between Fe and X plating materials is required. Strainers include saccharin, tridecyloxy poly (ethyleneoxy) ethanol (3), diisodecylphthalate N- (3-hydroxybutyllemen-P-sulfanic acid, polyalkylene polyamines, malonic acid or mixtures thereof It should not exceed 0.1-30g for 100g of iron, but preferably 2-10g is good, and it is not effective at 0.1g or less for reducing stress, and in the case of adding more than 30g, the conduction efficiency is excessive due to the excessive amount of organic matter in the plating solution. Falling, high current impedes ion transfer, resulting in non-uniform plating, but rather stress-induced cracking.

Fe 이온과 X이온과의 전위차를 비슷하게 해주어 양호한 선도금을 행할 수 있게 전위차 개선제로 에틸렌 글리콜, 폴리에틸렌글리콜, 폴리아민, 에틸렌 디아민, 2-뷰텐-1, 4-디올 등의 사용이 양호하다. 이들은 사용되는 철 100g/L 을 기준으로 0.05 ~ 30g을 사용하며 양호하게는 1 ~ 10g 이 양호하다. 0.05g 이하에서는 미량으로 효과가 없으며, 30g 이상의 경우 과량사용으로 이온 공급을 어렵게하여 균일 도금이 되지 못하게 하고, 밀착성을 감소시킨다. Ethylene glycol, polyethylene glycol, polyamine, ethylene diamine, 2-butene-1, 4-diol and the like are preferable as the potential difference improving agent so that the potential difference between the Fe ion and the X ion can be made similar, so that a good lead can be obtained. They use 0.05 to 30 g based on 100 g / L of iron used, preferably 1 to 10 g is good. If it is 0.05g or less, it is ineffective in a small amount, and in the case of 30g or more, it is difficult to supply ions by excessive use, preventing uniform plating and reducing adhesiveness.

또한 여기에 에칠렌, 아미노아세트산, 벤젠설포네이트, 글루콘산,,4-옥소-펜탄산등이나 이들의 혼합물인 도금이온 착화제를 사용하여 도금효율을 높여 표면 불량과 밀착력을 높일 수도 있다. 이들의 농도는 철 이온의 농도 100g에 대하여 0.1 ~ 100g에서 효과를 나타내며, 5~50g이 양호하다. 0.1g 이하에서는 도금 반응의 영향이 거의 없으며, 100g이상에서는 오히려 도금층 밀착성이 좋지않고, 탄도금도 나타난다. In addition, a plating ion complexing agent, such as ethylene, amino acetic acid, benzenesulfonate, gluconic acid, and 4-oxo-pentanoic acid, or a mixture thereof, may be used to increase the plating efficiency to improve surface defects and adhesion. These concentrations show an effect at 0.1 to 100 g with respect to the concentration of iron ions at 100 g, preferably 5 to 50 g. At 0.1 g or less, there is almost no influence of the plating reaction. On the other hand, at 100 g or more, the adhesion of the plated layer is not good, and ballistic plating also appears.

상기 용액의 전도성을 유지하기 위하여 전도 보조제가 사용되는데 황산계염, 암모늄계염, 붕산계염, 불화물계염 등으로 사용 가능하다. 예로들면 황산암모늄, 염화암모늄, 붕사 및 붕산계염, 인산암모늄, 황산칼륨, 염화칼륨, 염화나트륨, 불화암모늄, 수산화칼륨등이나, 이들의 혼합물이 사용 가능하다. 이들은 도금액에 잘 용해되어야 하고, 제조 시에는 본 도금액에 넣어서 용해시키거나 따로 물에 녹여 첨가도 가능하다. Conductive aids are used to maintain the conductivity of the solution, which may be used as sulfate salts, ammonium salts, boric acid salts, and fluoride salts. For example, ammonium sulfate, ammonium chloride, borax and boric acid salts, ammonium phosphate, potassium sulfate, potassium chloride, sodium chloride, ammonium fluoride, potassium hydroxide and the like, or mixtures thereof can be used. They should be well dissolved in the plating solution, and in manufacture, they can be dissolved in the plating solution or separately dissolved in water.

상기에서 설명된 도금액을 사용하여 Fe-X도금을 장시간 도금 조업을 행하여도 도금액에 노화되지 않으며, 슬러지도 방지되어 연속조업이 가능하다. 또한 양호한 도금층을 얻어 목적하는 선도금층을 얻고 이것으로 용융도금소지강판에 선도금하므로 인하여 Si, Mn, Al등이 포함됨 소지강판에 용융도금 (GI, GA등)을 행할시 양호한 도금층을 확보하는 도금조건을 제시한다. Even if the plating operation of Fe-X plating is performed for a long time using the above-described plating solution, the plating solution does not age and is prevented from sludge, thus allowing continuous operation. In addition, it obtains a good plating layer and obtains the desired lead metal layer, which leads to the hot-dip galvanized steel sheet. Therefore, Si, Mn, Al, etc. are included. When the hot-dip steel sheet is hot-dipped (GI, GA, etc.), the plating is secured. Present the conditions.

도금액의 산도는 (pH) 1.0~6.5가 양호하다. 1.0이하에서는 Fe석출량이 극히 미미하며, 도금이 어려우며 6.5 이상에서는 표면에 색상이 변화되고, 도금액의 장시간 사용시 불균일 도금이 된다. The acidity of the plating liquid is preferably (pH) 1.0 to 6.5. Below 1.0, the amount of Fe precipitates is extremely small, plating is difficult, and above 6.5, the color changes on the surface, and the plating becomes uneven when used for a long time.

도금액의 온도는 20oC에서 85oC 까지 가능하며 20도 이하에서는 도금층의 효율이 좋지 않고, 밀착성이 감소되며 85도 이상은 표면이 불균일하게 되고 X도금성분이 석출이 어렵다. The temperature of the plating liquid can be from 20oC to 85oC, the efficiency of the plating layer is not good at 20 degrees or less, the adhesion is reduced, and the surface is uneven and the X plating component is difficult to precipitate at more than 85 degrees.

전류밀도는 1 ~150ASD가 되도록 하여야 하며 1.0 ASD이하에서는 입자의 조대화가 일어나고 밀착성이 감소되고 효율도 감소되지만, 150ASD 이상에서는 X금속의 석출이 어렵고 에지에 도금층과 중앙의 도금 두께 차로 불균일 도금이 이루어진다. The current density should be between 1 and 150 ASD, but below 1.0 ASD, coarsening of particles occurs, adhesion is reduced, and efficiency is reduced, but above 150 ASD, deposition of X metal is difficult and uneven plating is caused by the difference in plating thickness at the edges. Is done.

이하 본 발명의 실시예를 통하여 보다 구체화 시킨다. Hereinafter, the embodiment of the present invention will be more specific.

소지 금속에 강도와 인장력을 부여하기 위하여 첨가되는 Si, A, Mn등 산화물로 인하여 용융도금이 원할치 못한 경우에 이들 산화물을 덮은 후 용융도금하는 형식으로 이러한 것을 앞에 설명된대로 이미 공지의 사실이나, 철계 도금액을 사용할 시 장시간 사용에 의하여 자연 현상으로 철 산화물이 발생하여 슬러지화 되어 연속 장시간 도금이 어렵고 설령 도금이 된다고 하여도 도금후 소둔공정에서 이들 산화물의 확산이동 및 표출로 선도금 피막과 소지금속간의 밀착성의 열세가 일어난다. When molten plating is undesired due to oxides such as Si, A, Mn, etc. added to give strength and tensile strength to the base metal, these oxides are covered and melt plated as described above. When iron-based plating solution is used, iron oxides are sludged due to natural phenomenon due to long-term use, which makes it difficult to continuously plate for long periods of time. Even if plating is performed, the lead gold coating and base metals are diffused due to diffusion movement and expression of these oxides in the annealing process after plating. Inferior adhesion of the liver occurs.

따라서 본 발명자들은 상기와 같은 결함을 해결하기 위하여 슬러지 발생 없이 연속 생산성이 가능한 Fe계 도금액을 발명하였고, 여기에 표면을 커버함으로 소둔시 용융도금을 어렵게 하는 문제를 해결하였고, X 무기물을 첨가하므로 인하여 소둔시 도금이 어려운 산화물 원소의 확산이동 및 표물을 막아 양호한 용융도금재를 생산하는 기술을 개발하였다. Therefore, the present inventors have invented a Fe-based plating solution capable of continuous productivity without sludge generation in order to solve the above defects, and solved the problem of making it difficult to melt plating during annealing by covering the surface, and because of the addition of X inorganic A technology was developed to produce a good molten plating material by preventing diffusion and migration of oxide elements that are difficult to plate during annealing.

본 발명에서는 실시예를 통하여 소지금속에 포함된 Si, Al, Mn등의 원소에 의하여 산화물이 발생되어 용융도금(합금화도금 포함)이 어려움을 극복하는 발명 예를 제시한다. In the present invention, an oxide is generated by elements such as Si, Al, Mn, etc. contained in the base metal through the embodiment to provide an example of the invention that the hot dip coating (including alloying plating) overcomes difficulties.

소지강판은 Si, Al, Mn 등 성분에서 1종 혹은 2종이상이 포함된 것으로 이들의 각각의 성분이 0.2중량% 이하에서는 소둔시 표면에 산화물의 양이 적어 발명의 효용성을 보기 힘들고 합이 0.5% 이상이 되는 경우를 선택하였고, 이들이 각각 7.0%이사에서는 현실적으로 소지강판 제조의 실용성이 감소하여 Si, Al, Mn의 합이 0.5%에서 7.0%이하를 선정하였다. 그러나 소지강판의 실시예가 이들을 선정하여도 이들의 합이 낮거나 높아도 본 발명이 적용 가능하다. The base steel sheet contains one kind or two or more kinds of components such as Si, Al, and Mn, and when each component is 0.2 wt% or less, the amount of oxide is small on the surface during annealing, so it is difficult to see the utility of the invention and the sum is 0.5. The cases of more than% were selected, and in these cases, the practicality of fabrication of the steel sheet was decreased in each of the 7.0% directors, so the sum of Si, Al, and Mn was selected from 0.5% to 7.0%. However, even if the embodiment of the steel sheet selected them, the present invention is applicable even if the sum is low or high.

탄소 C의 합량은 0.3중량%이하가 양호하며, 그 외 강의 다른 품질 즉 강도, 연성, 인성, 굽힘강도, 구멍확장성등을 목적으로 P, S, N, B, V, Cr, Co, Ni, Cu, Mo, Sb, Ti, Nb, 등을 포함하여 불가피하게 들어갈 수 밖에 없는 불순물이 포함된 강판이면 된다. 상기에 준비된 강을 열연, 냉연후 소둔하고, 냉각하고 압연한 강판에 탈지공정을 거쳐서 Fe-X 선도금을 행한다. The total amount of carbon C is 0.3% by weight or less, and P, S, N, B, V, Cr, Co, and Ni are used for the purpose of other qualities of steel, that is, strength, ductility, toughness, bending strength, and hole expandability. What is necessary is just the steel plate containing the impurity which must inevitably enter, including Cu, Mo, Sb, Ti, Nb, etc. The steel prepared above is hot-rolled, cold-rolled and annealed, and subjected to Fe-X lead gold through a degreasing process to the cooled and rolled steel sheet.

선도금층을 형성하는 용액으로서는 Fe-X 도금액을 사용하였다. 이때 도금량은 0.1g/m2 ~5g/m2으로 한정하였는데 비용 문제만 없으면 이상도 가능하다. 그러나 0.1g/m2 이하에서는 효과가 약하다Fe-X plating liquid was used as a solution which forms a lead gold layer. At this time, the plating amount was limited to 0.1 g / m 2 to 5 g / m 2, but it is possible to have an abnormality without cost problems. However, the effect is less than 0.1g / m2 or less

-실시예 1Example 1

두께가 1.2mm가되고 Si 1.8중량%, Al 0.3중량%, Mn 2.0중량%가 포함된 트립강을 소지강판으로 사용하여, 탈지 공정을 거쳐 표 1에 나타낸 도금 조건을 사용하여 도금을 행하였다. A strip steel having a thickness of 1.2 mm and containing 1.8% by weight of Si, 0.3% by weight of Al, and 2.0% by weight of Mn was used as the base steel sheet, and plating was performed using the plating conditions shown in Table 1 through a degreasing step.

도금액은 Fe는 황산계 철을 사용하였으며, 여기에 텅스텐산 나트륨을 첨가하여 Fe-X선 도금층을 형성하였다. 전도성을 향상시키기위하여 황산암모늄을 사용하였으며, 이온의 산화 방지와 장수명성을 위하여 아미노 아세트산을, 응력감소를 위하여 사카린을, 이온간 전위차 개선을 위하여 에틸렌글리콜을, 이온의 소지금속 확산을 위하여 글루콘산을 사용하였다. As the plating solution, Fe used iron sulfate-based iron, and sodium tungstate was added thereto to form a Fe-X-ray plating layer. Ammonium sulphate was used to improve conductivity, amino acetic acid for oxidization prevention and long life, saccharin for stress reduction, ethylene glycol to improve potential difference between ions, and gluconic acid for diffusion of base metals. Was used.

선도금된 강판을 이용하여 일반적으로 행해지는 용융도금을 행하였다. 즉 선도금된 강판을 수세 건조를 거쳐 760oC 까지 승온후 도금욕 온도까지 냉각하여 용융도금을 하고 부착량을 조절하여 편면 50g/m2이 되게 하였다. The hot-dip steel plate was generally used to perform hot dip plating. That is, the leaded steel sheet was heated to 760oC after washing with water and cooled to the plating bath temperature to be hot-dipped to adjust the deposition amount to 50g / m2.

표1에서는 이들의 선도금의 전기도금 조건을 나타내었다. 소지강판의 도금량은 도금 시간과 투입전류로서 조절하였다. 도금량은 동일조건으로 Cu판을 이용하여 ICP( Inductive Coupled Plasma)로 분석하였다. 용융도금된 판을 내각이 30도되게 V굴곡을 절곡하여 테이프 테스트로의 박리상태로 밀착성을 판정했다.Table 1 shows the electroplating conditions of these lead metals. The plating amount of the steel sheet was controlled by the plating time and the input current. Plating amount was analyzed by ICP (Inductive Coupled Plasma) using a Cu plate under the same conditions. The melt-plated plate was bent at V angle so that the cabinet angle was 30 degrees, and the adhesiveness was determined in the peeling state by the tape test.

박리 없는 경우를 우수로 하였고, 박리가 나타난 경우 불량으로 하였다. 또한 육안 판정으로 표면에 미도금이 1점이라도 발견되면 불량으로 그렇지 않을 경우 양호로 판정하였다. The case where there was no peeling was made excellent, and when peeling appeared, it was made defective. In addition, when even one unplated surface was found by visual inspection, it was judged to be defective and to be satisfactory.

하기 에서의 선도금은 언급이 없을 시 Fe 농도 100g/L, Fe 100에 대비 X물질은 0.5g/L, 산화방지제 10 g/L 응력감소제 5g/L, 전위차 개선제 3g/L, 도금착화제 10g/L, 전도보조제 50g/L을 녹여서 도금하였다.The lead in the following is not mentioned, the concentration of Fe 100g / L, compared with Fe 100 X material 0.5g / L, antioxidant 10 g / L stress reducing agent 5g / L, potentiometric improver 3g / L, plating complexing agent 10g / L, 50g / L of the conduction aid were melted and plated.

또한 선도금 조건은 전류밀도 60ASD, pH 3.0, 도금욕 온도 60oC, 도금량 2g/m2 의 조건으로 도금되었다. In addition, the lead gold was plated under the conditions of current density 60ASD, pH 3.0, plating bath temperature 60oC, and plating amount 2g / m2.

표 1 선도금 조건에 따른 품질영향 Table 1 Quality Impact by Leading Payment Terms

Figure 112019042488808-pat00001
Figure 112019042488808-pat00001

상기 표1에서 본 발명의 범위에서는 모두 양호한 결과를 나타내었다. In Table 1, all of the results of the present invention showed good results.

-실시예 2Example 2

아래 표 2는 산화방지제, 응력감소제, 전위차개선제, 도금착화제등에 대한 실시예를 나타낸 것이다. 도금액의 슬러지는 탁도로서 평가하였다. 연속도금 48시간후 나타난 탁도로서 초기 탁도 대비 탁도 증가 20NTU 이상을 불량, 그 아래를 양호로 나타내었다. . Table 2 below shows examples for antioxidants, stress reducers, potentiometers, plating complexing agents, and the like. The sludge of the plating liquid was evaluated as turbidity. The turbidity appeared after 48 hours of continuous plating. The turbidity increase over the initial turbidity was 20 NTU or more, and the lower was good. .

표 2 선도금 첨가제에 따른 품질영향 Table 2 Quality Impact by Leading Additives

Figure 112019042488808-pat00002
Figure 112019042488808-pat00002

상기 표에서 나타낸 바와 같이 발명 범위에서는 양호한 품질을 나타내었다. As shown in the above table, the invention showed good quality.

Claims (12)

Fe 이온의 농도가 3~300g/l인 산성도금용액 중에 Fe 이온의 농도 100g에 대하여,
텅스텐 및/또는 티타늄 금속이온: 0.01~5g, 산화방지제: 0.1~100g, Fe 응력감소제: 0.1~30g, 전위차 방지제: 0.5~30g, 착화제: 0.1~100g을 첨가하되,
상기 텅스텐 및/또는 티타늄 금속이온은 염상태로 텅스텐나트륨 및/또는 타슘티타늄옥살레이트나가 첨가되는 것을 특징으로 하는 용융아연도금강판 제조시 전처리 단계로서 행하여지는 하지전기도금용으로 사용하기 위한 Fe-X 플래쉬 도금용액
Regarding the concentration of Fe ions in 100 g of acid plating solution having a concentration of Fe ions of 3 to 300 g / l,
Tungsten and / or titanium metal ions: 0.01 to 5 g, antioxidant: 0.1 to 100 g, Fe stress reducer: 0.1 to 30 g, potentiometer: 0.5 to 30 g, complexing agent: 0.1 to 100 g,
The tungsten and / or titanium metal ions are Fe-X flash for use as a base electroplating performed as a pretreatment step in the production of hot-dip galvanized steel sheet, characterized in that tungsten sodium and / or potassium titanium oxalate is added in salt state . Plating solution
제1항에 있어서,
상기 Fe는 염상태로 황산제일철, 염화제일철, 붕불화제일철, 설폰제일철 중에서 선택된 하나로부터 첨가되는 것을 특징으로 하는 용융아연도금강판 제조시 전처리 단계로서 행하여지는 하지전기도금용으로 사용하기 위한 Fe플래쉬도금용액
The method of claim 1,
The Fe flash plating solution for use as a base electroplating is performed as a pretreatment step in the production of hot-dip galvanized steel sheet, characterized in that the Fe is added from a salt selected from ferrous sulfate, ferrous chloride, ferrous boride, and sulfone ferrous .
삭제delete 제1항에 있어서,
상기 산화방지제는 안식향산, 에틸렌 디아민 + 구연산 계 유기물, 아미노아세트산, 벤젤설포네이트, 4-옥소-펜탄산, 아스코로빈산 중 어느 하나로부터 첨가되는 것을 특징으로 하는 용융아연도금강판 제조시 전처리 단계로서 행하여지는 하지전기도금용으로 사용하기 위한 Fe-X 프래쉬도금용액
The method of claim 1,
The antioxidant is carried out as a pretreatment step in the preparation of hot-dip galvanized steel sheet, characterized in that it is added from any one of benzoic acid, ethylene diamine + citric acid-based organics, amino acetic acid, bezelsulfonate, 4-oxo-pentanoic acid, ascorbic acid. that no Fe-X peuraeswi plating solution for electroplating using the electroplating
제1항에 있어서,
상기 응력감소제는 사카린, 트리데실옥시 폴리(에틸렌옥시)에탄올(3), 디이소데실프탈레이트 N-(3-히드록시부틸레멘-P-설파닐산, 폴리알킬렌 폴리아민, 말론산 중 어느 하나로부터 첨가되는 것을 특징으로 하는 용융아연도금강판 제조시 전처리 단계로서 행하여지는 하지전기도금용으로 사용하기 위한 Fe-X 프래쉬도금용액
The method of claim 1,
The stress reducing agent is any one of saccharin, tridecyloxy poly (ethyleneoxy) ethanol (3), diisodecyl phthalate N- (3-hydroxybutyllemen-P-sulfanic acid, polyalkylene polyamine, malonic acid Fe-X flash plating solution for use in base electroplating performed as a pretreatment step in the manufacture of hot-dip galvanized steel sheets characterized in that it is added from
제1항에 있어서,
상기 전위차 개선제는 에틸렌 글리콜, 폴리에틸렌글리콜, 폴리아민, 에틸렌 디아민, 2-뷰텐-1, 4-디올 중의 적어도 어느 하나로부터 첨가되는 것을 특징으로하는 용융아연도금강판 제조시 전처리 단계로서 행하여지는 하지전기도금용으로 사용하기 위한 Fe-X 프래쉬도금용
The method of claim 1,
The potentiometric improving agent for the base electroplating is performed as a pretreatment step in the production of hot dip galvanized steel sheet, characterized in that it is added from at least one of ethylene glycol, polyethylene glycol, polyamine, ethylene diamine, 2-butene-1, 4-diol . For Fe-X flash plating
제1항에 있어서,
상기 도금이온 착화제는 에칠렌, 아미노아세트산, 벤젠설포네이트, 글루콘산,,4-옥소-펜탄산 중의 적어도 어느 하나로부터 첨가되는 것을 특징으로 하는 용융아연도금강판 제조시 전처리 단계로서 행하여지는 하지전기도금용으로 사용하기 위한 Fe-X 프래쉬도금용액
The method of claim 1,
The plating ion complexing agent is an electroless base metal which is performed as a pretreatment step in the production of hot-dip galvanized steel sheet , which is added from at least one of ethylene, aminoacetic acid, benzenesulfonate, gluconic acid, and 4-oxo-pentanoic acid. Fe-X peuraeswi plating solution for use in plating
중량%로 Si: 0.2~6.0%, Mn: 0.2~7%, Al: 0.2~7.0% 이 1종 이상 함유된 소지강판을 준비하는 단계,
상기 소지강판 위에 Fe와 W 및/또는 Ti 금속이 석출된 Fe-X 금속도금층을 형성시키기 위하여 청구항1의 성분조성으로 된 Fe-X 플래쉬 도금용액에서 온도: 20~85℃, PH: 1.0~6.5, 전류밀도: 1~150ASD의 조건으로 도금량이 0.1~5g/㎡ 가 되도록 전기도금하는 단계,
상기 Fe-X가 석출된 전기도금된 강판을 용융아연도금하는 단계로 구성되는 것을 특징으로 하는 용융아연도금강판의 제조방법
Preparing a steel sheet containing at least one of Si: 0.2 to 6.0%, Mn: 0.2 to 7%, and Al: 0.2 to 7.0% by weight,
Temperature: 20 ~ 85 ℃, PH: 1.0 ~ 6.5 in Fe-X flash plating solution of the composition of claim 1 to form a Fe-X metal plating layer in which Fe and W and / or Ti metal precipitated on the base steel sheet , Electroplating at a current density of 1 to 150 ASD so that the plating amount is 0.1 to 5 g / m 2,
Method for producing a hot-dip galvanized steel sheet comprising the step of hot-dip galvanizing the electroplated steel sheet precipitated Fe-X
삭제delete 삭제delete 중량%로 Si: 0.2~6.0%, Mn: 0.2~7%, Al: 0.2~7.0% 이 1종이상 함유된 소지강판 위에 Fe와 W 및/또는 Ti 금속이 석출된 Fe-X 금속도금층이 0.1~5.0g/㎡ 형성되고, 상기 Fe-X 금속도금층 위에 아연 또는 아연합금의 용융도금층이 형성되어 있는 것을 특징으로 하는 용융아연도금강판
In weight% Si: 0.2 ~ 6.0%, Mn: 0.2 ~ 7%, Al: 0.2 ~ 7.0% one species possessing plate on Fe with W and / or Ti metal is an Fe-X metal plating layer is 0.1 to precipitate containing at least ~ 5.0 g / m 2 is formed, the hot-dip galvanized steel sheet characterized in that the hot-dip galvanized layer of zinc or zinc alloy is formed on the Fe-X metal plating layer
삭제delete
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4261316A4 (en) * 2020-12-13 2024-06-05 POSCO Co., Ltd High-strength hot-dip galvanized steel sheet having excellent plating quality, steel sheet for plating, and methods for manufacturing same
EP4261317A4 (en) * 2020-12-13 2024-06-26 POSCO Co., Ltd High-strength hot-dip galvanized steel sheet with excellent plating quality, steel sheet for plating, and manufacturing methods therefor

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JPH0849091A (en) * 1994-08-03 1996-02-20 Sumitomo Metal Ind Ltd Production of electrogalvanized steel sheet
KR100976787B1 (en) * 2008-04-25 2010-08-18 남동화학(주) Zinc plated steel having iron flash plating film thereon and composition of bath of iron flash plating and method for manufacturing the zinc plated steel
KR20130076589A (en) * 2011-12-28 2013-07-08 주식회사 포스코 High strength galvanized steel sheet having excellent surface property and coating adhesion method for manufacturing the same

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0849091A (en) * 1994-08-03 1996-02-20 Sumitomo Metal Ind Ltd Production of electrogalvanized steel sheet
KR100976787B1 (en) * 2008-04-25 2010-08-18 남동화학(주) Zinc plated steel having iron flash plating film thereon and composition of bath of iron flash plating and method for manufacturing the zinc plated steel
KR20130076589A (en) * 2011-12-28 2013-07-08 주식회사 포스코 High strength galvanized steel sheet having excellent surface property and coating adhesion method for manufacturing the same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4261316A4 (en) * 2020-12-13 2024-06-05 POSCO Co., Ltd High-strength hot-dip galvanized steel sheet having excellent plating quality, steel sheet for plating, and methods for manufacturing same
EP4261317A4 (en) * 2020-12-13 2024-06-26 POSCO Co., Ltd High-strength hot-dip galvanized steel sheet with excellent plating quality, steel sheet for plating, and manufacturing methods therefor

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