KR100788295B1 - Abrasive backing and abrasive cloth - Google Patents

Abstract

An abrasive backing and an abrasive cloth are provided to adjust the elongation rate in a weft direction by reducing the number of intersection points between an upper layer and a lower layer of the abrasive backing. An abrasive backing consists of an upper layer and a lower layer in which the warp of the upper layer has a thickness identical with that of the warp of the lower layer and the weft of the upper layer has a thickness different from that of the weft of the lower layer. The abrasive backing is manufactured by a step of arranging the warp of the upper layer and warp of the lower layer alternately with each other, a step of simultaneously fabricating the upper layer and the lower layer, and a step of connecting the upper layer and the lower layer while advancing a binding yarn in a warp or weft direction of the abrasive backing such that intersection points between the upper layer and the lower layer are not overlapped with each other.

Description

Abrasive backing and abrasive cloth

1 is a dual structure of an abrasive substrate according to an embodiment of the present invention,

2 is a cross-sectional view of an abrasive substrate according to an embodiment of the present invention;

3 is a flow chart of a method of manufacturing an abrasive cloth according to an embodiment of the present invention.

Figure 4 is a photograph of the abrasive substrate prepared in Example 1 of the present invention,

FIG. 5 is a 60 times enlarged SEM photograph of the upper tissue layer of the abrasive substrate of FIG. 4,

FIG. 6 is a 60 times enlarged SEM photograph of the lower tissue layer of the abrasive substrate of FIG. 4.

<Explanation of symbols for the main parts of the drawings>

11, 13, 15, 17, 19: Slope of 1/4 twill of lower tissue layer

12, 14, 16, 18, 20: inclination of 1/4 twill of upper tissue layer

a, c, e, g, i: 1/4 twill weft of lower tissue layer

b, d, f, h, j: weft of 1/4 twill of upper tissue layer

70: stitching yarn

The present invention relates to an abrasive substrate and an abrasive cloth, and more particularly, to an abrasive substrate having excellent high tensile and low elongation smoothness and an abrasive cloth comprising the same.

Abrasive cloth is a cloth or paper coated with abrasive material to remove or polish metal products. Generally, abrasive products are classified into substrates, adhesives, abrasives, and the like. If the substrate is a fabric, it is divided into cotton, chemical fibers, blended fibers, nonwoven fabrics, and metal fibers depending on its composition. Is used suitably alone or in combination of one or more components.

In the case of the abrasive cloth belt, the abrasive substrate should be woven to have an uneven surface on which the abrasive can be attached well according to the particle size of the abrasive in consideration of the adhesive force and the uniformity (smoothness). Conventionally, the abrasive base material was woven by selecting the thickness of the yarn suitable for the particle size of the abrasive. However, in this case, when the thickness of the thread is determined, the front and rear surfaces of the abrasive substrate have the same thickness, so there is no difference in irregularities, and thus there is a problem that it is difficult to apply the abrasive with different particle diameters. Accordingly, in order to use various polishing states, we have to adjust the thickness of the yarn to separately weave different abrasive materials, which increases the burden burden and increases the adhesion between the abrasive materials even when double-bonding different abrasive materials is used. The problem arises that it is not good. This results in a decrease in polishing efficiency.

Therefore, there is a demand for a method of improving the grinding force by improving the basic physical properties and adhesion of the polishing cloth and reducing the inventory burden.

On the other hand, most of the fabric base material used as the abrasive cloth base material is woven so as to have a higher density of warp than the weft forming the fabric base in order to satisfy the properties such as elongation, tensile strength, adhesion, smoothness, uniformity, etc. required as the abrasive cloth In recent years, such a polishing cloth is continuously required to have a width of more than 2000mm in order to automate, enlarge, and increase productivity of the production equipment in the workpiece processing step.

Conventionally, no processing has been performed to secure low elongation and high tensile strength in the weft direction of abrasive materials, but recently, in order to manufacture ultra-wide abrasive belts such as wide belts for engraving joints, abrasive materials having high tensile strength and low elongation in weft directions are manufactured. And polishing cloth.

The present invention is to solve the above-mentioned problems of the prior art, an object of the present invention to provide a double-structured abrasive substrate that can improve the basic physical properties and adhesion while having a high tensile strength, low elongation in the weft direction.

Another object of the present invention is to provide an abrasive cloth comprising the abrasive substrate.

In one aspect of the invention,

An abrasive substrate comprising an upper tissue layer and a lower tissue layer composed of warp yarns and weft yarns, and stitching yarns connecting the upper tissue layer and the lower tissue layers, wherein the abrasive material is a yarn having a different thickness from the weft yarns of the upper tissue layer and the weft yarns of the lower tissue layer. It provides an abrasive substrate, characterized in that weaving using.

Here, the upper tissue layer and the lower tissue layer may each independently be woven with a yarn selected from cotton, wool, silk, hemp, synthetic fibers and blended yarns thereof, and in the case of hemp among natural fibers, it is more preferable to use jute. According to a preferred embodiment, the upper tissue layer is made of cotton, the lower tissue layer may be made of polyester.

In addition, at least one of the warp and weft yarns constituting the upper tissue layer and the lower tissue layer may be woven including MVS yarn (S).

The upper tissue layer and the lower tissue layer are each independently woven into a tissue selected from plain weave, twill, runner and change tissues thereof, and the upper and lower tissue layers may be woven into the same or different tissues.

In addition, the polishing substrate is a step of arranging the inclination of the upper tissue layer and the inclination of the lower tissue layer; The heald of the lower tissue layer is fixed when weft weaving the upper tissue layer, and the heald of the upper tissue layer is fixed when weft alternately weaving the lower tissue layer, such that the upper tissue layer and the lower tissue layer are woven simultaneously; And wherein the stitching yarn connects the upper tissue layer and the lower tissue layer without disturbing the organization of the upper tissue layer and the lower tissue layer, such that the intersection of the upper tissue layer and the lower tissue layer is not overlapped by the stitching yarn. The stitching yarn may be manufactured by a weaving method including; connecting the upper and lower tissue layers while advancing in the warp direction or the weft direction of the abrasive substrate.

In another aspect of the invention, the abrasive substrate described above; An abrasive applied to the abrasive substrate; And an adhesive for adhering the abrasive substrate and the abrasive to each other.

Wherein the abrasive can penetrate inside each of the upper and lower tissue layers and between the upper and lower tissue layers.

Hereinafter, preferred embodiments of the abrasive substrate and the polishing cloth according to the present invention will be described in detail with reference to the accompanying drawings, in the following description with reference to the accompanying drawings, the same or corresponding components are given the same reference numerals and Duplicate explanations will be omitted.

The abrasive substrate according to the present invention includes an upper tissue layer and a lower tissue layer composed of warp and weft yarns, and stitching yarns connecting the upper and lower tissue layers, and the weft yarns of the upper tissue layer and the weft yarns of the lower tissue layers have different thicknesses from each other. It consists of a dual tissue woven using.

In the present invention, 'double tissue' refers to the completion of one abrasive substrate by combining two tissue layers. Here, two tissue layers forming the upper tissue layer and the lower tissue layer may be woven into the same tissue or may be woven into different tissues.

These two organizational layers are connected by stitching yarns. The location of stitching yarns is very important. The location of stitching yarns between the upper and lower tissue layers should be such that they do not interfere with the organization of each tissue layer. This stitching yarn can connect the upper and lower tissue layers while advancing in the warp direction or the weft direction of the abrasive substrate. Care should be taken to ensure that the stitching yarns do not overlap the intersection of the upper and lower tissue layers. The double tissue connected by stitching yarns can secure a lot of space between the upper tissue layer and the lower tissue layer, and can easily penetrate the adhesive to improve adhesion between the two tissue layers.

In addition, the abrasive substrate according to the present invention is woven using a weft yarn of the upper tissue layer and a weft yarn of the lower tissue layer are different in thickness from each other. In the case of weaving the double tissue using stitching yarns of the same material and the same thickness, the upper tissue layer and the lower tissue layer can be used without any distinction between front and back, but it is not possible to implement various polishing states with one abrasive. However, in the case of weaving with different materials and thicknesses of the weft yarns in the upper tissue layer and the lower tissue layer as in the present invention, an abrasive having a small particle size and a thick particle can be adhered to both sides of the abrasive substrate as one abrasive cloth. Two polishing cloths can be implemented.

When weaving the weft of the upper tissue layer and the weft of the lower tissue layer in this way using a yarn having a different thickness, the upper tissue layer and the lower tissue layer may have uneven surfaces having different levels of fineness, and each may apply an abrasive having a different particle size. It becomes possible. By applying different size abrasives on the upper tissue layer surface and the lower tissue layer surface by using one abrasive material, it is possible to replace the conventional two abrasive cloths with one abrasive cloth to perform the same function, thereby maximizing the polishing efficiency twice. Inventory burden can be reduced.

In the abrasive substrate of the present invention, the kind of yarn constituting the upper fabric layer or the lower fabric layer of the dual structure is not limited. The yarn is not limited to the type of fibers constituting the yarn such as cotton, wool, silk, hemp, synthetic fibers or synthetic yarns, blended yarns, and blended yarns of these and synthetic fibers, and it is more preferable to use jute in natural fibers. . According to a preferred embodiment, the upper tissue layer can be woven into cotton and the lower tissue layer can be woven from polyester. In addition, a thread of the same or different color may be used as the yarn constituting the upper tissue layer and the yarn constituting the lower tissue layer. Preferably, the yarn constituting the upper tissue layer and the yarn constituting the lower tissue layer use the same thing.

In addition, the type of yarn constituting the dual structure is not limited by spinning techniques such as yarn, filament yarn, split yarn.

According to a preferred embodiment of the present invention, it is more preferable that the warp and weft yarns constituting the upper tissue layer and the lower tissue layer are woven including at least one of MVS (Murata Vortex Spinning) yarns. MVS yarns have a different spinning principle from polyester yarns and MJS yarns, and the state of the seed fiber itself is precisely warped so that the yarn physical properties are different from those of other yarns such as polyester yarns, ring yarns, MJS yarns, etc. However, when used as a general fabric, the difference in physical properties is not greatly expressed. However, the production of abrasive substrates and abrasive cloths by MVS company is superior to conventional polyester spinning yarns or MJS companies in terms of uniformity and adhesion, and can greatly improve the polishing efficiency compared to conventional abrasive materials in removing or polishing metal products. There is a number.

According to one embodiment of the present invention, a double-stranded abrasive substrate may be manufactured by incorporating MVS yarn and MVS yarn or yarns such as MVS yarn, for example, ring yarn, OE yarn, and MJS yarn.

On the other hand, in the structure of the abrasive substrate of the present invention, the upper tissue layer and the lower tissue layer may be independently woven into a tissue selected from plain weave, twill weave, runner weave and their changing tissue, wherein the upper tissue layer and the lower tissue layer are It may be woven into the same organization or may be woven into different organizations.

Plain weave, twill, and runner are three-way organization of weaving weaving. Plain weave is the simplest structure of weaving, where the warp and weft are interwoven alternately one by one, going up once, and then going down. Plain weave is usually labeled 1/1, and the strength of the woven fabric is determined by the thickness of the yarn and the density of the weave.

Twill, also known as serpentine, is an organization in which wefts and warp yarns interweave two or more rows in succession. These twills are soft and soft with less tissue points than plain weave, and are represented as 1/2, 1/3, 1/4, and the like.

Runner's position is also known as vertical, and it is a tissue that has a slope intersecting over four wefts and weaves one of the slopes or wefts on the surface of the fabric. Fabrics woven in runners have less bends due to the lack of warp and weft threads and are marked with 1/4 satin.

In addition, there is a transformation organization of plain weave, twill weave, and a change organization of ridge twill, wave twill, and vertical weave. There is this.

Such a double substrate abrasive substrate,

Arranging the inclination of the upper tissue layer and the inclination of the lower tissue layer at an intersection;

The heald of the lower tissue layer is fixed when weft weaving the upper tissue layer, and the heald of the upper tissue layer is fixed when weft alternately weaving the lower tissue layer, such that the upper tissue layer and the lower tissue layer are woven simultaneously; And

In the stitching yarn connecting the upper tissue layer and the lower tissue layer without disturbing the organization of the upper tissue layer and the lower tissue layer, the stitching yarn prevents the intersection of the upper tissue layer and the lower tissue layer from overlapping each other. The binder may be manufactured by a manufacturing method including a; connecting the upper tissue layer and the lower tissue layer while advancing in the warp direction or the weft direction of the abrasive substrate.

As an embodiment of the present invention, a case where the upper tissue layer and the lower tissue layer are woven in quarter twill will be described in detail.

1 is a dual structure showing an abrasive substrate according to an embodiment of the present invention. In this embodiment, both the upper and lower tissue layers of the abrasive substrate are woven in quarter twill. Here, the upper tissue layer is a portion consisting of the warp (12, 14, 16, 18, 20) and the weft (b, d, f, h, j), the lower tissue layer is the warp (11, 13, 15, 17, 19) ) And weft (a, c, e, g, i).

Looking at this double tissue, the upper tissue layer and the lower tissue layer, respectively, the weaving of the slanted cross intersect the weft four ol to form a twill, they can be seen that they are separated from each other weaving. In addition, the weft yarn once constitutes the upper tissue layer, and once the lower tissue layer, the upper twill layer and the lower twill layer are woven simultaneously.

That is, the inclination constituting the upper tissue layer and the inclination constituting the lower tissue layer are arranged to cross each other, the weft thread intersects the inclination constituting the upper tissue layer, and the other, the inclination constituting the lower tissue layer, the upper tissue layer It is possible to obtain a double substrate abrasive substrate which can be woven separately from each other and the lower tissue layer, but can be woven at the same time.

Here, when weaving the upper tissue layer, the healds of the inclinations 11, 13, 15, 17, and 19 of the lower tissue layer are fixed and prevented from moving so that the lower tissue layer is not woven. In addition, when weaving the lower tissue layer, the healds of the inclinations 12, 14, 16, 18, and 20 of the upper tissue layer are fixed and prevented from moving so that the upper tissue layer is not woven.

However, it is important that wefts constituting the upper tissue layer and wefts constituting the lower tissue layer are woven with different uneven surface by using threads of different thicknesses, and the weft measuring machine (acromemeter) or feeder (feeder) of the weaving machine is used. The upper tissue layer and the lower tissue layer can be weaved by using four or four weft yarns of different thicknesses, respectively.

Figure 2 shows a cross-sectional view of the abrasive substrate according to an embodiment of the present invention shown in FIG. FIG. 2 is based on the AA ′ cutting plane in FIG. 1.

As shown, the upper and lower tissue layers are each woven in quarter twill, which are separated from each other to form an abrasive substrate. It is the stitching yarn 70 which connects these two layers. Here, the stitching yarn 70 proceeds in the weft direction a portion where a specific slope 12 of the upper tissue layer intersects a specific weft (d) and a portion where a specific slope 15 of the lower tissue layer intersects a specific weft (e). While connecting the upper tissue layer and the lower tissue layer.

The portion 12-d where the specific warp yarn 12 and the specific weft yarn d intersect the upper tissue layer is organized even if the weft yarn d intersects the warp yarn 12 to enter the stitching yarn 70. The portions 15 and e where the specific warp yarn 15 and the specific weft yarn e intersect the lower tissue layer do not interfere even if the weft yarn e intersects under the warp yarn 15 and enters the stitching yarn 70. Does not interfere with organization of the organizational layer.

The type of yarn constituting stitching yarn 70 is not limited. The yarn is not limited to the types of fibers constituting the yarn, such as cotton, wool, silk, hemp, synthetic fibers or synthetic yarns, blended yarns, and blended yarns of these and synthetic fibers, and are spun yarn, filament yarn, and split yarn. It is not restricted in the spinning method.

In addition, the stitching yarn 70 may use a thread of the same type or color as the weft yarn constituting the upper fabric layer or the lower fabric layer, or may use a different yarn. Preferably, it is preferable to use a yarn of the same material as the weft yarn constituting the upper fabric layer or the lower fabric layer.

Since the abrasive substrate of the double tissue woven in this way has different thicknesses of threads forming the weft of the upper tissue layer and the lower tissue layer, the uneven surfaces of the two tissue layers are different, and abrasive grains of different particle sizes can be applied to the surfaces of the two tissue layers. Since the thickness of the abrasive applied to the tissue layer forming both sides of the abrasive substrate is different, it can perform the function of the conventional two abrasive cloth as one abrasive cloth, it is possible to maximize the polishing efficiency.

In addition, double-strand polishing substrates using stitching yarns can improve the density of the weft yarn by 50-60% or more compared to single-ply polishing substrates of the same structure, greatly improving basic physical properties, and securing space between the upper and lower tissue layers. It is easy to penetrate the abrasive, adhesives, etc., and can improve the adhesive force.

Furthermore, since the intersection of each of the upper tissue layer and the lower tissue layer is less than that of the general fabric, it is easy to expand not only in the warp but also in the weft direction during the processing of the abrasive substrate, so that the expansion rate in the weft direction can be adjusted. Nevertheless, it may have the same or more tensile force.

Next, a polishing cloth according to another aspect of the present invention will be described.

The abrasive cloth according to the present invention includes an abrasive substrate, an abrasive and an adhesive.

As the abrasive substrate used for the polishing cloth, the abrasive substrate of the dual structure according to the present invention described above is used. In order to manufacture the weft direction wide belt, the abrasive substrate constituting the polishing cloth is required to have a low elongation in the weft direction, so the expansion and heat setting of the abrasive substrate is necessary. If the elongation in the weft direction coinciding with the rotation direction of the polishing belt is not lower than 3 to 7%, the polishing belt may be stretched or broken by frictional heat and tension generated during the use of the polishing belt.

The abrasive substrate of the present invention is easy to expand in the weft direction because of less cross point. Therefore, in the tenter, the abrasive substrate of the double structure is expanded to 1 to 7% only in the weft direction without applying tension in the inclined direction, and then heat fixed at 180 to 250 ° C. for 1 to 3 minutes. Through this heat setting step, an abrasive substrate having a fixed elongation in the weft direction can be obtained.

Examples of the abrasive causing the grinding action include aluminum oxide (Al ₂ O ₃ ), silicon carbide (Sic), zirconia alumina (Al ₂ O _3- Zr ₂ O ₃ ), ceramic aluminum oxide, silica, and garnet , Emery, crocus and the like can be used. In addition, the filler may further include a filler. In general, fillers are used to supplement hard physical properties of the adhesive, such as hard coal, clay, and diatomaceous earth. Wherein the abrasive can penetrate inside each of the upper and lower tissue layers and between the upper and lower tissue layers.

As the adhesive for bonding the abrasive substrate and the abrasive, thermosetting or thermoplastic synthetic resin adhesive or glue may be used.

Figure 3 is a flow chart of a method for producing a polishing cloth according to an embodiment of the present invention. Referring to FIG. 3, in step S100, as described above, the polishing substrate of the dual structure is woven. Step S110 is a step of expanding and heat setting the abrasive substrate. In the present invention, the abrasive substrate of the dual structure is expanded in the weft direction in the tenter and then thermally fixed. Step S120 is a step of penetrating the abrasive into the abrasive substrate and fixing and bonding the abrasive to the abrasive substrate with an adhesive. As a method of applying such an abrasive, a gravity coating method or an electrodeposition coating method can be used. Step S130 is a size coating step for firmly fixing the abrasive on the abrasive substrate, and step S140 is a curing step of applying heat to the thus treated abrasive cloth. Step S150 is a humidification step, step S160 is a softening step, and if necessary, may be subjected to step S170 (MCM step) after the size coating operation (size coating) so as not to adhere to the abrasive dust during polishing. Next, when the polishing cloth is processed in step S180, the polishing cloth is completed.

Hereinafter, the present invention will be exemplified by the following examples, but the protection scope of the present invention is not limited only to the following examples.

<Example 1>

Ring spun yarn No. 20 spun yarn (PERING20S / 2) of polyester fiber is inclined, and single spun yarn (PERING30S / 1) of spun yarn of polyester fiber is used as the weft of the upper tissue layer, and OE yarn No. 10 single yarn of polyester fiber ( PEOE10S / 1) was used as the weft of the lower tissue layer, and a weft measuring device (also referred to as an acromometer or a feeder) was used to woven a double-stranded abrasive substrate in which both the upper and lower tissue layers were woven into plain weave.

The abrasive substrate of the double tissue woven in Example 1 is shown in FIG. 4, and SEM photographs of the upper tissue layer and the lower tissue layer enlarged by 60 times are shown in FIGS. 5 and 6, respectively.

4 to 6, it can be seen that the abrasive substrate having a double structure according to the present invention is different from the weft of the upper and lower tissue layers. Therefore, according to the present invention, since the irregularities of the upper and lower tissue layers are different from each other, it can be seen that the two abrasive cloth functions can be performed as one abrasive cloth by having different surfaces by applying different abrasives.

<Example 2>

The number of ring spun yarn of polyester fiber 20th yarn (PERING20S / 2) is inclined, the number of ring spun yarn of polyester fiber 30 (PERING30S / 1) is used as the weft of the upper tissue layer, and the OE yarn number 10 single yarn of polyester fiber ( PEOE10S / 1) was used as the weft of the lower tissue layer, and the weaving substrate was woven into a double twill of 1/4 twill by using a weft measuring device (also referred to as an acromometer or a feeder).

The density, warp tension, weft tension, elongation, and smoothness of the abrasive substrate woven in Example 2 were investigated, and are shown in Table 1 below.

Comparative Example

The abrasive substrate was woven into a single twill of 1/4 twill using a ring spun yarn of polyester fiber 20th yarn (PERING20S / 2) and a polyester fiber OE yarn 10th single yarn (PEOE10S / 1). Physical properties of the woven abrasive substrate were measured in the same manner as in Example 2, and described together in Table 1 below.

TABLE 1

Example 2 Comparative example Density (in × in) PERING20S / 2 × PERING30S / 1 (top), PERING20S / 2 × PEOE10S / 1 (bottom) ----------------------------- -(Double weave) 90 × 82 to 84 PERING20S / 2 x PEOE10S / 1 --------------------- (single weave) 90 x 44 to 46 Warp tensile force (kgf / in) 226 226 Weft tension (kgf / in) 105 63 Elongation at weft tension 100 kgf / in (mm) 7 14 Smoothness (Defects) 5 8

Experimental condition

(1) Density: The number of warp and weft yarns is 1 inch by 1 inch long.

(2) Number of yarns: The thickness of the yarn is represented by the number of times and denoted by S.

(3) Inclination Tensile force: The universal tester measured the width of descending in the inclined direction at a width of 2.5 × 12.5 m at 1 m / min.

(4) Weft tension: With a universal testing machine, the width was 2.5 × 12.5 m in length, and the rate of descent in the weft direction was measured at 1 m / min.

(5) Elongation rate: In the same universal testing machine as the tensile test, the length increased in weft tension 100kgf / in expressed in elongation (mm).

(6) Smoothness: The number of defects protruding from the fabric 1m width x 1m length was examined.

<Example 3>

In Example 2, except that MVS was used instead of ring spun yarn or OE yarn, the abrasive substrate was woven in the same manner as in Example 2. Physical properties of the woven abrasive substrate were measured in the same manner as in Example 2, described in Table 2 below, and compared with those of the comparative example.

TABLE 2

Example 3 Comparative example Density (in × in) PEMVS20S / 2 × PEMVS30S / 1 (top), PEMVS20S / 2 × PEMVS10S / 1 (bottom) ----------------------------- -(Double job) 93 × 80 PERING20S / 2 x PEOE10S / 1 --------------------- (single weave) 93 x 44 Warp tensile force (kgf / in) 224 226 Weft tension (kgf / in) 102 68 Elongation at weft tension 100 kgf / in (mm) 6 15 Smoothness (Defects) 4 9

As shown in Tables 1 and 2, it can be seen that the density of the weft yarn is increased by 60% or more in comparison with the conventional abrasive base material. Improved. Therefore, the abrasive substrate of the present invention can improve the weaving function by improving the limit of the basic physical properties. It was also confirmed that the weft tension was high, the elongation was low at the weft tension 100 kgf / in, and the smoothness was high.

The present invention is not limited to the above embodiments, and many variations are possible by those skilled in the art within the spirit of the present invention.

As described above, in the abrasive substrate according to the present invention, the weft yarns constituting the upper tissue layer and the lower tissue layer are woven by varying the thickness of the yarn, so that abrasives having different particle sizes can be applied to each tissue layer, thereby polishing as one abrasive cloth. Efficiency can be maximized and inventory burden can be reduced. In addition, by securing a space between the double structure, it is easy to penetrate the abrasive or adhesive, it is possible to improve the adhesion. Furthermore, since the intersection points of the upper tissue layer and the lower tissue layer are smaller than those of general fabrics, it is easy to expand not only in the warp but also in the weft direction when processing the abrasive substrate, so that the elongation can be adjusted in the weft direction, and the grinding function of the high tensile strength is improved. Abrasion can be obtained.

Claims (9)

An abrasive substrate comprising an upper tissue layer and a lower tissue layer composed of warp and weft yarns, and stitching yarns connecting the upper and lower tissue layers, The abrasive material is inclined of the upper tissue layer and the slope of the lower tissue layer is woven using a thread having the same thickness, the weft of the upper tissue layer and the weft of the lower tissue layer is woven using a different thickness of the yarn, the upper tissue layer and the lower The tissue layers have different uneven surfaces, The abrasive substrate is Arranging the inclination of the upper tissue layer and the inclination of the lower tissue layer at an intersection; The heald of the lower tissue layer is fixed when weft weaving the upper tissue layer, and the heald of the upper tissue layer is fixed when weft alternately weaving the lower tissue layer, such that the upper tissue layer and the lower tissue layer are woven simultaneously; And In the stitching yarn connecting the upper tissue layer and the lower tissue layer without disturbing the organization of the upper tissue layer and the lower tissue layer, the stitching yarn prevents the intersection of the upper tissue layer and the lower tissue layer from overlapping each other. Binding the upper tissue layer and the lower tissue layer while advancing in the warp direction or the weft direction of the abrasive substrate; It is manufactured by a weaving method comprising a, abrasive yarn abrasive substrate, characterized in that it has a structure that does not interfere with the organization of the upper tissue layer and the lower tissue layer. The method of claim 1, And the upper tissue layer and the lower tissue layer are each independently woven from a yarn selected from cotton, wool, silk, hemp, synthetic fibers and blended yarns thereof. The method of claim 1, The upper tissue layer and the lower tissue layer is a polishing cloth abrasive substrate using a jute. The method of claim 1, The upper tissue layer is made of cotton, the lower tissue layer is a polishing cloth polishing substrate made of polyester. The method of claim 1, At least one of the warp yarns and the weft yarns constituting the upper tissue layer and the lower tissue layer is woven including abrasives MVS (絲) substrate. The method of claim 1, And the upper tissue layer and the lower tissue layer are each independently woven into a tissue selected from plain weave, twill weave, runner weave and changeable tissue thereof. The method of claim 1, The abrasive substrate is a polishing cloth abrasive substrate, characterized in that the heat-fixed after expanding in the weft direction. An abrasive substrate according to any one of claims 1 to 7; An abrasive applied to the abrasive substrate; And An adhesive for adhering the abrasive substrate to the abrasive; Abrasive cloth comprising a. The method of claim 8, And the abrasive is applied to penetrate each of the upper and lower tissue layers and between the upper and lower tissue layers.

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