KR100675407B1 - Abrasive backing and abrasive cloth - Google Patents

Abstract

An abrasive substrate excellent in high tensile and low elongation smoothness and an abrasive cloth comprising the abrasive substrate are proposed. According to an aspect of the present invention, there is provided an abrasive substrate comprising an upper tissue layer and a lower tissue layer, a stitching yarn connecting the upper tissue layer and the lower tissue layer, and expanding the upper tissue layer and the lower tissue layer in a weft direction from a tender and then heat-fixing them. . In addition, the upper tissue layer and the lower tissue layer can be woven at the same time.

Abrasive, Abrasive material, Double structure, Abrasive cloth, Abrasive belt

Description

Abrasive Materials and Abrasives {ABRASIVE BACKING AND ABRASIVE CLOTH}

1 is a complete tissue diagram of the plain weave constituting the upper tissue layer according to an embodiment of the present invention.

Figure 2 is a complete tissue diagram of the 2/2 twill constituting the lower tissue layer according to an embodiment of the present invention.

Figure 3 is a complete double tissue diagram showing an abrasive substrate according to an embodiment of the present invention.

Figure 4 is a dual structure of the abrasive substrate according to an embodiment of the present invention.

5 is a cross-sectional view of the abrasive substrate according to an embodiment of the present invention.

Figure 6 is a flow chart of a method for producing a polishing cloth according to an embodiment of the present invention.

<Explanation of symbols for the main parts of the drawings>

11, 13, 15, 17: Slope of 2/2 twill 12, 14, 16, 18: Slope of plain weave

a, c, e, g: 2/2 twill weft b, d, f, h: plain weft

20: part where the inclination of the 2/2 twill is upward 30: part where the inclination of the plain fabric is upward

40: 2/2 twill weft upper part 50: plain weft weft upper part

70: stitching yarn

The present invention relates to an abrasive substrate having a double structure and an abrasive cloth using the abrasive substrate.

Abrasive cloths are reprocessed into products such as sheets, rolls, belts, and rings, depending on the application. In particular, in the case of abrasive belts, it is required to provide ultra-wide abrasive belts of 1650 mm or more for the purpose of automating production facilities and improving productivity of the workpiece processing. In the case of the existing abrasive cloth, its width cannot be manufactured to more than 1390mm due to process constraints, and in order to manufacture an ultra-wide abrasive belt, it was inevitable to attach a plurality of abrasive cloths together. It is also called a wide joint belt.

In the case of wide joint belts, there is a serious problem that the abrasive belt is shaken during use of the abrasive belt, or that the abrasive belt is easily broken and the quality of the workpiece to be degraded by the piece of the joint is severely generated. Therefore, there is a continuous demand for wide belt quality improvement.

In addition, due to the speed difference of the roller in the conventional manufacturing process of the abrasive substrate and abrasive cloth, a constant tension is naturally applied in the inclined direction, so that the inclination of the abrasive substrate has a lower elongation rate and higher tensile strength than the weft yarn. Therefore, even when manufacturing the polishing belt using the polishing cloth containing the abrasive base material, the polishing belt was connected in an oblique direction to secure the strength and low elongation of the finished polishing belt. Therefore, conventionally, no processing was performed to secure low elongation and high tensile strength in the weft direction of the abrasive substrate.

However, in recent years, a method of manufacturing by connecting the polishing cloth in the weft direction rather than the inclined direction to produce the polishing belt without limiting the width when manufacturing the wide belt joint. However, when manufacturing the weft direction wide width belt using an abrasive material that does not apply any tension to the existing weft yarn, the polishing belt is easily stretched during the rotation and break or lean to one side. Thereby, there is a risk of abrasion of the abrasive and fire. Therefore, although the weft yarn is required to have a low elongation rate and high tensile strength in order to manufacture the weft direction wide belt, until now, a polishing substrate including a low elongation rate and high tensile force, a manufacturing method or abrasive cloth It was not suggested about.

The present invention provides an abrasive substrate for an abrasive cloth having an improved function advantageous for producing weft direction wide belts and an abrasive cloth comprising the abrasive material. In particular, the weft provides an abrasive substrate and a polishing cloth having a low elongation, high tensile strength.

According to an aspect of the present invention, the upper tissue layer and the lower tissue layer, comprising a stitching yarn connecting the upper tissue layer and the lower tissue layer, presenting the abrasive substrate heat-fixed after expanding the upper tissue layer and the lower tissue layer in the weft direction in the tender can do.

Wherein the upper and lower tissue layers may be woven into plain, twill, runner or altered tissue, and the stitching yarn may connect the upper and lower tissue layers without interfering with the organization of each of the upper and lower tissue layers. have.

According to a preferred embodiment, the stitching yarn may use a thread of the same material as the weft yarn constituting the upper tissue layer or lower tissue layer.

In addition, the upper tissue layer and the lower tissue layer can be woven simultaneously.

According to another aspect of the invention, the step of arranging the inclination of the upper tissue layer and the inclination of the lower tissue layer; When the weft weaves the upper tissue layer, the heald of the lower tissue layer is fixed, and when the weft alternately weaves the lower tissue layer, the heald of the upper tissue layer is fixed so that the upper and lower tissue layers are woven simultaneously; and The stitching yarn may provide a method of manufacturing an abrasive substrate, including connecting the upper tissue layer and the lower tissue layer without disturbing the organization of the upper and lower tissue layers.

Here, the upper tissue layer and the lower tissue layer may be woven into plain weave, twill, runner or changeable tissue, and the step of thermally fixing the upper tissue layer and the lower tissue layer connected by stitching yarn in the direction of weft from the tenter, and then heat-fixing Can contain more.

According to a preferred embodiment, the stitching yarn may use a thread of the same material as the weft yarn constituting the upper tissue layer or the lower tissue layer.

In addition, according to another aspect of the present invention, it is possible to provide an abrasive cloth comprising the abrasive substrate described above, the abrasive applied to the abrasive substrate, and an adhesive for adhering the abrasive substrate and the abrasive.

Wherein the abrasive can penetrate inside each of the upper and lower tissue layers and between the upper and lower tissue layers.

Hereinafter, a preferred embodiment of the abrasive substrate, the method of manufacturing the abrasive substrate and the polishing cloth according to the present invention will be described in detail with reference to the accompanying drawings, in the following description with reference to the accompanying drawings, the same components regardless of reference numerals Denotes the same reference numerals and duplicate description thereof will be omitted.

In the present invention, 'double tissue' refers to the completion of one abrasive substrate by combining two tissue layers. Here, the two tissues forming the upper part and the lower part may be the same tissue, different tissues, or the upper and lower parts may be woven in completely different colors. These two organizational layers are connected by stitching yarns.

In addition, prior to describing the preferred embodiments of the present invention in detail, the structure of the general fabric, the structure of the abrasive substrate, the configuration of the polishing cloth will be described first.

Three-way organization of textile weaving: plain weave, twill weave and runners. Plain weave is the simplest organization of weaving, with wefts and wefts interwoven alternately one by one, going up and then down. Plain weave is usually labeled 1/1, and the strength of the woven fabric is determined by the thickness of the yarn and the density of the weave. Twill, also known as serpentine, is an organization in which wefts and warp yarns interweave two or more rows in succession. These twills are soft and soft with less tissue points than plain weave, and are represented as 1/2, 1/3, 1/4, and the like.

In addition, the runner's position is also called the vertical position. It is a structure in which a warp yarn interweaves over four or more weft yarns, and one of the warp or weft yarns stands out on the surface of the fabric. In the case of woven textiles, there is no warp and weft tissue points, so there is little curvature and it is indicated as 1/4 satin. In addition, there is a transformation organization of plain weave, twill weave, and a change organization of ridge twill, wave twill, and vertical weave. There is this.

When weaving the abrasive base constituting the abrasive cloth into a plain weave with the same thickness as the warp and weft yarns, the abrasive base has a higher tensile force, stronger resistance to friction, and superior surface smoothness than when weaved into other tissues. have. However, in order to fix the elongation rate, it is necessary to apply tension in the inclined direction or expand in the weft direction. In the case of plain weave, it is difficult to apply tension or expand because there are many crossing points. Therefore, weaving the abrasive base into plain weave has a disadvantage in that it is used as an abrasive base due to its high elongation.

Next, the components constituting the polishing cloth will be described in detail. The abrasive cloth generally includes an abrasive base, an abrasive, and an adhesive. In addition to the cloth (Cloth) as the present invention, the abrasive material includes a combination of paper, fiber (fiber), laminated cloth on paper. As the adhesive, thermosetting or thermoplastic synthetic resin adhesive or glue may be used.

Abrasives, which are the most important factors for grinding, are aluminum oxide (Al ₂ O ₃ ), silicon carbide (Sic), zirconia alumina (Al ₂ O _3- Zr ₂ O ₃ ), ceramic aluminum oxide, silica, garnet Garnet, emery, crocus and the like can be used. In addition, the filler may further include a filler. In general, fillers are used for hard coal, clay, and diatomaceous earth for the purpose of supplementing physical properties of the adhesive.

Figure 1 is a complete tissue diagram of the plain weave constituting the upper tissue layer according to an embodiment of the present invention. Referring to Figure 1, there is no difference in the organization of the general plain weave. Here, the plain weave is a weft (b, d, f, h) interwoven weaving in a row of slopes (12, 14, 16, 18), the portion of the plain weave 30 and the portion of the weft weft (50) It is shown separately.

Figure 2 is a complete tissue diagram of 2/2 twill constituting the lower tissue layer according to an embodiment of the present invention. Referring to Figure 2, it is the same as the organization chart of a general 2/2 twill. Here, the twill is a cross section of two warp yarns (11, 13, 15, 17) and weft yarns (a, c, e, g) interweaving and weaving, and the warp yarn part (20) and the weft yarn part (40). Shown separately.

Figure 3 is a complete double organization chart showing an abrasive substrate according to an embodiment of the present invention. Referring to FIG. 3, the warp yarns of the plain weave shown in FIG. 1 and the 2/2 twill shown in FIG. 2 are arranged to cross each other, and the weft of the plain weave shown in FIG. 1 and the 2/2 twill shown in FIG. 2 are arranged. Arranged by crossing each other to complete one complete double organization chart. By repeating the weave in one complete double-tissue road in the inclined direction and weft direction, the abrasive substrate of the present invention can be woven.

Figure 4 is a dual structure of the abrasive substrate according to an embodiment of the present invention. Referring to FIG. 4, there is shown a dual organization that may appear when actually weaving a 1 full dual tissue diagram shown in FIG. 3. Looking at this dual structure, the upper part is woven into the plain weave layer, the lower part is woven into the twill layer, and they are separated from each other. In addition, the weft yarn once constitutes a plain weave layer and the other constitutes a twill weave layer so that the upper plain weave layer and the lower twill weave layer are simultaneously woven.

5 is a cross-sectional view of an abrasive substrate according to an embodiment of the present invention. 5, it is sectional drawing of the grinding | polishing base material based on the specific weft (e) of FIG. As shown, the top is woven in plain weave and the bottom is woven in twill, and they are separated from each other to form an abrasive substrate. The stitching yarn 70 connects the two layers. Here, the stitching yarn is the upper plain weave layer and the lower portion while proceeding in the weft direction at a portion where a specific slope 12 of the plain weave intersects a specific weft (d) and a portion where a specific slope 15 of the twill weave intersects a specific weft (e). Connect the twill layers.

Figure 6 is a flow chart of a method for producing a polishing cloth according to an embodiment of the present invention. Referring to FIG. 6, in step S100, the polishing substrate of the dual structure is woven as described above. Step S110 is a step of expanding and heat setting the abrasive substrate. In the present invention, the abrasive substrate of the dual structure is expanded in the weft direction in the tenter and then thermally fixed. Step S120 is a step of penetrating the abrasive into the abrasive substrate and fixing and bonding the abrasive to the abrasive substrate with an adhesive. As a method of applying such an abrasive, a gravity coating method or an electrodeposition coating method can be used. Step S130 is a size coating step for firmly fixing the abrasive on the abrasive substrate, and is a curing step of applying heat to the abrasive cloth thus treated in step 140. Step S150 is a humidification step, step S160 is a flexible step, and if necessary, may be subjected to step S170 (MCM step) after a size coating operation (size coating) so as not to adhere to the abrasive dust during polishing. Next, when the polishing cloth is processed in step S180, the polishing cloth is completed.

The abrasive substrate, the method of manufacturing the abrasive substrate, and the abrasive cloth are described above with reference to the drawings in general. Hereinafter, the abrasive substrate according to the present invention will be described with reference to the accompanying drawings.

Weaving of Double Structure Grinding Materials

(1) weaving of upper and lower fabric layers

The abrasive substrate of the present invention includes an upper fabric layer and a lower fabric layer which can be separated from each other, stitching yarns connecting the upper fabric layer and the lower fabric layer, and the upper fabric layer and the lower fabric layer can be woven simultaneously. . Here, the upper fabric layer and the lower fabric layer may be woven into plain weave, twill weave, runner weave or their changing tissue, respectively. Examples of this change structure are as described above.

In the preferred embodiment of the present invention, a case of weaving the upper fabric layer to plain weave and the lower fabric layer to 2/2 twill will be described in detail.

Referring to FIG. 4, the upper fabric layer is a cross weave of the warp yarns (12, 14, 1, 18) of the plain weave and a single weft yarn (b, d, f, h) of the plain weave to form an upper plain weave layer, and the lower fabric layer The two twill slopes 11, 13, 15 and 17 of the twill weave and the two twill weaves (a, c, e, g) form the lower twill layer. The upper fabric layer and the lower fabric layer are woven separately from each other. That is, when the warp yarns forming the plain weave and the warp yarns forming the twill are intersected with each other, the weft yarns make up the plain weave once, and the other weave the cross weave so as to form the twill weave, thereby obtaining a double-stranded abrasive substrate. .

Here, when weaving the upper plain weave layer, the healds of the slopes 11, 13, 15, and 17 of the lower twill layer are fixed to prevent movement of the lower twill layer. In addition, when weaving the lower twill layer, the healds of the inclinations 12, 14, 16, and 18 of the upper plain weave layer are fixed and prevented from moving so that the upper plain weave layer is not woven.

There is no limitation on the kind of yarns forming the upper fabric layer or the lower fabric layer of the double tissue. The yarn is not limited to the types of fibers constituting the yarn such as cotton, wool, silk, hemp, synthetic fibers or synthetic yarns, blended yarns, and blended yarns of these and synthetic fibers, and spinning methods such as spun yarns, filament yarns, and split yarns. Is not restricted. It is also possible to use threads of the same kind or color or different from those of the upper fabric layer and the lower fabric layer. Preferably, the yarn constituting the upper fabric layer and the yarn constituting the lower fabric layer are the same.

(2) stitching yarn (70)

The upper fabric layer and the lower fabric layer constituting the double tissue are connected by stitching yarns. The location of the stitching yarn is very important, and the position where the stitching yarn connects the upper fabric layer and the lower fabric layer should be a position that does not interfere with the organization of each fabric layer. The stitching yarn may connect the upper fabric layer and the lower fabric layer while proceeding in the inclined direction or the weft direction of the abrasive substrate. Care should be taken that the stitching yarns do not overlap the intersection of the upper and lower fabric layers. According to a preferred embodiment of the present invention, referring to Figures 3 and 4, the portion 12-d in which the specific slope 12 and the specific weft (d) of the upper plain weave layer in the complete double-tissue chart cross the top The weft yarn d of the plain weave layer crosses over the slope 12 of the top plain weave layer so that stitching yarns do not interfere with the organization of the top plain weave layer. In addition, in the part of the complete double organization chart, the portion 15-e where the specific inclined 15 of the lower twill layer intersects the specific weft (e) crosses the weft (e) of the lower twill layer below the inclined 15 of the lower twill layer. Cross stitching does not interfere with the organization of the lower twill. Thus, stitching may come to these intersecting parts 12-d and 15-e. Referring to Figure 5, the stitching yarn connecting the upper plain weave layer and the lower twill layer is shown in cross section.

There is no limit to the type of yarn constituting stitching yarn. The yarn is not limited to the types of fibers constituting the yarn, such as cotton, wool, silk, hemp, synthetic fibers or synthetic yarns, blended yarns, and blended yarns of these and synthetic fibers, and yarns such as spun yarns, filament yarns, and split yarns. It is not restricted by law.

The stitching yarn may use threads of the same type or color as the weft yarns forming the upper fabric layer or the lower fabric layer, or may use different threads. Preferably, the same yarn as the weft yarn constituting the upper fabric layer or the lower fabric layer is used.

(3) Double structured abrasive substrate

Thus, the woven double base abrasive material has less inclination and weft intersection of the upper fabric layer body, and less inclination and weft intersection of the lower fabric layer. In addition, when combining the upper fabric layer and the lower fabric layer, as shown in Figure 4 connect the stitching yarn so that the intersection of each fabric layer does not overlap each other. Therefore, the abrasive substrate of the dual structure of the present invention can have the same tensile strength even if weaved tissue roughly by reducing the density of the weft and warp constituting the tissue by 20 to 40% compared to the abrasive substrate of the same structure. That is, each intersection point of the upper fabric layer and the lower fabric layer is guaranteed at least a tensile force compared to the normal fabric. The intersection of warp and weft of one layer is smaller than that of general fabrics, so it is easy to expand warp as well as warp when processing abrasive materials. Therefore, the abrasive substrate of the present invention can adjust the elongation rate in the weft direction. In addition, since the structure of the abrasive substrate is loosely woven, the space of the upper fabric layer or the lower fabric layer is large, and the space between the fabric layers is large, so that the abrasive substrate easily penetrates the abrasive or adhesive.

(4) Expansion of abrasive materials, etc.

In order to manufacture the weft direction wide belt, a low elongation is particularly required in the weft direction of the abrasive base constituting the abrasive cloth, and thus expansion and heat setting of the abrasive base is necessary. If the elongation in the weft direction coinciding with the rotation direction of the polishing belt is not lower than 3 to 7%, the polishing belt may be stretched or broken by frictional heat and tension generated during the use of the polishing belt.

The abrasive substrate of the present invention is easy to expand in the weft direction because of less cross point. Therefore, in the tenter, the abrasive substrate of the double structure is expanded to 1 to 7% only in the weft direction without applying tension in the warp direction, and then thermally fixed at 180 to 250 ° C. for 1 to 3 minutes. Through this heat setting step, an abrasive substrate having a fixed elongation in the weft direction can be obtained.

Experimental condition

(1) Density refers to the number of warp and weft yarns in 1 inch by 1 inch length of the fabric.

(2) Number of yarns: The thickness of the yarn is represented by the number of times and denoted by S.

(3) Inclination Tensile force: The universal tester measured the width of descending in the inclined direction at a width of 2.5 × 12.5 m at 1 m / min.

(4) Weft tension: With a universal testing machine, the width was 2.5 × 12.5 m in length, and the rate of descent in the weft direction was measured at 1 m / min.

(5) Elongation rate: In the same universal testing machine as the tensile test, the length increased in weft tension 100kgf / in expressed in elongation (mm).

(6) Smoothness: The number of defects protruding from the fabric 1m width x 1m length was examined.

Example 1 and Comparative Example 1

Example 1 weaving the upper fabric layer and the lower fabric layer of a double weave of plain weave, Comparative Example 1 was woven into the main fabric we investigated the density, warp tension, weft tension, elongation, smoothness as shown in the above experimental conditions [ Table 1]. In the case of a double-structured abrasive substrate, the weft tension is higher than that of the woven base fabric, and the elongation is low at the weft tension of 100 kgf / in, and the smoothness is high.

TABLE 1

Example 1 Comparative Example 1 Density (in × in) 16 ^s × 15 ^s 1 ────── (plain weave) 80 × 70 1 16 ^s × 15 ^s 4 ────── (Runner positions) 95 × 60 1 Warp tensile force (kgf / in) 95 to 97 100 to 105 Weft tension (kgf / in) 160 to 170 127 to 132 Elongation at weft tension 100 kgf / in (mm) 22 to 26 33 to 36 Smoothness (Defects) 5 to 8 10 to 16

Example 2 and Comparative Example 2

In Example 2, the upper fabric layer and the lower fabric layer were woven in plain weave, 3% expanded in the weft direction without applying tension in the warp direction, and heat-fixed at 250 ° C. for 3 minutes. Comparative Example 2 was woven in a main fabric, expanded 3% in the weft direction and then heat-fixed at 250 ° C for 3 minutes. As shown in the experimental conditions, the density, the gradient tensile force, the weft tension force, and the elongation rate were investigated. In the case of double-structured abrasive substrates, the weft tension was higher than that of the woven fabrics, and the elongation was very low at the weft tension of 100 kgf / in.

 TABLE 2

Example 2 Comparative Example 2 Density (in × in) 16 ^s × 15 ^s 1 ────── (plain weave) 80 × 70 1 16 ^s × 15 ^s 4 ────── (Runner positions) 95 × 60 1 Warp tensile force (kgf / in) 100 to 110 110 to 115 Weft tension (kgf / in) 170 to 180 140 to 150 Elongation at weft tension 100 kgf / in (mm) 16 to 18 38 to 40 Smoothness (Defects) 5 to 8 10 to 16

The present invention is not limited to the above embodiments, and many variations are possible by those skilled in the art within the spirit of the present invention.

As described above, the abrasive and abrasive cloth according to the present invention have less intersection points of the warp and weft yarns of the upper fabric layer and the lower fabric layer constituting the double structure than the general fabric, thereby increasing the smoothness of the surface. It is easy to expand the weft as well as the slope. Therefore, it is easy to adjust the elongation rate in the weft direction, by connecting the polishing cloth including a low elongation weft in the weft direction can be produced an ultra-wide polishing belt. In addition, since the tissue is loosely woven, the space of the upper fabric layer or the lower fabric layer is large, and the space between the fabric layers is large, so that the abrasive or adhesive can easily penetrate, thereby obtaining an abrasive cloth having improved grinding function of high tensile strength.

Claims (11)

An abrasive substrate comprising an upper tissue layer and a lower tissue layer, and stitching yarns connecting the upper and lower tissue layers, wherein the abrasive substrate is Arranging the inclination of the upper tissue layer and the inclination of the lower tissue layer at an intersection; The heald of the lower tissue layer is fixed when weft weaving the upper tissue layer, and the heald of the upper tissue layer is fixed when weft alternately weaving the lower tissue layer, such that the upper tissue layer and the lower tissue layer are woven simultaneously; And In the stitching yarn connecting the upper tissue layer and the lower tissue layer without disturbing the organization of the upper tissue layer and the lower tissue layer, the stitching yarn prevents the intersection of the upper tissue layer and the lower tissue layer from overlapping each other. Binding the upper tissue layer and the lower tissue layer while advancing in the warp direction or the weft direction of the abrasive substrate; Polishing substrate manufactured by a weaving method comprising a. The method of claim 1, And the upper tissue layer and the lower tissue layer are each woven into plain weave, twill weave, runner weave or changeable tissue thereof. The method of claim 1, And the upper tissue layer is woven into a plain weave, and the lower tissue layer is woven into a twill weave. The method of claim 1, Wherein the upper tissue layer is woven into plain weave, and the lower tissue layer is woven into 2/2 twill. The method of claim 3, The abrasive substrate is arranged to cross the inclination constituting the plain weave of the upper tissue layer and the inclination constituting the twill of the lower tissue layer to each other, the weaving material is weaved alternately weaving so as to constitute a plain weave, once the twill weave. . delete The method of claim 1, The stitching yarn may use a yarn of the same material as the weft yarn constituting the upper tissue layer or the lower tissue layer. The method of claim 1, The abrasive substrate is heat-fixed after expanding the upper tissue layer and the lower tissue layer connected by the stitching yarn in the weft direction in the tenter. The method of claim 8, The abrasive substrate is heat-fixed for 1 to 3 minutes at 180 to 250 ℃ after expanding the upper tissue layer and the lower tissue layer connected by the stitching yarn in 1 to 7% only in the weft direction. A polishing substrate according to any one of claims 1 to 9; An abrasive applied to the abrasive substrate; And An adhesive for adhering the abrasive substrate to the abrasive; Abrasive cloth comprising a. The method of claim 10, And the abrasive is applied to penetrate each of the upper and lower tissue layers and between the upper and lower tissue layers.

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