KR100764916B1 - Plasma analyzer - Google Patents

Abstract

A plasma inspection apparatus is provided to perform easily installing, disassembling, transferring and operating processes on the apparatus itself by integrating a plasma source block, a spectroscope block and an operation system block in one case and to prevent the interference between blocks due to noises and heat by using a shielding plate. A plasma inspection apparatus includes a plasma generating unit, a spectroscope, and a central control unit. The plasma generating unit is connected with a gas supply line of fabrication equipment in order to receive a predetermined gas. The plasma generating unit is capable of generating light by transforming the predetermined gas including particles into a plasma state. The spectroscope is used for forming spectrum by receiving the light from the plasma generating unit and transforming the spectrum into an electric signal. The central control unit is used for analyzing elements of the particles by receiving the electric signal of the spectroscope. The plasma generating unit is composed of an external connector, a sapphire tube, a magnetic field generator, a coil and an RF(Radio Frequency) generator. The external connector(115) includes a gas inlet port(116) connected with a gas supply line. The gas inlet port is used for supplying a transfer path of the predetermined gas. The sapphire tube has an opening portion at one side. The opening portion of the sapphire tube is connected with the gas inlet port of the external connector. The magnetic field generator is arranged parallel with the sapphire tube in order to form a magnetic field at the sapphire tube. The coil is wound around the sapphire tube. The RF generator is electrically connected with the coil in order to supplying an RF signal to the coil. A shielding plate is arranged at a predetermined portion between the plasma generating unit and the spectroscope.

Description

Plasma Inspection Equipment {Plasma Analyzer}

1 is a perspective view of a plasma inspection apparatus according to the present invention.

2 is an exploded perspective view of FIG. 1.

3 is an exemplary view showing a form of the second case of FIG. 1 viewed from another angle;

4A is a cross-sectional view illustrating a vertical cross section of the plasma generator.

4B is a top projection view of the plasma generator from above;

5A to 5C are exemplary diagrams for describing an arrangement of a magnetic field generator according to other embodiments of the present invention.

6A is an exemplary view showing a case where two permanent magnets are arranged.

6B is an exemplary view showing a case where three electromagnets are arranged.

7 is an exemplary view showing the internal structure and spectroscopy method of the spectrometer of FIG.

8 is an exemplary view for explaining the combination of the spectrometer, the plasma generator and the case.

<Description of the symbols for the main parts of the drawings>

101, 102, 103: case 107: shielding plate

110: plasma generator 111: heat sink

112: fan 115: external connector

116: gas inlet 117: adapter

118: seating portion 119: floodlight

120: sapphire tube 121: coil

122: high frequency generator 125, 225, 325, 425: magnetic field generator

126: wing 127: coupling hole

128: support 140: analysis device

160: spectrometer 162, 163, 164: reflector

165: imaging device 170: optical fiber

171: connection terminal 179: port

180: central control unit 181: circuit board

182: central processing unit 190: input and output port

197: IO cable 198: data cable

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a plasma inspection apparatus, and more particularly, to a plasma inspection apparatus in which a plasma source, a spectrometer, and an operation system are integrated in a block form so as to facilitate installation, disassembly, movement, and operation.

In various manufacturing processes and manufacturing facilities including semiconductor manufacturing and display panel manufacturing, it is important to check not only manufacturing speed and efficiency, but also various defects that may occur during the progress of manufacturing. Among them, in the case of forming fine patterns, circuits, structures, etc. in very small areas such as semiconductor manufacturing and display panel manufacturing, it is considered to be more important to check for defects and pre-detect the cause of defects.

For this reason, in the manufacturing facilities of semiconductors or display panels, defects and defect occurrence factors are detected through materials used during the process and residues after use of the materials. In particular, in the case of a semiconductor or a display panel, various processes such as a lithography process, an etching process, an ashing process, and a deposition process are performed for the formation of a circuit pattern, and a gas is often used for such a process. For this reason, the inspection apparatus which detects the residue of the gaseous waste used for a process, and detects the defect and the cause of defect in advance in the conventional semiconductor or display panel manufacturing facility is used.

However, the inspection apparatus used in the past, in particular, the device for inspecting the gas waste or the residue contained therein has a disadvantage that the size is too large to be applied to the manufacturing equipment, a huge cost for installation and operation. For example, in the case of an inspection apparatus using mass spectrometry, the size of the inspection apparatus is increased due to the hassle of lowering the gas pressure of the manufacturing facility and delivered to the inspection apparatus, and the installation cost is increased by installing a device that lowers the gas pressure. There was a problem. In this mass spectrometer, hot electrons generated from a filament ionize gas molecules and measure the energy change of the molecules to obtain a desired result. The filament of the mass spectrometry test device has a nonlinearity at a pressure lower than the air pressure for inspection, and the filament is destroyed at a high air pressure. However, since the gas pressure in the manufacturing process generally represents a pressure 1000 times higher than the pressure for inspection, there is no way to directly apply the inspection.

Due to these characteristics, operators operating manufacturing facilities do not operate the inspection equipment in addition to the manufacturing facilities due to the inconvenience of the operation and the enormous cost required for the operation.

Accordingly, it is an object of the present invention to provide a plasma inspection apparatus in which a plasma source, a spectrometer, and an operation system are integrated in a block form to facilitate installation, disassembly, movement, and operation.

In addition, another object of the present invention is to provide a plasma inspection apparatus that enables stable operation by preventing electromagnetic noise interference and thermal interference between integrated blocks.

In addition, another object of the present invention is to provide a plasma inspection apparatus having a sapphire tube to prevent corrosion by the corrosive gas and thereby failure.

Finally, another object of the present invention is to provide a plasma inspection apparatus having a magnetic field forming member on the delivery path so that gas deposits are deposited on the delivery path of the light generated from the sapphire tube so as not to inhibit the light transmission.

In order to achieve the above object, the plasma inspection apparatus according to the present invention is connected to a gas supply line of a manufacturing facility, receives a gas, and converts the gas and impurities contained in the gas into a plasma state to generate light. ; A spectrometer configured to receive the light from the plasma generator and spectroscopically form spectra and convert the light spectrum into an electrical signal; And a central controller configured to receive the electrical signal from the spectrometer and analyze components and states of the gas and the impurities.

The plasma generator includes a first case; An external connector fixed through one surface of the first case and connected to the gas supply line and having a gas inlet for providing a gas delivery path; A sapphire tube whose one side is opened and the other side is sealed to form a light transmitting part, and the opening receives and receives gas through the gas inlet of the external connector; An adapter fixed to the light transmitting portion of the sapphire tube through the other surface of the first case; A magnetic field generator arranged in parallel with the sapphire tube to form a magnetic field in the sapphire tube; A coil for supplying a high frequency signal to the sapphire tube; And a high frequency generator configured to generate the high frequency signal and to be electrically connected to the coil to provide the high frequency signal to the coil.

 The magnetic field generator includes a plurality of magnets, and the magnets may be any one selected from permanent magnets and electromagnets, or a combination thereof.

The plurality of magnets may be disposed in a direction orthogonal to the longitudinal direction of the sapphire tube so that any one of the distance between the sapphire tube and the magnets and the distance between the magnets is equal.

The plurality of magnets of the magnetic field generator may be arranged at equal intervals in the direction parallel to the sapphire tube.

The plurality of magnets may be arranged such that the same pole of the magnet faces the sapphire tube.

The first case may include any one selected from a heat sink and a fan for heat dissipation.

The spectrometer may include a plurality of magnifying reflectors and an image pickup device.

The spectrometer may be connected to the plasma generator by an optical fiber.

The spectrometer, the central control unit and the plasma generator may be integrally assembled and modularized.

It may be configured to further include a shielding plate disposed between the plasma generator and the spectrometer for shielding any one selected from heat and electromagnetic waves.

Other features and operations of the present invention in addition to the above objects will become apparent from the detailed description of the embodiments with reference to the accompanying drawings.

The detailed description set forth below in connection with the appended drawings is made with the intention of describing preferred embodiments of the invention, and does not represent the only forms in which the invention may be practiced. It should be noted that the same or equivalent functions included in the spirit or scope of the present invention may be achieved by other embodiments.

Certain features disclosed in the drawings are enlarged for ease of description, and the drawings and their components are not necessarily drawn to scale. However, those skilled in the art will readily understand these details.

Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings.

1 is a perspective view of a plasma inspection apparatus according to the present invention, Figure 2 is an exploded perspective view of Figure 1, Figure 3 is a perspective view showing an example of the second case viewed from another angle.

1 to 3, the plasma inspection apparatus 100 according to the present invention includes a plasma generator 110 and an analyzer 140. In addition, the analysis device 140 of the plasma inspection apparatus 100 according to the present invention comprises a case (101: 102, 103), the spectrometer 160 and the central control unit 180.

The plasma generator 110 is connected to a manufacturing facility (not shown) to receive a gas and a residue included in the gas from the manufacturing facility, convert the provided gas and gas residue into a plasma, and convert the plasma. Emission light is provided to the analyzer 140. To this end, the plasma generator 110 is configured to include an external coupling (External Coupling: 115) formed on the outside of the first case 102, coupled to the manufacturing equipment by the external connector 115, the external connector Gas and residue are supplied through the gas inlet 116 of 115. The plasma generator 110 supplies a radio frequency (RF) of a constant frequency to the gas and the residue introduced into the plasma generator in order to convert the gas and the gas residue into a plasma state. In addition, the plasma generator 110 provides the light EL generated while the gas and the gas residue are converted into the plasma state by the high frequency signal RF to the analyzer 140 through the optical fiber 170. The plasma generator 110 will be described in detail with reference to FIG. 4.

The analyzer 140 receives the light EL from the plasma generator 110 and analyzes the light EL using a spectrum analysis method. To this end, the analyzer 140 includes a spectrometer 160 and a central control unit 180. In FIGS. 1 and 2, both the spectrometer 160 and the central control unit 180 are accommodated in one second case 103, but the case 103 may be configured for each individual, and thus the present invention. It is not intended to limit.

The spectrometer 160 receives light EL from the optical fiber 170 to the plasma generator 110. In addition, the spectrometer 160 spectra the received light EL, converts the spectrad light pattern into an electrical signal through an internal recognition device, and transmits the converted light pattern to the central control unit 180. The central control unit 180 determines the state and the components of the gas and the gas residue by using the electric signal transmitted from the spectrometer 160. In particular, the central control unit 180 controls the driving of the plasma generator 110 and the spectrometer 160 as well as the input / output port 190 for providing information to the outside, and from the spectrometer 160 Analyzing the electrical signal provides the analyzed data to the outside.

The second case 103 accommodates the spectrometer 160 and the central control unit 180 therein, and is coupled to the first case 102 of the plasma generator 110 at one side. The second case 103 protects the internal spectrometer 160 and the central control unit 180 from external environments such as contaminants and impacts in the manufacturing environment. In particular, the second case 103 is coupled to the first case 102 of the plasma generator 110, so that the plasma inspection apparatus 100 is configured as one module. In this way, the second case 103 allows easy separation and recombination during defect, failure, maintenance, and inspection of the spectrometer 160, the central control unit 180, and other supplies received therein. The adaptability to the manufacturing equipment of the inspection apparatus 100 is increased. In addition, the second case 103 may be provided with an input and output port 190 for the connection between the plasma inspection apparatus 100 and the external device, but this is not a limitation of the present invention. As the input / output port 190 installed in the second case 103, a video port for connecting an external display device, a network port for connecting to a LAN or the Internet, a printer port, an external memory slot, a USB port, and an equivalent subscription output port thereof It may be configured, the input / output port 190 may be replaced by a wireless communication module, but this is not limited to the present invention. In addition, the input / output port 190 of the second case 103 is connected to the IO cable 197 of the central control unit 180. Here, the size of the second case 103 illustrated in FIGS. 1 to 3 may be manufactured to be somewhat larger than that of the plasma generator 110. When the plasma generator 110 and the second case 103 are coupled to each other, the remaining space generated by the size difference of the case 103 is an installation space of the optical fiber 170 and the cables 197 and 198 and air distribution for heat dissipation. It can be used as a space. However, this does not limit the present invention, and the shape of the second case 103 may be variously modified. In the drawings presented to explain embodiments of the present invention, the plasma generating device 110 is coupled to the second case 103 in a form of sealing the opening from the outside, and the spectrometer 160 and the central control unit 180. Shows an example that is accommodated inside the second case 103. However, the plasma generator 110, the spectrometer 160 and the central control unit 180 can also be used in the form of being housed in one case, the form of combining each case after storing them in each case. For example, the shape of the case may be variously changed and applied, such as a form in which the combined form is accommodated in one case again. That is, in the plasma inspection apparatus 100 of the present invention, the spectroscope 160, the central control unit 180, and the plasma generator 110 are integrally assembled in one module for the purpose of convenience of use and saving of space. It can be configured to achieve. However, this does not limit the present invention.

The spectrometer 160 receives and spectras the light EL generated from the plasma generator 110, converts the spectrum information into an electrical signal, and provides the spectrum to the central control unit 180. To this end, the spectrometer 160 is connected to the plasma generator 110 by the optical fiber 170, and receives the light (EL) through the optical fiber 170. The spectrometer 160 diffuses and diverges the light EL using a reflector or the like, and the spectroscopic light is converted into an electrical signal by an image pickup device such as a charge-coupled device (CCD). . The converted electrical signal is transmitted to the central control unit 180 through the port 179 provided in the spectrometer 160 and the data cable 198 connected to the port 179. In this case, the optical tunnel manufactured using quartz or the like may be used as the connection between the spectrometer 160 and the plasma generator 110. However, it is preferable to use the optical fiber 170 for the easy coupling of the spectrometer 160 and the plasma generator 110 and the efficient transmission of the light EL. However, this does not limit the present invention. In addition, the terminal of the optical fiber 170 may be provided with a connection terminal 171 for connection with the plasma generating device 110.

The central control unit 180 is connected to the spectrometer 160 by the data cable 198 to receive an electrical signal. In addition, the central control unit 180 analyzes the current state of the gas and gas residues by comparing the received electrical signals with data and comparing them with previously stored analysis data. In particular, the central control unit 180 is electrically connected to the plasma generator 110 and the spectrometer 160 as described above to control them. That is, when power is supplied to the plasma inspection apparatus 100 to operate, the central control unit 180 sets and operates the plasma generating apparatus 110 and the spectroscopic apparatus 160 according to the programmed details. Accordingly, the central control unit 180 transmits data supplied through the central control unit 180 to an external device, for example, an upper server or an upper system. To this end, the central control unit 180 may include a central processing unit 182 for control and analysis and a memory for storing data and operation applications. The central control unit 180 stores the values of the wavelength bands of the light EL, that is, the light EL, which are spectrally and spectroscopically obtained from the spectrometer 160, and converts the wavelength band values into numerical signals. The central control unit 180 is connected to the external device via the IO cable 197 and the input / output port 190, and transmits a numerical signal to the external device. In particular, the central control unit 180 may be implemented by a few substrates or modules having a general personal computer-class processing capacity. That is, the central control unit 180 may mount the graphics card, various input / output devices, and communication devices together with the central processing unit and the storage device on a few substrates and accommodate the inside of the inspection device. Through this, the central control unit 180 analyzes, processes, and stores the electric signals supplied from the spectrometer 160 by a programmed procedure, and stores them as display devices, communication lines, and prints connected through the input / output port 190. Output it and provide it. In addition, the central control unit 180 may be programmed by a mouse, a keyboard, an external memory, or the like connected through the input / output port 190, and may provide data to the user by analyzing and processing data in a form intended by the user. In addition, the central control unit 180 may include an output device such as a monitor or a printer according to the use environment and purpose, and the shape of the second case 103 may be somewhat changed. However, this does not limit the present invention.

4 is a structural diagram schematically showing the internal configuration of the plasma generating apparatus of FIG. 1, FIG. 4A is a cross-sectional view illustrating a vertical cross section of the plasma generating apparatus, and FIG. 4B is a top projection view of the plasma generating apparatus viewed from above.

4A to 4B, the plasma generator 110 according to the present invention includes a first case 102, a fan 112, an external connector 115, an adapter 117, a sapphire tube 120, and a coil. And a high frequency generator 122 and a magnetic field generator 125.

The first case 102 accommodates a fan 112, a sapphire tube 120, a coil 121, and a high frequency generator 122, and fixes the adapter 117 and the external connector 115 therein. The first case 102 prevents heat and electromagnetic noise generated from the inside of the first case 102 from being transmitted to the outside, in particular, the spectrometer 160 and the central control unit 180. To this end, a shielding plate 107 for shielding heat radiation and electromagnetic noise is disposed at a position where the spectrometer 160 and the central control unit 180 are disposed in the first case 102, that is, the portion coupled to the second case 103. ) May be arranged but is not intended to limit the invention. In addition, although the shielding plate 107 is illustrated as being disposed only on the upper surface in FIG. 4A, the shape and arrangement may be variously changed for efficient shielding. In addition, the fan 112 for cooling is fixed to the first case 102, and a plurality of holes for air distribution may be formed at and around the fan 112. In addition, a heat sink 111 structure for heat dissipation may be formed in the first case 102, or a separate heat sink may be attached to the first case 102. The heat sink 111 is also used to dissipate heat generated inside the plasma generator 110, and may be changed in various shapes and arrangements for smooth heat dissipation, and the material and heat sink of the first case 102. The material of the 111 may be different, but this does not limit the present invention. In addition, the first case 102 is attached with an external connector 115 fixed through one surface of the first case 102. In addition, the first case 102 is attached to the adapter 117 is fixed through the other surface of the first case (102). In addition, the high frequency generator 122 is disposed inside the first case 102 to supply a wireless signal through the coil 121. To this end, a seating portion 118 for disposing the high frequency generator 122 may be formed in the first case 102 as shown in FIG. 4A, but the present invention is not limited thereto.

The fan 112 intakes air into the plasma generator 110 or exhausts the air therein to prevent the temperature inside the plasma generator 110 from rising. Although FIG. 3A illustrates that the fan 112 is attached to the first case 102, the fan 112 is not limited thereto and may be appropriately disposed in consideration of heat dissipation efficiency, and may be configured in plural.

The external connector 115 connects the manufacturing equipment and the plasma generator 110, in particular, the manufacturing equipment and the sapphire tube 120, and provides a gas supply path so that the gas supplied from the manufacturing equipment is supplied to the sapphire tube 120. To this end, the external connector 115 is installed to penetrate the first case 102, and the part exposed to the outside of the first case 102 is manufactured to be connected to the gas supply line of the manufacturing facility. In addition, the external connector 115 supports one end of the sapphire tube 120 in the first case 102. A gas inlet 116 is formed in the external connector 115 to allow gas to flow therein.

The adapter 117 connects the other end of the sapphire tube 120 and the optical fiber 170. To this end, the adapter 117 is installed to penetrate the first case 102, and the connection terminal 171 of the optical fiber 170 is coupled at one side and coupled to the end of the sapphire tube 120 at the other side.

The sapphire tube 120 provides a space for converting the gas introduced into the plasma into the plasma, and also transmits the light EL generated when the gas is converted into the plasma to the optical fiber 170. Since the sapphire tube 120 has better corrosion resistance and heat resistance to gas and plasma than conventional quartz tubes, and has a light transmittance equal to or higher than that of quartz tubes, the sapphire tube 120 stably stores light EL generated inside the optical fiber ( 170). In addition, a coil 121 for supplying a high frequency signal is wound around the sapphire tube 120. In addition, one end of the both ends of the sapphire tube 120 toward the external connector 120 is opened to allow the inflow of gas, and one end connected to the optical fiber 170 is manufactured to have a blocked structure. The blocked portion of the sapphire tube 120 serves as the light transmitting unit 119, the light EL generated inside the sapphire tube 120 is transmitted to the optical fiber 170 through the light transmitting unit 119. .

The coil 121 supplies a high frequency signal from the high frequency generator 122 to the gas flowing into the sapphire tube 120. To this end, the coil 121 is wound at least once in the center of the longitudinal direction of the sapphire tube 120. The gas introduced into the sapphire tube 120 is ionized by the high frequency signal supplied through the coil 121, and the residue contained in the gas is ionized by the excitation energy and the high frequency energy when the gas is ionized. .

The high frequency generator 122 supplies the coil 121 with a high frequency signal for converting the gas introduced into the sapphire tube 120 into plasma under the control of the central controller 180. To this end, the high frequency generator 122 is electrically connected to the coil 121, it may be fixed to the seating portion 118 provided in the first case 102, as shown in Figure 4a. In particular, in the present invention, in order to improve the ionization efficiency by the high frequency signal, the high frequency generator 122 generates a signal of about 440 MHz and supplies it to the coil 121. However, this does not limit the present invention.

The magnetic field generator 125 is disposed near the light transmitting portion 119 of the sapphire tube 120 to provide a repulsive field by the magnetic field to the sapphire tube 120. Through this, the magnetic field generator 125 prevents the residue inside the sapphire tube 120 from being deposited on the light-transmitting unit 119 by the repulsive field, thereby preventing a decrease in the light transmission efficiency. The ionized particles in the plasma state are present in the form of anode particles in which electrons are separated. At this time, the particles are changed to the plasma state over time, the activity is lowered, thereby depositing inside the sapphire tube (120). In order to solve this problem, the magnetic field generator 125 provides the repulsive field to the sapphire tube 120, thereby maintaining or increasing the activity of the particles. Accordingly, the particles inside the sapphire tube 120 is not deposited inside the sapphire tube 120, so that the life of the sapphire tube 120 can be extended. To this end, in one embodiment of the present invention by using this to place two or more of the same magnet in the vicinity of the transparent portion 119 of the sapphire tube 120 to prevent the deposition by the particles in the transparent portion 119. As a result, the light-transmitting efficiency of the light transmitting unit 119 can be maintained at a stable level for a long time, thereby improving the reliability of the plasma inspection apparatus. To this end, the magnetic field generator 125 is composed of an electromagnet or a permanent magnet having the same polarity and at least two or more are disposed near the light transmitting part 119. Here, two magnetic field generators 125 are disposed to face each other, and when three or more magnetic generators 125 are arranged at regular intervals such as an equilateral triangle and a square to generate an equal magnetic field. In the present invention, the permanent magnet is used as an example of the magnetic field generator 125. However, the magnet may be configured by an electromagnet. In the case of the electromagnet, the circuit for driving the electromagnet may be further included. In addition, when the electromagnet is used as the magnetic field generator 125, since the structure of the plasma generator may be complicated because it requires separate power supply, it may be preferable to simply configure the permanent magnet by means of permanent magnets. It is not. And, as a permanent magnet, at least one of samarium cobalt (Sm-Co), neodymium (Nd-Fe-B) rare earth, barium (Ba), strontium (Sr), ferrites, rubber magnets and plastics Although one type or a combination thereof may be used, it is preferable to select and use a type having excellent magnetic field forming ability even at high temperature in consideration of the increase in temperature inside the plasma generator 110. In addition, although the magnetic field generator 125 is illustrated as being disposed in the vicinity of the light transmitting unit 119 in the present embodiment, the present invention is not limited thereto. That is, the magnetic field generator 125 may be installed anywhere in the longitudinal direction of the sapphire tube 120 to prevent deposition in the sapphire tube 120.

5A to 5C are diagrams for describing an arrangement of a magnetic field generator according to other exemplary embodiments of the present invention. The drawings illustrated in FIG. 4 are briefly represented.

5A and 5B, the plasma generator 110 according to another embodiment of the present invention includes a magnetic field generator 225 composed of a plurality of magnets, and each magnet is disposed in the longitudinal direction of the sapphire tube 120. It is used in a form spaced apart from each other. 5A illustrates an example in which the magnets facing each other are disposed in parallel to each other, and FIG. 5B illustrates an example in which both magnets are arranged in a zigzag form based on the sapphire tube 120.

When the magnet is arranged as shown in Figure 5a and 5b it is possible to provide a repulsive field throughout the sapphire tube 120, through which it is possible to prevent the deposition of gas and residue in the sapphire tube 120. . 5A and 5B, the same pole of the magnet should be disposed toward the sapphire tube 120. If the magnets are arranged so that the other poles face each other, particles may flow in accordance with the direction of the magnetic field, and deposits may be formed at a predetermined portion of the sapphire tube 120. It should be placed facing.

5c illustrates a case in which a magnet having a length approximately equal to that of the sapphire tube 120 is used as a magnetic field generator. 5A and 5B, a magnetic field having a desired level is formed according to the number and density of magnets belonging to the magnetic field generator 225, and there is an advantage of generating an equal magnetic field. However, the internal structure of the plasma generator 110 may be complicated because a large number of magnets must be disposed. For this reason, as shown in FIG. 5C, a single magnet having a large size may be used as the magnetic field generator 325 to simplify the structure. However, in the case of FIG. 5C, since the strength of the magnetic field may be weakened according to the type of the magnet, the magnetic field generator 325 should be used in consideration of this.

6A and 6B illustrate exemplary magnetic field generators, and FIG. 6A illustrates a case in which two permanent magnets are arranged, and FIG. 6B illustrates a case in which three electromagnets are arranged.

Referring to FIG. 6A, when two magnets 125 are used as magnetic field generators, they are arranged to form a magnetic field in a horizontal direction. At this time, the main direction in which the repulsive field M1 is formed becomes the direction of the center C1 of the light transmitting part 119. The magnetic flux formed by the permanent magnet 125 shown in FIG. 6A is preferably the center of the light transmitting part 119 where the magnetic flux density is the highest. For this reason, the distance between the permanent magnet 125 and the sapphire tube 120 may be defined by the numerical distance, but it is preferable that the distance is determined in consideration of the magnetic flux density. 5B illustrates an example in which magnets constituting the magnetic field generator 225 are arranged in a zigzag form. When using a pair of magnets as the magnetic field generator 225, it is preferable to increase the magnetic flux density at the center of the light transmitting unit 119 as described above. However, when a plurality of magnets are arranged in the longitudinal direction of the sapphire tube 120, since the entire sapphire tube 120 should form an even magnetic field, there may be a slight difference from the point described in FIG. That is, the description of FIGS. 6A and 6B exemplarily illustrates the arrangement of the magnet for preventing the deposition of the light transmitting portion 119, and thus the available range of the embodiment should be considered.

In the case of FIG. 6B, three electromagnets 425 are used as magnetic field generators. Three electromagnets 425 are disposed at positions corresponding to vertices of an equilateral triangle. At this time, the winding direction or the current supply direction should be determined such that the poles of the respective electromagnets 425 are the same. At this time, as in FIG. 6A, the direction of the magnetic field supplied from each electromagnet 425 becomes the direction of the center C2 of the light transmitting portion 119, and the electromagnet 425 so as to maximize the magnetic flux density at the center of the light transmitting portion 119. The placement distance and magnetization intensity of the are determined.

7 is an exemplary view illustrating an internal structure and a spectroscopic method of the spectrometer of FIG. 1.

Referring to FIG. 7, the spectrometer 160 according to the present invention includes a case 161, first to third reflecting mirrors 162, 163, and 164, an imaging device 165, and a port 179. .

The case 161 forms a sealed space therein so that external light does not flow in, and fixes and supports the reflectors 162 to 164 and the imaging device 165 therein. In addition, an optical nozzle 172 of the optical fiber 170 is attached to one side of the case 161, and the light EL is radiated toward the first reflector 162 through the optical nozzle 172.

The first to third reflecting mirrors 162 to 164 form a light spectrum by repeatedly reflecting and diffusing the light EL radiated through the light nozzle 172, and provide the light spectrum to the imaging device 165. . To this end, the first to third reflecting mirrors 162 to 164 are disposed to have a predetermined angle with respect to the path of the light irradiated through the optical nozzle 172. Here, the reflectors 162 to 164 are not limited to three, but may be more or less than this. In addition, in the present invention, an example of forming an optical spectrum using a reflector is illustrated, but a spectrometer using a lens aggregate may be used, and thus, the present invention is not limited thereto.

The imaging device 165 converts the light spectrum formed in the first to third reflectors 162 to 164 into an electrical signal. In addition, the imaging device 165 transmits an electrical signal to the central control unit 180 through the port 179 and the data cable 198 connected to the port 179. As the imaging device 165, a charge-coupled device (CCD) device or a CMOS image device may be used, but the present invention is not limited thereto.

8 is a view for explaining the combination of the spectrometer, the plasma generator and the case.

Referring to FIG. 8, the first case 102 of the plasma generator 110 has a plurality of blades 126 formed on a surface that is coupled to the second case 103 to be coupled to the second case 103. Can be. In addition, the blade 126 is formed with one or more coupling holes 127a for body coupling corresponding to the position where the coupling holes 127b of the second case 103 are formed. The wing 126 shown in FIG. 8 is positioned inside the second case 103 and is coupled to the second case 103 by a coupling member such as a bolt or a screw added to the coupling hole 127a.

In addition, although FIG. 8 illustrates that the wing 126 extends along the edge three sides of the upper side 129 of the first case 102, the present invention is not necessarily limited thereto. The shape of the wing 126 can be modified in a form that can be easily coupled and detached. In FIG. 8, the first case 102 in which the wing 126 is formed as an example is illustrated. In addition, a known mechanical coupling method It is possible to combine with the second case 103 by using. In addition, it is also possible to bend the wing 126 one or more times to serve as a guide for coupling with the second case 103.

8 also shows the spectrometer 160 as a dotted line. The spectrometer 160 may have a size slightly smaller than that of the plasma generator 110, and is coupled to the upper surface 129 of the first case 102 of the plasma generator 110 on which the wings 126 are formed. When the first case 102 and the second case 103 are combined, the spectrometer 160 is accommodated in the second case 103. In addition, at least one support 128 for fixing the spectrometer 160 may be formed on the upper side 129 of the first case 102. In addition, one or more coupling holes 127c may be formed in the support 128 to be coupled by the coupling member, but the present invention is not limited thereto.

As described above, the plasma inspection apparatus according to the present invention is composed of blocks of a plasma generator, a spectrometer, and an operation system, and is accommodated in a case and installed in a manufacturing facility, thereby facilitating installation, disassembly, movement, and operation.

In addition, the plasma inspection apparatus according to the present invention prevents electromagnetic noise interference and thermal interference between blocks by providing a shielding plate, thereby enabling stable operation of the inspection apparatus.

In addition, the plasma inspection apparatus according to the present invention can improve the corrosion resistance to the gas by providing a sapphire tube, it is possible to reduce the failure rate.

In addition, the plasma inspection apparatus according to the present invention provides a magnetic field generating device that provides a repulsive field on the light transmission path of the sapphire tube to prevent the degradation of the light transmission efficiency due to the plasma particle deposition, it is possible to use the sapphire tube for a long time This allows stable light transmission while reducing the need for maintenance.

What has been described above is only one embodiment for explaining the technical idea of the present invention, and the technical scope of the present invention is not limited by the above-described embodiment, but defined by the claims described in the claims of the present invention. Should be. In addition, it will be understood that the present invention may encompass various modifications and equivalent other embodiments that can be made by those skilled in the art.

Claims (11)

A plasma generator which is connected to a gas supply line of a manufacturing facility and receives a gas, and converts the gas and impurities contained in the gas into a plasma state to generate light; A spectroscope configured to receive the light from the plasma generator and spectroscopically form spectra and convert the spectra into electrical signals; And A central control unit receiving the electrical signal from the spectrometer and analyzing the components of the impurity; The plasma generator is An external connector connected to the gas supply line and having a gas inlet for providing a gas delivery path; A sapphire tube whose one side is opened and the other side is closed and formed in a tube shape to form a light transmitting part, and an opening is introduced into the gas through the gas inlet of the external connector; A magnetic field generator arranged in parallel with the sapphire tube to form a magnetic field in the sapphire tube; A coil wound around the sapphire tube; And And a high frequency generator electrically connected to the coil to supply a high frequency signal to the coil. The plasma generating apparatus of claim 1, wherein A first case; It is fixed through the other surface of the first case, and further comprises an adapter coupled to the light transmitting portion of the sapphire tube, And the external connector is fixed through one surface of the first case. The method of claim 1, wherein the magnetic field generator It comprises a plurality of magnets, The magnet is a plasma inspection device, characterized in that any one selected from permanent magnets and electromagnets or a combination thereof. The method of claim 3, wherein the plurality of magnets Plasma inspection apparatus, characterized in that disposed in the direction orthogonal to the longitudinal direction of the sapphire tube so that any one of the distance between the sapphire tube and the magnets and the distance between the magnets are equal. The method of claim 3, wherein the plurality of magnets of the magnetic field generator Plasma inspection device, characterized in that arranged at equal intervals in parallel with the sapphire tube. The method of claim 3, wherein the plurality of magnets Plasma inspection apparatus, characterized in that the same pole of the magnet is disposed facing the sapphire tube. The method of claim 2, wherein the first case Plasma inspection device comprising any one selected from a heat sink and a fan for heat dissipation. The method of claim 1, wherein the spectrometer And a plurality of magnified reflectors and an imaging device. The plasma inspection apparatus of claim 1, wherein the spectrometer is connected to the plasma generator by an optical fiber. The method of claim 1, And said spectrometer, said central control part and said plasma generator are integrally assembled and modularized. The method of claim 1, Plasma inspection apparatus further comprises a shielding plate disposed between the plasma generating device and the spectroscopic device for shielding any one selected from heat and electromagnetic waves.

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