KR100761745B1 - Apparatus for plasma discharge having pole type magnetic core and vertical dual process chamber - Google Patents

Abstract

The present invention is to provide a plasma processing apparatus capable of generating a high-density plasma with high uniformity. The plasma processing apparatus of the present invention includes a vertical first process chamber in which a substrate to be subjected to plasma processing is vertically placed, and a first process chamber. 2 process chambers; And a plurality of rod-shaped magnetic cores wound vertically between the first process chamber and the second process chamber and wound with coils of winding coils for inducing an electric field for generating plasma into the first process chamber and the second process chamber. The present invention includes a plasma source, and the present invention can use a single plasma source (rod-shaped magnetic core array) to plasma-process workpieces placed in two processing chambers of a chamber at once, thereby realizing a high productivity and efficient plasma processing apparatus. It can be effective.

Plasma, Workpiece, Process Chamber, Rod Magnetic Core, Matrix

Description

Plasma processing apparatus with rod-shaped magnetic core between vertical dual process chambers {{APPARATUS FOR PLASMA DISCHARGE HAVING POLE TYPE MAGNETIC CORE AND VERTICAL DUAL PROCESS CHAMBER}

In order to more fully understand the drawings used in the detailed description of the invention, a brief description of each drawing is provided.

1 is a structural perspective view of a plasma processing apparatus having a rod-shaped magnetic core between vertical dual process chambers according to a first embodiment of the present invention.

FIG. 2 is an internal perspective view of the dual process chamber of FIG. 1.

3 is an internal cross-sectional view of the plasma processing apparatus.

4 is a detailed view of the rod-shaped magnetic core.

5 illustrates a side plate structure of a plasma source.

6 to 8 are layout views between a plurality of holes and a rod-shaped magnetic core provided in the first and second side plates.

9 is a diagram illustrating a matrix arrangement of rod-shaped magnetic cores.

10 is a first example illustrating a method of connecting a power source of a rod-shaped magnetic core.

11 is a second example illustrating a power connection method of a rod-shaped magnetic core.

12 is a third example illustrating a power connection method of a rod-shaped magnetic core.

13A to 13C are views illustrating another structure of the rod-shaped magnetic core.

14 is a perspective view of a structure of a plasma processing apparatus having a rod-shaped magnetic core between vertical dual process chambers according to a second embodiment of the present invention.

15 is a structural diagram of a rod-shaped magnetic core.

16 is a view showing the side plate structure of the plasma source.

17 is an internal sectional view of the plasma processing apparatus according to the second embodiment.

FIG. 18 is a detailed view showing a connection relationship between a rod-shaped magnetic core, a tube, and a side plate of a plasma source.

* Description of the symbols for the main parts of the drawings *

100a: first process chamber 100b: second process chamber

200: plasma source 200a: first side plate

200b: second side plate 210, 250: rod-shaped magnetic core

215: tube 300: gas inlet

401a, 401b: exhaust port 500, 600: RF power

The present invention relates to a plasma processing apparatus, and more particularly, to a plasma processing apparatus capable of generating high density plasma having high uniformity.

Plasma is a highly ionized gas containing the same number of positive ions and electrons. Currently, plasma sources are widely used in various fields. Manufacturing of semiconductor devices for producing semiconductor chips is used, for example, in cleaning, etching, deposition, and the like.

ICP (inductive coupled plasma) or TCP (transformer coupled plasma) generation technology has been widely studied in this application field. Capacitive Coupled Plasma (CCP) method using an electrode generates impurities from the electrode in contact with the plasma, which adversely affects the final result. However, the RF ICP scheme provides the advantage of not having an electrode in contact with the plasma in providing electromagnetic energy for plasma generation.

Recently, in the technical field using plasma, a plasma source having a wider volume, uniformity, and higher density is required as the substrate to be processed is enlarged. In the field of semiconductor devices, a plasma source capable of effectively processing a large size wafer is required, and a plasma source capable of processing a large size liquid crystal display panel is also required in the production of a liquid crystal display panel.

Accordingly, the present invention is to provide a plasma processing apparatus having a plasma source capable of processing a large area as the size of the substrate to be processed increases, achieving uniformity and high density at the time of large area, and increasing the yield. have.

One aspect of the present invention for achieving the above technical problem relates to a plasma processing apparatus. The plasma processing apparatus of the present invention comprises: a vertical first process chamber and a second process chamber in which the substrate to be subjected to the plasma treatment is vertically placed; And a plurality of rod-shaped magnetic cores wound vertically between the first process chamber and the second process chamber and wound with coils of winding coils for inducing an electric field for generating plasma into the first process chamber and the second process chamber. A plasma source.

Preferably, the plurality of rod-shaped magnetic cores in the plasma source is a matrix structure arranged with rows and columns at regular intervals.

Preferably, in a matrix structure of the plurality of rod-shaped magnetic cores, adjacent magnetic cores in a column, row, or diagonal direction are connected in series to form a pair, and a power supply source is connected to any one of the magnetic cores forming the pair.

Preferably, the plasma source includes a top plate provided with a gas inlet, and a first side plate and a second side plate on which both ends of the plurality of rod-shaped magnetic cores are fixed and opposed to the first and second process chamber sides. It is a box structure.

Preferably, the first and second side plates have a plurality of holes through which source gas is discharged into the first and second process chambers.

Preferably, the plurality of holes are provided in the remaining areas except for the areas in which both ends of the rod-shaped magnetic core are in contact with each other in the first and second side plates.

In addition, the plasma processing apparatus of the present invention comprises: a vertical first process chamber and a second process chamber in which the substrate to be processed on which the plasma is to be processed is placed vertically; And

A plurality of rod-shaped coils disposed vertically between the first process chamber and the second process chamber and wound with winding coils for inducing an electric field for generating plasma into the first process chamber and the second process chamber; It includes a plasma source with a built-in magnetic core.

DETAILED DESCRIPTION In order to fully understand the present invention, the operational advantages of the present invention, and the objects achieved by the embodiments of the present invention, reference should be made to the accompanying drawings which illustrate preferred embodiments of the present invention and the contents described in the accompanying drawings. In understanding the drawings, it should be noted that like parts are intended to be represented by the same reference numerals as much as possible. And detailed description of known functions and configurations that are determined to unnecessarily obscure the subject matter of the present invention is omitted.

(Example)

Hereinafter, with reference to the accompanying drawings illustrating a preferred embodiment of the present invention, the plasma processing apparatus of the present invention will be described in detail.

1 is a perspective view of a plasma processing apparatus having a rod-shaped magnetic core between vertical dual process chambers according to a first embodiment of the present invention, FIG. 2 is an internal perspective view of the dual process chamber of FIG. 1, and FIG. An internal sectional view of the plasma processing apparatus. 4 is a detailed view of the rod-shaped magnetic core.

A plasma processing apparatus, a dual process chamber, and a plasma source will be described in detail with reference to FIGS. 1, 2, and 3.

First, the plasma processing apparatus according to the first embodiment has a first process chamber 100a and a second process chamber 100b in which the substrates 102b and 103b to be subjected to plasma processing are placed vertically. Here, the first process chamber 100a and the second process chamber 100b constitute a vertical dual process chamber. The substrates 102b and 103b are vertically placed on the susceptors 102a and 103a positioned inside the vertical first process chamber 100a and the second process chamber 100b, and the susceptor 102a. , 103a is fixed to the first process chamber 100a and the second process chamber 100b by a vacuum suction method or an electrostatic method, and one side of the first process chamber 100a and the second process chamber 100b. The exhaust ports 401a and 401b for gas discharge are respectively provided. Here, the exhaust ports 401a and 401b are disposed below the susceptors 102a and 103a. The slit valves 101a and 101b for unloading and loading the substrates 102b and 103b are provided on the front surfaces of the first process chamber 100a and the second process chamber 100b. Meanwhile, the susceptors 102a and 103a are connected to the RF power supply 500, and the magnetic core of the plasma source 200 is connected to the RF power supply 600.

In addition, one side surfaces of the first and second process chambers 100a and 100b contacting the plasma source 200 are opened. As described above, the electric field E induced by the rod-shaped magnetic core 210 by the open sides of the first process chamber 100a and the second process chamber 100b is obtained by the first process chamber 100a and the second process chamber. All of the inside of the process chamber 100b is affected.

Next, the plasma processing apparatus is disposed vertically between the first process chamber 100a and the second process chamber 100b and for generating plasma into the first process chamber 100a and the second process chamber 100b. A plasma source 200 having a plurality of rod-shaped magnetic cores 210 wound around a winding coil for inducing an electric field E is provided. Here, the rod-shaped magnetic core 210 is a ferrite core wound around a winding coil, and each rod-shaped magnetic core 210 has a structure shown in FIG. 4.

5 is a diagram illustrating a side plate structure of the plasma source. The plasma source 200 includes a top plate on which a gas injection hole 300 is provided, and both ends of at least a plurality of rod-shaped magnetic cores 210 are fixed. It is a box structure provided with the 1st side plate 200a and the 2nd side plate 200b which faced two process chamber 100a, 100b side. That is, a plurality of rod-shaped magnetic cores 210 are arranged inside the box-shaped plasma source 200.

In addition, the first and second side plates 200a and 200b include a plurality of holes 202 through which source gas is discharged to the first and second process chambers 100a and 100b. In the first and second side plates (200a, 200b) are provided in the remaining area except for the area where both ends of the rod-shaped magnetic core 210 is in contact.

6 to 8 are layout views between the plurality of holes and the rod-shaped magnetic cores provided in the first and second side plates, and the plurality of holes 202 are disposed at the center between the four rod-shaped magnetic cores 210 (FIG. 6). ), Between the column or row rod-shaped magnetic cores 210 (FIGS. 7 and 8).

9 is a diagram showing a matrix arrangement of rod-shaped magnetic cores, and is arranged with an arrangement of M × N.

FIG. 10 is a first example of a method of connecting a power source of a rod-shaped magnetic core. In the magnetic core array, winding coils of magnetic cores in adjacent rows are connected in series to form a pair, and a winding coil of a pair of magnetic cores. The power supply is connected to the winding coil and the winding coil of the other magnetic core is grounded.

As a result, electric fields 'E1' and 'E2' are induced between two pairs of magnetic cores, in which 'E1' is the first process chamber (or the second process chamber), and 'E2' is the second process chamber (or The plasma is generated and diffused in one process chamber.

11 is a second example illustrating a method of connecting a rod type magnetic core to a winding coil of magnetic cores of a pair of adjacent magnetic cores in a series of magnetic cores. The power supply is connected and the winding coil of the other magnetic core is grounded.

As a result, electric fields 'E1' and 'E2' are induced between two pairs of magnetic cores, in which 'E1' is the first process chamber (or the second process chamber), and 'E2' is the second process chamber (or The plasma is generated and diffused in one process chamber.

12 is a third example illustrating a method of connecting a power source of a rod-shaped magnetic core, in which winding coils of neighboring magnetic cores in a diagonal direction in a magnetic core array are connected in series to form a pair and winding of a pair of magnetic cores The power supply is connected to the coil and the winding coil of the other magnetic core is grounded.

As a result, electric fields 'E1' and 'E2' are induced between two pairs of magnetic cores, in which 'E1' is the first process chamber (or the second process chamber), and 'E2' is the second process chamber (or The plasma is generated and diffused in one process chamber.

13A to 13C illustrate another structure of a rod-shaped magnetic core, and an H-shaped magnetic core 211, an H-beam magnetic core 212, and an E-shaped magnetic core 213 may also be applied. Do.

14 is a structural perspective view of a plasma processing apparatus having a rod-shaped magnetic core between vertical dual process chambers according to a second embodiment of the present invention, FIG. 15 is a structure diagram of a rod-shaped magnetic core, and FIG. 16 is a side plate of the plasma source. It is a figure which shows a structure.

As shown in FIG. 14, the plasma processing apparatus according to the second embodiment includes a vertical first process chamber 100a and a second process chamber 100b in which the substrates to be subjected to plasma processing are vertically placed, and The winding coil is disposed vertically between the first process chamber 100a and the second process chamber 100b and induces an electric field for generating plasma into the first process chamber 100a and the second process chamber 100b. The plasma source 200 includes a plurality of rod-shaped magnetic cores 250 penetrating therein.

First, the first process chamber 100a and the second process chamber 100b constitute a vertical dual process chamber. The substrates 102b and 103b are vertically placed on the susceptors 102a and 103a positioned inside the vertical first process chamber 100a and the second process chamber 100b, and the susceptor 102a. , 103a is fixed to the first process chamber 100a and the second process chamber 100b by a vacuum suction method or an electrostatic method, and one side of the first process chamber 100a and the second process chamber 100b. The exhaust ports 401a and 401b for gas discharge are respectively provided. Here, the exhaust ports 401a and 401b are disposed below the susceptors 102a and 103a. The slit valves 101a and 101b for unloading and loading the substrates 102b and 103b are provided on the front surfaces of the first process chamber 100a and the second process chamber 100b. Meanwhile, the susceptors 102a and 103a are connected to the RF power supply 500, and the magnetic core of the plasma source 200 is connected to the RF power supply 600.

In addition, one side surfaces of the first and second process chambers 100a and 100b contacting the plasma source 200 are opened. As described above, the electric field E induced by the rod-shaped magnetic core 250 by the open side surfaces of the first process chamber 100a and the second process chamber 100b is the first process chamber 100a and the second process chamber. All of the inside of the process chamber 100b is affected.

In addition, the plasma source 200 includes a top plate on which the gas injection hole 300 is provided, and both ends of the at least a plurality of rod-shaped magnetic cores 250 are fixed and opposed to the first and second process chambers 100a and 100b. It is a box structure provided with the 1st side plate 200a and the 2nd side plate 200b. That is, a plurality of rod-shaped magnetic cores 250 are arranged inside the box-shaped plasma source 200.

In FIG. 14, as shown in FIG. 15, a plurality of rod-shaped magnetic cores 250 penetrated therein are inserted with a tube 215 having open ends at both ends thereof, and thus, the tube 215 is illustrated in FIG. 16. As shown, the plurality of holes 202a provided in the first side plate 200a and the second side plate 200b of the plasma source 200 are combined.

FIG. 17 is a sectional view showing the inside of the plasma processing apparatus according to the second embodiment, and FIG. 18 is a detailed view showing the connection relationship between the rod-shaped magnetic core, the tube and the side plate of the plasma source.

As shown in FIG. 17 and FIG. 18, the rod-shaped magnetic core 250 has a hole through which the center portion is penetrated, and the holes of the rod-shaped magnetic core 250 are also formed in the first side plate 200a and the second side plate 200b. The through hole 202a corresponding to the tube 215 inserted into the tube 215 is formed. In this way, the holes of the tube 215 inserted into the holes of the rod-shaped magnetic core 250 and the through-holes 202a of the first and second side plates 200a and 200b are guided by the rod-shaped magnetic core 250. The electric field E is guided through both the first process chamber 100a and the second process chamber 100b. In addition, the first side plate 200a and the second side plate 200b do not need a through hole for discharging the source gas.

In the second embodiment, the arrangement of the rod-shaped magnetic cores and the power connection method are the same as in the first embodiment. Although not shown, the first side plate 200a and the second side plate 200b are further provided with holes 202 in the method shown in FIGS. 5 to 8 of the first embodiment for discharging the source gas in FIG. 18. Thus, the source gas is discharged to the first process chamber 100a and the second process chamber 100b. Accordingly, the first side plate 200a and the second side plate 200b include a hole 202 for source gas discharge and a through hole 202a corresponding to the hole of the tube 215.

As described above, the present invention has been described with reference to the embodiments shown in the drawings, but this is merely exemplary, and those skilled in the art to which the present invention pertains have various modifications and equivalent embodiments. You can see that it is possible. Therefore, the true technical protection scope of the present invention will be defined by the technical spirit of the appended claims.

According to the plasma source (rod-shaped magnetic core array) of the present invention as described above, since the substrate to be processed placed in the vertical dual process chamber can be plasma treated at once, there is an effect of implementing a plasma processing apparatus with high productivity and efficiency. In addition, the present invention has the effect that it is easy to large area, and to obtain a uniform and high-density plasma by repeatedly expanding the unit structure of the rod-shaped magnetic core. In addition, the present invention has the effect of enabling a high-speed plasma treatment by implementing a dual processing structure for processing the substrate to be placed in two chambers at once.

Claims (18)

A vertical first process chamber and a second process chamber in which the substrates to be subjected to plasma treatment are to be vertically placed; And A plurality of rod-shaped magnetic cores are disposed vertically between the first process chamber and the second process chamber and are wound with coil coils wound around the first process chamber and the second process chamber to induce an electric field for plasma generation. Including a plasma source, The plasma source is: A top plate provided with a gas inlet; And And a first side plate and a second side plate on which both ends of the plurality of rod-shaped magnetic cores are fixed and opposed to the first and second process chambers. The plasma processing apparatus of claim 1, wherein the plurality of rod-shaped magnetic cores in the plasma source have a matrix structure arranged in rows and columns at regular intervals. The method of claim 2, wherein in the matrix structure of the plurality of rod-shaped magnetic cores, the magnetic cores of adjacent rows are connected in series to form a pair, and a power supply source is connected to the winding coils of the pair of magnetic cores. The winding coil of the magnetic core of the plasma processing apparatus is grounded. The method of claim 2, wherein in the matrix structure of the plurality of rod-shaped magnetic cores, the magnetic cores of adjacent rows are connected in series to form a pair, and a power supply source is connected to the winding coils of the pair of magnetic cores. The winding coil of one magnetic core is grounded. The method of claim 2, wherein in the matrix structure of the plurality of rod-shaped magnetic cores, adjacent magnetic cores in a diagonal direction are connected in series to form a pair, and a power supply source is connected to the winding coils of the pair of magnetic cores. The winding coil of the other magnetic core is grounded. delete The plasma processing apparatus of claim 1, wherein the first and second side plates have a plurality of holes through which source gas is discharged into the first and second process chambers. 8. The plasma processing apparatus of claim 7, wherein the plurality of holes are provided in the remaining regions except for regions where both ends of the rod-shaped magnetic core are in contact with the first and second side plates. The plasma processing apparatus of claim 1, wherein one side of the first and second process chambers facing the first side plate and the second side plate of the plasma source has an open structure. A vertical first process chamber and a second process chamber in which the substrates to be subjected to plasma treatment are to be vertically placed; And A plurality of rod-shaped magnetics disposed vertically between the first process chamber and the second process chamber and having winding coils wound therein for inducing an electric field for generating plasma into the first process chamber and the second process chamber; Plasma Source with Core Plasma processing apparatus comprising a. The plasma processing apparatus of claim 10, wherein the plurality of rod-shaped magnetic cores in the plasma source have a matrix structure arranged in rows and columns at regular intervals. 12. The method of claim 11, wherein in the matrix structure of the plurality of rod-shaped magnetic cores, the magnetic cores of adjacent rows are connected in series to form a pair, and a power supply source is connected to the winding coils of the pair of magnetic cores. The winding coil of the magnetic core of the plasma processing apparatus is grounded. 12. The method of claim 11, wherein in the matrix structure of the plurality of rod-shaped magnetic cores, the magnetic cores of adjacent rows are connected in series to form a pair, and a power supply source is connected to the winding coils of the pair of magnetic cores. The winding coil of the other magnetic core is grounded. 12. The method of claim 11, wherein in the matrix structure of the plurality of rod-shaped magnetic cores, adjacent magnetic cores in a diagonal direction are connected in series to form a pair, and a power supply source is connected to the winding coils of the pair of magnetic cores, The winding coil of the other magnetic core is grounded. 11. The plasma source of claim 10, wherein the plasma source comprises: an upper plate provided with a gas inlet, and at least both ends of the rod-shaped magnetic cores fixed to each other and opposed to the first and second process chambers; Plasma processing apparatus having a box structure having a. The method of claim 15, wherein the plurality of rod-shaped magnetic cores are inserted into the tube is open at both ends, the first side plate and the second side plate is a plurality of first holes and both ends of the tube is inserted; And a second hole for discharging the source gas. The plasma processing apparatus of claim 15, wherein one side of the first and second process chambers facing the first side plate and the second side plate of the plasma source has an open structure. The plasma processing apparatus of claim 1 or 10, wherein a slit valve for loading and unloading the substrate is provided on the front surface of the first process chamber and the second process chamber.

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