KR100696687B1 - Plasma display panel - Google Patents

Abstract

A plasma display panel is provided to improve largely electron emission performance by adding Zr of 60-100 ppm to an MgO protective layer. A first and second substrates(1,11) are disposed in parallel to each other. A plurality of address electrodes(3) are formed on the first substrate. A first dielectric layer(5) is formed on the first substrate in order to cover the address electrodes. A plurality of barrier ribs(7) are formed on the dielectric layer in order to form a discharge space. A phosphor layer(9) is formed within the discharge space. A plurality of display electrodes(13) are formed across the address electrodes on the second substrate. A second dielectric layer(15) is formed on the second substrate in order to cover the display electrodes. A protective layer(17) is formed to coat the second dielectric layer and includes MgO. The protective layer includes Zr of 60-100 ppm and Sn of 50-90 ppm.

Description

Plasma Display Panel {PLASMA DISPLAY PANEL}

1 is a cross-sectional view schematically showing the structure of a plasma display panel of the present invention.

Figure 2 is a graph showing the measurement of the discharge delay time according to the addition amount of Zr and Sn.

[Industrial use]

The present invention relates to a plasma display panel, and more particularly, to a plasma display panel with improved display quality.

[Prior art]

A plasma display panel is a display device using a plasma phenomenon. When a potential difference is applied between two contacts separated spatially in a gas atmosphere in a non-vacuum state, a discharge is generated, which is called a gas discharge phenomenon.

The plasma display device is a flat panel display device in which such gas discharge phenomenon is applied to image display, and basically has a matrix structure in which electrodes are opposed to two substrates filled with gas therebetween.

The plasma display device has a direct current type and an alternating current type, and among these, the AC type is most widely used.

The AC plasma display device has a basic structure in which electrodes are alternately arranged on two substrates filled with discharge gas and partitioned into partitions. A layer is formed.

The electrode, the partition, the dielectric layer, etc. are generally formed by a printing process in consideration of economical aspects, so that a thick film is formed, and thus the film formation state is considerably poorer than a thin film process.

Therefore, the sputtering of the electrons and ions generated by the discharge damages the dielectric layer and the lower electrode, thereby shortening the life of the AC plasma display device.

To solve this problem, in order to reduce the influence of ion bombardment during discharge, a protective film is formed on the dielectric layer with a thickness of about several hundred nm. In general, MgO is used as the protective film material. The protective film made of MgO lowers the discharge voltage and protects the dielectric layer by sputtering, thereby extending the life of the AC plasma display device.

The protective film is greatly changed in accordance with film forming conditions such as heat deposition, and thus it is difficult to maintain a constant display quality. That is, the passivation layer is likely to generate black noise due to an address discharge delay, that is, a discharge miss, a phenomenon in which a cell selected to emit light does not emit light. The occurrence of such black noise can easily occur at the boundary between the light emitting area and the non-light emitting area in the screen, but appears at a certain place, and the discharge miss is low in intensity when there is no address discharge or even scanning discharge is performed. Caused by

Therefore, various studies have been conducted to reduce the address discharge delay time.

An object of the present invention is to provide a plasma display panel with improved display quality.

In order to achieve the above object, the present invention comprises a first and second substrate disposed substantially parallel at any interval; A plurality of address electrodes formed on the first substrate; A first dielectric layer formed over the first substrate while covering the address electrodes; A plurality of partition walls provided with the first dielectric layer and having a predetermined height to form a discharge space; A fluorescent layer formed in the discharge space; A plurality of display electrodes disposed on one surface of the second substrate opposite to the first substrate in a direction crossing the address electrodes; The present invention provides a plasma display panel including a second dielectric layer formed on an entire surface of the second substrate and the second dielectric layer covering the display electrodes and including a protective film including MgO and Zr and Sn.

Hereinafter, the present invention will be described in more detail.

The present invention relates to a protective film in a plasma display panel. The passivation layer is to prevent the dielectric layer and the electrodes below it from being damaged by ion bombardment during discharge in the plasma display panel.

The protective film of this invention contains Zr and Sn with MgO which is a base material. As the protective film of the present invention includes such Zr and Sn, it is possible to improve electron emission capability and improve display quality. In addition, black noise, which is an address miss caused by an address discharge delay, that is, a phenomenon in which a cell selected to emit light does not emit light. It can easily occur at the boundary, but this phenomenon, which appears at certain places, can be improved by adding Zr and Sn during MgO protective film deposition. In addition, it is preferable to add Zr and Sn because the discharge start voltage and the discharge sustain voltage can be lowered.

In the protective film of the present invention, the Zr content is preferably 60 to 100 ppm, more preferably 70 to 80 ppm, based on the total weight of MgO. In addition, the content of Sn is preferably 50 to 90 ppm, more preferably 70 to 80 ppm relative to the total weight of the protective film. If the content of Zr and Sn is out of the above range, the black noise level (low discharge level, 250 nsec) or more, so that the response speed is slowed, there is a problem that the discharge characteristics are degraded.

As the MgO, it is preferable to use a polycrystal manufactured by a sintering method, since the Zr and Sn can be dissolved in a constant content as compared with using a single crystal material.

In this invention, 600 nm or more is preferable and, as for the thickness of the said protective film, 600-900 nm is more preferable. If the thickness of the protective film is thinner than 600 nm, there is a problem that the life is shortened, and if the thickness of the protective film is thicker than 900 nm, it may cause a problem of productivity, which is not preferable.

The protective film preferably has a transmittance of 90% or more. If the transmittance of the protective film is less than 90%, practical application is impossible, and since the minimum is more than 90%, it is not necessary to limit the maximum value. More preferably, the refractive index obtained at the wavelength of 640 nm is between 1.45 and 1.74. More effective results can be obtained when the crystal columnar structure is grown in the mixing direction. Thus, the protective film which has a crystal columnar structure is preferable because it is excellent not only in a lifetime characteristic but also an electron emission characteristic.

An example of the plasma display panel of the present invention having the protective film is shown in FIG. 1, but the structure of the plasma display panel of the present invention is not limited to FIG. 1.

As shown in FIG. 1, the plasma display panel of the present invention includes a first substrate 1 (rear substrate) and a second substrate 11 (front substrate) disposed substantially parallel to each other at arbitrary intervals.

A plurality of address electrodes 3 are formed on the first substrate 1 (back substrate) along one direction (Y direction in the drawing), and cover the address electrodes 3 to the first substrate 1. The first dielectric layer 5 is formed. A plurality of partitions 7 are formed on the first dielectric layer 5 between the address electrodes 3 at predetermined heights and form a discharge space, and the partitions 7 are open or closed as necessary. It can be formed as. Between each partition wall 7, phosphor layers 9 of red (R), green (G) and blue (B) colors are located. One surface of the second substrate 11 (front substrate) facing the first substrate 1 includes a pair of transparent electrodes 13a and bus electrodes 13b in a direction crossing the address electrodes 3. Display electrodes 13 are formed, covering the display electrodes 13 and including MgO on the dielectric layer 15 and the dielectric layer 7 over the entire second substrate 11 and including Zr and Sn. The protective film 17 of this invention is located.

Since the method of manufacturing the plasma display panel of the present invention having the above-described structure is well known in the art, detailed description thereof will be omitted since it is well understood by those skilled in the art. However, the main features of the present invention will be described in detail only for the forming process of the protective film.

The protective film of the present invention may be formed by a thick film printing method using a paste and a deposition method using a plasma. Among them, the thick film printing method is relatively weak to sputtering due to the impact of ions, and the discharge sustain voltage and discharge start by secondary electron emission. Since it is difficult to expect a reduction in voltage, it is preferable to use a deposition method using plasma.

As the method of forming the protective film by the plasma deposition method, an electron beam deposition method, an ion plating method, a magnetron sputtering method, or the like may be used, and an ion plating method is most preferable.

At this time, it is preferable to use it so that content of Zr which is an additive with respect to the total weight of MgO which is a main material used is 60-100 ppm, and it is more preferable to use so that it may be 70-80 ppm. In addition, it is preferable to use it so that content of Sn may be 50-90 ppm, and it is more preferable to use so that it may be 70-80 ppm.

Hereinafter, preferred examples and comparative examples of the present invention are described. However, the following examples are only one preferred embodiment of the present invention and the present invention is not limited to the following examples.

Experimental Examples 1 to 12

A display electrode was formed in a stripe shape in a conventional manner using an indium tin oxide conductor material on an upper substrate made of soda lime glass.

Subsequently, a paste of lead-based glass was coated over the entire surface of the upper substrate on which the display electrode was formed and baked to form a dielectric layer.

The upper panel was manufactured by preparing a protective film including MgO and Zr using the sputtering method on the dielectric layer. At this time, the amount of Zr added to MgO was changed as shown in Table 1 below.

(Experimental Examples 13 to 24)

Sn was carried out in the same manner as in Experiment 1 except that the amount added as shown in Table 1 below.

Discharge delay time according to the Zr and Sn addition amount of Experimental Examples 1 to 24 was measured and the results are shown in Table 1 and FIG. 2. In FIG. 2, the upper limit level means an upper limit level at which black noise does not appear.

Experimental Example 1 Experimental Example 2 Experimental Example 3 Experimental Example 4 Experimental Example 5 Experimental Example 6 Experimental Example 7 Experimental Example 8 Experimental Example 9 Experimental Example 10 Experimental Example 11 Experimental Example 12 Zr addition amount (ppm) 15 30 40 50 60 70 80 90 100 200 500 1000 Experimental Example 13 Experimental Example 14 Experimental Example 15 Experimental Example 16 Experimental Example 17 Experimental Example 18 Experimental Example 19 Experimental Example 20 Experimental Example 21 Experimental Example 22 Experimental Example 23 Experimental Example 24 Sn addition amount (ppm) 15 30 40 50 60 70 80 90 100 200 500 1000

As shown in FIG. 2, when the Zr addition amount is 60 to 100 ppm, and when the Sn addition amount is 50 to 90 ppm, the discharge delay time is about 80 to 220 nsec, which indicates that black noise does not appear. Therefore, it can be seen that the amount of Zr added is 60 to 100 ppm, and the amount of added Sn is 50 to 90 ppm in an optimum range.

(Example 1)

A display electrode was formed in a stripe shape in a conventional manner using an indium tin oxide conductor material on an upper substrate made of soda lime glass.

Subsequently, a paste of lead-based glass was coated over the entire surface of the upper substrate on which the display electrode was formed and baked to form a dielectric layer.

The upper panel was manufactured by preparing a protective film including MgO, Zr and Sn in the dielectric layer by using a sputtering method. At this time, the Zr content for MgO was 60ppm, and the Sn content was 55ppm. In addition, the protective film was formed to have a thickness of 7000 kPa, the transmittance of the protective film was 95%, and exhibited a refractive index of 1.65 at 640 nm.

As described above, the plasma display panel of the present invention can improve the electron emission ability and display quality by adding Zr to the MgO protective film in the range of 60 to 100 ppm, and can also obtain excellent results by adding 50 to 90 ppm of Sn. have.

Claims (11)

First and second substrates disposed substantially parallel at any interval; A plurality of address electrodes formed on the first substrate; A first dielectric layer formed over the first substrate while covering the address electrodes; A plurality of partition walls formed on the first dielectric layer and forming a discharge space; A fluorescent layer formed in the discharge space; A plurality of display electrodes disposed on one surface of the second substrate opposite to the first substrate in a direction crossing the address electrodes; A second dielectric layer formed over the second substrate while covering the display electrodes; And Coating the second dielectric layer, the protective layer including MgO; The protective film includes Zr 60 to 100 ppm and Sn 50 to 90 ppm. delete According to claim 1, The protective film is a plasma display panel comprising Zr in an amount of 70 to 80ppm relative to the total weight of MgO. delete According to claim 1, The protective film is a plasma display panel comprising Sn in an amount of 70 to 80ppm relative to the total weight of MgO. delete According to claim 1, The plasma display panel has a thickness of 600 to 900nm. delete According to claim 1, The protective film has a refractive index of 1.45 to 1.74 at 640nm. According to claim 1, The MgO is a poly crystal plasma display panel manufactured by the sintering method. According to claim 1, The protective film is a plasma display panel formed by the ion plating method.

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