KR100692025B1 - Apparatus and Method for Cleaning of Residual Phosphor Particle for Manufacturing of Plasma Display Panel - Google Patents

Abstract

The present invention relates to an apparatus and method for removing residual phosphor particles for plasma display panel manufacturing using the vacuum suction force to remove residual phosphor particles, and has an effect of reducing process time and manufacturing cost.

The present invention for achieving this purpose, the residual phosphor particles for removing the residual phosphor particles remaining on the screen mask surface for applying the red (R), green (G), blue (B) phosphor to the discharge space of the plasma display panel A removal apparatus, characterized in that it comprises a suction pump for providing a suction force for sucking the ambient air, and a suction nozzle for sucking the residual phosphor particles with the suction force provided by the suction pump.

Plasma display panel, phosphor, coating, screen mask, suction, nozzle

Description

Apparatus and Method for Cleaning of Residual Phosphor Particle for Manufacturing of Plasma Display Panel}

1 is a view showing the structure of a typical plasma display panel.

2 is a view for explaining a method of manufacturing a conventional plasma display panel.

3 is a view for explaining a method of forming a phosphor using a general screen mask.

4 is a view for explaining residual phosphor particles remaining in a screen mask.

5 is a view for explaining a conventional residual phosphor particle removal device and method.

6 is a view for explaining a method for removing residual phosphor particles for manufacturing a plasma display panel of the present invention.

Figure 7 is a view for explaining an application example of the residual phosphor particle removal device for producing a plasma display panel of the present invention.

8 is a view showing an example of the shape of the suction nozzle of FIG.

9A to 9B illustrate an example in which the suction nozzle of FIG. 7 is changed according to the shape of a screen mask.

<Explanation of symbols for the main parts of the drawings>

70: residual phosphor removal device 71: suction nozzle

72: suction pump 73: storage means

74: screen mask 75: pattern

76: residual phosphor particles

The present invention relates to a plasma display panel, and more particularly, to an apparatus and method for removing residual phosphor particles for manufacturing a plasma display panel using a vacuum suction force to remove residual phosphor particles.

In general, a plasma display panel is a partition wall formed between a front substrate and a rear substrate to form a unit cell, and each cell includes neon (Ne), helium (He), or a mixture of neon and helium (Ne + He) and The same main discharge gas and an inert gas containing a small amount of xenon (Xe) are filled. When discharged by a high frequency voltage, the inert gas generates vacuum ultraviolet rays and emits phosphors formed between the partition walls to realize an image. Such a plasma display panel has a spotlight as a next generation display device because of its thin and light configuration.

1 illustrates a structure of a general plasma display panel.

As shown in FIG. 1, a plasma display panel includes a front substrate on which a plurality of sustain electrode pairs formed by pairing a scan electrode 101 and a sustain electrode 102 on a front glass 100 that is a display surface on which an image is displayed. A rear substrate 11 having a plurality of address electrodes arranged so as to intersect the plurality of sustain electrode pairs on the rear glass 110 forming the back surface 10 and the rear surface is coupled in parallel with a predetermined distance therebetween.

The front substrate 10 is made of a scan electrode 101 and a sustain electrode 102, that is, a transparent electrode (a) formed of a transparent ITO material and a metal material to mutually discharge and maintain light emission of the cells in one discharge cell. The scan electrode 101 and the sustain electrode 102 provided as the bus electrode b are included in pairs. The scan electrode 101 and the sustain electrode 102 are covered by one or more dielectric layers 103 which limit the discharge current and insulate the electrode pairs, and the magnesium oxide top surface of the dielectric layer 103 to facilitate the discharge conditions. A protective layer 104 on which (MgO) is deposited is formed.

The rear substrate 11 is arranged in such a manner that a plurality of discharge spaces, that is, barrier ribs 111 of a stripe type (or well type) for forming discharge cells are maintained in parallel. In addition, a plurality of address electrodes 112 which perform address discharge to generate vacuum ultraviolet rays are arranged in parallel with the partition wall 111. On the upper side of the rear substrate 11, R, G, and B phosphors 113 which emit visible light for image display during address discharge are coated. A white dielectric 114 is formed between the address electrode 112 and the phosphor 113 to protect the address electrode 112 and reflect visible light emitted from the phosphor 113 to the front substrate 10.

Looking at the manufacturing method of the plasma display panel having such a structure as shown in FIG.

2 is a view for explaining a method of manufacturing a conventional plasma display panel.

As shown in FIG. 2, in the conventional method of manufacturing a plasma display panel, first, a discharge space is formed on a rear substrate (S20). For example, as shown in Figure 1, by forming a partition of a predetermined shape on the glass substrate for manufacturing the back substrate, a discharge space partitioned by each partition is formed.

R, G, B phosphors are applied to the discharge space formed in step S20 by screen printing (S21). In this case, when R (red), G (green), and B (blue) phosphors are applied, each of the R, G, and B phosphors is applied to a discharge space designated for each R, G, B phosphor. In order to do this, a screen mask is used. An example of a phosphor coating method using such a screen mask will be described with reference to FIG. 3.

Referring to FIG. 3, the phosphor supplied from the outside is applied to the discharge space 32 partitioned by the partition wall 31 having a predetermined shape on the rear substrate 30 through a predetermined pattern 34 formed on the screen mask 33. do. In this way, R, G, and B phosphors are applied to different discharge spaces, respectively.

Thereafter, the back substrate is manufactured through drying or a predetermined process (S22).

Here, the screen masks used to apply the R, G, and B phosphors to the designated discharge spaces in step S21, respectively, are not discarded after one use but are repeatedly used in a plurality of times. In order to use the screen mask once used again, the remaining phosphor particles attached to the screen mask in the R, G and B phosphor coating process are removed from the screen mask (S23). Here, the arrangement on the screen mask of the residual phosphor particles remaining in the screen mask will be described with reference to FIG. 4.

Referring to FIG. 4, phosphor particles 40 remain around a predetermined pattern 34 formed on the screen mask 33. The reason why the phosphor particles remain on the screen mask 33 is that the paste-like phosphor passes through the pattern 34 on the screen mask 33 and is influenced by the viscosity and surface tension of the paste-like phosphor. This is because some of the phosphor particles are attached around the pattern 34 of the screen mask 33. Here, the reason why the remaining phosphor particles 40 remaining in the screen mask 33 becomes a problem is that the aforementioned screen mask 33 is reused a plurality of times. That is, if a predetermined screen mask 33 is used to apply one of the R, G, and B phosphors to the discharge space, the predetermined screen mask 33 previously used in another phosphor applying process is transferred. It is used to apply the same phosphor to the discharge space.

Accordingly, as shown in FIG. 4, when the residual phosphor particles remaining in the screen mask 33 cannot be effectively removed, the above-mentioned residual phosphor particles are transferred to the discharge space in which the phosphors different from the phosphors are formed and are mixed to deteriorate the image quality. For example, when the screen mask used for applying the R phosphor is used to continuously apply the R phosphor without removing the residual phosphor particles, it may be caused by the viscosity or surface tension of the R phosphor in the paste state. The amount of R phosphor particles remaining on the surface of the above-described screen mask in the downward direction, that is, the direction in which the R phosphor particles are discharged, gradually increases. Accordingly, the remaining R phosphor particles remaining on the lower surface of the screen mask during the application of the R phosphors are transferred to the discharge space in which the adjacent G phosphor is formed or the discharge space in which the B phosphor is formed. As a result, different phosphor particles are mixed with each other, which seriously affects the discharge characteristics of the plasma display panel.

In order to solve this problem, the above-mentioned residual phosphor particles have been removed using a predetermined cleaning tape. Looking at the conventional apparatus and method for removing the residual phosphor particles as shown in FIG.

5 is a view for explaining a conventional residual phosphor particle removal apparatus and method.

As shown in FIG. 5, the conventional method of removing residual phosphor particles is performed by the phosphor particle removing apparatus 52 using a predetermined cleaning tape 51.

The phosphor particle removing device 52 cleans the remaining phosphor particles 40 remaining on the bottom surface of the screen mask 33 that has undergone the phosphor coating process by using a predetermined roller 50 to clean the tape 51. The remaining phosphor particles of the mask 33 are removed while moving along the surface where the phosphors are located. Here, the cleaning tape 51 described above has a predetermined adhesive force and is in close contact with the surface of the screen mask 33 by the roller 50 described above. Subsequently, according to the operation of the roller 50 described above, the cleaning tape 51 falls off the surface of the screen mask 33 and the remaining phosphor particles 40 remaining on the surface of the screen mask 33 are screened with a predetermined adhesive force. It is separated from the mask 33.

However, the residual phosphor particle removal method performed by the phosphor particle removal apparatus 52 using the cleaning tape 51 has a problem in that the unit cost of the cleaning tape 51 described above is relatively high, thereby increasing the manufacturing cost. For example, in the case of the multi-sided method of manufacturing a plurality of plasma display substrates using a single mother glass substrate, the larger-area cleaning is performed due to the characteristics of the multi-sided method using a larger area of the substrate. Tape 51 should be used. Accordingly, in the multi-faceted method, the cost is increased in the process of removing the residual phosphor particles 40, which further increases the manufacturing cost.

Furthermore, since the cleaning tape 51 used as a cleaning tape 51 for one-time use is difficult to reuse, and the predetermined residual phosphor particles removed by the cleaning tape 51 described above cannot be reused and must be discarded. There is a problem of increased manufacturing cost and waste of resources.

In order to solve this problem, an object of the present invention is to provide a residual phosphor particle removal apparatus and method for manufacturing a plasma display panel to remove the residual phosphor particles remaining on the surface of the screen mask with a predetermined suction force.

The present invention for achieving this purpose, the residual phosphor particles for removing the residual phosphor particles remaining on the screen mask surface for applying the red (R), green (G), blue (B) phosphor to the discharge space of the plasma display panel In the removal apparatus, the suction pump provides a suction force for sucking the ambient air, and a suction nozzle for suctioning the residual phosphor particles with the suction force provided by the suction pump.

And storage means for storing the residual phosphor particles sucked into the suction nozzle.

The suction pump is characterized in that the vacuum pump.

The suction nozzle may be configured to suck residual phosphor particles on the surface of the screen mask while moving in a state spaced apart from the surface of the screen mask by a predetermined distance.

The width of the suction nozzle in the direction perpendicular to the traveling direction on the screen mask is larger than the width of the screen mask.

In addition, the present invention for achieving this purpose, residual to remove the residual phosphor particles remaining on the screen mask surface for applying the red (R), green (G), blue (B) phosphor to the discharge space of the plasma display panel A method for removing phosphor particles, the method comprising: inhaling and removing residual phosphor particles on the screen mask surface with a suction force for sucking air on the screen mask surface.

And after inhaling and removing the residual phosphor particles on the screen mask surface, storing the inhaled residual phosphor particles.

Hereinafter, an apparatus and a method for removing residual phosphor particles for manufacturing a plasma display panel of the present invention will be described in detail with reference to the accompanying drawings.

6 is a view for explaining a method for removing residual phosphor particles for manufacturing a plasma display panel of the present invention.

As shown in FIG. 6, the method for removing residual phosphor particles for manufacturing a plasma display panel of the present invention first includes a screen for applying red (R), green (G), and blue (B) phosphors to a discharge space of a plasma display panel. Residual phosphor particles remaining on the mask surface are sucked and removed by the suction force for sucking air on the screen mask surface (S60).

The remaining phosphor particles sucked in this way are stored in a predetermined storage means (S61), and the remaining phosphor particles thus stored are reused later (S62). The reason why the inhaled phosphor particles can be reused is that the screen mask used to apply one phosphor, such as the R phosphor, is then used to apply the R phosphor, but not to apply the other phosphors, namely the G and B phosphors. Therefore, the phosphors sucked from the screen masks used to apply the same phosphor are not mixed with the same phosphors and thus can be used.

In the method of removing residual phosphor particles for plasma display panel manufacturing, a residual phosphor particle removing apparatus having a predetermined suction force for suction of the residual phosphor particles is used. Looking at the application of such a residual phosphor particle removal device as shown in FIG.

7 is a view for explaining an application example of the residual phosphor particle removal device for manufacturing a plasma display panel of the present invention.

As shown in FIG. 7, the residual phosphor particle removing device 70 having a predetermined air suction force sucks and removes the remaining phosphor particles 76 remaining on the surface of the screen mask 74 on which the predetermined pattern 75 is formed. do. Here, when the above-mentioned screen mask 74 coats R, G, and B phosphors, R, G, and B phosphors are supplied from the top surface of the screen mask 74, and the bottom surface of the screen mask 74 is used to supply the R, G, and B phosphors. The remaining phosphor particles 76 are mainly located on the bottom surface of the screen mask 74 because they are applied to the discharge space. Therefore, in order to suck and remove the residual phosphor particles 76 more effectively, the above-described residual phosphor particle removal device 70 further sucks the residual phosphor particles 76 in a state in which the residual phosphor particles are located in the lower surface direction of the screen mask 74. desirable.

Here, the above-described residual phosphor particle removal device 70 is a suction pump 72 for providing a suction force for sucking the ambient air, and a suction for sucking the residual phosphor particles 76 with the suction force provided by the suction pump 72. And a nozzle 71. Here, the suction pump 72 is to provide a suction force for sucking the ambient air is preferably a vacuum pump. Referring to the operation of the residual phosphor particle removal device 70, when the suction force generated by the suction pump 72 is transmitted to the screen mask 74 through the suction nozzle 71, the above-mentioned surface around the screen mask 74 Air is sucked into the suction nozzle 71. Then, the remaining phosphor particles on the surface of the screen mask 74 are also mixed with the air sucked into the suction nozzle 71 and sucked into the suction nozzle 71.

Residual phosphor particles sucked into the suction nozzle 71 through this process can be reused. In order to collect and store the reusable phosphor particles 76, the residual phosphor particle removal device 70 further includes a storage means 73. It is preferable to store the remaining phosphor particles 76 in such storage means 73.

Here, the above-described suction nozzle 71 sucks and removes the remaining phosphor particles 76 on the surface of the screen mask 74 while moving in a state spaced apart from the surface of the screen mask 74 by a predetermined distance. In addition, the suction nozzle 71 may be formed in various shapes. An example of the shape of the suction nozzle 71 is as follows.

8 is a diagram illustrating an example of a shape of a suction nozzle of FIG. 7.

As shown in FIG. 8, the suction nozzle 71 has a shape having a relatively longer length in the lateral direction, for example, to suck in a larger area of residual phosphor particles in a shorter time. The shape of the suction nozzle 71 may be variously changed according to the area, size, width, etc. of the screen mask. An example of the suction nozzle 71 whose shape is changed according to the screen mask will be described with reference to FIGS. 9A to 9B.

9A to 9B are views illustrating an example in which the suction nozzle of FIG. 7 is changed according to the shape of the screen mask.

First, referring to FIG. 9A, the width of the suction nozzle 71 of the residual phosphor particle removing device 70, that is, the width in the vertical direction in the advancing direction on the screen mask 74 of the suction nozzle 71 is the screen mask 74. Is smaller than the width in the horizontal direction, that is, the width in the longitudinal direction in the advancing direction of the suction nozzle 71 of the screen mask 74. In this case, it is preferable to manufacture the suction nozzle 71 having a size large enough to allow the screen mask 74 described above to be relatively large and to suck all the residual phosphors on the surface of the large screen mask 74 in one operation. Applicable in the case of generating a relatively higher unit price increase.

9b, the width of the suction nozzle 71 of the residual phosphor particle removing device 70, that is, the traveling direction on the screen mask 74 of the suction nozzle 71, that is, the direction perpendicular to the direction indicated by the arrow is The width of the screen mask 74 in the horizontal direction, that is, the width of the screen mask 74 in the longitudinal direction in the advancing direction of the suction nozzle 71 is formed larger. In this case, since the remaining phosphor on the surface of the screen mask 74 can be sucked up in one operation, the process time can be shortened.

As described above, those skilled in the art will appreciate that the present invention can be implemented in other specific forms without changing the technical spirit or essential features.

Therefore, the above-described embodiments are to be understood as illustrative and not restrictive in all respects, and the scope of the present invention is indicated by the appended claims rather than the detailed description, and the meaning and scope of the claims and All changes or modifications derived from the equivalent concept should be interpreted as being included in the scope of the present invention.

As described in detail above, the present invention removes residual phosphor particles remaining on the surface of the screen mask with a predetermined suction force, thereby reducing process time and reducing manufacturing costs.

Claims (7)

A residual phosphor particle removal apparatus for removing residual phosphor particles remaining on a screen mask surface for applying red (R), green (G), and blue (B) phosphors to a discharge space of a plasma display panel. A suction pump providing suction power to suck ambient air; Suction nozzle for sucking the residual phosphor particles with the suction force provided by the suction pump Residual phosphor particle removal device for manufacturing a plasma display panel comprising a. The method of claim 1, And a storage means for storing the residual phosphor particles sucked into the suction nozzle. The method of claim 1, The suction pump is Residual phosphor particle removal device for plasma display panel production, characterized in that the vacuum pump. The method of claim 1, The suction nozzle Residual phosphor particles removal apparatus for manufacturing a plasma display panel, characterized in that for sucking the remaining phosphor particles on the surface of the screen mask while moving in a state spaced apart from the surface of the screen mask. The method according to any one of claims 1 to 4, And a width in a direction perpendicular to the advancing direction on the screen mask of the suction nozzle is larger than the width of the screen mask. A method of removing residual phosphor particles in which residual phosphor particles remaining on a screen mask surface for applying red (R), green (G), and blue (B) phosphors to a discharge space of a plasma display panel are removed. And removing and removing residual phosphor particles on the screen mask surface with suction force for sucking air on the screen mask surface. The method of claim 6, And storing the sucked residual phosphor particles after suctioning and removing the residual phosphor particles on the screen mask surface.

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