KR100681493B1 - Antireflective Coating Composition with Excellent Stain Resistance - Google Patents

Antireflective Coating Composition with Excellent Stain Resistance Download PDF

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KR100681493B1
KR100681493B1 KR1020050030995A KR20050030995A KR100681493B1 KR 100681493 B1 KR100681493 B1 KR 100681493B1 KR 1020050030995 A KR1020050030995 A KR 1020050030995A KR 20050030995 A KR20050030995 A KR 20050030995A KR 100681493 B1 KR100681493 B1 KR 100681493B1
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coating composition
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KR20060045700A (en
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이영은
한미영
장영래
홍정진
장성훈
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주식회사 엘지화학
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    • C09D183/04Polysiloxanes
    • C09D183/08Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01QANTENNAS, i.e. RADIO AERIALS
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    • H01Q1/241Supports; Mounting means by structural association with other equipment or articles with receiving set used in mobile communications, e.g. GSM
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    • C09D165/00Coating compositions based on macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain; Coating compositions based on derivatives of such polymers
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    • H01R24/00Two-part coupling devices, or either of their cooperating parts, characterised by their overall structure
    • H01R24/38Two-part coupling devices, or either of their cooperating parts, characterised by their overall structure having concentrically or coaxially arranged contacts
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    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/22Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
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    • C08L83/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
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    • GPHYSICS
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    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
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Abstract

본 발명은 오염 제거가 용이하고, 반사 방지 기능을 가지는 코팅층을 형성하기 위한 코팅 조성물에 관한 것으로, 알콕시실란, 불소계 실란, 촉매, 물, 및 유기 용매로부터 제조되는 졸-겔 반응물, 및 전도성 고분자를 포함하는 디스플레이 반사방지용 코팅 조성물에 관한 것이다.BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a coating composition for forming a coating layer that is easily decontaminated and has an antireflection function. The present invention relates to a sol-gel reactant prepared from alkoxysilane, fluorine-based silane, catalyst, water, and an organic solvent, and a conductive polymer. It relates to a display antireflective coating composition comprising.

본 발명의 코팅 조성물은 코팅층의 굴절률, 표면에너지, 전도성을 제어하여 반사방지특성과 지문 등의 액성 오염물질에 대한 지움성, 및 먼지제거성을 동시에 발휘할 수 있기 때문에 디스플레이 반사 방지용 코팅기재로 유용하게 사용할 수 있다. The coating composition of the present invention is useful as a display anti-reflective coating substrate because it can exhibit the anti-reflective property and the removal property against liquid contaminants such as fingerprints and dust removal by controlling the refractive index, surface energy and conductivity of the coating layer. Can be used.

반사방지, 코팅 조성물, 불소계 실란, 전도성 고분자 Anti-reflective, Coating composition, Fluorine-based silane, Conductive polymer

Description

오염 제거가 용이한 디스플레이 반사 방지용 코팅 조성물{Antireflective Coating Composition with Excellent Stain Resistance}Antireflective Coating Composition with Excellent Stain Resistance

[산업상 이용분야][Industrial use]

본 발명은 오염 제거가 용이하고, 반사 방지 기능을 가지는 코팅층을 형성하기 위한 코팅 조성물에 관한 것으로, 보다 상세하게는 표면 장력이 낮은 불소계 실란, 대전 방지 특성을 지닌 전도성 고분자 및 용매를 포함하는 코팅 조성물에 관한 것이다.The present invention relates to a coating composition for easily decontamination and to form a coating layer having an antireflection function, and more particularly, to a coating composition comprising a fluorine-based silane having a low surface tension, a conductive polymer having an antistatic property, and a solvent. It is about.

[종래기술] [Private Technology]

모니터용 CRT, TV용 CPT와 같은 브라운관, TFT-LCD 편광판, PDP 필터, RPTS 필터, 휴대폰 액정으로부터 시계, 사진, 액자 등에 이르기까지 다양한 디스플레이들이 우리 생활에서 접해지고 있다. 이러한 디스플레이가 자연광 등의 빛에 노출되는 경우 반사광에 의해 눈이 피로감을 느끼거나 두통을 유발하게 되며, 디스플레이 내부에서 만들어지는 이미지가 눈에 선명하게 맺히지 못하여 컨트라스트(contrast)의 저하가 발생한다.Displays such as CRTs for monitors, CRTs such as CPTs for TVs, TFT-LCD polarizers, PDP filters, RPTS filters, cell phones, liquid crystals, clocks, photographs, picture frames, etc. are being encountered in our lives. When the display is exposed to light such as natural light, the eyes may feel tired or cause headaches due to the reflected light, and the image produced inside the display may not be clearly formed in the eye, resulting in a decrease in contrast.

이를 해결하기 위하여, 소멸간섭을 유도하여 반사율을 감소시키는 저반사 코 팅층을 개발하고자 하는 연구들이 있었다. 일본공개특허 제97-208898호, 일본공개특허 제96-122501호 등에서는 굴절률 1.28~1.38의 저반사층을 규산화합물과 마그네슘 플로라이드(MgF2, Magnesium Fluoride)의 금속불화물을 이용하여 제조하였고, 유럽특허 제776925호에서는 불소계 실란과 불소계 알킬기를 갖는 화합물을 이용하여 저반사 기능 및 표면에너지 저하에 따른 내오염 기능을 갖는 코팅액의 제조에 관하여 개시하고 있다.In order to solve this problem, there have been studies to develop a low reflection coating layer which reduces the reflectance by inducing extinction interference. In Japanese Patent Laid-Open No. 97-208898, Japanese Patent Laid-Open No. 96-122501, etc., a low reflection layer having a refractive index of 1.28-1.38 was prepared using a silicic acid compound and a metal fluoride of magnesium fluoride (MgF 2 ). Patent No. 776925 discloses the preparation of a coating liquid having a low reflection function and a fouling resistance function according to a decrease in surface energy by using a compound having a fluorine silane and a fluorine alkyl group.

그러나, 금속불화물이나 불소가 도입된 저반사층은 마찰 등의 대전에 의하여 표면에 쉽게 전하를 띠게 되어 먼지가 잘 붙고, 한번 붙은 먼지는 쉽게 떨어지지 않는 단점을 가지고 있다. 특히, 저반사층은 보통 디스플레이의 최외곽에 위치하므로 지문, 먼지 등의 오염원에 대하여 내성을 가져야 한다. 이때 내성을 가진다는 것은 표면에너지가 낮아 지문 등이 쉽게 묻지 않고, 표면의 전하가 상쇄되거나 머무르지 않고 흐르게 되어 정전기적 인력에 의하여 먼지가 붙지 않도록 하는 것을 의미한다.However, the low reflection layer into which the metal fluoride or fluorine is introduced has a disadvantage that the charge easily adheres to the surface by friction or the like, and the dust adheres well, and the dust once adhered does not fall easily. In particular, since the low reflection layer is usually located at the outermost side of the display, it should be resistant to contamination sources such as fingerprints and dust. In this case, having resistance means that the surface energy is low and fingerprints are not easily attached, and the charge on the surface flows without being offset or stayed so that dust does not adhere to the electrostatic attraction.

따라서, 표면에 정전하를 띠지 않게 하여 먼지 등이 부착되는 것을 방지하기 위한 방법들이 보고된 바 있다. 일본공개특허 제94-65529호에서는 주석이 도핑된 산화 인듐(Tin-doped indium oxide, ITO), 안티몬이 도핑된 산화 주석(Antimony-doped tin oxide, ATO), 안티몬이 도핑된 산화 아연(Antimony-doped zinc oxide, AZO) 등의 전도성 산화금속 필러를 이용하였으나, 전도성 산화금속을 이용할 경우 대체적으로 굴절률이 높아 반사 방지 효과를 기대할 수 없고 지문 등의 액성 오염 원에 대한 제거 능력이 구현되지 않는다.Therefore, there have been reported methods for preventing the adhesion of dust and the like by not applying a static charge on the surface. Japanese Patent Application Laid-Open No. 94-65529 discloses tin-doped indium oxide (ITO), antimony-doped tin oxide (ATO), antimony-doped zinc oxide (Antimony- Conductive metal oxide fillers such as doped zinc oxide (AZO) are used, but when the conductive metal oxide is used, the refractive index is generally high and antireflection effects cannot be expected and the ability to remove liquid contaminants such as fingerprints is not realized.

또한, 일본공개특허 제2003-215306호에서는 양전하와 음전하가 공존하는 관능기와 불소화합물을 도입하여 먼지 등의 고상 오염원과 지문 등의 액상 오염원의 제거 능력을 향상시키고자 하였으나, 계절적 환경에 민감한 특성을 보이며 액상 오염원에 대한 제거성이 저하되는 단점이 있다. In addition, Japanese Patent Application Laid-Open No. 2003-215306 attempts to improve the ability to remove solid contaminants such as dust and liquid contaminants such as fingerprints by introducing functional groups and fluorine compounds in which positive and negative charges coexist, but they are sensitive to seasonal environment. There is a disadvantage in that the removal to the liquid pollution source is lowered.

따라서, 코팅층의 굴절률, 표면에너지, 전도성을 제어하여 반사 방지 특성과 지문 등의 액성 오염 물질에 대한 지움성, 먼지 제거성을 동시에 발휘할 수 있는 디스플레이 반사 방지용 코팅 조성물의 개발이 절실히 요구되어 왔다.Therefore, there is an urgent need to develop a display anti-reflective coating composition capable of simultaneously controlling the refractive index, surface energy, and conductivity of the coating layer to exhibit anti-reflective properties, erosion of liquid contaminants such as fingerprints, and dust removal.

상기와 같은 문제점을 해결하기 위하여, 본 발명은 낮은 굴절률로 인한 반사방지기능을 부여하면서 동시에 낮은 표면에너지와 대전방지를 통한 오염제거가 용이하며, 디스플레이 전면에 적합하게 적용할 수 있는 코팅층을 형성하기 위한 디스플레이 반사방지용 코팅조성물을 제공하는데 그 목적이 있다.In order to solve the above problems, the present invention provides antireflection function due to low refractive index and at the same time easy to remove the contamination through low surface energy and antistatic, to form a coating layer that can be suitably applied to the front of the display To provide a display antireflective coating composition for that purpose.

상기 목적을 달성하기 위하여, 본 발명은 (a) (i) 알콕시실란 0.3 내지 15 중량부, (ii) 불소계 실란 0.1 내지 10 중량부, (iii) 촉매 0.001 내지 0.5 중량부, (iv) 물 0.01 내지 10 중량부, 및 (v) 유기용매 20 내지 99.5 중량부로부터 제조되는 졸-겔 반응물, 및 (b) 전도성 고분자 0.02 내지 50 중량부를 포함하는 디스플레이 반사반지용 코팅 조성물을 제공한다.In order to achieve the above object, the present invention is (a) 0.3 to 15 parts by weight of (i) alkoxysilane, (ii) 0.1 to 10 parts by weight of fluorine-based silane, (iii) 0.001 to 0.5 parts by weight of catalyst, (iv) water 0.01 To 10 parts by weight, and (v) a sol-gel reactant prepared from 20 to 99.5 parts by weight of an organic solvent, and (b) 0.02 to 50 parts by weight of a conductive polymer.

이하, 본 발명에 대하여 상세히 설명한다.EMBODIMENT OF THE INVENTION Hereinafter, this invention is demonstrated in detail.

본 발명자들은 낮은 굴절률로 인한 반사방지기능을 부여하면서 동시에 낮은 표면에너지와 대전방지를 통한 오염제거가 용이하여 디스플레이 전면에 적합하게 적용할 수 있는 코팅 조성물을 개발하던 중, 기본적인 코팅 필름의 기계적 물성을 구현하기 위한 알콕시실란, 굴절률이 낮으면서 액상 오염원의 제거 용이성이 우수한 불소계 실란 및 먼지 등의 고상 오염원의 제거 기능을 부여하기 위해서 필름의 표면에 대전방지 효과를 지니도록 하는 전도성 고분자를 포함하는 코팅 조성물을 개발하여 본 발명을 완성하게 되었다.The inventors of the present invention are developing a coating composition that can be applied to the front surface of a display by providing anti-reflection function due to low refractive index and at the same time easy to remove contamination through low surface energy and antistatic property. Alkoxysilane for implementation, a coating composition comprising a conductive polymer to have an antistatic effect on the surface of the film in order to give a removal function of the solid contaminants such as fluorine-based silane and dust having a low refractive index and excellent ease of removal of liquid contaminants It was developed to complete the present invention.

본 발명의 디스플레이 반사 방지용 코팅 조성물은 (a) (i) 알콕시실란 0.3 내지 15 중량부, (ii) 불소계 실란 0.1 내지 10 중량부, (iii) 촉매 0.001 내지 0.5 중량부, (iv) 물 0.01 내지 10 중량부, 및 (v) 유기용매 20 내지 99.5 중량부로부터 제조되는 졸-겔 반응물, 및 (b) 전도성 고분자 0.02 내지 50 중량부를 포함한다. The antireflective coating composition of the present invention comprises (a) 0.3 to 15 parts by weight of (i) alkoxysilane, (ii) 0.1 to 10 parts by weight of fluorine silane, (iii) 0.001 to 0.5 parts by weight of catalyst, and (iv) 0.01 to water. 10 parts by weight, and (v) a sol-gel reactant prepared from 20 to 99.5 parts by weight of an organic solvent, and (b) 0.02 to 50 parts by weight of a conductive polymer.

상기 알콕시실란은 디스플레이 최외각에 사용될 수 있는 수준의 필름 강도를 제공하기 위한 성분으로, 4관능 규소화합물인 테트라메톡시실란, 테트라에톡시실란, 3관능 규소화합물인 메틸트리메톡시실란, 메틸트리에톡시실란, 글리시독시프로필 트리메톡시실란, 글리시독시프로필 트리에톡시실란 등이 사용될 수 있다. The alkoxysilane is a component for providing a film strength of the level that can be used for the outermost display, tetramethoxysilane, tetraethoxysilane, tetraethoxysilane, methyltrimethoxysilane, trimethylsilicon, Ethoxysilane, glycidoxypropyl trimethoxysilane, glycidoxypropyl triethoxysilane, and the like can be used.

상기 졸-겔 반응물의 제조에 사용되는 알콕시실란의 함량이 0.3 중량부 미만인 경우에는 디스플레이용 코팅막의 경도를 유지하기 어렵고, 15 중량부를 초과하는 경우에는 코팅막의 경화도가 높아 컬링(curling)이 유발될 수 있으며, 기재와 코팅막의 부착력이 저하될 수 있다. When the content of the alkoxysilane used in the preparation of the sol-gel reactant is less than 0.3 parts by weight, it is difficult to maintain the hardness of the coating film for display, and when it exceeds 15 parts by weight, the curing degree of the coating film is high, which may cause curling. The adhesion between the substrate and the coating film may be reduced.

상기 졸-겔 반응물의 제조에 사용되는 불소계 실란은 굴절률을 낮게 하고 액상 오염원의 제거를 용이하게 하는 성분으로, 트리데카플루오로옥틸트리에톡시실란(상품명: DYNASYLAN F8261, Degussa-Huls사), 헵타데카플루오로데실트리메톡시실란(상품명: TSL8233, Toshiba silicon사; KBM-7803, Shinetsu사), 헵타데카플루오로데실트리이소프로폭시실란(상품명: XC95-A9715, Toshiba Silicone사) 등이 사용될 수 있다. Fluorine-based silane used in the preparation of the sol-gel reactant is a component that lowers the refractive index and facilitates the removal of liquid contaminants, tridecafluorooctyltriethoxysilane (trade name: DYNASYLAN F8261, Degussa-Huls), hepta Decafluorodecyltrimethoxysilane (trade name: TSL8233, Toshiba silicon; KBM-7803, Shinetsu), heptadecafluorodecyltriisopropoxysilane (trade name: XC95-A9715, Toshiba Silicone) have.

상기 졸-겔 반응물의 제조에 사용되는 불소계 실란의 함량이 0.1 중량부 미만인 경우에는 코팅막의 굴절률 제어 및 내오염성의 효과가 미미하고, 10 중량부를 초과인 경우에는 필름의 강도가 저하될 수 있다..When the content of the fluorine-based silane used in the preparation of the sol-gel reactant is less than 0.1 part by weight, the refractive index control and fouling resistance of the coating film are insignificant, and when the content is greater than 10 parts by weight, the strength of the film may be reduced. .

또한, 상기 불소계 실란은 알콕시실란과 불소계 실란을 합한 전체 실란 대비 10 내지 50 중량%로 사용되는 것이 바람직한데, 10 중량% 미만을 사용하는 경우에는 굴절률 제어 및 액상 오염원의 제거 효과가 미미하고, 50 중량%를 초과하여 사용하는 경우에는 졸-겔 반응에 의한 적정 분자량의 제어가 어렵고 필름의 강도가 저하될 수 있다.In addition, the fluorine-based silane is preferably used in an amount of 10 to 50% by weight compared to the total silane of the alkoxysilane and the fluorine-based silane. When using less than 10% by weight, the effect of controlling the refractive index and removing the liquid pollutant is insignificant, 50 In the case where it is used in an amount exceeding% by weight, it is difficult to control the appropriate molecular weight by the sol-gel reaction and the strength of the film may be lowered.

또한, 상기 유기용매의 함량이 20 중량부 미만이거나, 99.5 중량부를 초과하는 경우에는 코팅성이 저하될 수 있다. In addition, when the content of the organic solvent is less than 20 parts by weight or more than 99.5 parts by weight, the coating property may be reduced.

상기 유기용매는 알코올류, 셀로솔브류, 케톤류, 또는 이들 중에서 선택되는 둘 이상의 혼합용매인 것이 바람직하다. 상기 알코올류 용매의 바람직한 예로는 메탄올, 에탄올, 프로판올 및 부탄올로 이루어진 군에서 선택되는 1종 이상이 있고, 상기 셀로솔브류 용매의 바람직한 예로는 에틸 셀로솔브, 부틸 셀로솔브, 헥실 셀로솔브, 메틸 셀로솔브 및 이소프로폭시 셀로솔브로 이루어진 군에서 선택되는 1종 이상이 있으며, 상기 케톤류 용매의 바람직한 예로는 아세톤, 메틸에틸케톤, 디아세톤알코올 및 메틸이소부틸케톤으로 이루어진 군에서 선택되는 1종 이상이 있다. The organic solvent is preferably alcohols, cellosolves, ketones, or two or more mixed solvents selected from these. Preferred examples of the alcohol solvent include at least one selected from the group consisting of methanol, ethanol, propanol and butanol, and preferred examples of the cellosolve solvents include ethyl cellosolve, butyl cellosolve, hexyl cellosolve, and methyl cello. There is at least one selected from the group consisting of sorb and isopropoxy cellosolve, a preferred example of the ketone solvent is at least one selected from the group consisting of acetone, methyl ethyl ketone, diacetone alcohol and methyl isobutyl ketone have.

상기 코팅 조성물의 졸-겔 반응물에 포함되는 불소계 실란과 상기 전도성 고분자는 서로간의 상용성이 좋지 못하여 코팅 조성물 내에서 상 분리를 일으킬 염려가 있다. 따라서, 디스플레이 반사 방지용 코팅 조성물 내에서 상기 불소계 실란과 전도성 고분자의 상분리 현상을 억제하기 위해서는 상기 유기용매가 저비점(약 100 ℃ 이하) 용매인 알코올류 용매를 포함하며, 중비점(약 100 ℃ 내지 150 ℃) 용매인 케톤류 용매, 및 셀로솔브류 용매로 이루어진 군에서 선택되는 1종 이상을 더 포함하는 혼합용매인 것이 바람직하다. 상기 혼합용매에 포함되는 상기 중비점 용매의 함량은 혼합용매의 총중량에 대하여 30 중량% 이하인 것이 바람직하고, 1 내지 20 중량%인 것이 더 바람직하다. 상기 혼합용매의 중비점 용매의 함량이 30 중량%를 초과하는 경우에는 불소계 실란과 전도성 고분자의 상분리가 일어날 수 있으며 용액의 건조시간이 길어져 건조가 안 될 수 있다. The fluorine-based silane and the conductive polymer included in the sol-gel reactant of the coating composition may not have good compatibility with each other and may cause phase separation in the coating composition. Accordingly, in order to suppress phase separation between the fluorine-based silane and the conductive polymer in the display antireflective coating composition, the organic solvent includes an alcohol solvent which is a low boiling point (about 100 ° C. or less) solvent, and has a medium boiling point (about 100 ° C. to 150 ° C.). It is preferable that it is a mixed solvent further containing 1 or more types chosen from the group which consists of a ketone solvent which is C) solvent, and a cellosolve solvent. The content of the middle boiling point solvent included in the mixed solvent is preferably 30% by weight or less, more preferably 1 to 20% by weight based on the total weight of the mixed solvent. When the content of the middle boiling point solvent of the mixed solvent exceeds 30% by weight, phase separation of the fluorine-based silane and the conductive polymer may occur and the drying time of the solution may not be dried.

상기 촉매는 질산, 염산, 초산 등의 산, 또는 이들의 염이 사용될 수 있고, 상기 산과 염의 혼합물이 사용될 수 있으며, 이때 사용 가능한 염으로는 지르코늄, 인듐 등의 염산염, 질산염, 황산염, 초산염 등이 있다. 이때, 상기 촉매는 0.001 내지 0.5 중량부로 사용하는 것이 바람직하며, 0.001 중량부 미만을 사용하는 경우에는 졸-겔 반응시간의 제어에 문제가 있고, 0.5 중량부를 초과하여 사용하는 경우 에는 용액의 산도가 높아져 부식의 문제가 있다. The catalyst may be an acid such as nitric acid, hydrochloric acid, acetic acid, or a salt thereof, and a mixture of the acid and the salt may be used. The salts available may include hydrochlorides such as zirconium and indium, nitrates, sulfates, acetates, and the like. have. In this case, the catalyst is preferably used in 0.001 to 0.5 parts by weight, when using less than 0.001 parts by weight, there is a problem in controlling the sol-gel reaction time, when using more than 0.5 parts by weight of the acidity of the solution There is a problem of corrosion.

상기 물은 가수분해 반응과 축합 반응을 위해서 필요한 성분으로, 0.01 내지 10 중량%로 사용되는 것이 바람직하다. 0.01 중량부 미만을 사용하는 경우에는 졸-겔 반응시간의 제어에 문제가 있고, 10 중량%를 초과하여 사용하는 경우에는 코팅성에 문제가 있다. The water is a component necessary for the hydrolysis reaction and the condensation reaction, it is preferably used in 0.01 to 10% by weight. When using less than 0.01 parts by weight, there is a problem in controlling the sol-gel reaction time, and when used in excess of 10% by weight, there is a problem in coating property.

상기 전도성 고분자는 먼지 등의 고상 오염원의 제거 기능을 부여하기 위해서 필름의 표면에 대전방지 효과를 지니도록 하는 성분으로, 폴리에틸렌디옥시티오펜 수지 등과 같은 폴리티오펜계 수지를 사용하는 것이 바람직하다. 특히, 폴리티오펜 수지에 전도성 향상을 위하여 글루타민산, 알킬 술폰산, 폴리스티렌 술폰산 음이온, 스틸렌 술폰산과 스틸렌 술폰산 음이온 공중합체 등과 같은 도핑(doping)제를 첨가할 수 있다. 현재 상업화 되어 널리 사용되고 있는 전도성 고분자로는 폴리에틸렌디옥시티오펜-폴리스티렌설포네이트의 구조를 갖는 바이엘사의 베이트론 P(Baytron P), PH, P HS, P HC, P ET V2 등이 있고, 2종 이상 혼합하여 사용할 수도 있다. The conductive polymer is a component to have an antistatic effect on the surface of the film in order to give a function of removing solid contaminants such as dust, it is preferable to use a polythiophene-based resin such as polyethylene dioxythiophene resin. In particular, a doping agent such as glutamic acid, alkyl sulfonic acid, polystyrene sulfonic acid anion, styrene sulfonic acid and styrene sulfonic acid anion copolymer, or the like may be added to the polythiophene resin to improve conductivity. Presently commercialized and widely used conductive polymers include Bayerron P (Baytron P), PH, P HS, P HC, PET V2, etc. having a structure of polyethylenedioxythiophene-polystyrenesulfonate, and two or more kinds thereof. It can also be mixed and used.

상기 전도성 고분자의 함량이 0.02 중량부 미만인 경우에는 먼지 등의 고상 오염원에 대한 제거 용이성이 저하될 수 있고, 50 중량부를 초과하여 사용하는 경우에는 필름의 강도가 저하될 수 있다.When the content of the conductive polymer is less than 0.02 parts by weight, the ease of removal of solid contaminants such as dust may be reduced, and when used in excess of 50 parts by weight, the strength of the film may be reduced.

본 발명의 디스플레이 반사방지용 코팅 조성물을 제조하기 위하여, (a) (i) 알콕시실란 0.3 내지 15 중량부, (ii) 불소계 실란 0.1 내지 10 중량부, (iii) 촉매 0.001 내지 0. 5 중량부, (iv) 물 0.01 내지 10 중량부, 및 (v) 유기 용매 20 내지 99.5 중량부를 포함하는 혼합물을 15 내지 90℃에서 0.5 내지 40시간 동안 pH 1 내지 3에서 졸-겔 반응을 수행한다. 이때, 졸-겔 반응을 수행한 후 최종반응물의 분자량은 2,000 내지 20,000정도로 조정하는 것이 필름의 건조 및 경화에 유리하다. 상기 제조된 졸-겔 반응물에 (b) 전도성 고분자 0.02 내지 50 중량부를 첨가하여 코팅 조성물을 제조한다. In order to prepare a display antireflective coating composition of the present invention, (a) 0.3 to 15 parts by weight of (i) alkoxysilane, (ii) 0.1 to 10 parts by weight of fluorine-based silane, (iii) 0.001 to 0.5 parts by weight of catalyst, The sol-gel reaction is carried out at 15 to 90 ° C. for 0.5 to 40 hours at 15 to 90 ° C. with a mixture comprising (iv) 0.01 to 10 parts by weight of water and (v) 20 to 99.5 parts by weight of organic solvent. In this case, it is advantageous to dry and cure the film after the sol-gel reaction to adjust the molecular weight of the final reactant to about 2,000 to 20,000. (B) 0.02 to 50 parts by weight of the conductive polymer is added to the prepared sol-gel reactant to prepare a coating composition.

상기 코팅 조성물 전체 중에서 고형분 함량은 0.5 내지 30 중량%인 것이 바람직하며, 건조 및 경화온도를 고려하여 상기 유기용매를 선택적으로 더 첨가할 수 있다.The solids content of the coating composition as a whole is preferably 0.5 to 30% by weight, and the organic solvent may be selectively added in consideration of drying and curing temperatures.

본 발명은 상기 코팅 조성물을 이용하여 제조된 코팅 필름을 제공한다.The present invention provides a coating film prepared using the coating composition.

즉, 본 발명의 코팅 조성물은 디스플레이 반사방지용 코팅재로 사용할 수 있고, 기재 또는 기재 위에 하드 코팅층이 도포된 후 도포 가능하거나 또는 기재/하드 코팅/고굴절층 위에 도포 가능하다. 이때, 통상적으로 사용되는 기재는 유리와 플라스틱 기판, 필름 등이 있으며 기재에 따라 코팅 방식은 자유롭게 선택할 수 있다. 하드 코팅층은 자외선 경화형 수지를 사용하고, 내마모성의 개선을 위해서 무기 나노 미립자를 자외선 경화형 수지에 분산하여 사용할 수도 있다.That is, the coating composition of the present invention can be used as a display antireflective coating material, and can be applied after the hard coating layer is applied on the substrate or the substrate, or can be applied on the substrate / hard coating / high refractive layer. In this case, the substrates commonly used include glass, plastic substrates, films, and the like, and the coating method may be freely selected according to the substrate. As the hard coat layer, an ultraviolet curable resin may be used, and inorganic nanoparticles may be dispersed and used in an ultraviolet curable resin in order to improve wear resistance.

상기 코팅 조성물은 통상적인 방법에 따라 기재 위에 코팅될 수 있으며, 코팅 후의 건조 및 경화 온도는 70 내지 120℃, 건조 및 경화 시간은 10 내지 40시간인 것이 바람직하다.The coating composition may be coated on a substrate according to a conventional method, the drying and curing temperature after coating is preferably 70 to 120 ℃, the drying and curing time is 10 to 40 hours.

일반적으로 반사 방지층의 굴절률은 낮을수록 바람직하며 특히 하층과의 굴절률 차이가 클수록 반사 방지 효과는 커진다. 한편 반사 방지층의 두께는 사용한 재료의 굴절률 및 입사광의 파장에 의하여 결정되어지는데, 예를 들어 기재 위에 하드 코팅층과 방사 방지층을 도포할 경우 하드 코팅 층의 굴절률이 1.51, 반사 방지층의 굴절률이 1.38, 입사광의 설계파장을 550 nm라고 한다면 광학 설계에 의해 반사 방지층의 원하는 두께는 100 nm가 된다. 본 발명에 따른 코팅 필름의 바람직한 두께는 50 내지 200 nm이다. In general, the lower the refractive index of the antireflective layer is preferable, and the greater the difference in refractive index with the lower layer, the greater the antireflective effect. On the other hand, the thickness of the antireflection layer is determined by the refractive index of the material used and the wavelength of the incident light. For example, when the hard coating layer and the radiation prevention layer are applied on the substrate, the refractive index of the hard coating layer is 1.51, the refractive index of the antireflection layer is 1.38, the incident light If the design wavelength of is 550 nm, the desired thickness of the antireflection layer is 100 nm by optical design. The preferred thickness of the coating film according to the invention is 50 to 200 nm.

이하, 본 발명의 이해를 돕기 위하여 바람직한 실시예 및 비교예를 제시한다. 그러나 하기의 실시예들은 본 발명을 보다 쉽게 이해하기 위하여 제공되는 것일 뿐 본 발명이 하기의 실시예에 한정되는 것은 아니다.Hereinafter, preferred examples and comparative examples are presented to aid in understanding the present invention. However, the following examples are merely provided to more easily understand the present invention, and the present invention is not limited to the following examples.

<실시예 1><Example 1>

테트라에톡시실란 10 g, 헵타데카플루오로데실트리메톡시실란 3 g, 물 3 g, 염산 0.12 g, 및 에탄올 58.88 g의 혼합물을 졸-겔 반응시켰다. 반응온도는 78℃이고 pH는 2이며, 반응시간은 3시간이었다. 반응 종료 후, 상온으로 냉각시켜 전도성 고분자 Baytron P ET V2 25 g 을 첨가하였다.A mixture of 10 g of tetraethoxysilane, 3 g of heptadecafluorodecyltrimethoxysilane, 3 g of water, 0.12 g of hydrochloric acid, and 58.88 g of ethanol was subjected to a sol-gel reaction. The reaction temperature was 78 ℃, pH was 2, the reaction time was 3 hours. After the reaction was completed, the reaction mixture was cooled to room temperature and 25 g of a conductive polymer Baytron PET V2 was added thereto.

상기 방법으로 제조된 반사방지용 코팅 조성물을 하드 코팅 필름 위에 롤코팅 방식으로 건조 두께 100nm로 도포하였다. 코팅된 필름은 120℃ 오븐에서 10시간 경화하였다.The antireflective coating composition prepared by the above method was applied on a hard coating film with a dry thickness of 100 nm by a roll coating method. The coated film was cured for 10 hours in a 120 ℃ oven.

<실시예 2><Example 2>

전도성 고분자로서 Baytron P ET V2 대신에 Baytron PH 를 25 g 첨가한 것을 제외하고는 실시예 1과 동일하게 반사방지용 코팅 조성물이 코팅된 필름을 제조하였다.A film coated with an antireflective coating composition was prepared in the same manner as in Example 1 except that 25 g of Baytron PH was added instead of Baytron PET V2 as the conductive polymer.

<실시예 3><Example 3>

불소계 실란으로 헵타데카플루오로데실트리이소프로폭시실란을 사용한 것을 제외하고는 실시예 1과 동일하게 반사방지용 코팅 조성물이 코팅된 필름을 제조하였다.Except for using heptadecafluorodecyltriisopropoxysilane as the fluorine-based silane was prepared in the same manner as in Example 1 coated with a coating composition for antireflection.

<실시예 4><Example 4>

에탄올을 83.86 g, Baytron P ET V2을 0.02 g 사용한 것을 제외하고는 실시예 1과 동일하게 반사방지용 코팅 조성물이 코팅된 필름을 제조하였다.Except for using 83.86 g of ethanol and 0.02 g of Baytron PET V2, a film coated with an antireflective coating composition was prepared in the same manner as in Example 1.

<실시예 5>Example 5

에탄올을 60.88 g, 헵타데카플루오로데실트리메톡시실란을 1 g 사용한 것을 제외하고는 실시예 1과 동일하게 반사방지용 코팅 조성물이 코팅된 필름을 제조하였다.A film coated with an antireflective coating composition was prepared in the same manner as in Example 1 except that 60.88 g of ethanol and 1 g of heptadecafluorodecyltrimethoxysilane were used.

<실시예 6><Example 6>

에탄올을 51.88 g, 헵타데카플루오로데실트리메톡시실란을 10 g 사용한 것을 제외하고는 실시예 1과 동일하게 반사방지용 코팅 조성물이 코팅된 필름을 제조하였다.A film coated with an antireflective coating composition was prepared in the same manner as in Example 1 except that 51.88 g of ethanol and 10 g of heptadecafluorodecyltrimethoxysilane were used.

<실시예 7><Example 7>

에탄올 35.28 g, 디아세톤알코올 11.8 g, 및 부틸셀로솔브 11.8 g을 포함하는 혼합 유기용매를 사용한 것을 제외하고는 실시에 1과 동일하게 반사방지용 코팅 조성물이 코팅된 필름을 제조하였다.An antireflective coating composition was prepared in the same manner as in Example 1 except that a mixed organic solvent including 35.28 g of ethanol, 11.8 g of diacetone alcohol, and 11.8 g of butyl cellosolve was used.

<실시예 8><Example 8>

에탄올 78.1 g, 디아세톤알코올 0.39 g, 및 부틸셀로솔브 0.39 g을 포함하는 혼합 유기용매를 사용한 것을 제외하고는 실시에 1과 동일하게 반사방지용 코팅 조성물이 코팅된 필름을 제조하였다.Except for using a mixed organic solvent containing 78.1 g of ethanol, 0.39 g of diacetone alcohol, and 0.39 g of butyl cellosolve, a film coated with an antireflective coating composition was prepared in the same manner as in Example 1.

<비교예 1>Comparative Example 1

실시예 1에서 전도성 고분자 Baytron P ET V2를 사용하지 않은 것을 제외하고는 실시예 1과 동일하게 제조하였다.Except for using the conductive polymer Baytron PET V2 in Example 1 was prepared in the same manner as in Example 1.

<비교예 2>Comparative Example 2

실시예 1에서 헵타데카플루오로데실트리메톡시실란 대신 메틸트리에톡시실란을 사용한 것을 제외하고는 실시예 1과 동일하게 제조하였다.Except for using heptadecafluorodecyltrimethoxysilane in Example 1 was prepared in the same manner as in Example 1 except that methyltriethoxysilane.

<비교예 3>Comparative Example 3

에탄올을 68.88 g, Baytron P ET V2을 15 g 사용한 것을 제외하고는 실시예 1과 동일하게 반사방지용 코팅 조성물이 코팅된 필름을 제조하였다.Except for using 68.88 g of ethanol, 15 g of Baytron PET V2 was prepared in the same manner as in Example 1 coated with a coating composition for antireflection.

<실험예 1>Experimental Example 1

상기 실시예 및 비교예에서 제조된 코팅 필름의 접촉각, 펜 지움성, 먼지 제거성 및 반사율을 측정하여 오염 제거 용이성과 광 특성을 평가하였다.The contact angle, pen erase, dust removal and reflectance of the coating films prepared in Examples and Comparative Examples were measured to evaluate the ease of decontamination and optical properties.

1) 접촉각1) contact angle

코팅 필름의 물에 대한 접촉각을 측정하여 액상 오염원에 대한 제거 용이성을 판단하였다. 이때 접촉각이 90 ˚이상에서 오염 제거성이 구현된다.The contact angle to the water of the coating film was measured to determine the ease of removal to the liquid contaminant. At this time, the contact angle is more than 90 ° decontamination is implemented.

2) 펜 지움성2) pen erase

유성펜으로 글씨를 쓴 후 면포로 문지르면서(rubbing) 지움성을 육안 관찰하 여 상, 하로 판단하였다.After writing with the oil pen, rubbing with a cotton cloth, and visually observed the eraser was judged as upper and lower.

3) 먼지 제거성3) dust removal

가로와 세로 길이 각각 10cm 크기의 코팅 필름을 면포로 왕복 20회 문질러 준 다음, 30cm 거리에서 스프레이 파우더를 1 분 간격으로 5회 분사하였다. 파우더가 내려앉은 코팅면을 2기압의 에어로 10초간 블로잉한 후 남아 있는 파우더를 육안으로 관찰하여 파우더가 적은 순서대로 상, 하로 표기하였다.The coating film having a size of 10 cm in length and length was rubbed with a cotton cloth 20 times, and then spray powder was sprayed 5 times at 1 minute intervals at a distance of 30 cm. The coated surface where the powder settled down was blown with air of 2 atmospheres for 10 seconds, and the remaining powder was visually observed, and the powders were expressed in the order of the lower and lower order.

4) 반사율4) reflectance

코팅 필름의 뒷면을 흑색 처리한 후 N&K사의 분광광도계(spectrophotometer)로 반사율을 측정하여 최소 반사율 값으로 반사 방지 특성을 평가하였다.After the back side of the coating film was blacked, reflectance was measured with N & K's spectrophotometer to evaluate the antireflection property with a minimum reflectance value.

접촉각( ˚)Contact angle 펜 지움성Pen erase 먼지 제거성Dust removal 최소반사율 (%)Minimum reflectance (%) 헤이즈 (%)Haze (%) 실시예 1Example 1 102102 Prize Prize 2.02.0 0.70.7 실시예 2Example 2 104104 Prize Prize 1.81.8 0.60.6 실시예 3Example 3 9797 Prize Prize 2.22.2 0.60.6 실시예 4Example 4 100100 Prize Ha 1.61.6 0.60.6 실시예 5Example 5 8080 medium Prize 2.82.8 0.70.7 실시예 6Example 6 104104 Prize Ha 1.21.2 0.80.8 실시예 7Example 7 104104 Prize Prize 1.81.8 0.40.4 실시예 8Example 8 103103 Prize Prize 2.02.0 0.60.6 비교예 1Comparative Example 1 104104 Prize Ha 1.51.5 0.30.3 비교예 2Comparative Example 2 7070 Ha Prize 3.33.3 0.70.7 비교예 3Comparative Example 3 9999 Prize Prize 2.12.1 1.01.0

상기 표 1에서 펜지움성의 '상', '중', 및 '하'는 각각 '90% 이상', '70 내지 90%', 및 '70% 이하'의 제거 성능을 나타낸다. In Table 1, 'top', 'middle', and 'bottom' of the pengium exhibit removal performance of '90% or more ', '70 to 90%', and '70% or less', respectively.

상기 표 1로부터, 전도성 고분자가 함유된 코팅 조성물로 제조된 코팅 필름의 경우 먼지제거 기능이 우수하다는 것을 확인할 수 있었고, 불소계 실란을 포함하지 않는 경우에는 높은 표면에너지를 가지며, 반사율도 높고 액상 오염 제거 용이성이 저하됨을 알 수 있었다. From Table 1, it can be seen that the coating film made of the coating composition containing the conductive polymer is excellent in dust removal function, when it does not contain a fluorine-based silane has a high surface energy, high reflectance and liquid contamination removal It turned out that easiness falls.

본 발명의 디스플레이 반사방지용 코팅 조성물은 표면 장력이 낮은 불소계 실란, 대전 방지 특성을 지닌 전도성 고분자 및 용매를 포함한다. 또한, 본 발명의 코팅 조성물로부터 제조되는 코팅 필름은 굴절률, 표면에너지, 및 전도성을 제어하여 반사 방지 특성과 지문 등의 액성 오염 물질에 대한 지움성, 먼지 제거성이 우수하므로, 브라운관이나 평판 디스플레이 필름 등 기재의 종류, 하드코팅이나 대전방지코팅 또는 눈부심방지 코팅 등의 다른 코팅층의 유무와 상관없이 디스플레이 전면 최외곽에 유용하게 적용될 수 있다 The display antireflective coating composition of the present invention includes a fluorine-based silane having a low surface tension, a conductive polymer having an antistatic property, and a solvent. In addition, the coating film prepared from the coating composition of the present invention is excellent in the anti-reflective properties and the anti-reflective properties and liquid removal of dust, such as fingerprints, by controlling the refractive index, surface energy, and conductivity, CRT or flat panel display film It can be usefully applied to the outermost front of the display regardless of the type of substrate, hard coating or anti-static coating or other coating layer such as anti-glare coating.

Claims (9)

(a) (i) 알콕시실란 0.3 내지 15 중량부, (ii) 불소계 실란 0.1 내지 10 중량부, (iii) 촉매 0.001 내지 0.5 중량부, (iv) 물 0.01 내지 10 중량부, 및 (v) 알코올류 용매를 포함하며 케톤류 용매 및 셀로솔브류 용매로 이루어진 군에서 선택되는 1종 이상의 용매를 추가로 포함하는 혼합 유기 용매 20 내지 99.5 중량부로부터 제조되는 졸-겔 반응물; 및 (a) 0.3 to 15 parts by weight of (i) alkoxysilane, (ii) 0.1 to 10 parts by weight of fluorine silane, (iii) 0.001 to 0.5 parts by weight of catalyst, (iv) 0.01 to 10 parts by weight of water, and (v) alcohol A sol-gel reactant prepared from 20 to 99.5 parts by weight of a mixed organic solvent including a solvent such as a ketone solvent and at least one solvent selected from the group consisting of cellosolve solvents; And (b) 전도성 고분자 0.02 내지 50 중량부(b) 0.02 to 50 parts by weight of the conductive polymer 를 포함하는 디스플레이 반사방지용 코팅 조성물.Display antireflective coating composition comprising a. 삭제delete 삭제delete 제1항에 있어서, 상기 불소계 실란이 트리데카플루오로옥틸트리에톡시실란, 헵타데카플루오로데실트리메톡시실란, 및 헵타데카플루오로데실트리이소프로폭시실란으로 이루어진 군에서 선택되는 1종 이상인 코팅 조성물.The fluorine-based silane is at least one member selected from the group consisting of tridecafluorooctyltriethoxysilane, heptadecafluorodecyltrimethoxysilane, and heptadecafluorodecyltriisopropoxysilane. Coating composition. 제1항에 있어서, 상기 전도성 고분자가 폴리티오펜류인 것을 특징으로 하는 코팅 조성물.The coating composition according to claim 1, wherein the conductive polymer is polythiophene. 제5항에 있어서, 상기 전도성 고분자가 글루타민산, 알킬 술폰산, 폴리스티렌 술폰산 음이온, 및 스틸렌 술폰산과 스틸렌 술폰산 음이온의 공중합체로 이루어진 군에서 선택되는 1종 이상의 화합물로 도핑된 것인 코팅 조성물.The coating composition of claim 5, wherein the conductive polymer is doped with at least one compound selected from the group consisting of glutamic acid, alkyl sulfonic acid, polystyrene sulfonic acid anion, and copolymers of styrene sulfonic acid and styrene sulfonic acid anion. 제1항에 있어서, 상기 촉매가 산류, 금속염류, 및 이들의 혼합물로 이루어진 군에서 선택되는 1종 이상인 코팅 조성물. The coating composition of claim 1, wherein the catalyst is at least one selected from the group consisting of acids, metal salts, and mixtures thereof. 제1항의 코팅 조성물로부터 제조되는 디스플레이 대전방지용 코팅 필름.Display antistatic coating film prepared from the coating composition of claim 1. 제1항에 있어서, 상기 케톤류 용매 및 셀로솔브류 용매로 이루어진 군에서 선택되는 1종 이상의 용매의 함량이 상기 혼합용매의 총중량에 대하여 30 중량% 이하인 코팅 조성물.The coating composition according to claim 1, wherein the content of at least one solvent selected from the group consisting of ketone solvents and cellosolve solvents is 30% by weight or less based on the total weight of the mixed solvent.
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CN1771445A (en) 2006-05-10
TWI303746B (en) 2008-12-01
WO2005101063A1 (en) 2005-10-27
JP2007500374A (en) 2007-01-11
TW200604729A (en) 2006-02-01
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US20050239933A1 (en) 2005-10-27
EP1735645A1 (en) 2006-12-27
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US7204877B2 (en) 2007-04-17
JP4347886B2 (en) 2009-10-21

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