KR100658288B1 - Pixel circuit and organic light emitting display having an improved transistor structure - Google Patents

Abstract

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a pixel circuit in which image quality is improved by improving uniformity of transistors in a panel and an organic light emitting display device employing the same. The pixel circuit according to the present invention provides a switching element for transmitting a data signal in response to a selection signal, a capacitor for storing a voltage corresponding to the transmitted data signal, and a current for supplying a current corresponding to the voltage stored in the capacitor to the organic light emitting element. A drive transistor comprising a first channel and a second source connected to the cross-shaped channel and two adjacent ends of the channel, respectively, and a first terminal connected to two ends facing the first and second sources, respectively. And a gate facing the channel with the semiconductor layer having the second drain interposed therebetween.

OLED, display, TFT, uniformity, channel

Description

Pixel circuit and organic light emitting display having an improved transistor structure

1 is a plan view of a driving transistor according to a first exemplary embodiment of the present invention.

2 is a plan view illustrating a case where a high density defect portion is formed in a driving transistor according to a first embodiment of the present invention.

3 is a cross-sectional view of the driving transistor taken along line III-III of FIG. 1.

4 is a layout diagram of a pixel employing a driving transistor according to a first exemplary embodiment of the present invention.

FIG. 5 is a cross-sectional view of the pixel taken along the line VV of FIG. 4.

6 is a circuit diagram of another pixel circuit that can employ the driving transistor according to the first embodiment of the present invention.

7 is a configuration diagram of an organic light emitting display device employing a driving transistor according to a first embodiment of the present invention.

<Description of the symbols in the main part of the drawing>

100: transistor 110: insulating substrate

120: semiconductor layer 122: channel

123: Defective portion 124a, 124b: Source

126a and 126b: drain 140: gate electrode

150: source electrode 152a: first contact hole

152b: second contact hole 160: drain electrode

162a: third contact hole 162b: fourth contact hole

A, B: current pass 400: pixel

700: organic light emitting display

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a transistor, a pixel circuit, and an organic light emitting display device, and more particularly, to a pixel circuit and an organic light emitting display device which improves the image quality of a display device by increasing the uniformity of driving transistors in a panel.

In general, an active matrix organic light emitting display device includes an array of thin film transistors (hereinafter, referred to as TFTs) in a panel. In addition, the active matrix organic light emitting display device includes at least two thin film transistors in a pixel displaying red, green, blue, or white light. These thin film transistors are composed of a switching transistor for controlling the operation of each pixel and a driving transistor for driving the organic light emitting element.

On the other hand, if the uniformity of the characteristics of the driving transistor in the panel in the active matrix organic light emitting display is reduced, random mura increases in the panel and excimer laser annealing (ELA) according to the manufacturing process. ) Mura appears along the line, which is a significant factor in deteriorating image quality.

In general, the nonuniformity of the characteristics of the driving transistor is due to the characteristics of the excimer laser annealing. The ELA used to make the polysilicon TFT has a nonuniform energy distribution in the ELA beam and the advancing direction of the ELA. This increases the nonuniformity for the driving TFT in the panel.

To this end, the conventional active matrix display device compensates the threshold voltage of the driving transistor by applying various compensation circuits to each pixel circuit as a method for improving the non-uniformity of the TFT panel by the ELA. In this way, the conventional active matrix display device attempts to improve image quality.

However, using the above-described prior art, there is a problem that the pixel is complicated, the aperture ratio is decreased, and the yield is reduced by the complicated pixel structure.

Therefore, the present invention is derived to solve the above-mentioned conventional problems, and an object of the present invention is that even if a density of defect state increases in a specific portion of a channel of a TFT due to non-uniformity of ELA, The present invention provides a thin film transistor that can maintain a constant current flow by forming a current path to a portion of a channel other than the portion.                         

Another object of the present invention is to provide a pixel circuit and an organic light emitting display device having improved image quality by employing a thin film transistor having a cross-shaped channel.

In order to achieve the above object, according to an aspect of the present invention, a first switching element for transmitting a data signal in response to a selection signal, a capacitor for storing a voltage corresponding to the transferred data signal, and a voltage stored in the capacitor A driving transistor for supplying a current corresponding to the organic light emitting element, the driving transistor being connected to a cross-shaped channel and first and second sources respectively connected to two adjacent ends of the channel and the remaining two ends of the channel. A pixel circuit of an organic light emitting display device is provided having a semiconductor layer having a drain, and a gate facing the channel with an insulating layer interposed therebetween.

According to another aspect of the present invention, a pixel is formed in a pixel area defined by a plurality of data lines for transmitting a data signal, a plurality of scan lines for transmitting a selection signal, and two neighboring data lines and two neighboring scan lines. An organic light emitting display device including a circuit is provided.

According to another aspect of the invention, the first and second sources are formed on the insulating substrate, connected to the cross-shaped channel, the first end of the channel and the second end adjacent to the first end, respectively, and A semiconductor layer having first and second drains connected to third and fourth ends facing the first and second ends, an insulating layer formed in contact with the channel, and an insulating layer interposed therebetween And a gate facing the gate, the first and second sources being electrically connected, and the first and second drains being electrically connected.

In one preferred embodiment, the semiconductor layer is formed of a polysilicon layer.

In addition, the semiconductor layer is formed by a crystallization process of crystallizing the amorphous silicon layer.

The crystallization process also includes an excimer laser annealing process.

The channel also includes at least two current paths formed between the first and second sources and the first and second drains.

In addition, the first and second sources are electrically connected, and the first and second drains are also electrically connected.

In addition, the data signal is a voltage or a current.

Hereinafter, with reference to the accompanying drawings, the present invention will be described in detail.

1 is a plan view of a driving transistor according to a first exemplary embodiment of the present invention. 2 is a plan view illustrating a case where a high density defect portion is formed in a driving transistor according to a first embodiment of the present invention. 3 is a cross-sectional view of the driving transistor taken along line III-III of FIG. 1.

1 to 3, the driving transistor 100 includes a semiconductor layer 120 formed on the insulating substrate 110, an insulating layer 130 formed on the semiconductor layer 120, and an insulating layer 130. A gate or gate electrode 140 facing the channel 122 in the semiconductor layer 120 is disposed therebetween. The driving transistor 100 forms a predetermined channel 122 according to the voltage applied to the gate electrode 140. The channel 122 is a passage through which a predetermined current can flow.

The semiconductor layer 120 includes a channel 122, a first source 124a, a second source 124b, a first drain 126a, and a second drain 126b. The first and second sources 124a and 124b are connected to two adjacent ends of the cross-shaped channel 122, respectively, and the first and second drains 126a and 126b are connected to the first and second sources 124a and 124b. Are connected to two ends facing each other). For example, the channel 122 is formed in a cross shape to form two current paths A and B in the horizontal and vertical directions. Such a cross shape provides a constant current flow as a whole even when the semiconductor layer 120 is formed through an ELA process, even when a defect state density increases at a specific portion of one current path within a channel of the transistor due to nonuniformity of ELA characteristics. To maintain.

In addition, the semiconductor layer 120 is formed of a polysilicon layer. In this case, the polysilicon layer may be formed by a crystallization process such as an excimer laser annealing process for crystallizing amorphous silicon.

An insulating layer 130 is formed on the semiconductor layer 120. The insulating layer 130 has first, second, third and fourth contact holes 152a and 152b exposing the first and second sources 124a and 124b and the first and second drains 126a and 126b, respectively. , 162a, 162b). The gate electrode 140, the source electrode 150, and the drain electrode 160 are formed on the insulating layer 130. The source electrode 150 is connected to the first and second sources 124a and 124b through the first and second contact holes 152a and 152b, respectively. The drain electrode 160 is connected to the first and second drains 126a and 126b through the third and fourth contact holes 162a and 162b, respectively. Here, one end (gate) of the gate electrode 140 is formed to face the channel 122 with the insulating layer 130 interposed therebetween. A protective film or insulating film 170 may be additionally formed on the structure as needed.

With the above-described configuration, the present invention can keep the current flow of the driving transistor constant even when the defect state density increases at a specific portion in the channel. In other words, as shown in FIG. 2, the present invention maintains the overall current flow through another current path B even when a high density defect part 123 is generated in the channel and one current path A is poor. A driving transistor that can be kept constant is provided.

In the above-described embodiment, the thin film transistor having the coplanar structure or the upper gate structure has been described. However, the present invention is not limited to such a configuration and can be applied to other structures such as a staggered structure or a lower gate structure. For example, according to the present invention, an insulating island is formed in a channel to have at least two channel paths, and thus, a thin film having various structures capable of maintaining the overall current flow even when a defect state density increases at a specific site due to ELA characteristics or the like. Applicable to the transistor.

Next, a pixel structure for an organic light emitting display device employing the above-described driving transistor will be described. 4 is a layout diagram of a pixel employing a driving transistor according to a first exemplary embodiment of the present invention. A circuit diagram of the layout of FIG. 4 is illustrated in a pixel area of the organic light emitting diode display of FIG. 7.

Referring to FIG. 4, the pixel 400 includes a switching transistor 440, a capacitor 450, a driving transistor 460, and an organic light emitting device (OLED) 470. The switching transistor 440 and the driving transistor 460 may be implemented as thin film transistors, and have a gate, a source, and a drain, respectively. The capacitor 450 has a first terminal and a second terminal.

The switching transistor 440 may include a gate extending from the scan line 410, a source connected to the data line 420 through the first contact hole 422, and an upper electrode 452 through the second contact hole 454. And a drain connected to one end. The switching transistor 440 is used to sample the data signal applied to the data line 420 according to the scan signal applied to the scan line 410.

The capacitor 450 includes an upper electrode 452 connected to the power supply voltage line 430 through the third contact hole 432 and a lower electrode 456 patterned together with the semiconductor layer of the switching transistor 440. Here, the upper electrode 452 becomes the first terminal of the capacitor 450 and the lower electrode 456 becomes the second terminal. The capacitor 450 stores a voltage corresponding to the data signal applied to the data line 420 during the period in which the switching transistor 440 is on, and maintains the stored voltage during the period in which the switching transistor 440 is in the off state. It performs the function. By this process, the gray level to be displayed in the pixel is programmed in the capacitor 450.

The driving transistor 460 is connected to the power supply line 430 through the gate electrode 462 connected to the other end of the upper electrode 452, the channel 464 formed in a cross shape, and the fourth contact hole 434a. The second source 466b and the seventh contact are connected to the source electrode 434 connected to the power supply voltage line 430 through the first source 466a and the fifth contact hole 435 through the sixth contact hole 434b. The first drain 468a connected to one end of the drain electrode 436 through the hole 438a, and the second drain 468b connected to the other end of the drain electrode 436 through the eighth contact hole 438b. Include. The driving transistor 460 supplies a current corresponding to the voltage applied between the first terminal and the second terminal of the capacitor 450 to the organic light emitting diode.

According to the above-described configuration, in the pixel circuit of the organic light emitting diode display, the current flow is kept constant throughout even when a high density of defects are formed in a specific portion on one current path in the channel 464 of the driving transistor 460. As a result, the uniformity of characteristics of the driving transistors in the panel is increased to improve image quality.

The organic light emitting diode 470 may include a first electrode 472 connected to the drain electrode 436 through a ninth contact hole 474, an organic thin film 476 formed on the first electrode 472, and an organic A second electrode (not shown) formed on the thin film 476 is included. Here, the first electrode 472 includes an anode electrode, and the second electrode includes a cathode electrode. The cathode electrode may be formed of an ITO electrode (Indium Tin Oxide).

The organic thin film 476 may include a hole injecting layer and an electron injecting layer on both sides of the emitting layer to improve injection characteristics of electrons and holes from the first electrode 472 and the second electrode. It consists of a multilayer structure including a layer). In addition, the organic thin film 476 may optionally include an electron transporting layer, a hole transporting layer, a hole blocking layer, or the like in order to improve light emission characteristics of the organic light emitting diode. .

By the above-described configuration, the organic light emitting element 470 emits light with a predetermined luminance corresponding to the current supplied by the driving transistor 460.

On the other hand, in the above-described embodiment, a P-type switching transistor and a driving transistor have been described as an example. However, the present invention is not limited to such a configuration, and can be implemented using an N-type transistor.

In the above-described embodiment, the case where one switching transistor and one driving transistor are included in the pixel circuit has been described, but the present invention is not limited to such a configuration. For example, the pixel circuit according to the present invention may be configured to include at least two driving transistors or at least two switching transistors. In addition, the pixel circuit may include at least two organic light emitting diodes connected to one driving transistor. In this case, the pixel circuit may be driven in a sequential driving manner in which two organic light emitting devices are sequentially driven with a predetermined time difference. In this case, the at least two organic light emitting diodes may display different colors. Furthermore, the pixel circuit according to the present invention can be designed not only with the pixel circuit of the voltage programming structure described above, but also with the pixel circuit of another voltage programming structure or the pixel circuit of the current programming structure. The pixel circuit of the current programming structure will be described later with reference to FIG. 6.

Next, the cross-sectional structure of the pixel employing the transistor according to the first embodiment of the present invention will be described. 5 is a cross-sectional view of a cross-sectional structure of a pixel employing a transistor according to a first embodiment of the present invention. The cross-sectional structure of FIG. 5 corresponds to the cross section taken along the line VV of FIG. 4. Hereinafter, the pixel represents an organic light emitting element and a pixel circuit. Reference numerals in FIG. 5 are shown separately from reference numerals in FIG. 4 because they represent layers in cross-section based primarily on manufacturing processes.

Referring to FIG. 5, the cross-sectional structure of a pixel with a transistor according to the present invention first includes a buffer layer 401b formed of a nitride film or an oxide film on an insulating substrate 401a such as glass. The buffer layer 401b is formed to prevent impurities such as metal ions from diffusing into an active channel in the semiconductor layer. The buffer layer 401b may be formed by chemical vapor deposition (CVD), sputtering, or the like.

Next, an amorphous silicon layer is formed on the substrate 401a on which the buffer layer 401b is formed through CVD, sputtering, and the like, and is heated at a temperature of about 430 ° C. to contain hydrogen contained in the amorphous silicon layer. After performing a dehydrogenation process to remove the component, the dehydrogenated amorphous polysilicon layer is crystallized by a predetermined method to form the semiconductor layer 402. At this time, the lower electrode 402c of the capacitor Cs is also formed.

Crystallization after deposition of amorphous silicon includes solid phase crystallization (SPC), excimer laser crystallization (ELC / excimer laser anneal (ELA)), and sequential lateral solidification (SLS). Methods, metal induced crystallization (MIC), metal induced lateral crystallization (MILC), and the like.

At this time, the semiconductor layer 402 is patterned in a cross shape. Specifically, the semiconductor layer 402 includes a cross-shaped channel C and two opposite ends of the channel C, the first source 402b, the second source (not shown), and the first drain ( 402a and a second drain (not shown) are each patterned to be formed.

Subsequently, a gate insulating film 403 is formed on the entire surface of the substrate 400 on which the semiconductor layer 402 is formed. Then, a gate electrode material such as aluminum is deposited on the gate insulating film 403 and then patterned to form the gate electrode 407a. do. At this time, the upper electrode 407b of the capacitor Cs is also patterned with the formation of the gate electrode 407a. Thereafter, predetermined impurities are ion implanted using the gate electrode 407a as a mask to form a first source 402b, a second source, a first drain 402a, and a second drain. Here, the region of the semiconductor layer 402 positioned below the gate electrode 407a with the gate insulating layer 403 interposed therebetween becomes a region in which a cross-shaped channel C is formed.

Next, a first contact hole for forming an interlayer insulating film 404 on the structure and exposing a first source 402b, a second source, a first drain 402a and a second drain, respectively, in the interlayer insulating film 404. 413, a second contact hole (not shown), a third contact hole 412, and a fourth contact hole (not shown) are formed. In this case, a fifth contact hole 414 exposing the upper electrode 407b is also formed. Thereafter, the metal layer 405 is entirely deposited and patterned to form a source electrode and a drain electrode. The source electrode is formed in a curved shape to be connected to the first source 402b and the second source through the first contact hole 413 and the second contact hole, respectively. The drain electrode is formed in a curved shape to be connected to the first drain 402a and the second drain through the third contact hole 412 and the fourth contact hole, respectively. The upper electrode 407b of the capacitor Cs is connected to the metal layer 405 through the fifth contact hole 414.

Next, a passivation layer 406 is formed on the metal layer 405. The passivation layer 406 includes a sixth contact hole 415 exposing the drain electrode. Thereafter, the anode electrode 408 is deposited and patterned on a portion of the upper portion of the passivation layer 406. The anode electrode 408 is electrically connected to the drain electrode through the sixth contact hole 415.

Next, a planarization film 409 made of an insulator is formed and patterned on top of the structure. An opening for exposing the anode electrode 408 is formed in the planarization film 409. Thereafter, the organic light emitting material 410 is applied to the opening. The cathode electrode 411 is formed on the structure including the organic light emitting material 410.

According to the above-described configuration, the channel and the channel are formed with the cross-shaped channel, the first and second sources, the first and second drains, and the gate insulating layer connected between both ends of the channel in the horizontal and vertical directions, respectively. A driving transistor MD having an opposite gate electrode is formed. The capacitor Cs is formed by the lower electrode and the upper electrode facing the lower electrode with the gate insulating layer interposed therebetween. In addition, an organic light emitting diode OLED is formed by the first electrode, the organic thin film, and the second electrode.

Meanwhile, in the above-described embodiment, a method of manufacturing a pixel including a thin film transistor having a PMOS structure is mentioned. However, the present invention is not limited to such a configuration, and can be easily applied to a method for manufacturing a pixel including another thin film transistor structure such as an NMOS structure or a CMOS structure.

In the above-described embodiment, the lower electrode and the upper electrode of the capacitor Cs are formed together at the time of forming the semiconductor layer and the gate electrode, but the present invention is not limited to such a configuration. For example, the capacitor Cs may be formed to include a lower electrode formed on the same layer as the gate electrode and an upper electrode formed on the same layer as the source or drain electrode.

6 is a circuit diagram of another pixel circuit that can employ the driving transistor according to the first embodiment of the present invention.

Referring to FIG. 6, the pixel circuit 600 includes a driving transistor MD, a capacitor Cs, and first to third switching transistors M1, M2, and M3. The driving transistor MD and the first to third switching transistors M1, M2, and M3 have a gate, a source, and a drain, respectively. Capacitor Cs has a first terminal and a second terminal.

The gate of the first switching transistor M1 is connected to the first scan line Sn, the source is connected to the first node N1, and the drain is connected to the data line Dm. The first switching transistor M1 charges the capacitor C in response to the first scan signal applied to the first scan line Sn.

The gate of the second switching transistor M2 is connected to the first scan line Sn, the source is connected to the second node N2, and the drain is connected to the data line Dm. The second switching transistor M2 transmits a data current flowing through the data line Dm to the driving transistor MD in response to the first scan signal applied to the first scan line Sn.

The gate of the third switching transistor M3 is connected to the second scan line En, the source is connected to the second node N2, and the drain is connected to the organic light emitting diode OLED. The third switching transistor M3 supplies a current flowing through the driving transistor MD to the organic light emitting diode OLED in response to the second scan signal applied to the second scan line En.

The power supply voltage VDD is applied to the first terminal of the capacitor Cs, and the second terminal is connected to the first node N1. The capacitor Cs charges a voltage corresponding to the data current flowing in the driving transistor MD during the period in which the first and second switching transistors M1 and M2 are on. The voltage charged in the capacitor Cs corresponds to the charge amount with respect to the gate-to-gate voltage V _GS of the driving transistor MD. The capacitor Cs maintains the gate voltage of the driving transistor MD during the period in which the first and second switching transistors M1 and M2 are off.

A gate of the driving transistor MD is connected to the first node N1, a power supply voltage is applied to the source, and a drain thereof is connected to the second node N2. The driving transistor MD supplies a current corresponding to the voltage applied between the first terminal and the second terminal of the capacitor Cs to the organic light emitting diode OLED during the period when the third switching transistor M3 is on. Do this.

In this case, the driving transistor MD includes first and second sources, first and second drains, and an insulating layer connected to a cross-shaped channel and two opposite ends thereof facing each other in the horizontal and vertical directions of the channel. And a gate facing the channel with the gap therebetween.

As described above, in the case of using the pixel circuit according to the present invention, in the case of an active matrix display device, even when a defect state density increases in a specific part of a channel of a predetermined driving transistor, the entire current flow is made constant to drive the transistor in the panel. You can improve the image quality by increasing the uniformity of. In other words, the present invention can be easily applied to a current programming pixel circuit having a polycrystalline silicon thin film transistor formed by crystallizing an amorphous silicon layer.

In the above-described embodiment, the pixel circuit for the organic light emitting diode display has been described, but the present invention is not limited to such a configuration. For example, the present invention can be easily applied to other types of display devices such as an active matrix driving TFT-LCD, a plasma display panel, a field emission display device and the like using a driving thin film transistor.

7 is a configuration diagram of an organic light emitting display device employing a driving transistor according to a first embodiment of the present invention.

Referring to FIG. 7, the OLED display 700 includes a scan driver 710, a data driver 720, and an image display unit 730. The image display unit 730 includes a plurality of pixels 740. The pixel 740 includes a switching transistor MS, a capacitor Cs, a driving transistor MD, and an organic light emitting diode OLED. Here, the driving transistor MD is, as shown enlarged in FIG. 7, a cross-shaped channel, two sources and two drains connected to two opposite ends facing each other in the horizontal and vertical directions of the channel. And a gate facing the channel with an insulating layer interposed therebetween.

Here, the driving transistor MD supplies a current corresponding to the voltage applied between both terminals of the capacitor to the organic light emitting diode OLED. The capacitor Cs is connected between the source and the gate of the driving transistor MD to maintain a data voltage applied through the switching transistor MS for a predetermined period of time. According to this configuration, when the switching transistor MS is first turned on in response to a scan signal applied to the gate of the switching transistor MS, the data voltage applied through the data line Dm is stored in the capacitor Cs. Thereafter, when the switching transistor MS is turned off, a current corresponding to the voltage stored in the capacitor Cs is supplied to the organic light emitting diode OLED through the driving transistor MD. The organic light emitting diode OLED emits light with a predetermined luminance corresponding to the supplied current.

In addition, the organic light emitting diode display 700 includes n × m pixels 740, n scan lines S1, S2,..., Sn extending in the horizontal direction, and m data lines D1 extending in the vertical direction. , D2, D3, ..., Dm). The scan driver 710 sequentially supplies a scan signal to the scan lines S1, S2,..., Sn. The scan signal is transmitted to the pixel 740. The data driver 720 supplies a data signal to the data lines D1, D2, D3,..., And Dm. The data voltage is transferred to the pixel 740.

The pixel 740 samples the data signal transmitted from the data driver 720 in response to the scan signal transmitted from the scan driver 710, and displays a predetermined gray level corresponding to the sampled data signal.

In the above-described embodiment, the case where one switching transistor and one driving transistor are included in the pixel circuit has been described, but the present invention is not limited to such a configuration. For example, the organic light emitting diode display according to the present invention may include a pixel circuit including at least two driving transistors or at least two switching transistors. In addition, the organic light emitting diode display according to the present invention may include a pixel circuit including at least two organic light emitting diodes connected to one driving transistor. In this case, the pixel circuit is driven in a sequential driving manner in which two organic light emitting elements are sequentially driven at a predetermined time difference. Furthermore, the organic light emitting diode display according to the present invention may include the pixel circuit of the voltage programming structure as well as the pixel circuit of another voltage programming structure or the pixel circuit of the current programming structure.

As mentioned above, although preferred embodiment of this invention was described in detail, this invention is not limited to the said embodiment, A various deformation | transformation by a person of ordinary skill in the art within the scope of the technical idea of this invention is carried out. This is possible.

As described above, according to the present invention, even when a density of defect state increases in a specific portion of a TFT channel due to nonuniformity in a crystallization process such as ELA, a current path is applied to other channel portions except for the channel portion. It is possible to provide a transistor that can be formed to keep the overall current flow constant.

According to the present invention, it is possible to provide a pixel circuit and an organic light emitting display device employing the same by employing a driving transistor having a cross-shaped channel structure to increase the uniformity of the driving transistor in the panel.

Claims (13)

A first switching element transferring a data signal in response to the selection signal; A capacitor storing a voltage corresponding to the transferred data signal; And A driving transistor for supplying a current corresponding to the voltage stored in the capacitor to the organic light emitting device, The driving transistor may include a semiconductor layer having a cross-shaped channel, first and second sources connected to two adjacent ends of the channel, and a drain connected to the remaining two ends of the channel, and an insulating layer interposed therebetween. A pixel circuit of an organic light emitting display device having a gate facing a channel. The method of claim 1, And the semiconductor layer is formed of a polysilicon layer. The method of claim 1, And the semiconductor layer is crystallized in amorphous silicon. delete The method of claim 1, And the channel includes at least two current paths between the first and second sources and the first and second drains. The method of claim 1, And the first and second sources are electrically connected, and the first and second drains are electrically connected. The method of claim 1, And the data signal is a voltage or a current. A plurality of data lines for transmitting data signals; A plurality of scan lines for transmitting a selection signal; And An organic light emitting display device formed in a pixel area defined by two neighboring data lines and two neighboring scan lines, and including one of the pixel circuits of claim 1. Insulating substrate; First and second sources formed on the insulating substrate and connected to a cross-shaped channel, a first end of the channel and a second end adjacent to the first end, and the first and second ends, respectively; A semiconductor layer having first and second drains connected to opposing third and fourth ends, respectively; An insulation layer formed in contact with the channel; And A gate facing the channel with the insulating layer interposed therebetween, And the first and second sources are electrically connected, and the first and second drains are electrically connected. The method of claim 9, The semiconductor layer of claim 1, wherein the semiconductor layer is formed of a polysilicon layer. The method of claim 9, The semiconductor layer is a transistor for a pixel circuit of an organic light emitting display device formed by crystallizing amorphous silicon. delete The method of claim 9, And the channel includes at least two current paths between the first and second sources and the first and second drains.

Images