KR100582900B1 - Solution for forming black oxide layer on metal thin film, method for forming black oxide layer on metal thin film of electromagnetic interference filter and metal thin film of electromagnetic interference filter formed by the same method - Google Patents

Solution for forming black oxide layer on metal thin film, method for forming black oxide layer on metal thin film of electromagnetic interference filter and metal thin film of electromagnetic interference filter formed by the same method Download PDF

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KR100582900B1
KR100582900B1 KR1020040041679A KR20040041679A KR100582900B1 KR 100582900 B1 KR100582900 B1 KR 100582900B1 KR 1020040041679 A KR1020040041679 A KR 1020040041679A KR 20040041679 A KR20040041679 A KR 20040041679A KR 100582900 B1 KR100582900 B1 KR 100582900B1
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thin film
metal thin
oxide layer
black oxide
solution
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KR20050116570A (en
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최관민
최광혜
김창제
김판수
이덕수
정운석
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엘지마이크론 주식회사
주식회사 호진플라텍
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23FNON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00Etching metallic material by chemical means
    • C23F1/10Etching compositions
    • C23F1/14Aqueous compositions
    • C23F1/16Acidic compositions
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B25/00Phosphorus; Compounds thereof
    • C01B25/16Oxyacids of phosphorus; Salts thereof
    • C01B25/26Phosphates
    • C01B25/38Condensed phosphates
    • C01B25/42Pyrophosphates
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C22/00Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C22/05Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions
    • C23C22/06Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6
    • C23C22/07Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6 containing phosphates
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/552Protection against radiation, e.g. light or electromagnetic waves

Abstract

금속박막에 흑색산화층을 형성하기 위한 용액, 이를 이용한 전자파 차폐필터의 금속박막에 흑색표면을 형성하는 방법 및 이에 의해 형성된 전자파 차폐필터의 금속박막이 개시된다. 상기 금속박막에 흑색산화층을 형성하기 위한 용액을 이용하여 금속박막에 흑색산화층을 형성하면 흑색산화층이 면상구조로 형성되므로, 흑색산화층의 경도, 면 저항값 및 흑색도의 특성이 우수해진다. 이로인해, 전자파 차폐필터가 전자파를 차폐하는 효율이 향상되고, 전자파 차폐필터가 설치된 디스플레이의 콘트라스트(Contrast)가 향상된다.A solution for forming a black oxide layer on a metal thin film, a method of forming a black surface on a metal thin film of an electromagnetic shielding filter using the same, and a metal thin film of an electromagnetic shielding filter formed thereby are disclosed. When the black oxide layer is formed on the metal thin film by using a solution for forming the black oxide layer on the metal thin film, the black oxide layer is formed into a planar structure, and thus the characteristics of the hardness, the surface resistance value and the blackness of the black oxide layer are excellent. As a result, the efficiency of shielding the electromagnetic wave from the electromagnetic shielding filter is improved, and the contrast of the display provided with the electromagnetic shielding filter is improved.

Description

금속박막에 흑색산화층을 형성하기 위한 용액, 이를 이용한 전자파 차폐필터의 금속박막에 흑색산화층을 형성하는 방법 및 이에 의해 형성된 전자파 차폐필터의 금속박막 {SOLUTION FOR FORMING BLACK OXIDE LAYER ON METAL THIN FILM, METHOD FOR FORMING BLACK OXIDE LAYER ON METAL THIN FILM OF ELECTROMAGNETIC INTERFERENCE FILTER AND METAL THIN FILM OF ELECTROMAGNETIC INTERFERENCE FILTER FORMED BY THE SAME METHOD}SOLUTION FOR FORMING BLACK OXIDE LAYER ON METAL THIN FILM, METHOD FOR Solution for forming black oxide layer on metal thin film, method of forming black oxide layer on metal thin film of electromagnetic wave shielding filter using the same FORMING BLACK OXIDE LAYER ON METAL THIN FILM OF ELECTROMAGNETIC INTERFERENCE FILTER AND METAL THIN FILM OF ELECTROMAGNETIC INTERFERENCE FILTER FORMED BY THE SAME METHOD}

도 1a 및 도 1b는 종래의 방법에 의하여 형성된 흑색산화층의 표면조직 및 흑색도를 보인 도.1a and 1b is a view showing the surface structure and blackness of the black oxide layer formed by a conventional method.

도 2는 본 발명의 일 실시예에 따른 PDP의 개략적 구성을 보인 도.2 is a diagram illustrating a schematic configuration of a PDP according to an embodiment of the present invention.

도 3은 도 2에 도시된 전자파 차폐필터의 구성을 보인 도.3 is a view showing the configuration of the electromagnetic shielding filter shown in FIG.

도 4a 및 도 4b는 본 발명의 일 실시예에 따른 방법에 의하여 형성된 흑색산화층의 표면조직 및 흑색도를 보인 도.Figures 4a and 4b is a view showing the surface structure and blackness of the black oxide layer formed by the method according to an embodiment of the present invention.

도 5a 및 도 5b는 본 발명의 다른 실시예에 따른 방법에 의하여 형성된 흑색산화층의 표면조직 및 흑색도를 보인 도.5a and 5b is a view showing the surface structure and blackness of the black oxide layer formed by the method according to another embodiment of the present invention.

* 도면의 주요부분에 대한 부호의 설명 *Explanation of symbols on the main parts of the drawings

50 : 전자파 차폐필터 53 : 금속박막50: electromagnetic shielding filter 53: metal thin film

53a : 메쉬 54 : 흑색산화층53a: mesh 54: black oxide layer

본 발명은 금속박막에 흑색산화층을 형성하기 위한 용액, 이를 이용한 전자파 차폐필터의 금속박막에 흑색표면을 형성하는 방법 및 이에 의해 형성된 전자파 차폐필터의 금속박막에 관한 것이다.The present invention relates to a solution for forming a black oxide layer on a metal thin film, a method of forming a black surface on a metal thin film of an electromagnetic shielding filter using the same, and a metal thin film of an electromagnetic shielding filter formed thereby.

디스플레이(Display)란 문자나 도형의 형식으로 데이터를 시각적으로 표시하는 장치이다. 디스플레이의 내부에는 인체에 유해한 전자파를 차단하는 차폐필터, 근적외선을 차단하며 반사를 방지하는 차폐필름 등이 설치된다.Display is a device that visually displays data in the form of characters or figures. Inside the display, a shielding filter that blocks electromagnetic waves harmful to the human body and a shielding film that blocks near infrared rays and prevents reflection are installed.

전자파 차폐필터는 도전성 금속인 Cu로 제조된 금속박막을 가진다. 상기 금속박막에는 메쉬(Mesh)가 형성되고, 메쉬가 형성된 상기 금속박막의 일면에는 반사를 방지하기 위한 흑색산화층이 형성된다.The electromagnetic shielding filter has a metal thin film made of Cu, which is a conductive metal. A mesh is formed on the metal thin film, and a black oxide layer is formed on one surface of the metal thin film on which the mesh is formed to prevent reflection.

그리고, 고농도의 아염소산나트륨(Sodium Chlorite)과 고농도의 수산화나트륨(Sodium Hydroxide)을 혼합한 용액에 금속박막을 침적시켜 금속박막에 흑색산화층을 형성하는 방법이 1947년 Meyer에 의해 발표되었다.In 1947, Meyer announced a method of depositing a thin metal film on a thin metal film by depositing a thin metal film in a solution containing a high concentration of sodium chlorite and a high concentration of sodium hydroxide.

상기 아염소산염류는 반응식1과 같이 Cu와 반응하여 Cu 수화물을 형성하고, Cu 수화물은 탈수 반응에 의하여 반응식2와 같이 산화동 또는 아산화동의 형태로 형성되어 금속박막의 표면에 흑색산화층으로 형성된다.The chlorites react with Cu to form Cu hydrate as shown in Scheme 1, and the Cu hydrate is formed in the form of copper oxide or copper nitrous oxide as shown in Scheme 2 by a dehydration reaction to form a black oxide layer on the surface of the metal thin film.

ClO2 - + 2Cu + 2H2O --------> 2Cu(OH)2 + Cl - ClO 2 - + 2Cu + 2H 2 O --------> 2Cu (OH) 2 + Cl -

2Cu(OH)2 --------> 2CuO or Cu2O + H2O2Cu (OH) 2 --------> 2CuO or Cu 2 O + H 2 O

그리고, 수산화나트륨은 고분자 착염을 형성하는데, Cu 착염은 반응식3과 같이 흑색산화층의 조직을 침상(針狀) 또는 우상(羽狀)구조로 성장시킨다.Sodium hydroxide forms a polymer complex salt, and Cu complex salt grows the tissue of the black oxide layer in the acicular or idol structure as in Scheme 3.

Cu(OH)2 + 2NaOH --------> Na(Cu(OH)4)Cu (OH) 2 + 2NaOH --------> Na (Cu (OH) 4 )

그러나, 상기와 같은 Meyer의 방법에 의하여 형성된 흑색산화층은 표면에서 내부로 갈수록 아산화동의 함량비가 높아진다. 즉, 흑색산화층의 표면은 부도체인 산화동의 함량비가 높은 반면, 금속박막과 접촉하는 내부는 도체인 아산화동의 함량비가 높다. 그러면, 디스플레이의 전자파 차폐필터에서 요구하는 0.1Ω/□(Square : 이하 생략 함) 이하의 면 저항값을 얻을 수 없는 단점이 있다. 면 저항값이 낮으면 전기가 잘 통하는 것을 의미하고, 전기가 잘 통하면 전자파 차폐필터가 전자파를 잘 차폐하는 것을 의미한다. 그리고, 상기와 같은 Meyer의 방법으로 흑색산화층을 형성할 때, 도체인 아산화동의 함량비가 증가되게 하여 흑색산화층의 면 저항값을 0.1Ω/□ 이하로 얻을수는 있으나, 이는 디스플레이에서 요구하는 30 이하의 흑색도(L*)를 얻는 것이 불가능하다. 흑색도(L*)가 0이면 완전한 검은색을 의미하고 흑색도(L*)가 100이면 흰색을 의미한다.However, the black oxide layer formed by Meyer's method as described above has a higher content ratio of copper oxide from the surface to the inside. That is, the surface of the black oxide layer has a high content ratio of copper oxide, which is a nonconductor, while the inside of contact with the metal thin film has a high content ratio of copper oxide, a conductor. Then, there is a disadvantage in that a surface resistance value of 0.1 Ω / □ (Square: omitted below) required by the electromagnetic shielding filter of the display cannot be obtained. If the surface resistance is low, it means electricity is well communicated. If electricity is well communicated, it means that the electromagnetic shielding filter shields electromagnetic waves well. In addition, when the black oxide layer is formed by Meyer's method as described above, the content ratio of copper oxide, which is a conductor, is increased so that the sheet resistance value of the black oxide layer can be obtained at 0.1 kW / □ or less, which is less than 30 required by the display. It is impossible to obtain blackness (L *). Blackness (L *) of 0 means full black, and blackness (L *) of 100 means white.

또한, 상기와 같은 Meyer의 방법은 흑색산화층이 뾰족한 침상(針狀) 또는 우 상(羽狀) 조직으로 형성되므로 강도가 약하여 흑색산화층이 외부의 충격에 의해 쉽게 탈리(脫離)된다. 이로인해, 후공정에서 전자파 차폐필터와 근적외선 차폐필름을 상호 접착할 때 전자파 차폐필터와 근적외선 차폐필름이 상호 균일하게 접착되지 못하는 단점이 있다.In addition, the Meyer method as described above has a weak strength because the black oxide layer is formed as a sharp needle-like or right upper tissue, and the black oxide layer is easily detached by an external impact. Thus, when the electromagnetic shielding filter and the near infrared shielding film are bonded to each other in a later process, the electromagnetic shielding filter and the near infrared shielding film may not be uniformly bonded to each other.

상기와 같은 Meyer 방법을 응용한 흑색산화층을 형성하기 위한 용액이 미국특허 4,512,818호(발명자 : Silvester Valayil)에 개시되어 있다. Silvester Valayil의 특허에 개시된 용액은 물 1ℓ에 대하여 Alkali Metal Chlorite 60g, Alkali Metal Hydroxide 27g, Trialkali Metal Phosphate 3g 및 Vinol Polyvinyl Alcohol 4㎎을 첨가한 것이다. 상기 용액을 이용하여 금속박막에 흑색산화층을 형성한 후 표면조직을 촬영하고, 면 저항값과 흑색도를 측정하였다.A solution for forming a black oxide layer applying the Meyer method as described above is disclosed in US Patent 4,512,818 (Inventor: Silvester Valayil). The solution disclosed in Silvester Valayil's patent was to add 60 g Alkali Metal Chlorite, 27 g Alkali Metal Hydroxide, 3 g Trialkali Metal Phosphate and 4 mg Vinol Polyvinyl Alcohol to 1 liter of water. After forming a black oxide layer on the metal thin film using the solution, the surface texture was photographed, and the surface resistance value and blackness were measured.

도 1a에 도시된 바와 같이, 주사전자현미경(Scanning Electron Microscope)으로 5,000배 배율로 표면조직을 촬영한 결과 흑색산화층의 조직은 침상(針狀) 또는 우상(羽狀)의 조직이었다. 흑색산화층의 조직이 침상(針狀) 또는 우상(羽狀)이므로 인하여 그 경도(硬度)(Hv : Vickers Hardness)는 9.34로 얻고자 하는 경도 25.0보다 나빴다. 그리고, 면 저항값은 2.1㏀/□로 얻고자 하는 면 저항값 0.1Ω/□ 보다 나빴고, 흑색도(L*)는, 도 1b에 도시된 바와 같이, 14.07로 얻고자 하는 흑색도(L*) 30 보다 우수했다.As shown in Figure 1a, the surface tissue was photographed at a magnification of 5,000 times with a scanning electron microscope (Scanning Electron Microscope), the tissue of the black oxide layer was a needle (狀) or idol (羽 () tissue. Because the structure of the black oxide layer was acicular or idol, its hardness (Hv: Vickers Hardness) was 9.34, which was worse than the hardness of 25.0. The surface resistance value was worse than the surface resistance value 0.1 Ω / □ to be obtained at 2.1 mA / □, and the blackness level L * was the black degree (L *) desired to be obtained at 14.07 as shown in Fig. 1B. ) Better than 30).

즉, Silvester Valayil 특허에 개시된 용액으로 금속박막에 흑색산화층을 형성하였을 경우, 조직과 경도 및 면 저항값은 얻고자 하는 특성을 얻을 수 없는 단점이 있다.That is, when the black oxide layer is formed on the metal thin film with the solution disclosed in the Silvester Valayil patent, the texture, hardness, and surface resistance values have disadvantages that cannot be obtained.

본 발명은 상기와 같은 종래 기술의 문제점을 해결하기 위하여 창작된 것으로, 본 발명의 목적은 금속박막에 형성된 흑색산화층의 조직을 면상(面狀)으로 형성하여 흑색산화층의 조직, 경도, 면 저항값 및 흑색도를 모두 만족할 수 있는 금속박막에 흑색산화층을 형성하기 위한 용액, 이를 이용한 전자파 차폐필터의 금속박막에 흑색표면을 형성하는 방법 및 이에 의해 형성된 전자파 차폐필터의 금속박막을 제공함에 있다. The present invention was created in order to solve the problems of the prior art as described above, an object of the present invention is to form the structure of the black oxide layer formed on the metal thin film in the shape of the structure, hardness, surface resistance value of the black oxide layer And a solution for forming a black oxide layer on a metal thin film capable of satisfying both blackness, a method of forming a black surface on a metal thin film of an electromagnetic shielding filter using the same, and a metal thin film of an electromagnetic shielding filter formed thereby.

상기 목적을 달성하기 위한 본 발명에 따른 금속박막에 흑색산화층을 형성하기 위한 용액은 물 1ℓ에 대하여 아염소산염류(Alkali Metal Chlorite) 30∼100g, 수산화나트륨(Sodium Hydroxide) 10∼30g, 인산소다류(Trialkali Metal Phosphate) 0.1∼10g, 에틸렌 글리콜류(Ethlene Glycol) 0.1∼0.4g, 염산(Hydrochloric Acid) 0.01∼10g 및 아미노산류(Amino Acids) 0.2 ∼10g 을 혼합한다.
또한, 금속박막에 흑색산화층을 형성하기 위한 용액은 물 1ℓ에 대하여 아염소산염류(Alkali Metal Chlorite) 30∼100g, 수산화나트륨(Sodium Hydroxide) 10∼30g, 인산소다류(Trialkali Metal Phosphate) 0.1∼10g, 에틸렌 글리콜류(Ethlene Glycol) 0.1∼0.4g, 염산(Hydrochloric Acid) 0.01∼10g, 아미노산류(Amino Acids) 0.2 ∼10g 및 피로인산계(Copper Pyrophosphate) 0.1∼10g을 혼합한다.
The solution for forming the black oxide layer on the metal thin film according to the present invention for achieving the above object is 30 to 100 g of chlorite (Alkali Metal Chlorite), 10 to 30 g of sodium hydroxide (Sodium Hydroxide), sodium phosphate per 1 L of water. 0.1-10 g of Trialkali Metal Phosphate, 0.1-0.4 g of Ethlene Glycol, 0.01-10 g of Hydrochloric Acid, and 0.2-10 g of Amino Acids are mixed.
In addition, the solution for forming a black oxide layer on the thin metal film is 30 to 100 g of chlorite (Alkali Metal Chlorite), 10 to 30 g of sodium hydroxide (Trialkali Metal Phosphate) and 0.1 to 10 g of sodium hydroxide (Sodium Hydroxide) per 1 L of water. , 0.1 to 0.4 g of ethylene glycol (Ethlene Glycol), 0.01 to 10 g of hydrochloric acid, 0.2 to 10 g of amino acids and 0.1 to 10 g of pyrophosphate.

상기 목적을 달성하기 위한 본 발명에 따른 전자파 차폐필터의 금속박막에 흑색표면을 형성하는 방법은 상기 용액을 40∼90℃로 유지한 후, 메쉬가 형성된 Cu제의 금속박막을 상기 용액에 30초∼10분 동안 침적시켜 상기 금속박막의 상,하면 및 상기 메쉬를 형성하는 상기 금속박막의 측면 중 어느 한면 이상에 흑색산화층을 형성한다. The method for forming a black surface on the metal thin film of the electromagnetic shielding filter according to the present invention for achieving the above object is to maintain the solution at 40 ~ 90 ℃, 30 seconds of a metal thin film made of Cu formed mesh The black oxide layer is formed on at least one of the upper and lower surfaces of the metal thin film and the side surface of the metal thin film forming the mesh by being deposited for ˜10 minutes.

상기 목적을 달성하기 위한 본 발명에 따른 전자파 차폐필터의 금속박막은 상기 방법에 의하여 제조된 흑색산화층을 구비한다.Metal thin film of the electromagnetic shielding filter according to the present invention for achieving the above object is provided with a black oxide layer produced by the above method.

이하, 첨부한 도면을 참조하여 본 발명의 일 실시예에 따른 금속박막에 흑색산화층을 형성하기 위한 용액, 이를 이용한 전자파 차폐필터의 금속박막에 흑색표 면을 형성하는 방법 및 이에 의해 형성된 전자파 차폐필터의 금속박막을 상세히 설명한다.Hereinafter, a solution for forming a black oxide layer on a metal thin film according to an embodiment of the present invention, a method of forming a black surface on a metal thin film of an electromagnetic shielding filter using the same, and an electromagnetic shielding filter formed thereby Will be described in detail.

디스플레이의 일종인 플라즈마 디스플레이 패널(Plasma Display Panel : 이하 "PDP"라 함)에 대하여 도 2를 참조하여 설명한다.A plasma display panel (hereinafter referred to as "PDP"), which is a kind of display, will be described with reference to FIG.

도시된 바와 같이, PDP(10)는 상호 미세한 간격을 유지하여 방전 공간을 형성하는 전면유리기판(11)과 후면유리기판(13)을 구비한다. 전면유리기판(11)과 후면유리기판(13) 사이의 상기 방전 공간에는 방전가스가 봉입되는데, 상기 방전 공간을 플라즈마 방전시켜서 후면유리기판(13)의 격벽(13a)에 도포된 형광체를 여기ㆍ발광시켜 화면을 표시한다. 후면유리기판(13)의 후면에는 구동 콘트롤러(15)가 설치되고, 전면유리기판(11)의 전면에는 광학필름필터(17)가 설치된다. 광학필름필터(17)는 반사방지필름(17a), 전자파 차폐필터(50) 및 색보정/근적외선차폐필름(17b)을 가진다. 미설명부호 19는 프레임이다.As shown in the drawing, the PDP 10 includes a front glass substrate 11 and a rear glass substrate 13 which form a discharge space by keeping minute intervals from each other. Discharge gas is enclosed in the discharge space between the front glass substrate 11 and the rear glass substrate 13, and the phosphor applied to the partition 13a of the rear glass substrate 13 by exciting the discharge space is excited. The light is displayed to display the screen. The drive controller 15 is installed on the rear surface of the rear glass substrate 13, and the optical film filter 17 is installed on the front surface of the front glass substrate 11. The optical film filter 17 has an antireflection film 17a, an electromagnetic wave shielding filter 50, and a color correction / near infrared shielding film 17b. Reference numeral 19 is a frame.

전자부품에서 방사되는 유해한 전자파를 차폐하는 전자파 차폐필터(50)는, 도 3에 도시된 바와 같이, 투명기재(51), 금속박막(53) 및 투명수지(57)를 가진다. 투명기재(51)는 금속박막(53)을 지지하고, 금속박막(53)은 투명기재(11)의 상면에 형성되어 전자파를 차폐한다. 금속박막(53)은 Cu 등과 같은 도전성 금속으로 마련되며 금속박막(53)에는 메쉬(Mesh)(53a)가 형성된다. 메쉬(53a)가 형성된 금속박막(53) 상에 투명수지(57)가 코팅되는데, 투명수지(57)는 금속박(53)의 메쉬(53a) 부위를 평탄하게 코팅하여 광투과도를 향상시킨다. 그리고, 메쉬(53a)가 형성된 금속박막(53)의 상면, 하면 및 측면 중 어느 한면 이상에는 반사를 방지하기 위한 흑색산화층(54)이 형성된다. 흑색산화층(54)은 메쉬(53a)가 형성된 금속박막(53)을 투명기재(51)의 상면에 형성하기 전 또는 후에 형성된다. 미설명부호 59는 접착층이다.As shown in FIG. 3, the electromagnetic shielding filter 50 for shielding harmful electromagnetic waves emitted from an electronic component has a transparent substrate 51, a metal thin film 53, and a transparent resin 57. The transparent substrate 51 supports the metal thin film 53, and the metal thin film 53 is formed on the upper surface of the transparent substrate 11 to shield electromagnetic waves. The metal thin film 53 is made of a conductive metal such as Cu, and a mesh 53a is formed on the metal thin film 53. The transparent resin 57 is coated on the metal thin film 53 on which the mesh 53a is formed, and the transparent resin 57 improves light transmittance by flatly coating a portion of the mesh 53a of the metal foil 53. The black oxide layer 54 is formed on at least one of the upper, lower, and side surfaces of the metal thin film 53 on which the mesh 53a is formed. The black oxide layer 54 is formed before or after forming the metal thin film 53 on which the mesh 53a is formed on the upper surface of the transparent substrate 51. Reference numeral 59 is an adhesive layer.

본 실시예에 따른 금속박막(53)에 형성된 흑색산화층(54)의 조직은 면상(面狀)구조로 형성된다. 이를 위하여 본 실시예에 따른 금속박막에 흑색산화층을 형성하기 위한 용액은 물 1ℓ에 대하여 아염소산염류(Alkali Metal Chlorite) 30∼100g, 수산화나트륨(Sodium Hydroxide) 10∼30g, 인산소다류(Trialkali Metal Phosphate) 0.1∼10g 이외에, 에틸렌 글리콜류(Ethlene Glycol) 0.1∼0.4g, 염산(Hydrochloric Acid) 0.01∼10g, 아미노산류(Amino Acids) 0.2 ∼10g 및 피로인산계(Copper Pyrophosphate) 0.1∼10g이 첨가된 용액이다.The black oxide layer 54 formed on the metal thin film 53 according to the present embodiment has a planar structure. To this end, the solution for forming the black oxide layer on the metal thin film according to the present embodiment is 30 to 100 g of chlorite (Alkali Metal Chlorite), 10 to 30 g of sodium hydroxide (Sodium Hydroxide), and sodium phosphate (Trialkali Metal) to 1 l of water. In addition to 0.1 to 10 g of phosphate, 0.1 to 0.4 g of ethylene glycol (Ethlene Glycol), 0.01 to 10 g of hydrochloric acid, 0.2 to 10 g of amino acids and 0.1 to 10 g of pyrophosphoric acid (Popper Pyrophosphate) are added. Solution.

상세히 설명하면, 아염소산염류는 Cu와 반응하여 동 수화물(Cu(OH)2)을 생성하고, 수산화나트륨은 동 수화물과 반응하여 동 착염( Na(Cu(OH)4))을 형성한다. 이는 전술한 바와 같다. 그리고, 인산소다류는 아염소산소다의 자연분해를 방지하고 흑색산화층의 미세화시키며, 에틸렌 글리콜류는 Cu 표면의 장력을 감소시키고 조직을 미세화시킨다. 또한, 염산은 전술한 산화동과 아산화동의 생성 비율을 조절하여 흑색산화층의 면 저항값을 0.1Ω/□(Square : 이하 생략함) 이하로 감소시키고, 아미노산류는 흑색산화층의 조직을 면상조직으로 개질함과 동시에 면 저항값을 0.1Ω/□이하로 감소시킨다. 마지막으로, 피로인산계는 흑색산화층 형성 용액을 활성화시켜 흑색산화층의 흑색도(L*)를 30이하로 감소시킨다.In detail, chlorites react with Cu to produce copper hydrate (Cu (OH) 2 ), and sodium hydroxide reacts with copper hydrate to form copper complex salts (Na (Cu (OH) 4 )). This is as described above. Sodium phosphate prevents the natural decomposition of sodium chlorite and refines the black oxide layer, and ethylene glycol reduces the tension of the Cu surface and refines the structure. In addition, hydrochloric acid reduces the sheet resistance value of the black oxide layer to 0.1 Ω / □ (Square: hereinafter omitted) by adjusting the formation rate of copper oxide and nitrous oxide described above, and amino acids modify the structure of the black oxide layer to planar tissue. At the same time, reduce the surface resistance to 0.1Ω / □ or less. Finally, the pyrophosphate system activates the black oxide layer forming solution to reduce the blackness (L *) of the black oxide layer to 30 or less.

다음에는 본 실시예에 따른 용액을 이용하여 금속박막에 흑색산화층을 형성하는 다양한 실시예를 설명한다.Next, various embodiments of forming a black oxide layer on a metal thin film using a solution according to the present embodiment will be described.

실시예1Example 1

물 1ℓ에 대하여 아염소산칼륨 60g, 수산화나트륨 27g, 인산소다류인 H2NaPO4 3 g, 염산 1.3g, 아미노산 2.7g 및 에틸렌 글리콜 1.2g을 혼합하여 40∼90℃로 유지한 후 메쉬가 형성된 금속박막을 30초∼10분 동안 담가서 흑색산화층을 형성한 후, 표면조직, 면 저항값 및 흑색도를 각각 촬영 및 측정하였다. 이때, 흑색산화층은 금속박막의 상면과 메쉬를 형성하는 금속박막의 측면에 형성시켰다. 60 g of potassium chlorite, 27 g of sodium hydroxide, 3 g of H 2 NaPO 4 , soda phosphate, 1.3 g of hydrochloric acid, 2.7 g of amino acid, and 1.2 g of ethylene glycol were mixed and maintained at 40 to 90 ° C., followed by mesh formation. After immersing the thin film for 30 seconds to 10 minutes to form a black oxide layer, the surface texture, surface resistance value and blackness were respectively photographed and measured. At this time, the black oxide layer was formed on the upper surface of the metal thin film and the side surface of the metal thin film forming the mesh.

도 4a에 도시된 바와 같이, 흑색산화층(54)의 표면조직은 면상구조로 형성되고, 이로인한 경도는 36.02로 요구하는 특성치 25.0 보다 우수했다. 그리고, 면 저항값은 0.10Ω/□ 으로 요구하는 특성치와 동일한 특성을 얻었고, 흑색도(L*)는, 도 4b에 도시된 바와 같이, 25.43으로 요구하는 특성치 30보다 우수했다.As shown in FIG. 4A, the surface structure of the black oxide layer 54 was formed in a planar structure, and the hardness thereof was superior to the characteristic value 25.0 required to be 36.02. And the surface resistance value obtained the same characteristic as the characteristic value calculated | required at 0.10 kPa / square, and blackness (L *) was superior to the characteristic value 30 requested at 25.43, as shown in FIG. 4B.

실시예2Example 2

물 1ℓ에 대하여 아염소산칼륨 60g, 수산화나트륨 27g, 인산소다류인 H2NaPO4 3 g, 염산 1.3g, 아미노산 2.7g, 에틸렌 글리콜 1.2g 및 피로인산계인 Cu2P2O7 0.5g을 혼합하여 40∼90℃로 유지한 후 금속박막을 30초∼10분 동안 담그서 흑색산화층을 형성한 후, 표면조직, 면 저항값 및 흑색도를 각각 촬영 및 측정하였다. 이때, 흑색산화층은 금속박막의 상면과 메쉬를 형성하는 금속박막의 측면에 형성시켰다. To 1 liter of water, 60 g of potassium chlorite, 27 g of sodium hydroxide, 3 g of H 2 NaPO 4 , sodium phosphate, 1.3 g of hydrochloric acid, 2.7 g of amino acid, 1.2 g of ethylene glycol, and 0.5 g of Cu 2 P 2 O 7 of pyrophosphoric acid were mixed. After maintaining at 40 to 90 ° C., the metal thin film was immersed for 30 seconds to 10 minutes to form a black oxide layer, and surface texture, surface resistance value, and blackness were respectively photographed and measured. At this time, the black oxide layer was formed on the upper surface of the metal thin film and the side surface of the metal thin film forming the mesh.

도 5a에 도시된 바와 같이, 흑색산화층(54)의 표면조직은 면상구조로 형성되고, 이로인한 경도는 27.68로 요구하는 특성치 25.0 보다 우수했다. 그리고, 면 저항값은 0.09Ω/□ 로 요구하는 특성치 0.1Ω/□ 보다 우수했고, 흑색도(L*)는, 도 5b에 도시된 바와 같이, 16.62로 요구하는 특성치 30보다 우수했다.As shown in Fig. 5A, the surface structure of the black oxide layer 54 was formed in a planar structure, and thus the hardness was 27.68, which was superior to the required characteristic value 25.0. The sheet resistance value was better than the characteristic value 0.1 mW / square required at 0.09 kV / square, and the blackness level L * was superior to the characteristic value 30 required at 16.62, as shown in Fig. 5B.

즉, 본 실시예에 따른 금속박막에 흑색산화층을 형성하기 위한 용액에는 아염소산염류와 수산화나트륨에 인산소다류, 에틸렌 글리콜류, 염산, 아미노산류 및 피로인산계가 적정량 첨가된다. 상기 첨가제로 인하여, 금속박막(53)에 형성된 흑색산화층(54)이 면상구조로 형성된다. 이로인해, 흑색산화층(54)은 디스플레이중 PDP용 전자파 차폐필터에서 요구하는 경도 25 이하, 흑색도(L*) 30 이하, 면 저항값 0.1Ω/□ 이하인 특성을 가진다.That is, an appropriate amount of sodium phosphate, ethylene glycol, hydrochloric acid, amino acids and pyrophosphoric acid is added to the solution for forming the black oxide layer on the metal thin film according to the present embodiment. Due to the additive, the black oxide layer 54 formed on the metal thin film 53 is formed in a planar structure. As a result, the black oxide layer 54 has the characteristics of hardness of 25 or less, blackness (L *) of 30 or less, and sheet resistance of 0.1 kΩ / square or less, which are required by the electromagnetic wave shielding filter for PDP during display.

이상에서 설명한 바와 같이, 본 발명에 따른 금속박막에 흑색산화층을 형성하기 위한 용액을 이용하여 금속박막에 흑색산화층을 형성하면 흑색산화층이 면상구조로 형성되므로, 흑색산화층의 경도, 면 저항값 및 흑색도의 특성이 우수해진다. 이로인해, 전자파 차폐필터가 전자파를 차폐하는 효율이 향상되고, 전자파 차폐필터가 설치된 디스플레이의 콘트라스트(Contrast)가 향상된다.As described above, when the black oxide layer is formed on the metal thin film by using the solution for forming the black oxide layer on the metal thin film according to the present invention, the black oxide layer is formed into a planar structure. The characteristic of the figure becomes excellent. As a result, the efficiency of shielding the electromagnetic wave from the electromagnetic shielding filter is improved, and the contrast of the display provided with the electromagnetic shielding filter is improved.

이상에서는, 본 발명의 일 실시예에 따라 본 발명을 설명하였지만, 본 발명 이 속하는 기술분야에서 통상의 지식을 가진 자가 본 발명의 기술적 사상을 벗어나지 않는 범위 내에서 변경 및 변형한 것도 본 발명에 속함은 당연하다.In the above, the present invention has been described in accordance with one embodiment of the present invention, but those skilled in the art to which the present invention belongs and also changes and modifications within the scope without departing from the spirit of the present invention Of course.

Claims (6)

물 1ℓ에 대하여 아염소산염류(Alkali Metal Chlorite) 30∼100g, 수산화나트륨(Sodium Hydroxide) 10∼30g, 인산소다류(Trialkali Metal Phosphate) 0.1∼10g, 에틸렌 글리콜류(Ethlene Glycol) 0.1∼0.4g, 염산(Hydrochloric Acid) 0.01∼10g 및 아미노산류(Amino Acids) 0.2 ∼10g을 혼합한 것을 특징으로 하는 금속박막에 흑색산화층을 형성하기 위한 용액.30 to 100 g of Alkali Metal Chlorite, 10 to 30 g of Sodium Hydroxide, 0.1 to 10 g of Trialkali Metal Phosphate, 0.1 to 0.4 g of Ethlene Glycol, per liter of water A solution for forming a black oxide layer on a metal thin film, comprising 0.01 to 10 g of hydrochloric acid and 0.2 to 10 g of amino acids. 물 1ℓ에 대하여 아염소산염류(Alkali Metal Chlorite) 30∼100g, 수산화나트륨(Sodium Hydroxide) 10∼30g, 인산소다류(Trialkali Metal Phosphate) 0.1∼10g, 에틸렌 글리콜류(Ethlene Glycol) 0.1∼0.4g, 염산(Hydrochloric Acid) 0.01∼10g, 아미노산류(Amino Acids) 0.2 ∼10g 및 피로인산계(Copper Pyrophosphate) 0.1∼10g을 혼합한 것을 특징으로 하는 금속박막에 흑색산화층을 형성하기 위한 용액.30 to 100 g of Alkali Metal Chlorite, 10 to 30 g of Sodium Hydroxide, 0.1 to 10 g of Trialkali Metal Phosphate, 0.1 to 0.4 g of Ethlene Glycol, per liter of water A solution for forming a black oxide layer on a metal thin film, comprising 0.01 to 10 g of hydrochloric acid, 0.2 to 10 g of amino acids, and 0.1 to 10 g of copper pyrophosphate. 삭제delete 제 1 항 또는 제 2 항에 따른 용액을 40∼90℃로 유지한 후, 메쉬가 형성된 Cu제의 금속박막을 상기 용액에 30초∼10분 동안 침적시켜 상기 금속박막의 상,하면 및 상기 메쉬를 형성하는 상기 금속박막의 측면 중 어느 한면 이상에 흑색산화층을 형성하는 것을 특징으로 하는 전자파 차폐필터의 금속박막에 흑색산화층을 형성하는 방법.After maintaining the solution according to claim 1 or 2 at 40 to 90 ° C., a metal thin film made of Cu formed with a mesh is deposited in the solution for 30 seconds to 10 minutes, and the upper and lower surfaces of the metal thin film and the mesh Forming a black oxide layer on the metal thin film of the electromagnetic shielding filter, characterized in that to form a black oxide layer on at least one side of the side of the metal thin film to form a. 제 4 항에 따른 방법에 의하여 제조된 흑색산화층을 구비하는 것을 특징으로 하는 전자파 차폐필터의 금속박막.A metal thin film of an electromagnetic shielding filter, comprising a black oxide layer prepared by the method according to claim 4. 삭제delete
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