KR20070037273A - Plasma display panel and making method thereof - Google Patents

Abstract

The present invention relates to a plasma display panel and a manufacturing method, and more particularly, to a plasma display panel including an electromagnetic shielding layer that can reduce the manufacturing cost by changing the material of the electromagnetic shielding layer and a manufacturing method thereof. .

The plasma display panel of the present invention for solving the above technical problem includes a front substrate; and an electromagnetic shielding layer composed of a plurality of layers having different conductivity on the front surface of the front substrate.

As described above, the present invention reduces the use of expensive silver and forms an electromagnetic wave shielding layer by spraying or sputtering by mixing palladium which is a low-cost conductive material, thereby greatly reducing the manufacturing cost of the plasma display panel. .

Plasma, display, electromagnetic waves, shielding, palladium

Description

Plasma Display Panel and Making Method Thereof

1 is a view showing a filter including an electromagnetic shielding film of a conventional mesh (Mesh) type.

2 is a view for explaining a plasma display panel including a conductive layer composed of a mixture of silver and palladium according to a first embodiment of the present invention.

FIG. 3 is a diagram schematically illustrating a method of manufacturing a plasma display panel according to the first embodiment of FIG. 2.

4 is a view for explaining a plasma display panel including a conductive layer composed of a mixture of silver, palladium, and gold according to a second embodiment of the present invention.

FIG. 5 is a diagram schematically illustrating a method of manufacturing a plasma display panel according to the second embodiment of FIG. 4.

Fig. 6 is a diagram showing another example of the firing process of the plasma display panel in the first embodiment or the second embodiment.

FIG. 7 is a view for explaining a plasma display panel including an electromagnetic shielding layer laminated in a plurality of layers according to a third embodiment; FIG.

8 is a view for explaining a plasma display panel including an electromagnetic shielding layer according to a fourth embodiment of the present invention.

***** Explanation of symbols for the main parts of the drawing *****

700: front substrate 710: conductive layer

720: transparent electrode layer

The present invention relates to a plasma display panel and a manufacturing method, and more particularly, to a plasma display panel and a method for manufacturing the same, including an electromagnetic shielding layer is reduced manufacturing cost by changing the material of the electromagnetic shielding layer.

In general, a plasma display panel (hereinafter referred to as a PDP) has a partition wall formed between a front glass and a rear glass of soda-lime glass and forms one unit cell. When inert gases such as helium-xenon (He-Xe) and helium-neon (He-Ne) are discharged by high frequency voltage, vacuum ultraviolet rays are generated to emit phosphors formed between partition walls. It is a device that implements an image. Such PDPs are attracting attention as the next generation display devices because they are characterized by the ease of manufacturing due to the simple structure, the thin shape, and the low power consumption.

Such a general plasma display device includes a plasma display panel and a driving device. The plasma display panel is configured by adsorbing a surface on which a barrier rib of a rear substrate is formed and a surface on which an electrode and a dielectric layer of the front substrate are formed. The drive unit is coupled to the rear of the panel.

In addition, the plasma display panel and the driving device of the plasma display device generate strong leakage electromagnetic waves or near infrared rays during the operation process.

Therefore, in general, a plasma display apparatus has used a functional filter to shield such electromagnetic waves because electromagnetic waves are generated by a strong high frequency voltage when the plasma display apparatus is driven. Such functional filters include a glass filter and a film filter.

Each layer of the conventional filter has an anti-reflection film (AR film) for reducing ultraviolet rays and external reflected light, a color-dye film for controlling near-infrared (NIR) blocking and color, and electromagnetic shielding according to a function. Electromagnetic shielding film (EMI Film) for forming a unit film layer is formed.

More specifically, the filter includes films having functions such as antireflection, color control, and electromagnetic shielding, each of which is a base film of a material such as polyethylene terepletite (PET) or triacetyl cellulose (TAC). Attached to each other to form a unit film layer, and each unit film layer is bonded to each other by an adhesive.

The conventional electromagnetic shielding film layer will be described in more detail with reference to FIG. 1.

1 is a view showing a filter including an electromagnetic shielding film of a conventional mesh (Mesh) type.

Conventional electromagnetic shielding film (EMI coating) as shown in Figure 1 forms a grounding portion (10) to which the bus bar (ground) using a conductive paste (ground) is grounded and the conductive material is formed of a mesh (Cu) It is formed by etching a material such as) to form a mesh film 20 and then attaching it to a base film (not shown) using an adhesive film (not shown).

On the other hand, such a mesh type electromagnetic shielding filter has a lot of difficulties in the manufacturing process in the trend of the plasma display device in pursuit of large size. Because, in the case of a large panel, there is a problem that the manufacturing process is complicated and the manufacturing cost is high to make a large mesh when applying or attaching a mesh type electromagnetic shielding film layer to the large plasma panel.

This complicated manufacturing process has a problem of increasing the defective rate of the image filter. Therefore, there was a problem that the manufacturing cost is also increased.

In addition, when attaching a mesh type filter having a thinly treated opaque conductive metal to the surface of a panel that emits light by self-emission, the mesh type electromagnetic shielding filter interferes with the progress of light to lower the brightness of the plasma display device. there was.

In order to solve this problem, the present invention forms an electromagnetic shielding layer composed of a plurality of layers having different conductivity when forming the electromagnetic shielding layer by spray method, thereby simplifying the manufacturing process, increasing the process yield and increasing the manufacturing cost. It is an object of the present invention to provide a plasma display panel and a method of manufacturing the same that can be reduced.

The plasma display panel of the present invention for solving the above technical problem includes a front substrate; and an electromagnetic shielding layer composed of a plurality of layers having different conductivity on the front surface of the front substrate.

The electromagnetic shielding layer may include a conductive layer in which silver (Ag) and palladium (Pd) are mixed.

The conductive layer is characterized in that gold (Au) is mixed.

The electromagnetic shielding layer may include a transparent electrode layer (Indium Tin Oxide) that transmits light while absorbing electromagnetic waves.

The electromagnetic wave shielding layer is formed of a plurality of layers.

The conductive layer is characterized in that the thickness of one layer is 0.01㎛ ~ 1㎛.

In addition, a method of manufacturing a plasma display panel including a front substrate includes a first coating step of applying a mixture of silver and palladium constituting a conductive layer for shielding electromagnetic waves on the front substrate, by the first coating step A second coating step of applying indium tin oxide (ITO) forming a transparent electrode layer while shielding electromagnetic waves on the applied mixture and the mixture applied by the first coating step and the second coating step A calcining step of calcining the indium tin oxide.

In addition, the method for manufacturing a plasma display panel including a front substrate includes a first coating step of applying a mixture of silver, palladium and gold constituting a conductive layer for shielding electromagnetic waves on the front substrate, by the first coating step. A second coating step of applying indium tin oxide (ITO) forming a transparent electrode layer while shielding electromagnetic waves on the applied mixture and the mixture applied by the first coating step and the second coating step A calcining step of calcining the indium tin oxide.

The first application step includes firing the applied mixture.

The first coating step is characterized in that made by a spray method.

The first coating step is characterized in that made by a sputtering method.

Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings.

<First Embodiment>

2 is a view for explaining a plasma display panel including a conductive layer composed of a mixture of silver and palladium according to a first embodiment of the present invention.

First, referring to FIG. 2, the plasma display panel according to the present invention includes an electromagnetic shielding layer 200 including a front substrate 100 and a plurality of layers 210 and 220 having different electrical conductivity on the front surface of the front substrate 100. Include.

The plasma display panel includes a front substrate 100 and a rear substrate (not shown). The panel is formed by bonding the front substrate 100 and the rear substrate. The bonding process results in a panel containing a large number of discharge cells.

As described in the related art, an electromagnetic shielding layer 200 is formed on the front surface of the front substrate 100 to shield a large amount of electromagnetic waves emitted through the front substrate 100. The electromagnetic wave shielding layer 200 of the present invention includes a conductive layer 220 in which silver (Ag) and palladium (Pd) are mixed, and a transparent electrode layer (Indium Tin Oxide, 210) that transmits light while absorbing electromagnetic waves. .

The reason for using the mixture of silver and palladium and ITO to achieve the electromagnetic shielding function is as follows.

Mixtures of silver and palladium have very high electrical conductivity but are opaque metals. The reason for using palladium by mixing it here is because silver is expensive. Therefore, when using a mixture of inexpensive palladium, it is possible to form the same conductive layer 220 at a much lower manufacturing cost than using only silver.

In addition, although copper (Cu), which is a highly conductive material, may be used as the conductive layer, copper has a disadvantage in that it does not have a function of blocking near infrared rays (NIR) induced from inert (Ne, Xe) gases injected into the PDP. . In addition, when the PDP goes to the large screen, when the electromagnetic shielding film layer is formed in a mesh type using copper, it is difficult to manufacture a large size mask for making the electromagnetic shielding film of the mesh type.

Therefore, when copper is used as the conductive material, there is a problem in that a layer having a near infrared blocking function must be separately formed on the PDP front filter. In addition, although only silver, which is a highly conductive material, may be used, in the case of using only silver, as the large plasma display panel becomes larger, there is a problem that the manufacturing cost becomes too high.

Therefore, the present invention is to solve this problem by using a mixture of much cheaper palladium than silver while performing the equivalent electromagnetic shielding function. The manufacturing cost of the electromagnetic shielding layer 200 according to the present invention has an effect that is reduced to about one hundredth of the manufacturing cost of the existing electromagnetic shielding layer 200.

In addition, when using a mixture of palladium, the life of the conductive layer 220 can be extended than when using only silver due to the nature of the palladium material.

The transparent electrode layer 210 is made of ITO. ITO has a lower electrical conductivity than the conductive layer 220 but has a function of transmitting light. Therefore, when the two layers 210 and 220 are alternately stacked, the conductive layer 220 which is an opaque mixed metal is thin, and the transparent electrode layer 210 which is made of ITO, which is a transparent metal, may be thicker than the conductive layer 220. have. The conductive layer 220 and the transparent electrode layer 210 may have a thickness of 1 μm or less. That is, it is preferable that the conductive layer 220 has a thickness such that the light emitted from the plasma display panel can have sufficient transmittance.

As such, the two stacked layers effectively shield electromagnetic waves and at the same time effectively transmit the light emitted from the cell.

Until now, the electromagnetic shielding layer 200 including the conductive layer 220 and the transparent electrode layer 210 formed of a mixture of silver and palladium in the plasma display panel according to the first embodiment of the present invention has been described. .

Hereinafter, a method of manufacturing the plasma panel according to the first embodiment will be described.

FIG. 3 shows a first method of manufacturing a plasma display panel according to a first embodiment of the present invention. Among the methods of manufacturing a plasma display panel, an electromagnetic wave including a conductive layer composed of a mixture of silver and palladium, which is a feature of the present invention, Only the manufacturing method for the shielding layer is shown briefly.

Therefore, hereinafter, the description of the manufacturing method of the plasma display panel of the other parts except for the electromagnetic shielding layer which is a feature of the present invention will be omitted, and the method of manufacturing the electromagnetic shielding layer comprising a mixture of silver and palladium, which is a feature of the present invention. Only explain.

3 is a diagram schematically illustrating a method of manufacturing a plasma display panel according to the first embodiment of FIG. 2.

Referring to FIG. 3, a method of manufacturing a plasma display panel including a front substrate includes a first coating step (S310) of applying a mixture of silver and palladium constituting a conductive layer to shield electromagnetic waves on the front substrate, A second coating step (S320) for applying an indium tin oxide (ITO) to form a transparent electrode layer while shielding the electromagnetic waves on the mixture applied by the first coating step (S320) and the mixture applied by the first coating step And a firing step (S330) of firing the indium tin oxide applied by the second coating step.

First, a mixture of silver and palladium is applied to the front substrate of the plasma display panel (S310, first coating step). The application of the mixture of silver and palladium is here by spray or sputtering.

The spray method is as follows. In the spray method, an injector containing a mixture of silver and paradium for forming a conductive layer on the front surface of the plasma display panel sprays the mixture of silver and paradium in a strongly fluid state in which powder and resin are bonded onto the front substrate of the panel. It is. In this case, the front substrate is coated with a mixture of silver and palladium, thereby forming a first coating step (S310).

Application by the spray method has an effect of increasing the uniformity (Uniformity) of the conductive layer by hardly generated bubbles that may be a problem when forming the conductive layer.

The sputtering method is as follows. According to the sputtering method, a target sample made of a mixture of silver and palladium is set in a sputtering apparatus having a vacuum inside, and the target substrate is set so that the front substrate of the plasma display panel faces the target sample. Subsequently, when a voltage is applied by injecting argon (Ar) gas or the like, a plasma state in which the argon gas is decomposed into argon ions and electrons is formed. These argon ions impinge on the target sample which is a mixture of silver and palladium. As a result, a mixture of silver and palladium is attached to the front substrate of the plasma display panel in an atomic state by the collision of argon ions to form an electromagnetic shielding layer.

After the first coating step S310, ITO having different conductivity is applied onto the mixture applied by the first coating step (S320, second coating step). Application of ITO (S320) may be applied by electron beam deposition, sputtering, or the like.

Finally, after the first application step S310 and the second application step S320 are performed, the mixture applied by the first application step S310 and the ITO applied by the second application step S320 are fired. (S330, firing step).

In the firing step (S330), thermal firing, ultraviolet firing, laser firing, or the like may be used.

Until now, only the electromagnetic wave shielding layer and a method of manufacturing the electromagnetic wave shielding layer, which include a conductive layer composed of a mixture of silver and palladium in a plasma display panel, will be described later. The electromagnetic shielding layer comprising a conductive layer consisting of a mixture of and a method of manufacturing the same.

Second Embodiment

4 is a view for explaining a plasma display panel including a conductive layer composed of a mixture of silver, palladium, and gold according to a second embodiment of the present invention.

First, referring to FIG. 4, the plasma display panel according to the present invention includes an electromagnetic shielding layer 400 including a front substrate 100 and a plurality of layers 410 and 420 having different conductivity on the front surface of the front substrate 100. do.

Since the description of the front substrate 100 of the plasma display panel is the same as described above, a detailed description thereof will be omitted.

The electromagnetic shielding layer includes a conductive layer 420 in which silver (Ag), palladium (Pd), and gold (Au) are mixed, and a transparent electrode layer 410 that transmits light while absorbing electromagnetic waves. Detailed descriptions of silver and palladium have already been described above, and thus omission and addition of the description of gold are as follows.

Since gold has very high electrical conductivity compared to silver or palladium, the electrical conductivity of the conductive layer 420 may be further increased by mixing a very small amount. Therefore, the electromagnetic shielding effect of the conductive layer 420 mixed with gold is more excellent.

In addition, the present invention by forming a conductive layer by mixing a small amount of gold (Au) with silver and palladium, it is possible to form an electromagnetic shielding layer excellent in electrical conductivity.

Next, a method of manufacturing the plasma panel according to the second embodiment will be described with reference to FIG. 5. FIG. 5 shows a manufacturing method for a plasma display panel, and only a manufacturing method for an electromagnetic wave shielding layer including a conductive layer composed of a mixture of silver, palladium and gold, which is a feature of the present invention, is a manufacturing method of a plasma display panel. Briefly shown.

FIG. 5 is a diagram schematically illustrating a method of manufacturing a plasma display panel according to the second embodiment of FIG. 4.

Referring to FIG. 5, in the method of manufacturing a plasma display panel including a front substrate, a first coating step (S510) of coating a mixture of silver, palladium and gold constituting a conductive layer for shielding electromagnetic waves on the front substrate is performed. A second coating step (S520) of applying an indium tin oxide (ITO) to form a transparent electrode layer while shielding electromagnetic waves on the mixture applied by the first coating step (S510) and the first coating step ( And a firing step S530 of firing ITO by the second coating step S520 and the mixture applied by S510.

First, a mixture of silver, palladium and gold is applied to the front substrate of the plasma display panel (S510, first coating step). The application of the mixture of silver and palladium is here by spray or sputtering.

Detailed descriptions of the spray method and the sputtering method are already described above, and thus, further description thereof will be omitted.

After the first application step (S510), ITO having a different conductivity is applied onto the mixture applied by the first application step (S520, second application step). Application of ITO (S520) may be applied by electron beam deposition, sputtering, or the like.

Finally, after the first application step S510 and the second application step S520 are performed, the mixture applied by the first application step S510 and the ITO applied by the second application step S520 are fired. (S530, firing step).

In the firing step (S530), thermal firing, ultraviolet firing, laser firing, or the like may be used.

In the method of manufacturing the plasma display panel according to the first embodiment and the second embodiment, the first application steps S310 and S510 are performed after the first application steps S310 and S510 and the second application steps S320 and S520 are performed. It has been described that the mixture applied by and the ITO applied by the second coating step (S320, S520) is fired at once, but differently from FIG. 6, after the first coating step, the firing process and the second coating step are performed. I'll explain.

6 is a view showing another example of a firing process of the plasma display panel in the first embodiment or the second embodiment.

Referring to FIG. 6, the first application step of FIG. 3 or the first application step of FIG. 5 further includes firing the applied mixture.

That is, a method of manufacturing a plasma display panel including a front substrate may include applying a mixture of silver and palladium or a mixture of gold (S610), and firing the mixture applied by the mixture applying step. (S620), applying the ITO on the mixture formed by the step (S630), and firing the ITO applied by the ITO application step (S640).

Detailed description of each step is the same as described above will be omitted.

Until now, only the electromagnetic wave shielding layer has been formed of one conductive layer and one transparent electrode layer, but in order to increase the electromagnetic shielding effect, a plurality of conductive sides and a plurality of transparent electrode layers may be formed.

Third Embodiment

FIG. 7 illustrates a plasma display panel including an electromagnetic shielding layer stacked with a plurality of layers according to a third embodiment.

Referring to FIG. 7, an electromagnetic shielding layer including a transparent electrode layer 710 and a conductive layer 720 is formed on a plurality of layers on the front substrate 700. As described above, the electromagnetic shielding layer has a transparent electrode layer 710 and a conductive layer 720 stacked on the front substrate 700 to complement each other. Therefore, in order to increase the electric wave shielding effect, the conductive layer 720 is thin, the transparent electrode layer 710 is thick, it is preferable to alternately stack each layer alternately.

The conductive layer 720 formed at this time is formed of a mixture of silver and palladium or a mixture of silver, palladium and gold.

The total thickness of the electromagnetic shielding layer laminated with such a plurality of layers is suitably between 1 μm and 100 μm. This is because if the thickness of the electromagnetic wave layer is 100 µm or more, the brightness of the image may be lowered. In addition, when the thickness is less than 1㎛, since the electromagnetic shielding function may be degraded, the total thickness of the electromagnetic shielding layer laminated in multiple layers is suitably between 1㎛ ~ 100㎛.

The method of forming such a plurality of layers is preferably made through an application step and a firing step. In addition, the coating step is preferably made by a spray method and a sputtering method.

A more detailed description will be omitted since it is the same as the above description.

As in the third exemplary embodiment, the electromagnetic shielding layer may be alternately stacked with the same number of conductive layers 720 and the transparent electrode layer 710, but may be stacked with different numbers of stacked layers. This will be described in detail through the fourth embodiment to be described later.

Fourth Embodiment

8 is a view for explaining a plasma display panel including an electromagnetic shielding layer according to a fourth embodiment of the present invention.

Referring to FIG. 8A, the electromagnetic shielding layer on the front substrate 800 may include a conductive layer formed between two transparent electrode layers 810 and a transparent electrode layer 810 that transmit light while absorbing electromagnetic waves. 820).

The conductive layer 820 having high electrical conductivity is disposed in the center, and the transparent conductive electrode layer 810 is weakly disposed, but the transparent conductive electrode layer 810 is located outside, so that the electromagnetic shielding effect can be enhanced by using the conductive layer 820 more efficiently.

In addition, referring to FIG. 8B, the electromagnetic shielding layer absorbs electromagnetic waves formed between the two conductive layers 820 and the conductive layer 820 on the front substrate 800, and transmits light through a transparent electrode layer ( 810).

Meanwhile, the transparent electrode layer 810 according to the embodiments of the present invention is not necessarily limited to ITO. Any metal can be used as long as it is transparent and has excellent electrical conductivity. For example, indium zinc oxide (IZO: Indium Zink Oxide) may be possible. In addition, the number of stacked transparent electrode layers and conductive layers is not limited to the two layers illustrated in FIGS. 7 and 8, but two or more layers may be used as long as the electromagnetic wave shielding effect is maximized while ensuring proper transmittance.

In addition, the electromagnetic wave shielding layer of the present invention can be used with a functional layer serving as another image filter. That is, it can be used as an image filter together with an antireflection layer, a color die layer, and other functional layers.

As such, those skilled in the art will appreciate that the present invention can be implemented in other specific forms without changing the technical spirit or essential features thereof. Therefore, the above-described embodiments are to be understood as illustrative in all respects and not as restrictive.

The scope of the present invention is shown by the following claims rather than the detailed description, and all changes or modifications derived from the meaning and scope of the claims and their equivalents should be construed as being included in the scope of the present invention. do.

As described above, the present invention reduces the use of expensive silver and forms an electromagnetic wave shielding layer by spraying or sputtering by mixing palladium which is a low-cost conductive material, thereby greatly reducing the manufacturing cost of the plasma display panel. .

Claims (4)

Front substrate; And an electromagnetic shielding layer including at least one conductive layer of silver (Ag) and palladium (Pd) on the front surface of the front substrate. The method of claim 1, The conductive layer is a plasma display panel, characterized in that gold (Au) is mixed. The method of claim 1, The electromagnetic wave shielding layer includes a transparent electrode layer that transmits light while absorbing electromagnetic waves. The method of claim 1, The conductive layer is a plasma display panel, characterized in that the thickness of 0.01㎛ ~ 1㎛.

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