CN1979717A - Plasma display and mfg. method - Google Patents

Plasma display and mfg. method Download PDF

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Publication number
CN1979717A
CN1979717A CNA2005101228514A CN200510122851A CN1979717A CN 1979717 A CN1979717 A CN 1979717A CN A2005101228514 A CNA2005101228514 A CN A2005101228514A CN 200510122851 A CN200510122851 A CN 200510122851A CN 1979717 A CN1979717 A CN 1979717A
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CN
China
Prior art keywords
spaced walls
bulkhead
manufacturing
next door
night
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CNA2005101228514A
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Chinese (zh)
Inventor
李勇翰
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
LG Electronics Nanjing Plasma Co Ltd
Original Assignee
LG Electronics Nanjing Plasma Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by LG Electronics Nanjing Plasma Co Ltd filed Critical LG Electronics Nanjing Plasma Co Ltd
Priority to CNA2005101228514A priority Critical patent/CN1979717A/en
Publication of CN1979717A publication Critical patent/CN1979717A/en
Pending legal-status Critical Current

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Abstract

The invention involves in plasma display and its manufacturing method, and the dielectric is coated on the substrates of the back glass. The manufacturing method includes the procedures: coats the first bulkhead material on the dielectric layer, then coats the second bulkhead material on the first bulkhead, then coats the photoresist on the second bulkhead; and then uses the shielding film on the photoresist to develop the exposure template, then etch the first and second bulkhead respectively and selectively. In accordance with the invention, the white bulkhead is narrow than the black bulkhead, then reduce maximally the absorption to the visual light by reducing the black bulkhead that is exposed in the unit where it produces the visual light, and then avoid efficiently to produce low luminescence it is caused by the black bulkhead. In addition, it reduces also the square of black bulkhead of large constant of dielectric, reduces the constant of dielectric, restrain the increase of capacitance. Thus it can reduce the electric power loss caused by displacement current used for capacitance charge when driving, and then improve the driving efficiency.

Description

Plasma display and manufacture method thereof
Technical field
The present invention relates to plasma display and manufacture method thereof.
Background technology
Generally speaking, for plasma display (Plasma Display Panel: hereinafter to be referred as " PDP ".), it is a kind of picture to be carried out device shown.The spaced walls that forms between front glass that is made of soda lime (Soda-lime) glass and back side glass constitutes the unit of a unit, then, with the neon in each unit (Ne), helium (He) or He-Ne (Ne+He) gas as periodic discharge, and add a spot of xenon inert gases such as (Xe), produce discharge by high frequency voltage.In this case, will produce vacuum ultraviolet (VacuumUltraviolet rays), thereby make the light-emitting phosphor that between spaced walls, forms, like this, just can carry out picture and show.Plasma display a kind of picture display device that comes to this with said structure and feature.
Fig. 1 is the structural representation according to the plasma display of prior art.Plasma display (PDP) leaves certain slit by the front glass substrate 10 and back glass substrate 20 parallel be combined intos that show portrait between front-back baseboard as shown in the figure.
Electrode pair 11 is kept in the below of glass substrate 10 in front, 12, this electrode pair by keep by the mutual discharge in the pixel unit luminous keep electrode 11,12, the i.e. transparency electrode 11a that forms by transparent ITO (Indium Thin Oxide tin indium oxide) material, 12a and the bus electrode 11b that is made by metal material, 12b constitutes.
Keep electrode pair by scan electrode 11 and keep electrode 12 and constitute, the injection signal of template injection mainly is provided in the scan electrode 11 and keeps the signal of keeping of discharge, keeping electrode 12 mainly provides and keeps signal.
Keep electrode 11,12 and suppress discharging current, be coated with the dielectric layer 13a that insulate between the maintenance electrode pair above, on dielectric layer 13a, be coated with the protective layer of making by magnesium oxide (MgO) 14, guarantee that electronics can discharge smoothly.
In the back on the glass substrate 20, for forming more than one discharge space, it is the spaced walls 21 of strip (or well shape) the formation discharge cell that is arranged in parallel, with keep electrode 11,12 parts of reporting to the leadship after accomplishing a task have a plurality of addressing electrodes 22 and spaced walls 21 be arranged in parallel glass substrate 20 in the back above, addressing electrode 22 can carry out address discharge, produces vacuum ultraviolet.
On above-mentioned addressing electrode 22, be coated with lower dielectric layer 13, on lower dielectric layer 13, be coated with the R that shows the visible rays that portrait is required when discharging address discharge, G, B fluorescence coating 23.
In front on glass substrate 10 and the back glass substrate 20 by subsides be coated with operation with encapsulant frit (Frit Glass) carry out pasting after the plasticization spread upon on the substrate after, enter deairing step then the foreign body of intralamellar part removed.
Discharging efficiency when deairing step finishes the back for the discharge that improves plasma display is helium (He), neon (Ne), plasma display inside (PDP) such as injection such as xenon (Xe) inert gas of etc.ing.
The discharge process of existing plasma display with said structure is as follows: keep electrode 11 on addressing electrode 22 on the glass substrate 20 and the front glass substrate 10 in the back, behind 12 generation address discharges, more selected unit is carried out continuous demonstration discharge.
The vacuum ultraviolet that produces when discharge makes fluorophor radiate visible rays, produces portrait.
The manufacture process of existing plasma display is roughly by the step of making glass substrate; Make the step of front panel; Step and the number of assembling steps of making rear board constitute.The board manufacturing process of plasma display is as follows.
Fig. 2 is the manufacturing process's flow chart according to the plasma display of present technology.As shown in the figure, in a step in the back the top 20 of glass substrate form addressing electrode 22 with certain width and height; Form dielectric layer 13b in the b step on addressing electrode 22 tops.
In the c step, form white spaced walls 12a on the top of dielectric layer 13b; Next door 21b night is formed at the top at white spaced walls 12a in the d step; In the e step night next door 21b top smear photoresist 30; The photomask that will form specific template in the f step spreads upon the top of photoresist 30, and the irradiation of process light makes photoresist 30 sclerosis, and this process is exposure process.
Through behind the exposure process, in the g step by developing process not the photoresist of sclerosis wash go after; In the h step through etching process form white spaced walls 21a and night next door 21b.
Carry out drying then, moulding after, formation can prevent crosstalking between each discharge cell (Crosstalk) white spaced walls 21a and night next door 21b.
Then, at white spaced walls 21a with form fluorescence coating between the 21b of next door night, pass through moulding formation back glass substrate 20 then in the i step.
But next door 21b structure night of the plasma display that the process said process produces has following shortcoming.
At first, opposite with white spaced walls because next door 21b night is directly exposed in the unit of emission visible light, night, next door 21b absorbed visible light, had played the negative interaction that reduces luminous efficiency.
Secondly, next door 21b electric medium constant height night by common material manufactures has increased electric capacity (Capacitance) value of spaced walls, thereby has caused unnecessary power wastage.
Summary of the invention
The present invention proposes for addressing the above problem just, the purpose of this invention is to provide a kind of plasma display, its white spaced walls than night the next door narrow, by reduce to be exposed in the unit that produces visible light night the next door size, reduce the absorption of visible light, thereby farthest avoid reducing the appearance of phenomenon because of the luminous efficiency that night, the next door caused.
And since reduced electric medium constant big night the next door area, reduced dielectric constant, thereby suppressed the increase of electric capacity.Can reduce the power loss that the electric capacity charging causes with the displacement electric current when driving like this, improve the efficient that drives.
To achieve these goals, constitute by following steps according to manufacturing method for plasma displays of the present invention: on dielectric layer, be coated with the step of spreading the 1st spaced walls material; On the 1st spaced walls, be coated with the step of spreading the 2nd spaced walls material; In the step of smearing photoresist on the 2nd spaced walls; Utilize the mask on the photoresist to carry out step of exposing; Template after the exposure is carried out step of developing, the 2nd spaced walls is carried out selectively etched the 1st etching step; The 1st spaced walls is carried out selectable etched the 2nd etching step and the 2nd spaced walls is carried out selectively etched the 3rd etching step.
According to plasma display of the present invention, it is characterized in that: the reflectivity of the material in manufacturing next door night does not have conductivity below 50%.
According to plasma display of the present invention, it is characterized in that: night, the next door utilized membrane process to form, and used equipment such as sputter (Sputter), electron beam (E-beam), chemical vapor deposition (CVD) in the forming process.
According to plasma display of the present invention, it is characterized in that: use diverse etchant (Etchant) at the 1st, 3 etching step.
According to plasma display of the present invention, it is characterized in that: the 1st etching step can use reactive ion etching (Reactive Ion Etching) method.
According to plasma display of the present invention, it is characterized in that: the width above the night next door is than the little 10 μ m of width of white spaced walls.
According to the present invention, white spaced walls than night the next door narrow, by reduce to be exposed in the unit that produces visible light night the next door size, reduce the absorption of visible light, thereby farthest avoid reducing the appearance of phenomenon because of the luminous efficiency that night, the next door caused.
And since reduced electric medium constant big night the next door area, reduced dielectric constant, thereby suppressed the increase of electric capacity.Can reduce the power loss that the electric capacity charging causes with the displacement electric current when driving like this, improve the efficient that drives.
Description of drawings
Fig. 1 is the structural representation according to the plasma display of prior art;
Fig. 2 is the manufacturing process's flow chart according to the plasma display of present technology;
Fig. 3 is a foundation plasma display of the present invention manufacturing process flow chart.
Embodiment
For further specifying above-mentioned purpose of the present invention, design feature and effect, the present invention is described in detail below with reference to accompanying drawing.
Below with reference to accompanying drawings embodiments of the invention are elaborated.
Fig. 3 is a foundation plasma display of the present invention manufacturing process flow chart.As shown in the figure, form white spaced walls 21a and night next door 21b operation as follows.In a step in the back the top 20 of glass substrate form addressing electrode 22 with certain width and height; Form dielectric layer 13b in the b step on addressing electrode 22 tops.
In the c step, form white spaced walls 12a on the top of dielectric layer 13b; The material of white spaced walls 12a will with night next door 21b material have different rate of etch.
Next door 21b night is formed at the top at white spaced walls 21a in the d step, and the reflectivity of material of making next door night is below 50%, and does not have conductivity.
Night, the next door utilized membrane process to form, and used equipment such as sputter (Sputter), electron beam (E-beam), chemical vapor deposition (CVD) in the forming process.
In the e step night next door 21b top smear photoresist 30; The photomask that will form specific template in the f step spreads upon the top of photoresist 30, and the irradiation of process light makes photoresist 30 sclerosis, and this process is exposure process.Through behind the exposure process, in the g step by developing process not the photoresist of sclerosis wash go after; In the h step, utilize etchant, only to night next door 21b carry out etching.
The 1st etching step can use reactive ion etching (Reactive Ion Etching) method.
The i step is the 2nd etching step, uses the etchant different with the 1st an etching step dialogue spaced walls 21a to carry out etching.
The J step is the 3rd etching step, for night next door 21b top width manufacture littler than the width above the white spaced walls 21a, use with the 1st etching step in identical etchant to night next door 21b carry out etching.
What at this moment use is Wet-type etching, reason be Wet-type etching when different materials exists simultaneously, can be than the material that is easier to select match with etchant composition and condition, thus only select to need etched material carry out etching.
By the 1st, 2,3 etching steps, the width above the night next door 21b is than the little 10 μ m of width of white spaced walls 21a.
Carry out drying then, moulding after, formation can prevent crosstalking between each discharge cell (Crosstalk) white spaced walls 21a and night next door 21b.
Plasma display according to the prior art manufacturing has following shortcoming: at first, opposite with white spaced walls because next door 21b night is directly exposed in the unit of emission visible light, night, next door 21b absorbed visible light, had played the negative interaction that reduces luminous efficiency.
Secondly, next door 21b electric medium constant height night by common material has increased the capacitance of spaced walls, thereby has caused unnecessary power wastage.
But, according to the white spaced walls of plasma display of the present invention than night the next door narrow, by reduce to be exposed in the unit that produces visible light night next door 21b size, reduce the absorption of visible light, thereby farthest avoid the appearance of the luminous efficiency reduction phenomenon that next door 21b causes because of night.
And since reduced electric medium constant big night the next door area, reduced dielectric constant, thereby suppressed the increase of electric capacity.Can reduce the power loss that the electric capacity charging causes with the displacement electric current when driving like this, improve the efficient that drives.
The technical staff of the technical field of the invention can carry out the change of other concrete form not departing from this invention technological thought and necessary characteristics fully to embodiments of the invention.
Therefore, above-described embodiment launches with the purpose of example in all respects, do not have limitation, compared with above-mentioned detailed description, scope of the present invention more is embodied in following claim scope, and all changes that the thought of claim scope and scope and equivalent concepts thereof derive or the form of variation should belong to scope of the present invention.

Claims (9)

1, be coated with dielectric manufacturing method for plasma displays on a kind of glass substrate in the back, comprise:
On dielectric layer, be coated with the step of spreading the first spaced walls material;
On first spaced walls, be coated with the step of spreading the second spaced walls material;
In the step of smearing photoresist on second spaced walls;
Utilize the mask on the photoresist to carry out step of exposing;
Template after the exposure is carried out step of developing, second spaced walls is carried out selectively etched first etching step;
Second spaced walls is carried out selectively etched second etching step;
Second spaced walls is carried out selectively etched the 3rd etching step.
2, manufacturing method for plasma displays as claimed in claim 1 is characterized in that: first spaced walls is white spaced walls, and second spaced walls is next door night.
3, manufacturing method for plasma displays as claimed in claim 2 is characterized in that: described night, the reflectivity of next door manufactured materials was lower than 50%.
4, manufacturing method for plasma displays as claimed in claim 2 is characterized in that: described night, the next door manufactured materials did not have conductivity.
5, manufacturing method for plasma displays as claimed in claim 2 is characterized in that: described night, the next door utilized membrane process to form.
6, manufacturing method for plasma displays as claimed in claim 5 is characterized in that: described membrane process comprises uses sputter, electron beam, chemical vapour deposition (CVD).
7, manufacturing method for plasma displays as claimed in claim 1 is characterized in that: use diverse etchant at described the first, three etching step.
8, manufacturing method for plasma displays as claimed in claim 2 is characterized in that: described first etching step can use reactive ion-etching.
9, manufacturing method for plasma displays as claimed in claim 2 is characterized in that: the width above the described night next door is than the little 10 μ m of the width above the white spaced walls.
CNA2005101228514A 2005-12-06 2005-12-06 Plasma display and mfg. method Pending CN1979717A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CNA2005101228514A CN1979717A (en) 2005-12-06 2005-12-06 Plasma display and mfg. method

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Application Number Priority Date Filing Date Title
CNA2005101228514A CN1979717A (en) 2005-12-06 2005-12-06 Plasma display and mfg. method

Publications (1)

Publication Number Publication Date
CN1979717A true CN1979717A (en) 2007-06-13

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010075811A1 (en) * 2009-01-05 2010-07-08 四川虹欧显示器件有限公司 Method for forming black barrier layer of plasma display panel and composition for the same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010075811A1 (en) * 2009-01-05 2010-07-08 四川虹欧显示器件有限公司 Method for forming black barrier layer of plasma display panel and composition for the same
CN101719445B (en) * 2009-01-05 2011-12-21 四川虹欧显示器件有限公司 Method for forming black barrier layer of plasma display screen and composition thereof

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