KR100568389B1 - Surface treatment agent, and surface-treated article and electroless nickel plating method using the same - Google Patents

Surface treatment agent, and surface-treated article and electroless nickel plating method using the same Download PDF

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KR100568389B1
KR100568389B1 KR1020037001348A KR20037001348A KR100568389B1 KR 100568389 B1 KR100568389 B1 KR 100568389B1 KR 1020037001348 A KR1020037001348 A KR 1020037001348A KR 20037001348 A KR20037001348 A KR 20037001348A KR 100568389 B1 KR100568389 B1 KR 100568389B1
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surface treatment
silane coupling
treatment agent
agent
copper
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KR20040014928A (en
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이모리도루
세키구치준노스케
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가부시키 가이샤 닛코 마테리알즈
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Priority claimed from JP2001231129A external-priority patent/JP4582528B2/en
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/1803Pretreatment of the material to be coated of metallic material surfaces or of a non-specific material surfaces
    • C23C18/1824Pretreatment of the material to be coated of metallic material surfaces or of a non-specific material surfaces by chemical pretreatment
    • C23C18/1827Pretreatment of the material to be coated of metallic material surfaces or of a non-specific material surfaces by chemical pretreatment only one step pretreatment
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated

Abstract

구리 혹은 구리합금상에 무전해 니켈도금을 할 때 등에 사용되는 촉매액의 건욕 빈도를 적게 할 수 있는 표면처리액제를 제공하여, 해당 표면처리제의 안정성을 향상하는 것을 목적으로 한다. An object of the present invention is to provide a surface treatment liquid capable of reducing the frequency of drying of the catalyst liquid used for electroless nickel plating on copper or copper alloy, and to improve the stability of the surface treatment agent.

표면처리제는, 분자 내에 금속포착능을 가진 관능기를 갖는 실란커플링제와 귀금속화합물을 미리 혼합 또는 반응시켜 얻어진 액체로 이루어지고, 산화제를 더 첨가함으로써 상기 처리제의 안정성이 향상한다. 또한, 본 표면처리제는 표면, 특히 금속표면의 젖음성을 향상시키는 작용도 있다. The surface treating agent is a liquid obtained by mixing or reacting a silane coupling agent having a functional group having a metal trapping ability in a molecule with a noble metal compound in advance, and further adding an oxidizing agent improves the stability of the treating agent. In addition, the surface treatment agent also has an effect of improving the wettability of the surface, particularly the metal surface.

Description

표면처리제, 그것을 사용한 표면처리물 및 무전해 니켈도금방법{SURFACE TREATMENT AGENT, AND SURFACE-TREATED ARTICLE AND ELECTROLESS NICKEL PLATING METHOD USING THE SAME}SURFACE TREATMENT AGENT, AND SURFACE-TREATED ARTICLE AND ELECTROLESS NICKEL PLATING METHOD USING THE SAME}

본 발명은, 표면처리제, 그것을 사용하여 표면처리된 물품, 및 그것을 사용하여 표면처리된 구리 혹은 구리합금상에 무전해 니켈도금하는 방법에 관한 것이다. The present invention relates to a surface treatment agent, an article surface-treated using the same, and a method of electroless nickel plating on copper or copper alloy surface-treated using the same.

더욱 상세하게는, 본 발명은, 무전해도금의 촉매가 되는 귀금속을 포착하는 기능과 도금된 기질(substrate)상에 고착하는 기능을 동일분자 내에 아울러 가진 실란커플링제와, 귀금속화합물을 혼합 또는 반응시킨 액체로 이루어지는 표면처리제, 산화제를 첨가함으로써, 액체안정성이 향상된 표면처리제, 및 이들 처리제를 사용한 표면처리물 및 무전해 니켈도금방법에 관한 것이다. More specifically, the present invention is a mixture or reaction of a silane coupling agent and a noble metal compound having both a function of capturing a noble metal serving as a catalyst for electroless plating and a function of fixing on a plated substrate in the same molecule. The present invention relates to a surface treatment agent having improved liquid stability, a surface treatment product using these treatment agents, and an electroless nickel plating method by adding a surface treatment agent and an oxidizing agent made of the prepared liquid.

무전해도금법은 도전성이 없는 기질에 금속피막을 형성하는 방법의 하나로서, 수지 기질에 프린트배선을 형성하는 방법 등에 이용되고 있다. 이 무전해도금의 전처리로서는, 팔라듐 등의 귀금속을 촉매로서 미리 기질에 부착시켜 두는 '활성화'라 불리는 방법이 일반적으로 사용된다. SnCl2의 염산 수용액으로 기질을 처 리한 후 PdCl2 수용액에 침지처리하여 Pd를 상기 기질에 흡착시키거나, Sn과 Pd를 함유한 콜로이드용액을 사용하여 Pd를 상기 기질 표면에 담지시키는 방법이 지금까지 사용되어 왔다. 이들 방법은 독성이 높은 Sn이 사용되고, 처리공정이 복잡하다는 등의 문제가 많다. The electroless plating method is a method of forming a metal film on a substrate having no conductivity, and is used in a method of forming a printed wiring on a resin substrate. As a pretreatment of this electroless plating, a method called "activation" in which a noble metal such as palladium is previously attached to the substrate as a catalyst is generally used. After treating the substrate with an aqueous hydrochloric acid solution of SnCl 2 and then immersing it in an aqueous PdCl 2 solution to adsorb Pd to the substrate, or using a colloidal solution containing Sn and Pd, Pd is supported on the surface of the substrate. Has been used. These methods have many problems, such as the use of Sn which has high toxicity, and a complicated process.

구리 혹은 구리합금상에 무전해 니켈도금을 하기 위해서는 촉매의 사용이 필요하고, 일반적으로는 염화팔라듐의 염산용액에 침지하여 치환도금으로 팔라듐이 사용되는 방법이 사용되고 있다. 그러나 이 방법의 경우, 치환반응을 통해 용액 내로 용출된 구리가 촉매액 내에 서서히 축적하기 때문에, 액체평형의 관계에서 용출된 구리는 치환반응의 장애가 되고 있다.In order to electroless nickel-plated on copper or copper alloy, the use of a catalyst is required. In general, a method in which palladium is used as a substitution plating by immersion in a hydrochloric acid solution of palladium chloride is used. However, in this method, since the copper eluted into the solution through the substitution reaction gradually accumulates in the catalyst solution, the copper eluted in the relationship of liquid equilibrium is an obstacle to the substitution reaction.

따라서, 촉매액이 어떤 일정시간동안 상기 촉매사용기작을 반복적으로 수행하기 위해 연속적으로 사용되면, 어느 시점에서 무전해 니켈도금을 하는 데에 충분한 양의 팔라듐촉매가 부착하지 않게 되어, 새로운 촉매액의 건욕(建浴)이 필요하다. 건욕 빈도가 많아질수록 그만큼 팔라듐의 사용량이 많아지는데, 팔라듐은 고가의 귀금속이므로 건욕빈도를 줄이는 방법이 요구된다. Therefore, when the catalyst liquid is used continuously for repeatedly performing the above catalyst use mechanism for a certain time, a sufficient amount of palladium catalyst for electroless nickel plating is not attached at any point, so that the new catalyst liquid is bathed. (建 浴) is necessary. As the frequency of the bath increases, the amount of palladium used increases. Since palladium is an expensive precious metal, a method of reducing the frequency of bathing is required.

또한, 최근, 무전해도금의 촉매인 Pd 등의 귀금속을 담지시키는 방법으로서, 이들 귀금속류와 착체를 형성할 수 있는 관능기를 가진 실란커플링제를 사용하는 방법이 여러가지로 제안되고 있다(일본 특공소59-52701, 일본 특개소60-181294, 일본 특개소61-194183, 일본 특공평3-44149호 공보). 본 발명자들도, 실란커플링제와 귀금속화합물을 미리 혼합 또는 반응시켜 얻은 도금 표면처리제를 사용한 방법에 대하여, 몇 가지 제안하였다(일본 특허출원 2000-1645, 일본 특허출원 2000-238047호 공보). In recent years, as a method of supporting precious metals such as Pd, which is a catalyst for electroless plating, various methods of using a silane coupling agent having a functional group capable of forming a complex with these precious metals have been proposed. 52701, Japanese Patent Application Laid-Open No. 60-181294, Japanese Patent Application Laid-Open No. 61-194183, and Japanese Patent Application Laid-Open No. 3-44149. The present inventors also proposed several methods using the plating surface treatment agent obtained by mixing or reacting a silane coupling agent and a noble metal compound in advance (Japanese Patent Application 2000-1645 and Japanese Patent Application 2000-238047).

그러나, 이들 액에는, 시간 경과에 따른 변화를 일으키기 쉽고, 침전이 발생하는 등 액체안정성이 불충분하다는 문제점이 있었다. However, these liquids have a problem that they are liable to change over time, and there is insufficient liquid stability such as precipitation.

[발명의 개시] [Initiation of invention]

본 발명의 기술적 과제는 무전해도금을 위한 표면처리제의 이러한 문제점을 개선하는 것이다. 즉, 무전해 니켈도금을 할 때에 사용되는 촉매액의 건욕 빈도를 적게 하는 표면처리제를 제공하는 것을 목적으로 하고, 또한 그 표면처리제를 사용한 무전해 니켈도금방법을 제공하는 것을 목적으로 한다. 또한, 상기 표면처리제의 액체안정성을 개선하는 것을 목적으로 한다. The technical problem of the present invention is to improve this problem of the surface treatment agent for electroless plating. That is, it aims at providing the surface treating agent which reduces the frequency of the dry bath of the catalyst liquid used at the time of electroless nickel plating, and it aims at providing the electroless nickel plating method using this surface treating agent. Moreover, it aims at improving the liquid stability of the said surface treating agent.

본 발명자들은 예의 검토한 결과, 상기 표면처리제로서 금속포착능을 가진 관능기를 갖는 실란커플링제를 사용하는 것이 건욕 빈도를 적게 하는 데 유용한 것을 발견하여 본 발명에 이르렀다. As a result of earnest examination, the present inventors have found that the use of a silane coupling agent having a functional group having a metal trapping ability as the surface treating agent is useful for reducing the frequency of drying.

또한, 상기 귀금속화합물과 그것을 포착하는 기능을 갖는 실란커플링제를 미리 혼합 또는 반응시킨 액체에서 시간경과에 따른 변화의 원인은, 귀금속화합물의 환원반응에 있는 것을 밝혀 내었다. 그 대책으로서, 본 발명자들은 산화제를 가함으로써 시간경과에 따른 변화가 억제되어, 액체안정성이 향상하는 것을 발견하여 본 발명에 이르렀다. Further, it has been found that the cause of the change over time in the liquid in which the noble metal compound and the silane coupling agent having a function of capturing it are mixed or reacted in advance is in the reduction reaction of the noble metal compound. As a countermeasure, the present inventors have found that the change over time is suppressed by adding an oxidizing agent, and the present inventors have found that the liquid stability is improved.

즉, 본 발명은, 이하와 같다. That is, this invention is as follows.

삭제delete

(1) 분자 내에 금속포착능을 가진 관능기를 갖는 실란커플링제와 귀금속화합물을 미리 혼합 또는 반응시켜 얻어진 액체에 산화제를 첨가하여 이루어지는 표면처리제. (1) A surface treatment agent obtained by adding an oxidizing agent to a liquid obtained by mixing or reacting a silane coupling agent having a functional group having a metal trapping ability in a molecule with a noble metal compound in advance.

(2) 분자 내에 금속포착능을 가진 관능기를 갖는 실란커플링제가 아졸 (azole) 화합물과 에폭시실란 화합물과의 반응에 의해 얻어진 실란커플링제인 것을 특징으로 하는 상기 (1)에 기재된 표면처리제. (2) The surface treatment agent according to the above (1), wherein the silane coupling agent having a functional group having metal trapping ability in the molecule is a silane coupling agent obtained by the reaction of an azole compound and an epoxy silane compound.

(3) 금속포착능을 가진 관능기가 이미다졸기인 것을 특징으로 하는 상기 (1)에 기재된 표면처리제. (3) The surface treating agent according to the above (1), wherein the functional group having a metal trapping ability is an imidazole group.

(4) 귀금속화합물이 팔라듐화합물인 것을 특징으로 하는 상기 (1)에 기재된 표면처리제. (4) The surface treatment agent according to the above (1), wherein the noble metal compound is a palladium compound.

(5) 실란커플링제와 귀금속화합물을 이하에 나타내는 중량비로 미리 혼합 또는 반응시킨 것을 특징으로 하는 상기 (1)에 기재된 표면처리제.(5) The surface treatment agent according to the above (1), wherein the silane coupling agent and the noble metal compound are mixed or reacted in advance at a weight ratio shown below.

1/10 < (실란커플링제/귀금속화합물) < 5/11/10 <(silane coupling agent / noble metal compound) <5/1

(6) 산화제가 과황산염(persulfate)인 것을 특징으로 하는 상기 (1)에 기재된 표면처리제. (6) The surface treating agent according to the above (1), wherein the oxidizing agent is persulfate.

(7) 표면처리제의 pH가 2.0 이하인 것을 특징으로 하는 상기 (1)에 기재된 표면처리제. (7) The surface treatment agent according to the above (1), wherein the pH of the surface treatment agent is 2.0 or less.

(8) 상기 (1)∼(6)중 어느 하나에 기재된 표면처리제로 구리 혹은 구리합금을 전처리한 후, 무전해 니켈도금하는 것을 특징으로 하는 무전해 니켈도금방법. (8) An electroless nickel plating method characterized by electroless nickel plating after pretreatment of copper or copper alloy with the surface treatment agent according to any one of (1) to (6).

(9) 상기 (1)∼(6)중 어느 하나에 기재된 표면처리제로 처리된 표면처리물. (9) The surface treated material treated with the surface treating agent in any one of said (1)-(6).

본 발명에 있어서는, 상기 특정의 실란커플링제를 사용하는 것이 중요하다. 즉, 금속포착능을 가진 관능기가 분자 내에 존재함으로써, 도금 촉매의 활성을 효과적으로 발현하는 전자상태(electronic state) 또는 배향(orientation)을 얻는 것이 가능하고, 상기 실란커플링제를 사용함으로써 피도금재와의 밀착성을 발현하는 것이 가능해진다. 또한, 본 발명의 표면처리제는 표면, 특히 금속표면의 젖음성(wettability)을 향상시키는 작용도 있다. In this invention, it is important to use the said specific silane coupling agent. That is, by the presence of a functional group having a metal trapping ability in the molecule, it is possible to obtain an electronic state or orientation that effectively expresses the activity of the plating catalyst, and by using the silane coupling agent, It becomes possible to express the adhesiveness of. In addition, the surface treatment agent of the present invention also has an effect of improving the wettability of the surface, particularly the metal surface.

본 발명의 표면처리제에 사용되는 금속포착능을 가진 관능기를 갖는 실란커플링제의 예로는, 아미노기, 카르복실기, 아졸기, 히드록실기, 메르캅토기 등을 가진 실란커플링제가 있으나, 이들에 한정되지 않는다. 이들 중에서도 아졸기를 갖는 실란커플링제가 바람직하다. 또, 아졸기로서의 예로는, 이미다졸, 옥사졸, 티아졸, 셀레나졸, 피라졸, 이소옥사졸, 이소티아졸, 트리아졸, 옥사디아졸, 티아디아졸, 테트라졸, 옥사트리아졸, 티아트리아졸, 벤다졸, 인다졸, 벤즈이미다졸, 벤조트리아졸 등이 있다. 그 중에서도 이미다졸기가 특히 바람직하다. 또한, 상기 실란커플링제는 상기 귀금속이온 포착기 외에 -SiX1X2X3기를 가는 화합물을 의미하고, 여기서 X1, X2, X3는 각각 알킬기, 할로겐, 알콕시기 등이고, 피도금물에의 고정이 가능한 관능기이다. X1, X2, X3는 동일하거나 또는 다르더라도 좋다. Examples of the silane coupling agent having a functional group having a metal trapping ability used in the surface treatment agent of the present invention include, but are not limited to, a silane coupling agent having an amino group, a carboxyl group, an azole group, a hydroxyl group, a mercapto group, and the like. Do not. Among these, the silane coupling agent which has an azole group is preferable. Examples of the azole group include imidazole, oxazole, thiazole, selenazole, pyrazole, isoxazole, isothiazole, triazole, oxadiazole, thiadiazole, tetrazole, oxtriazole, thia Triazole, bendazole, indazole, benzimidazole, benzotriazole and the like. Especially, imidazole group is especially preferable. In addition, the silane coupling agent means a compound having a -SiX 1 X 2 X 3 group in addition to the noble metal ion capture group, wherein X 1 , X 2 , X 3 are each an alkyl group, a halogen, an alkoxy group, and the like. It is a functional group that can be fixed. X 1 , X 2 and X 3 may be the same or different.

이러한 실란커플링제 자체는 공지이다. 예를 들면, 일본 특개평6-256358호 공보에는 아졸계 화합물과 에폭시실란계 화합물의 반응으로 얻어진 실란커플링제가 개시되어 있다. 또한, 이러한 질소함유 헤테로사이클릭 아졸화합물과 반응시키는 에폭시기함유 실란화합물로서는, Such silane coupling agents themselves are known. For example, Japanese Unexamined Patent Application Publication No. 6-256358 discloses a silane coupling agent obtained by the reaction of an azole compound and an epoxy silane compound. Moreover, as an epoxy-group containing silane compound made to react with such a nitrogen-containing heterocyclic azole compound,

Figure 112003003371977-pct00001
Figure 112003003371977-pct00001

(식중, R1, R2는 각각 수소 또는 탄소수가 1∼3인 알킬기이고, n은 1∼3의 정수이다)로 표시되는 에폭시실란커플링제가 바람직하다. Epoxysilane coupling agents represented by (wherein R 1 and R 2 each represent hydrogen or an alkyl group having 1 to 3 carbon atoms and n is an integer of 1 to 3) are preferable.

상기 아졸화합물과 상기 에폭시기함유 실란화합물과의 반응은, 일본 특개평 6-256358호 공보에 개시된 조건으로 할 수 있다. 예를 들면, 80∼200℃에서 아졸화합물 1몰에 대하여 0.1∼10몰의 에폭시기함유 실란화합물을 적하하고, 5분∼2시간 동안 반응시킨다. 이 때, 용매는 특별히 필요 없지만, 클로로포름, 디옥산, 메탄올, 또는 에탄올 등의 유기용매를 사용하여도 좋다. The reaction between the azole compound and the epoxy group-containing silane compound can be carried out under the conditions disclosed in Japanese Patent Laid-Open No. 6-256358. For example, 0.1-10 mol of epoxy group containing silane compounds are dripped at 80-200 degreeC with respect to 1 mol of azole compounds, and it is made to react for 5 minutes-2 hours. At this time, the solvent is not particularly required, but an organic solvent such as chloroform, dioxane, methanol, or ethanol may be used.

본 발명에 사용되는 금속포착능을 갖는 실란커플링제의 기타 예로서, γ-아미노프로필트리메톡시실란, γ-아미노프로필트리에톡시실란, N-β(아미노에틸)γ-아미노프로필트리메톡시실란, N-β(아미노에틸)γ-아미노프로필트리에톡시실란, γ-메르캅토프로필트리메톡시실란 등을 들 수 있다. As other examples of the silane coupling agent having a metal trapping ability used in the present invention, γ-aminopropyltrimethoxysilane, γ-aminopropyltriethoxysilane, N-β (aminoethyl) γ-aminopropyltrimethoxy Silane, N- (beta) (aminoethyl) (gamma) -aminopropyl triethoxysilane, (gamma)-mercaptopropyl trimethoxysilane, etc. are mentioned.

또한, 상기 귀금속화합물의 예로는, 무전해 도금액으로부터 구리, 니켈 등을 석출시킬 때에 촉매효과를 나타내는 팔라듐, 은, 백금, 금 등의 염화물, 수산화물, 산화물, 황산염, 암모늄염 등의 아민착체(complex) 등이 있고; 특히 팔라듐화합물, 그 중에서도 염화팔라듐이 바람직하다. 귀금속화합물은 수용액으로서 사용하는 것 이 바람직하고, 처리하는 용액 중의 농도는 5∼300mg/L가 바람직하다. 특히, 무전해 도금액으로부터 구리 혹은 구리합금 표면에 니켈을 석출시키는 경우, 처리하는 용액 중의 귀금속화합물 농도는 5∼100mg/L가 보다 바람직하다. Examples of the noble metal compound include chlorides such as palladium, silver, platinum, and gold, amine complexes such as hydroxides, oxides, sulfates, and ammonium salts, which exhibit a catalytic effect in depositing copper, nickel, and the like from an electroless plating solution. Etc .; Especially a palladium compound, especially palladium chloride is preferable. The noble metal compound is preferably used as an aqueous solution, and the concentration in the solution to be treated is preferably 5 to 300 mg / L. In particular, when depositing nickel on the surface of copper or copper alloy from an electroless plating solution, the concentration of the noble metal compound in the solution to be treated is more preferably 5 to 100 mg / L.

상기한 분자 내에 금속포착능을 가진 관능기를 갖는 실란커플링제와 귀금속화합물을 미리 혼합 또는 반응시킨 얻은 액체를 사용하여 무전해도금되는 기질의 표면처리를 하는 경우, 이 액체는 물, 메틸알콜, 에틸알콜, 2-프로판올, 아세톤, 톨루엔, 에틸렌글리콜, 폴리에틸렌글리콜, 디메틸포름아미드, 디메틸술폭사이드, 디옥산, 또는 이들의 혼합물과 같은 적당한 용매에 용해시킨 용액으로 사용할 수 있다. 특히, 물을 사용하는 경우, 피도금면 및 도금 조건에 따라 용액의 pH를 최적화해야 한다. When the surface treatment of the substrate to be electroplated is carried out using the obtained liquid obtained by mixing or reacting a silane coupling agent having a functional group having a metal trapping ability and a noble metal compound in the above molecule, the liquid is water, methyl alcohol, ethyl It can be used as a solution dissolved in a suitable solvent such as alcohol, 2-propanol, acetone, toluene, ethylene glycol, polyethylene glycol, dimethylformamide, dimethyl sulfoxide, dioxane, or mixtures thereof. In particular, when water is used, the pH of the solution should be optimized according to the surface to be plated and the plating conditions.

포(cloth)형상이나 판(plate)형상의 기질에 대해서는, 침지처리나 솔칠 (brush application) 등으로 표면코팅한 후에 용매를 휘발시키는 방법이 일반적이지만, 이에 한정되는 것은 아니고, 기질의 표면에 균일하게 실란커플링제를 부착시키는 방법이면 좋다. 구리 혹은 구리합금에 대해서는, 침지처리로 표면 코팅한 후에 용매를 휘발시키는 방법이 일반적이지만, 이에 한정되는 것은 아니고, 구리 혹은 구리합금의 표면에 균일하게 실란커플링제를 부착시키는 방법이면 좋다. 부착상태에 따라서, 수세만 하고 건조공정을 생략할 수 있는 경우도 있다. For cloth or plate-like substrates, a solvent is volatilized after surface coating by dipping or brush application, but is not limited thereto. What is necessary is just the method of making a silane coupling agent adhere. For copper or copper alloy, a method of volatilizing a solvent after surface coating by dipping treatment is common, but it is not limited to this, What is necessary is just a method of attaching a silane coupling agent uniformly to the surface of copper or a copper alloy. Depending on the adhered state, only washing with water and the drying step may be omitted.

또한, 분체(powder)에 대해서는, 침지처리후 용매를 휘발시켜 강제적으로 용액 중에 포함된 실란커플링제를 기질 표면에 부착시키는 방법 외에, 상기 실란커플링제의 균일한 성막성(film formation ability)으로 인해 침지처리 상태에서 기질 의 표면에 실란커플링제의 흡착이 또한 가능하고, 따라서, 처리 후 용매를 여과분리하여 습한 분체를 건조시키는 방법도 가능하다. 부착상태에 따라서, 수세만 하고 건조공정을 생략할 수 있는 경우도 있다. In addition, in the case of powder, in addition to the method of forcibly attaching the silane coupling agent contained in the solution to the substrate surface by volatilizing the solvent after the immersion treatment, due to the uniform film formation ability of the silane coupling agent Adsorption of the silane coupling agent to the surface of the substrate in the immersion state is also possible, and thus a method of drying the wet powder by filtration of the solvent after the treatment is also possible. Depending on the adhered state, only washing with water and the drying step may be omitted.

처리하는 용액 중에서 분자 내에 금속포착능을 가진 관능기를 갖는 실란커플링제의 농도는, 이에 한정되는 것은 아니지만, 0.001∼10중량%가 사용되기 쉽다. 0.001중량% 미만의 경우, 기질의 표면에 부착하는 화합물량이 낮아지기 쉽고, 효과를 얻기 어렵다. 또한, 10중량%를 넘으면, 부착량이 지나치게 많아 건조하기 어렵거나, 분말의 응집을 일으키기 쉬워진다. Although the density | concentration of the silane coupling agent which has a functional group which has a metal trapping ability in a molecule | numerator in a solution to be processed is 0.001-10 weight% easily, although it is not limited to this. In the case of less than 0.001% by weight, the amount of the compound adhering to the surface of the substrate tends to be low, and effects are hardly obtained. Moreover, when it exceeds 10 weight%, it will become difficult to dry because it is too much adhesion amount, or it will become easy to cause aggregation of powder.

본 발명에 있어서, 분자 내에 금속포착능을 가진 관능기를 갖는 실란커플링제와 귀금속화합물을 미리 혼합 또는 반응시켜 얻은 액체에 산화제를 첨가함으로써, 촉매효과를 나타내는 귀금속의 환원반응에 의한 시간경과에 따른 변화가 억제되어, 액체안정성이 향상된다. 본 발명에서, 산화제로는 과황산나트륨, 과황산칼륨, 또는 과황산암모늄 등의 과황산염, 과산화수소 등의 과산화물, 염화제2철, 염화제2구리, 질산 등이 사용 가능하다. 그 중에서도 과황산염이 특히 바람직하다. 첨가하는 산화제의 농도는, 0.01∼100g/L가 바람직하다. 농도가 0.01g/L보다 낮으면, 산화제의 효과가 충분히 발휘되지 않고, 반면에 농도가 100g/L보다 높으면, 피도금기질에 산화제에 의한 악영향을 미칠 우려가 있다. 분자 내에 금속포착능을 가진 관능기를 갖는 실란커플링제와 귀금속화합물을 미리 혼합 또는 반응시킨 액체의 안정성은, 상기 액체에 산화제를 첨가함으로써 향상되지만, 아울러 pH를 낮추는 것에 의해 더욱 향상된다. 특히, pH를 2.0 이하로 함으로써, 액체의 안정성은 향 상된다. 또한, pH를 1.5 이하로 함으로써, 액체의 안정성은 대폭 향상된다. In the present invention, the change over time due to the reduction reaction of a noble metal exhibiting a catalytic effect by adding an oxidizing agent to a liquid obtained by mixing or reacting a silane coupling agent having a functional group having a metal trapping ability in a molecule and a noble metal compound in advance. Is suppressed and the liquid stability is improved. In the present invention, as the oxidizing agent, persulfates such as sodium persulfate, potassium persulfate, or ammonium persulfate, peroxides such as hydrogen peroxide, ferric chloride, cupric chloride, nitric acid, and the like can be used. Especially, persulfate is especially preferable. As for the density | concentration of the oxidizing agent to add, 0.01-100 g / L is preferable. If the concentration is lower than 0.01 g / L, the effect of the oxidizing agent is not sufficiently exhibited. On the other hand, if the concentration is higher than 100 g / L, there is a fear that the oxidizing agent adversely affects the substrate to be plated. The stability of a liquid in which a silane coupling agent having a functional group having a metal trapping ability and a noble metal compound are mixed or reacted in advance in the molecule is improved by adding an oxidizing agent to the liquid, but is further improved by lowering the pH. In particular, by setting the pH to 2.0 or less, the stability of the liquid is improved. Moreover, stability of a liquid improves significantly by setting pH to 1.5 or less.

표면처리 후에 사용된 용매를 휘발시키기 위해서는, 상기 용매의 휘발온도 (evaporation temperature) 이상으로 가열하여 표면을 건조하면 충분하다. 용매로서 물을 사용한 경우는, 건조공정을 생략하고, 표면처리 후 수세하는 것만으로 도금을 하는 것도 가능하다. 단, 이 경우, 실란커플링제에 포착되지 않은 촉매가 도금액 내에 반입되지 않도록 하기 위해서, 수세를 충분히 할 필요가 있다. In order to volatilize the solvent used after the surface treatment, it is sufficient to dry the surface by heating above the evaporation temperature of the solvent. When water is used as the solvent, the drying step may be omitted, and plating may be performed only by washing with water after surface treatment. However, in this case, in order to prevent the catalyst which is not trapped by the silane coupling agent from being carried into the plating liquid, it is necessary to sufficiently wash the water.

분자 내에 금속포착능을 가진 관능기를 갖는 실란커플링제와 귀금속화합물을 이하에 나타내는 중량비로 미리 혼합 또는 반응시키고, 구리 혹은 구리합금상에의 무전해 니켈도금용 표면처리제로서 사용하면, 실온(10∼30℃)에서의 상기 전처리로 무전해 니켈도금이 가능해진다. When a silane coupling agent having a functional group having a metal trapping ability in the molecule and a noble metal compound are mixed or reacted in advance in the weight ratios shown below, and used as a surface treatment agent for electroless nickel plating on copper or copper alloy, it is room temperature (10 to 10). Electroless nickel plating is possible by the said pretreatment in 30 degreeC).

1/10 < 실란커플링제/귀금속화합물 < 5/11/10 <Silane coupling agent / Precious metal compound <5/1

상기 중량비가 1/10 미만인 경우, 실란커플링제의 비율이 지나치게 낮아서, 금속포착능이 충분히 나타나지 않는다. 또한, 상기 중량비가 5/1을 넘는 경우, 실란커플링제끼리의 상호작용이 커져, 역시 금속포착능이 충분히 나타나지 않는다. 또한, 분자 내에 금속포착능을 가진 관능기를 갖는 실란커플링제와 귀금속화합물을 이하에 나타내는 중량비로 미리 혼합 또는 반응시키고, 구리 혹은 구리합금상에의 무전해 니켈도금용 표면처리제로서 사용하면, 실온(10∼30℃)에서 더욱 단시간의 전처리로 무전해 니켈도금이 가능해진다. When the said weight ratio is less than 1/10, the ratio of a silane coupling agent is too low, and metal trapping ability does not appear sufficiently. Moreover, when the said weight ratio exceeds 5/1, interaction of silane coupling agents becomes large and metal capture | acquisition ability does not appear sufficiently, either. In addition, when the silane coupling agent and the noble metal compound which have a functional group which has a metal trapping ability in a molecule | numerator are mixed or reacted previously by the weight ratio shown below, and used as a surface treating agent for electroless nickel plating on copper or copper alloy, 10 to 30 DEG C) allows electroless nickel plating by a shorter time of pretreatment.

1/2 < 실란커플링제/귀금속화합물 < 2/11/2 <silane coupling agent / noble metal compound <2/1

물론, 도금 전처리를 하기 전에 피도금면의 세정(예를 들면, 묽은 황산으로) 을 하여도 좋다. Of course, you may wash | clean (for example, with dilute sulfuric acid) of a to-be-plated surface before plating pretreatment.

전처리를 하는 온도는 실온에서 충분하지만, 피도금물에 따라서는 가열하는 것이 유효한 경우도 있다. 물론, 도금 전처리를 하기 전에 피도금 면의 세정을 하여도 좋다. 우수한 밀착성이 특히 요구되는 경우는, 종래의 크롬산 등에 의한 에칭처리를 사용하여도 좋다. 도금을 하는 경우에, 피도금체를 상기 표면처리제로 전처리 한 후, 환원제를 함유한 용액으로 처리하는 것이 효과적인 경우도 있다. 특히, 구리도금의 경우는, 환원제로서 디메틸아민-보란 용액, 차아인산나트륨 용액 등으로 처리하면 좋다. 또한, 우선 무전해도금을 하여 얇은 금속막을 형성하여, 도전성이 없는 기질에 어느 정도의 도전성을 갖게 한 후, 전기도금이나 기초금속(base metal)과의 치환도금을 하는 것도 가능하다. 본 발명에 의해, 무전해도금으로 구리, 니켈, 코발트, 주석, 금 등의 금속을 도금할 수가 있다. Although pretreatment temperature is enough at room temperature, heating may be effective depending on the to-be-plated material. Of course, the plating surface may be washed before the plating pretreatment is performed. When excellent adhesiveness is especially required, the conventional etching treatment with chromic acid or the like may be used. In the case of plating, it is sometimes effective to pretreat the plated body with the surface treatment agent and then to treat the solution with a solution containing a reducing agent. In particular, in the case of copper plating, it may be treated with a dimethylamine-borane solution, sodium hypophosphite solution or the like as a reducing agent. In addition, it is also possible to first conduct electroless plating to form a thin metal film to give the substrate which is not conductive to a certain degree of conductivity, and then to perform electroplating or substitution plating with a base metal. According to the present invention, metals such as copper, nickel, cobalt, tin, and gold can be plated by electroless plating.

또한, 본 발명의 표면처리제는, 도금 전처리에 사용될 뿐만 아니라, 기질 표면의 젖음성을 향상시키는 것도 가능하다. 이러한 효과가 있는 액체는 극성이 높은 액체이고; 특히, 물에 대한 젖음성이 크게 향상될 수 있다. 젖음성이 향상되는 기질로, 구리나 니켈 등에 큰 효과가 발현된다. 금속표면의 젖음성이 향상되면, 상기 금속표면에 땜납(solder)이나 수지 등을 도포할 때, 도포성이나 밀착성이 향상될 수가 있다. In addition, the surface treating agent of the present invention can be used not only for the pretreatment of plating but also for improving the wettability of the substrate surface. Liquids with this effect are liquids of high polarity; In particular, the wettability to water can be greatly improved. It is a substrate with improved wettability and exhibits a great effect on copper, nickel and the like. When the wettability of the metal surface is improved, the coating property and adhesion can be improved when applying solder, resin, or the like to the metal surface.

도 1은, 표면처리제 내의 구리농도와 니켈도금이 석출되는 데 필요한 표면처리제 내 최소 침지시간과의 관계를 나타내는 그래프이다. 1 is a graph showing the relationship between the copper concentration in the surface treatment agent and the minimum immersion time in the surface treatment agent required to deposit nickel plating.

도 2는, 실시예 14에 나타내는 표면처리제로 처리된 표면의 젖음성을 설명하는 사진이다. FIG. 2 is a photograph illustrating wettability of a surface treated with the surface treating agent shown in Example 14. FIG.

도 3은, 비교예 3에 나타내는 표면처리제로 처리된 표면의 젖음성을 설명하는 사진이다. 3 is a photograph illustrating wettability of a surface treated with the surface treating agent shown in Comparative Example 3. FIG.

[발명을 실시하기 위한 최선의 형태]Best Mode for Carrying Out the Invention

예비시험예 1Preliminary Test Example 1

피도금소재로서 전해구리박(두께 20㎛)을 사용하여, 이것을 5% 묽은 황산 (dilute sulfuric acid)(1분간)으로 수세후, 이미다졸과 γ-글리시독시프로필트리메톡시실란과의 등몰 반응(equimolar reaction) 생성물인 실란커플링제 50mg/L와 염화팔라듐 50mg/L를 함유한 수용액에 20℃에서 정해진 시간동안 침지, 수세하여, 이하에 나타내는 조건으로 무전해 니켈도금을 하였다. Electrolytic copper foil (thickness: 20 µm) was used as the material to be plated, and after washing with 5% dilute sulfuric acid (1 minute), equimolar with imidazole and γ-glycidoxypropyltrimethoxysilane An aqueous solution containing 50 mg / L of a silane coupling agent and 50 mg / L of palladium chloride as a reaction product was immersed and washed at 20 ° C. for a predetermined time, and electroless nickel plated under the following conditions.

황산니켈 : 20g/LNickel Sulfate: 20g / L

EDTA : 10g/L EDTA: 10g / L

황산암모늄 : 40g/L Ammonium Sulfate: 40g / L

차아인산나트륨 : 20g/LSodium hypophosphite: 20 g / L

pH : 9.0pH: 9.0

욕(bath) 온도 : 30℃Bath temperature: 30 ℃

도금시간 : 1분Plating time: 1 minute

예비시험예 2Preliminary Test Example 2

표면처리제를 이미다졸과 γ-글리시독시프로필트리메톡시실란과의 등몰 반응 생성물인 실란커플링제 40mg/L와 염화팔라듐 40mg/L를 함유한 수용액으로 바꾼 것 외에는 예비시험예 1과 같이 무전해 니켈도금을 하였다. It was electroless as in Preliminary Test Example 1 except that the surface treatment agent was changed to an aqueous solution containing 40 mg / L of silane coupling agent and 40 mg / L of palladium chloride, which is an equimolar reaction product of imidazole and γ-glycidoxypropyltrimethoxysilane. Nickel plating was performed.

예비시험예 3 Preliminary Test Example 3

표면처리제를 이미다졸과 γ-글리시독시프로필트리메톡시실란과의 등몰 반응 생성물인 실란커플링제 30mg/L와 염화팔라듐 30mg/L를 함유한 수용액으로 바꾼 것 외에는 예비시험예 1과 같이 무전해 니켈도금을 하였다. It was electroless as in Preliminary Test Example 1 except that the surface treatment agent was changed to an aqueous solution containing 30 mg / L of silane coupling agent and 30 mg / L of palladium chloride, which is an equimolar reaction product of imidazole and γ-glycidoxypropyltrimethoxysilane. Nickel plating was performed.

예비시험예 4 Preliminary Test Example 4

표면처리제를 이미다졸과 γ-글리시독시프로필트리메톡시실란과의 등몰 반응 생성물인 실란커플링제 20mg/L와 염화팔라듐 20mg/L를 함유한 수용액으로 바꾼 것 외에는 예비시험예 1과 같이 무전해 니켈도금을 하였다. It was electroless as in Preliminary Test Example 1 except that the surface treatment agent was changed to an aqueous solution containing 20 mg / L of silane coupling agent and 20 mg / L of palladium chloride, which is an equimolar reaction product of imidazole and γ-glycidoxypropyltrimethoxysilane. Nickel plating was performed.

비교예 1 Comparative Example 1

표면처리제를 염화팔라듐 50mg/L와 36% 진한염산 10mL/L를 함유한 수용액으로 바꾼 것 외에는 예비시험예 1과 같이 무전해 니켈도금을 하였다. Electroless nickel plating was carried out as in Preliminary Test Example 1 except that the surface treatment agent was changed to an aqueous solution containing 50 mg / L of palladium chloride and 10 mL / L of 36% concentrated hydrochloric acid.

비교예 2Comparative Example 2

표면처리제를 염화팔라듐 40mg/L와 36% 진한염산 10mL/L를 함유한 수용액으로 바꾼 것 외에는 예비시험예 1과 같이 무전해 니켈도금을 하였다. Electroless nickel plating was carried out as in Preliminary Test Example 1 except that the surface treatment agent was changed to an aqueous solution containing 40 mg / L of palladium chloride and 10 mL / L of 36% concentrated hydrochloric acid.

예비시험예 1∼4 및 비교예 1∼2의 어느 예에서나 표면처리제로의 침지한 30초 이내로 니켈도금이 석출되었다. 또한, 구리의 용출의 영향을 조사하기 위해서, 표면처리제 각각에 염화구리를 서서히 첨가하였다. 표면처리제중 구리농도와 니켈이 석출되는 데 필요한 표면처리제내 최소 침지시간과의 관계를 표 1 및 도 1에 나타낸다. In any of Preliminary Test Examples 1 to 4 and Comparative Examples 1 and 2, nickel plating was deposited within 30 seconds of immersion in the surface treatment agent. In addition, copper chloride was gradually added to each of the surface treatment agents in order to investigate the effect of elution of copper. Table 1 and FIG. 1 show the relationship between the copper concentration in the surface treatment agent and the minimum immersion time in the surface treatment agent required to deposit nickel.

표 1Table 1

표면처리제중구리농도 (mg/L)Copper concentration in surface treatment agent (mg / L) 00 300300 400400 500500 600600 700700 10001000 15001500 20002000 25002500 예비시험예 1Preliminary Test Example 1 20초20 seconds 20초20 seconds 20초20 seconds 20초20 seconds 20초20 seconds 20초20 seconds 20초20 seconds 40초40 seconds 50초50 seconds 50초50 seconds 예비시험예 2Preliminary Test Example 2 20초20 seconds 20초20 seconds 20초20 seconds 30초30 seconds 30초30 seconds 30초30 seconds 30초30 seconds 50초50 seconds 60초60 seconds 70초70 seconds 예비시험예 3Preliminary Test Example 3 20초20 seconds 20초20 seconds 20초20 seconds 30초30 seconds 30초30 seconds 40초40 seconds 40초40 seconds 60초60 seconds 80초80 sec 90초90 sec 예비시험예 4Preliminary Test Example 4 30초30 seconds 30초30 seconds 30초30 seconds 50초50 seconds 60초60 seconds 70초70 seconds -- -- -- -- 비교예 1Comparative Example 1 20초20 seconds 30초30 seconds 50초50 seconds 60초60 seconds 70초70 seconds 80초80 sec 110초110 seconds -- -- -- 비교예 2Comparative Example 2 30초30 seconds 70초70 seconds 100초100 sec -- -- -- -- -- -- --

표면처리제에서의 침지시간 60초와 비교하면, 염화팔라듐 및 염산으로 이루어진 일반적인 표면처리제를 사용한 비교예 1, 2의 경우, 염화 팔라듐 농도가 50 또는 40mg/L이더라도 구리농도가 500 또는 250mg/L까지밖에 도금이 가능하지 않았다; 그러나, 예비시험예 1∼4에 나타내는 실란커플링제를 함유한 표면처리제의 경우, 같은 염화팔라듐 농도(예비시험예 1, 2)에서 구리농도가 5배 이상이라도 도금이 가능하고, 또한 염화팔라듐 농도가 20mg/L(예비시험예 4)로 낮아도 구리농도가 600mg/L까지 도금이 가능했다. Compared with 60 seconds of immersion time in the surface treatment agent, in Comparative Examples 1 and 2 using a general surface treatment agent composed of palladium chloride and hydrochloric acid, the copper concentration was only 500 or 250 mg / L even if the palladium chloride concentration was 50 or 40 mg / L. Plating was not possible; However, in the case of the surface treatment agent containing the silane coupling agent shown in the preliminary test examples 1 to 4, plating can be performed even if the copper concentration is 5 times or more at the same palladium chloride concentration (preliminary test examples 1 and 2), and also the palladium chloride concentration. Even if it was as low as 20 mg / L (preliminary test example 4), the copper concentration could be plated to 600 mg / L.

예비시험예 1 및 비교예 1의 표면처리제 100mL에 전해 구리박(30mm ×40mm ×20㎛)을 20℃에서 300분간 침지하였을 때, 구리용출량(교반기의 교반속도 0 및 100rpm)을 표 2에 나타낸다. 교반기의 교반속도가 0rpm인 경우, 예비시험예 1의 구리 용출량은 비교예 1의 반 이하이고, 100rpm인 경우, 그 차는 더욱 커져 약 1/8이 된다.
표 2
When the electrolytic copper foil (30 mm x 40 mm x 20 micrometers) was immersed for 300 minutes at 20 degreeC in 100 mL of the pretreatment example 1 and the surface treating agents of the comparative example 1, the amount of copper dissolution (the stirring speed of stirrer 0 and 100 rpm) is shown in Table 2 . In the case where the stirring speed of the stirrer is 0 rpm, the amount of copper eluted in Preliminary Test Example 1 is less than half of Comparative Example 1, and in the case of 100 rpm, the difference becomes larger and becomes about 1/8.
TABLE 2

삭제delete

교반기의 교반속도 (rpm)Stirring Speed of Stirrer (rpm) 구리 용출량 (mg/L)Copper Elution Rate (mg / L) 예비시험예 1Preliminary Test Example 1 00 2222 예비시험예 1Preliminary Test Example 1 100100 7474 비교예 1Comparative Example 1 00 5252 비교예 1Comparative Example 1 100100 564564

이상과 같이, 본 발명의 표면처리제를 사용함으로써 표면처리제 속으로의 구리 용출량이 감소되고, 더욱 표면처리제 속의 구리의 허용농도도 증가한다; 그 결과, 표면처리제의 건욕 빈도를 현저히 감소시킬 수 있어, 고가의 팔라듐 사용을 감소시킬 수 있다. As described above, by using the surface treating agent of the present invention, the amount of copper eluted into the surface treating agent is reduced, and the allowable concentration of copper in the surface treating agent is also increased; As a result, the frequency of the dry bath of the surface treatment agent can be significantly reduced, thereby reducing the use of expensive palladium.

실시예 1∼6, 비교예 3∼5 Examples 1-6, Comparative Examples 3-5

이미다졸과 γ-글리시독시프로필트리메톡시실란과의 등몰 반응 생성물인 실란커플링제 40mg/L와 염화팔라듐 40mg/L를 함유한 수용액에, 다양한 양의 과황산나트륨을 첨가하고, 또한 pH를 변화시켰다; 각 생성액의 안정성을 실온방치(최장 30일)했을 때의 시간경과에 따른 변화를 관찰함으로써 조사하였다. 결과를 표 3에 나타낸다. To the aqueous solution containing 40 mg / L of silane coupling agent and 40 mg / L of palladium chloride, which are equimolar reaction products of imidazole and γ-glycidoxypropyltrimethoxysilane, various amounts of sodium persulfate were added, and the pH was also changed. To make; The stability of each product was investigated by observing the change over time when left at room temperature (up to 30 days). The results are shown in Table 3.

표 3TABLE 3

과황산나트륨(g/L)Sodium Persulfate (g / L) pHpH 침전발생까지의 일수Days until sedimentation occurs 실시예 1Example 1 0.10.1 1.01.0 침전발생없음No precipitation 실시예 2Example 2 0.10.1 1.51.5 침전발생없음No precipitation 실시예 3Example 3 1.01.0 2.02.0 12일12 days 실시예 4Example 4 0.40.4 2.02.0 6일6 days 실시예 5Example 5 1.01.0 2.52.5 2일2 days 실시예 6Example 6 3.03.0 3.03.0 2일2 days 비교예 3Comparative Example 3 00 2.02.0 1일1 day 비교예 4Comparative Example 4 00 2.52.5 1일1 day 비교예 5Comparative Example 5 00 3.03.0 1일1 day

실시예 1, 2에 나타낸 바와 같이, pH 1.5 이하에서 과황산나트륨을 첨가한 계에서는 30일의 실온방치에서 어느 것이나 침전발생은 없었다. 또한, 실시예 3, 4에 나타낸 바와 같이, pH 2.0에서는 과황산나트튬 농도가 높을수록 침전발생까지의 일수가 길어져, 산화제가 액체안정성의 향상에 효과를 나타내는 것을 알 수 있다. 반면, 비교예 3에 나타낸 바와 같이, 과황산나트륨을 첨가하지 않은 계에서는, pH 2.0이라도 1일에 침전이 발생하였다. 또한, 실시예 5, 6에 나타낸 바와 같이, 과황산나트륨을 많이 첨가함으로써 pH가 2.0보다 높은 경우에도 약간이지만 액체안정성이 향상된다. 표 3을 보면, 과황산나트륨의 첨가량이 늘어날수록, 또한 pH가 낮을수록, 시간경과에 따른 변화의 억제효과가 높은 경향이 보인다. 또한, 표 3의 시험 후에 이들 액체를 사용하여 전해 구리박(두께 20㎛)상에 무전해 니켈도금을 하였다. 처리는, 5% 묽은황산세정(1분간), 수세, 표면처리제내 침지(25℃, 1분간), 수세, 무전해 니켈도금의 순서로 행하였다. 무전해 니켈도금의 조건은 이하와 같다. 각각의 액체에 대해, 무전해 니켈도금은 문제없이 할 수 있었다. As shown in Examples 1 and 2, in the system in which sodium persulfate was added at pH 1.5 or less, no precipitation occurred at room temperature for 30 days. In addition, as shown in Examples 3 and 4, it can be seen that, at pH 2.0, the higher the concentration of sodium persulfate, the longer the number of days until precipitation occurs, and the oxidant is effective in improving liquid stability. On the other hand, as shown in Comparative Example 3, in the system without addition of sodium persulfate, precipitation occurred on day 1 even at pH 2.0. In addition, as shown in Examples 5 and 6, even when the pH is higher than 2.0 by adding a large amount of sodium persulfate, the liquid stability is improved. As shown in Table 3, the more the amount of sodium persulfate added and the lower the pH, the higher the inhibitory effect of the change over time. Moreover, after the test of Table 3, these liquids were used for electroless nickel plating on the electrolytic copper foil (thickness 20 micrometers). The treatment was performed in the order of 5% dilute sulfuric acid washing (1 minute), water washing, immersion in the surface treatment agent (25 ° C, 1 minute), water washing, and electroless nickel plating. The conditions of electroless nickel plating are as follows. For each liquid, electroless nickel plating could be done without a problem.

황산니켈 : 20g/LNickel Sulfate: 20g / L

EDTA : 10g/L EDTA: 10g / L

황산암모늄 : 40g/L Ammonium Sulfate: 40g / L

차아인산나트륨 : 20g/LSodium hypophosphite: 20 g / L

pH : 9.0pH: 9.0

욕 온도 : 30℃Bath temperature: 30 ℃

도금시간 : 1분간Plating time: 1 minute

실시예 7Example 7

이미다졸과 γ-글리시독시프로필트리메톡시실란과의 등몰 생성물인 커플링제 40mg/L, 염화팔라듐 40mg/L 및 과황산나트륨 1.0g/L를 첨가한 수용액에, 니켈이 1㎛ 도금된 구리판을 실온에서 1분간 침지하였다. 수세 후, 물에 대한 젖음성을 관찰하였다. 표면은 부분적으로 변색하였지만, 도 2에 나타낸 바와 같이 니켈도금 구리판의 젖음성은 크게 향상되었고, 물의 반발(shedding)은 관찰되지 않았다. A copper plate plated with 1 μm of nickel was added to an aqueous solution containing 40 mg / L of coupling agent, 40 mg / L of palladium chloride, and 1.0 g / L of sodium persulfate, which is an equimolar product of imidazole and γ-glycidoxypropyltrimethoxysilane. It was immersed for 1 minute at room temperature. After washing with water, wetting on water was observed. Although the surface was partially discolored, as shown in FIG. 2, the wettability of the nickel plated copper plate was greatly improved, and no water shedding was observed.

비교예 6 Comparative Example 6

니켈이 1㎛ 도금된 구리판을 처리하지 않은 채로 사용하여, 물에 대한 젖음성을 관찰하였다. 도 3에 나타낸 바와 같이, 니켈도금 구리판의 젖음성은 나쁘고, 물의 반발이 관찰되었다. The wetness to water was observed by using the nickel plated 1 micrometer plated copper plate untreated. As shown in Fig. 3, the wettability of the nickel-plated copper sheet was poor, and water repulsion was observed.

이상 설명한 바와 같이, 구리 혹은 구리합금상에 무전해 니켈도금을 하기 위해서는 촉매의 부여가 필요하지고, 종래에는 그 촉매부여를 구리 혹은 구리합금상에 팔라듐 등을 치환도금함으로써 행하여 왔다. As described above, in order to perform electroless nickel plating on copper or copper alloys, the provision of a catalyst is not required, and in the past, the catalyst is imparted by substitution plating of palladium or the like on copper or copper alloys.

그러나, 이미 서술한 바와 같이, 치환반응에 의한 촉매부착은 촉매액 내에 구리이온을 축적시켜 점차 촉매부착을 방해하게 되고, 그 결과, 고가의 촉매액의 건욕을 요하게 된다. 반면, 본 발명의 표면처리제의 경우는, 기질표면으로의 촉매부착이 치환도금에 의해 이루어지지 않고, 구리 혹은 구리합금상에 실란커플링제가 고착함으로써, 해당 실란커플링제에 결합된 촉매도 동시에 그 구리 혹은 구리합금상에 부착함으로써 이루어진다; 따라서, 구리의 용출의 영향을 적게 할 수 있어, 새로운 촉매액(표면처리제)의 건욕 빈도를 현저히 저감할 수 있다. However, as described above, the catalyst adhesion by the substitution reaction accumulates copper ions in the catalyst liquid and gradually hinders the catalyst adhesion. As a result, the expensive catalyst liquid needs to be dried. On the other hand, in the case of the surface treatment agent of the present invention, catalyst adhesion to the substrate surface is not performed by substitution plating, and the silane coupling agent is fixed on copper or copper alloy, so that the catalyst bound to the silane coupling agent is simultaneously used. By adhering on copper or copper alloys; Therefore, the influence of the elution of copper can be reduced, and the frequency of drying of a new catalyst liquid (surface treatment agent) can be reduced significantly.

본 발명에서는, 이 표면처리제에 산화제를 더 첨가함으로써 귀금속의 환원반응을 억제하여, 그 결과 액체안정성이 향상되었다. In the present invention, by further adding an oxidizing agent to the surface treatment agent, the reduction reaction of the noble metal is suppressed, and as a result, the liquid stability is improved.

또한, 본 발명의 표면처리제를 사용함으로써, 금속표면의 젖음성을 향상시킬 수 있다. In addition, by using the surface treating agent of the present invention, the wettability of the metal surface can be improved.

Claims (10)

분자 내에 금속포착능을 가진 관능기를 갖는 실란커플링제와 귀금속화합물을 미리 혼합 또는 반응시켜 얻어진 액체에, 과황산염, 과산화물, 염화제2철, 염화제2구리 및 질산으로 이루어진 군으로부터 선택되는 산화제를 첨가하여 이루어지는 표면처리제. An oxidizing agent selected from the group consisting of persulfate, peroxide, ferric chloride, cupric chloride, and nitric acid is added to a liquid obtained by mixing or reacting a silane coupling agent having a metal-containing functional group with a metal and a noble metal compound in a molecule in advance. Surface treatment agent which is added by addition. 제 1 항에 있어서, 상기 분자 내에 금속포착능을 가진 관능기를 갖는 실란커플링제가 아졸계 화합물과 에폭시실란계 화합물과의 반응에 의해 얻어진 실란커플링제인 것을 특징으로 하는 표면처리제. The surface treatment agent according to claim 1, wherein the silane coupling agent having a functional group having a metal trapping ability in the molecule is a silane coupling agent obtained by a reaction between an azole compound and an epoxy silane compound. 제 1 항에 있어서, 상기 금속포착능을 가진 관능기가 이미다졸기인 것을 특징으로 하는 표면처리제. The surface treating agent according to claim 1, wherein the functional group having a metal trapping ability is an imidazole group. 제 1 항에 있어서, 상기 귀금속화합물이 팔라듐화합물인 것을 특징으로 하는 표면처리제. The surface treating agent according to claim 1, wherein the noble metal compound is a palladium compound. 제 1 항에 있어서, 상기 실란커플링제와 상기 귀금속화합물을 이하에 나타내는 중량비로 미리 혼합 또는 반응시킨 것을 특징으로 하는 표면처리제. The surface treatment agent according to claim 1, wherein the silane coupling agent and the noble metal compound are mixed or reacted in advance in a weight ratio shown below. 1/10 < (실란커플링제/귀금속화합물) < 5/11/10 <(silane coupling agent / noble metal compound) <5/1 제 1 항에 있어서, 상기 산화제가 과황산염인 것을 특징으로 하는 표면처리제. The surface treatment agent according to claim 1, wherein the oxidant is persulfate. 제 1 항에 있어서, 상기 표면처리제의 pH가 2.0 이하인 것을 특징으로 하는 표면처리제. The surface treatment agent according to claim 1, wherein the pH of the surface treatment agent is 2.0 or less. 제 1 항 내지 제 6 항중의 어느 한 항에 따른 표면처리제로 구리 혹은 구리합금을 전처리한 후, 무전해 니켈도금하는 것을 특징으로 하는 무전해 니켈도금방법. An electroless nickel plating method comprising electroless nickel plating after pretreatment of copper or copper alloy with the surface treating agent according to any one of claims 1 to 6. 제 1 항 내지 제 6 항중의 어느 한 항에 따른 표면처리제로 처리된 표면처리물. A surface treatment treated with the surface treatment agent according to any one of claims 1 to 6. 삭제delete
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