KR100566023B1 - Exposing apparatus - Google Patents

Abstract

SUMMARY OF THE INVENTION An object of the present invention is to provide an exposure apparatus that can perform exposure such as patterning efficiently and at high speed by using an optical fiber array in which the arrangement shape of the optical fiber element lines on the incidence side and the outgoing side of the optical fiber array is different. The exposure apparatus includes a light source that emits light, an optical modulator that modulates light emitted from the light source, and an optical fiber array that receives light modulated by the optical modulator and exits the light toward the substrate. In the optical fiber array, a plurality of optical fiber element wires are arranged, and the optical fiber element wires are arranged so that the arrangement shape of the incidence side which enters light is different from the arrangement shape of the emission side which emits light.

Fiber Optic Array, Fiber Optic Wire, Optical Modulator, Exposure Equipment, Fly Eye Lens

Description

Exposure device {EXPOSING APPARATUS}

1 is a perspective view showing a schematic configuration of an exposure apparatus using an optical fiber array according to an embodiment of the present invention.

Figure 2a is a plan view schematically showing the structure of the optical modulator.

Fig. 2B is a sectional view schematically showing the arrangement structure of optical fiber element wires at the incidence side end portion of the optical fiber array.

Fig. 3 is a sectional view schematically showing an arrangement structure of optical fiber element wires at the exit side ends of the optical fiber array.

4A to 4C are plan views schematically showing examples of patterning using the exposure apparatus of the present invention.

Fig. 5 is a sectional view schematically showing an arrangement structure of optical fiber element wires at an exit side end portion of an optical fiber array in another embodiment of the present invention.

Fig. 6 is a sectional view schematically showing another arrangement structure of optical fiber element wires at the exit side ends of the optical fiber array in another embodiment of the present invention.

FIG. 7 is a cross-sectional view showing one step of the manufacturing method of the optical fiber array of FIG. 6; FIG.

Fig. 8 is a sectional view schematically showing the arrangement position adjusting mechanism at the exit side end portion of the optical fiber array in another embodiment of the present invention.

9A to 9F are side views showing the outline of the tip portion of the optical fiber element wire at the exit side end of the optical fiber array.

Fig. 10 is a side view showing an outline of a tip portion of an optical fiber element wire at an output side end portion of an optical fiber array in another embodiment of the present invention.

11A and 11B are cross-sectional views schematically showing the arrangement structure and the polarization direction of a polarization plane-preserving optical fiber element wire when the polarization plane-preservation optical fiber element wire is used as the optical fiber element wire at the exit side end of the optical fiber array.

Fig. 12 is a sectional view showing the structure of a conventional projection exposure apparatus.

13A and 13B are plan views in which an element compares a two-dimensional array of optical modulators and a one-dimensional array of optical modulators.

<Description of the symbols for the main parts of the drawings>

1: exposure apparatus

2: light source

3: fly eye lens

4: optical modulator (light modulator)

5: magnification conversion optical system

6: optical fiber array

7 stage (moving part)

8: substrate

9: exposure pattern

The present invention relates to an exposure apparatus. More specifically, it is related with the exposure apparatus using the optical fiber array which patterns a predetermined pattern shape by irradiating a light beam to the board | substrate of a liquid crystal display or a general circuit board, for example.

Background Art Conventionally, as a patterning device used for forming an exposure pattern of a liquid crystal display or a semiconductor integrated circuit, a patterning device employing a projection exposure method for projecting a predetermined mask pattern onto a substrate is widely known. However, in the case of such a patterning device, a plurality of expensive photo masks are normally required for one model. Therefore, in the case of mass production, if the photo mask value is distributed to one product, it is not a big amount. However, in recent years, the product specifications are diversified with the diversification of user values. The cost of the mask is directly attributable to the price of the product. In addition, in the conventional method using a photomask, the photomask needs to be remade to correct the exposure pattern, which is expensive in terms of money and time. In addition, since the design of the photomask requires a certain period of time, there have been problems such as being unable to respond quickly to market demands.

As a solution of the said subject, the linear drawing patterning apparatus which performs exposure by irradiating a board | substrate with the laser beam, an electron beam, etc. which converged without passing through a photomask based on CAD data, such as a wiring pattern, is proposed. Moreover, as such a patterning apparatus, the projection exposure apparatus as a patterning apparatus of the system using an optical fiber array to guide a laser beam etc. to the exposure surface of a board | substrate is proposed (for example, refer patent document 1).

Here, the method by which the conventional projection exposure apparatus performs exposure is demonstrated. 12 is a cross-sectional view showing the structure of a conventional projection exposure apparatus. The light beam 102 emitted from the exposure light source 101 is introduced into the optical fiber group 103. The optical fiber group 103 is divided into one optical fiber element wire 104a, 104b ... on the way. Shutters 105... Are provided at the exit ports of the optical fiber element wires 104a, 104b. The light beam exiting the shutter 105... Ejected from the optical fiber element lines 104a, 104b... Enters the other optical fiber element lines 106a, 106b... Arranged at the corresponding positions. The photosensitive material 110 formed on the surface of the to-be-exposed substrate 109 is formed at or near the position where the optical image of the exit port 108 of the optical fiber element lines 106a, 106b ... is formed by the projection optical system 107. Position it. The driving stage and the position and angle control stage 111 are controlled to move the exit end surface 108 of the optical fiber element wires 106a and 106b, the projection optical system 107 and the exposed substrate 109 relatively. At the same time, with this relative movement, the shutter 105 and the optical element are controlled to form a distribution of light and dark on the exit end surface 108 of the optical fiber element wires 106a, 106b, and so on. At the desired position of the photosensitive material 110, a strong and weak distribution of the required light corresponding to the light and dark distribution of the injection port end surface 108 is formed. The photosensitive material 110 is exposed in a form corresponding to the light and dark arrangement of the exit opening 108.

(Patent Document 1)

Japanese Laid-Open Patent Publication No. 2001-313251 (published November 9, 2001)

As said shutter, optical modulators, such as a liquid crystal device and a digital micromirror device (DMD), are widely known, and some are commercially available, and it is convenient to use them. Patent Document 1 also proposes a method of using a mirror device as a shutter. In the shutter, the pixels are arranged two-dimensionally in the liquid crystal device and the mirrors in the DMD, and the aspect ratio is close to 1: 1. On the other hand, in order to perform patterning at a high speed using the patterning device, it is preferable to relatively move the light beam and the substrate in a direction perpendicular to the arrangement of the light beams by using a plurality of light beams arranged in one column in one dimension. Therefore, it is necessary to perform an array conversion of the light beams in order to rearrange the light beams having the two-dimensional arrangement via the shutter mechanism as the optical modulator in which the pixels or mirrors are two-dimensionally arranged into the light beams having the one-dimensional arrangement.

However, the patterning device described in Patent Document 1 does not describe a method for converting light beams. In addition, since the light beam passing through one shutter is incident on one optical fiber element wire, it is necessary to make the arrangement of the pixel or mirror of the shutter and the arrangement of the optical fiber element light to which the light exiting the shutter enter. That is, in the patterning apparatus described in Patent Document 1, since the optical fiber element wires on the exit port side of the optical fiber group are arranged in a straight line or matrix form, a shutter in which pixels or mirrors are arranged in a straight line or matrix form is correspondingly provided. It is necessary to use. Therefore, when using a shutter in which pixels or mirrors are arranged in a straight line, a liquid crystal device, a DMD, or the like, which is a shutter as a general optical modulator, cannot be used.

Although it is also possible to prepare an optical modulator in which pixels or mirrors are arranged in a straight line and use it in the patterning device, the device as an optical modulator is made by cutting out a substrate or wafer of a predetermined size, so that the pixel or mirror is a two-dimensionally arranged device. It is more efficient in terms of the number of acquisitions. For example, as shown in FIG. 13A and FIG. 13B, the case where a device is created using four elements 112 whose length of one side is d is demonstrated. Normally, it is necessary to form a frame portion around the entire enumerated elements, and when the elements 112 are arranged two-dimensionally as shown in Fig. 13A, the length of the frame is 8d. On the other hand, when the elements 112 are arranged one-dimensionally as shown in Fig. 13B, the length of the frame is 10d, and the length of the frame is longer than that of the elements 112 arranged two-dimensionally. Therefore, the arrangement of the elements 112 two-dimensionally reduces the waste of substrates or wafers, making it possible to efficiently create devices. However, when the elements are arranged one-dimensionally, they are inefficient in terms of the number of acquisitions. I have a problem. In addition, in the case of using a device in which the elements are arranged in a straight line, in addition to the problem that the mechanical strength is not sufficient, in order to inject a light beam into the light modulator with one lamp as a light source, a straight and long light source that is suitable for the device may be used. There is a problem that there is a need.

In addition, the conventional projection exposure apparatus collects light emitted from a projection optical system having a high field of view and a high number of apertures, that is, an optical fiber element wire, which is generally used as a stepper for forming a high-resolution and fine exposure pattern. I need a condenser lens to irradiate. In the projection exposure apparatus described in Patent Document 1, the light beams emitted from the optical fiber element wires 106a, 106b ... are condensed by the projection optical system 107 to form an image on the photosensitive material 110.

In order to condense so that the spot diameter of the light beam to form on the photosensitive material may be several micrometers-submicrometer order, it is necessary to use the condensing lens which has a wide field of view and a high aperture number. On the other hand, in order to speed up patterning, it is effective to use an optical fiber array in which many optical fiber wires are arranged. However, the longer the optical fiber element lines are arranged in a line, the larger the field of view required for the condenser lens to condense the luminous flux emitted from the optical fiber array to the spot diameter of several micrometers to submicrometer order, whereas the optical field also has a high number of apertures and low The design and fabrication of aberration condensing lenses has a problem of difficulty.

SUMMARY OF THE INVENTION The present invention has been made to solve the above-described problems, and is capable of performing exposure such as patterning efficiently and at high speed by using an optical fiber array in which optical fiber element wires are arranged differently in the incidence side and the exit side of the optical fiber array. At the same time, the light beam emitted from the optical fiber array can be condensed on the photosensitive material so as to be a spot having a diameter of several micrometers to a submicrometer order without using a wide field of view light and a high number of condensing lenses that are difficult to design and manufacture. It is an object to provide a possible exposure apparatus.

In order to solve the above problems, the exposure apparatus of the present invention includes a light source, a light modulator for modulating the light emitted from the light source, and a plurality of optical fibers that enter the light modulated by the light modulator and exit toward the target object. And an optical fiber array in which the plurality of optical fibers are arranged such that an array shape on the incidence side to which light is incident and an array shape on the outgoing side to emit light are arranged differently.

In general, the arrangement of the optical fibers for efficiently injecting light from the incidence side and the arrangement of the optical fibers for efficiently exposing the exposed objects are different. In either case, it becomes inefficient. In contrast, according to the above configuration, a plurality of optical fibers are arranged in the optical fiber array of the exposure apparatus, and the arrangement of the incidence side and the arrangement of the exit side are arranged differently in the plurality of optical fibers. That is, the arrangement of the optical fibers can be made into an arrangement in which light emitted from the light source on the incidence side and efficiently modulated by the light modulator can be incited, and in the outgoing side an arrangement in which the exposed object can be efficiently exposed. . Therefore, by using the exposure apparatus having the above configuration, it is possible to efficiently enter the light modulated by the light modulator and to perform exposure of the exposed object efficiently.

In addition, in order to solve the above problems, the exposure apparatus of the present invention includes a light source, a light modulator for modulating the light emitted from the light source, and a plurality of light incident on the light modulator and emitted toward the target object. An optical fiber array in which optical fibers are arranged is provided, and the plurality of optical fibers are arranged so that the aspect ratio of the number of arrays in the incident side end surface and the aspect ratio of the number of arrays in the exit side end surface are arranged differently.

According to the above configuration, the aspect ratio of the optical fiber arranged on the incident side and the aspect ratio of the optical fiber arranged on the exit side can be different. That is, the aspect ratio which can efficiently enter the light modulated by the light modulator on the incidence side can be made into the aspect ratio which can efficiently expose to the to-be-exposed object on the output side. This makes it possible to efficiently enter the light modulated by the light modulator and to perform the exposure of the exposed object efficiently.

In addition, in order to solve the above problems, the exposure apparatus of the present invention includes a light source, a light modulator for modulating the light emitted from the light source, and a plurality of light incident on the light modulator and emitted toward the target object. And an optical fiber array in which optical fibers of the optical fiber array are arranged, wherein the plurality of optical fibers are arranged such that the array shape at the incident side end surface is two-dimensional, and the arrangement shape at the exit side end surface is arranged one dimensional. have.

According to the above structure, the optical fibers are arranged on the incidence side so that the arrangement shape in the cross section is two-dimensional, and on the exit side, the optical fibers are arranged so that the arrangement shape in the cross section is one dimension. Since the light modulated by the light modulator is a two-dimensional luminous flux, the light can be incident most efficiently by arranging the optical fibers on the incidence side so that the arrangement in the cross section is two-dimensional. Further, by arranging the optical fibers on the emission side so that the cross section is one-dimensional, exposure of the exposed object can be performed efficiently and at high speed.

In addition, the exposure apparatus of the present invention includes a light source and an optical fiber array in which a plurality of optical fibers are arranged to inject light emitted from the light source and exit toward the object to be solved. It has a light condensing part which condenses light at the front-end | tip part on the emission side which exits.

According to the above configuration, since the plurality of optical fibers arranged in the optical fiber array have a light collecting portion at the distal end of the emission side, the light emitted toward the target object can be collected. Thereby, it is not necessary to provide a condenser lens or the like separately, so that it is not necessary to design or manufacture the condenser lens in consideration of the arrangement shape of the optical fiber, and the device can be simplified. In addition, the light can be condensed so as to be a spot having a diameter of several micrometers to a submicron order, for example, on the object to be exposed without using a condenser lens having a wide field of view and a high aperture number.

In addition, the exposure apparatus of the present invention includes a light source and an optical fiber array in which a plurality of optical fibers that enter light emitted from the light source and exit toward the target object are arranged to solve the above problems. It is characterized by having the opening part of the magnitude | size below the wavelength of the light radiate | emitted from the said light source in the front-end | tip part on the emission side to exit.

Since the size of the openings at the leading ends of the plurality of optical fibers arranged in the optical fiber array is equal to or less than the wavelength of the light emitted from the light source, it does not transmit light emitted from the light source. However, according to the above constitution, for example, an ebenent field is formed in the vicinity of the opening, and the ultra-neutral spot light of the ultra-near spot exceeding the diffraction limit of the light is leaked, so that the exposure target is exposed by using the ebenent light. An ultrafine pattern about the size of the opening can be formed.

Other objects, features and advantages of the present invention will be fully understood by the description disclosed below. Further advantages of the present invention will become apparent from the following description with reference to the accompanying drawings.

[First Embodiment]

EMBODIMENT OF THE INVENTION The 1st Embodiment of this invention is described based on FIG. 1 thru | or FIG. 4C.

1 is a perspective view showing a schematic configuration of an exposure apparatus 1 according to the present embodiment. As shown in Fig. 1, the exposure apparatus 1 in the present embodiment includes a light source 2, a fly's eye lens 3, an optical modulator (light modulator) 4, a magnification conversion optical system 5, The optical fiber array 6 and the stage (moving part) 7 are provided.

The light source 2 emits a light beam for the exposure apparatus 1 to pattern. The fly's eye lens 3 equalizes the intensity distribution of the light beam emitted from the light source 2. The optical modulator 4 is adapted to modulate the light beam by changing the reflectance of the light beam whose intensity distribution is uniform in the fly's eye lens 3 on the basis of the recording information for patterning. In this embodiment, the digital micromirror device DMD is taken as an example as the optical modulator 4. For this reason, it is an optical system in which the light beam is reflected by the optical modulator 4. In addition, as the optical modulator 4, it is not limited to DMD, For example, a liquid crystal device can also be used. In this case, it becomes an optical system which transmits the light beam from the fly's eye lens 3, and modulates the light beam by changing the transmittance in the liquid crystal device. The magnification converting optical system 5 converts the magnification of the light beam reflected by the optical modulator 4, and converts the magnification of the light beam to guide the optical fiber array 6. The optical fiber array 6 is composed of a plurality of optical fiber element wires (optical fibers) 6a, 6b... The light beam guided from the magnification conversion optical system 5 is incident on each of the optical fiber element wires 6a, 6b, ... at the end (incident side end) on the side where the light beam of the optical fiber array 6 is incident. The light beams incident on the optical fiber element wires 6a, 6b ... are each optical fiber element wires 6a, which are end portions (emission side ends) on the side from which light beams of the optical fiber array 6 exit through the optical fiber element wires 6a, 6b ... 6b...) Is irradiated to the substrate (exposed object) 8. The photosensitive material, such as a resist, is apply | coated to the board | substrate 8 similarly to the case of the conventional exposure apparatus (not shown). The stage 7 is provided with the substrate 8 and the stage 7 is moved so that the substrate 8 and the optical fiber array 6 are relatively moved.

FIG. 2A is a plan view schematically showing the structure of the optical modulator 4, and FIG. 2B is a cross sectional view schematically showing the arrangement structure of the optical fiber element lines 6a, 6b, ... at the incidence side end portion of the optical fiber array 6; to be. As shown in Fig. 2A, the optical modulator 4 has a structure in which a plurality of angle-adjustable micro mirrors 4a, 4b ... are arranged two-dimensionally, and one of the individual micromirrors 4a, 4b ... The length of a side is about 10-20 micrometers. In addition, as shown in Fig. 2B, at the incidence side end portion of the optical fiber array 6, the same number of optical fiber element wires 6a, 6b ... are arranged two-dimensionally in the longitudinal direction of the micromirrors 4a, 4b. It is. The micromirrors 4a, 4b... And the optical fiber element wires 6a, 6b... Each micromirror so that, for example, a light beam reflected by one micromirror 4a is incident on one optical fiber element wire 6a. 4a, 4b ...) and optical fiber element wires 6a, 6b ... are arranged in a one-to-one correspondence. By controlling the angles of the micromirrors 4a, 4b ..., the angle of reflection of light can be adjusted to determine whether or not the light beam is incident on the optical fiber element wires 6a, 6b .... In addition, the diameter of each optical fiber strand 6a, 6b ... is 100 micrometers-mm order normally, and differs from the size of the micromirrors 4a, 4b .... Therefore, by providing the magnification conversion optical system 5 between the optical modulator 4 and the optical fiber array 6, the magnification of the luminous flux is adjusted in accordance with the size ratio of the micromirrors 4a, 4b... And the optical fiber element wires 6a, 6b. All of the light that has been converted and reflected by the micromirrors 4a, 4b... Of the optical modulator 4 is incident on the corresponding optical fiber element wires 6a, 6b.

FIG. 3 is a sectional view schematically showing the arrangement structure of optical fiber element wires 6a, 6b, ... at the exit side end of the optical fiber array 6. As shown in Fig. 3, the exit side of the optical fiber array 6 has a structure in which all the optical fiber element wires 6a, 6b ... are arranged in one row. That is, the optical fiber element wires 6a, 6b, which have a two-dimensional arrangement at the incident side end, have a one-dimensional arrangement at the exit side end. The arrangement can be changed by rearranging the optical fiber element wires 6a, 6b ... between the incidence side end portion and the outgoing side end portion.

Next, an example of a process of irradiating the substrate 8 with the light beam emitted from the optical fiber element lines 6a, 6b... Of the exposure apparatus 1 having the above-described configuration to form an exposure pattern on the substrate 8 will be described. do.

The light beam emitted from the light source 2 is incident on the light modulator 4 after the intensity is uniformed by the fly's eye lens 3. In the optical modulator 4, the reflection angles of the micromirrors 4a, 4b ... are adjusted based on the information for patterning to reflect the light beam to the magnification converting optical system 5. The light beam reflected by the optical modulator 4 enters the incidence side end of the optical fiber array 6 after the magnification is converted in the magnification converting optical system 5. The incident light of the light to the incidence side end portion of the optical fiber array 6 corresponds to the light beams reflected from each micromirror 4a, 4b… of the optical modulator 4 one-to-one with each micromirror 4a, 4b…. It is made to inject into each optical fiber element wire 6a, 6b ... which is made. The light beam incident on the optical fiber array 6 passes through the optical fiber element wires 6a, 6b... And reaches the exit side end of the optical fiber array 6. Then, a light beam is emitted from the exit side end of the optical fiber array 6 and irradiated onto the substrate 8.

Irradiation of the light to the substrate 8 can be performed by condensing the tip portion of the exit side end of each optical fiber element wire 6a, 6b... And condensing the light beam emitted from the exit side end to the substrate 8. The spherical portion of the tip portion of the output side end portion of each of the optical fiber element wires 6a, 6b ... serves to serve as a condenser lens. However, irradiation of the light beam to the substrate is not limited to this, and may be performed by condensing a light beam on the substrate 8 by providing a single condenser lens between the optical fiber array 6 and the substrate 8, for example. In addition, in the case where the tip portion of the exit side end portion of the optical fiber element wires 6a, 6b is spherical, it is possible to generate a light beam spot of several micrometers to a submicrometer order on the substrate 8 without using a condenser lens. .

In the exposure apparatus 1 according to the present embodiment, the substrate 8 and the optical fiber array 6 are relatively moved by moving the stage 7. Here, the scanning direction in which the substrate 8 and the optical fiber array 6 relatively move is referred to as the X direction, and the direction perpendicular to the X direction on the plane parallel to the surface of the stage 7 is referred to as the Y direction. The direction perpendicular to the XY plane is called the Z direction.

As described above, patterning is performed by condensing a light beam on the substrate 8 and scanning the stage 7 in the X direction. In addition, patterning is performed by controlling the light modulator 4 according to the shape of the exposure pattern to be formed, and turning on / off the light beam. Thereby, many linear exposure patterns can be formed in the board | substrate 8 simultaneously.

4A to 4C are plan views schematically showing examples of patterning when the exposure using the exposure apparatus 1 in the present embodiment is performed. 4A shows the simplest example. The patterning shown in FIG. 4A is exposed by scanning the stage 7 in the X direction while irradiating a light beam from each of the optical fiber element wires 6a, 6b... At the exit side end of the optical fiber array 6 to focus on the substrate 8. The pattern 9 is formed. The interval (pitch) of the exposure pattern 9 formed by the patterning shown in Fig. 4A is the pitch of the light beam focused on the substrate 8, that is, the pitch of the center point of the optical fiber element wires 6a, 6b.

4B and 4C show a method of forming the exposure pattern 9 at a pitch narrower than the pitch of the exposure pattern 9 shown in FIG. 4A. In Fig. 4B, the arrangement direction of the optical fiber element wires 6a, 6b, ... arranged at the exit side end of the optical fiber array 6 is inclined in the X direction. By condensing a light beam on the substrate 8 in a state in which the arrangement direction of the optical fiber element wires 6a, 6b ... is inclined in the X direction, and scanning the stage 7 in the X direction, the exposure pattern 9 shown in FIG. The exposure pattern 9 can be formed at a pitch narrower than the pitch. In the patterning shown in Fig. 4C, after the patterning shown in Fig. 4A is performed, the same exposure is performed after the stage 7 is moved in the Y direction by the pitch of the desired exposure pattern 9. By patterning by moving the stage 7, the exposure pattern 9 can be formed at a pitch narrower than the pitch of the exposure pattern 9 shown in FIG. 4A. In addition, by repeating the movement of the stage 7 in the Y direction, it becomes possible to repeatedly form the exposure pattern 9 of a minute pitch.

On the other hand, when the exposure pattern 9 is formed at a pitch wider than the pitch of the exposure pattern 9 shown in Fig. 4A, some of the optical fiber wires 6a, 6b, etc. shown in Fig. 4A or 4B are removed. After taking out, it can implement by exposing as mentioned above. In addition, fine adjustment for making the width | variety of the pitch of the exposure pattern 9 into a desired width | variety may be performed by adjusting the angle at the time of inclining the arrangement direction of optical fiber element wire 6a, 6b ... to an X direction.

In addition, when the substrate 8 is patterned by outputting the two-dimensional light beam pattern reflected from the optical modulator 4 as it is from the optical fiber array 6 as it is, the substrate 8 is exposed by step and repeat, so that the optical fiber is step by step. It is necessary to perform positioning of the array 6 and the stage 7. However, in the exposure apparatus 1 using the optical fiber array 6 in which the above-described optical fiber element wires 6a, 6b ... are arranged in one row, the one-dimensional light beam pattern is emitted to expose the substrate 8, Even when the one-dimensional light beam pattern is relatively scanned at a high speed, the high-precision stage 7 eliminates the need for positioning during scanning. As a result, patterning can be speeded up. In other words, by performing patterning by continuous scanning over the entire area to be patterned, the number of positioning can be reduced, and the most efficient patterning can be realized.

Therefore, by making the arrangement shape of the optical fiber element wires 6a, 6b, ... of the optical fiber array 6 different at the incident side end portion and the exit side end portion, it is possible to realize high speed and efficient patterning. In addition, when the aspect ratio of the arrangement number of the optical fiber element wires 6a, 6b ... in the exit side end surface crosses, and the aspect ratio of the arrangement number of the optical fiber element wires 6a, 6b ... in the incidence side end surface is different, or is incident Even in the case of arranging the optical fiber element wires 6a, 6b ... so that the arrangement shape in the side end section is two-dimensional, and arranging the optical fiber element wires 6a, 6b ... so that the arrangement shape of the emission side end section is one-dimensional, it is similarly high speed. And it is possible to realize efficient patterning. That is, at the incidence side end of the optical fiber array 6, the optical fiber element wires 6a, 6b ... are arranged so as to efficiently enter the light reflected from the optical modulator 4, and at the exit side end, the optical fiber element wires are realized to realize high-speed patterning. By arranging (6a, 6b ...), a general optical modulator in which micromirrors and the like are arranged in two dimensions can be used, and a large number of exposure patterns can be formed, thereby enabling high speed patterning. In addition, by arranging a plurality of optical fiber element wires 6a, 6b ... in the Y direction, the number of exposure patterns 9 which can be drawn at the same time increases, which enables faster patterning.

[2nd Embodiment]

A second embodiment of the present invention will be described with reference to Figs. In the exposure apparatus 1 according to the present embodiment, a row of optical fiber element wires (optical fibers) 10a, 10b, 12a, 12b, etc., arranged in the Y direction at the exit side ends of the optical fiber arrays 10, 12 (optical fiber rows). ) Are arranged in multiple rows in the X direction.

FIG. 5 is a sectional view schematically showing an arrangement structure of optical fiber element lines 10a, 10b, ..., at the exit side end of the optical fiber array 10 in the exposure apparatus 1 of the present embodiment. As shown in Fig. 5, a plurality of rows of optical fibers arranged in the Y direction are provided in the X direction. In addition, each column of the optical fiber rows provided in the X direction is arranged so as to be shifted from each other. In the optical fiber array 10 shown in Fig. 5, when the minimum pitch of the desired exposure pattern 11 is set to w, each column is Y. It is arranged in order so as to shift w in a direction.

In Fig. 5, when the diameters of the optical fiber element wires 10a, 10b ... are set to ø, the optical fiber element wires 10a, 10b ... adjacent to each other are in contact with each other, so that adjacent optical fiber element wires 10a, 10b ... The distance between the centers of the arrays (array pitch) is ø. Incidentally, in the optical fiber array 10 according to the present embodiment,? Is an integer multiple of w. For example, in the optical fiber array 10 shown in Fig. 5, 4 times, i.e.,? For this reason, the fifth column of the optical fiber rows sequentially arranged in the X direction is arranged in a state of shifting 4w in the Y direction than the optical fiber rows of the first column. In other words, the optical fibers are arranged in a state in which they are displaced by one wire. Therefore, by providing four rows of optical fiber rows in the X direction, the exposure pattern 11 having a pitch of w can be continuously formed in the Y direction.

The exposure apparatus 1 having the above structure emits a light beam from each of the optical fiber element wires 10a, 10b ... at the exit side end portion of the optical fiber array 10, and condenses the stage 7 in the X direction while condensing the light on the substrate 8. The exposure pattern 11 is formed by scanning. When the exposure pattern 11 is formed, the exposure pattern 11 can be formed in a desired shape by controlling the timing of on / off of the optical modulator 4 for each optical fiber row in conjunction with the scanning of the stage 7. have. That is, only by performing the scan of the stage 7 once, the exposure pattern 11 of the pitch w smaller than the distance (ø) of the optical fiber element wires 10a, 10b ... adjoining the Y direction is formed in multiple numbers. In addition, the exposure pattern 11 can be formed in a desired shape.

In addition, the said integer multiple is not limited to 4 times. It may be several times as long as? = nw (n is an integer), and it may set according to the pitch of a desired exposure pattern. When ø = nw, the optical fiber array 10 without waste can be realized by arranging the optical fiber rows arranged in the Y direction in the X direction, and the exposure pattern having the pitch w is continuously formed in the Y direction. can do.

FIG. 6 is a cross-sectional view schematically showing another arrangement structure of optical fiber element wires (optical fibers) 12a, 12b, ..., at the exit side end of the optical fiber array 12 in the exposure apparatus 1 of the present embodiment. . In the optical fiber array 12 shown in FIG. 6, similarly to the optical fiber array 10 shown in FIG. 5, a plurality of optical fiber rows arranged in the Y direction are arranged in the X direction. The optical fiber arrays provided in the X direction are arranged so as to be offset from each other. In the optical fiber array 12 shown in Fig. 6, when the minimum pitch of the desired exposure pattern 13 is v, each optical fiber array is They are arranged in order with v shifting in the Y direction. However, the diameter? Of the optical fiber element wires 12a, 12b... Is not an integer multiple of the minimum pitch v of the exposure pattern 13.

Therefore, the optical fiber array 12 shown in Fig. 6 has a structure in which adjacent optical fiber wires 12a, 12b ... of each optical fiber row do not come into contact with each other, so that the adjacent optical fiber wires 12a, 12b ... of each optical fiber row In the case where the distance between the centers (array pitch) is p, p is set to be an integer multiple of v. For example, in the optical fiber array 12 shown in Fig. 6, four times, that is, p = 4v. For this reason, it arrange | positions in the state which shifted 4v to the Y direction rather than the optical fiber row of the 5th column of the 1st column of the optical fiber row arranged one by one in the X direction. In other words, the optical fibers are arranged in a state in which one wire is shifted. Therefore, by providing four rows of optical fiber rows in the X direction, the exposure pattern 13 having a pitch of v can be continuously formed in the Y direction.

The exposure apparatus 1 having the above structure emits a light beam from each of the optical fiber element wires 12a, 12b ... at the exit side end of the optical fiber array 12, and condenses the stage 7 in the X direction while condensing the light on the substrate 8. The exposure pattern 13 is formed by scanning. When the exposure pattern 13 is formed, the exposure pattern 13 can be formed in a desired shape by controlling the timing of the on / off of the optical modulator 4 for each optical fiber row in conjunction with the scanning of the stage 7. have. In other words, a plurality of exposure patterns 13 having a pitch v smaller than the distance p between the centers of the optical fiber element wires 12a, 12b... Adjacent to the Y direction are formed by only scanning the stage 7 once. In addition, it becomes possible to form the exposure pattern 13 in a desired shape.

In addition, the said integer multiple is not limited to 4 times. It may be several times as long as p = nv (n is an integer), and it may set according to the pitch of a desired exposure pattern. In addition, when p = nv, the optical fiber array 12 which is the least wasteful can be realized by arranging the optical fiber rows arranged in the Y direction in the X direction, and the exposure pattern having a pitch of v is continuously formed in the Y direction. can do.

Next, an example of a method of manufacturing the optical fiber array 12 shown in FIG. 6 will be described based on FIG.

FIG. 7 is a cross-sectional view showing one step of the manufacturing method of the optical fiber array 12 shown in FIG. First, a plurality of V-shaped grooves 15 are formed in a substrate 14 made of silicon or the like by a photolithography process. The V-shaped grooves 15 are positioned with high accuracy so that the distance between the centers of adjacent grooves becomes p. The optical fiber element wires 12a, 12b ... are arranged in this V-shaped groove 15, and an ultraviolet curable resin or the like is applied, and then the optical fiber element wires 12a, 12b ... are fixed to each other by ultraviolet irradiation. By removing the silicon substrate 14, an optical fiber row having a gap between adjacent optical fiber element wires 12a, 12b ... and having a center-to-center distance of p is produced. In addition, the silicon substrate 14 is disposed with the minimum pitch v of the desired exposure pattern shifted to produce a new row of optical fiber wires, and at the same time, the already prepared optical fiber rows are adhesively fixed. By repeating this, the optical fiber arrays 12 arranged in order are arranged so that a plurality of rows of optical fiber rows are shifted by a minimum pitch v.

The distance between the adjacent V-grooves is not limited to p, and may be appropriately changed to the distance between the centers of adjacent optical fiber element wires in consideration of the minimum distance of the desired exposure pattern. In addition, similarly to the optical fiber array 10 shown in FIG. 5, even if the optical fiber element wires 10a, 10b ... adjacent to the Y direction have a structure which contacts each other, it can manufacture by the same manufacturing method. In this case, a silicon substrate in which a V-shaped groove is formed may be used in accordance with the distance ø between the adjacent optical fiber element wires 10a, 10b...

In the above description, an example in which optical fibers are arranged at equal intervals is shown, but the present invention is not limited thereto, and may be arranged at uneven intervals in accordance with a pattern to be exposed. Since the incidence side of the optical fiber is regulated by a pattern such as DMD, the equal intervals are arranged, but the emission side may be an uneven interval. The normal exposure pattern is not necessarily all limited to equal intervals. Thus, by switching not only the number of arrays but also the intervals at the incidence side and the outgoing side in this way, the arrangement of the optical fibers is eliminated to areas where exposure is unnecessary and more efficient exposure is achieved. I can do it. This switching of intervals is effective only in the present invention using optical fibers.

In addition, as shown in Fig. 8, by providing a drive mechanism (array position adjusting mechanism) using a piezoelectric element 23 or the like at the light output side end 22 of the optical fiber array, optical fiber element wires 12a, 12b ... It is possible to finely adjust the position of each one of them. For example, it is possible to cope with the case of equal intervals or inequality intervals by moving in the Y direction, and it is possible to adjust the focus of one optical fiber element by moving in the Z direction. Become. The free switching of the distance and height in this manner also has the effect of the present invention using optical fibers.

In addition, in the above description, it was assumed that it exposes to a flat board | substrate, but it is not limited to this. In some cases, unevenness of the substrate may occur due to warpage of the substrate and nonuniformity of the thickness, and the first patterned layer. Or it may be desired to expose to the board | substrate which has periodic irregularities, such as the groove of an optical disc. In such a case, it is possible to simultaneously expose the concave portion and the convex portion by shifting the attachment position of the fiber in advance in the optical axis direction in accordance with the unevenness of the substrate. In addition to changing the number of arrays in this way, the effect possible only in the present invention using the optical fiber can be added by changing the attachment position on the exit side.

[Third Embodiment]

A third embodiment of the present invention will be described with reference to Figs. 9A to 9F. The exposure apparatus 1 according to the present embodiment is configured to have any one of the light collecting portions 16a to 16f at the exit side end portion of the optical fiber element wires 6a and 6b. About another structure, it is the same as the structure of the exposure apparatus 1 demonstrated in the said 1st Embodiment. For this reason, the description regarding the member shown in the said 1st Embodiment is abbreviate | omitted for convenience of description, and it focuses mainly on the light condensing parts 16a-16f in this embodiment.

The light condensing parts 16a to 16f have a function of condensing a light beam, and condensing a light beam emitted from the optical fiber element wires 6a, 6b... That is, the light emitted from each optical fiber element wire 6a, 6b ... is condensed by the light condensing part, and is irradiated to the board | substrate 8 (exposed object) by which the photosensitive material (not shown), such as a resist, was apply | coated to the surface. .

At this time, the irradiation of the light beam to the resist is performed by condensing the light beam at the light collecting portion at the exit side end of each optical fiber element wire 6a, 6b. Moreover, the distance of the board | substrate 8 and the optical fiber array 6 is adjusted so that the light beam irradiated to the resist may be condensed on the resist surface. In order to change the diameter of the light beam focused on the resist surface, a configuration in which the distance between the substrate 8 and the optical fiber array 6 is changed may be provided. Further, even in the case where the substrate 8 is bent or the like, in order to maintain a constant light beam diameter, a servo mechanism for automatically controlling the position of the tip end portion of the optical fiber array 6 may be provided.

In addition, in this embodiment, the arrangement shape of the optical fiber element wire 6a, 6b ... arrange | positioned at the incidence side edge part of the optical fiber array 6 is not limited to two-dimensional arrangement, It can also be set as one-dimensional arrangement.

Next, details of the light collecting portion will be described based on Figs. 9A to 9F. As an example, the description will be made using the optical fiber element wires 6a arranged in the optical fiber array 6. 9A to 9F are side views schematically showing the exit side front end portion of the optical fiber element wire 6a. As shown in Figs. 9A to 9F, the optical fiber element wire 6a in the present embodiment has any one of the condensing portions 16a to 16f, for example, at the output side front end portion. The condensing parts 16a to 16f have a function of condensing a light beam, and condensing a light beam emitted from the optical fiber element wire 6a.

The light condensing parts 16a to 16f are each configured as follows. The light collecting portion 16a has a spherical shape as shown in Fig. 9A, and the light collecting portion 16b has a curved surface aspheric shape as shown in Fig. 9B, and the light collecting portion 16c is shown in Fig. 9C. As shown in FIG. 9, the condensing portion 16d has a wedge shape as shown in FIG. 9 (d), and the collecting portion 16e has a semi-cylindrical shape as shown in FIG. 9 (e). The shapes of the light collecting portions 16a to 16e are formed by processing the tip end of the core of the optical fiber element wire 6a into a lens shape, and all are lenses having a light condensing action. The light converging portion 12f is a lens such as a ball lens having a light condensing action, and is fixed to the distal end of the optical fiber element wire 6a by an adhesive or the like 17 as shown in Fig. 9F.

It is preferable to use translucent resin as an adhesive agent. Although it is preferable that the transmittance | permeability is as high as possible from a viewpoint of light utilization efficiency, even a value of 90% or less can be used. What is necessary is just to judge the transmittance | permeability as the whole optical system. In addition, when light transmits through an adhesive bond layer, it is necessary to consider the refractive index. What is necessary is just to select the material of an adhesive so that optical design may be performed with refractive indexes, such as a core part of an optical fiber element wire, a ball lens, and air, and an optical converging characteristic may be obtained. However, the adhesive is not limited to the light-transmissive resin, and in the case of using a resin that is not light-transmissive, only the portion shifted from the optical path may be adhered.

If the condensing portion is spherical like the condensing portions 16a and 16f, the light beam can be condensed to irradiate the resist with a small spot. Further, by condensing the condensing portion into a curved or conical shape of the aspherical surface as in the condensing portion 16b or 16c, it is possible to condense a light beam to irradiate the resist with a small spot and to further reduce aberration. Further, by condensing the wedge-shaped or semi-cylindrical shape like the condensing portion 16d or 16e, it is possible to condense in only one direction. When the light collecting portion has a wedge shape or a semi-cylindrical shape, it is preferable to focus the light beam in the Y direction, whereby the scanning range can be reduced when the exposure pattern is formed in the X direction.

As described above, the wide field of view used as a stepper is provided by providing any one of the condensing portions 16a to 16f on one of the optical fiber element wires 6a, 6b ... arranged at the exit side end of the optical fiber array 6. In addition, it is possible to generate light beam spots of several micrometers to submicrometer orders without using a high aperture condensing lens. In addition, it is possible to avoid limiting the length of the optical fiber array 6 by the field of view of the condenser lens.

[4th Embodiment]

A fourth embodiment of the present invention will be described with reference to Figs. 10 to 11B. In this embodiment, it is a structure which has an opening part which has a light condensing action instead of the structure which has a light concentrating part in each front-end | tip part of an optical fiber element wire. The structure of the exposure apparatus in this embodiment is the same about the structure of the exposure apparatus 1 demonstrated by the said 1st Embodiment and 3rd embodiment, and the structure other than a light concentrating part, and can be performed similarly about exposure. . For this reason, the description about the member shown in the said 1st Embodiment is abbreviate | omitted for convenience of description, and an opening part is mainly demonstrated in this embodiment. As an example, the description will be made using the optical fiber element wires 6a arranged in the optical fiber array 6.

Fig. 10 is a side view schematically showing the exit side distal end portion of the optical fiber element wire 6a according to the present embodiment. As shown in Fig. 10, the optical fiber element wire 6a has a tapered shape of the core 18 of the output side end portion, and the optical fiber element wire 6a has a size equal to or less than the wavelength of the light beam emitted from the light source 2 at the end portion of the optical fiber element wire 6a. The metal 20 is coated around the core 18 formed in a tapered shape so as to leave the opening 19 having a.

Since the opening 19 has a size equal to or less than the wavelength of the light beam emitted from the light source 2, the light beam emitted from the light source 2 is not normally emitted from the opening 19. However, since the Ebenesent field is formed very near (for example, wavelength order) of the opening part 19, the ultra-neutral spott light exceeding the diffraction limit of light leaks from the opening part 19. . The Ebenesent light is a light wave that is attenuated exponentially with respect to the distance from the interface, such as the light wave when the light is totally reflected, and thus has no energy (does not propagate). Therefore, by bringing the optical fiber array 6 close to a distance of several tens to several hundreds nm with respect to the resist applied on the substrate 8, patterning of an ultrafine pattern about the size of the opening 19 is possible.

In the patterning using the ebenestant light, Ebenesen is emitted when the shape of the opening 19 of the optical fiber element wire 6a is not a perfect symmetry such as a circle but an asymmetry such as an ellipse, an elongated circle, a rectangle, or the like. In some cases, polarization dependence may occur in the light beam. That is, the light polarized in the long direction of the opening 19 and incident on the opening interacts with the free electrons of the coated metal 20, and the longitudinal polarization which easily vibrates the free electrons is reflected to reflect the opening 19. It becomes difficult to penetrate. For this reason, it is preferable to use the light which polarized in the short direction of the opening part 19. In this case, it is preferable to use a polarization plane storage optical fiber element wire as each optical fiber element wire. The loss of light in the opening portion 19 can be reduced by injecting light into the opening in a state in which the polarization direction is preserved in the short direction by using the polarization plane preservation optical fiber element wire. In addition, polarization dependence means that light tends to pass through an opening part easily, or it is hard to pass by an opening shape and polarization direction. In addition, a polarization plane storage optical fiber element wire is an optical fiber element wire which can transmit light without changing a polarization direction.

In the third and fourth embodiments, in the case where a laser or the like is used for the light source 2, the emitted light of adjacent optical fiber wires may interfere, causing unnecessary noise such as an interference fringe. Therefore, as shown in Figs. 11A and 11B, the polarization planes of the polarization planes adjacent to the polarization direction of the polarization planes preservation optical fiber element wires 21a, 21b ... are used by using the polarization plane storage optical fiber element wires 21a, 21b. It is preferable that the optical fiber element wires 21a, 21b ... be arranged differently from each other by 90 degrees. Fig. 11A shows a case where the columns of the polarization plane storage optical fiber element wires 21a, 21b ... are arranged in one row, and Fig. 11B shows a case where the rows of the polarization plane storage optical fiber element wires 21a, 21b ... are arranged in plural. The polarization directions of the polarization plane-preserving optical fiber element wires 21a, 21b ... adjacent to each other are arranged 90 degrees differently. As a result, interference of light emitted from the optical fiber element wires can be prevented and generation of interference fringes can be avoided.

Moreover, it is preferable that the exposure apparatus of this invention further includes the moving part for relatively moving the to-be-exposed object and an optical fiber array. According to the above configuration, the target object and the optical fiber array can be moved relatively. That is, it becomes possible to move a to-be-exposed object and an optical fiber array relatively, irradiating light to the to-be-exposed object from the optical fiber of an optical fiber array, and as a result, continuous exposure can be performed.

In the exposure apparatus of the present invention, the number of optical fibers arranged in the scanning direction relatively scanning the exposed object and the optical fiber array among the plurality of optical fibers arranged on the exit side is smaller than the number of optical fibers arranged in the direction perpendicular to the scanning direction. It is preferable. According to the above configuration, the light modulated by the light modulator can be incident more efficiently, and the exposure of the exposed object can be performed more efficiently and at high speed.

In the exposure apparatus of the present invention, the scanning direction is selected from among the plurality of optical fibers arranged on the emission side, among the exposure patterns in which the distance between the centers of the optical fibers adjacent to the direction perpendicular to the scanning direction is formed by irradiating light to the exposed object. It is preferable that it is an integer multiple of the minimum distance of the exposure pattern adjacent to a perpendicular | vertical direction with respect to. Further, when the minimum distance of the exposure pattern is w and the integer multiple is n times, the optical fiber rows in which the plurality of optical fibers are arranged in one row are arranged in n rows in the scanning direction, and each optical fiber row is in the scanning direction. It is preferable to arrange | position in order so that each may shift | deviate by w in the orthogonal direction.

According to the above structure, the exposure pattern can be formed at intervals smaller than the distance between the centers of the optical fibers adjacent to the direction perpendicular to the scanning direction. Further, when the distance between the centers of optical fibers adjacent to the direction perpendicular to the scanning direction is an integer multiple of the minimum distance of the irradiation pattern adjacent to the direction perpendicular to the scanning direction, for example, n times, the optical fibers arranged in one row By arranging the columns in the scanning direction by n columns and arranging the optical fiber rows in order so as to shift the w optical fibers in a direction perpendicular to the scanning direction, the exposure can be performed so that the minimum distance of adjacent exposure patterns becomes w. That is, a pattern having a minimum distance w of the exposure pattern can be formed only by relatively moving the exposed object and the optical fiber array in the scanning direction.

The exposure apparatus of the present invention preferably further includes a moving part for relatively moving the exposed object and the optical fiber array. According to the above configuration, the target object and the optical fiber array can be moved relatively. That is, it becomes possible to move a to-be-exposed object and an optical fiber array relatively, irradiating light to the to-be-exposed object from the optical fiber of an optical fiber array, and as a result, continuous exposure can be performed.

It is preferable that the exposure apparatus of the present invention is configured to expose the entire area of the exposed object by moving the exposed object and the optical fiber array relatively. According to the above configuration, it is possible to expose the exposed object by irradiating light to the exposed object from the optical fiber of the optical fiber array, and it is possible to expose the entire area of the exposed object by relatively moving the exposed object and the optical fiber array. Thereby, exposure of a to-be-exposed object can be performed efficiently and at high speed.

It is preferable that the exposure apparatus of this invention is equipped with the magnification conversion optical system for changing the magnitude | size of a light beam between the said optical modulator and an optical fiber array. According to the above configuration, the light beam modulated by the light modulator can be transmitted to the magnification converting optical system, so that the light flux can be changed to the size according to the cross section of the optical fiber array. Thereby, even when the reflecting surface of the optical modulator and the size of the incident end surface of the optical fiber array are different, all of the light modulated by the optical modulator can be incident on the optical fiber array.

It is preferable that the exposure apparatus of this invention is equipped with the arrangement position adjustment mechanism for changing the light emission side arrangement | positioning shape of the said optical fiber array. According to the above configuration, since the light output side array shape of the optical fiber array can be changed in accordance with the exposure pattern, the position of each optical fiber can be finely adjusted. This makes it possible to cope not only with the case where the light output side arrangement of the optical fiber array is equally spaced but also with an inequality interval, and at the same time, it is possible to adjust the focus of each optical fiber. As a result, it can respond to various exposure patterns and exposure line width easily.

In the exposure apparatus of the present invention, it is preferable that the light converging portion is formed by processing the exit side end portion of the optical fiber into a lens shape. In addition, the light collecting unit is preferably a lens fixed to the exit end of the optical fiber.

According to the above configuration, the condensing portion formed by processing the output side front end of the optical fiber into the lens shape, or the lens fixed to the output side front end of the optical fiber can simplify the apparatus to fulfill the role of the condensing lens, Light can be condensed easily. Further, by providing a lens at the output side front end portion of the optical fiber, it is possible to condense so that the diameter becomes a spot of several micrometers to a submicrometer order on the object to be exposed.

In the exposure apparatus of the present invention, it is preferable that the optical fiber emits ebenescent light from the opening. According to the above constitution, by exposing the object to be exposed using the ultrane spot's evanescent light, it is possible to form an ultrafine pattern about the size of the opening.

In the exposure apparatus of the present invention, it is preferable that the optical fiber is a polarization plane storage optical fiber. When the opening portion has asymmetry, polarization dependence may appear in light emitted from the optical fiber. On the other hand, according to the said structure, since it becomes possible to exit | emit in the state which preserved the polarization state of the light which entered the polarization plane storage optical fiber, it can avoid that a polarization dependency appears.

In the exposure apparatus of the present invention, it is preferable that the optical fiber is a polarization plane storage optical fiber, and the polarization directions of adjacent polarization plane storage optical fibers are arranged to be shifted by 90 ° from each other. For example, when a laser is used as a light source, the emitted light of adjacent optical fibers may interfere, causing unnecessary noise such as interference fringes. On the other hand, according to the above configuration, it is possible to prevent the interference of the light emitted from the adjacent polarization plane preservation optical fiber to avoid the occurrence of interference fringes. As a result, generation of unnecessary noise can be prevented.

As described above, in the exposure apparatus according to the present invention, the arrangement of the incidence side on which light is incident is arranged differently from the arrangement of the emission side in which light is emitted. Therefore, the exposure apparatus which concerns on this invention can perform exposure of a to-be-exposed object efficiently and at high speed. Therefore, this invention can be used suitably for the industrial field which manufactures the board | substrate of a liquid crystal display, a general circuit board, etc., and the industrial field which manufactures components, such as an optical fiber.

Specific embodiments or examples made in the description of the present invention are intended to clarify the technical contents of the present invention to the last, and should not be construed in a narrow sense as limited to such specific embodiments. It can change and implement variously within the scope of the patent claim described in the following. Moreover, the embodiment obtained by combining suitably the technical means respectively disclosed in other embodiment is also included in the technical scope of this invention.

According to the present invention, it is possible to provide an exposure apparatus capable of performing exposure such as patterning efficiently and at high speed by using an optical fiber array in which optical fiber element wires are arranged differently in the incidence side and the exit side of the optical fiber array, There is provided an exposure apparatus capable of condensing a luminous flux emitted from an optical fiber array onto a photosensitive material so as to be a spot having a diameter of several micrometers to a submicrometer order without using a wide field of view and a high number of condensing lenses that are difficult to manufacture.

Claims (33)

A light source, an optical modulator for modulating the light emitted from the light source, and an optical fiber array in which a plurality of optical fibers are incident and emitted toward the object to be exposed by light modulated by the optical modulator; And said plurality of optical fibers are arranged differently in the arrangement of the incidence side on which light is incident and in the arrangement of the outgoing side in which light is emitted. 2. An exposure apparatus according to claim 1, further comprising a moving part for relatively moving the exposed object and the optical fiber array. The exposure direction of claim 2, wherein a distance between the centers of optical fibers adjacent to the direction perpendicular to the scanning direction among the plurality of optical fibers arranged on the exit side is formed by irradiating light to the exposed object. An exposure apparatus characterized by being an integer multiple of the minimum distance of the exposure pattern adjacent to a perpendicular | vertical direction with respect to it. The optical fiber array according to claim 3, wherein when the minimum distance of the exposure pattern is w and the integer multiple is n times, the optical fiber rows in which the plurality of optical fibers are arranged in one row are arranged in n rows in the scanning direction. An exposure apparatus, which is arranged in order so as to be shifted by w respectively in the direction perpendicular to the scanning direction. 3. The optical fiber according to claim 2, wherein the number of optical fibers arranged in the scanning direction relatively scanning the exposed object and the optical fiber array among the plurality of optical fibers arranged on the exit side is smaller than the number of optical fibers arranged in the direction perpendicular to the scanning direction. An exposure apparatus characterized by the above-mentioned. The said scanning of the exposure pattern of Claim 5 in which the distance between the centers of the optical fibers adjacent to the direction orthogonal to the said scanning direction is formed by irradiating light to a to-be-exposed object among the some optical fibers arrange | positioned at the said emission side. An exposure apparatus, which is an integer multiple of the minimum distance of the exposure pattern adjacent to the direction perpendicular to the direction. The optical fiber array according to claim 6, wherein when the minimum distance of the exposure pattern is w and the integer multiple is n times, the optical fiber rows in which the plurality of optical fibers are arranged in one row are arranged in n rows in the scanning direction. An exposure apparatus, which is arranged in order so as to be shifted by w respectively in the direction perpendicular to the scanning direction. The exposure apparatus according to claim 2, wherein the entire area of the exposed object is exposed by moving the exposed object and the optical fiber array relatively. The exposure apparatus according to claim 1, further comprising a magnification conversion optical system for changing the magnitude of the luminous flux between the light modulator and the optical fiber array. The exposure apparatus according to any one of claims 1 to 9, further comprising an array position adjusting mechanism for changing a light output side array shape of the optical fiber array. A light source, an optical modulator for modulating the light emitted from the light source, and an optical fiber array in which a plurality of optical fibers are incident and emitted toward the object to be exposed by light modulated by the optical modulator; The plurality of optical fibers are arranged such that the aspect ratio of the number of arrays in the incidence side end face and the aspect ratio of the number of arrangements in the exit side end face are arranged differently. 12. An exposure apparatus according to claim 11, further comprising a moving part for relatively moving the exposed object and the optical fiber array. The said scanning of the exposure pattern of Claim 12 in which the distance between the centers of the optical fibers adjacent to a direction orthogonal to the said scanning direction among the several optical fibers arrange | positioned at the said emission side is formed by irradiating light to a to-be-exposed object, And an integer multiple of the minimum distance of the exposure pattern adjacent to the direction perpendicular to the direction. 14. The optical fiber array according to claim 13, wherein when the minimum distance of the exposure pattern is w and the integer multiple is n times, the optical fiber rows in which the plurality of optical fibers are arranged in one row are arranged in n rows in the scanning direction, and each optical fiber row is An exposure apparatus, which is arranged in order so as to be shifted by w respectively in the direction perpendicular to the scanning direction. 13. The optical fiber according to claim 12, wherein the number of optical fibers arranged in the scanning direction relatively scanning the exposed object and the optical fiber array among the plurality of optical fibers arranged on the exit side is smaller than the number of optical fibers arranged in the direction perpendicular to the scanning direction. An exposure apparatus characterized by the above-mentioned. The said scanning direction of the exposure pattern of Claim 15 in which the distance between the centers of the optical fibers adjacent to the orthogonal direction with respect to the said scanning direction is formed by irradiating light to a to-be-exposed object among the some optical fibers arrange | positioned at the said emission side. An integer multiple of the minimum distance of the exposure pattern adjacent to a perpendicular | vertical direction with respect to the exposure apparatus. 17. The optical fiber array according to claim 16, wherein when the minimum distance of the exposure pattern is w and the integer multiple is n times, the optical fiber rows in which the plurality of optical fibers are arranged in one row are arranged in n rows in the scanning direction, and each optical fiber row is An exposure apparatus, which is arranged in order so as to be shifted by w respectively in the direction perpendicular to the scanning direction. The exposure apparatus according to claim 12, wherein the entire area of the exposed object is exposed by relatively moving the exposed object and the optical fiber array. The exposure apparatus according to claim 11, further comprising a magnification conversion optical system for changing the magnitude of the luminous flux between the light modulator and the optical fiber array. The exposure apparatus according to any one of claims 11 to 19, further comprising an array position adjusting mechanism for changing a light output side array shape of the optical fiber array. A light source, an optical modulator for modulating the light emitted from the light source, and an optical fiber array in which a plurality of optical fibers are incident and emitted toward the object to be exposed by light modulated by the optical modulator; The plurality of optical fibers are arranged so that the arrangement shape in the incidence side cross section is two-dimensional, and the arrangement shape in the emission side cross section is arranged in one dimension. 22. An exposure apparatus according to claim 21, further comprising a moving part for relatively moving the exposed object and the optical fiber array. 23. An exposure apparatus according to claim 22, wherein the entire area of the exposed object is exposed by moving the exposed object and the optical fiber array relatively. The exposure apparatus according to claim 21, further comprising a magnification conversion optical system for changing the magnitude of the luminous flux between the light modulator and the optical fiber array. The exposure apparatus according to any one of claims 21 to 24, further comprising an array position adjusting mechanism for changing the light output side array shape of the optical fiber array. A light source, and an optical fiber array in which a plurality of optical fibers which enter light emitted from the light source and exit toward the target object are arranged; And said optical fiber has a light collecting portion for condensing light at a distal end of the light emitting side for emitting light. 27. The exposure apparatus according to claim 26, wherein the condensing portion is formed by processing the exit side end portion of the optical fiber into a lens shape. 27. An exposure apparatus according to claim 26, wherein the light collecting portion is a lens fixed to an exit side end portion of the optical fiber. The exposure apparatus according to any one of claims 26 to 28, wherein the optical fiber is a polarization plane storage optical fiber, and the polarization directions of adjacent polarization plane storage optical fibers are arranged to be shifted by 90 ° from each other. A light source, and an optical fiber array in which a plurality of optical fibers which enter light emitted from the light source and exit toward the target object are arranged; And the optical fiber has an opening having a size equal to or less than a wavelength of light emitted from the light source at a distal end of the light exiting side. 31. An exposure apparatus according to claim 30, wherein the optical fiber emits everneven light from the opening. 32. An exposure apparatus according to claim 30 or 31, wherein the optical fiber is a polarization plane storage optical fiber. The exposure apparatus according to claim 30 or 31, wherein the optical fiber is a polarization plane storage optical fiber, and the polarization directions of adjacent polarization plane storage optical fibers are arranged to be shifted by 90 ° from each other.

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