KR100546703B1 - Reflecting Substrate of Reflective Type Liquid Crystal Display Devices - Google Patents
Reflecting Substrate of Reflective Type Liquid Crystal Display Devices Download PDFInfo
- Publication number
- KR100546703B1 KR100546703B1 KR1019980054555A KR19980054555A KR100546703B1 KR 100546703 B1 KR100546703 B1 KR 100546703B1 KR 1019980054555 A KR1019980054555 A KR 1019980054555A KR 19980054555 A KR19980054555 A KR 19980054555A KR 100546703 B1 KR100546703 B1 KR 100546703B1
- Authority
- KR
- South Korea
- Prior art keywords
- coating agent
- substrate
- liquid crystal
- crystal display
- reflective
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133553—Reflecting elements
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
- G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
- G02F1/13398—Spacer materials; Spacer properties
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Liquid Crystal (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
Abstract
본 발명에 따른 반사형 액정표시장치의 반사판의 형성방법은 우선 박막트랜지스터가 형성된 기판 위에 자성체 가루와 대전된 복수의 볼이 섞인 도포제를 도포한 후, 전자석을 이용하여 자성체를 기판쪽으로 끌어 당김으로써, 볼을 기판에 밀착하도록 하며, 이때, 복수의 볼은 대전되었기 때문에 서로 미는 힘에 의해 일정간격을 두고 균일하게 정렬한다. 도포제 위에는 반사전극이 형성되며, 이러한 방법에 의해 형성된 반사전극의 표면은 균일한 요철패턴을 형성한다. 또한, 볼이 기판에 밀착되기 때문에 도포제의 표면이 연속된 부드러운 요철면이 되어, 그 위에 형성되는 반사전극에 단선이 발생하지 않는다.In the method of forming a reflecting plate of a reflective liquid crystal display according to the present invention, first, by applying a coating agent mixed with magnetic powder and a plurality of balls charged on a substrate on which a thin film transistor is formed, the magnetic material is attracted to the substrate using an electromagnet, The balls are brought into close contact with the substrate. At this time, since the plurality of balls are charged, the balls are uniformly arranged at regular intervals by the pushing force. A reflective electrode is formed on the coating agent, and the surface of the reflective electrode formed by this method forms a uniform uneven pattern. In addition, since the ball is in close contact with the substrate, the surface of the coating agent becomes a continuous smooth uneven surface, and disconnection does not occur in the reflective electrode formed thereon.
Description
본 발명은 반사형 액정표시장치의 반사판에 관한 것으로, 특히 단순한 공정으로 균일한 반사전극의 요철패턴을 형성하는 반사형 액정표시장치의 반사판 및 그 제조방법에 관한 것이다. BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a reflecting plate of a reflective liquid crystal display device, and more particularly to a reflecting plate of a reflective liquid crystal display device and a method of manufacturing the same for forming a uneven pattern of a uniform reflecting electrode in a simple process.
액정표시장치는 동작모드에 따라, 개략적으로 TN(Twisted Nematic)형, GH(Guest Host)형, ECB(Electrically Controlled Birefringence)형 및 OCB(Optically Compensated Birefringence)형 등으로 나눌 수 있고, 광원의 이용방법에 따라, 백라이트를 이용하는 투과형 액정표시장치와 외부의 광원을 이용하는 반사형 액정표시장치의 두 종류로 분류할 수 있다. 근래에는 백라이트(back light)를 광원으로 사용하는 투과형 액정표시장치가 널리 이용되고 있으나, 이러한 백라이트의 사용은 액정표시장치의 무게와 부피를 증가시킬 뿐만 아니라, 소비전력이 높다는 문제점을 가진다. 백라이트가 내장된 액정표시장치의 상기한 문제점들을 극복하고자, 최근에는 백라이트를 사용하지 않는 반사형 액정표시장치에 대한 연구가 활발하게 진행되고 있다. The liquid crystal display can be roughly divided into twisted nematic (TN) type, guest host (GH) type, electrically controlled birefringence type (ECB) type, and optically compensated birefringence type (OCB) type according to the operation mode. Accordingly, the present invention can be classified into two types, a transmissive liquid crystal display using a backlight and a reflective liquid crystal display using an external light source. Recently, a transmissive liquid crystal display using a backlight as a light source has been widely used, but the use of such a backlight not only increases the weight and volume of the liquid crystal display, but also has a problem of high power consumption. In order to overcome the above problems of a liquid crystal display device with a built-in backlight, researches on a reflective liquid crystal display device that does not use a backlight have been actively conducted in recent years.
일반적인 반사형 액정표시장치는 기본적으로 편광판과 투명전극이 형성되는 상판과 반사전극이 형성되는 하판과 그 사이의 액정층으로 구성되며, 하판에 형성되는 게이트배선 및 데이터배선에 의해 복수의 화소영역으로 나뉘며, 각 화소영역 마다 스위칭소자로써의 박막트랜지스터가 하나씩 형성된다. 상기 반사전극은 각 화소영역 마다 하나씩 형성되며 상기 박막트랜지스터의 드레인전극과 연결된다. A general reflective liquid crystal display device is basically composed of a top plate on which a polarizer and a transparent electrode are formed, a bottom plate on which a reflective electrode is formed, and a liquid crystal layer therebetween, and are divided into a plurality of pixel regions by gate wiring and data wiring formed on the bottom plate. Each thin film transistor is formed as a switching element in each pixel region. One reflective electrode is formed in each pixel region and is connected to the drain electrode of the thin film transistor.
반사전극은 인가된 화소데이터전압에 따라 상판의 투명전극과 함께 액정층에 전기장을 인가하여 액정분자의 배열을 조절하는 화소전극(pixel electrode) 역할을 하며, 동시에 상판과 액정층을 통해 입사한 빛을 사용자의 시야방향으로 반사하는 반사막(mirror) 역할을 동시에 한다. 반사전극의 표면이 평탄하면 특정방향의 외부광으로부터 입사한 빛은 상기 특정방향의 반대편 쪽으로 반사하게 되며, 따라서, 사용자가 반사되는 빛을 볼 수 있는 시야각 범위가 좁아지게 된다. 시야각을 넓히기 위해서 상판에 광산란수단을 설치할 수도 있지만, 주로 이용되는 방법이 반사전극의 표면을 요철모양으로 형성하는 것이다. 이러한 구조를 위한 일반적인 방법으로 반사전극을 형성하기 전에 감광성수지 등을 도포한 후 패터닝하고 열처리하여 표면이 요철모양의 요철막을 형성하고 그 위에 금속막을 적층한 후 패터닝하여 표면이 요철모양이 반사전극을 형성하는 방법이 있다. 이러한 요철막 형성 방법은 공정이 복잡할 뿐만 아니라, 요철막의 균일한 패턴이 힘들어 공정 때마다 설계치와 다른 불규칙한 요철패턴이 발생하고, 반사전극이 불규칙한 방향으로 빛을 산란반사하기 때문에 원하는 반사특성을 얻지 못하는 단점이 있다. The reflective electrode acts as a pixel electrode to control the arrangement of liquid crystal molecules by applying an electric field to the liquid crystal layer along with the transparent electrode of the upper plate according to the applied pixel data voltage, and at the same time, light incident through the upper plate and the liquid crystal layer At the same time serves as a reflector (mirror) to reflect in the direction of the user's view. When the surface of the reflective electrode is flat, the light incident from the external light in a specific direction is reflected toward the opposite side of the specific direction, thereby narrowing the viewing angle range in which the user can see the reflected light. Although light scattering means may be provided on the top plate to widen the viewing angle, a commonly used method is to form the surface of the reflective electrode in an uneven shape. As a general method for such a structure, a photosensitive resin is applied before forming a reflective electrode, and then patterned and heat treated to form an uneven film having a concave-convex shape, and a metal film is laminated thereon, then patterned to form a reflective electrode with a concave-convex shape. There is a way to form. This uneven film forming method is not only complicated in process, but also uniform pattern of uneven film is difficult to produce irregular irregular pattern different from the designed value at every process, and the reflective electrode scatters and reflects light in irregular direction so that the desired reflective characteristic is not obtained. There is a disadvantage.
반사전극의 표면을 요철모양으로 만들기 위한 또 다른 방법으로 구 모양의 복수의 볼을 도포제에 첨가한 후, 도 1에 나타낸 바와 같이 게이트전극(3), 게이트절연막(4), 활성반도체층(5), 소스전극(2), 및 드레인전극(6)으로 구성된 박막트랜지스터(8)가 형성된 기판(1) 위에 상기 도포제(10)를 도포한 후, 그 위에 반사전극(11)을 형성하는 방법이 있다. 이러한 요철형성 방법은 공정이 단순하지만, 볼(9)이 부력에 의해 기판에 붙지 않고 떨어져서 볼(9) 위에 충분한 도포제가 형성되지 않을 경우, 화살표로 표시한 부분(A,B)과 같이, 요철표면이 불연속적인 부분이 생기며, 이 부분의 반사전극(11)에 단선이 생길 수 있다. 또한, 볼(9)의 배열을 규칙적으로 제어할 수 없기 때문에, 원하는 배열의 요철패턴을 얻을 수 없는 단점이 있다.As another method for making the surface of the reflective electrode uneven, after adding a plurality of spherical balls to the coating agent, as shown in FIG. 1, the gate electrode 3, the gate insulating film 4, and the active semiconductor layer 5 ), The coating agent 10 is applied on the substrate 1 on which the thin film transistor 8 composed of the source electrode 2 and the drain electrode 6 is formed, and then the reflective electrode 11 is formed thereon. have. This irregularity forming method is simple, but when the ball 9 does not adhere to the substrate by buoyancy and falls, and sufficient coating agent is not formed on the ball 9, as shown by the arrows A and B, The surface is discontinuous and a disconnection may occur in the reflective electrode 11 of this portion. Further, since the arrangement of the balls 9 cannot be controlled regularly, there is a disadvantage in that the uneven pattern of the desired arrangement cannot be obtained.
본 발명은 상기한 종래기술의 문제점을 감안하여 이루어진 것으로, 반사전극 표면을 요철모양으로 하기 위한 요철패턴 공정이 단순할 뿐만 아니라, 요철패턴이 균일하며, 요철표면의 불연속적인 부분에 의한 반사전극의 단선을 방지한 반사형 액정표시장치의 반사판 및 그 제조방법을 제공하는 것을 목적으로 한다. SUMMARY OF THE INVENTION The present invention has been made in view of the above-described problems of the prior art, and is not only a simple concave-convex pattern process for forming the concave-convex surface of the reflecting electrode, but a concave-convex pattern is uniform, and the concave-convex surface of the concave-convex surface is formed by An object of the present invention is to provide a reflective plate of a reflective liquid crystal display device which prevents disconnection and a manufacturing method thereof.
상기한 목적을 달성하기 위한 본 발명에 따른 반사형 액정표시장치의 반사판은 기판과, 복수의 볼과 자성체 가루를 포함하며 상기 기판 위에 형성된 도포제와, 상기 도포제 위에 형성된 반사전극을 포함하여 구성된다. The reflective plate of the reflective liquid crystal display according to the present invention for achieving the above object comprises a substrate, a plurality of balls and magnetic powder, the coating agent formed on the substrate, and a reflective electrode formed on the coating agent.
상기한 목적을 달성하기 위한 본 발명에 따른 반사형 액정표시장치의 반사판 제조방법은 기판 위에 복수의 대전된 볼과 자성체 가루를 포함하는 도포제를 도포하는 단계와, 상기 자성체 가루에 상기 기판쪽으로의 자기력을 인가하는 단계와, 상기 도포제 위에 반사전극을 형성하는 단계를 포함하여 구성된다.Reflective plate manufacturing method of a reflective liquid crystal display device according to the present invention for achieving the above object is a step of applying a coating agent comprising a plurality of charged balls and magnetic powder on a substrate, and the magnetic force to the substrate to the magnetic powder It comprises a step of applying, and forming a reflective electrode on the coating agent.
상기한 대전된 볼은 쿨롱의 힘에 의해 서로 일정간격을 두고 배열되어, 도포제의 요철패턴이 균일해지며, 도포제에 첨가된 자성체가루가 자기력에 의해 기판쪽으로 힘을 받으므로, 이 힘에 의해 상기 볼도 기판에 밀착되어 상기 도포제가 부드러운 요철표면을 가짐으로써, 도포제의 요철표면 위에 형성되는 반사전극의 단선이 방지된다.The charged balls are arranged at regular intervals from each other by the coulomb force, so that the uneven pattern of the coating agent becomes uniform, and the magnetic powder added to the coating agent receives the force toward the substrate by the magnetic force. The ball is also in close contact with the substrate, and the coating agent has a smooth uneven surface, thereby preventing disconnection of the reflective electrode formed on the uneven surface of the coating agent.
이하, 도면을 참조하여 본 발명에 따른 반사형 액정표시장치의 반사판을 상세히 설명한다.Hereinafter, the reflective plate of the reflective liquid crystal display according to the present invention will be described in detail with reference to the accompanying drawings.
도 2 - 도 5는 본 발명에 따른 반사형 액정표시장치의 반사판의 제조방법을 나타낸 단면도이다.2 to 5 are cross-sectional views illustrating a method of manufacturing a reflecting plate of a reflective liquid crystal display according to the present invention.
도 2에 나타낸 바와 같이, 우선, 기판(21) 위에 게이트전극(23), 게이트절연막(24), 활성반도체층(25), 소스전극(22), 및 드레인전극(26)으로 구성되는 박막트랜지스터(28)를 형성한다.As shown in FIG. 2, first, a thin film transistor including a gate electrode 23, a gate insulating film 24, an active semiconductor layer 25, a source electrode 22, and a drain electrode 26 on the substrate 21. FIG. Form 28.
기판(21) 위에 형성되는 게이트전극(23)은 Al, Al합금, Mo/Al 이중층, 또는 Cr/Al 이중층을 스퍼터링(sputtering)법으로 적층하고 사진식각(photolithography)법으로 패터닝하여 형성하며, 도면에 나타내지 않은 게이트배선도 이와 함께 형성된다.The gate electrode 23 formed on the substrate 21 is formed by stacking Al, Al alloy, Mo / Al double layer, or Cr / Al double layer by sputtering and patterning by photolithography. Gate wirings not shown in the figure are also formed with this.
그 위에 형성되는 게이트절연막(24)은 SiNx 또는 SiOx 등을 플라즈마 CVD(plasma chmeical vapor deposition)법으로 적층하여 형성한다.The gate insulating film 24 formed thereon is formed by stacking SiNx or SiOx or the like by plasma CVD (plasma chemical vapor deposition).
그 위에 형성되는 활성반도체층(25)은 비정질실리콘(amorphous silicon)을 플라즈마 CVD방법에 의해 적층하고 패터닝하여 형성하고, 도면에 나타내지 않았지만, 그 위에 n+ a-Si을 적층하고 패터닝하여 오우믹콘택층을 형성한다.The active semiconductor layer 25 formed thereon is formed by laminating and patterning amorphous silicon by a plasma CVD method, and although not shown in the drawing, the ohmic contact layer is formed by laminating and patterning n + a-Si thereon. To form.
그 위에 형성되는 소스전극(22) 및 드레인전극(26)은 Al, Cr, Ti, Al합금 등의 금속을 스퍼터링방법으로 적층한 후 사진식각방법으로 패터닝하여 형성한다.The source electrode 22 and the drain electrode 26 formed thereon are formed by stacking metals such as Al, Cr, Ti, and Al alloys by the sputtering method, and then patterning them by photolithography.
이어서, 대전된 볼(29)을 자성체 가루가 섞여 있는 도포제(30)에 섞은 후에, 도 3에 나타낸 바와 같이, 박막트랜지스터(28)가 형성된 기판(21) 위에 상기 도포제(30)를 도포하고, 베이킹하면서 전자석(40)으로 자화시켜 대전된 볼(29)들을 고정시킨다. 도포제(30)는 자성체 가루가 섞여 있으므로 전자석(40)의 자기력에 의해 기판쪽으로 당겨지며, 이러한 힘에 의해 대전된 볼(29)들이 바닥에 안정적으로 고정되며, 쿨롱의 힘에 의해 서로를 밀면서 일정한 간격으로 정렬된다. 자성체 가루로는 철가루를 이용할 수 있으며, 도포제(30)로는 감광성수지 또는 폴리머를 이용할 수 있다. 대전된 볼(29)은 플라스틱과 같은 부도체로 형성가능하며, 금속과 같은 도전체로도 형성가능하다. 도포제(30)의 도포된 두께(T)는 볼 직경의 1/2 이상이 되도록 도포제의 점도, 양 및 베이킹 온도를 조절한다.Subsequently, after the charged balls 29 are mixed with the coating agent 30 containing magnetic powder, the coating agent 30 is applied onto the substrate 21 on which the thin film transistor 28 is formed, as shown in FIG. While baking, the electromagnet 40 is magnetized to fix the charged balls 29. The coating agent 30 is pulled toward the substrate by the magnetic force of the electromagnet 40 because the magnetic powder is mixed, and the charged balls 29 are stably fixed to the floor by this force, and pushes each other by the coulomb force. Aligned at intervals. Iron powder may be used as the magnetic powder, and a photosensitive resin or a polymer may be used as the coating agent 30. The charged ball 29 may be formed of a nonconductor such as plastic, or may be formed of a conductor such as metal. The applied thickness T of the coating agent 30 adjusts the viscosity, amount and baking temperature of the coating agent so that it is at least 1/2 of the ball diameter.
이어서, 도 4에 나타낸 바와 같이, 드레인전극(26) 영역의 도포제 중 일부를 제거하여 연결홀(32)을 형성한다. 도포제를 양성 감광성수지로 형성한 경우에는, 도포제의 드레인전극 영역에 자외선을 조사한 후 현상하여 제거하여 연결홀을 형성한다.Subsequently, as shown in FIG. 4, a part of the coating agent in the drain electrode 26 region is removed to form the connection hole 32. In the case where the coating agent is formed of a positive photosensitive resin, ultraviolet rays are irradiated to the drain electrode region of the coating agent and then developed and removed to form a connection hole.
이어서, 그 위에 Al이나 Al합금을 스퍼터링법으로 적층한 후 사진식각법으로 패터닝하여 반사전극(31)을 형성한다.Subsequently, Al or Al alloy is deposited thereon by sputtering, and then patterned by photolithography to form the reflective electrode 31.
도면에 나타내지 않았지만, 반사전극(31) 위에는 액정의 배향을 결정하는 배향막이 형성하며, 이 배향막은 광반응성 물질이나 폴리이미드를 도포한 후 광배향 또는 러빙을 실시하여 형성한다.Although not shown in the figure, an alignment film for determining the alignment of the liquid crystal is formed on the reflective electrode 31, which is formed by applying a photoreactive substance or polyimide and then performing photo-alignment or rubbing.
본 발명은 반사형 액정표시장치의 반사판의 제조방법에만 국한되지 않으며, 상기한 제조방법에 의해 형성된 반사판을 포함하고, 요철모양의 표면을 형성하는 모든 방법을 포함하며, 상기 제조방법을 포함하는 반사형 액정표시장치의 제조방법 및 그 장치를 모두 포함한다.The present invention is not limited to the manufacturing method of the reflecting plate of the reflective liquid crystal display device, and includes all the methods of forming the uneven surface including the reflecting plate formed by the manufacturing method described above, and including the manufacturing method. The manufacturing method of a type | mold liquid crystal display device, and its device are included.
종래의 감광성수지를 이용한 요철패턴 공정에 비해 공정이 단순하며, 종래의 볼이 첨가된 도포제를 이용한 요철패턴 공정에서 발생하는 반사전극의 단선을 방지하며, 배열이 균일한 요철패턴을 안정되게 형성할 수 있다.The process is simpler than the conventional concave-convex pattern process using photosensitive resin, and it prevents the disconnection of the reflective electrode generated in the concave-convex pattern process using the coating agent added with the conventional ball, and stably forms the concave-convex pattern with uniform arrangement. Can be.
도 1은 반사형 액정표시장치의 반사판에서 요철패턴 형성방법의 일례를 나타낸 단면도이다. 1 is a cross-sectional view showing an example of a method of forming an uneven pattern in a reflection plate of a reflective liquid crystal display device.
도 2 - 도 5는 본 발명에 따른 반사형 액정표시장치의 반사판 제조방법을 나타낸 단면도이다. 2 to 5 are cross-sectional views illustrating a method of manufacturing a reflecting plate of a reflective liquid crystal display according to the present invention.
-도면의 주요부분에 대한 부호의 설명- Explanation of symbols on the main parts of the drawing
21: 기판 28: 박막트랜지스터 30: 도포제 21 substrate 28 thin film transistor 30 coating agent
31: 반사전극 32: 연결홀 24: 게이트절연막 31: reflective electrode 32: connection hole 24: gate insulating film
Claims (3)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1019980054555A KR100546703B1 (en) | 1998-12-11 | 1998-12-11 | Reflecting Substrate of Reflective Type Liquid Crystal Display Devices |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1019980054555A KR100546703B1 (en) | 1998-12-11 | 1998-12-11 | Reflecting Substrate of Reflective Type Liquid Crystal Display Devices |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20000039270A KR20000039270A (en) | 2000-07-05 |
| KR100546703B1 true KR100546703B1 (en) | 2006-03-23 |
Family
ID=19562489
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019980054555A KR100546703B1 (en) | 1998-12-11 | 1998-12-11 | Reflecting Substrate of Reflective Type Liquid Crystal Display Devices |
Country Status (1)
| Country | Link |
|---|---|
| KR (1) | KR100546703B1 (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100640089B1 (en) * | 2001-02-07 | 2006-10-31 | 삼성전자주식회사 | Reflective-type liquid crystal display device and method for manufacturing the same |
| KR100803173B1 (en) * | 2002-02-06 | 2008-02-14 | 삼성전자주식회사 | Method of manufacturing liquid crystal display apparatus |
| US7683982B2 (en) | 2007-02-16 | 2010-03-23 | Samsung Electronics Co., Ltd. | Active reflective polarizer, liquid crystal display employing the same and method for the same |
| US7864269B2 (en) | 2007-02-16 | 2011-01-04 | Samsung Electronics Co., Ltd. | Liquid crystal display device switchable between reflective mode and transmissive mode by employing active reflective polarizer |
| US20080199667A1 (en) * | 2007-02-16 | 2008-08-21 | Samsung Electronics Co., Ltd. | Magnetic field controlled active reflector and magnetic display panel comprising the active reflector |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04243226A (en) * | 1991-01-18 | 1992-08-31 | Sharp Corp | Reflection type liquid crystal display device and production thereof |
| JPH07110476A (en) * | 1993-10-13 | 1995-04-25 | Matsushita Electric Ind Co Ltd | Liquid crystal display element and production of its relfection plate |
| JPH10170938A (en) * | 1996-12-11 | 1998-06-26 | Canon Inc | Liquid crystal element |
| KR19980084207A (en) * | 1997-05-22 | 1998-12-05 | 구자홍 | Reflective liquid crystal display device and manufacturing method of the reflecting plate |
-
1998
- 1998-12-11 KR KR1019980054555A patent/KR100546703B1/en not_active IP Right Cessation
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04243226A (en) * | 1991-01-18 | 1992-08-31 | Sharp Corp | Reflection type liquid crystal display device and production thereof |
| JPH07110476A (en) * | 1993-10-13 | 1995-04-25 | Matsushita Electric Ind Co Ltd | Liquid crystal display element and production of its relfection plate |
| JPH10170938A (en) * | 1996-12-11 | 1998-06-26 | Canon Inc | Liquid crystal element |
| KR19980084207A (en) * | 1997-05-22 | 1998-12-05 | 구자홍 | Reflective liquid crystal display device and manufacturing method of the reflecting plate |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20000039270A (en) | 2000-07-05 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US6380995B1 (en) | Transflective liquid crystal display device with asymmetry reflective electrode having a transparent portion facing a main viewing angle | |
| US6115098A (en) | LCD having an LC layer with spacers arranged so that LC molecules are in axial symmetry upon application of voltage | |
| KR100252800B1 (en) | Liquid crystal device and its manufacturing method | |
| KR100775685B1 (en) | Diffusing reflector and manufacture of the same and reflection type display apparatus | |
| EP0586220A1 (en) | Reflection type liquid crystal display device | |
| US5714247A (en) | Reflective surface for LCD and method for forming it | |
| KR20060099885A (en) | Flexible liquid crystal display and manufacturing method of the same | |
| JPH05232465A (en) | Reflection type liquid crystal display device and its production | |
| US6414735B1 (en) | Reflectance liquid crystal display having a limited interference effect | |
| JP3806666B2 (en) | Reflective structure of multi-domain liquid crystal display and manufacturing method thereof | |
| JP2000284272A (en) | Liquid crystal display device and its production | |
| KR100546703B1 (en) | Reflecting Substrate of Reflective Type Liquid Crystal Display Devices | |
| KR100421901B1 (en) | Reflecting substrate of reflective type liquid crystal display devices | |
| KR100290921B1 (en) | Method for producing reflecting plate of reflecting liquid crystal displays | |
| KR100290922B1 (en) | Reflective-type liquid crystal display device and method of manufacturing thereof | |
| US7315339B2 (en) | Method for manufacturing LCD | |
| KR100892948B1 (en) | Liquid crystal device for enhancing reflectance and method of manufacturing the same | |
| KR100311530B1 (en) | A reflector of reflective-type liquid crystal display device and method for manufacturing the same | |
| KR100521265B1 (en) | Wide viewing angle liquid crystal display device and manufacturing method thereof | |
| KR100565735B1 (en) | Reflective type liquid crystal display device and method of manufacturing thereof | |
| KR100959129B1 (en) | Multi domain VA mode Liquid Crystal Display and method for fabricating the same | |
| JP2000206515A (en) | Light controlling body, optical device, electric device and production of the same | |
| KR100693649B1 (en) | Reflector and liquid-crystal display | |
| JP2004347686A (en) | Bistable nematic liquid crystal display device | |
| JP2002148646A (en) | Liquid crystal display device and method for manufacturing the same |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| N231 | Notification of change of applicant | ||
| A201 | Request for examination | ||
| E902 | Notification of reason for refusal | ||
| E701 | Decision to grant or registration of patent right | ||
| GRNT | Written decision to grant | ||
| LAPS | Lapse due to unpaid annual fee |