KR100542764B1 - Organic Electro Luminescence Device And Fabricating Method Thereof - Google Patents

Abstract

The present invention relates to an organic electroluminescent device capable of improving luminance and contrast ratio and a method of manufacturing the same.

The present invention provides an organic electroluminescent device in which an organic light emitting cell including a light emitting layer and an anode electrode and a cathode electrode positioned with the light emitting layer interposed therebetween is arranged in a matrix. The organic light emitting cell region is partially exposed by partially exposing the anode electrode. In addition, it is characterized in that it comprises an insulating film containing a black pigment and an organic material absorbing external light.

Description

Organic electroluminescent device and manufacturing method therefor {Organic Electro Luminescence Device And Fabricating Method Thereof}

1 is a cross-sectional view showing a part of a conventional passive organic electroluminescent device.

2 is a cross-sectional view showing a part of a conventional active organic electroluminescent device.

3A and 3B are cross-sectional views showing passive and active organic electroluminescent devices having a polarizing plate formed thereon.

4 is a plan view showing an organic electroluminescent device according to the present invention.

5 is a cross-sectional view showing an organic electroluminescent device according to a first embodiment of the present invention.

6A and 6F illustrate a method of manufacturing the organic electroluminescent device shown in FIG. 5.

7 is a cross-sectional view showing an organic electroluminescent device according to a second embodiment of the present invention.

8A to 8E are plan views illustrating a method of manufacturing the organic light emitting display device illustrated in FIG. 7.

9 is a cross-sectional view showing an organic electroluminescent device according to a third embodiment of the present invention.

10 is a cross-sectional view showing an organic electroluminescent device according to a fourth embodiment of the present invention.

11 is a graph showing the light transmittance according to the insulating material.

<Explanation of symbols for the main parts of the drawings>

2,102 substrate 4,104 anode electrode

6,106 insulating film 8,108 partition wall

10,110: organic light emitting layer 12,112: cathode electrode

115: black layer

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      The present invention relates to an electroluminescent device, and more particularly, to an organic electroluminescent device capable of improving brightness and contrast, and a manufacturing method thereof.

Recently, various flat panel displays have been developed to reduce weight and volume, which are disadvantages of cathode ray tubes. Such flat panel displays include liquid crystal displays, field emission displays, plasma display panels, and electroluminescent devices (hereinafter referred to as "ELDs"). There is this. In particular, ELD is basically formed by attaching electrodes to both sides of an organic light emitting layer composed of a hole transporting layer, a light emitting layer, and an electron transporting layer, and is attracting attention as a next-generation flat panel display because of its wide viewing angle, high opening ratio, and high color.

Such ELDs are largely divided into inorganic ELDs and organic ELDs depending on the materials used. Among them, the organic ELD has the advantage of being able to be driven at a lower voltage than the inorganic ELD because when the charge is injected into the organic EL layer formed between the hole injection electrode and the electron injection electrode, electrons and holes are paired up and extinguished to emit light. . In addition, organic ELDs can form devices on flexible flexible substrates, such as plastics, and can be driven at lower voltages of 10V or less than PDPs or inorganic ELDs, and have a relatively low power consumption. This is excellent. The ELD is divided into a passive ELD shown in FIG. 1 and an active ELD shown in FIG. 2 according to a driving scheme.

The passive organic ELD shown in FIG. 1 is formed on the substrate 2 in the direction in which the anode electrode 4 and the cathode electrode 12 cross each other.

A plurality of anode electrodes 4 are spaced apart at predetermined intervals on the substrate 2. On the substrate 2 on which the anode electrode 4 is formed, an insulating film 6 having an opening for each EL cell EL region is formed. On the insulating film 6, a partition 8 for separating the organic light emitting layer 10 and the cathode electrode 12 to be formed thereon is positioned. The partition wall 8 is formed in a direction crossing the anode electrode 4 and has an overhag structure in which the upper end portion has a wider width than the lower end portion. On the insulating film 6 on which the partition 8 is formed, the organic light emitting layer 10 and the cathode electrode 12 made of an organic compound are sequentially deposited on the entire surface. The organic electroluminescent layer 10 is formed by laminating a hole transporting layer, a light emitting layer, and an electron transporting layer on the insulating film 6. The passive ELD emits electrons and holes when a driving signal is applied to the anode electrode 4 and the cathode electrode 12, and the electrons and holes emitted from the anode electrode 4 and the cathode electrode 12 are organic light emitting layers 10. Recombination within) produces visible light. At this time, the generated visible light comes out through the anode electrode 4 to display a predetermined image or image.

The active ELD shown in FIG. 2 is formed to overlap the anode electrode 72 with the thin film transistor formed on the substrate 51, the anode electrode 72 in contact with the thin film transistor, and the organic light emitting layer 74 interposed therebetween. The thin film transistor includes an active layer 64 formed on the buffer film 52, a gate electrode 56 formed on the gate insulating film 62, and a gate electrode 56. Source and drain electrodes 58 and 60 are formed on both sides with a gap therebetween.

The active layer 64 is formed of polysilicon on the substrate 51 with the buffer film 52 interposed therebetween. The gate electrode 56 is formed to overlap the active layer 64 with the gate insulating layer 62 interposed therebetween. The source electrode 58 and the drain electrode 60 are formed to be insulated from the gate electrode 56 with an interlayer insulating layer 66 therebetween, and a source contact hole formed through the interlayer insulating layer 66 and the gate insulating layer 62. The active layer 64 is contacted through the 54S and the drain contact hole 54D.

The anode electrode 72 is formed of a transparent conductive material on the protective film 68. The anode electrode 72 is in contact with the drain electrode 60 of the thin film transistor through the pixel contact hole 70.

The organic light emitting layer 74 is composed of a hole injection layer, a light emitting layer, and an electron injection layer (not shown). When the driving voltage is applied to the anode electrode 72 and the cathode electrode 76, the holes in the hole injection layer and the electrons in the electron injection layer move toward the light emitting layer, respectively, to excite the fluorescent material in the light emitting layer.

The cathode electrode 76 is formed of a metal electrode material on the organic light emitting layer 74 and the insulating film 88 so that a driving voltage for emitting the organic light emitting layer 74 is applied. The active ELD emits electrons and holes when a driving signal is applied to the anode electrode 72 through a thin film transistor and a driving signal is applied to the cathode electrode 76, and is emitted from the anode electrode 72 and the cathode electrode 76. The electrons and holes are recombined in the organic light emitting layer 74 to generate visible light. At this time, the generated visible light is emitted to the outside through the anode electrode 72 to display a predetermined image or image.

Hereinafter, the manufacturing method of the conventional organic ELD will be described. First, an anode electrode 4 is formed by depositing a metal transparent conductive material on a substrate 2 formed using soda lime or hardened glass, and then patterning the same by a photolithography process and an etching process. Here, indium tin oxide or SnO 2 may be used as the metal material. At this time, in the case of the active organic ELD, a thin film transistor (not shown) connected to the anode electrode 4 is formed on the substrate 2.

An insulating film 6 is formed on the substrate 2 on which the anode electrode 4 is formed by coating a photosensitive insulating material by spin-coating and then patterning the photolithography to expose the light emitting region. .

After the photosensitive organic material is deposited on the insulating film 6, the partition 8 is formed by a photolithography process. The partition wall 8 is formed in the non-light emitting area so as to intersect the plurality of anode electrodes 4 to distinguish the pixels.

An organic light emitting material is deposited on the substrate 2 on which the partition 8 is formed to form the organic light emitting layer 10. The organic light emitting layer 10 is formed in a region divided by the partition wall 8.

The cathode 12 is formed by depositing a metal material on the substrate 2 on which the organic light emitting layer 10 is formed.

As described above, the insulating films 6 and 88 of the conventional passive and active organic ELD are formed of an organic material, for example, polyimide, in a region excluding the light emitting region. Since the insulating film is formed in an area of 40 to 60% of the entire display area including the light emitting area and the non-light emitting area, it is most exposed to external light. That is, since external light is incident through the substrate, reflected through the cathode electrode and the partition wall, and then comes out again through the substrate, there is a problem that the contrast ratio is lowered.

In order to solve this problem, as illustrated in FIGS. 3A and 3B, the polarizers 7 and 77 are formed on the rear surface of the substrate. The polarizers 7 and 77 prevent diffuse reflection of external light and absorb external light. However, by absorbing some of the visible light emitted from the organic light emitting layer, the polarizing plates 7 and 77 consume about 50% of the visible light, thereby deteriorating luminance and contrast ratio. .

Accordingly, an object of the present invention relates to an organic light emitting device capable of improving brightness and contrast and a method of manufacturing the same.

In order to achieve the above object, the present invention is an organic electroluminescent device in which a light emitting layer and an organic light emitting cell consisting of an anode electrode and a cathode electrode positioned with the light emitting layer interposed therebetween are arranged in a matrix form, the anode electrode partially The organic light emitting cell region may be exposed to define an organic light emitting cell region, and an insulating layer including a black pigment and an organic material absorbing external light may be provided.
The organic material is characterized in that it comprises at least one of polyimide, nobulac resin and acrylic resin.
A thin film transistor in contact with the anode electrode is further provided on the substrate.
The present invention provides an organic electroluminescent device in which an organic light emitting cell including a light emitting layer and an anode electrode and a cathode electrode positioned with the light emitting layer interposed therebetween is arranged in a matrix. The organic light emitting cell region is partially exposed by partially exposing the anode electrode. An insulating film which defines and insulates the anode electrode and the cathode electrode; And a black layer formed to overlap the insulating film and including a black pigment absorbing external light.
The insulating film is characterized in that it comprises at least one of polyimide, no bullock resin and acrylic resin.
A thin film transistor in contact with the anode electrode is further provided on the substrate.
A method of manufacturing an organic electroluminescent device according to the present invention includes the steps of forming an anode electrode on a substrate; Partially exposing the anode electrode to define an organic light emitting cell region and to form an insulating film including a black pigment and an organic material absorbing external light; Forming a light emitting layer in the organic light emitting cell region; And forming a cathode electrode constituting the organic light emitting cell together with the anode electrode and the light emitting layer.
The organic material is characterized in that it comprises at least one of polyimide, nobulac resin and acrylic resin.
And forming a thin film transistor in contact with the anode on the substrate.
A method of manufacturing an organic electroluminescent device according to the present invention includes the steps of forming an anode electrode on a substrate; Partially exposing the anode electrode to form an insulating film defining an organic light emitting cell region; Forming a black layer overlapping the insulating layer and including a black pigment absorbing external light; Forming a light emitting layer in the organic light emitting cell region; And forming a cathode electrode constituting the organic light emitting cell together with the anode electrode and the light emitting layer.
The organic material is characterized in that it comprises at least one of polyimide, nobulac resin and acrylic resin.
And forming a thin film transistor in contact with the anode electrode on the substrate.
Other objects and features of the present invention in addition to the above object will be apparent from the description of the embodiments with reference to the accompanying drawings.

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Hereinafter, exemplary embodiments of the present invention will be described with reference to FIGS. 4 to 11.

4 is a plan view illustrating a passive ELD according to a first embodiment of the present invention, and FIG. 5 is a cross-sectional view illustrating the passive ELD illustrated in FIG. 4.

The organic ELD shown in FIGS. 4 and 5 is formed on the substrate 102 in a direction in which the anode electrode 104 and the cathode electrode 112 cross each other. A plurality of anode electrodes 104 are spaced apart at predetermined intervals on the substrate 102. On the substrate 102 on which the anode electrode 104 is formed, an insulating film 106 having an opening for each EL cell EL region is formed. At least one of polyimide, novolak resin, or acrylic resin is used for the insulating film 106.

The partition 108 is disposed on the insulating layer 106 to separate the organic light emitting layer 110 and the cathode electrode 112 to be formed thereon. The partition 108 is formed in a direction crossing the anode electrode 104 and has an overhag structure in which the upper end portion has a wider width than the lower end portion. On the insulating layer 106 on which the partition 8 is formed, the organic light emitting layer 110 and the cathode electrode 112 made of an organic compound are sequentially deposited on the entire surface. The organic light emitting layer 110 is formed by stacking a hole transporting layer, a light emitting layer, and an electron transporting layer on the insulating film 106. Meanwhile, the passive ELD according to the first embodiment of the present invention includes a black layer 115 formed on the insulating film 106 so as to overlap the insulating film 106. Here, since the black layer 115 is formed to include the black pigment and absorbs the external light incident through the insulating film 106 most exposed to the external light, it is possible to prevent the contrast ratio from being lowered by the external light. In addition, since the polarizing plate is removed, all visible light emitted from the organic light emitting layer is emitted to the outside through the substrate, thereby increasing luminance.

 Meanwhile, in the passive ELD according to the first exemplary embodiment of the present invention, the insulating layer 106 may be formed on the black layer 115 to overlap.

The ELD emits electrons and holes when a driving signal is applied to the anode electrode 104 and the cathode electrode 112, and the electrons and holes emitted from the anode electrode 104 and the cathode electrode 112 are organic light emitting layers 110. Recombination in the interior will generate visible light. At this time, the generated visible light comes out through the anode electrode 104 to display a predetermined image or image. 6A to 6E are a plan view and a cross-sectional view showing a method for producing an organic ELD.

First, a transparent conductive material is deposited on a substrate 102 formed using soda lime or hardened glass, and then patterned by a photolithography process and an etching process, thereby showing the anode electrode 104 as shown in FIG. 6A. Is formed. In this case, indium tin oxide or SnO 2 may be used as the transparent conductive material. The organic insulating material is coated on the substrate 102 on which the anode electrode 104 is formed by spin-coating, and then panned by a photolithography process, thereby forming the insulating film 106 as shown in FIG. 6B. Is formed. The insulating film 106 is formed to cover both ends of the anode electrode 104 in order to prevent moisture absorption into the organic light emitting layer to be formed later or to prevent breakdown of the organic light emitting layer by the anode electrode 104. Herein, at least one of polyimide, novolak resin, and acrylic resin may be used as the organic insulating material.

After the black pigment material is deposited on the insulating layer 106 and patterned by a photolithography process, a black layer 115 is formed as shown in FIG. 6C.

After the photosensitive organic material is deposited on the substrate 102 on which the black layer 115 is formed, the partition wall 108 is formed as shown in FIG. 6D by patterning by a photolithography process. The partition 108 is formed in the non-light emitting area in a direction crossing the plurality of anode electrodes 104 to distinguish the pixels.

As the organic material is deposited on the substrate 102 on which the partition 108 is formed, the organic light emitting layer 110 is formed as shown in FIG. 6E. The organic light emitting layer 110 is formed at a desired position in a region divided by the partition wall 108. The organic light emitting layer 110 is formed by stacking a hole transporting layer, a light emitting layer, and an electron transporting layer.

As the metal material is deposited on the substrate 102 on which the organic light emitting layer 110 is formed, the cathode electrode 112 is formed as shown in FIG. 7F. Here, the metal material is aluminum (Al), LiF and the like.

7 is a cross-sectional view showing a passive ELD according to a second embodiment of the present invention.

The ELD shown in FIG. 7 has the same components except that the insulating film 206 including the black pigment is formed in place of the black layer 115 in contrast to the EL elements shown in FIGS. 4 and 5. The same components as those in 4 and 5 will be denoted by the same reference numerals and detailed description thereof will be omitted.

In the ELD shown in FIG. 7, an insulating film 206 having an opening for each EL cell EL region is formed on the substrate 102 on which the anode electrode 104 is formed. The partition 108 is disposed on the insulating layer 206 to separate the organic light emitting layer 110 and the cathode electrode 112. Here, the insulating film 206 is an organic insulating material containing a black pigment is used.

The insulating layer 206 prevents moisture absorption into the organic light emitting layer 110 or prevents breakdown of the organic light emitting layer 110 by the anode electrode 104, and absorbs external light incident through the substrate 102. Thereby, the fall of contrast ratio of ELD by external light can be prevented. In addition, since the polarizing plate is removed, all visible light emitted from the organic light emitting layer is emitted to the outside through the substrate, thereby increasing luminance.

8A to 8E are plan views illustrating a method of manufacturing the ELD shown in FIG. 7.

First, a transparent conductive material is deposited on a substrate 102 formed by using soda lime or hardened glass, and then patterned by a photolithography process and an etching process to form an anode electrode 104 as shown in FIG. 8A. Is formed. In this case, indium tin oxide or SnO 2 may be used as the transparent conductive material. The organic insulating material including the black pigment is coated on the substrate 102 on which the anode electrode 104 is formed by spin-coating and then patterned by a photolithography process, as shown in FIG. 8B. An insulating film 106 is formed. Herein, at least one of polyimide, novolak resin, and acryl resin may be used as the organic insulating material.

After the photosensitive organic material is deposited on the insulating layer 106 and patterned by a photolithography process, the partition 108 is formed as shown in FIG. 8C. The partition wall 108 is formed in the non-light emitting area in a direction crossing the plurality of anode electrodes 104 to distinguish the pixels.

As the organic material is deposited on the substrate 102 on which the partition 108 is formed, the organic light emitting layer 110 is formed as shown in FIG. 8D. The organic light emitting layer 110 is formed at a desired position in a region divided by the partition wall 108.

As the metal material is deposited on the substrate 102 on which the organic light emitting layer 110 is formed, the cathode electrode 112 is formed as shown in FIG. 8E. Here, the metal material is aluminum (Al), LiF and the like.

9 is a cross-sectional view showing an active ELD according to a third embodiment of the present invention.

The active ELD illustrated in FIG. 9 overlaps the anode electrode 172 with a thin film transistor formed on the substrate 151, an anode electrode 172 contacting the thin film transistor, and an organic light emitting layer 174 therebetween. The cathode electrode 126 is provided. The thin film transistors may include an active layer 164 formed on the buffer layer 152, a gate electrode 156 formed on the gate insulating layer 162, a source formed on both sides of the gate electrode 156, and the gate electrode 156 disposed therebetween. Drain electrodes 158 and 160 are provided.

The active layer 164 is formed of polysilicon on the substrate 151 with the buffer layer 152 therebetween. The gate electrode 156 is formed to overlap the active layer 164 with the gate insulating layer 162 interposed therebetween. The source electrode 158 and the drain electrode 160 are formed to be insulated from the gate electrode 156 with the interlayer insulating layer 166 therebetween, and the source contact hole formed through the interlayer insulating layer 166 and the gate insulating layer 162. In contact with the active layer 164 through the 154S and the drain contact hole 154D. The anode 172 is formed of a transparent conductive material on the passivation layer 168. The anode electrode 172 is in contact with the drain electrode 160 of the thin film transistor through the pixel contact hole 170.

The organic light emitting layer 174 includes a hole injection layer, a light emitting layer, and an electron injection layer (not shown). In the organic light emitting layer 174, when a driving voltage is applied to the anode electrode 172 and the cathode electrode 176, holes in the hole injection layer and electrons in the electron injection layer proceed toward the light emitting layer, respectively, to excite the fluorescent material in the light emitting layer.

The cathode electrode 176 is formed of a metal electrode material on the organic light emitting layer 174 and the insulating film 188 so that a driving voltage for emitting the organic light emitting layer 174 is applied.

The black layer 255 is formed on the insulating film 188 to block light. The black layer 255 absorbs light incident through the insulating film 188 including the black pigment. Thereby, the fall of contrast ratio of ELD by external light can be prevented. In addition, since the polarizing plate is removed in comparison with the related art, all visible light emitted from the organic light emitting layer 174 is emitted to the outside through the substrate 151, thereby increasing luminance.

Meanwhile, in the active ELD according to the third exemplary embodiment of the present invention, the insulating layer 188 may be formed on the black layer 225.

 At least one of polyimide, novolak resin, and acrylic resin may be used as the insulating film 188.

In the ELD, a driving signal is applied to the anode electrode 172 through a thin film transistor, and when a driving signal is applied to the cathode electrode 176, electrons and holes are emitted and emitted from the anode electrode 172 and the cathode electrode 176. The electrons and holes are recombined in the organic light emitting layer 174 to generate visible light. At this time, the generated visible light comes out through the anode electrode 172 to display a predetermined image or image. FIG. 10 is a cross-sectional view illustrating an active ELD according to a fourth embodiment of the present invention.

The ELD shown in FIG. 10 has the same components except that the insulating film 288 including the black pigment is formed instead of the black layer 255 as compared to the EL element shown in FIG. Like reference numerals refer to like elements and detailed descriptions thereof will be omitted. The ELD shown in FIG. 10 is formed on the protective film 168 with an insulating film 288 overlapping the thin film transistor. An organic light emitting layer 174 and a cathode electrode 176 formed of a metal electrode material are formed on the insulating layer 288.

As the insulating film 288, a photosensitive insulating material including black pigment is used. Here, at least one of polyimide, novolak resin, and acryl resin may be used as the photosensitive insulating material.

The insulating layer 288 prevents moisture absorption into the organic light emitting layer 174 or prevents breakdown of the organic light emitting layer by the anode, and absorbs external light incident through the substrate. Thereby, the fall of contrast ratio of ELD by external light can be prevented. In addition, since the polarizing plate is removed in comparison with the related art, all visible light emitted from the organic light emitting layer 174 is emitted to the outside through the substrate 151, thereby increasing luminance.

11 is a graph showing light transmittance according to an insulating material. Here, the horizontal axis represents wavelength and the vertical axis represents light transmittance.

 A curve represents the light transmittance of the black layer of the black pigment of the present invention, B curve is an insulating layer and a black layer containing the black pigment and the insulating layer containing the black pigment according to the first to fourth embodiments of the present invention The light transmittance of the double layer of is shown. The C and D curves show the light transmittances of the insulating films made of conventional novolac and polyimide, respectively.

Conventionally, an insulating layer made of polyimide, novolac, and the like almost absorbs light having a wavelength of 330 nm or less, such as curves D and C, but transmits light having a wavelength of 330 nm or more to about 90%. On the other hand, an ELD having a black layer made of black pigment (A) has a low light transmittance of about 12% in the wavelength range of 180 to 680 nm, including a case where a polyimide and a black pigment are mixed and an insulating film and a black pigment. In the case of the double layer of the black layer, it can be seen that it absorbs the light of the radio wave band as shown by the curve B.

As described above, in the ELD according to the first to fourth embodiments of the present invention, a polarizing plate is removed and a black pigment is mixed with an organic insulating material to form an insulating film or a black layer on the insulating film. As a result, the external light incident through the substrate is absorbed by the insulating film or the black layer containing the black pigment, thereby improving the contrast ratio. In addition, since all visible light generated in the organic light emitting layer is emitted to the outside through the substrate, the luminance is increased.

As described above, the organic electroluminescent device and the method of manufacturing the same according to the present invention provide contrast by absorbing external light incident through the substrate by forming an insulating film by mixing black pigment in the photosensitive insulating material or forming a black layer on the insulating film It can improve rain. In addition, about 50% of the visible light lost by the polarizer absorbing the external light is emitted to the outside through the substrate to implement an image to improve the brightness.

Those skilled in the art will appreciate that various changes and modifications can be made without departing from the technical spirit of the present invention. Therefore, the technical scope of the present invention should not be limited to the contents described in the detailed description of the specification but should be defined by the claims.

Claims (12)

In an organic electroluminescent device in which an organic light emitting cell comprising a light emitting layer and an anode electrode and a cathode electrode positioned with the light emitting layer interposed therebetween is arranged in a matrix form, And an insulating film including a black pigment and an organic material absorbing external light while defining an organic light emitting cell region by partially exposing the anode electrode. The method of claim 1, The organic material is an organic electroluminescent device, characterized in that it comprises at least one of polyimide, novolac resin and acrylic resin. The method of claim 1, And a thin film transistor in contact with the anode electrode on the substrate. In an organic electroluminescent device in which an organic light emitting cell comprising a light emitting layer and an anode electrode and a cathode electrode positioned with the light emitting layer interposed therebetween is arranged in a matrix form, An insulating layer which partially exposes the anode electrode to define an organic light emitting cell region and insulates the anode electrode and the cathode electrode; An organic electroluminescent device, characterized in that it comprises a black layer formed to overlap with the insulating film and comprising a black pigment absorbing external light. The method of claim 4, wherein The insulating film is an organic electroluminescent device, characterized in that it comprises at least one of polyimide, no bullock resin and acrylic resin. The method of claim 4, wherein And a thin film transistor in contact with the anode electrode on the substrate. Forming an anode electrode on the substrate; Partially exposing the anode electrode to define an organic light emitting cell region and to form an insulating film including a black pigment and an organic material absorbing external light; Forming a light emitting layer in the organic light emitting cell region; Forming a cathode electrode constituting the organic light emitting cell together with the anode electrode and the light emitting layer. The method of claim 7, wherein The organic material is a method of manufacturing an organic electroluminescent device, characterized in that it comprises at least one of polyimide, novolac resin and acrylic resin. The method of claim 7, wherein And forming a thin film transistor in contact with the anode on the substrate. Forming an anode electrode on the substrate; Partially exposing the anode electrode to form an insulating film defining an organic light emitting cell region; Forming a black layer overlapping the insulating layer and including a black pigment absorbing external light; Forming a light emitting layer in the organic light emitting cell region; Forming a cathode electrode constituting the organic light emitting cell together with the anode electrode and the light emitting layer. The method of claim 10, The organic material is a method of manufacturing an organic electroluminescent device, characterized in that it comprises at least one of polyimide, novolac resin and acrylic resin. The method of claim 10, And forming a thin film transistor in contact with the anode on the substrate.

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