KR100516682B1 - A method of partially transmitted light plating for polycarbonate constituted resin using the laser engraving - Google Patents

A method of partially transmitted light plating for polycarbonate constituted resin using the laser engraving Download PDF

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KR100516682B1
KR100516682B1 KR1020040044656A KR20040044656A KR100516682B1 KR 100516682 B1 KR100516682 B1 KR 100516682B1 KR 1020040044656 A KR1020040044656 A KR 1020040044656A KR 20040044656 A KR20040044656 A KR 20040044656A KR 100516682 B1 KR100516682 B1 KR 100516682B1
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plated
plating layer
copper
plating
polycarbonate
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KR1020040044656A
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Korean (ko)
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김순택
조점제
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김진수
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Priority to CNA2004100908821A priority patent/CN1712562A/en
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/20Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • C23C18/1633Process of electroless plating
    • C23C18/1689After-treatment
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    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • C23C18/1633Process of electroless plating
    • C23C18/1689After-treatment
    • C23C18/1692Heat-treatment
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    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/20Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/2006Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30
    • C23C18/2013Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30 by mechanical pretreatment, e.g. grinding, sanding
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    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/20Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/22Roughening, e.g. by etching
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    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/20Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/28Sensitising or activating
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    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31Coating with metals
    • C23C18/32Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
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    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31Coating with metals
    • C23C18/42Coating with noble metals
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    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/02Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemically Coating (AREA)
  • Electroplating Methods And Accessories (AREA)

Abstract

본 발명은 레이저 식각을 이용한 폴리카보네이트 성분이 함유된 수지의 부분투광도금방법에 관한 것으로, 그 목적은 두터운 도금층의 표면처리에 의해 수려한 외관을 구비하고, 동/니켈도금층의 형성으로 전자파차폐효율을 증대시키며, 레이저 조사에 의해 소정패턴으로 식각된 부위가 빛 조사시 투광성을 구비할 수 있는 레이저 식각을 이용한 폴리카보네이트 성분이 함유된 수지의 부분투광도금방법을 제공하는데 있다.The present invention relates to a partial light-transmission plating method of a resin containing a polycarbonate component using laser etching, and its purpose is to have a beautiful appearance by surface treatment of a thick plating layer, and to form an electromagnetic shielding efficiency by forming a copper / nickel plating layer. The present invention provides a partial light-transmission plating method of a resin containing a polycarbonate component using laser etching, in which a portion etched in a predetermined pattern by laser irradiation can have light transmittance upon light irradiation.

본 발명은 폴리카보네이트 또는 폴리카보네이트가 함유된 피도금물을 수세 및 탈지하는 단계; 상기 수세 및 탈지된 피도금을 에칭하고 이를 중화처리한 후, 예비침적하여 극성을 부여하는 단계; 상기 극성이 부여된 피도금물의 표면을 활성처리하여 전처리하는 단계; 상기 전처리된 피도금물의 표면에 무전해 동도금층을 형성하는 단계; 상기 동도금층이 형성된 피도금물을 다시 무전해 니켈도금하여 동/니켈도금층을 형성하고 이를 건조하는 단계; 상기 피도금물의 동/니켈도금층에 레이저빔을 선택적으로 집속 발산하기 위하여 레이저 빔의 초점을 조절하고, 선택된 소정패턴의 형상 및 도막층의 두께에 따라 레이저 빔의 두께 및 세기를 조절하며, 이를 피도금물의 도금부위에 조사하여 도금층의 일부를 제거함으로써 소정패턴의 형상을 형성하는 단계; 상기 식각처리된 피도금물의 동/니켈 도금층에 전기도금을 하여 표면처리를 하는 단계를 통해, 수려한 도금층을 구비하고, 레이저 식각처리된 부분이 선명하게 부분투광될 수 있도록 되어 있다. The present invention comprises the steps of washing and degreasing polycarbonate or the plated material containing polycarbonate; Etching the washed and degreased plated and neutralizing it, followed by preliminary deposition to impart polarity; Pretreatment by activating the surface of the plated object to which polarity is applied; Forming an electroless copper plating layer on a surface of the pretreated plated object; Electroless nickel plating the plated object on which the copper plating layer is formed to form a copper / nickel plating layer and drying it; The focus of the laser beam is adjusted to selectively diverge the laser beam to the copper / nickel plated layer of the plated object, and the thickness and intensity of the laser beam are adjusted according to the shape of the selected predetermined pattern and the thickness of the coating layer. Irradiating a plating portion of the plated object to remove a portion of the plating layer to form a shape of a predetermined pattern; Through the electroplating of the copper / nickel plating layer of the etched to-be-plated material, the surface-treatment may be provided, and the laser-etched portion may be clearly partially transmitted through the plating layer.

Description

레이저 식각을 이용한 폴리카보네이트 성분이 함유된 수지의 부분투광도금방법 {A method of partially transmitted light plating for polycarbonate constituted resin using the laser engraving}A method of partially transmitted light plating for polycarbonate constituted resin using the laser engraving}

본 발명은 레이저 식각을 이용한 폴리카보네이트 성분이 함유된 수지의 부분투광도금방법에 관한 것으로, 엔지니어링 플라스틱 중 폴리카보네이트 또는 폴리카보네이트가 다량 함유된(70%이상) 복합수지 제품의 전자파 차폐 또는 외장처리를 위한 하지도금으로서 무전해 도금시, 폴리카보네이트의 제조시 첨가된 첨가제를 용출해 냄으로써 표면의 응력을 해소하여 균일한 촉매부여가 용이하게 하고, 표식의 부분투광이 가능하며, 도금부위를 3중으로 처리하여 수려한 외관을 구비하는 레이저 식각을 이용한 폴리카보네이트 성분이 함유된 수지의 부분투광도금방법에 관한 것이다. The present invention relates to a partial light-transmission plating method of a resin containing a polycarbonate component using laser etching, and to shield electromagnetic waves or exterior treatment of a composite resin product containing a large amount of polycarbonate or polycarbonate (70% or more) in engineering plastics. For electroless plating as a base plating, the eluting additives added during the production of polycarbonates can be used to relieve stress on the surface to facilitate uniform catalyst application, to allow partial light transmission of the marking, and to process the plating part in threefold. The present invention relates to a partial translucent plating method of a resin containing a polycarbonate component using laser etching having a beautiful appearance.

일반적으로 산업이 고도로 발달함에 따라 등장한 각종 전자기기들은 생활에 편리함을 주고 있으나, 이에 못지 않게 심각한 피해를 주고 있다.In general, as the industry is highly developed, the various electronic devices that have appeared to give convenience to life, but no less serious damage.

그중에서도 최근에 심각하게 대두되고 있는 것이 전자파로 인한 각종 장해에 대한 것으로, 전자파는 각종 전기, 전자기기들에서 생기는 에너지파의 일종으로 각종 정밀기에 간섭을 일으켜 산업재해를 일으키며, 각종 직업병의 원인이 되기도 한다.Among them, the most serious problem is recently caused by various kinds of obstacles caused by electromagnetic waves. Electromagnetic waves are a kind of energy waves generated by various electric and electronic devices, which cause industrial accidents by interfering with various precision instruments and cause various occupational diseases. do.

문명이 발달할수록 산업기기들이 점차 컴퓨터화 되어 가고 있는 이때에 전자파 장해에 의한 기기의 오동작은 치명적인 재해를 초래하게 되는 것이다.As civilization develops, industrial devices are gradually becoming computerized, and malfunctions of devices caused by electromagnetic interference cause fatal disasters.

따라서, 선진 각국에서는 각종 유해 전자파를 규제하는 관계 법규를 만들어 자국에서 생산하는 제품 및 외국에서 수입하는 제품에 이르기까지 그 적용을 확대시키고 있으며, 이 기준에 적합치 않은 제품에 대해서는 생산 및 수입을 금지시키고 있는 실정이다.Therefore, developed countries have established related laws regulating various kinds of harmful electromagnetic waves, and are expanding their application to products produced in their home country and products imported from foreign countries. Prohibit production and import of products that do not meet this standard. There is a situation.

최근, 각종 전기, 전자기기의 경량화와 소형화로 인하여 이 분야에 플라스틱이 널리 이용되고 있으나, 플라스틱은 전기가 통하지 않는 부도체이므로 전자파를 차폐하기 위하여는 표면처리 즉, 특허 공개 번호 제91-18476호 및 특허출원 제94-4008호와 같은 도금, 도전도장, 금속융사 등의 방법을 행하고 있으나 그 중에서도 정밀도, 차폐능력, 수지의 물성변화가 적은 도금(무전해 도금)에 의한 방법이 가장 효과적이며 안정적이다.Recently, plastics have been widely used in this field due to light weight and miniaturization of various electric and electronic devices. However, since plastic is a non-conductive non-conductive material, in order to shield electromagnetic waves, surface treatment, that is, Patent Publication No. 91-18476 and Plating, conductive coating, and metal fusing are performed as in Patent Application No. 94-4008, but the most effective and stable method is plating (electroless plating) with little change in precision, shielding ability, and resin properties. .

기존의 무전해 도금방법은 ABS 수지의 세가지 성분중 B(부타디엔)성분이 에칭(ABS 수지표면에 있는 0.1-2㎛의 부타디엔 성분이 산에 녹아 미세한 홀을 형성함)하기 쉬운점을 이용하여 주로 ABS 수지나 ABS 수지 성분이 50% 정도 이상 함유된 복합재료에 한하여 사용되고 있다.The existing electroless plating method mainly uses the point that the B (butadiene) component among the three components of the ABS resin is easily etched (0.1-2 μm butadiene component on the ABS resin surface is dissolved in acid to form fine holes). It is used only for composite materials containing about 50% or more of ABS resin and ABS resin.

그러나, ABS 수지는 자연상태에 방치 하였을 때 그 물성이 급격히 떨어지는 약점 즉 내후성이 약하다는 문제점이 있으므로, 더 양호한 물성을 가진 수지의 개발이 요구 되게 되었으며, 뛰어난 내충격성과 내후성을 가지고 있는 폴리카보네이트(PC)가 어느 정도 이러한 조건들을 만족시켜주는 재료로서 최근 그 사용량이 증가하고 있으나,ABS 수지와는 달리 단일 성분계로 구성되고 있어 에칭이 어렵고, 극성도 띄고 있지 않으므로 ABS 수지의 도금공정으로는 전혀 도금을 할수 없음으로 그 탁월한 물성에 비해 도금용으로는 거의 사용하지 않거나, 50% 이상의 ABS 수지를 혼합하여야하는 문제점이 있었다.However, ABS resin has a weakness in its physical properties when it is left in its natural state, that is, its weather resistance is weak. Therefore, development of a resin having better physical properties is required, and polycarbonate (PC) having excellent impact resistance and weather resistance is required. ) Is a material that satisfies these conditions to some extent, but its usage has recently increased, but unlike ABS resin, since it is composed of a single component system, it is difficult to etch and has no polarity. It is not possible to use almost no plating, or more than 50% ABS resin compared to its excellent physical properties had a problem.

이러한 문제들로 인하여 폴리카보네이트는 그 뛰어난 물성에도 불구하고 도금용으로는 사용이 극히 저조하였다.Due to these problems, polycarbonate was extremely poorly used for plating despite its excellent physical properties.

폴리카보네이트 수지는 단일 성분으로서 ABS와 같이 전체 중 일부 성분만을 제거하여 제품 표면에 미세한 요철을 형성시키는 방법을 사용할 수 없음으로 표면을 부풀린 후 그 부풀린 표면을 제거하여 에칭하여야 하며, 또한 극성을 띄고 있지 않아 표면 촉매화가 어렵고, 촉매핵과의 밀착이 약하여 표면극성부여의 과정이 필요하게 된다.Polycarbonate resin is a single component, and it is impossible to use a method of removing only some components of the whole product such as ABS to form fine irregularities on the surface of the product. As a result, surface catalysis is difficult, and adhesion to the catalyst nuclei is weak, requiring a process of surface polarization.

또한, 수지 제조시 각종 첨가제 및 성형조건 등의 영향으로 에칭을 하여도 표면요철이 불균일하거나, 극성부여를 하여도 극성부여를 억제하는 첨가제들의 영향에 의해 촉매핵의 결합력이 저하하는 등의 현상의 종종 나타나므로 이들의 영향을 제거하기 위한 공정이 필요하게 된다.In addition, the surface unevenness may be uneven even when etching due to various additives and molding conditions, or the binding force of the catalyst nucleus may be reduced by the influence of additives that suppress polarization even when polarizing. Often appearing, a process is needed to remove their effects.

종래의 경우 유기용제를 사용하여 에칭하는 방법이 있으나 화재위험 등의 취급상의 곤란한 문제점과, 상기에 언급되어진 것과 같이 수지 제조시의 각종 첨가제 및 성형조건에 의한 영향을 배재하고 밀착력이 있는 에칭효과를 거두려면 에칭의 강도가 강하여야 하며 이러한 경우, 폴리카보네이트의 표층박리 및 크랙발생 등을 초래한다. 또한 성형조건에 의해 발생된 불균형한 표면은 이러한 과다한 에칭 후 더욱 더 다른 부분과 구분되는 불균일한 표면상태를 형성하여 표면균일성의 저하와 외관의 불량을 초래한다. 뿐만 아니라 첨가제의 함량이 높고 성형조건이 나쁠 경우, 상기와 같은 과다에칭으로도 전혀 원하는 밀착을 얻을 수 없는 경우가 많다는 문제점이 있다.In the conventional method, there is a method of etching using an organic solvent, but it is difficult to handle such as fire hazards, and as mentioned above, the effect of various additives and molding conditions in the manufacturing of resins is excluded, and the adhesion effect with adhesion is achieved. In order to reap, the strength of the etching must be strong, in this case, surface peeling and cracking of polycarbonate are caused. In addition, the unbalanced surface generated by the molding conditions forms a non-uniform surface state distinguished from other parts even after such an excessive etching, resulting in a decrease in surface uniformity and poor appearance. In addition, when the content of the additive is high and the molding conditions are bad, there is a problem in that the desired adhesion can not be obtained at all by the over-etching as described above.

또한, 종래에는 도금처리된 수지제품에 소정패턴을 형성하기 위해서는 스크린 인쇄, 포토에칭 등의 식각공정을 행하였으나, 상기 같은 방식은 정면공정, 라미네이팅공정, 노광공정, 현상공정, 부식공정, 박리공정 등 다수개의 공정을 행하여야 하므로 매우 복잡하며, 또한, 다양하고, 소형의 정밀한 표식/식각을 행할 수 없는 등 여러가지 문제점이 있었다. In addition, conventionally, in order to form a predetermined pattern on the plated resin product, an etching process such as screen printing or photo etching is performed, but the same method is used for the front process, laminating process, exposure process, developing process, corrosion process, and peeling process. There are various problems, such as being complicated, and unable to carry out various, small and precise marking / etching.

본 발명은 상기와 같은 문제점을 고려하여 이루어진 것으로, 그 목적은 두터운 도금층의 표면처리에 의해 수려한 외관을 구비하고, 동/니켈도금층의 형성으로 전자파차폐효율을 증대시키며, 레이저 조사에 의해 소정패턴으로 식각된 부위가 빛 조사시 투광성을 구비할 수 있는 레이저 식각을 이용한 폴리카보네이트 성분이 함유된 수지의 부분투광도금방법을 제공하는데 있다. The present invention has been made in consideration of the above problems, and its object is to have a beautiful appearance by the surface treatment of a thick plating layer, and to increase the electromagnetic shielding efficiency by forming a copper / nickel plating layer, and to a predetermined pattern by laser irradiation. The present invention provides a partial light-transmission plating method of a resin containing a polycarbonate component using laser etching, in which an etched portion may have light transmittance when irradiated with light.

본 발명은 폴리카보네이트 또는 폴리카보네이트가 함유된 피도금물을 수세 및 탈지하는 단계; 상기 수세 및 탈지된 피도금을 에칭하고 이를 중화처리한 후, 예비침적하여 극성을 부여하는 단계; 상기 극성이 부여된 피도금물의 표면을 활성처리하여 전처리하는 단계; 상기 전처리된 피도금물의 표면에 무전해 동도금층을 형성하는 단계; 상기 동도금층이 형성된 피도금물을 다시 무전해 니켈도금하여 동/니켈도금층을 형성하고 이를 건조하는 단계; 상기 피도금물의 동/니켈도금층에 레이저빔을 선택적으로 집속 발산하기 위하여 레이저 빔의 초점을 조절하고, 선택된 소정패턴의 형상 및 도막층의 두께에 따라 레이저 빔의 두께 및 세기를 조절하며, 이를 피도금물의 도금부위에 조사하여 도금층의 일부를 제거함으로써 소정패턴의 형상을 형성하는 단계; 상기 식각처리된 피도금물의 동/니켈 도금층에 전기도금을 하여 표면처리를 하는 단계를 통해, 수려한 도금층을 구비하고, 레이저 식각처리된 부분이 선명하게 부분투광될 수 있도록 되어 있다. The present invention comprises the steps of washing and degreasing polycarbonate or the plated material containing polycarbonate; Etching the washed and degreased plated and neutralizing it, followed by preliminary deposition to impart polarity; Pretreatment by activating the surface of the plated object to which polarity is applied; Forming an electroless copper plating layer on a surface of the pretreated plated object; Electroless nickel plating the plated object on which the copper plating layer is formed to form a copper / nickel plating layer and drying it; The focus of the laser beam is adjusted to selectively diverge the laser beam to the copper / nickel plated layer of the plated object, and the thickness and intensity of the laser beam are adjusted according to the shape of the selected predetermined pattern and the thickness of the coating layer. Irradiating a plating portion of the plated object to remove a portion of the plating layer to form a shape of a predetermined pattern; Through the electroplating of the copper / nickel plating layer of the etched to-be-plated material, the surface-treatment may be provided, and the laser-etched portion may be clearly partially transmitted through the plating layer.

즉, 본 발명은 폴리카보네이트 또는 폴리카보네이트가 다량 함유된(70%이상) 피도금물을 50 ∼ 60℃ 범위내에서 5분간 세척하고, 세척된 피도금물을 50℃에서 40% 질산으로 약 5 분정도 처리한 후 수세한다. 이후 질산처리된 피도금물을 1,3-다이클로로-2프로판올(1,3-dichloro-2-propanol) 56 wt%와 소디움 알킬 나프탈레인 설포네이트(sodium alkyl naphthalene sulfonate) 8wt%에 증류수 36wt%를 혼합한 전처리액과, 물을 4:6으로 혼합하여 43℃의 온도에서 100 초간 처리한 후 이를 수세하며, 전처리된 피도금물을 에칭하고, 중화액에 의해 중화처리한 후, 피도금물에 극성을 부여한다. 상기 극성부여는 에칠렌디아민(ethylenediamine) 80wt%와 증류수 20wt%를 혼합한 극성부여액 7wt% 와, 35% 염산 7wt%, 물 86wt%를 혼합한 액에 40℃ 에서 4 분간 처리한다. 이와 같이 표면에 극성이 부여된 피도금물을 활성처리한 후, 1 미크론 이하의 두께로 무전해 동도금하고, 상기 무전해 동도금된 피도물을 다시 니켈도금한다. 이때, 상기 형성된 니켈도금층은 산화와 부식으로부터 동도금층을 보호하고, 동도금층과 함께 전자파 차폐효율을 극대화시키는 것으로 0.5 미크론 이하의 두께를 구비한다. 이와 같이 동/니켈도금층이 형성된 피도금물을 건조한 다음 레이저 식각위치로 이동하여 위치시키고, 피도금물과 레이저 사이의 간격을 고려하여 피도금물의 특정 표면에 레이저빔이 집속발산되도록 레이저빔의 초점을 조절한다. 이와 같이 레이저 빔의 초점이 조절되면, 동/니켈 도금층이 형성된 피도금물에 식각하기 위한 소정패턴을 선택한 다음, 선택된 소정패턴 및 피도물에 형성된 동/니켈도금층의 두께에 맞추어 레이저 빔의 폭 및 세기를 조절한다. 선택된 소정패턴에 따른 레이저 빔의 초점, 폭, 세기의 조절이 완료되면, 레이저 빔을 피도금물의 도금부위에 조사하여 소정패턴의 형상에 따라 도금층의 일부를 제거한다. 즉, 피도금물의 동/니켈도금층에는 레이저의 조사에 따라 소정패턴 형상의 표식이 식각처리되게 되며, 이와 같이 식각처리된 피도금물에 다시 전기도금을 행하여 레이저 식각처리되지 않은 부분에 남아있는 동/니켈도금층에 두터운 도금층을 형성하여 수려한 도금층을 구비하도록 되어 있다. 이때, 레이저 식각처리된 부분은 동/니켈도금층이 제거된 상태 즉, 폴리카보네이트 자체이므로 전기도금시 도금층이 형성되지 않게되며, 폴리카보네이트의 물성에 의해 빛 조사시 선명하게 투광된다. That is, according to the present invention, a polycarbonate or a plated material containing a large amount of polycarbonate (more than 70%) is washed for 5 minutes within a range of 50 to 60 ° C, and the washed plated material is about 5% at 40 ° C with 40% nitric acid. Flush after washing for a minute. Subsequently, the nitric acid-treated plated product was diluted with 36 wt% of 1,3-dichloro-2-propanol and 56 wt% of sodium alkyl naphthalene sulfonate in 8 wt% of sodium alkyl naphthalene sulfonate. The pretreatment liquid mixed with% and water was mixed at 4: 6, treated for 100 seconds at a temperature of 43 ° C., followed by washing with water, etching the pretreated plated material, and neutralizing with a neutralizing solution. Give polarity to forbidden things. The polarization was performed for 4 minutes at 40 ° C. in a solution containing 7 wt% of a polarization solution mixed with 80 wt% of ethylenediamine and 20 wt% of distilled water, 7 wt% of 35% hydrochloric acid, and 86 wt% of water. In this way, the surface-polarized plated object is activated and then electroless copper plated to a thickness of 1 micron or less, and the electroless copper plated plated material is nickel plated again. At this time, the formed nickel plating layer to protect the copper plating layer from oxidation and corrosion, and to maximize the electromagnetic shielding efficiency with the copper plating layer has a thickness of less than 0.5 microns. As such, the plated object on which the copper / nickel plated layer is formed is dried and then moved to a laser etching position, and the laser beam is focused on a specific surface of the plated object in consideration of the distance between the plated object and the laser. Adjust the focus. When the focus of the laser beam is adjusted as described above, a predetermined pattern for etching the plated object on which the copper / nickel plating layer is formed is selected, and then the width and intensity of the laser beam are matched to the selected predetermined pattern and the thickness of the copper / nickel plating layer formed on the coated object. Adjust When adjustment of the focus, width, and intensity of the laser beam according to the selected predetermined pattern is completed, the laser beam is irradiated onto the plating portion of the plated object to remove a portion of the plating layer according to the shape of the predetermined pattern. That is, the copper plate / nickel plated layer of the plated material is etched with the laser according to the irradiation of the laser, and the plated object is electroplated again to remain in the unetched portion. A thick plating layer is formed on the copper / nickel plating layer to provide a beautiful plating layer. In this case, the laser-etched portion is a state in which the copper / nickel plating layer is removed, that is, the polycarbonate itself, so that the plating layer is not formed during the electroplating, and is clearly transmitted through light irradiation due to the physical properties of the polycarbonate.

또한, 상기 피도금물에 형성된 도금층의 총 두께는 약 40∼200 미크론 정도를 유지하는 것이 바람직하다. In addition, the total thickness of the plating layer formed on the plated material is preferably maintained about 40 to 200 microns.

상기 폴리카보네이트 또는 폴리카보네이트가 다량 함유된 피도금물의 동/니켈 도금층은 무전해도금에 의해 약 1.5 미크론 이하의 두께를 구비하고 있으므로, 레이저에 의해 용이하게 식각할 수 있으며, 레이저 식각에 의해 표식이 형성된 피도금물을 다시 전기도금하여 도금층을 필요에 따른 두께로 조절하므로, 수려한 미관 및 내식성, 내마모성을 구비할 수 있다. Since the copper / nickel plating layer of the polycarbonate or the plated product containing a large amount of polycarbonate has a thickness of about 1.5 microns or less by electroless plating, it can be easily etched by a laser and is marked by laser etching. Electroplating the formed to-be-plated again to adjust the plating layer to the thickness as necessary, it can have a beautiful appearance and corrosion resistance, wear resistance.

이하 본 발명을 실시예에 의거하여 상세히 설명하면 다음과 같다. Hereinafter, the present invention will be described in detail with reference to Examples.

실시예 1Example 1

폴리카보네이트 또는 폴리카보네이트가 50% 첨가된 피도금물을 50℃ 에서 5분간 세척하고, 이를 40% 질산으로 50℃에서 5 분정도 처리 및 수세하여 표면을 부풀린 후, 이를 1,3-다이클로로-2프로판올(1,3-dichloro-2-propanol) 56 wt%와 소디움 알킬 나프탈레인 설포네이트(sodium alkyl naphthalene sulfonate) 8wt%에 증류수 36wt%를 혼합한 전처리액과, 물을 4:6으로 혼합하여 43℃의 온도에서 100 초간 처리한 후 이를 수세하여 부풀린 표면층을 제거하고, 상기 표면층이 제거된 피도금물을 무수크롬산 520g/L와 황산 18 wt%로써 72℃에서 2분간 에칭하여 2회 회수하고 4회 수세하여 에칭처리한다.The plated product to which 50% of polycarbonate or polycarbonate was added was washed for 5 minutes at 50 ° C, treated with 40% nitric acid at 50 ° C for 5 minutes, washed with water, and the surface was swollen, and then 1,3-dichloro- Pretreatment mixture of 56 wt% 2propanol (1,3-dichloro-2-propanol), 8 wt% sodium alkyl naphthalene sulfonate and 36 wt% distilled water, and water at 4: 6 After treatment for 100 seconds at a temperature of 43 ℃ and washed with water to remove the inflated surface layer, the surface layer removed to be recovered twice by etching for 2 minutes at 72 ℃ with 520 g / L and 18 wt% sulfuric anhydride. 4 times and rinsed.

상기 에칭처리된 피도금물을 하이드록실아민 설페이트(hydroxylamine sulfate) 18(무게 퍼센트)를 증류수 82(무게 퍼센트)와 혼합한 중화액 2.5 wt%와, 35% 염산 10wt%, 물 8.7wt%을 혼합한 액에서 60℃ 정도의 온도로 5 분간 처리한 후 수세하여 중화처리하고, 이를 다시 에칠렌디아민(ethylenediamine) 80wt%와 증류수 20wt%를 혼합한 극성부여액 7wt% 와, 35% 염산 7wt%, 물 86wt%를 혼합한 액에 40℃ 에서 4 분간 처리하여 극성을 부여한다. 2.5 wt% of the neutralized solution of hydroxylated amine sulfate 18 (weight percent) and distilled water 82 (weight percent) was mixed with the etching-treated plated material, 10 wt% 35% hydrochloric acid, and 8.7 wt% water. After treatment for 5 minutes at a temperature of about 60 ℃ in a liquid, and neutralized by washing with water, and again, polarization solution 7wt%, 35% hydrochloric acid 7wt%, water 80% ethylenediamine and 20wt% distilled water The mixture with 86 wt% was treated at 40 ° C. for 4 minutes to give polarity.

이와 같이, 극성이 부여된 피도금물을 염화파라듐(PdCl2) 및 염화제일주석(SnCl2)을 각각 0.2g/L, 520g/L를 혼합한 촉매부여액 100cc/L과 염산 100cc/L로 10분간 활성처리 및 4회 수세하여 1차 활성처리하고, 이를 5% 황산으로 40℃에서 10 분간 2차 활성 처리하여 3회 수세하여 2차 활성처리한다.In this way, the polarized plating product 100cc / L and hydrochloric acid 100cc / L with the addition of 0.2 g / L and 520 g / L of palladium chloride (PdCl 2 ) and cuprous chloride (SnCl 2 ), respectively After 10 minutes of active treatment and 4 times of water treatment, the first activation treatment, it was treated with 5% sulfuric acid for 2 minutes at 40 ℃ for 10 minutes the second time active treatment.

상기 활성처리된 피도금물을, 염화동(CuCl2) 12g/L, 포르말린(CH2O) 2.03.0g/L, 가성소다 67g/L, EDTA(Ethylene Diamine Tetra Acetic ACid) 1520g/L를 혼합하고, 2,2-비피리딜(2,2-bi-pyridyl)을 소량 첨가한 수용액으로 화학동을 도금한 후 3회 수세한 후, 황산니켈 30g/L와 차아인산소다(NaH2PO2H2O) 20g/L 및 구연산소다 20g/L를 혼합한 수 온도를 40℃ 정도로 하여 무전해 니켈도금을 10분간 실시한 후 3회 수세한다. 이와 같이 니켈도금된 피도금물을 50℃에서 약 30분간 건조하였으며, 이에 대한 피복력 및 밀착력을 테스트한 결과는 표 1 과 같다.Copper plated (CuCl2) 12 g / L, formalin (CH 2 O) 2.03.0 g / L, caustic soda 67 g / L, EDTA (Ethylene Diamine Tetra Acetic ACid) 1520 g / L is mixed with the activated plated, After plating copper copper with an aqueous solution containing a small amount of 2,2-bipyridyl (2,2-bi-pyridyl) and washing with water three times, nickel sulfate 30g / L and sodium hypophosphite (NaH 2 PO 2 H 2 O) The electroless nickel plating is carried out for 10 minutes at a water temperature of about 40 ° C. in which 20 g / L and 20 g / L of sodium citrate are mixed, followed by washing three times. The nickel-plated object was dried at 50 ° C. for about 30 minutes, and the results of testing the coating and adhesion strengths thereof are shown in Table 1.

이때, 피복력은 도금이 된 부위와 도금이 되지 않은 부위를 비교하였으며, 밀착력테스트는 도금피막을 예리한 칼 등으로 사방 1㎜ 간격의 홈을 내어 테이프를 부착하여 밀착력을 테스트 하였다. At this time, the coating force was compared with the plated portion and the non-plated portion, and the adhesion test was performed by attaching a tape with grooves of 1 mm intervals with a sharp knife, etc., to test the adhesion.

실시예 2Example 2

폴리카보네이트 또는 폴리카보네이트가 70% 첨가된 피도금물을 실시예 1 과 동일한 방법으로 전처리한 후 니켈도금을 실시한 후 이에 대한 피복력 및 밀착력을 테스트하였으며, 그 결과는 표 1 과 같다. After the polycarbonate or the plated product to which 70% of the polycarbonate was added, pre-treatment was carried out in the same manner as in Example 1, nickel plating was performed, and coating and adhesion thereto were tested. The results are shown in Table 1 below.

실시예 3Example 3

폴리카보네이트 또는 폴리카보네이트가 100% 첨가된 피도금물을 실시예 1 과 동일한 방법으로 전처리한 후 니켈도금을 실시한 후 이에 대한 피복력 및 밀착력을 테스트하였으며, 그 결과는 표 1 과 같다. 100% of the polycarbonate or the polycarbonate-added plated material was pretreated in the same manner as in Example 1, followed by nickel plating, and then the coating and adhesion thereof were tested. The results are shown in Table 1 below.

실시예 4Example 4

폴리카보네이트 또는 폴리카보네이트가 70% 첨가된 피도금물을 실시예 1 과 동일한 방법으로 전처리한 후 동도금 1 미크론, 니켈도금 0.5 미크론을 실시하고, 형성된 동/니켈도금층에 레이저로 표식을 식각한 후 이를 다시 전기도금 하였으며, 이에 대한 외관의 수려정도 및 표식의 선명도를 테스트하였으며, 그 결과는 표 2 와 같다. After pre-treating the plated product to which polycarbonate or polycarbonate is added 70% in the same manner as in Example 1, copper plating 1 micron, nickel plating 0.5 micron, and the copper / nickel plated layer formed by laser etching the marking Electroplating was again performed, and the degree of appearance and the clearness of the marking were tested. The results are shown in Table 2.

비교예 1Comparative Example 1

폴리카보네이트 또는 폴리카보네이트가 50% 첨가된 피도금물을 기존의 ABS 수지 도금법에 의해 니켈도금을 실시한 후 이에 대한 피복력 및 밀착력을 테스트 하였으며, 그 결과는 표 1 과 같다. After plating 50% of the polycarbonate or the polycarbonate-added material by nickel plating by the conventional ABS resin plating method, the coating and adhesion strengths thereof were tested. The results are shown in Table 1 below.

비교예 2Comparative Example 2

폴리카보네이트 또는 폴리카보네이트가 70% 첨가된 피도금물을 기존의 ABS 수지 도금법에 의해 니켈도금을 실시한 후 이에 대한 피복력 및 밀착력을 테스트 하였으며, 그 결과는 표 1 과 같다. After coating the plated product to which the polycarbonate or polycarbonate is added to 70% by nickel plating by the conventional ABS resin plating method, the coating and adhesion strengths thereof were tested. The results are shown in Table 1 below.

비교예 3Comparative Example 3

폴리카보네이트 또는 폴리카보네이트가 100% 첨가된 피도금물을 기존의 ABS 수지 도금법에 의해 니켈도금을 실시한 후 이에 대한 피복력 및 밀착력을 테스트 하였으며, 그 결과는 표 1 과 같다. 100% of polycarbonate or polycarbonate-coated material was nickel plated by the conventional ABS resin plating method, and then the coating and adhesion thereof were tested. The results are shown in Table 1 below.

비교예 4Comparative Example 4

폴리카보네이트 또는 폴리카보네이트가 70% 첨가된 피도금물을 기존의 ABS 수지 도금법에 의해 니켈도금을 실시한 후 스크린 인쇄로 표식을 식각한 후 이를 다시 전기도금 하였으며, 이에 대한 외관의 수려정도 및 표식의 선명도를 테스트하였으며, 그 결과는 표 2 와 같다. The plated material to which 70% of polycarbonate or polycarbonate was added was nickel plated by the conventional ABS resin plating method, and the mark was etched by screen printing, and then electroplated again, and the beautifulness of the appearance and the sharpness of the mark were applied. Was tested and the results are shown in Table 2.

비교예 5Comparative Example 5

폴리카보네이트 또는 폴리카보네이트가 70% 첨가된 피도금물을 실시예 1 과 동일한 방법으로 전처리한 후 동도금 1미크론, 니켈도금 0.5 미크론을 실시하고, 형성된 동/니켈도금층에 스크린 인쇄로 표식을 식각한 후 이를 다시 전기도금 하였으며, 이에 대한 외관의 수려정도 및 표식의 선명도를 테스트하였으며, 그 결과는 표 2 와 같다. After pre-treatment of the plated product to which the polycarbonate or polycarbonate is added 70% in the same manner as in Example 1, copper plating 1 micron, nickel plating 0.5 micron, and etching the mark on the formed copper / nickel plating layer by screen printing This was again electroplated, and the degree of appearance and the sharpness of the marker were tested. The results are shown in Table 2.

피복력Coverage 밀착력Adhesion 실시예 1Example 1 100 %100% 97∼100 %97-100% 실시예 2Example 2 100 %100% 97∼100 %97-100% 실시예 3Example 3 100 %100% 97∼100 %97-100% 비교예 1Comparative Example 1 100 %100% 97∼100 %97-100% 비교예 2Comparative Example 2 40∼60 %40-60% 70 % 이하Less than 70% 비교예 3Comparative Example 3 30 % 이하30% less than 40 % 이하40% less than

이와 같이, 폴리카보네이트 및 폴리카보네이트를 70 이상 함유한 수지제품을 상기의 공정을 통하여 무전해 도금을 실시하면, 종래의 ABS 수지의 도금방법에 의하여 폴리카보네이트 및 폴리카보네이트를 다량(70%이상) 함유한 수지 제품을 도금하는 경우, 도금이 불가능하거나 도금이 안되는 부위가 60 이상 발생하는 반면, 본 발명은 100% 도금이 가능함을 알 수 있다. In this way, when electroless plating of a resin product containing at least 70 polycarbonates and polycarbonates is carried out through the above process, a large amount (more than 70%) of polycarbonates and polycarbonates is contained by the conventional plating method of ABS resin. When plating one resin product, it can be seen that the plating is impossible or non-plating at least 60 sites, while the present invention is capable of 100% plating.

외관Exterior 선명도(투과성)Clarity (Transparent) 실시예 4Example 4 100100 100100 비교예 4Comparative Example 4 8080 8080 비교예 5Comparative Example 5 100100 8080

상기에서와 같이, 무전해도금 및 전기도금에 의해 도금층이 형성되고 레이저에 의해 소정패턴을 구비하도록 식각처리된 피도금물과 종래의 기술에 의해 도금층이 형성되고 스크린 인쇄 및 포토에칭에 의해 식각처리된 피도금물의 외관 및 선명도를 대비할 경우, 본 발명에 따른 피도물이 수려한 외관 및 우수한 선명도를 구비하고 있음을 알 수 있다. As described above, the plated layer is formed by electroless plating and electroplating, and the plated layer is formed by conventional techniques and the plated layer is formed by etching, and the etching layer is formed by screen printing and photoetching. When contrasting the appearance and sharpness of the plated object, it can be seen that the object according to the present invention has a beautiful appearance and excellent sharpness.

이와 같이 본 발명은 폴리카보네이트 및 폴리카보네이트를 70%이상 함유한 수지제품에 대하여 무전해도금을 용이하게 행할 수 있으며, 이로 인해 기존의 ABS 수지가 구비하는 취약한 물성을 대체할 수 있다. As described above, the present invention can easily perform electroless plating on a polycarbonate and a resin product containing 70% or more of polycarbonate, thereby replacing the weak physical properties of the existing ABS resin.

또한, 본 발명은 도금층이 형성된 폴리카보네이트 또는 폴리카보네이트가 함유된 수지제품에 레이저로 소정패턴을 식각하도록 되어 있어, 수 ㎝ 에서 수 ㎛ 까지 초소형으로 아주 복잡하고 정교한 문자, 표식, 도형등의 식각을 용이하게 할 수 있으며, 신속한 식각작업이 가능하고, 이로 인해 제품의 대량생산이 가능하며 시간과 노력이 최소화되는 등 산업발전에 큰 기여를 할 수 있는 등 많은 효과가 있다. In addition, the present invention is to use a laser to etch a predetermined pattern on a polycarbonate or a resin product containing a polycarbonate plated layer, it is very small and fine from several centimeters to several micrometers to etch very complex and sophisticated characters, marks, figures, etc. It can be easily and quickly etched, which can be mass-produced, and can greatly contribute to industrial development such as minimizing time and effort.

Claims (2)

폴리카보네이트 또는 폴리카보네이트가 함유된 피도금물을 수세 및 탈지하는 단계;Washing and degreasing the polycarbonate or the plated material containing the polycarbonate; 상기 수세 및 탈지된 피도금을 에칭하고 이를 중화처리한 후, 예비침적하여 극성을 부여하는 단계;Etching the washed and degreased plated and neutralizing it, followed by preliminary deposition to impart polarity; 상기 극성이 부여된 피도금물의 표면을 활성처리하여 전처리하는 단계; Pretreatment by activating the surface of the plated object to which polarity is applied; 상기 전처리된 피도금물의 표면에 무전해 동도금층을 형성하는 단계; Forming an electroless copper plating layer on a surface of the pretreated plated object; 상기 동도금층이 형성된 피도금물을 다시 무전해 니켈도금하여 동/니켈도금층을 형성하고 이를 건조하는 단계; Electroless nickel plating the plated object on which the copper plating layer is formed to form a copper / nickel plating layer and drying it; 상기 피도금물의 동/니켈도금층에 레이저빔을 선택적으로 집속 발산하기 위하여 레이저 빔의 초점을 조절하고, 선택된 소정패턴의 형상 및 도막층의 두께에 따라 레이저 빔의 두께 및 세기를 조절하며, 이를 피도금물의 도금부위에 조사하여 도금층의 일부를 제거함으로써 소정패턴의 형상을 형성하는 단계;The focus of the laser beam is adjusted to selectively diverge the laser beam to the copper / nickel plated layer of the plated object, and the thickness and intensity of the laser beam are adjusted according to the shape of the selected predetermined pattern and the thickness of the coating layer. Irradiating a plating portion of the plated object to remove a portion of the plating layer to form a shape of a predetermined pattern; 상기 식각처리된 피도금물의 동/니켈 도금층에 전기도금을 하여 표면처리를 행하는 단계를 통해, 수려한 도금층을 구비하고, 레이저 식각처리된 부분이 선명하게 부분투광되는 것을 특징으로 하는 레이저 식각을 이용한 폴리카보네이트 성분이 함유된 수지의 부분투광도금방법.The surface treatment is performed by electroplating the copper / nickel plated layer of the etched plated object, and having a beautiful plating layer, the laser-etched portion is partly transparently transmitted using laser etching. Partial translucent plating method of resin containing polycarbonate component. 제 1 항에 있어서;The method of claim 1; 상기 동도금층은 1 미크론 이하, 니켈도금층은 0.5 미크론 이하의 두께를 구비하는 것을 특징으로 하는 레이저 식각을 이용한 폴리카보네이트 성분이 함유된 수지의 부분투광도금방법.Wherein the copper plating layer is less than 1 micron, the nickel plating layer has a thickness of less than 0.5 microns, the partial translucent plating method of the resin containing the polycarbonate component using laser etching.
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