KR100502464B1 - Structure and Formation Method of Plasma Display Device - Google Patents

Abstract

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a structure and a method of forming a plasma display device, and more particularly, to modify the structure of the BM layer formed in order to improve the contrast of the plasma display device and to change the order of forming the BM layer, thereby maintaining the sustain electrode due to the BM layer firing process The purpose of the present invention is to prevent oxidation and to improve contrast and screen brightness of the PDP.

In order to realize this, in the present invention, a parallel upper substrate and a lower substrate are joined by fritted glass, a sustain electrode is formed on the upper substrate, a dielectric layer is formed on the electrode, and a protective layer is formed on the dielectric layer. In a plasma display panel in which electrodes are arranged on a lower substrate, and partition walls are formed between the lower substrate electrodes, a matrix-type BM layer and a transparent glass material for protecting the BM layer are sequentially formed between the upper substrate and the sustain electrode. will be.

Description

Structure and Formation Method of Plasma Display

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a plasma display panel (PDP), and more particularly, to a structure of a BM layer formed on an upper substrate for improving contrast of a PDP and a method of manufacturing the same.

The general color PDP is composed of an upper structure (shown rotated 90 degrees for better understanding) and a lower structure as shown in FIG. 1, which is formed on the upper substrate 1 and the upper substrate 1. Sustain electrodes 3 and 3 ', a second BM layer 9 formed in parallel between the sustain electrodes, and a dielectric layer for holding surface charges generated during discharge of the sustain electrodes 3 and 3'. (4) and a protective layer (5) for protecting the dielectric layer (4) from discharge, the lower structure of which is the lower substrate (2) and the address electrode (6) formed on the lower substrate (2) A barrier rib 7 having a phosphor 8 coated on a surface is formed between the upper glass 1 and the lower glass 2, and a first BM layer 10 is formed thereon.

The arbitrary sustain electrode lines 3 and 3 'are composed of a transparent electrode line 3' and a metal electrode line 3, and the transparent electrode line 3 'is discharged when a discharge voltage is supplied at both ends thereof. Mutual discharge is caused in the space, and the metal electrode lines 3 are formed on the transparent electrode lines 3 ', respectively, to prevent a voltage drop due to the resistance of the transparent electrode lines.

In general, a plasma display panel is a light emitting device that displays an image by using an internal gas discharge phenomenon, and there is no need to mount an active device for each cell, so the manufacturing process is simple and the screen is easily enlarged. It has been spotlighted as a display element of a direct view type image display device having a large screen with a high speed, particularly an image display device for HDTV (High Definition TeleVision) era.

Looking at the formation process of the upper substrate of the conventional PDP having the characteristics as described above with reference to Figure 3, first to form a pattern at a predetermined interval on the transparent electrode line (3 ') on the upper substrate (1) The metal electrode line 3 is formed thereon to complete the sustain electrode. Then, the second BM layer 9 is formed in parallel between the pair of sustain electrodes 3 and 3 'as shown in (C), and after the firing process is performed at 500 ° C. or higher, the dielectric layer 4 as shown in (D). Is formed on the entire surface, and the protective layer 5 is formed on the entire surface to complete the upper structure, as shown in (C), in order to protect the dielectric layer 4 from sputtering generated during discharge.

In the lower structure, the electrode 6 is formed on the insulating substrate by using the electrode paste, the outer terminal such as a pad electrode (not shown) is printed, and then the partition 7 is printed. The address electrode 6 is generally formed by printing, but the electrode may be formed by deposition of a metal material. The first BM layer 10 is formed on the upper end of the partition wall 7 so as to improve the contrast of the screen by making the distinction between the discharge cells clear.

When the upper structure and the lower structure are combined using frit glass, the entire screen is divided into cell units by the plurality of lower electrode lines 6 and the plurality of transparent electrode lines 3 '. Layers 9 and 10 are vertically overlapped.

However, the conventional PDP undergoes a firing process after forming the second BM layer 9 between the sustain electrodes 3 and 3 'during the manufacturing process of the upper substrate, wherein the sustain electrode is heated at a high temperature (500 ° C.) during the firing process. There was a problem in that electrode defects occurred while being oxidized, especially the oxidation of the metal electrode became severe, resulting in problems such as conductive electrical resistance, and in the lower substrate, the light emitted from the phosphor 8 was partially absorbed in the first BM layer. Another structural problem has arisen in which the luminance is lowered.

The present invention has been invented to solve the problems of the prior art as described above to form the BM layer formed on the upper substrate and the lower substrate, respectively, in a matrix form only on the upper substrate, and the BM layer protection and sustain electrode thereon The purpose of forming a transparent glass material to facilitate the formation is to structurally prevent oxidation of the sustain electrode due to the BM layer firing process and to improve the brightness of the PDP.

The present invention will be described in detail below with reference to the accompanying drawings.

First, referring to the structure of the plasma display panel of the present invention, as shown in FIG. 4, the parallel upper substrate 101 and the lower substrate 102 are joined by fritted glass, and the upper substrate 101 has a matrix type BM layer. 109 is formed, a transparent glass material 110 is formed on the BM layer 109, a sustain electrode 103 is formed on the transparent glass material, a dielectric layer 104 is formed on the sustain electrode 103. A protective layer 105 is formed thereon for protecting the dielectric layer from discharge, an address electrode 106 is arranged on the lower substrate 102, and a phosphor 108 on an inner wall between the address electrodes 106; The partition 107 to which the coating was applied is formed.

Looking at the upper substrate manufacturing process and effect of the PDP according to the present invention with reference to FIG.

First, in (a), a matrix-shaped BM layer 109 as shown in FIG. 5 is coated on the upper substrate 101, and then transparent glass material 110 is formed thereon as shown in (b) to etch the BM. Serves to protect layer 109. In addition, the glass material 110 to smooth the substrate surface curved by the BM layer 109 so that the electrode forming process can be performed smoothly.

The upper sustain electrode 103 is formed by uniformly depositing the sustain electrode material on the entire surface of the substrate by a sputtering technique and then forming an electrode through an etching process. In this case, the sustain electrode material may be uniformly formed only when the substrate is flat.

The sputtering method will be described below.

Sputtering is performed through the sputtering device, and the thin film is deposited as the upper PDP substrate passes between the material to be deposited (called target) and the negative electrode plate opposite to the inside of the sealed chamber. The target and the cathode plate are fixed, and the PDP substrate is moved while being deposited.

The substrate is first cleaned and then loaded into the chamber and energized to the target. Then, a plasma is generated by the gas previously injected between the target and the negative electrode plate, and cations such as argon in the plasma move and collide at high speed toward the target. The surface of the target absorbs the momentum energy of the argon that has hit, and the particles are more than a certain energy, and the particles pop out of the surface. The protruding particles go straight to the PDP substrate between the target and the negative electrode plate. In a vacuum, the particles move in a straight line, so that the particles are uniformly deposited on the substrate without mutual interference. If the surface of the target substrate is not flat during the thin film deposition, it is difficult to deposit. In particular, the electrode material should be evenly deposited to prevent the defect of the electrode to reduce the electrical resistance to increase the display quality of the entire substrate.

After the etching process is performed by forming the sustain electrode line 103 in parallel with the BM layer 109 by the above technique, a dielectric layer for generating a wall charge on the electrode layer to lower the driving voltage. (104), which is composed mainly of silicon oxide and lead oxide.

Next, in order to prevent damage to the dielectric layer 104 due to discharge, a protective layer is formed on the dielectric layer to complete the upper structure as shown in (d).

The lower structure is completed through the same process as in the prior art, and the upper structure and the lower structure are combined by frit glass to form one plasma display panel.

In particular, a separate BM layer is not formed on the barrier rib surface 107 of the lower structure, thereby improving luminance during light emission. In the conventional partition wall surface, the BM layer is formed at the upper end for the purpose of contrast enhancement, so that a part of the visible light emitted from the phosphor is absorbed by the BM layer and the luminance is lowered. The barrier rib structure increases the luminance by diffusely reflecting visible light by forming the barrier ribs with white low melting glass. And the matrix shape of the BM layer of the upper structure is to improve the contrast of the product to match the plurality of cell structure.

As described above, the BM layer structure of the present invention forms the BM layer before the sustain electrode forming process, thereby preventing the oxidation of the sustain electrode due to the BM layer firing process and improving the contrast and screen brightness of the PDP.

1 is a cross-sectional view of a conventional plasma display device.

2 is a BM and an electrode structure diagram of a conventional upper substrate.

3 is a process chart of forming a conventional upper substrate.

4 is a cross-sectional view of the present invention plasma display device.

5 is a BM shape diagram according to the present invention.

6 is an upper substrate forming process chart according to the present invention.

*** Explanation of symbols for the main parts of the drawing ***

101: upper substrate 102: lower substrate

103: sustain electrode 104: dielectric layer

105: protective layer 106: address electrode

107: partition 108: phosphor

109: BM layer 110: transparent glass material

Claims (3)

A parallel upper substrate and a lower substrate are joined by frit glass, a sustain electrode pair is formed on the upper substrate, a dielectric layer is formed on the sustain electrode pair, a protective layer is formed on the dielectric layer, and an address electrode is formed on the lower substrate. In the panel of the plasma display device is arranged, the partition wall is formed between the address electrode, A matrix light blocking layer is formed on the upper substrate, and the sustain electrode pair is formed on the light blocking layer. And a transparent layer for protecting the light blocking layer between the light blocking layer and the sustain electrode pair. The method of claim 1, And said transparent layer is made of a transparent glass material. In a panel of a plasma display device in which an upper substrate and a lower substrate are coupled by frit glass in parallel, Forming a light blocking layer in a matrix form on the upper substrate; Forming a transparent layer for protecting the light blocking layer on the light blocking layer; Forming a sustain electrode pair on the transparent layer; Forming a dielectric layer on the pair of sustain electrodes; And forming a protective layer for protecting the dielectric layer.

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