KR100433048B1 - Total Nitrogen Eliminator Composition - Google Patents
Total Nitrogen Eliminator Composition Download PDFInfo
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- KR100433048B1 KR100433048B1 KR10-2002-0005626A KR20020005626A KR100433048B1 KR 100433048 B1 KR100433048 B1 KR 100433048B1 KR 20020005626 A KR20020005626 A KR 20020005626A KR 100433048 B1 KR100433048 B1 KR 100433048B1
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/58—Treatment of water, waste water, or sewage by removing specified dissolved compounds
- C02F1/586—Treatment of water, waste water, or sewage by removing specified dissolved compounds by removing ammoniacal nitrogen
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/66—Treatment of water, waste water, or sewage by neutralisation; pH adjustment
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2305/00—Use of specific compounds during water treatment
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Abstract
본 발명은 무기성 질소 화합물을 선택적으로 분해 제거할 수 있는 총 질소 제거제 조성물에 관한 것이다.The present invention relates to a total nitrogen scavenger composition capable of selectively decomposing and removing inorganic nitrogen compounds.
본 발명에 따른 총 질소 제거제 조성물은 4.5~6.5 중량%의 차아염소산나트륨과, 5.6~8.0 중량%의 아염소산나트륨과, 1.5~2.5 중량%의 탄산나트륨과, 2.5~3.5중량%의 탄산수소나트륨과, 2.5~3.5 중량%의 무수황산나트륨과, 76~83.4%의 물을 구비한다.The total nitrogen scavenger composition according to the present invention comprises 4.5 to 6.5 wt% sodium hypochlorite, 5.6 to 8.0 wt% sodium chlorite, 1.5 to 2.5 wt% sodium carbonate, 2.5 to 3.5 wt% sodium hydrogencarbonate , 2.5-3.5% by weight of anhydrous sodium sulfate, and 76-83.4% of water.
Description
본 발명은 총 질소 제거제 조성물에 관한 것으로, 특히 무기성 질소 화합물을 선택적으로 분해 제거할 수 있는 총 질소 제거제 조성물에 관한 것이다.The present invention relates to a total nitrogen scavenger composition, and more particularly to a total nitrogen scavenger composition capable of selectively decomposing and removing inorganic nitrogen compounds.
통상, 각종 산업폐수 중 질산성 및 암모니아성 질소 화합물은 폐수의 색도와 악취를 발생시키고, 유해가스와 부영양화를 일으켜 폐수의 화학적 산소 요구량(chemical oxygen demand : COD), 생화학적 산소 요구량(biochemical oxygen demand : BOD)을 상승시키는 원인이 되어왔다. 이러한 무기성 질소의 제거방법으로는 이온교환 수지법, 미생물 균주를 이용한 분해 제거법, 역삼투법에 의한 분리법 등이 있다.Generally, nitric acid and ammonia nitrogen compounds in various industrial wastewaters generate color and odor of the wastewater, cause harmful gas and eutrophication, and thus the chemical oxygen demand (COD) and biochemical oxygen demand of the wastewater. : Has caused a rise in BOD). Examples of the inorganic nitrogen removal method include ion exchange resin method, decomposition removal method using microbial strain, separation method by reverse osmosis method, and the like.
이와 같은 기능을 가진 종래의 조성물로는 다음과 같은 것들이 있다.Conventional compositions having such a function include the following.
차아염소산을 이용한 인 및 질소 제거제(예 : 특허 0276250호), 키토산-프탈로시아닌계 조성물(예 : 특허 98-061276호), 미생물 균주를 이용하는 조성물(예 : 특허 95-16788호) 등이 있다. 이들 방법은 무기성 질소를 흡착, 미생물에 의한 분해 또는 부분적 산화흡착에 의한 제거에 효과가 있다. 그러나, 무기성 질소 화합물의 제거에는 그 효율이 낮아 오염원을 완전 분해하여 제거하는 데에는 어려움이 있다.Phosphorus and nitrogen scavengers using hypochlorous acid (for example, Patent 0276250), chitosan-phthalocyanine-based compositions (for example, Patent 98-061276), and compositions using microbial strains (for example, Patent 95-16788). These methods are effective for adsorption of inorganic nitrogen, decomposition by microorganisms or partial oxidative adsorption. However, the removal of the inorganic nitrogen compound has a low efficiency, making it difficult to completely decompose and remove the pollutant.
따라서, 본 발명의 목적은 무기성 질소 화합물을 선택적으로 분해 제거할 수 있는 총 질소 제거제 조성물을 제공하는 것이다.Accordingly, it is an object of the present invention to provide a total nitrogen scavenger composition capable of selectively decomposing and removing inorganic nitrogen compounds.
도 1은 본 발명에 따른 총 질소 제거제 조성물에 관한 시험결과를 나타내는 도면.1 is a view showing the test results for the total nitrogen remover composition according to the present invention.
상기 목적을 달성하기 위하여, 본 발명에 따른 총 질소 제거제 조성물은 4.5~6.5 중량%의 차아염소산나트륨과, 5.6~8.0 중량%의 아염소산나트륨과, 1.5~2.5 중량%의 탄산나트륨과, 2.5~3.5중량%의 탄산수소나트륨과, 2.5~3.5 중량%의 무수황산나트륨과, 76~83.4%의 물을 구비한다.In order to achieve the above object, the total nitrogen scavenger composition according to the present invention is 4.5 to 6.5% by weight sodium hypochlorite, 5.6 to 8.0% by weight sodium chlorite, 1.5 to 2.5% by weight sodium carbonate, 2.5 to 3.5 Wt% sodium hydrogencarbonate, 2.5-3.5 wt% anhydrous sodium sulfate, and 76-83.4% water.
상기 차아염소산나트륨 용액은 유효염소함량이 12 중량%인 것을 특징으로 한다.The sodium hypochlorite solution is characterized in that the effective chlorine content is 12% by weight.
상기 아염소산나트륨의 순도는 35 중량%인 것을 특징으로 한다.The purity of the sodium chlorite is characterized in that 35% by weight.
상기 조성물의 피에이치(pH)는 9.0~13.0인 것을 특징으로 한다.The pH of the composition is characterized in that 9.0 to 13.0.
상기 목적 외에 본 발명의 다른 목적 및 이점들은 첨부도면을 참조한 본 발명의 바람직한 실시 예에 대한 설명을 통하여 명백하게 드러나게 될 것이다.Other objects and advantages of the present invention in addition to the above object will be apparent from the description of the preferred embodiment of the present invention with reference to the accompanying drawings.
이하, 도 1을 참조하여 본 발명의 바람직한 실시 예를 상세하게 설명하기로 한다.Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to FIG. 1.
본 발명에 따른 총 질소 제거제 조성물은 차아염소산나트륨 4.5~6.5 중량%, 아염소산나트륨 5.6~8.0 중량%, 탄산나트륨 1.5~2.5 중량%, 탄산수소나트륨 2.5~3.5중량%, 무수황산나트륨 2.5~3.5 중량%과, 76~83.4%의 물로 구성된다.The total nitrogen scavenger composition according to the present invention is sodium hypochlorite 4.5-6.5 wt%, sodium chlorite 5.6-8.0 wt%, sodium carbonate 1.5-2.5 wt%, sodium hydrogencarbonate 2.5-3.5 wt%, anhydrous sodium sulfate 2.5-3.5 wt% And 76-83.4% of water.
아염소산나트륨은 차아염소산나트륨과 적정비로 혼합시 pH영역에 따라 이산화염소 및 차아염소산의 발생량이 다르게 나타난다. 이 아염소산나트륨의 순도는 35중량%이며, 치아염소산나트륨의 유효염소 함량은 12 중량%이다.When sodium chlorite is mixed with sodium hypochlorite in an appropriate ratio, the amount of chlorine dioxide and hypochlorous acid is different depending on the pH range. The purity of this sodium chlorite is 35% by weight, and the effective chlorine content of sodium chlorite is 12% by weight.
특히, 이때 발생하는 차아염소산은 암모니아성 질소에 효과적이며, 이차적으로 발생되는 이산화염소는 질소 화합물 및 아질산성 질소를 완전히 분해하여 제거하게 된다.In particular, hypochlorous acid generated at this time is effective for ammonia nitrogen, and secondary chlorine dioxide is completely decomposed to remove the nitrogen compound and nitrite nitrogen.
또한, 본 발명에 따른 조성물의 pH는 이산화염소의 발생량이 지속적으로 유지되는 9.0~13.0의 범위에 있으므로 상대적으로 낮은 pH영역에서 이산화염소의 발생량이 순간적으로 증가하게 되어 분해효과가 낮고, 지속적이지 못한 단점을 개선하였다. 즉, 본 발명의 조성물은 9.0~13.0의 pH영역에서 강력한 산화력을 가진 이산화염소 가스를 생성하여 무기성 질소화합물을 선택적으로 분해 제거할 수 있다.In addition, since the pH of the composition according to the present invention is in the range of 9.0 to 13.0 in which the amount of chlorine dioxide is continuously maintained, the amount of chlorine dioxide is instantaneously increased in a relatively low pH range, resulting in low decomposition effects and unsustainable effects. The shortcomings were improved. That is, the composition of the present invention can selectively decompose and remove the inorganic nitrogen compound by generating chlorine dioxide gas having a strong oxidizing power in the pH range of 9.0 ~ 13.0.
탄소수소나트륨 및 탄산나트륨은 본 조성물의 pH를 일정수준으로 유지시켜 주는 완충제로써 이산화염소 및 차아염소산의 발생량을 안정적이고, 지속적으로 유지시키는 역할을 한다.Sodium hydrogen carbonate and sodium carbonate are buffers that maintain the pH of the composition at a constant level and serve to stably and continuously maintain the amount of chlorine dioxide and hypochlorous acid.
무수황산나트륨은 조성물의 이온강도를 조절하여 조성물을 장기간 보관해도 유효 염소의 농도를 일정수준으로 유지시켜주는 작용을 한다.Anhydrous sodium sulfate acts to maintain the concentration of effective chlorine at a constant level even if the composition is stored for a long time by adjusting the ionic strength of the composition.
이러한 총 질소 제거제 조성물의 제조방법은 다음과 같다.The manufacturing method of such a total nitrogen remover composition is as follows.
<실시 예 1><Example 1>
1) 무수황산나트륨 30g을 물 0.4L에 완전히 녹인다.1) Dissolve 30 g of anhydrous sodium sulfate completely in 0.4 L of water.
2) 1)용액에 탄산수소나트륨 30g을 넣고 완전히 녹인다.2) 1) Put 30 g of sodium bicarbonate in the solution and dissolve it completely.
3) 2)용액에 탄산나트륨 20g을 넣고 녹인다.3) 2) Dissolve 20 g of sodium carbonate in the solution.
4) 3)용액에 차아염소산나트륨(유효염소 12%)0.4L를 넣고 교반 후 상온에서 30분간 방치한다.4) 3) Add 0.4 L of sodium hypochlorite (12% of effective chlorine) to the solution and leave for 30 minutes at room temperature after stirring.
5) 4)용액에 35%아염소산나트륨 0.2L를 넣고, 균질한 용액이 되도록 교반 후 1시간정도 방치한다.5) 4) Add 0.2L of 35% sodium chlorite to the solution and leave for about 1 hour after stirring to make a homogeneous solution.
이와 같이 완성된 총 질소 제거제 조성물의 성능의 평가시험은 도 1에 도시된 바와 같이 한국화학시험연구원에 의뢰하여 실시하였으며, 그 시험방법 및 결과는 다음과 같다.The evaluation test of the performance of the total nitrogen remover composition thus completed was commissioned by the Korea Testing Institute as shown in Figure 1, the test method and results are as follows.
<시험예 1><Test Example 1>
실시예 1에서 제조한 총 질소 제거제 조성물의 성능을 평가하기 위하여 질산성 질소 함유량이 약 1,980ppm인 폐수 원액 1L을 2L의 비이커에 넣고, 실시예 1에서 제조한 조성물 2mL을 첨가한 후 교반장치(jar-tester)로 50rpm에서 교반하면서 2시간후 1회, 4시간후 1회씩 시료의 일정량을 채취 후 처리전과 처리 후의 총 질소잔존량을 원소분석기로 측정하였다.In order to evaluate the performance of the total nitrogen scavenger composition prepared in Example 1, 1 L of the wastewater stock solution having a nitrate nitrogen content of about 1,980 ppm was placed in a 2 L beaker, and 2 mL of the composition prepared in Example 1 was added, followed by stirring ( After stirring at 50 rpm with a jar-tester), a predetermined amount of the sample was taken once after 2 hours and once after 4 hours, and the total nitrogen residual before and after the treatment was measured by an element analyzer.
본 발명의 총 질소 제거제 조성물의 첨가에 의한 폐수의 처리전과 처리후의 총 질소 제거율은 도 1에서 알수 있는 바와 같이 2시간 경과시 1980ppm에서 231ppm으로 약 88.3% 정도 제거되었으며, 4시간 경과시 1980ppm에서 53.8ppm으로 약 97.3% 정도 제거됨을 알 수 있다.The total nitrogen removal rate before and after the treatment of the wastewater by the addition of the total nitrogen scavenger composition of the present invention was removed from 1980ppm to 231ppm after about 2 hours, about 88.3%, and 53.8 at 1980ppm after 4 hours. It can be seen that about 97.3% is removed by ppm.
상술한 바와 같이, 본 발명에 따른 총 질소 제거제 조성물은 무기성 질소화합물을 일시적인 흡착, 부분적 산화 등에 의해서 제거하는 것이 아니라 이산화염소와 차아염소산의 복합적인 산화작용에 의해서 무기성 질소화합물을 질소 가스의 형태로 분해 제거한다. 이에 따라, 시간이 경과하여도 처리수 내의 무기성질소의 잔존율은 거의 변화가 없으므로 질산성 질소를 다량 함유하는 각종 산업폐수는 물론 암모니아성 질소를 함유하는 일반 오폐수 등에도 적용될 수 있다.As described above, the total nitrogen scavenger composition according to the present invention does not remove the inorganic nitrogen compound by temporary adsorption, partial oxidation, etc., but instead of removing the inorganic nitrogen compound by the complex oxidation of chlorine dioxide and hypochlorous acid. Decompose and remove in form. Accordingly, since the residual ratio of inorganic nitrogen in the treated water is almost unchanged even after time, it can be applied to various industrial wastewater containing a large amount of nitrate nitrogen as well as general wastewater containing ammonia nitrogen.
이상 설명한 내용을 통해 당업자라면 본 발명의 기술사상을 일탈하지 아니하는 범위에서 다양한 변경 및 수정이 가능함을 알 수 있을 것이다. 따라서, 본 발명의 기술적 범위는 명세서의 상세한 설명에 기재된 내용으로 한정되는 것이 아니라 특허 청구의 범위에 의해 정하여져야만 할 것이다.Those skilled in the art will appreciate that various changes and modifications can be made without departing from the technical spirit of the present invention. Therefore, the technical scope of the present invention should not be limited to the contents described in the detailed description of the specification but should be defined by the claims.
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KR100796098B1 (en) * | 2006-09-14 | 2008-01-21 | 김영수 | Denitrification composition |
KR101160884B1 (en) * | 2010-02-16 | 2012-06-28 | 서승훈 | A dehumidifying, deodorant and germicidal device |
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KR20030069023A (en) * | 2002-02-15 | 2003-08-25 | 김임석 | Method for eliminating total nitrogen from wastewater |
Citations (3)
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JPS5549191A (en) * | 1978-10-03 | 1980-04-09 | Hitachi Plant Eng & Constr Co Ltd | Purifying treatment method of waste water |
JPS5556887A (en) * | 1978-10-23 | 1980-04-26 | Toyo Soda Mfg Co Ltd | Treatment method of ammonium compounds-containing solution |
KR100276250B1 (en) * | 1999-10-16 | 2000-12-15 | 손달수 | A total nitrogen and phosphorus eliminator |
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Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5549191A (en) * | 1978-10-03 | 1980-04-09 | Hitachi Plant Eng & Constr Co Ltd | Purifying treatment method of waste water |
JPS5556887A (en) * | 1978-10-23 | 1980-04-26 | Toyo Soda Mfg Co Ltd | Treatment method of ammonium compounds-containing solution |
KR100276250B1 (en) * | 1999-10-16 | 2000-12-15 | 손달수 | A total nitrogen and phosphorus eliminator |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100796098B1 (en) * | 2006-09-14 | 2008-01-21 | 김영수 | Denitrification composition |
KR101160884B1 (en) * | 2010-02-16 | 2012-06-28 | 서승훈 | A dehumidifying, deodorant and germicidal device |
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