KR100414053B1 - Photocatalytic film and the manufacturing method of it - Google Patents
Photocatalytic film and the manufacturing method of it Download PDFInfo
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- KR100414053B1 KR100414053B1 KR10-2000-0076443A KR20000076443A KR100414053B1 KR 100414053 B1 KR100414053 B1 KR 100414053B1 KR 20000076443 A KR20000076443 A KR 20000076443A KR 100414053 B1 KR100414053 B1 KR 100414053B1
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- Prior art keywords
- substrate
- photocatalyst
- hard particles
- cured resin
- particles
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- 238000004519 manufacturing process Methods 0.000 title abstract description 12
- 230000001699 photocatalysis Effects 0.000 title description 11
- 239000011941 photocatalyst Substances 0.000 claims abstract description 55
- 239000002245 particle Substances 0.000 claims abstract description 46
- 239000000758 substrate Substances 0.000 claims abstract description 46
- 239000011347 resin Substances 0.000 claims abstract description 19
- 229920005989 resin Polymers 0.000 claims abstract description 19
- 238000000034 method Methods 0.000 claims description 10
- 239000007864 aqueous solution Substances 0.000 claims description 5
- 238000005507 spraying Methods 0.000 claims description 3
- 238000007598 dipping method Methods 0.000 claims description 2
- 238000010438 heat treatment Methods 0.000 abstract description 9
- 238000000354 decomposition reaction Methods 0.000 abstract description 7
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 21
- 239000004408 titanium dioxide Substances 0.000 description 10
- 239000004033 plastic Substances 0.000 description 5
- 229920003023 plastic Polymers 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 239000004566 building material Substances 0.000 description 3
- 239000000428 dust Substances 0.000 description 3
- 239000003344 environmental pollutant Substances 0.000 description 3
- 231100000719 pollutant Toxicity 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910015902 Bi 2 O 3 Inorganic materials 0.000 description 1
- 229910002367 SrTiO Inorganic materials 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000000844 anti-bacterial effect Effects 0.000 description 1
- 230000003373 anti-fouling effect Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000004332 deodorization Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000005416 organic matter Substances 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
- 238000006479 redox reaction Methods 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
- XLOMVQKBTHCTTD-UHFFFAOYSA-N zinc oxide Inorganic materials [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 1
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
- B01J37/02—Impregnation, coating or precipitation
- B01J37/0215—Coating
- B01J37/0228—Coating in several steps
-
- B01J35/39—
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
- B01J37/02—Impregnation, coating or precipitation
- B01J37/0215—Coating
- B01J37/0221—Coating of particles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
- B01J37/34—Irradiation by, or application of, electric, magnetic or wave energy, e.g. ultrasonic waves ; Ionic sputtering; Flame or plasma spraying; Particle radiation
- B01J37/341—Irradiation by, or application of, electric, magnetic or wave energy, e.g. ultrasonic waves ; Ionic sputtering; Flame or plasma spraying; Particle radiation making use of electric or magnetic fields, wave energy or particle radiation
- B01J37/344—Irradiation by, or application of, electric, magnetic or wave energy, e.g. ultrasonic waves ; Ionic sputtering; Flame or plasma spraying; Particle radiation making use of electric or magnetic fields, wave energy or particle radiation of electromagnetic wave energy
- B01J37/345—Irradiation by, or application of, electric, magnetic or wave energy, e.g. ultrasonic waves ; Ionic sputtering; Flame or plasma spraying; Particle radiation making use of electric or magnetic fields, wave energy or particle radiation of electromagnetic wave energy of ultraviolet wave energy
Abstract
본 발명은 광촉매 막 및 그 제조 방법에 관한 것으로서, 본 발명은 기판과, 상기 기판 위에 도포된 유브이 경화 수지와, 상기 유브이 경화 수지에 의해 기판 상에 부착되는 다수의 하드 입자와, 상기 하드 입자들 사이에 삽입되어 적층된 상태로 상기 기판에 부착된 다수의 광촉매 입자를 포함하여 구성됨을 특징으로 하는 광촉매 막을 제공함으로써 고온의 열처리를 하지 않고도 뛰어난 경도를 갖게 되어 광촉매 특성인 분해력과 초친수성이 지속적으로 유지되고 실외환경에서의 사용상의 제한도 없어지도록 한 것이다.The present invention relates to a photocatalyst film and a method of manufacturing the same, the present invention relates to a substrate, a UV cured resin coated on the substrate, a plurality of hard particles attached to the substrate by the UV cured resin, and the hard particles By providing a photocatalyst film comprising a plurality of photocatalyst particles attached to the substrate in a state of being inserted between the laminated state to have an excellent hardness without the heat treatment of high temperature, the decomposition power and super hydrophilic properties of the photocatalyst continuously It is maintained so that the restrictions on use in the outdoor environment are eliminated.
Description
본 발명은 광촉매 막 및 그 제조 방법에 관한 것으로서, 특히 고온의 열처리를 하지 않고도 열악한 실외환경에서 견딜 수 있을 만큼 뛰어난 경도를 갖게 되는 광촉매 막 및 그 제조 방법에 관한 것이다.BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a photocatalyst film and a method of manufacturing the same, and more particularly, to a photocatalyst film and a method for producing the same, which have excellent hardness enough to withstand harsh outdoor environments without high temperature heat treatment.
최근 광촉매에 관한 활발한 연구와 함께 상품화가 서서히 진행되고 있다. 가장 주목받고 있는 광촉매인 이산화티탄(TiO2)을 예로 들면, 상기 이산화티탄에 광에너지가 가해지면 가전자대의 전자가 전도대로 여기되면서 가전자대에 정공을 만들게 된다. 이때, 여기된 전자가 생성된 정공이 산화 환원 반응을 일으키면서 광촉매 특성이 나타난다.Recently, with the active research on photocatalyst, commercialization is progressing slowly. For example, titanium dioxide (TiO 2 ), which is the photocatalyst most attracting attention, is applied to the titanium dioxide, and when light energy is applied, electrons in the valence band are excited as the conduction band, thereby making holes in the valence band. In this case, photocatalyst characteristics appear as holes generated by excited electrons cause redox reactions.
상기한 광촉매의 특성은 전자와 정공의 반응에 따라 크게 분해력과 초친수성 두 가지로 구분되는데, 분해력의 경우에는 공기중의 산소가 전자와 반응하고 수증기가 정공과 반응하는 과정에서 분해력이 뛰어난 활성산소가 발생되어 표면에 흡착되는 유기물이 분해되게 된다.The characteristics of the photocatalyst are classified into two types of decomposition and super hydrophilicity according to the reaction of electrons and holes.In the case of decomposition, oxygen in the air reacts with the electrons and water vapor reacts with the holes. Is generated to decompose the organic matter adsorbed on the surface.
반면에, 초친수성의 경우에는 이산화티탄을 구성하고 있는 2개의 산소중 하나가 공기중의 수증기와 반응하는 과정에서 OH 친수기가 표면에 생성되어 물과의 친수력이 좋아지게 된다.On the other hand, in the case of super hydrophilicity, OH hydrophilic groups are formed on the surface of one of two oxygen constituting titanium dioxide and react with water vapor in the air, thereby improving hydrophilicity with water.
상기한 바와 같은 광촉매 특성을 이용하기 위한 최근 연구로는 분해력을 이용하여 방오, 항균, 탈취 등의 환경 정화를 수행하거나 초친수성을 이용하여 자동차의 미러나 욕실의 거울 등에 방운 기능을 부여하는 것이 있다.Recent studies for utilizing the photocatalytic properties as described above include environmental protection such as antifouling, antibacterial and deodorization using decomposing power, or imparting anti-fog function to a mirror of a car or a mirror of a bathroom using super hydrophilicity. .
이외에도 상기한 광촉매를 각종 실외환경, 즉 대기 및 수분에 항시 노출된 장소에서 사용되는 간판, 신호등, 방음벽, 각종 건축자재를 포함한 건축물의 오염 방지 또는 오염된 공기의 정화를 위한 수단으로서 응용하기 위한 연구가 활발하게 진행되고 있다.In addition, the study is to apply the photocatalyst as a means for preventing pollution of the building including the signboards, traffic lights, soundproof walls, and various building materials used in various outdoor environments, that is, places exposed to air and moisture at all times. Is actively underway.
도 1은 종래 기술에 따른 광촉매 막이 도시된 단면도이고, 도 2는 종래 기술에 따른 광촉매 막의 제조 방법이 도시된 구성도이다.1 is a cross-sectional view showing a photocatalyst film according to the prior art, Figure 2 is a block diagram showing a manufacturing method of the photocatalyst film according to the prior art.
상기 도 1을 참조하면, 종래 기술에 따른 광촉매 막은 기판(1) 위에 이산화티탄 입자(3)들이 적층되어 부착된 구조로 상기 기판(1)에 도포되어 있다.Referring to FIG. 1, the photocatalyst film according to the related art is applied to the substrate 1 in a structure in which titanium dioxide particles 3 are stacked and attached to the substrate 1.
상기와 같이 구성된 종래의 광촉매 막은 도 2에 도시된 바와 같이, 기판(1)을 이산화티탄 입자(3)들이 섞여있는 수용액(5) 속에 디핑(Dipping)하면 상기 이산화티탄 입자(3)들이 상기 기판(1) 위에 적층되어 부착되는 방식으로 기판(1)에 도포되게 된다.In the conventional photocatalyst film configured as described above, as shown in FIG. 2, when the substrate 1 is dipped into an aqueous solution 5 in which titanium dioxide particles 3 are mixed, the titanium dioxide particles 3 are formed on the substrate. (1) is applied to the substrate 1 in such a way that it is laminated and attached on it.
그러나, 상기와 같은 종래의 광촉매 막은 구조상 기판(1)에 대한 이산화티탄 입자(3)들의 부착 및 접착력이 약하기 때문에 각종 오염물질, 먼지, 태양열 등에 노출되는 실외 환경에서 사용되는 경우 시간이 경과함에 따라 상기 이산화티탄 입자(3)들의 박리 및 열화 현상이 발생되어 광촉매 특성인 분해력과 초친수성이 급격히 저하되는 문제점이 있었다.However, since the conventional photocatalyst film has a weak adhesion and adhesion of the titanium dioxide particles 3 to the substrate 1 in structure, when used in an outdoor environment exposed to various pollutants, dust, solar heat, etc., as time passes, Peeling and deterioration of the titanium dioxide particles (3) occurred, there was a problem that the decomposition power and the superhydrophilic properties of the photocatalyst rapidly decreases.
즉, 광촉매 특성인 분해력과 초친수성은 이산화티탄이 갖는 고유 특성으로서, 상기한 종래의 광촉매 막은 이산화티탄 입자(3)가 기판(1)으로부터 박리되기시작되면 광촉매 막의 분해력과 초친수성도 떨어지게 되므로 그 경도를 고려할 때 상기 이산화티탄 입자(3)의 박리 및 열화를 촉진하는 실외 환경에서는 사용상의 제한이 큰 문제점이 있었다.In other words, the photocatalytic properties of decomposition and superhydrophilicity are inherent properties of titanium dioxide. The conventional photocatalyst film is degraded in the photocatalytic film and the superhydrophilic property when the titanium dioxide particles 3 begin to peel off from the substrate 1. Considering the hardness, there is a big problem in the use in the outdoor environment to promote the peeling and deterioration of the titanium dioxide particles (3).
특히, 상기 기판(1)으로 플라스틱을 사용하는 경우에는 기판(1)에 광촉매 막의 경도 향상을 위한 고온의 열처리를 행하는 경우 상기 기판(1)이 열에 의해 심하게 변형되거나 녹을 우려가 있고, 이러한 기판(1)의 열변형 및 녹음을 방지하기 위해 저온의 열처리를 하면 충분한 경도를 얻을 수 없게 되어 더욱더 문제가 심각해지게 된다.In particular, when plastic is used as the substrate 1, the substrate 1 may be severely deformed or melted by heat when the high temperature heat treatment is performed to improve the hardness of the photocatalytic film. In order to prevent heat deformation and greening in 1), if the low temperature heat treatment is performed, sufficient hardness cannot be obtained, and the problem becomes more serious.
본 발명은 상기와 같은 문제점을 해결하기 위하여 안출된 것으로서, 고온의 열처리를 하지 않고도 뛰어난 경도를 갖게 되어 광촉매 특성인 분해력과 초친수성이 지속적으로 유지되고 실외환경에서의 사용상의 제한도 없어지도록 하는 광촉매 막 및 그 제조 방법을 제공하는데 그 목적이 있다.The present invention has been made to solve the above problems, and has an excellent hardness without performing a high temperature heat treatment, so that the photocatalytic properties such as decomposition and superhydrophilic properties are continuously maintained, and the photocatalyst is also eliminated in the outdoor environment. It is an object of the present invention to provide a membrane and a method of manufacturing the same.
도 1은 종래 기술에 따른 광촉매 막이 도시된 단면도,1 is a cross-sectional view showing a photocatalyst film according to the prior art,
도 2는 종래 기술에 따른 광촉매 막의 제조 방법이 도시된 구성도,2 is a block diagram showing a method for manufacturing a photocatalyst film according to the prior art,
도 3은 본 발명에 따른 광촉매 막이 도시된 단면도,3 is a cross-sectional view showing a photocatalyst film according to the present invention;
도 4는 본 발명에 따른 광촉매 막의 제조 방법이 도시된 구성도,4 is a configuration diagram showing a method of manufacturing a photocatalyst film according to the present invention;
도 5는 종래 기술과 본 발명에 따라 제조된 광촉매 막의 경도 특성이 나타난 그래프이다.5 is a graph showing the hardness characteristics of the photocatalyst film prepared according to the prior art and the present invention.
<도면의 주요 부분에 대한 부호의 설명><Explanation of symbols for the main parts of the drawings>
51 : 기판 53 : 유브이 경화 수지51: substrate 53: UV cured resin
55 : 하드 입자 57 : 유브이 광55: Hard Particles 57: UV Light
59 : 광촉매 입자 61 : 수용액59 photocatalyst particle 61: aqueous solution
상기의 목적을 달성하기 위한 본 발명에 따르면, 기판과, 상기 기판 위에 도포된 유브이 경화 수지와, 상기 유브이 경화 수지에 의해 기판 상에 부착되는 다수의 하드 입자와, 상기 하드 입자들 사이에 삽입되어 적층된 상태로 상기 기판에 부착된 다수의 광촉매 입자를 포함하여 구성됨을 특징으로 하는 광촉매 막이 제공된다.According to the present invention for achieving the above object, a substrate, and a yub coated on the substrate is inserted between the cured resin, a plurality of hard particles attached on the substrate by the yuv cured resin, and the hard particles A photocatalyst film is provided comprising a plurality of photocatalyst particles attached to the substrate in a stacked state.
또한, 본 발명에 의하면, 기판 위에 경도가 우수한 하드 입자들을 다수 부착시키는 제 1과정과, 상기 제 1과정에서 부착된 하드 입자들 사이에 다수의 광촉매입자들이 삽입되어 적층된 형태로 부착되도록 상기 기판을 광촉매 입자들이 섞여 있는 수용액에 디핑시켜 기판에 광촉매를 도포하는 제 2과정으로 이루어지는 것을 특징으로 하는 광촉매 막의 제조 방법이 제공된다.In addition, according to the present invention, a first process of attaching a plurality of hard particles having excellent hardness on the substrate, and a plurality of photocatalyst particles are inserted between the hard particles attached in the first process is inserted in a stacked form to attach the substrate There is provided a method for producing a photocatalyst film, comprising a second step of applying a photocatalyst to a substrate by dipping in an aqueous solution in which photocatalyst particles are mixed.
이하, 본 발명의 실시 예를 첨부한 도면에 의거하여 상세하게 설명하면 다음과 같다.Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings.
도 3은 본 발명에 따른 광촉매 막이 도시된 단면도이고, 도 4는 본 발명에 따른 광촉매 막의 제조 방법이 도시된 구성도이고, 도 5는 종래 기술과 본 발명에 따라 제조된 광촉매 막의 경도 특성이 나타난 그래프로서, (a)가 종래의 경우이고, (b)가 본 발명의 경우이다.3 is a cross-sectional view showing a photocatalyst film according to the present invention, Figure 4 is a block diagram showing a method for producing a photocatalyst film according to the present invention, Figure 5 shows the hardness characteristics of the photocatalyst film prepared according to the prior art and the present invention As a graph, (a) is a conventional case and (b) is a case of the present invention.
상기 도 3을 참조하면, 본 발명에 따른 광촉매 막은 기판(51) 위에 부착되고 경도가 우수한 다수의 하드 입자(55)와, 상기 하드 입자(55)들 사이에 삽입되어 적층된 형태로 상기 기판(51)에 부착된 다수의 광촉매 입자(59)로 이루어진다.Referring to FIG. 3, the photocatalytic film according to the present invention is attached to the substrate 51 and has a plurality of hard particles having excellent hardness, and inserted into and stacked between the hard particles 55. It consists of a plurality of photocatalyst particles 59 attached to 51.
여기서, 상기 하드 입자(55)들은 기판(51) 위에 도포된 유브이 경화 수지()에 의해 상기 기판(51)에 부착된다.Here, the hard particles 55 are attached to the substrate 51 by a cured resin (Yu) coated on the substrate 51.
또한, 상기 하드 입자(55)들은 대기중에 포함된 각종 입자들보다는 작은 0.05 내지 5㎛의 크기를 갖는다.In addition, the hard particles 55 have a size of 0.05 to 5 μm smaller than those of various particles included in the atmosphere.
상기와 같이 구성된 광촉매 막을 성막시키기 위한 본 발명에 따른 광촉매 막의 제조 방법을 도 4를 참조하여 설명하면 다음과 같다.Referring to FIG. 4, a method of manufacturing a photocatalyst film according to the present invention for forming a photocatalyst film configured as described above is as follows.
먼저, 기판(51) 위에 경도가 우수한 하드 입자(55)들을 다수 부착시켜야 하는데, 이를 위한 첫 번째 단계로서 스핀 코팅(Spin Coating) 방법이나 스프레이 코팅(Spray coating)방법을 이용하여 상기 기판(51) 위에 유브이 경화 수지(53)를 일정 두께만큼 도포한다.First, a plurality of hard particles 55 having excellent hardness must be attached onto the substrate 51. As a first step, the substrate 51 is formed by using a spin coating method or a spray coating method. The UV cured resin 53 is applied on the film by a predetermined thickness.
이후, 상기 기판(51)으로 분사노즐(N)을 통해 경도가 우수한 하드 입자(55)들을 분사하여 상기 하드 입자(55)들을 유브이 경화 수지(53)에 부착시킨다. 이때, 상기 각 하드 입자(55)들은 분사되는 압력에 의해 상기 유브이 경화 수지(53) 속에 삽입되거나 유브이 경화 수지(53) 표면에 부착되게 된다.Thereafter, the hard particles 55 having excellent hardness are sprayed onto the substrate 51 through the spray nozzle N to attach the hard particles 55 to the UV cured resin 53. At this time, the hard particles 55 are inserted into the cured resin 53 or attached to the surface of the cured resin 53 by the spraying pressure.
상기와 같이 유브이 경화 수지(53)에 하드 입자(55)들이 부착되면 상기 기판(51)을 유브이 광(57)에 노출시켜 상기 유브이 경화 수지(53)를 경화시킨다. 이렇게 유브이 경화 수지(53)가 경화되면 상기 유브이 경화 수지(53)에 부착되어 있는 하드 입자(55)들의 부착 상태가 견고하게 된다.When the hard particles 55 are attached to the UV cured resin 53 as described above, the substrate 51 is exposed to the UV light 57 to cure the UV cured resin 53. When the cured resin 53 is hardened in this manner, the attached state of the hard particles 55 attached to the cured resin 53 becomes firm.
이후, 상기 기판(51)을 광촉매 입자(59)들이 섞여 있는 수용액(61)에 디핑시켜 상기 각 하드 입자(55)들 사이에 상기 광촉매 입자(59)들이 삽입되어 적층된 상태로 부착되도록 기판(51)에 광촉매를 도포한다.Subsequently, the substrate 51 is dipped in an aqueous solution 61 in which the photocatalytic particles 59 are mixed so that the photocatalytic particles 59 are inserted and stacked between the hard particles 55 so as to be attached in a stacked state. Apply photocatalyst to 51).
상기의 과정을 거치면 고온의 열처리를 하지 않고도 각종 오염물질, 먼지, 태양열 등에 노출되는 열악한 실외환경에서도 충분히 견딜 수 있는 경도를 갖는 광촉매 막을 성막시킬 수 있다.Through the above process, it is possible to form a photocatalyst film having a hardness that can be sufficiently tolerated in a poor outdoor environment exposed to various pollutants, dust, solar heat, etc. without performing a high temperature heat treatment.
상기에서, 광촉매로는 TiO2, ZnO, SrTiO3, CdS, CaP, InP, In2O3, CaAs, BaTiO3, K2NbO3, Fe2O3, Ta2O5, WO3SaO2Bi2O3, NiO, Cu2O, SiC, SiO2, MoS2, InPb, RuO2, CeO2등이 사용된다.In the above, as the photocatalyst, TiO 2 , ZnO, SrTiO 3 , CdS, CaP, InP, In 2 O 3 , CaAs, BaTiO 3 , K 2 NbO 3 , Fe 2 O 3 , Ta 2 O 5 , WO 3 SaO 2 Bi 2 O 3 , NiO, Cu 2 O, SiC, SiO 2 , MoS 2 , InPb, RuO 2 , CeO 2, and the like are used.
또한, 상기 광촉매 막이 성막되는 기판(51)으로는 유리나 플라스틱류, 또는 알루미늄이나 스테인레스와 같은 금속류가 사용된다.As the substrate 51 on which the photocatalyst film is formed, glass or plastics, or metals such as aluminum or stainless steel are used.
특히, 본 발명은 경도 향상을 위해 고온의 열처리를 하면 그 열에 의해 변형되거나 녹을 우려가 있는 플라스틱 기판에 매우 유용하다.In particular, the present invention is very useful for plastic substrates that may be deformed or melted by heat when high temperature heat treatment is performed to improve hardness.
즉, 본 발명에 따라 플라스틱 기판에 광촉매 막을 성막하면 도 5에 도시된 바와 같이 종래 기술에 따라 제조된 광촉매 막보다 월등히 뛰어난 경도를 갖는 광촉매 막을 얻을 수 있다.That is, when the photocatalyst film is formed on the plastic substrate according to the present invention, as shown in FIG. 5, a photocatalyst film having a hardness superior to that of the photocatalyst film prepared according to the prior art can be obtained.
이때, 종래 기술에 따라 플라스틱 기판에 성막된 후 경도 향상을 위한 저온의 열처리 과정을 거친 광촉매 막은 통상 2B이하의 경도를 갖고, 본 발명에 의해 제조된 광촉매 막은 실외환경에서도 사용상의 제한 없이 응용 가능한 4H이상의 경도를 갖게 된다.At this time, the photocatalyst film formed on a plastic substrate according to the prior art and subjected to a low temperature heat treatment process for improving the hardness usually has a hardness of 2B or less, and the photocatalyst film prepared according to the present invention is applicable to outdoor environments without limitation on use. It has the above hardness.
마지막으로, 상기 기판(51) 위에 광촉매 막을 성막시킨 후에도 기판(51)의 원래 색상을 그대로 유지하고자 하는 경우에는 상기 하드 입자(55)로써 투명 SiO2와 같은 투명한 재료를 사용하면 된다.Finally, when the original color of the substrate 51 is to be maintained even after the photocatalyst film is formed on the substrate 51, a transparent material such as transparent SiO 2 may be used as the hard particles 55.
상기와 같은 본 발명에 따른 광촉매 막 및 그 제조 방법은, 고온의 열처리를 하지 않고도 뛰어난 경도를 갖게 되므로 각종 오염물질, 먼지, 태양열에 노출되는 열악한 실외환경에서도 광촉매 입자(59)의 박리 및 열화가 방지되어 광촉매 특성인 분해력과 초친수성이 지속적으로 유지되고 실외환경에서의 사용상의 제한도 없어지는 이점이 있다.As described above, the photocatalyst film and the method of manufacturing the same have excellent hardness without high temperature heat treatment, so that the photocatalyst particles 59 may be peeled and deteriorated even in poor outdoor environments exposed to various pollutants, dust, and solar heat. Since it is prevented, the photocatalytic properties of decomposability and superhydrophilicity are continuously maintained, and there is an advantage that the restriction on use in the outdoor environment is also eliminated.
즉, 본 발명은 마찰이 필연적인 전자기기, 건축자재 등의 표면코팅이나 실외 건축자재 및 교통 신호등, 간판 외에도 오염물질 분해용 처리시설 등의 열악한 환경에서 사용할 수 있는 광촉매 막의 성막이 가능하여 광촉매 응용 분야가 큰폭으로 확대되는 이점이 있다.That is, the present invention is capable of forming a photocatalytic film that can be used in harsh environments such as surface coatings of inevitable friction, such as electronic equipment, building materials, outdoor building materials, traffic signals, signs, and other treatment facilities for contaminant decomposition. There is an advantage that the field is greatly expanded.
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Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1176834A (en) * | 1997-09-11 | 1999-03-23 | Toto Ltd | Photocatalytic hydrophilic component and photocatalytic hydrophilic coated composition |
| JPH1191030A (en) * | 1997-09-25 | 1999-04-06 | Toto Ltd | Hydrophilic member with photocatalystic property |
| KR20000058790A (en) * | 2000-06-29 | 2000-10-05 | 김형호 | Holding method titanium dioxides photocatalytic at lamination |
| KR20020009105A (en) * | 2000-07-24 | 2002-02-01 | 박경주 | Producing method of fixed the anatase form Tio2 powder |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1176834A (en) * | 1997-09-11 | 1999-03-23 | Toto Ltd | Photocatalytic hydrophilic component and photocatalytic hydrophilic coated composition |
| JPH1191030A (en) * | 1997-09-25 | 1999-04-06 | Toto Ltd | Hydrophilic member with photocatalystic property |
| KR20000058790A (en) * | 2000-06-29 | 2000-10-05 | 김형호 | Holding method titanium dioxides photocatalytic at lamination |
| KR20020009105A (en) * | 2000-07-24 | 2002-02-01 | 박경주 | Producing method of fixed the anatase form Tio2 powder |
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