KR100404331B1 - 카제인 용액 조성물 - Google Patents
카제인 용액 조성물 Download PDFInfo
- Publication number
- KR100404331B1 KR100404331B1 KR10-2001-0019277A KR20010019277A KR100404331B1 KR 100404331 B1 KR100404331 B1 KR 100404331B1 KR 20010019277 A KR20010019277 A KR 20010019277A KR 100404331 B1 KR100404331 B1 KR 100404331B1
- Authority
- KR
- South Korea
- Prior art keywords
- casein
- powder
- sensitivity
- casein solution
- alkali
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/085—Photosensitive compositions characterised by adhesion-promoting non-macromolecular additives
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0382—Macromolecular compounds which are rendered insoluble or differentially wettable the macromolecular compound being present in a chemically amplified negative photoresist composition
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
- H01J29/02—Electrodes; Screens; Mounting, supporting, spacing or insulating thereof
- H01J29/06—Screens for shielding; Masks interposed in the electron stream
- H01J29/07—Shadow masks for colour television tubes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
- H01J29/02—Electrodes; Screens; Mounting, supporting, spacing or insulating thereof
- H01J29/06—Screens for shielding; Masks interposed in the electron stream
- H01J29/07—Shadow masks for colour television tubes
- H01J29/073—Mounting arrangements associated with shadow masks
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Materials For Photolithography (AREA)
Abstract
Description
Claims (3)
- 섀도우마스크와 리드프레임에서 고해상도 패턴을 만들기 위해 사용되는 네가티브형 포토레지스트의 주원료인 카제인 용액 조성물에 있어서,카제인 분말에 대하여 3~20 중량%의 비휘발성 알칼리인 붕사와 카제인 분말에 대하여 1~10 중량%의 휘발성 알칼리인 암모니아수를 혼합하여 카제인 용액의 pH를 7.7~8.3의 범위로 감도조절을 하는 것을 특징으로 하는 카제인 용액 조성물.
- 제1항에 있어서,상기 카제인 용액에 박테리아의 형성억제를 위하여 페놀과 페놀 화합물 중 적어도 어느 하나로 된 방부제를 카제인 분말에 대해 0.5~1 중량% 첨가하는 것을 특징으로 하는 카제인 용액 조성물.
- 제1항에 있어서,상기 카제인 분말의 분산강화를 위하여 비이온계의 계면활성제를 카제인 분말에 대하여 0.1~0.5 중량% 함량으로 혼합하도록 함을 특징으로 하는 카제인 용액 조성물.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR10-2001-0019277A KR100404331B1 (ko) | 2001-04-11 | 2001-04-11 | 카제인 용액 조성물 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR10-2001-0019277A KR100404331B1 (ko) | 2001-04-11 | 2001-04-11 | 카제인 용액 조성물 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20020080099A KR20020080099A (ko) | 2002-10-23 |
| KR100404331B1 true KR100404331B1 (ko) | 2003-11-03 |
Family
ID=27700708
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR10-2001-0019277A Expired - Fee Related KR100404331B1 (ko) | 2001-04-11 | 2001-04-11 | 카제인 용액 조성물 |
Country Status (1)
| Country | Link |
|---|---|
| KR (1) | KR100404331B1 (ko) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100512077B1 (ko) * | 2002-06-04 | 2005-09-05 | 일동화학 주식회사 | 포토레지스트용 카제인 수지조성물 |
| KR100585536B1 (ko) * | 2004-06-07 | 2006-05-30 | 주식회사 루밴틱스 | 카세인을 포함하는 네가티브형 포토레지스트 조성물 및이의 제조방법 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS55113052A (en) * | 1979-02-24 | 1980-09-01 | Konishiroku Photo Ind Co Ltd | Electrophotographic receptor |
| US4865953A (en) * | 1987-09-28 | 1989-09-12 | Rca Licensing Corp. | Method for making a stencil with a borax-free, low-dichromate, casein photoresist composition |
| KR20010039669A (ko) * | 1999-07-13 | 2001-05-15 | 하타케야마 시게미쓰 | 카세인수용액 |
-
2001
- 2001-04-11 KR KR10-2001-0019277A patent/KR100404331B1/ko not_active Expired - Fee Related
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS55113052A (en) * | 1979-02-24 | 1980-09-01 | Konishiroku Photo Ind Co Ltd | Electrophotographic receptor |
| US4865953A (en) * | 1987-09-28 | 1989-09-12 | Rca Licensing Corp. | Method for making a stencil with a borax-free, low-dichromate, casein photoresist composition |
| KR20010039669A (ko) * | 1999-07-13 | 2001-05-15 | 하타케야마 시게미쓰 | 카세인수용액 |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20020080099A (ko) | 2002-10-23 |
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