KR100346755B1 - Apparatus and method for photo-induced process without using an optical window - Google Patents

Abstract

Disclosed are an apparatus and a method for solving the problem of blur of a light source surface and blur of an optical window in a photoexcitation process. Photoexcited apparatus of the present invention, the light emitted from the light source installed in close contact with the top of the reaction chamber capable of vacuum exhaust decomposes the reaction gas in the reaction chamber to photochemical vapor deposition, oxidation, etching, annealing, surface modification and In order to prevent the blur of the light source surface from which light is emitted, a thin heat-resistant transparent film wound in a roll shape is installed horizontally in a space inside the reaction chamber between the light source and the substrate. It is designed to prevent the blur of the surface of the light source by mechanically sealing the space between the light source and the transparent film to prevent the reaction gas from accessing the space between the light source and the transparent film. According to the present invention, it is possible not only to effectively utilize the light emitted from the light source, but also to implement a photoexcited process apparatus with significantly improved operation efficiency than the existing apparatus.

Description

Apparatus and method for photo-induced process without using an optical window}

The present invention relates to an apparatus and method for solving the problem of blurring of a light source surface or blurring of an optical window in a photo-induced process. More specifically, the present invention relates to the reaction of photoreaction gas in the reaction chamber of a photoexcited process apparatus, that is, the deposition of a material by photoexcitation, i.e. photochemical vapor deposition (Photo CVD). The present invention relates to a device and a method for preventing a material produced by decomposition or a material produced by photoexcitation oxidation or etching from being attached to a light source surface or an optical window. Photoexcitation processes include deposition, oxidation, etching, annealing, surface modification and cleaning of materials to the substrate. Here, optical CVD will be described as a representative example.

Conventional optical CVD apparatuses are shown in FIGS. 1 and 2. The device of FIG. 1 is presented in US Pat. No. 4,654,226, which describes a prior art that prevents blur of an optical window. Referring to FIG. 1, light B emitted from a plurality of light sources 100 provided in the atmosphere outside the reaction chamber S passes through the optical window 110 and is then irradiated into the reaction chamber S. At this time, when the reaction gas flows into the reaction chamber S in the direction of the arrow ←, the reaction gas is decomposed by the irradiated light, and a chemical vapor deposition thin film by photoexcitation is formed on the substrate 120. Meanwhile, a flexible curtain 130 is installed between the substrate 120 and the optical window 110, and the flexible transparent film 130 is continuously wound at a constant speed in a state in which a roll is wound around the left roller. It is supplied and wound on the roller on the right side. At this time, the flexible transparent membrane is in close contact with the uppermost edge of the wall surface of the reaction chamber standing vertically to prevent the reaction gas in the reaction chamber (S) from approaching the optical window (110). However, since the sealing property between the uppermost edge of the reaction chamber vertical wall surface and the flexible transparent film 130 is not perfect, the reaction gas may leak into this gap and blur the optical window 110. Therefore, in the apparatus of FIG. 1, the optical window purge gas is flowed between the flexible transparent film 130 and the optical window 110 in the direction of the arrow to prevent blur of the optical window.

2 is a conceptual diagram illustrating a process of replacing a blurred optical window in another conventional optical CVD apparatus, which is disclosed in US Pat. No. 5,810,930. Moreover, this US patent discloses a method for replacing a blurred optical window with a cleaned optical window using an optical window replacement device and a thin film on a large-area substrate using an optical CVD device equipped with an optical window replacement device. Also described are ways in which it can be formed. The operation of this apparatus is described below with reference to FIG. When the optical CVD process is completed while the optical window 200 is in close contact with the edge of the optical hole above the reaction chamber 210 by the mechanical pressing force, the optical window that is blurred by the attachment of the reaction product and the reaction gas is a mechanical drive device. It is moved to the optical window replacement chamber 220 by. Next, the gate valve 230 is closed and nitrogen gas or inert gas (N) is put into the replacement chamber 220 through the first air inlet 222 to make the interior thereof into an atmospheric pressure state. Subsequently, the lid 240 is opened to replace the blurred optical window with the cleaned optical window 250, and then the lid 240 is closed. Then, the exhaust chamber 224 is exhausted so that the inside of the replacement chamber 220 is in a high vacuum state, the gate valve 230 is opened again, the cleaned optical window is moved to the optical window fixing chamber 260, The optical window is brought into close contact with the optical hole above the reaction chamber 210. When the process of forming a thin film on the substrate 270 by optical CVD is carried out, the reaction gas is supplied to the reaction chamber 210 through the first air inlet 222 or the second air inlet 226. And irradiating light from the light source 280 in a state in which the pressure difference between the two chambers 210 and 260 is removed while flowing nitrogen gas or inert gas into the fixed chamber 260 at a desired flow rate, respectively. According to this method, since the optical window is replaced while the optical window fixing chamber 260 and the reaction chamber 210 are completely isolated from the optical window replacement chamber 220 by the gate valve 230, the reaction chamber 210 is replaced. It is not permanently exposed to the atmosphere. Therefore, since the inside of the reaction chamber 210 is not contaminated by oxygen, nitrogen, carbon, dust, etc. in the air, a high quality thin film can be formed. In addition, since there is no friction between the optical window surface to which the thin film is attached and other parts during the detachment and movement of the optical window, there is no fear of dust generation, so that the reaction chamber can be kept clean at all times. In addition, since the light source can be put in a vacuum and there is little pressure difference between both sides of the optical window when forming a thin film, the optical window can be made thin and a device capable of forming a large area thin film can be made.

As described above, in the apparatus of FIG. 1, the flexible transparent membrane is in close contact with the uppermost edge of the vertical wall surface of the reaction chamber to isolate the reaction chamber space from the space in which the cleaning gas for purging the window flows between the flexible transparent membrane and the optical window. Since the degree is not perfect, blurring of the optical window cannot be effectively prevented during thin film deposition. In addition, when the flexible transparent membrane is wound to replace a new one during the thin film deposition or after the deposition is completed, dust is generated due to friction with the upper edge of the reaction chamber wall that is in close contact with the flexible transparent membrane. In addition, in this device, the optical window must be thick to withstand atmospheric pressure, and the optical window cleaning purge gas flows between the optical window and the flexible transparent film, so that the optical absorption loss due to the optical window and the optical absorption loss due to the cleaning purge gas are reduced. It cannot be ignored. This problem becomes more serious as the device gets larger, so it is almost impossible to manufacture a large-area device with a structure in which a light source is placed in the air and irradiated with light through the optical window into the reaction chamber. In addition, such a structure in which the light source is located in the atmosphere cannot use a light source that emits vacuum ultraviolet rays. Accordingly, in order to solve such a problem, US Patent No. 4,654,226 also refers to a structure in which a light source is placed in a space in which a cleaning gas for purging an optical window flows. This eliminates the need for an optical window and enables the manufacture of large area devices and the use of vacuum ultraviolet light sources. However, even in a structure in which the light source is placed in a vacuum, the surface of the light source cannot be prevented from being clouded by the material produced by the photochemical reaction due to the incomplete sealing between the reaction chamber and the flexible transparent film as described above.

On the other hand, according to the apparatus shown in Fig. 2, a large area thin film can be deposited. In this case, however, the optical window should also be large, but the thinner optical window is more likely to be damaged and difficult to handle in the physical cleaning process. Therefore, the thickness of the optical window should be thickened to some extent. Increasing the light absorption loss in the window is inevitable. In addition, in order to replace the optical window, the vacuum efficiency of the optical window replacement chamber must be broken and replaced with a cleaned optical window, and then evacuated to high vacuum again, thereby reducing the operation efficiency of the apparatus.

Therefore, the technical problem of the present invention solves problems such as blur of optical window and light source surface, loss of light absorption by optical window and purge gas for cleaning, dust generation by moving parts such as flexible transparent film and emission from light source. It is to provide a photoexcited process apparatus that can effectively utilize the light.

Another technical problem of the present invention is to provide a photoexcited process apparatus with significantly improved operation efficiency than the existing apparatus.

1 is a schematic configuration diagram of a conventional photochemical vapor deposition apparatus using a flexible transparent film to prevent blur of an optical window;

2 is a conceptual diagram illustrating a process of replacing a blurred optical window in another conventional photochemical vapor deposition apparatus; And

3 is a schematic configuration diagram of a photochemical vapor deposition apparatus according to an embodiment of the present invention;

4 is a view for explaining a process of the deposition process in the photochemical vapor deposition apparatus shown in FIG. And

Figure 5 is a detailed cross-sectional view for explaining another connection method of the light source and the flange in the photochemical vapor deposition apparatus according to another embodiment of the present invention.

In the optical excitation process apparatus of the present invention for solving the above technical problem, the light emitted from the light source installed in close contact with the upper plate of the reaction chamber capable of vacuum exhaust decomposes the reaction gas in the reaction chamber, photochemical vapor deposition on the substrate surface, Oxidation, etching, annealing, surface modification, and cleaning processes, in which a thin transparent film wound in the form of a roll is placed horizontally in the reaction chamber between the light source and the substrate to prevent blur of the light source surface from which light is emitted. It is designed to prevent blur of the surface of the light source by mechanically sealing the space between the light source and the transparent film so that the reaction gas does not approach the space between the light source and the transparent film when the thin film is deposited. After the thin film deposition is finished, the closed space is released and exhausted in a high vacuum together with the reaction chamber. At this time, since the transparent film is not in contact with the light source or the O-ring for sealing, but is in the air, the transparent film portion can be rolled and replaced with a clean part without fear of dust generation. . Since the conventional optical window and the optical window cleaning purge gas are not used, this method can effectively utilize the light emitted from the light source by eliminating the light absorption loss caused by the optical window and the cleaning gas. In other words, an optical excitation process apparatus according to the first aspect of the present invention for solving the above technical problem comprises: a reaction chamber housing having an opening through which light passes through a central portion thereof; A light source having a flat light emitting surface, the light emitting surface facing the opening such that light can be irradiated into the reaction chamber through the opening; A heat-resistant transparent film horizontally disposed in a space between the light emitting surface of the light source and the opening of the reaction chamber and capable of transmitting light from the light source; An opening is located between the light emitting surface of the light source and the reaction chamber opening, and has an opening in the center of the upper and lower plates, and the central axis of the upper and lower openings coincides with the light emitting surface and the reaction chamber central axis. A compartment housing for installing, supplying and receiving the transparent film, the lower plate being coupled with the reaction chamber upper plate; A flange welded around the center opening of the light emitting surface edge of the light source so as to be sealed to the upper opening of the compartment; A stretchable bellows or a welded bellows having flanges at both ends joining the flange welded around the opening of the transparent film compartment upper plate and the flange edge welded to the light source; The flange, to which the light source is welded, the stretchable part, the transparent film storage chamber housing, and the reaction chamber housing are sequentially combined to form a closed space. During the photoexcitation process, the heat resistant transparent film is pushed down to react the reaction. A driving means for moving the light source to which the flange is welded up and down so as to be in close contact with the seal opening so that the reaction gas in the reaction chamber does not leak into the containment chamber. The sealed structure is not broken when moved. In this case, the light source group of visible light sources, infrared light sources and infrared rays in the ultraviolet region consisting of excimer lamp, deuterium discharge tube, xenon lamp, low pressure mercury lamp, etc. At least one selected from the group of light sources is preferred. And a storage chamber for winding and storing the heat-resistant transparent film exposed to the reaction chamber in a symmetrical position with respect to the axis, and a supply chamber for continuously supplying a clean transparent film, respectively. It is more preferable that the rotating shafts for releasing and supplying the rolls and storing them in the form of rolls are provided in the supply chamber and the storage chamber, respectively, and have means for rotationally driving the rotating shafts outside the supply chamber and the storage chamber, respectively. When welding the edge of the face around the center opening of the flange, a flange of stainless steel or a weldable material is welded so that the light emitting surface surface of the light source and the lower surface of the flange are on the same plane. Preferably, the light source welded to the flange. If there is a risk of damage and not tolerate atmospheric pressure, the reinforcement may be welded to some or all of the remaining outer surface of the light source except for the light emitting surface of the light source exposed to the opening of the compartment so that the light source can withstand the atmospheric pressure. . In this case, it is preferable that the material of the reinforcing material is made of stainless steel or a material which can be welded with the surface material of the light source. In addition, an O-ring is formed around the opening for adhesion of the heat resistant transparent film to the reaction chamber opening. Preferably, the lower plate of the transparent film compartment and the upper plate of the reaction chamber are joined by welding, O-ring or gaskets. The top plate and the stretchable portion are preferably joined by an O-ring or a gasket. Furthermore, a heater for supporting a material or a substrate for the photoexcitation process or for raising and adjusting the temperature of the material or the substrate is incorporated. The substrate is positioned in the reaction chamber so that the substrate can be subjected to a photoexcitation process under optimum conditions. It is preferable to include a drive device for the vertical motion, which is controlled by a vertical motion of a stand, outside the reaction chamber, and more preferably includes an expansion and contraction part so that the vacuum of the reaction chamber is not destroyed when the substrate heating support is driven. In addition, it is preferable to provide a water cooling tube or an air cooling fan on the outer wall except for the light source surface of the light source for cooling the light source. Preferably, the reaction chamber is provided with an exhaust port for exhausting. Further, the reaction chamber may be provided with an air inlet for supplying a purge gas for washing into the reaction chamber and an exhaust port for exhausting the purge gas. A vent for supplying nitrogen or an inert gas into the containment chamber and for exhausting the gas A mechanism may be provided in the storage chamber. It is also preferable that the supply chamber is provided with an opening and closing port for mounting and supplying a clean transparent film, and the storage chamber is each provided with an opening and closing port for detaching and collecting the used transparent film. In addition, an auxiliary chamber (load-lock chamber) is generally used to install the substrate on the substrate heating support of the reaction chamber for the necessary photoexcitation process and not break the vacuum of the reaction chamber when the substrate is removed from the reaction chamber after the process is completed. ) And a substrate transfer mechanism for transferring and installing the substrate between the reaction chamber and the auxiliary chamber. The gate valve between the reaction chamber and the auxiliary chamber is always closed except for the substrate transfer for installing and collecting the substrate. It is preferable to isolate the auxiliary room. The second tube of the present invention for solving the above technical problem. Photo-excitation process apparatus according to comprising: a reaction chamber housing having an opening capable of light transmission in the center and the top plate; A light source having a flat light emitting surface, the light emitting surface facing the opening such that light can be irradiated into the reaction chamber through the opening; A heat-resistant transparent film horizontally disposed in a space between the light emitting surface of the light source and the opening of the reaction chamber and capable of transmitting light from the light source; An opening is located between the light emitting surface of the light source and the reaction chamber opening, and has an opening in the center of the upper and lower plates, and the central axis of the upper and lower openings coincides with the light emitting surface and the reaction chamber central axis. A compartment housing for installing, supplying and receiving the transparent film, the lower plate being coupled with the reaction chamber upper plate; A flange for detachably fixing the light source; Coupling means for hermetically fixing the light source to the flange; An o-ring positioned at a contact portion of the light source and the flange to maintain airtightness between the light emitting surface or the light emitting edge edge wall surface of the light source and the flange; A stretchable bellows or a welded bellows having flanges at both ends joining the flange and the flange edge welded around the transparent film compartment top opening; The flange, to which the light source is fixed, the stretchable part, the transparent film storage chamber housing, and the reaction chamber housing are sequentially combined to form a closed space, and during the photoexcitation process, the heat resistant transparent film is pushed down to react the reaction. Drive means for moving the light source fixed to the flange up and down so as to be in close contact with the seal opening so that the reaction gas in the reaction chamber does not leak into the containment chamber, when the light source is moved up and down by the drive device. It is characterized in that the sealing structure is not broken. In this case, when the light source coupled to the flange with an o-ring does not endure atmospheric pressure and there is a risk of damage, the light emitting surface of the light source exposed to the opening of the compartment is excluded. The reinforcing material is welded to some or all of the remaining outer surface of the light source so that the light source can withstand atmospheric pressure. Preferably, the reinforcing material is made of stainless steel or a material that can be welded to the surface material of the light source. In addition, the flange for fixing the light source, the upper surface of the compartment, and the elastic part may have an o-ring. Or gaskets. Preferably, the substrate is placed on the substrate heating support of the reaction chamber for the necessary photoexcitation process, and in order not to break the vacuum of the reaction chamber when removing the substrate from the reaction chamber after the process is finished. A load-lock chamber, which is commonly used, is provided, and a substrate transport mechanism for transporting and installing a substrate between the reaction chamber and the auxiliary chamber is installed. It is preferable that the gate valve between the chambers is always closed to isolate the reaction chamber from the auxiliary chamber. The photoexcitation process method of the present invention for solving the problem is a light source having a flat light emitting surface for the photoexcitation process, a reaction chamber for photoexcitation process having an opening through which light is transmitted, and a blur of the light emitting surface of the light source. Photoexciting process apparatus including a storage chamber consisting of supply chambers and storage chambers respectively provided on both sides of the outside of the reaction chamber so as to store the transparent film rolls to prevent the damage, and an auxiliary chamber for storing, installing and collecting the substrates to the reaction chamber. Proceeding from: evacuating the reaction chamber, the containment chamber and the auxiliary chamber at high vacuum; The flange with the light source attached close to the O-ring provided around the upper part of the reaction chamber is vertically lifted by the light source driving device to separate the o-ring, the transparent film, and the light emitting surface of the light source separately. Spacing; Rotating the rolled transparent film into a new clean transparent film portion, rotating the roller for winding the used transparent film by an external drive, and replacing the film; Opening a gate valve between the reaction chamber and the auxiliary chamber, transferring the substrate prepared in the auxiliary chamber to the reaction chamber, and installing the substrate on the substrate heating support; Closing the gate valve to isolate the auxiliary and reaction chambers; The flange attached to the light source is lowered vertically by the light source driving device, and the transparent film is pushed down a little while the flange welded to the edge of the light emitting surface of the light source fits the O-ring around the opening of the reaction chamber top plate with the transparent film. Rendering; Putting the reaction gas into the reaction chamber through a gas supply pipe and exhausting the reaction gas through the exhaust port so that the pressure in the reaction chamber becomes a predetermined pressure; Nitrogen gas or inert gas is flowed through the intake vent and exhausted through the exhaust port so that the pressure in the transparent film supply chamber and storage compartment, that is, the containment chamber, is slightly higher than or equal to that of the reaction chamber. Preventing it from becoming; Heating and heating the substrate by a built-in heater of the substrate heating support to allow the substrate to reach a predetermined temperature; Adjusting the position of the substrate in the reaction chamber by the vertical drive unit so that the photoexcitation process can be performed under optimum conditions; Irradiating the light from the light source into the reaction chamber to activate the reaction gas, thereby performing a photoexcitation process; Turning off the light source to terminate the photoexcitation process and stopping the supply of nitrogen or inert gas and reaction gas and exhausting these gases through the exhaust port, respectively; Supplying nitrogen or an inert gas to the reaction chamber for cleaning the reaction chamber and then evacuating through the exhaust port, ie, purging the purge chamber three or four times, and then evacuating the reaction chamber and the containment chamber through the other exhaust port at high vacuum; And opening the gate valve to move the substrate to the auxiliary chamber and closing the gate valve.

Hereinafter, an optical CVD apparatus according to an embodiment of the present invention will be described in detail with reference to the accompanying drawings. Referring to FIG. 3, the apparatus of the present invention does not use a conventional optical window such as a quartz window having a high light transmittance in the ultraviolet region, and the emission surface of the light source 340 is located above the reaction chamber 350. As a structure facing the opening 311 for light transmission, a transparent heat-resistant transparent film 330 is horizontally installed between the light emitting surface of the light source 340 and the upper space of the reaction chamber 350 to blur the surface of the light source. It is designed to prevent. The upper compartment of the reaction chamber 350 is connected to the upper compartment 303 and the lower compartment having openings respectively in the center of the lower plate 304, and the transparent film rolls 310 and 312 can be stored on both sides of the compartment. The supply chamber 302 and the storage chamber 300 are provided, respectively. A clear transparent film of several tens of microns (μm) thick wound on the roll 312 of the left feed chamber 302 is passed through the rollers 324, 326, 322, 320 on both the left and right sides of the roll 310 of the right storage chamber 300. Coiled on On the other hand, the central axis of the opening provided in the center of the upper plate 303 and the lower plate 304 of the compartment housing coincides with the central axis of the light emitting surface of the light source 340 and the reaction chamber 350. In addition, the lower plate 304 is coupled to the upper side of the reaction chamber in which the opening 311 is formed. Then, the flange 306 welded around the edge of the flange 306 welded around the center opening of the light emitting surface edge of the light source 340 and the flange 308 welded around the transparent film compartment top opening in order to be installed in the upper compartment of the compartment. ) Is connected to an expansion and contraction portion 370 made of molded bellows or welded bellows having flanges at both ends. Therefore, the flange 306 with the light source, the stretchable portion 370, the transparent film compartment housing, and the reaction chamber housing are sequentially combined to form one sealed space.

When forming the thin film, as shown in FIG. 4, the flange 306 welded to the edge of the light emitting surface of the light source is moved to the transparent film (while lowering the light source 340 vertically and slightly pushing the transparent film 330 downward. 330 in close contact with the o-ring 358. At this time, the expansion and contraction portion 370 using the molded bellows (welded bellows) or welded bellows (welded bellows) is contracted to achieve the above object without breaking the vacuum of the reaction chamber. In this state, the reaction gas is introduced into the reaction chamber 350 through the gas supply pipe 318, and the light from the light source 340 is exhausted through the exhaust port 319 such that the pressure of the reaction chamber is a predetermined pressure. To form a thin film. At this time, the O-ring while flowing nitrogen gas or inert gas through the inlet 384 and exhausting through the exhaust port 386 so that the pressure of the transparent film supply chamber and the storage chamber, that is, the containment chamber, is slightly higher than or equal to the reaction chamber. 358 prevents the reaction gas from leaking into the containment chamber. When the flange 306 to which the light source 340 is welded is in close contact with the o-ring 358, the transparent film 330 is formed at the time of forming a thin film because the light emitting surface of the light source 340 and the transparent film 330 are completely in a high vacuum state. ) Is kept in close contact with the light emitting surface of the light source 340, and the transparent film does not sag even in a device capable of forming a large-area thin film. Therefore, the means for preventing the transparent film 330 from falling down need not be taken otherwise. On the other hand, the heater 356 for controlling the temperature of the substrate 352 is built in the substrate heating support 354 for supporting the substrate 352, so that the deposition process can be performed under optimal conditions in the reaction chamber. The position of the substrate 352 is controlled by the vertical movement of the substrate heating support 354, and the driving device for the vertical movement is installed outside the reaction chamber. The bellows and stretch part 360 is provided so that the vacuum of the reaction chamber 350 is not destroyed during the vertical movement of the substrate heating support 354, and this part is stretched.

On the other hand, when the thin film is formed, the supply of nitrogen, inert gas, and reaction gas is stopped, and these gases are exhausted through the exhaust ports 319 and 386, respectively. In order to clean the reaction chamber, nitrogen or an inert gas is supplied to the reaction chamber through the air inlet 314, and the process of exhausting the gas through the exhaust port 316, that is, purging several times, and then vacuuming the reaction chamber through the other exhaust port 319. Exhaust to Then, when the light source 340 is vertically lifted to its original position, the transparent film is supported by the rollers 324, 326, 322, and 320 to be in a state as shown in FIG. 3. Then, the rolled portion 310 of the right side is replaced with a new clean transparent film portion by replacing the blurred portion of the film. By alternately forming the thin film and changing the transparent film by the method described above, the reaction chamber 350 can be maintained at high purity at all times without exposing the reaction chamber 350 to the atmosphere until the clean film of the supply chamber 302 is exhausted to form a high quality thin film. can do. However, an auxiliary chamber (load-lock chamber) is generally used to install a substrate on the substrate heating support of the reaction chamber for the necessary photoexcitation process and to not break the vacuum of the reaction chamber when the substrate is removed from the reaction chamber after the process is completed. ) And substrate transfer mechanism should be installed. In addition, a gate valve is installed between the reaction chamber and the auxiliary chamber, and the gate valve must be closed at all times except for transporting the substrate for the installation and collection of the substrate to isolate the reaction chamber from the auxiliary chamber. When the transparent film of the supply chamber is exhausted, the used film roll is removed by opening and closing the opening and closing hole 382 of the storage chamber 300 and opening and closing the opening and closing hole 380 of the supply chamber 302 to mount a clean transparent film roll. Install the film together. Then, the openings and closing ports 380 and 382 are closed and the supply chamber 302, the storage chamber 300, and the reaction chamber 350 are simultaneously evacuated to high vacuum. At this time, it is necessary to purge several times using the purge gas for cleaning. However, when the transparent film of the supply chamber 302 is exhausted in the state of FIG. 4 and is wound around the roll 310 of the storage chamber 300, the flange 306 welded to the edge of the light emitting surface of the light source 340. Is attached to the O-ring 358 without the transparent film, the opening and closing hole 382 of the storage compartment 300 is removed, the used transparent film is removed, and the opening and closing opening 380 of the supply chamber 302 is opened to mount a clean film roll. After closing the opening and closing openings (380, 382) and purging three or four times in a high vacuum, the light source (340) to the original position and the rollers in the state shown in Figure 3 rollers 324, 326, 322, If a mechanical method is devised so as to be installed over 320, the transparent film roll can be replaced without permanently destroying the vacuum of the reaction chamber 350. In addition, since the apparatus does not use an optical window, the light emitted from the light source can be used very effectively. While the light source 340 has a function similar to that of a part of the upper plate of the present optical CVD apparatus, that is, has a function of withstanding atmospheric pressure, as shown in FIG. Since the light emitting surface is in contact with the transparent film 330, it is possible to use a light source that emits light in the vacuum ultraviolet region. However, at this time, the transparent film 330 having a high light transmittance in the vacuum ultraviolet region should be used. In addition, it is preferable to cover part or all of the outer surface of the light source except the light emitting surface with a solid material such as stainless steel so that the light source can withstand atmospheric pressure. In addition, a water cooling tube 342 is provided around the light source 340 to prevent overheating. In addition to the water cooling tube 342, an air cooling fan may be used. As the light source 340, any light source having a flat emitting surface can be utilized, and when using a large area light source such as an excimer lamp, an optical CVD apparatus capable of manufacturing a large area substrate can be made. In addition to the excimer lamp, if a light source that emits light in a vacuum ultraviolet ray or an ultraviolet ray region such as a deuterium discharge tube, a xenon lamp, a low pressure mercury lamp, or the like is used, light having a short wavelength in the region can be easily used. As described above, the flange 306 of a material such as stainless steel is formed at the edge of the light emitting surface of the light source 340 by connecting the light source 340 to the expansion and contraction part 370 while ensuring the sealing property of the reaction chamber 350. ) Can be used. However, in order to alleviate the inconvenience of welding the light source to the flange at the time of replacing the light source or manufacturing the light source, as illustrated in FIG. 5, the light source 340 and the flange 500 are connected by the hinge 520. The O-ring 510 may be used to maintain the sealability of the reaction chamber.

According to the present invention, it is possible not only to effectively utilize the light emitted from the light source, in particular vacuum ultraviolet rays, but also to implement an optical excitation process apparatus with significantly improved operation efficiency than the existing apparatus. In addition, the device is very simple and practical, making it easy to carry out the photoexcitation process for large area substrates.

Claims (25)

A reaction chamber housing having an opening through which light passes through the center of the upper plate; A light source having a flat light emitting surface, the light emitting surface facing the opening such that light can be irradiated into the reaction chamber through the opening; A heat-resistant transparent film horizontally disposed in a space between the light emitting surface of the light source and the opening of the reaction chamber and capable of transmitting light from the light source; An opening is located between the light emitting surface of the light source and the reaction chamber opening, and has an opening in the center of the upper and lower plates, and the central axis of the upper and lower openings coincides with the light emitting surface and the reaction chamber central axis. A compartment housing for installing, supplying and receiving the transparent film, the lower plate being coupled with the reaction chamber upper plate; A flange welded around the center opening of the light emitting surface edge of the light source so as to be sealed to the upper opening of the compartment; A stretchable bellows or a welded bellows having flanges at both ends joining the flange welded around the opening of the transparent film compartment upper plate and the flange edge welded to the light source; The flange, to which the light source is welded, the stretchable part, the transparent film storage chamber housing, and the reaction chamber housing are sequentially combined to form a closed space. During the photoexcitation process, the heat resistant transparent film is pushed down to react the reaction. It is provided with a driving means for moving the light source welded to the flange up and down to be in close contact with the seal opening so that the reaction gas in the reaction chamber does not leak into the containment chamber, And the sealing structure is not destroyed when the light source to which the flange is welded is moved up and down by the driving device. delete The method of claim 1, wherein the light source is at least one selected from the group of light emitting light sources, visible light source group and infrared light source group in the ultraviolet region composed of excimer lamp, deuterium discharge tube, xenon lamp, low pressure mercury lamp and the like. Photoexcitation process equipment. The supply chamber according to claim 1, further comprising: a supply chamber for continuously supplying a clean transparent film and a storage chamber for winding and storing the heat-resistant transparent film exposed to the reaction chamber in a symmetrical position with respect to the axis away from the central axis of the storage chamber. Each of the photoexcited process equipment. 5. The apparatus according to claim 4, wherein a rotating shaft for unwinding and supplying the transparent film in a roll form and winding the roll in a form is installed in the supply chamber and the storage chamber, respectively, and means for driving the rotation shafts outside the supply chamber and the storage chamber, respectively. Photoexcitation process apparatus, characterized in that it comprises. The material of claim 1, wherein the light emitting surface surface of the light source and the lower surface of the flange are on the same plane when welding an edge of the light emitting surface of the light source around the flange center opening. And an optical excitation process apparatus characterized by welding a flange of a weldable material. The reinforcing member of claim 1, wherein when the light source welded to the flange does not endure atmospheric pressure and there is a risk of damage, the reinforcing material is applied to some or all of the remaining outer surfaces of the light source except for the light emitting surface of the light source exposed to the opening of the compartment. Optical excitation process apparatus, characterized in that the reinforcement to the light source to withstand the atmospheric pressure by welding. The apparatus of claim 7, wherein the reinforcing material is made of stainless steel or a material which can be welded to the surface material of the light source. The apparatus of claim 1, wherein an o-ring is provided around the opening to closely contact the heat resistant transparent film to the reaction chamber opening. The photoexcitation process apparatus according to claim 1, wherein the lower plate of the transparent film containment chamber and the upper plate of the reaction chamber are joined by welding, O-ring or gaskets. The apparatus of claim 1, wherein the light source is welded to the flange, the upper compartment of the compartment, and the expansion and contraction unit by O-rings or gaskets. The method according to claim 1, further comprising a substrate heating support supporting a material or a substrate for the photoexcitation process or a heater for heating and controlling the temperature of the material or the substrate, and performing the photoexcitation process under optimum conditions. The position of the substrate in the reaction chamber is controlled by the vertical motion of the support so that the drive device for the vertical motion is provided outside the reaction chamber. 13. The photoexcitation process apparatus according to claim 12, wherein an expansion and contraction portion is provided so that the vacuum of the reaction chamber is not destroyed when the substrate heating support is driven. The optical excitation process apparatus according to claim 1, wherein the outer wall except for the light source surface of the light source includes a water cooling tube or an air cooling fan to cool the light source. The photoexciting process apparatus according to claim 1, further comprising an air inlet for supplying the reaction gas into the reaction chamber, and an exhaust port for the reaction gas exhaust and the high vacuum exhaust. The photoexcited process apparatus according to claim 1, wherein the reaction chamber is provided with an intake port for supplying a purge gas for washing into the reaction chamber and an exhaust port for exhausting the purge gas. The photoexcited process apparatus according to claim 1, wherein the storage chamber is provided with an air inlet for supplying nitrogen or an inert gas to the storage chamber and an exhaust port for exhausting the gas. The optical excitation process apparatus according to claim 1, wherein the supply chamber is provided with an opening and closing port for mounting and supplying a clean transparent film, and the storage chamber is each provided with an opening and closing port for detaching and collecting the transparent film after use. The auxiliary chamber according to claim 1, wherein a substrate is placed on a substrate heating support of a reaction chamber for a necessary photoexcitation process, and an auxiliary chamber which is usually used in order not to break the vacuum of the reaction chamber when removing the substrate from the reaction chamber after the process is completed ( A load-lock chamber is installed, and a substrate transfer mechanism for transferring and installing the substrate between the reaction chamber and the auxiliary chamber is provided. The gate valve between the reaction chamber and the auxiliary chamber is always provided except for the substrate transfer for installing and collecting the substrate. A photoexcited process apparatus, wherein the reaction chamber and the auxiliary chamber are closed to close each other. A reaction chamber housing having an opening through which light passes through the center of the upper plate; A light source having a flat light emitting surface, the light emitting surface facing the opening such that light can be irradiated into the reaction chamber through the opening; A heat-resistant transparent film horizontally disposed in a space between the light emitting surface of the light source and the opening of the reaction chamber and capable of transmitting light from the light source; An opening is located between the light emitting surface of the light source and the reaction chamber opening, and has an opening in the center of the upper and lower plates, and the central axis of the upper and lower openings coincides with the light emitting surface and the reaction chamber central axis. A compartment housing for installing, supplying and receiving the transparent film, the lower plate being coupled with the reaction chamber upper plate; A flange for detachably fixing the light source; Coupling means for hermetically fixing the light source to the flange; An o-ring positioned at a contact portion of the light source and the flange to maintain airtightness between the light emitting surface or the light emitting edge edge wall surface of the light source and the flange; A stretchable bellows or a welded bellows having flanges at both ends joining the flange and the flange edge welded around the transparent film compartment top opening; The flange, to which the light source is fixed, the stretchable part, the transparent film storage chamber housing, and the reaction chamber housing are sequentially combined to form a closed space, and during the photoexcitation process, the heat resistant transparent film is pushed down to react the reaction. A driving means for moving the light source fixed to the flange up and down to be in close contact with the seal opening so that the reaction gas in the reaction chamber does not leak into the containment chamber. And the sealing structure is not destroyed when the light source is moved up and down by the driving device. 21. The method of claim 20, wherein when there is a risk that the light source coupled to the flange with an o-ring does not endure atmospheric pressure and is damaged, the part of the remaining outer surface of the light source except for the light emitting surface of the light source exposed to the compartment opening or An optical excitation process apparatus, wherein the reinforcing material is welded to the whole to reinforce the light source to withstand atmospheric pressure. 22. The apparatus of claim 21, wherein the reinforcing material is made of stainless steel or a material which can be welded to the surface material of the light source. 21. The photoexcited process apparatus of claim 20, wherein the flange for fixing the light source and the upper compartment of the compartment and the stretchable portion are coupled by O-rings or gaskets. The auxiliary chamber according to claim 20, wherein a substrate is placed on a substrate heating support of a reaction chamber for a necessary photoexcitation process, and an auxiliary chamber which is conventionally used so as not to break the vacuum of the reaction chamber when removing the substrate from the reaction chamber after the process is completed. load-lock chamber), and a substrate transfer mechanism for transporting and installing the substrate between the reaction chamber and the auxiliary chamber is installed, and a gate valve between the reaction chamber and the auxiliary chamber is always provided except for the substrate transfer for installing and collecting the substrate. A photoexcited process apparatus, wherein the reaction chamber and the auxiliary chamber are closed to close each other. A light source having a flat light emitting surface for the light excitation process, a reaction chamber for the light excitation process having an opening through which light can penetrate, and a transparent film roll to prevent blur of the light emitting surface of the light source. In the photoexcitation process in the photoexcitation process apparatus including a storage chamber consisting of supply chambers and storage chambers provided on both sides of the reaction chamber, and an auxiliary chamber for storing, installing and collecting the substrates in the reaction chamber, Evacuating the reaction chamber, the containment chamber and the auxiliary chamber at high vacuum; The flange with the light source attached close to the O-ring provided around the upper part of the reaction chamber is vertically lifted by the light source driving device to separate the o-ring, the transparent film, and the light emitting surface of the light source separately. Spacing; Rotating the rolled transparent film into a new clean transparent film portion, rotating the roller for winding the used transparent film by an external drive, and replacing the film; Opening a gate valve between the reaction chamber and the auxiliary chamber, transferring the substrate prepared in the auxiliary chamber to the reaction chamber, and installing the substrate on the substrate heating support; Closing the gate valve to isolate the auxiliary and reaction chambers; The flange attached to the light source is lowered vertically by the light source driving device, and the transparent film is pushed down a little while the flange welded to the edge of the light emitting surface of the light source fits the O-ring around the opening of the reaction chamber top plate with the transparent film. Rendering; Putting the reaction gas into the reaction chamber through a gas supply pipe and exhausting the reaction gas through the exhaust port so that the pressure in the reaction chamber becomes a predetermined pressure; Nitrogen gas or inert gas is flowed through the intake vent and exhausted through the exhaust port so that the pressure in the transparent film supply chamber and storage compartment, that is, the containment chamber, is slightly higher than or equal to that of the reaction chamber. Preventing it from becoming; Heating and heating the substrate by a built-in heater of the substrate heating support to allow the substrate to reach a predetermined temperature; Adjusting the position of the substrate in the reaction chamber by the vertical drive unit so that the photoexcitation process can be performed under optimum conditions; Irradiating the light from the light source into the reaction chamber to activate the reaction gas, thereby performing a photoexcitation process; Turning off the light source to terminate the photoexcitation process and stopping the supply of nitrogen or inert gas and reaction gas and exhausting these gases through the exhaust port, respectively; Supplying nitrogen or an inert gas to the reaction chamber for cleaning the reaction chamber and then evacuating through the exhaust port, ie, purging the purge chamber three or four times, and then evacuating the reaction chamber and the containment chamber through the other exhaust port at high vacuum; Opening the gate valve to move the substrate to the auxiliary chamber and closing the gate valve.