KR100282607B1 - Manufacturing method of electroluminescent device having high brightness and high brightness - Google Patents

Abstract

The present invention provides a method of manufacturing an electroluminescent device having high brightness and high definition. The electroluminescent device of the present invention has a linear or mesh shape on the surface of a transparent substrate or an opaque substrate, forms a pattern having an inclined side surface, and a transparent electrode layer, a first insulating layer, a fluorescent layer, and a second insulation on the substrate. In the case of an inverting device in which a layer and a metal electrode layer are sequentially stacked and the metal electrode layer is patterned to form a metal electrode on the convex upper plane or the upper plane and the inclined plane of the second insulating layer, and the material layers are stacked in reverse. 1 A transparent electrode was formed over an upper plane or an upper plane and an inclined plane of the concave portion of the insulating layer to form pixels or islands.

The present invention forms a pattern on a substrate in advance so that the inclined side of the pattern is arranged to increase the brightness of the electroluminescent element to form the electroluminescent element, thereby reducing the amount of side loss of light and increasing the total transmission amount.

Description

Manufacturing method of electroluminescent device having high brightness and high definition

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electroluminescent device, and more particularly, to a method of manufacturing an electroluminescent device having high brightness and high clarity in which an electrode is formed in a concave or convex portion having an inclined surface formed on a substrate to improve light transmission performance. .

FIG. 1 (a) shows a cross-sectional view of an electroluminescent device according to the prior art, wherein the electroluminescent device is formed by forming a transparent electrode layer 2 on a transparent substrate 1, followed by forming a first insulating layer 3, The fluorescent layer 4 and the second insulating layer 5 are deposited in order, and the metal electrode 6a having a predetermined width is formed on the second insulating layer 5.

In the electroluminescent device having such a structure, when a voltage of several tens of V is applied between the transparent electrode layer 2 and the metal electrode 6a, electrons are emitted from the interface between the insulating layer and the fluorescent layer to accelerate into the fluorescent layer 4 and accelerate. When the electrons collide with the emission center atoms in the fluorescent layer, the emission center atoms are excited, and the electroluminescent device is a device using an electroluminescence principle that generates light when the excited emission center atoms return to the ground state. The device is a kind of flat panel display, and has many advantages such as excellent durability, heat resistance, impact resistance, wide viewing angle, and fast response speed.

However, the fluorescent layer 4 and the first and second insulating layers 3 and 5 used in the device of FIG. 1A have a large refractive index, so that only about 10% of the light generated from the fluorescent layer 4 is transmitted to the front surface. It is known that the rest is leaked out to the side and lost.

In addition, the electroluminescent device of FIG. 1 (b) showing the inverted structure of the electroluminescent device of FIG. 1 (a) forms a refractory metal electrode layer 8 on an opaque substrate 7 such as silicon, alumina, and the like. A structure in which the second insulating layer 5, the fluorescent layer 4, and the first insulating layer 3 are formed, and the transparent electrode 2a having a predetermined width is formed on the first insulating layer 3. In the case of the electroluminescent device having the inverted structure as shown in FIG. 1 (b), most of the light is not transmitted through the transparent electrode 2a and is lost to the side surface to improve the silicon substrate. The surface roughness may be increased by growing the polycrystalline silicon or the like to increase the surface roughness to induce diffused reflection, and the refractive index of the insulating layer on the front surface, that is, the light generation side is smaller than that of the fluorescent layer 4, Oyster of insulation layer on the back side The rate may be greater than beneficial.

The method of growing the electroluminescent thin films, that is, the first and second insulating layers 3 and 5, the fluorescent layer 4, the transparent electrode layer 2, and the metal electrodes 6 may be sputter deposition or e-beam deposition. , Atomic layer epitaxy, etc. Among these, the atomic layer epitaxy method has the advantage of depositing a very uniform thin film. The principle of this technique is to inject source vapor A into the reactor so that one layer is chemisorbed on the surface where the thin film is to be grown, and the excess source vapor is reactive with nitrogen, argon, helium, etc. After purging with no gas, the source vapor B is injected again to allow the thin film to grow by surface reaction with the already adsorbed source A, and then the excess source vapors and by-products continue to the purge gas. Purge As that technique, this technique has the advantage to grow a film having a uniform thickness all over the surface, so proceed by a surface saturation response.

In this case, the reaction sequence can be repeated by repeating the continuous steps of source steam A inert gas purge and source steam B inert gas purge so that the required thickness can be grown. In the case of a thin film containing more than one element or more elements, two or more types of source vapors (reactive precursors) may be used to grow a thin film having a desired composition, and according to the present invention, an atomic layer epitaxy technique is used for manufacturing an electroluminescent device. And process conditions used similar chemical vapor deposition. As described above, the atomic layer deposition method and the chemical vapor deposition method are vapor deposition methods using chemical reactions, and two or more kinds of reaction precursors may be defined as a method of forming a film by chemical reaction at an appropriate reaction temperature.

An object of the present invention is to provide an electroluminescent device having high brightness and high definition.

Another object of the present invention is to provide a method of manufacturing an electroluminescent device having high brightness and high definition.

Method of manufacturing an EL device according to an embodiment of the present invention for achieving the above object is a step of forming an etch mask having a mesh shape on a transparent substrate, and the substrate exposed through the etch mask to a predetermined width and Etching to a depth to form a pattern having a mesh shape on the surface of the substrate and having an inclined side surface; and removing the etching mask, and removing the etching mask on the front surface of the substrate; And forming a layer and a metal electrode layer in sequence, and forming a metal electrode on an upper plane of the convex portion of the second insulating layer by patterning the metal electrode layer.

According to a method of manufacturing an EL device according to another embodiment of the present invention for achieving the above object, the step of forming an etch mask having a mesh shape on the opaque substrate, and the substrate exposed through the etch mask Forming a pattern having a mesh shape on the surface of the substrate and having an inclined side surface by etching the width and depth; and removing the etching mask, and removing the metal electrode layer, the second insulating layer, the fluorescent layer, and the A first step of forming an insulating layer and a transparent electrode layer, and the step of patterning the transparent electrode layer to form a transparent electrode on the upper plane of the recess of the first insulating layer.

According to another aspect of the present invention, there is provided a method of manufacturing an EL device, including forming an etching mask having a mesh shape on an opaque substrate, and exposing a substrate exposed through the etching mask to a predetermined width. Forming a pattern having a mesh shape on the surface of the substrate and having an inclined side surface by etching at an excessive depth, forming a driving element in a recess of the substrate formed by the pattern, and a trademark surface of the driving element. And forming a metal electrode layer on the inclined surface of the recess, sequentially forming a second insulating layer, a fluorescent layer, a first insulating layer, and a transparent electrode layer on the surface of the metal electrode layer and the substrate, and patterning the transparent electrode layer. And forming a transparent electrode on an upper plane of the concave portion of the first insulating layer.

The present invention is characterized by forming a regular or inclined pattern having a line or mesh shape on the surface of the substrate when manufacturing the electroluminescent device, and by forming a pattern on the substrate, Since concave and convex portions having an inclined surface are formed, an electroluminescent element can be formed into a structure that can effectively utilize the inclined surface to reduce side loss of light, and the luminance of the electroluminescent element can be greatly increased by increasing the light emitting area. . In addition, this structure generally corresponds to the size of one pixel in which attempts to increase the total transmittance of light by reducing the total reflection at each interface of the thin film by uniformly forming or roughening small grooves and irregularities on the front surface of the substrate. In addition to forming large unevenness, and the inclined surface of the unevenness reduces the total reflection, the light can be focused in one pixel to the front to improve the sharpness.

1 (a) is a cross-sectional structure diagram of a conventional electroluminescent device,

1 (b) is a cross-sectional structural view showing an inverted structure of the electroluminescent device of FIG.

2 is a cross-sectional structural view showing a manufacturing process of an electroluminescent device according to an embodiment of the present invention;

2 (a) is a cross-sectional structure diagram of a transparent substrate having a pattern formed by isotropic dry etching or wet etching;

2 (b) is a cross-sectional structure diagram in which a transparent electrode layer is formed on a substrate;

FIG. 2 (c) is a cross-sectional structure diagram of depositing a first insulating layer, a fluorescent layer, and a second insulating layer on the structure of FIG. 2 (b);

FIG. 2 (d) is a cross-sectional structural view of forming a metal electrode layer on the structure of FIG.

3 is a cross-sectional structural diagram showing a manufacturing process of an electroluminescent device having an inverted structure;

3 (a) is a cross-sectional structure diagram of an opaque substrate having a pattern formed by dry etching or wet etching;

3 (b) is a cross-sectional structure diagram in which a metal electrode layer is formed on a substrate on which a pattern is formed;

FIG. 3 (c) is a cross-sectional structure diagram of depositing a first insulating layer, a fluorescent layer, and a second insulating layer on the metal electrode layer of FIG. 3 (b);

FIG. 3 (d) is a cross-sectional structure diagram in which a transparent electrode layer is formed on the structure of FIG. 3 (c);

FIG. 4 (a) is a cross-sectional structure diagram in which the metal electrode layer of FIG. 2 (d) is etched to form a metal electrode (unit pixel) on an upper plane of the convex portion;

FIG. 4B is a cross-sectional structural view of forming a transparent electrode (unit pixel) on a flat surface of a recess by etching the transparent electrode layer of FIG.

FIG. 5 (a) is a cross-sectional structure diagram in which the metal electrode layer of FIG. 2 (d) is etched to form a metal electrode (unit pixel) over an upper plane and an inclined plane of the convex portion;

FIG. 5 (b) is a cross-sectional structure diagram in which the transparent electrode layer of FIG.

6 is a cross-sectional structural view of an electroluminescent device having an inverted structure according to another embodiment of the present invention;

7 is a cross-sectional structure diagram of an EL device having an inversion structure according to another embodiment of the present invention.

<Explanation of symbols on the main parts of the drawing>

1 transparent substrate 2 transparent electrode layer

2a: transparent electrode 3: first insulating layer

4: fluorescent layer 5: second insulating layer

6: metal electrode layer 6a: metal electrode

7: non-transparent substrate 9: transparent substrate with pattern

10: non-transparent substrate on which a pattern is formed 11: drive element

Hereinafter, with reference to the accompanying drawings will be described an embodiment of the present invention;

2 and 3 are cross-sectional views showing the manufacturing process of the electroluminescent device according to the embodiment of the present invention, Figures 4 and 5 show the cross-sectional structure of the electroluminescent device manufactured according to the embodiment of the present invention.

According to the manufacturing process of the electroluminescent device of FIG. 2, first, as shown in FIG. 2 (a), several tens of micrometers are formed on a transparent substrate 9 such as glass, BSG (Borosilicate Glass), quartz, etc. as a substrate of the electroluminescent device. An etching mask (not shown) having a line shape or a mesh shape is formed by using a photosensitive film at intervals of several hundred μm, and the substrate 9 exposed through the etching mask is several μm by wet etching or isotropic plasma etching. It is etched to a depth of several tens of micrometers to form a line pattern or mesh pattern having inclined side surfaces on the surface of the substrate 9, and the mask pattern is removed.

The size of the line or mesh pattern is determined according to the size and resolution of the display panel composed of the electroluminescent elements. In general, one pixel is considered when considering a display of a VGA or SVGA class (1000 line / inch) scale. The size of is about 200-300 ㎛, and for ultra-high resolution displays such as head mount display, the size of one pixel is about 20-40 ㎛ by current technology level.

Subsequently, as shown in FIGS. 2B to 2D, the transparent electrode layer 2, the first insulating layer 3, and the fluorescent layer 4, which are the constituent thin films of the electroluminescent element, on the substrate 9. ), The second insulating layer 5, and the metal electrode layer 6 are sequentially grown.

3 illustrates an inverted structure of the EL device of FIG. 2.

The electroluminescent device of FIG. 3 forms an etch mask (not shown) having a linear or mesh shape at intervals of several tens of micrometers to several hundreds of micrometers on an opaque substrate 10 such as silicon or alumina, and is exposed through the etch mask. The opaque substrate 10 by wet etching or isotropic plasma etching to a depth of several micrometers to several tens of micrometers to form a line pattern or a mesh pattern having an inclined side surface on the surface of the opaque substrate 10, Remove

Subsequently, as shown in FIGS. 3B to 3D, the metal electrode layer 6, the second insulating layer 5, the fluorescent layer 4, the first insulating layer 3, and the metal electrode layer 2 are formed. ) In turn.

As shown in FIGS. 2A and 3A, the patterns formed on the substrates 9 and 10 include not only a line pattern having a linear shape but also a mesh pattern having a mesh shape in which the lines cross at right angles to each other. When formed to form a shallow concave or convex, and evenly formed a multi-layer material layer for forming an electroluminescent element, each material layer is also formed in the form having a concave and convex, the pattern When the concave or convex shape is formed, the four sides are all inclined, so the effect is doubled compared to the case of the line pattern.

Subsequently, as shown in FIGS. 2 and 3, a substrate in which a material layer for manufacturing an electroluminescent device is laminated in a multilayer manner is used in FIGS. 4 (a), 4 (b) or 5 (a) and 5 (b). As shown, the metal electrode layer 6 and the transparent electrode layer 2 are patterned, respectively, to form the metal electrode 6a and the transparent electrode 2a.

4 (a) and 5 (a) show an example of formation of an electroluminescent device according to an embodiment of the present invention. When the metal electrode layer 6 is patterned to form the metal electrode 6a, FIG. As shown in (a), the metal electrode layer 6 is patterned such that the metal electrode layer 6 of FIG. 2 (d) remains only in the upper plane of the convex portion of the second insulating layer 5, thereby forming the second insulating layer 5. The metal electrode 6 is formed on the top plane of the convex portion, or as shown in Fig. 5 (a), the metal electrode layer 6 of Fig. 2 (d) is inclined and the top plane of the convex portion of the second insulating film 5. The metal electrode 6a is formed by patterning the metal electrode 6a to remain.

In the case of the EL device having the inverted structure of the EL device shown in FIGS. 4A and 5A, as shown in FIG. 4B, the transparent electrode layer of FIG. 2) is patterned so as to remain only on the concave flat surface of the first insulating layer 3 to form a transparent electrode 2a, or as shown in FIG. 5 (b), the transparent electrode layer 2 of FIG. The transparent electrode a is formed by patterning the concave portion of the first insulating layer 3 so as to remain on the flat surface and the inclined surface.

As described above, the EL device having the structures of FIGS. 4A and 4B minimizes side loss of light due to refraction, and the light reflected by the electrodes 6a and 2a is effectively transmitted to the front surface. In particular, in the case of forming a metal electrode having a structure as shown in Figs. 5 (a) and 5 (b), the side surface also contributes to light emission, thereby further increasing the luminance.

6 and 7 are cross-sectional views showing an active driving type light emitting device according to another embodiment of the present invention.

The active matrix electroluminescent device based on the inverted structure shown in FIG. 6 is subjected to the same patterning process as in FIGS. 2 and 3 on the surface of the opaque substrate 10 to have a size of several tens of micrometers to several hundred micrometers. A mesh pattern having a width and a depth of several micrometers to several tens of micrometers is formed, the driving element 11 is formed in the recess of the pattern, and a refractory metal, a silicide metal, and the like are deposited on the plane and the inclined surface of the recess to form a metal electrode layer ( 6), the second insulating layer 5, the fluorescent layer 4, and the first insulating layer 3 are sequentially stacked, and the transparent electrode 2a is formed on the flat surface of the recessed portion of the first insulating film 3. Has a structure formed.

In the active driving type electroluminescent element based on the inverted structure shown in FIG. 7, the driving element 11 is formed in the concave portion on the opaque substrate 10 in the same manner as the electroluminescent element of FIG. 6. , The metal electrode layer 6, the second insulating layer 5, the fluorescent layer 4, and the first insulating layer 3 are sequentially stacked, and the transparent electrode is formed on the flat and inclined surfaces of the recesses of the first insulating layer 3. It has a structure in which (2a) is formed.

The electroluminescent device including the active devices of FIGS. 6 and 7 and having an inverted structure includes a driving device 11 and a transparent electrode 2a in a recess formed by etching an upper surface of the substrate 10 in a mesh pattern shape. ), It is possible to prevent the side loss of the light generated from the EL device and to maximize the luminance and the clarity so that the sides contribute to the light emission and the light emitting area is widened and the light can be concentrated to the front. have.

In the electroluminescent device of the present invention, since light is generated by a strong electric field, when the size of the pattern decreases and the surface bending becomes severe, if an uneven portion is formed, an electrical breakdown may occur in the portion. For this purpose, an insulating layer and a fluorescent layer were grown by using a chemical vapor deposition method or an atomic layer growth method capable of growing a very uniform thin film. In particular, in the case of the atomic layer deposition method, the reaction proceeds by surface saturation reaction, so that the deposition of a very uniform thin film is known.

In addition, the present invention provides a substrate structure in which a line pattern or a mesh pattern is formed by a method such as wet etching or plasma etching, and high luminance for forming an electroluminescent device, an inverted structure electroluminescent device, and an active driving type electroluminescent device on the substrate. It consists of a structure of high definition electroluminescent device and a manufacturing method using atomic layer epitaxy technology.

The electroluminescent device manufactured by the above manufacturing method increases the luminance by decreasing the side loss of light and increasing the emission area, and increases the sharpness by collecting the light in the center direction.

In the present invention, the side loss amount of light reaching nearly 90% is reduced, and instead, the front transmission amount is improved.

In particular, when etching not only in the form of a line but also in the form of a mesh, the same effect can be obtained in four directions by forming the concave and convex pixels so that the effect can be doubled.

In addition, this structure generally corresponds to the size of one pixel in which attempts to increase the total transmittance of light by uniformly forming small grooves, irregularities, etc. on the front surface of the substrate or roughening the surface to reduce total reflection at each constituent thin film interface. In addition to forming a large degree of irregularities and the inclined surface of the irregularities in addition to reducing the total reflection, the light can be focused in front of one pixel to further improve the sharpness.

In addition, an active matrix electroluminescent device based on an inverted structure is formed by etching a substrate using a mesh-shaped etching mask having a depth of several micrometers to several tens of micrometers and a width of several tens of micrometers to hundreds of micrometers. By forming a driving element and an electroluminescent element in one recess and allowing all four sides of the recess to contribute to light emission, the luminance is maximized by simultaneously obtaining the effect of widening the light emitting area and preventing side loss.

Claims (13)

Forming an etching mask having a mesh shape on the transparent substrate, Etching the substrate exposed through the etching mask to a depth of several tens to hundreds of micrometers and a depth of several tens of micrometers to form a pattern having a mesh shape on the surface of the substrate and having an inclined side surface; Removing the etching mask and sequentially forming a transparent electrode layer, a first insulating layer, a fluorescent layer, a second insulating layer, and a metal electrode layer on the entire surface of the substrate; And patterning the metal electrode layer to form a metal electrode on an upper plane of the convex portion of the second insulating layer. The method of claim 1, And the metal electrode layer is formed next to the top plane and the inclined plane of the convex portion of the second insulating layer. The method of claim 1, Wherein the first insulating layer, the fluorescent layer, and the second insulating layer are formed by a deposition method for forming a thin film by a chemical reaction between two or more kinds of source precursors. Forming an etch mask having a mesh shape on the opaque substrate, Etching the substrate exposed through the etching mask to a depth of several tens to hundreds of micrometers and a depth of several tens of micrometers to form a pattern having a mesh shape on the surface of the substrate and having an inclined side surface; Removing the etching mask and sequentially forming a metal electrode layer, a second insulating layer, a fluorescent layer, a first insulating layer, and a transparent electrode layer on a front surface of the substrate; And patterning the transparent electrode layer to form a transparent electrode on an upper plane of the concave portion of the first insulating layer. The method of claim 4, wherein The transparent electrode is formed on the image plane and the inclined surface of the concave portion of the first insulating layer, characterized in that the manufacturing method of the electroluminescent device. The method of claim 4, wherein Wherein the first insulating layer, the fluorescent layer, and the second insulating layer are formed by a deposition method for forming a thin film by a chemical reaction between two or more kinds of source precursors. Forming an etch mask having a mesh shape on the opaque substrate, Etching the substrate exposed through the etching mask to a depth of several tens to hundreds of micrometers and a depth of several tens of micrometers to form a pattern having a mesh shape on the surface of the substrate and having an inclined side surface; Forming a driving element in a recess of the substrate formed by the pattern; Forming a metal electrode layer on the trademark surface and the inclined surface of the concave portion of the drive element, and sequentially forming a second insulating layer, a fluorescent layer, a first insulating layer and a transparent electrode layer on the surface of the metal electrode layer and the substrate; And an active device comprising patterning the transparent electrode layer to form a transparent electrode on an upper plane of the concave portion of the first insulating layer. The method of claim 7, wherein And the transparent electrode comprises an active element formed on the top plane and the inclined plane of the concave portion of the first insulating layer. The method of claim 8, And the metal electrode layer comprises an active element formed of a silicide metal. Forming an etching mask having a linear shape on the transparent substrate, Etching the substrate exposed through the etching mask to a width of several tens to hundreds of micrometers and a depth of several tens of micrometers to form a pattern having a linear shape on the surface of the substrate and having an inclined side surface; Removing the etching mask and sequentially forming a transparent electrode layer, a first insulating layer, a fluorescent layer, a second insulating layer, and a metal electrode layer on the entire surface of the substrate; And patterning the metal electrode layer to form a metal electrode on an upper plane of the convex portion of the second insulating layer. Forming an etch mask having a linear shape on the opaque substrate, Etching the substrate exposed through the etching mask to a width of several tens to hundreds of micrometers and a depth of several tens of micrometers to form a pattern having a linear shape on the surface of the substrate and having an inclined side surface; Removing the etching mask and sequentially forming a metal electrode layer, a second insulating layer, a fluorescent layer, a first insulating layer, and a transparent electrode layer on a front surface of the substrate; And patterning the transparent electrode layer to form a transparent electrode on an upper plane of the concave portion of the first insulating layer. Forming an etch mask having a linear shape on the opaque substrate, Etching the substrate exposed through the etching mask to a width of several tens to hundreds of micrometers and a depth of several tens of micrometers to form a pattern having a linear shape on the surface of the substrate and having an inclined side surface; Forming a driving element in a recess of the substrate formed by the pattern; Forming a metal electrode layer on the trademark surface and the inclined surface of the concave portion of the drive element, and sequentially forming a second insulating layer, a fluorescent layer, a first insulating layer and a transparent electrode layer on the surface of the metal electrode layer and the substrate; And patterning the transparent electrode layer to form a transparent electrode on an upper plane of the concave portion of the first insulating layer. The method of claim 12, Wherein the first cutoff layer, the fluorescent layer, and the second insulating layer are formed by a deposition method for forming a thin film by a chemical reaction between two or more kinds of source precursors.

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