KR100268011B1 - A method of manufacturing liquid crystal display device - Google Patents

A method of manufacturing liquid crystal display device Download PDF

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KR100268011B1
KR100268011B1 KR1019970048282A KR19970048282A KR100268011B1 KR 100268011 B1 KR100268011 B1 KR 100268011B1 KR 1019970048282 A KR1019970048282 A KR 1019970048282A KR 19970048282 A KR19970048282 A KR 19970048282A KR 100268011 B1 KR100268011 B1 KR 100268011B1
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liquid crystal
crystal display
display device
color filter
substrate
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KR1019970048282A
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Korean (ko)
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KR19990026228A (en
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이남주
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구본준
엘지.필립스 엘시디주식회사
론 위라하디락사
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Priority to KR1019970048282A priority Critical patent/KR100268011B1/en
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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1341—Filling or closing of cells
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Liquid Crystal (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)

Abstract

PURPOSE: A method for manufacturing a liquid crystal display is provided to prevent an electric defect and reduce a process number, by eliminating an Ag process. CONSTITUTION: A seal agent including Ag is printed at a color filter substrate(110) along a seal line(112). A thin film transistor substrate, in which a conduction portion is formed, is adhered with the color filter substrate(110) An indium tin oxide electrode is formed on the thin film transistor substrate(110), and a passivation film is formed on the indium tin oxide electrode. The indium tin oxide electrode is formed at both sides of a center passivation film.

Description

액정표시소자 제조방법{A METHOD OF MANUFACTURING LIQUID CRYSTAL DISPLAY DEVICE}Liquid crystal display device manufacturing method {A METHOD OF MANUFACTURING LIQUID CRYSTAL DISPLAY DEVICE}

본 발명은 액정표시소자에 관한 것으로, 특히 박막트랜지스터 액정표시소자의 제조공정 중 액정표시소자 공정에 관한 것이다.BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display device, and more particularly, to a liquid crystal display device process during a manufacturing process of a thin film transistor liquid crystal display device.

일반적으로, 박막트랜지스터 액정표시소자(TFT-LCD) 공정은 TFT 제작공정, 칼라필터(C/F) 제조공정, LCD 제조공정 및 모듈 공정의 네가지 공정으로 나눌 수 있다.In general, a thin film transistor liquid crystal display (TFT-LCD) process may be divided into four processes: a TFT manufacturing process, a color filter (C / F) manufacturing process, an LCD manufacturing process, and a module process.

TFT 제작공정은 유리기판 위에 박막트랜지스터 배열을 제작하는 공정을 말하는 것이며, 칼라필터(C/F) 제조공정은 광차단층이 형성된 유리기판 위에 염료나 안료를 사용하여 R, G 및 B의 칼라필터층을 형성한 후 공통전극용 ITO(Indium Tin Oxide)를 형성하는 공정이고, LCD 공정은 TFT 공정이 완료된 유리기판(하판)과 C/F공정이 완료된 유리기판(상판)을 두 기판 사이에 일정한 간격이 유지되도록 합착한후, 액정을 주입하여 LCD셀을 제조하는 공정이며, 마지막으로 모듈 공정은 신호처리를 위한 회로부를 제작하고, TFT-LCD패널과 신호처리 회로부를 실장기술을 이용하여 연결한 후 기구물을 부착하여 모듈을 제작하는 공정이다.The TFT fabrication process refers to a process of fabricating a thin film transistor array on a glass substrate, and the color filter (C / F) fabrication process uses a dye or pigment on a glass substrate on which a light blocking layer is formed to form color filter layers of R, G, and B. After forming, ITO (Indium Tin Oxide) for common electrode is formed, and the LCD process is a glass substrate (bottom plate) where the TFT process is completed and a glass substrate (top plate) where the C / F process is completed. It is a process of manufacturing LCD cells by injecting liquid crystals after holding them together. Finally, the module process is to fabricate a circuit portion for signal processing, and to connect a TFT-LCD panel and a signal processing circuit portion using a mounting technique. It is a process of manufacturing a module by attaching.

상기한 LCD의 구조는, 액정을 일정한 방향으로 배향시키는 배향막과, 상 ·하판 사이의 간격을 유지하는 플라스틱재질의 스페이서(spacer)와, 상 ·하판을 접착/밀봉하여 액정내부로 습기나 기타 물질이 유입되는 것을 방지하는 시일(seal)과, 기판 테두리 부분의 간격을 유지하는 시일스페이서(seal spacer)와, 그리고 상판의 공통전극을 하판과 전기적으로 연결해 주는 은페이스트(Ag-paste)로 이루어져 있다.The LCD has a structure in which the alignment layer for orienting the liquid crystal in a predetermined direction, a spacer made of a plastic material that maintains a gap between the upper and lower plates, and the upper and lower plates are bonded / sealed to prevent moisture or other substances from inside the liquid crystal. It consists of a seal that prevents the inflow, a seal spacer that maintains the gap between the edges of the substrate, and an silver paste that electrically connects the common electrode of the upper plate to the lower plate. .

도 1a ~ 1c는 종래 LCD 공정의 시일공정 및 Ag공정을 나타내는 도면으로서, 먼저, 도 1a에 나타내듯이 칼라필터기판(10)에 Ag부(A)를 오픈한 상태로 시일제를 시일선(12)을 따라 인쇄한다. 여기서 부호 11은 공통전극용 ITO를 나타낸다. 계속해서, 도 1b에 나타내듯이 TFT기판(20)의 B영역에 소량의 Ag를 도포한 후, 도 1c에 나타내듯이 두 기판(10, 20)을 합착한다.1A to 1C are diagrams illustrating a sealing process and an Ag process of a conventional LCD process. First, as shown in FIG. 1A, a sealant is applied to the sealant in a state in which the Ag portion A is opened on the color filter substrate 10. To print. Reference numeral 11 denotes ITO for the common electrode. Subsequently, a small amount of Ag is applied to the B region of the TFT substrate 20 as shown in FIG. 1B, and then the two substrates 10 and 20 are bonded together as shown in FIG. 1C.

그러나, 이러한 공정에서 상기한 Ag부(A)의 존재는 시일제의 인쇄시 인쇄불량을 초래할 수 있고, TFT기판(20)에서 Ag의 정밀한 도포가 어려울 뿐만 아니라 ITO와의 단락을 유발할 수 있으며, 합착시에 Ag가 도포된 부근의 시일선의 영향으로 상 ·하기판 사이의 접착력이 약해진다는 문제점이 있었다.However, the presence of the Ag portion (A) in such a process may result in poor printing during the printing of the sealant, it is difficult to precisely apply Ag on the TFT substrate 20, as well as may cause a short circuit with ITO, adhesion There was a problem that the adhesive force between the upper and lower substrates was weakened by the influence of the seal line in the vicinity of Ag applied.

본 발명은 상기한 종래 기술의 문제점을 해결하기 위한 것으로, 액정표시소자의 상 ·하판 합착시에 상 ·하판 도통을 실시하여 공정의 단순화와 생산성의 향상을 꾀한 액정표시소자의 제조방법을 제공하는 것이다.The present invention is to solve the above problems of the prior art, to provide a method for manufacturing a liquid crystal display device to simplify the process and improve the productivity by conducting the upper and lower plate conduction at the time of the upper and lower plate bonding of the liquid crystal display device will be.

상기한 목적을 달성하기 위하여 본 발명에 따른 액정표시소자 공정은, 칼라필터기판에 Ag를 포함하는 시일제를 시일선을 따라 인쇄하는 단계와, 도통부분이 형성된 TFT기판과 상기 시일제가 인쇄된 칼라필터기판을 합착하는 단계로 이루어진 다.In order to achieve the above object, a liquid crystal display device process according to the present invention comprises the steps of printing a sealing agent containing Ag on a color filter substrate along a seal line, a TFT substrate on which a conductive portion is formed, and the color on which the sealing agent is printed. Joining the filter substrate.

상기한 공정에서 TFT기판의 도통영역의 형상은 별도의 공정을 필요로 하지 않으면 TFT제작시에 진행된다.In the above process, the shape of the conductive region of the TFT substrate proceeds at the time of TFT fabrication unless a separate process is required.

상기한 공정에 의하면 Ag공정을 필요로 하는 종래 기술과 비교할 때, 공정수의 감소, 상 ·하기판 합착의 정밀정을 향상시킬 수 있다.According to the above process, compared with the prior art which requires an Ag process, the number of processes can be reduced and the precision of superimposition of the upper and lower substrates can be improved.

도 1a ~ 1c는, 종래 액정표시소자 제조공정의 시일공정 및 Ag공정을 나타내는 도면.1A to 1C are diagrams showing a sealing process and an Ag process of a conventional liquid crystal display device manufacturing process.

도 2a ~ 2f는, 본 발명의 액정표시소자 공정에 따른 합착전의 칼라필터기판, TFT기판 및 도통 ·비도통영역의 단면도 및 평면도.2A to 2F are cross-sectional views and plan views of the color filter substrate, the TFT substrate, and the conductive and non-conductive region before bonding according to the liquid crystal display device process of the present invention.

도 3a ~ 3c는, 본 발명의 액정표시소자 공정에 따른 합착후의 칼라필터기판, TFT기판 및 도통영역의 단면도 및 평면도.3A to 3C are cross-sectional views and plan views of the color filter substrate, the TFT substrate, and the conductive region after bonding according to the liquid crystal display device process of the present invention.

도면의 주요 부분에 대한 부호의 설명Explanation of symbols for the main parts of the drawings

110 : 칼라필터기판 111 : ITO전극110: color filter substrate 111: ITO electrode

113 : 시일제 114 : 보호막113: sealant 114: protective film

120 : TFT기판120: TFT substrate

이하, 본 발명의 바람직한 실시예를 도면을 참조하여 상세하게 설명한다.Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the drawings.

도 2 내지 도 3은 본 발명에 따른 액정표시소자 공정을 나타내는 도면으로서, 도 2a ~ 2f는 합착전의 칼라필터기판, TFT기판 및 도통 ·비도통영역의 단면도 및 평면도를, 도 3a ~ 3c는 합착 후의 칼라필터기판, TFT기판 및 도통영역의 단면도 및 평면도를 나타내고 있다.2 to 3 are views illustrating a liquid crystal display device process according to the present invention, wherein FIGS. 2A to 2F are cross-sectional views and plan views of a color filter substrate, a TFT substrate, and conductive and non-conductive regions before bonding, and FIGS. 3A to 3C are bonded. The cross section and plan view of the following color filter substrate, TFT substrate and conduction area are shown.

본 발명에 따른 액정표시소자 공정은 먼저, 도 2a에 나타내듯이 칼라필터기판(110)에 Ag를 포함하는 시일제를 시일선(112)을 따라 인쇄하고, 도 2b에 나타내듯이 도통부분(B')이 형성된 TFT기판(120)과 상기 시일제가 인쇄된 칼라필터기판(110)을 합착한다. 여기서, 도면의 A'영역은 시일선의 미도통부분을 나타낸다.In the liquid crystal display device process according to the present invention, first, a sealing agent containing Ag is printed on the color filter substrate 110 along the seal line 112, as shown in FIG. 2A, and the conductive portion B 'is shown in FIG. 2B. ) Bonded TFT substrate 120 and the color filter substrate 110 on which the sealant is printed. Here, area A 'in the drawing represents an unconducted portion of the seal line.

도 2c는 도 2b의 A'영역(미도통부분)의 단면도로서, 상기 TFT기판(110)위에 ITO전극(111)이 형성되어 있고, 상기 ITO전극(111) 위에는 보호막(114)이 형성된 구조를 갖는다.FIG. 2C is a cross-sectional view of an A ′ region (not conductive portion) of FIG. 2B, in which an ITO electrode 111 is formed on the TFT substrate 110, and a protective film 114 is formed on the ITO electrode 111. Have

도 2d는 도 2b의 A'영역(미도통부분)의 평면도로서, 중앙의 보호막(114)을 기준으로 양쪽에 ITO전극(111)이 형성되어 있다.FIG. 2D is a plan view of the region A ′ (not conductive portion) of FIG. 2B, in which ITO electrodes 111 are formed on both sides of the center protective film 114.

도 2e는 도 2b의 B'영역(도통부분)의 단면도로서, 상기 TFT기판(110)위에 ITO전극(111)이 형성되어 있고, 상기 ITO전극(111)위에는 오픈영역을 갖는 보호막(114)이 형성된 구조를 갖는다. 이는 B'영역(도통부분)에 보호막(114)을 제거하여 시일 인쇄시 시일에 포함된 Ag에 의해 상하 도통하도록 되는 것이다.FIG. 2E is a cross-sectional view of the region B '(conducting portion) of FIG. 2B, in which an ITO electrode 111 is formed on the TFT substrate 110, and a protective film 114 having an open area is formed on the ITO electrode 111. Has a formed structure. This removes the protective film 114 in the B 'region (conductive portion) so that the conductive film is conducted up and down by Ag included in the seal during printing.

도 2f는 도 2b의 B'영역(도통부분)의 평면도로서, 일체로 형성된 ITO전극(111)사이에 오픈영역을 갖는 보호막(114)이 형성되어 있다.FIG. 2F is a plan view of the region B '(conducting portion) of FIG. 2B, wherein a protective film 114 having an open region is formed between the integrally formed ITO electrodes 111.

도 3a는 칼라필터기판(110)과 TFT기판(120)을 합착한 후의 상태를 나타내는 도면으로서, Ag를 포함하고 있는 시일제가 통공(B")을 통하여 상·하기판을 연결하고 있다.FIG. 3A is a view showing a state after the color filter substrate 110 and the TFT substrate 120 are bonded to each other, and a sealing agent containing Ag connects the upper and lower substrates through the through hole B ″.

도 3b는 도 3a의 B"영역의 평면도로서, 일체로 형성된 시일제(113)사이에 오픈영역을 갖는 보호막(114)이 형성되어 있고, 그 양쪽을 ITO전극(111)이 덮고 있는 구조를 갖는다.FIG. 3B is a plan view of the B ″ region of FIG. 3A, wherein a protective film 114 having an open region is formed between the integrally formed sealing agent 113 and has a structure in which both of the ITO electrodes 111 cover the same. .

도 3c는 도 3a의 B"영역의 단면도로서, 상기 TFT기판(110)위에 ITO전극(111)이 형성되어 있고, 상기 ITO전극(111)위에는 오픈영역을 갖는 보호막(114)이 형성되어 있고, 그 위에는 Ag를 포함하는 시일제(113)가 도포되어 있고, 상기 시일제(113)위에는 ITO전극(111)이 형성되어 있으며, 그 위쪽에 상기 칼라필터기판(110)이 부착되어 있다.FIG. 3C is a cross-sectional view of region B ″ of FIG. 3A, in which an ITO electrode 111 is formed on the TFT substrate 110, and a protective film 114 having an open area is formed on the ITO electrode 111. A sealing agent 113 containing Ag is coated thereon, an ITO electrode 111 is formed on the sealing agent 113, and the color filter substrate 110 is attached thereon.

본 발명에 따른 액정표시소자 공정은 공정 중에 Ag공정을 생략하므로써, 종래 기술과 비교할 때 공정수를 감소시킬 수 있고, 상 ·하기판 합착시에 정밀한 합착이 가능하도록 하여 전기적 결함을 효과적으로 방지할 수 있다.The liquid crystal display device process according to the present invention can reduce the number of processes compared to the prior art by omitting the Ag process during the process, and it is possible to effectively prevent electrical defects by enabling precise bonding at the upper and lower substrate bonding. have.

Claims (2)

칼라필터기판 위에 전도성 시일제를 인쇄하는 단계와,Printing a conductive sealant on the color filter substrate; 상기 칼라필터기판과 도통부분이 형성된 TFT기판을 합착하는 단계로 이루어진 액정표시소자 공정.And bonding the color filter substrate and the TFT substrate on which the conductive portion is formed. 제1항에 있어서, 상기한 전도성 시일제가 Ag를 포함하는 것을 특징으로 하는 액정표시소자 공정.The liquid crystal display device process according to claim 1, wherein the conductive sealing agent comprises Ag.
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