KR100215911B1 - Method for manufacturing color filter of ccd image device - Google Patents

Abstract

According to the present invention, in a CCD image element which reproduces a desired color by using a color filter having a dye layer, a light signal incident on a photodiode for detecting a light signal is formed between the dye layers when forming a dye layer of the color filter. By effectively isolating each dye layer by dying each color layer of the single layer is better, there is no damage between the dye layer and the dye layer.

Description

Method for manufacturing color filter of CCD imaging device

1 is a cross-sectional view of a manufacturing process of a conventional color filter.

2 is a manufacturing process diagram of a color filter according to a first embodiment of the present invention.

3 is a manufacturing process diagram of a color filter according to a second embodiment of the present invention.

Explanation of symbols for main parts of the drawings

1: flat layer 2: first dye layer

4: second dye layer 5: third dye layer

6: coating layer 7a: lens layer

7b: lens 8: pad

9: photodiode 10: gate

11a: first photoresist layer 11b: second photoresist layer

12a, 12b, 12c: photoresist layer

The present invention relates to a color filter manufacturing method, and more particularly, to a color filter in a CCD image device.

In general, a CCD image device is formed by continuously forming a plurality of photodiodes and a plurality of VCCD regions on a semiconductor substrate in a one-to-one correspondence, and when a light energy signal is incident on the photodiode, the photodiode controls the transferred image signal charges in the transfer gate. Move to VCCD area by. Here, the upper part of the photodiode is provided with a lens for focusing light and a color filter for producing a desired image according to incident light.

1 (a) to (k) are cross-sectional views of a manufacturing process of a conventional color filter, and the flat layer 1 is formed on the photodiode 10 on which the plurality of gates 10 are formed as shown in FIG. As shown in FIG. 1 (b), the first dye layer 2 is formed on the flat layer 1, the first dye layer 2 is patterned through a photolithography process, and then dyed. As in c), the entire surface of the flat layer 2 on which the first dye layer 2 is formed is applied to the first intermediate layer 3a.

Subsequently, as shown in FIG. 1 (e), the second dye layer 4 is applied to the entire surface of the intermediate layer 3, the second dye layer 4 is patterned through a photolithography process, and then dyed. As shown in (f), the second intermediate layer 3b is applied to the entire surface on which the first and second dye layers 2 and 4 are formed.

Then, the third dye layer 5 is applied to the entire surface of the second intermediate layer 3b as shown in FIG. 1 (g), and then the third dye layer 5 is subjected to the photolithography process as shown in FIG. 1 (h). After patterning, staining is performed.

A coating layer 6 is formed on the first, second and third dye layers 2, 4 and 5 as shown in FIG. 1 (i), and a predetermined size lens is formed on the coating layer 6 as shown in FIG. The layer 7a is repeatedly formed and then heat treated to form a plurality of lenses 7b as shown in FIG.

However, such a prior art has a factor of lowering the overall chromaticity because the height of the flat layer is different from the height of the flat layer when the dye layer is formed, the intermediate layer is applied, and then another dye layer is formed again.

The present invention has been made to solve the above disadvantages, and an object thereof is to provide a color filter that does not damage the color of the preformed dye layer when forming the dye layer.

In order to achieve the above object, according to the present invention, before forming the dyeing layer and forming the next dyeing layer to separate the first dyeing layer formed with a photosensitive agent (photoresist) to proceed with the color filter manufacturing process and to form a dyeing layer The whole photosensitive agent is applied, a dyeing layer is formed on the photosensitive agent, and an isolation layer made of the same material as the photosensitive agent is applied, followed by a color filter manufacturing process.

Hereinafter, an embodiment according to the present invention will be described with reference to FIGS. 2 and 3 as follows.

2 (a) to (m) are process charts of manufacturing a color filter according to the present invention. As shown in FIG. 2 (a), a flat layer is formed on the photodiode 9 of the CCD image element in which the plurality of gates 10 are formed. 1) is formed, the first dye layer 2 is coated on the flat layer 1 as shown in FIG. 2 (b), and then the first dye layer is formed through a photolithography process as shown in FIG. 2 (c). After patterning (2), staining is performed. In this case, since the first dye layer 2 is a negative photoresist, a portion that receives light, that is, the first dye layer 2, is left.

Next, as shown in FIG. 2D, the first photoresist layer 11a is applied to the entire surface of the flat layer 1 on which the first dye layer 2 is formed, and then the first photoresist layer 11a is formed by a photolithography process. ) Is applied to the entire surface and etched so as to enclose the first dye layer 2 at a right angle, and then the second dye layer 4 is applied on the entire surface as shown in FIG. By patterning as described above, the second dye layer 4 is dyed in a predetermined color, and the second photoresist layer 11b is applied to the entire surface as shown in FIG. Subsequently, the second photoresist layer 11b is formed through the photolithography process so that the second photoresist layer 11b is wrapped at right angles for the first and second dye layers 2 and 4 as shown in FIG. ), The third dye layer (5) is applied to the entire surface, and then patterning is performed by a photolithography process and stained with a predetermined color.

Subsequently, the coating layer 6 is formed on the entire surface as shown in FIG. 2 (k), and the lens layer 7a having a predetermined interval is formed on the entire surface on the coating layer 6 as shown in FIG. Then, a plurality of lenses 7b are formed through a heat treatment process.

Wherein the first dye layer 2 is a magenta dye, the second dye layer 4 is a cyan dye, and the third dye layer 5 is a yellow dye. You can create the desired image by the combination of.

2 is a cross-sectional view of the manufacturing process showing another manufacturing method according to the present invention.

A flat layer 1 is formed on the photodiode 9 on which the plurality of gates 10 are formed as shown in FIG. 3 (a), and the first photoresist 12a is formed as shown in FIG. 3 (b). The first photoresist layer 12a is etched to a size to be applied to the entire surface of (1) and the first dyeing layer is formed, and then the first dyeing layer 2 is formed on the entire surface as shown in FIG. After coating, the first dye layer 2 is etched so that it remains only on the unetched first photoresist layer 12a, and then the first photoresist layer 12a and the first dye layer as shown in FIG. After the second photoresist layer 12b is formed on the entire surface of the flat layer 1 in which (2) is sequentially formed, the predetermined second photoresist layer 12b formed on one side of the first photoresist layer 12a is formed. After etching so that only a part remains, the second dye layer 4 is applied to the entire surface as shown in FIG. 3 (e), and then the second salt is disposed only on the unetched second photoresist layer 12b. Of the flattened layer 1 patterned so that the layer 4 remains and the first and second photoresist layers 12a and 12b and the first and second dyed layers 2 and 4 as shown in FIG. After the third photoresist layer 12c is applied to the entire surface, the third photoresist layer 12c having a predetermined size is formed on only one side of the preformed second photoresist layer 12b. After the third dye layer 5 is applied to the entire surface as described above, the third dye layer is patterned so that the third dye layer remains only on the upper side of the unetched third photoresist layer 12c, followed by dyeing with a predetermined color. Subsequently, as shown in FIG. 3 (h), the coating layer 6 is formed on the entire surface, and the plurality of lens layers 7a are formed at a predetermined distance on the coating layer 6, followed by heat treatment to form the lens 7b.

Here, the first, second and third photoresist layers 12a, 12b and 12c are made of positive photoresist.

Therefore, according to the present invention, since each dye layer is dyed, the photoresist layer is isolated, and the other dye layer is dyed, thereby improving the uniformity of each dye layer, thereby maximizing the color sensitivity of the color filter.

Claims (3)

Forming a first isolation layer in a form covering the first dye layer and the first dye layer from above from a predetermined portion on the flat layer; and the first dye layer and the flat layer without forming the first isolation layer Forming a second isolation layer in a form of wrapping the second dye layer and the second dye layer from above in a predetermined portion; and wherein the first, second dye layer, and the first and second isolation layers are not formed. A third dyeing layer is formed on the remaining portion of the flat layer, and a coating layer is formed on the entire surface on which the first, second and third dyeing layers are formed at predetermined periods, and then corresponds one to one to the plurality of dyeing layers formed by repeating the predetermined periods. A method of manufacturing a color filter for a CCD imaging device, characterized in that the steps of forming a plurality of lenses are sequentially performed. The first photoresist layer and the first dye layer are sequentially formed in a predetermined portion of the flat layer, and then the second photoresist layer and the second dye layer are sequentially formed in the predetermined portion on the flat layer where the first photoresist layer is not formed. Forming a third photoresist layer and a third dyeing layer in the remaining portion of the flat layer where the first and second photoresist layers are not formed; and the first, second and third dyeing Forming a coating layer on the entire surface where the layers are repeated at predetermined cycles, and then forming a plurality of lenses corresponding to one-to-one on the plurality of dyed layers repeated at the predetermined cycles in order, the color filter manufacturing method of the CCD image element . The method of claim 2, wherein the second photoresist layer formed on the flat layer is formed of a layer connected from the top of the first dye layer to the bottom of the second dye layer and the third photoresist layer is a third dye from above the second dye layer. A method of manufacturing a color filter of a CCD imaging device, characterized in that it is formed as a layer connected below the layer to isolate each dye layer.