KR100215817B1 - Display panel substrate manufacturing method thereof and manufacturing method of pdp using the same - Google Patents

Abstract

The present invention relates to a display panel substrate, a method for manufacturing the same, and a method for manufacturing a PDP using the same.

Composition Crystal phase Nucleating agent Anti-deviation material One SiO ₂ 68-76wt%, Al ₂ O ₃ 17-24wt%, Li ₂ O 2.5-5wt%, MgO 0-3wt%, ZnO 0-4wt% β-quartz solid solution TiO ₂ 1.5-4wt%, ZrO ₂ 0-3wt% 2 SiO ₂ 68-76wt%, Al ₂ O ₃ 17-22wt%, Li ₂ O 1.5-3wt%, MgO 2.5-7wt%, ZnO 0-3wt% β-quartz solid solution ZrO ₂ 3-6wt% 3 SiO ₂ 64-75wt%, Al ₂ O ₃ 16-25wt%, MgO 3-10wt%, ZnO 0-7wt% β-quartz solid solution ZrO ₂ 3-10wt% 4 SiO ₂ 65-75wt%, Al ₂ O ₃ 15-25wt%, MgO 0-6wt%, ZnO 4-15wt% Spinel ZrO ₂ 5-10wt% K ₂ O, Cs ₂ O (less than 10%) 5 SiO ₂ 60-90wt%, Al ₂ O ₃ 10-40wt% Mullite BaO, Na ₂ O, Rb ₂ O, Cs ₂ O (less than 10%)

After mixing the appropriate nucleating agent or anti-devitrification material to each other, the mixture is melted to produce plate glass, and the plate glass is heat-treated for a predetermined time by general crystallization treatment, alkali ion exchange method or surface polishing method. By depositing the fine crystals in the film, it has excellent thermal stability and light transmittance and can prevent deterioration of the metal electrode due to diffusion of alkali ions.

Description

Display panel substrate, manufacturing method thereof and manufacturing method using PDIP

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a display panel, and more particularly, to a display panel substrate, a method for manufacturing the same, and a method for manufacturing a PD using the same.

In general, the substrate used in the display element mainly uses a transparent glass substrate that can transmit light well.

Glass substrates used in such display elements should have good light transmittance and be resistant to thermal shock and thermal deformation.

Among the display devices, in particular, soda lime glass is mainly used as a substrate of a PDP (PDP) device, which is emerging as a next-generation display device together with a TFT liquid crystal display device. It has a composition close to Na ₂ O · CaO · 6SiO ₂ .

That is, the soda lime-based glass contains a small amount of Al ₂ O ₃ , K ₂ O, MgO, etc. in addition to 70% SiO ₂ , 15% Na ₂ O, 10% CaO and the coefficient of thermal expansion is 85 × 10 ^-7 / ℃ The transition point temperature is about 550 ° C.

However, in the case of manufacturing a PDP device, a baking process of about 500 to 600 ° C. must be performed together with a paste printing operation. The soda lime-based glass has a very low thermal shock, and thus heats when baking a structure formed on a substrate. The deformation causes an obstacle to thinning the glass substrate.

In addition, Na and K contained in the soda lime glass have ionic potentials (Z / r; Z is valence and r is ion radius) of 0.95. Since it is 1.33, it has very weak binding force with oxygen and has only one external electron, so it is easily ionized.

Therefore, during high temperature firing, these alkali ions increase the non-crosslinked oxygen to open the glass structure and thereby cause rapid diffusion of alkali ions between the glass networks.

In addition, when these alkali ions penetrate into the lattice of the PD element electrode, the periodicity of the lattice is distorted, and electron scattering occurs, thereby increasing the electrical resistance.

This phenomenon increases the resistance of the PD device electrode, which causes an increase in power consumption of the PD device and a decrease in response.

The display panel substrate according to the prior art has the following problems.

First, it is weak to thermal shock and thermal deformation occurs during heat treatment, and thus it is impossible to maintain a stable shape.

Second, due to thermal and mechanical instability, there is a limit to thinning the thickness, which increases the cost.

Third, alkali ions in the glass substrate diffuse to the electrode of the device, shortening the life of the device.

The present invention has been made to solve the above problems, and provides a display panel substrate, a method for manufacturing the same and a method for manufacturing a PD using the same, having excellent thermal stability and light transmittance and preventing deterioration of the metal electrode due to diffusion of alkali ions. Its purpose is to.

1 is a view showing a process of manufacturing a PD using a crystallized glass substrate according to the present invention

Explanation of symbols for main parts of the drawings

1: top plate 2: bottom plate

3: electrode 4: dielectric

5: MgO layer 6: partition wall

7: phosphor

The display panel substrate according to the present invention is characterized by having microcrystals having a particle diameter of 0.02 to 1 μm or less, and having the following compositions:

First group 2nd group Third group Fourth group 5th group wt% SiO ₂ 68-76 68-76 64-75 65-75 60-90 Al ₂ O ₃ 17-24 17-22 16-25 15-25 10-40 Li ₂ O 2.5-5 1.5-3 MgO 0-3 2.5-7 3-10 0-6 ZnO 0-4 0-3 0-7 4-15

It is formed in any one group of the first group to the fifth group consisting of.

The display panel substrate manufacturing method according to the present invention is characterized by the following compositions:

Table 1

First group 2nd group Third group Fourth group 5th group wt% SiO ₂ 68-76 68-76 64-75 65-75 60-90 Al ₂ O ₃ 17-24 17-22 16-25 15-25 10-40 Li ₂ O 2.5-5 1.5-3 MgO 0-3 2.5-7 3-10 0-6 ZnO 0-4 0-3 0-7 4-15

Mixing a nucleating agent or a devitrification preventing material to any one of the first to fifth groups having a step; manufacturing the plate glass by melting the mixture; It consists of a step of depositing fine crystals in the.

Features of the manufacturing method of the PDP using the display panel substrate according to the present invention comprises the steps of preparing a transparent first and second glass substrate, the fine crystallization, forming a partition wall with a predetermined interval on the first glass substrate, Applying a phosphor between the partition walls, forming an electrode with a predetermined interval on the second glass substrate, sequentially applying a dielectric and MgO layer over the entire surface of the second glass substrate including the electrode, and It consists of the step of sealing a glass substrate and a 2nd glass substrate.

Referring to the accompanying drawings, a display panel substrate, a method for manufacturing the same, and a method for manufacturing a PDP using the same according to the present invention having the above characteristics are as follows.

In order to manufacture the display panel substrate according to the present invention, first, the composition of the display panel substrate and the nucleating agent and the anti-devitrification material mixed in the composition should be appropriately selected.

Here, the reason for adding the nucleating agent is to improve the light transmittance and thermal properties compared to the existing substrate by crystallizing the substrate, and the reason for adding the devitrification preventing material to prevent the impermeability and breakage of the substrate to be.

The composition of the display panel substrate selected in the present invention, the nucleating agent and the anti-devitrification material mixed therewith are shown in Table 2 below.

Composition Crystal phase Nucleating agent Anti-deviation material One SiO ₂ 68-76wt%, Al ₂ O ₃ 17-24wt%, Li ₂ O 2.5-5wt%, MgO 0-3wt%, ZnO 0-4wt% β-quartz solid solution TiO ₂ 1.5-4wt%, ZrO ₂ 0-3wt% 2 SiO ₂ 68-76wt%, Al ₂ O ₃ 17-22wt%, Li ₂ O 1.5-3wt%, MgO 2.5-7wt%, ZnO 0-3wt% β-quartz solid solution ZrO ₂ 3-6wt% 3 SiO ₂ 64-75wt%, Al ₂ O ₃ 16-25wt%, MgO 3-10wt%, ZnO 0-7wt% β-quartz solid solution ZrO ₂ 3-10wt% 4 SiO ₂ 65-75wt%, Al ₂ O ₃ 15-25wt%, MgO 0-6wt%, ZnO 4-15wt% Spinel ZrO ₂ 5-10wt% K ₂ O, Cs ₂ O (less than 10%) 5 SiO ₂ 60-90wt%, Al ₂ O ₃ 10-40wt% Mullite BaO, Na ₂ O, Rb ₂ O, Cs ₂ O (less than 10%)

In the present invention, after mixing the appropriate nucleating agent or anti-devitrification material to each of the five kinds of composition as shown in Table 2, the mixture is melted in the temperature range of about 1000 ~ 1600 ℃ to produce a plate-like glass.

There are three methods for crystallizing the glass substrate thus produced.

The first method is a general crystallization method, the second method is an alkali ion exchange method, and the third method is a surface polishing method.

A general crystallization method will be described first. A method of depositing particulate crystals in a glass matrix by heat-treating the plate-shaped glass prepared as described above for a predetermined time between the transition point of the glass and the softening point of the glass.

That is, the glass plate is heat-treated at about 500 to 800 ° C. for several minutes to several hours so that microcrystals having a particle diameter of about 0.02 to 1 μm or less are distributed in the glass matrix by 85% or more.

In this case, the crystallized glass substrate should have a visible light transmittance of 85% or more.

In this method, the heat treatment process for crystallization of the glass is very important.

In other words, if the heat treatment is not properly performed, proper nucleation and growth in the glass do not occur, resulting in precipitation of non-uniform crystals, growth of non-uniform crystals, and deterioration of light transmission characteristics and thermal characteristics.

Therefore, in order for small fine grains to occupy a large volume ratio in the glass, nuclei must be present at a uniform density of 10 ¹² to 10 ¹³ per cm 3, and the initial nucleation size is preferably about 30 to 90 mm 3. .

In addition, when growing from nucleation, in order to have good light transmittance and thermal properties, the particle size should be uniformly dispersed between 0.02 to 1 μm and the refractive index with the glass matrix should be kept about the same. Depending on the product, precise heat treatment is required.

On the other hand, in the alkali ion exchange method, the produced plate-shaped glass is immersed in an alkali molten salt of the SiO ₂ -Li ₂ O-based or SiO ₂ -MgO-based glass substrate of Table 2, and then heat-treated to Li ⁺ ↔ Na ⁺ or Mg ^{2 It} is a method of forming surface crystallization by causing ⁺ ↔ 2Li ⁺ substitution to distribute fine grains within a depth of about 60 to 90 µm from the surface of the glass substrate.

At this time, SiO ₂ -Li ₂ O system or the SiO ₂ -MgO system the intensity of each of the glass substrate can be kept for about 50000psi, 40000psi.

In addition, the surface polishing method produces a fine flaw on the glass surface by polishing the glass surface by using the produced plate-shaped glass with an abrasive of any one of SiC, Al ₂ O ₃ and ZrO ₂ of ₂₀₀ to 300 mesh.

Subsequently, it is a method of forming surface crystallization by heat-treating a glass substrate with a fine flaw at the temperature of about 600-800 degreeC, and disperse | distributing a fine crystal within the depth of 30-150 micrometers from the surface of a glass substrate.

As mentioned above, the principle of the ion exchange method or the surface polishing method takes advantage of the fact that the crystallization occurs mostly on the glass surface rather than inside the glass.

Therefore, when the crystals are deposited on the glass surface by proper surface treatment, strong compressive stress is formed on the glass surface due to the difference in thermal expansion between the glass surface and the glass surface. The transmittance can be increased.

That is, the source of the surface crystallization is that the chemical composition difference between the glass surface and the glass surface or the minute scratches on the glass surface.

These are the driving forces that lower the glass surface energy, causing surface crystallization.

In general, the glass surface stress? According to the rate of change (ΔV / V) of the molar volume by the ion exchange method and the surface polishing method is calculated as follows.

Where σ is the surface stress, E is the Young's modulus, and μ is the Poisson's ratio.

1 is a view showing a process of manufacturing a PD using a crystallized glass substrate according to the present invention, as shown in Figure 1, first to produce a top plate 1 and a lower plate 2 made of transparent crystallized glass.

Then, an electrode 3 having a predetermined interval is formed on the upper plate 1, and the dielectric 4 and the MgO layer 5 are sequentially applied to the entire upper plate 1 including the electrode 3.

On the other hand, the partition 6 is formed on the lower plate 2 at regular intervals, and the phosphor 7 is applied between the partitions 6.

The PD is manufactured by sealing the upper plate 1 and the lower plate 2 thus formed so as to face each other.

The display panel substrate according to the present invention, a method for manufacturing the same, and a method for manufacturing a PDP using the same have the following effects.

First, since the transparent crystallized glass substrate manufactured by the present invention is excellent in light transmittance and thermal stability, it is possible to maintain a stable shape without significant deformation even in the heat treatment step required for manufacturing a display device.

Second, the transparent crystallized glass substrate produced by the present invention can maintain thermal and mechanical stability, so that the thickness can be made thinner than before, thereby reducing cost and increasing productivity.

Third, the transparent crystallized glass substrate produced by the present invention has a high resistance effect against the movement of alkali ions, and can prevent alkali ions inside the glass from diffusing to the electrode of the device even at a high firing temperature. Can increase the lifetime of the device.

Claims (17)

Having microcrystals having a particle diameter of 0.02 to 1 μm or less, and having the following compositions: First group 2nd group Third group Fourth group 5th group wt% SiO ₂ 68-76 68-76 64-75 65-75 60-90 Al ₂ O ₃ 17-24 17-22 16-25 15-25 10-40 Li ₂ O 2.5-5 1.5-3 MgO 0-3 2.5-7 3-10 0-6 ZnO 0-4 0-3 0-7 4-15 Display panel substrate, characterized in that formed in any one group of the first group to the fifth group consisting of. The display panel substrate of claim 1, wherein the microcrystal is distributed in the substrate at least 85%. The display panel substrate of claim 1, wherein the microcrystals are distributed at a depth of 30 to 150 μm from the surface of the substrate. The following compositions: First group 2nd group Third group Fourth group 5th group wt% SiO ₂ 68-76 68-76 64-75 65-75 60-90 Al ₂ O ₃ 17-24 17-22 16-25 15-25 10-40 Li ₂ O 2.5-5 1.5-3 MgO 0-3 2.5-7 3-10 0-6 ZnO 0-4 0-3 0-7 4-15 A first step of mixing the nucleating agent or anti-devitrification material in any one of the first to fifth groups having a; A second step of melting the mixture to produce a plate glass; And a third step of depositing particulate crystals in the plate glass by heat-treating the plate glass for a predetermined time. 5. The method of claim 4, wherein the nucleating agent mixed with the first group is 1.5 to 4 wt% of TiO ₂ and 0 to 3 wt% of ZrO ₂ , and the nucleating agent mixed with the second group is ZrO ₂ 3 to 6 wt%, the nucleating agent mixed with the third group is ZrO ₂ 3-10 wt%, the nucleating agent mixed with the fourth group is ZrO ₂ 5-10 wt% Way. The anti-throw material mixed with the fourth group is K ₂ O, Cs ₂ O, the anti-throw material mixed with the fifth group is BaO, Na ₂ O, Rb ₂ O, Cs ₂ O Display panel substrate manufacturing method characterized in that. The method of claim 4, wherein the melting temperature of the mixture in the second step is 1000 to 1600 ° C. 6. The method of claim 4, wherein the heat treatment is performed between the transition point of the glass and the softening point of the glass. The method of claim 4, wherein the temperature of the heat treatment in the third step is 500 to 800 ° C. 6. The method of claim 4, wherein an ion exchange method or a surface polishing method is used to deposit fine crystals in the plate glass in the third step. The method of claim 4, wherein the third step Immersing the plate glass in an alkali molten salt; And heat-treating the plate-shaped glass for a predetermined time, thereby depositing fine crystals on the surface of the plate-shaped glass. 12. The method of claim 11, wherein the fine grains are distributed at a depth of 60 to 90 mu m from the surface of the plate glass. The method of claim 4, wherein the third step Polishing the plate glass surface using an abrasive; And heat-treating the plate-shaped glass for a predetermined time, thereby depositing fine crystals on the surface of the plate-shaped glass. The method of claim 13, wherein the fine grains are distributed at a depth of 30 to 150 μm from the surface of the plate glass. The method of claim 13, wherein the heat treatment temperature is 600 to 800 ° C. 15. The method of claim 13, wherein the abrasive is any one of SiC, Al ₂ O ₃ , and ZrO ₂ . Preparing a transparent first and second glass substrate on which microcrystallization has been performed; Forming a partition wall having a predetermined distance on the first glass substrate; Applying a phosphor between the barrier ribs; Forming an electrode having a predetermined interval on the second glass substrate; Sequentially applying a dielectric and an MgO layer on the entire surface of the second glass substrate including the electrode; Method of manufacturing a PD using a display panel substrate, characterized in that the step consisting of sealing the first glass substrate and the second glass substrate.

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